JP3991518B2 - Manufacturing method of liquid crystal display device - Google Patents

Description

[0001]
BACKGROUND OF THE INVENTION
The present invention relates to a method for manufacturing a reflector and a method for manufacturing a liquid crystal display device.
[0002]
[Prior art]
A so-called reflective liquid crystal display device is configured by sandwiching liquid crystal in a gap between a front substrate and a rear substrate. On the inner surface (liquid crystal side) surface of the rear substrate of the reflective liquid crystal display device, a pixel electrode made of aluminum or the like and having a function of a reflecting plate, a switching element for controlling the switching of the pixel electrode, and the like are formed. A transparent counter electrode or the like is formed on the inner side (liquid crystal side) of the front substrate.
[0003]
In such a configuration, external light (sunlight, indoor illumination light, etc.) incident from the front substrate side is reflected by the pixel electrode, is emitted from the front substrate side, and is visually recognized by the user. As described above, the reflective liquid crystal display device does not require a backlight, so that there is an advantage that the display device can be easily reduced in thickness and size and power consumption can be reduced.
[0004]
[Problems to be solved by the invention]
However, in this reflective liquid crystal display device, when light from a nearby person or object enters from the front substrate, the incident light is reflected by the mirror-shaped pixel electrode and is visually recognized by the user. For this reason, in addition to the original display image, there is a problem that an image of a nearby person or object is visually recognized by the user, and the display becomes difficult to see. Hereinafter, this phenomenon is referred to as background reflection.
[0005]
The present invention has been made in view of the circumstances described above, and an object of the present invention is to provide a method for manufacturing a liquid crystal display device and a method for manufacturing a reflector that can reduce the influence of reflection of the background and the like, and display is easy to see. Yes.
[0006]
[Means for Solving the Problems]
The present invention provides a projection forming step of forming a plurality of projections on a substrate by a resin material discharged from an inkjet head, and a reflection film that covers the surface of the substrate on which the plurality of projections are formed with a reflection film The manufacturing method of the reflecting plate characterized by having a formation process is provided.
[0007]
According to the manufacturing method of the reflector, the position where the convex portion is formed by the ink jet head and the size of the convex portion (the amount of the resin material to be ejected) can be arbitrarily set. It is possible to easily create a reflector having Further, it becomes easy to selectively form the convex portions only in a desired region on the substrate.
[0008]
Here, prior to the convex portion forming step, a substrate water repellent step of performing a water repellent treatment on the substrate may be provided. In this case, since the resin material that has landed on the substrate has a predetermined contact angle, the resin material can be prevented from spreading and becoming flat on the substrate. Therefore, a reflector having desired scattering characteristics can be produced with certainty.
[0009]
The plurality of protrusions formed on the substrate have substantially the same diameter, and the center of one of the plurality of protrusions and the other one closest to the protrusion. You may make it the length between the centers of a convex part become the length of 0.1 times-3 times the diameter of each convex part. In the case of such a configuration, there is an advantage that a reflector having good scattering characteristics can be manufactured.
[0010]
Moreover, you may make it the said convex part formation process form the convex part of a multiple types of diameter. By doing so, a reflector having better scattering characteristics can be manufactured.
[0011]
The present invention relates to a liquid crystal display device in which a liquid crystal is sandwiched between a first substrate on which a pixel electrode having light reflectivity and a switching element for switching control of the pixel electrode are formed, and a second substrate. A method of manufacturing the switching element, the step of forming the switching element on the first substrate, and the ejection from the inkjet head to a region other than the region where the switching element is formed on the first substrate. Forming a plurality of protrusions in the region, and forming an electrode for forming the pixel electrode in the region on the first substrate where the plurality of protrusions are formed And a process for producing a liquid crystal display device.
[0012]
According to the liquid crystal display device manufactured by the method for manufacturing a liquid crystal display device, the surface of the pixel electrode that also serves as the reflection plate is a reflection plate on which a plurality of convex portions are formed, and light incident from the second substrate side is And scattered by the plurality of convex portions. Accordingly, since the background is not reflected in the image visually recognized by the user and the direct reflection of the illumination light does not occur, the display can be easily viewed.
