JP4027108B2 - フォトマスク - Google Patents

フォトマスク Download PDF

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Publication number
JP4027108B2
JP4027108B2 JP2002029084A JP2002029084A JP4027108B2 JP 4027108 B2 JP4027108 B2 JP 4027108B2 JP 2002029084 A JP2002029084 A JP 2002029084A JP 2002029084 A JP2002029084 A JP 2002029084A JP 4027108 B2 JP4027108 B2 JP 4027108B2
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JP
Japan
Prior art keywords
transmittance
photomask
light
region
intermediate layer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2002029084A
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English (en)
Japanese (ja)
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JP2003228160A (ja
JP2003228160A5 (enrdf_load_stackoverflow
Inventor
順司 寺田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
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Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP2002029084A priority Critical patent/JP4027108B2/ja
Publication of JP2003228160A publication Critical patent/JP2003228160A/ja
Publication of JP2003228160A5 publication Critical patent/JP2003228160A5/ja
Application granted granted Critical
Publication of JP4027108B2 publication Critical patent/JP4027108B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Diffracting Gratings Or Hologram Optical Elements (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
JP2002029084A 2002-02-06 2002-02-06 フォトマスク Expired - Fee Related JP4027108B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2002029084A JP4027108B2 (ja) 2002-02-06 2002-02-06 フォトマスク

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2002029084A JP4027108B2 (ja) 2002-02-06 2002-02-06 フォトマスク

Publications (3)

Publication Number Publication Date
JP2003228160A JP2003228160A (ja) 2003-08-15
JP2003228160A5 JP2003228160A5 (enrdf_load_stackoverflow) 2005-08-11
JP4027108B2 true JP4027108B2 (ja) 2007-12-26

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ID=27750016

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2002029084A Expired - Fee Related JP4027108B2 (ja) 2002-02-06 2002-02-06 フォトマスク

Country Status (1)

Country Link
JP (1) JP4027108B2 (enrdf_load_stackoverflow)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN100345008C (zh) * 2005-06-29 2007-10-24 浙江工业大学 一种超分辨微结构衍射光学元件的制作方法
JP4967616B2 (ja) * 2006-11-17 2012-07-04 凸版印刷株式会社 多段階段状素子並びにモールドの製造方法
JP5008479B2 (ja) * 2007-06-28 2012-08-22 ラピスセミコンダクタ株式会社 レジストパターンの形成方法及びフォトマスク
CN107643557A (zh) * 2016-07-21 2018-01-30 擎中科技（上海）有限公司 一种光栅结构、立体显示装置及光栅结构的制作方法
CN111856636B (zh) * 2020-07-03 2021-10-22 中国科学技术大学 一种变间距光栅掩模线密度分布可控微调方法

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Publication number Publication date
JP2003228160A (ja) 2003-08-15

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