[0013]
In addition, according to the method for manufacturing the liquid crystal display device, since a convex portion having an arbitrary size can be formed at an arbitrary position on the surface of the pixel electrode that also functions as a reflector, desired scattering characteristics can be obtained. There is an advantage that the pixel electrode can be easily formed. In addition, there is an advantage that it is easy to selectively form convex portions only in regions other than the region where the switching elements are formed by arbitrarily operating the ink jet head.
[0014]
DETAILED DESCRIPTION OF THE INVENTION
Embodiments of the present invention will be described below with reference to the drawings. Such an embodiment shows one aspect of the present invention, and does not limit the present invention, and can be arbitrarily changed within the scope of the present invention.
[0015]
A: First embodiment
FIG. 1 is a cross-sectional view schematically showing a configuration of a reflective liquid crystal panel 100 to which the reflector manufacturing method according to the first embodiment of the present invention is applied. In addition, in FIG. 1 and each figure shown below, in order to make each layer and each member large enough to be recognized on the drawing, the scale is different for each layer and each member.
[0016]
As shown in FIG. 1, in the reflective liquid crystal panel 100, a front substrate 10 and a rear substrate 11 are affixed with a sealant 12 at a constant interval, and TN ( Twist Nematic) type liquid crystal 13 is enclosed. The front substrate 10 and the back substrate 11 are plate-like members formed of, for example, quartz, glass, plastic, or the like.
[0017]
A plurality of counter electrodes 14 are formed in a stripe pattern on the inner surface (the liquid crystal 13 side) surface of the front substrate 10. The counter electrode 14 is made of, for example, ITO (Indium Tin Oxide) which is a transparent material. The surface of the front substrate 10 on which the counter electrode 14 is formed is covered with an alignment film 15. The alignment film 15 is a thin film made of an organic material such as polyimide, and is subjected to a uniaxial alignment process such as a rubbing process. The liquid crystal 13 sealed between the front substrate 10 and the rear substrate 11 is in an alignment state according to the alignment film 15 in a state where an electric field from a pixel electrode 16 described later is not applied. A polarizing plate (not shown) having a polarization axis set in accordance with the rubbing direction of the alignment film 15 is attached to the outer surface (opposite the liquid crystal 13) of the front substrate 10.
[0018]
On the other hand, a plurality of pixel electrodes 16 are formed in a matrix on the inner surface (the liquid crystal 13 side) surface of the back substrate 11. In the present embodiment, the pixel electrode 16 has not only a function as an electrode for applying an electric field to the liquid crystal 13 but also a function as a reflector. That is, each pixel electrode 16 is made of a light reflective metal such as aluminum, silver, nickel, or chromium, and reflects light incident from the front substrate 10 side.
[0019]
Here, FIG. 2A is a plan view showing a configuration when the pixel electrode 16 and the vicinity thereof are viewed from the liquid crystal 13 side, and FIG. 2B is a plan view of FIG. It is AA 'line sectional view. As shown in FIGS. 2A and 2B, a spherical convex portion (hereinafter referred to as a “resin convex portion”) is formed on the surface of the back substrate 11 and the region where the pixel electrode 16 is formed by acrylic resin or the like. A plurality of 17 are formed. Since the pixel electrode 16 is formed in a thin film on the upper surface, a convex portion 18 reflecting the resin convex portion 17 is formed on the surface of the pixel electrode 16. Due to these convex portions 18 formed on the pixel electrode 16, the reflected light from the pixel electrode 16 is moderately scattered, so that the background is reflected in the image visually recognized by the user or the light from the room illumination is reflected. Such a thing disappears.
[0020]
Here, each pixel electrode 16 is connected to a scanning line 20 for supplying a pixel voltage via a TFD (Thin Film Diode) element 19. The TFD element 19 is for controlling the switching of the pixel electrode 16, and as shown in FIG. 2B, a first metal film 22, an oxide film 23, and a second metal film 24a are stacked. 1 TFD element 19a, and a second TFD element 19b formed by laminating a first metal film 22, an oxide film 23, and a second metal film 24b. The second metal films 24a and 24b are formed so as to be separated from each other. The second metal film 24a extends in the opposite direction to the pixel electrode 16 and becomes the uppermost layer of the scanning line 20, while the second metal film 24b. Is extended to the pixel electrode 16 side and connected to the pixel electrode 16. An insulating film 21 is interposed between the TFD element 19 and the scanning line 20 and the back substrate 11. This is to prevent the first metal film 22 from being peeled off from the base and to prevent impurities from diffusing into the first metal film 22.
[0021]
Here, the current supplied from the scanning line 20 is supplied to the pixel electrode 16 through the first TFD element 19a and the second TFD element 19b. More specifically, the current from the scanning line 20 passes through the first TFD element 19a in the order of the second metal film 24a → the oxide film 23 → the first metal film 22, while passing through the second TFD element 19b. The first metal film 22 → the oxide film 23 → the second metal film 24b are passed through in this order. Thus, the element structure of the first TFD element 19 a and the element structure of the second TFD element 19 b are opposite to the direction of the current from the scanning line 20. That is, since the TFD element 19 has a configuration in which two elements are connected in series in opposite directions, the current-voltage nonlinear characteristic is symmetric in both positive and negative directions compared to the case where one element is used. can do.
[0022]
In FIG. 1 again, the surface of the back substrate 11 on which the pixel electrode 16, the TFD element 19 (not shown in FIG. 1) and the scanning line 20 are formed is covered with an alignment film 25 similar to the alignment film 15. Yes.
[0023]
Next, with reference to FIGS. 3A to 3F and FIGS. 4G to 4I, a manufacturing process of the reflective liquid crystal panel 100 to which the method according to this embodiment is applied will be described. 3 (b1), (e1) and (f1) and FIGS. 4 (g1) and (i1) are respectively shown in FIGS. 3 (b), (e) and (f) and FIGS. 4 (g) and (i). ). 3B is a sectional view taken along line BB ′ in FIG. 3B1, and FIG. 3E is a sectional view taken along line CC ′ in FIG. (F) is a sectional view taken along line DD ′ in FIG. 3 (f1), FIG. 4 (g) is a sectional view taken along line EE ′ in FIG. 4 (g1), and FIG. FIG. 5 is a cross-sectional view taken along line FF ′ in FIG.
[0024]
First, as shown in FIG. 3A, the surface of the back substrate 11 is covered with an insulating film 21 ′. The insulating film 21 ′ is made of, for example, tantalum oxide (Ta ₂ O ₅ The tantalum (Ta) film deposited by sputtering is thermally oxidized, or sputtering is performed using a target made of tantalum oxide.
[0025]
Next, a first metal film is formed on the upper surface of the insulating film 21 ′. This first metal film is made of, for example, tantalum, and is formed using sputtering, electron beam evaporation, or the like. Further, the first metal film is subjected to photolithography or etching, and is patterned into a portion to become the scanning line 20 and a portion branched from this portion, as shown in FIGS. 3B and 3B1.
[0026]
Subsequently, as shown in FIG. 3C, an oxide film 23 is formed on the surface of the first metal film 22 ′. Specifically, the surface of the first metal film 22 ′ is oxidized by an anodic oxidation method to form tantalum oxide. Next, as shown in FIG. 3D, the surface of the insulating film 21 ′ on which the first metal film 22 and the oxide film 23 are formed is covered with a second metal film 24 ′. The second metal film 24 ′ is made of, for example, chromium, aluminum, titanium, molybdenum, or the like, and is formed by sputtering or the like.
[0027]
Next, the second metal film 24 ′ is subjected to photolithography and etching to be patterned into the shape shown in FIG. That is, the second metal film 24a constituting the first TFD element 19a and the second metal film 24b constituting the second TFD element 19b are formed apart from each other. The uppermost layer is the second metal film 24a.
[0028]
Subsequently, as shown in FIGS. 3F and 3F1, the insulating film 21 ′ in the region other than the region where the scanning line 20 and the TFD element 19 are formed is removed by etching or the like. At this time, of the oxide film 23 branched from the scanning line 20, the oxide film in the wavy line portion in FIG. 3 (f1) is removed together with the first metal film serving as the basis thereof. Through the above steps, the TFD element 19 is formed on the back substrate 11.
[0029]
Next, a water repellent treatment for imparting water repellency is performed on the region of the back substrate 11 on which the pixel electrode 16 is formed. As this water repellent treatment, for example, a region where the pixel electrode 16 is formed is coated with a water repellent such as a silicon water repellent or a fluorine water repellent, or a fluorine compound (for example, CF ₄ ) And a method of forming a plasma polymerization film such as a silane compound. Specifically, for example, “Plasma water repellent treatment method and apparatus” disclosed in Japanese Patent Application Laid-Open No. 5-68874 and Japanese Patent Application Laid-Open No. 5-171410, which are prior applications of the present applicant, can be used. . In order to prevent the TFD element 19 from being affected by this water repellent treatment, prior to the water repellent treatment, a mask having a shape covering the region where the TFD element 19 is formed on the back substrate 11 is overlaid, The mask may be peeled off after the water repellent treatment.
[0030]
Subsequently, as shown in FIGS. 4G and 4G1, a plurality of resin protrusions 17 are formed using the inkjet head 50 in the region where the pixel electrode 16 is formed. That is, the liquefied acrylic resin is discharged from each nozzle 51, 51,... Provided in the ink jet head 50 and landed in a region where the pixel electrode 16 on the back substrate 11 is formed. Further, a series of operations of moving the ink jet head and discharging the acrylic resin is repeated. Next, the acrylic resin landed on the back substrate 11 in this way is thermally dried and cured. Here, as described above, since the region where the resin convex portion 17 is formed is subjected to water repellent treatment, the contact angle of the acrylic resin landed on the back substrate 11 has a predetermined size, and the back substrate 11 does not spread out into a film shape. Therefore, the resin convex part 17 which has the spherical surface which rose moderately from the back substrate 11 can be formed.
[0031]
Here, the inkjet head 50 has the same configuration as the well-known inkjet head 50 used in a normal printer or the like. That is, for example, a bubble jet type using an electrothermal transducer or a piezo jet type inkjet head using a piezoelectric element can be used. The inkjet head 50 includes a plurality of nozzles 51 that discharge acrylic resin, and the position of each nozzle 51 can be controlled. That is, the landing position of the acrylic resin on the back substrate 11 can be arbitrarily set. In the present embodiment, the amount of acrylic resin discharged from the inkjet head 50 is constant, and the amount of acrylic resin protruding from each nozzle 51 at a time is about 3 ng to 20 ng. Each resin protrusion 17 on the back substrate 11 formed in this way has a diameter of about 30 μm and a height of about 0.3 to 1.0 μm.
[0032]
Here, each of these resin protrusions 17 may be formed in a matrix with some regularity, for example, in a region where the pixel electrode 16 is formed, or the pixel electrode 16 is formed. It may be randomly formed in the region. However, the distance between the center of one resin convex portion 17 and the center of another resin convex portion 17 closest to the resin convex portion 17 is 0.1 times to 3 times the diameter of the resin convex portion 17. Since it has been experimentally found that good light scattering characteristics can be obtained when the ratio is approximately double, the positions of the nozzles 51 of the inkjet head 50, that is, the back surface, are set so that the formed resin convex portions 17 satisfy this condition. It is desirable to set the landing position of the acrylic resin on the substrate 11. The distance between the center of one resin convex portion 17 and the center of the other resin convex portion 17 located closest to the resin convex portion 17 is 0.1 times to 1 times the diameter of the resin convex portion 17. In the case of doubling, that is, when forming each of the plurality of resin protrusions 17 so as to have overlapping portions, the acrylic resin discharged from the inkjet head 50 is landed on the back substrate 11 and the acrylic resin is After forming the resin convex portions 18 by curing, the acrylic resin may be discharged so as to overlap the resin convex portions 18.
[0033]
Now, after forming the plurality of resin protrusions 17 in this way, as shown in FIG. 4H, the surface of the back substrate 11 on which the TFD element 19 and the plurality of resin protrusions 17 are formed is applied to the pixel electrode 16. It is covered with a reflective film 16 ′. The reflective film 16 ′ is formed by depositing light-reflecting aluminum, silver, or the like by a sputtering method or the like. As shown in FIG. 4H, a plurality of convex portions 18 reflecting the plurality of resin convex portions 17 are formed on the surface of the reflective film 16 ′. Next, the reflective film 16 ′ is subjected to photolithography, etching, or the like, and the reflective film 16 ′ is patterned into the shape of the pixel electrode 16 (FIGS. 4 (i) and (i1)).
[0034]
Through the above steps, the TFD element 19 and the pixel electrode 16 having a plurality of convex portions 18 are formed on the back substrate 11. Then, an alignment film 25 such as polyimide is formed on the surface of the back substrate 11 on which these parts are formed, and a uniaxial alignment process, for example, a rubbing process is performed on the alignment film.
[0035]
On the other hand, on the surface of the front substrate 10, first, a transparent conductive film such as ITO is formed, and the transparent conductive film is patterned by etching or the like to form the counter electrode 14. Then, an alignment film 15 such as polyimide is formed on the surface of the front substrate 10 on which the counter electrode 14 is formed, and a uniaxial alignment process, for example, a rubbing process is performed.
[0036]
In the case of producing a reflective liquid crystal panel capable of color display, a color filter is formed prior to the formation of the counter electrode 14. That is, on the surface of the front substrate 10 and in a region facing each pixel electrode 16 formed on the rear substrate 11, the region has one of R (red), G (green), and B (blue). The color filter is formed by an arrangement such as a stripe arrangement, a mosaic arrangement, or a delta arrangement, and a light shielding film is formed in a region other than the color filter. Next, an overcoat layer for flattening the surface of the front substrate 10 on which the color filter and the light shielding film are formed is formed, and the counter electrode 14 is formed on the upper surface of the overcoat layer.
[0037]
Next, the back substrate 11 and the front substrate created by the above steps are joined together by a sealing material 12, and the liquid crystal 13 is sealed in the gap between the substrates. Thereby, the reflective liquid crystal panel 100 illustrated in FIG. 1 can be created.
[0038]
As described above, according to the reflective liquid crystal panel 100 to which the manufacturing method of the reflective plate according to the present embodiment is applied, the plurality of convex portions 18 are formed on the surface of the pixel electrode 16 that also serves as the reflective plate. Light incident from the side is moderately scattered by the convex portion 18. Therefore, since the background is not reflected in the image visually recognized by the user, the display can be made easy to see.
[0039]
In the present embodiment, a plurality of resin protrusions 17 are formed on the back substrate 11 using the inkjet head 50. Accordingly, since the position of the nozzle 51 of the inkjet head 50, that is, the landing position of the acrylic resin can be arbitrarily set, the resin convex portion 17 is selectively formed only in a desired region (region where the pixel electrode 16 is formed). Has the advantage of being easy.
[0040]
In the above embodiment, the acrylic resin is ejected from the inkjet head 50, but it is needless to say that other resin materials such as an epoxy resin may be ejected. That is, any resin material may be used as long as it has a viscosity that can be discharged from the nozzle 51 of the inkjet head 50 in a liquefied state and is cured on the substrate. Further, since the surface of the back substrate 11 on which the resin protrusions 17 are formed is covered with the pixel electrodes 16, the resin material used does not have to be transparent, and may exhibit some color tone.
[0041]
Moreover, in the said embodiment, although the resin convex part 17 was formed on the back substrate 11 which performed the water-repellent process, when using the back substrate 11 which originally has desired water repellency, the said water-repellent process is carried out. Can be omitted.
[0042]
B: Second embodiment
Next, with reference to FIG. 5 and FIG. 6, the manufacturing method of the reflective liquid crystal panel 100 concerning 2nd Embodiment of this invention is demonstrated.
[0043]
First, after the above-described water repellent treatment is performed on one surface of the back substrate 11, the liquefied acrylic resin is discharged from each nozzle 51, 51... Of the inkjet head 50, thereby forming the pixel electrode 16. A plurality of resin protrusions 17 are formed in the region (FIGS. 5A and 5A1). The conditions for forming the resin convex portion 17 are the same as those in the first embodiment.
[0044]
Next, the surface of the back substrate 11 on which the plurality of resin protrusions 17 are formed is covered with an insulating film 21 ′ such as tantalum (FIG. 5B). Further, a first metal film is formed on the upper surface of the insulating film 21 ′ by sputtering or the like, and photolithography or etching is performed on the first metal film, so that FIG. 5C and FIG. Pattern to the shape shown.
[0045]
Subsequently, the surface of the first metal film 22 ′ patterned as described above is anodized to form an oxide film (tantalum oxide) 23 (FIG. 5D). Then, a second metal film (chromium, aluminum, etc.) 24 ′ is formed on the surface of the insulating film 21 ′ on which these parts are formed (FIG. 5E), and the second metal film 24 ′ Photolithography, etching, or the like is performed to form second metal films 24 and 24b (FIGS. 6 (f) and (f1)).
[0046]
Next, the insulating film 21 ′ in the region other than the region where the scanning line and the TFD element 19 are formed is removed by etching or the like. At this time, of the oxide film 23 branched from the scanning line 20, the portion indicated by the wavy line in FIG. 6G is also removed together with the first metal film 22 serving as the basis thereof (FIG. 6G). )). Through the above steps, the TFD element 19 and the plurality of resin protrusions 17 are formed on the back substrate 11.
[0047]
Subsequently, the surface of the back substrate 11 on which the TFD element 19 and the plurality of resin protrusions 17 are thus formed is covered with a reflective film 16 ′ having light reflectivity. As a result, as shown in FIG. 6H, a plurality of convex portions 18 reflecting the plurality of resin convex portions 17 are formed on the surface of the reflective film 16 ′. Then, the reflective film 16 ′ is subjected to photolithography or etching to be patterned into the shape of the pixel electrode 16 (FIGS. 6 (i) and (i1)).
[0048]
Further, the surface of the back substrate 11 on which the TFD element 19 and the pixel electrode 16 having the plurality of convex portions 18 are formed is covered with an alignment film 25 such as polyimide, and a rubbing process is performed.
[0049]
Thus, the back substrate 11 on which the TFD element 19 and the pixel electrode 16 and the like are formed and the front substrate 10 on which the counter electrode 14 and the alignment film 15 and the like are formed are joined by the sealing material 12, and the liquid crystal 13 is formed in the gap between the substrates. The reflective liquid crystal panel 100 can be created by encapsulating.
[0050]
Also in this embodiment, the same effect as the first embodiment can be obtained.
[0051]
C: Third embodiment
In each of the above embodiments, in order to form the pixel electrode 16 of the reflective liquid crystal panel 100 in which the pixel electrode 16 formed on the back substrate 11 also serves as a reflector, the method for manufacturing a reflector according to the present invention is applied. However, the present invention can also be applied when forming the reflective plate of the reflective liquid crystal panel 101 in which the pixel electrode 16 and the reflective plate are separately provided. FIG. 7 is a cross-sectional view illustrating the configuration of the reflective liquid crystal panel 101 in which the pixel electrode 16 and the reflective plate 30 are separately provided. In addition, in each part shown in FIG. 7, the same code | symbol is attached | subjected about the part which is common in each part shown in above-mentioned FIG. 1, and the description is abbreviate | omitted.
[0052]
As shown in the figure, the reflective liquid crystal panel 101 includes a front substrate 10 on which a counter electrode 14 and an alignment film 15 are formed, a TFD element 19, a pixel electrode 16, a scanning line 20, an alignment film 25, and the like. The back substrate 11 is joined via a sealing material 12, and a liquid crystal 13 is sealed between these substrates. In this embodiment, unlike the above embodiments, the pixel electrode 16 is a transparent electrode made of ITO or the like. Further, the pixel electrode 16 does not have the plurality of convex portions 18 described above, and has a flat shape.
[0053]
Further, a polarizing plate 31 is attached to the outside of the front substrate 10 (on the side opposite to the liquid crystal 13), and a polarizing plate 32 is attached to the outside of the back substrate 11, and the polarizing axes of the polarizing plates 31 and 32 are each attached. Is set according to the alignment direction of the alignment films 15 and 25 provided on each substrate. On the back side of the polarizing plate 32, a reflector 30 having a plurality of convex portions 18 on the surface facing the polarizing plate 32 is disposed.
[0054]
In such a configuration, light incident from the front substrate 10 side is polarizing plate 31 → front substrate 10 → counter electrode 14 → alignment film 15 → liquid crystal 13 → alignment film 25 → pixel electrode 16 → back substrate 11 → polarizer 32. → The light is reflected by the reflection plate 30 along the path of the reflection plate 30 and emitted from the front substrate 10 along the reverse path. Here, since a plurality of convex portions 18 are formed on the surface of the reflecting plate 30, the light reflected by the reflecting plate 30 is appropriately scattered. Therefore, the background does not appear in the image visually recognized by the user.
[0055]
Next, a manufacturing process of the reflector 30 will be described with reference to FIG.
[0056]
First, the above-described water repellent treatment is performed on the substrate 33. Here, as this board | substrate 33, plate-shaped members, such as glass and a plastic, can be used. Subsequently, the liquefied acrylic resin is discharged from each nozzle 51, 51... Of the ink jet head 50 and landed on one surface of the substrate 33 (on the surface subjected to water repellent treatment). A plurality of resin protrusions 17 are formed on the substrate 33 by thermally drying the landed acrylic resin. The conditions for forming the resin protrusions 17 may be the same as those shown in the first embodiment.
[0057]
Next, the reflective film 34 is formed by sputtering or the like on the surface of the substrate 33 on which the plurality of resin protrusions 17 are formed. The reflection film 34 is a thin film made of a material having light reflectivity, such as aluminum, silver, or nickel. The reflection plate 30 thus prepared is arranged so that the surface on which the reflection film 34 is formed faces the back substrate 11.
[0058]
Thus, according to the manufacturing method of the present embodiment, there is an advantage that the reflector 30 having a plurality of convex portions and having good scattering characteristics can be formed by a very simple process.
[0059]
D: Modification
Although one embodiment of the present invention has been described above, the above embodiment is merely an example, and various modifications can be made to the above embodiment without departing from the spirit of the present invention. As modifications, for example, the following can be considered.
[0060]
<Modification 1>
In each of the above embodiments, the amount of the acrylic resin discharged from the inkjet head 50 is made constant, and the diameter of the formed resin convex portion 17 is made constant, but the acrylic resin discharged from the inkjet head 50 is made constant. The amount may be changed for each discharge. That is, a plurality of resin protrusions 17 each having a plurality of types of diameters may be formed on the back substrate 11. Here, when the inkjet head 50 to be used is a piezo jet type, the amount of acrylic resin discharged can be adjusted by changing the voltage applied to the piezoelectric element. Further, when the inkjet head 50 to be used is a bubble jet type, the amount of acrylic resin discharged is adjusted by adjusting the size of bubbles generated by changing the size of the voltage applied to the heater. Can do.
[0061]
Further, instead of adjusting the discharge amount from one nozzle, different amounts of acrylic resin may be discharged for each of the plurality of nozzles 51 provided in the inkjet head 50.
[0062]
<Modification 2>
In each of the above embodiments, the TFD element 19 is used as the diode element. However, the present invention is not limited thereto, and an element using a zinc oxide (ZnO) varistor, MSI (Metal Semi-Insulator), or the like may be used. These elements may be used alone or in series connected in the reverse direction. A thin film transistor may be used as the switching element. In other words, the “switching element” in the claims includes these various elements.
[0063]
【The invention's effect】
As described above, according to the liquid crystal panel to which the method according to the present invention is applied, a plurality of convex portions are formed on the surface of the reflecting plate (pixel electrode) that reflects incident light. Incident light is scattered moderately. Therefore, it is possible to prevent the background from being reflected in the image visually recognized by the user, and to make the display easier to see.
[0064]
In addition, since a plurality of convex portions are formed on the back substrate using the inkjet head, a desired region can be obtained by arbitrarily setting the position of the nozzle of the inkjet head, that is, the landing position of the acrylic resin. It becomes easy to selectively form convex portions only in (for example, a region other than a region where a switching element is formed).
[Brief description of the drawings]
FIG. 1 is a cross-sectional view showing a configuration of a liquid crystal panel to which a method according to a first embodiment of the present invention is applied.
FIG. 2A is a plan view showing a configuration of a pixel electrode of the liquid crystal panel and its vicinity, and FIG. 2B is a cross-sectional view taken along line AA ′ in FIG.
3 is a view showing a manufacturing process of a rear substrate of the liquid crystal panel. FIG.
FIG. 4 is a diagram showing a manufacturing process of the rear substrate of the liquid crystal panel.
FIG. 5 is a view showing a manufacturing process of a back substrate of a liquid crystal panel to which a method according to a second embodiment of the present invention is applied.
FIG. 6 is a diagram showing a manufacturing process of the rear substrate of the liquid crystal panel.
FIG. 7 is a cross-sectional view showing a configuration of a liquid crystal panel to which a method according to a third embodiment of the present invention is applied.
FIG. 8 is a diagram showing a manufacturing process of the reflecting plate of the liquid crystal panel.
[Explanation of symbols]
DESCRIPTION OF SYMBOLS 10 ... Front substrate (second substrate) 11 ... Back substrate (first substrate) 12 ... Sealing material 13 ... Liquid crystal 14 ... Counter electrode 15 ... Alignment film 16 ... Pixel electrode, 16 '... Reflective film, 17 ... Resin convex part (convex part), 18 ... Convex part, 19 ... TFD element (switching element), 19a ... First TFD element, 19b ... First 2 TFD elements, 20... Scanning line, 21... Insulating film, 22... First metal film, 23... Oxide film, 24 a and 24 b. Reflector 31, 32... Polarizing plate 33... Substrate 34. Reflecting film 50. Inkjet head 51. Nozzle 100, 101.

Claims (2)

A method of manufacturing a liquid crystal display device in which a liquid crystal is sandwiched between a first substrate on which a pixel electrode having light reflectivity and a switching element for switching control of the pixel electrode are formed, and a second substrate. There,
A switching element forming step of forming the switching element on the first substrate;
A substrate water-repellent treatment step for performing water-repellent treatment for imparting water repellency to a region where the pixel electrode is formed;
Resin material discharged from the ink jet head is landed on a region where the water repellent treatment other than the region where the switching element is formed on the first substrate, and a plurality of convex portions are formed in the region. A convex forming step;
An electrode forming step of forming the pixel electrode in a region where the plurality of convex portions are formed on the first substrate;
A method for manufacturing a liquid crystal display device, comprising: forming a mask having a shape covering a region where the switching element is formed prior to the water repellent treatment; and peeling the mask after the water repellent treatment. A method of manufacturing a liquid crystal display device in which a liquid crystal is sandwiched between a first substrate on which a pixel electrode having light reflectivity and a switching element for switching control of the pixel electrode are formed, and a second substrate. There,
A substrate water repellent treatment step of subjecting one surface of the first substrate to a water repellent treatment;
The resin material discharged from the inkjet head is landed on a region where the pixel electrode is formed in the water-repellent treatment region on the first substrate, and a plurality of convex portions are formed in the region. A projecting portion forming step,
Forming an insulating film covering the first substrate on which the convex portions are formed;
A switching element forming step of forming the switching element on the insulating film;
Removing the insulating film in a region other than at least the region where the switching element is formed;
A method of manufacturing a liquid crystal display device, comprising: an electrode forming step of forming the pixel electrode in a region where the plurality of convex portions are formed on the first substrate.

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