JP3952729B2 - Manufacturing method of color filter substrate - Google Patents

Manufacturing method of color filter substrate Download PDF

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Publication number
JP3952729B2
JP3952729B2 JP2001320001A JP2001320001A JP3952729B2 JP 3952729 B2 JP3952729 B2 JP 3952729B2 JP 2001320001 A JP2001320001 A JP 2001320001A JP 2001320001 A JP2001320001 A JP 2001320001A JP 3952729 B2 JP3952729 B2 JP 3952729B2
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Japan
Prior art keywords
color filter
filter substrate
colored layer
bank
layer
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JP2001320001A
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JP2003121635A (en
Inventor
和昭 桜田
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セイコーエプソン株式会社
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Description

[0001]
BACKGROUND OF THE INVENTION
The present invention relates to a color filter substrate and a manufacturing method thereof, a liquid crystal device and an electronic apparatus, and more particularly to a manufacturing method of a color filter substrate provided with a transflective layer.
[0002]
[Prior art]
Conventionally, reflection type liquid crystal devices are often used in portable devices and display units of devices because of their low power consumption. However, since they use external light to make the display visible, they are used in dark places. There was a problem that the display could not be read. For this reason, a type of liquid crystal device has been proposed in which the display is visually recognized using external light in a bright place and the display can be visually recognized by an internal light source in a dark place.
[0003]
For example, as described in JP-A-57-042771, a polarizing plate, a transflective plate, and a backlight are sequentially arranged on the outer surface opposite to the viewer side of the liquid crystal cell. A transflective liquid crystal device is known.
The liquid crystal device having such a configuration performs reflection-type display using reflected light reflected by the transflective plate when ambient light is bright, and backlight when the ambient light is dark. Is turned on, and a transmissive display is made in which the display can be visually recognized by the light transmitted through the transflective plate.
In recent years, there has been a high demand for liquid crystal devices capable of color display, and a transflective color liquid crystal device having a color filter substrate having a transflective film on a substrate and a color filter composed of a colored layer is also known. Yes.
As the transflective layer, a structure in which a light transmitting opening is provided in a reflective layer made of a metal material such as Al, Cr, or Ag is preferably used.
[0004]
[Problems to be solved by the invention]
However, in the conventional transflective color filter substrate, in order to form the transflective layer, a frost processing is performed in advance to form fine irregularities on the surface of the substrate. Since a reflective film made of a metal material was formed by vacuum deposition and then a part of the reflective film was removed by etching to form an opening, the number of processes was large and a large-scale apparatus was required. In addition, there is a problem that the manufacturing cost increases.
[0005]
The present invention has been made in view of the above circumstances, and reduces the number of processes requiring complicated and large-scale apparatuses such as a substrate frosting process, a film forming process using a sputtering method or a vacuum evaporation method, and an etching process. An object of the present invention is to make it possible to manufacture a transflective color filter substrate in a time and at a low cost.
[0006]
[Means for Solving the Problems]
In order to solve the above-described problems, a method for manufacturing a color filter substrate according to the present invention includes a color comprising a transflective layer having an opening for light transmission and a colored layer composed of a plurality of color elements on the substrate. A method of manufacturing a color filter substrate for manufacturing a filter substrate, the step of forming a bank for partitioning each colored layer on the substrate, and in the region partitioned by the bank, the opening A liquid repellent treatment step for applying a liquid repellent treatment to a portion where the liquid crystal is to be formed, and after the liquid repellent treatment step, a liquid material is ejected by an ink jet method into an area partitioned by the bank to form the transflective layer A translucent reflective layer forming step, and a colored layer forming step of forming a colored layer in a region partitioned by the bank after the transflective layer forming step.
[0007]
According to this method, after the bank is formed on the substrate, the liquid material for forming the transflective layer is discharged by the ink jet method in the region partitioned by the bank, so that the bank is discharged onto the substrate. It plays the role of a bank that regulates the spread of the liquid material, and the transflective layer can be formed only in the area surrounded by the bank, and the shape accuracy is also good.
Conventionally, since the transflective layer is formed by the inkjet method, which requires complicated work and large-scale equipment such as a film forming process and an etching process by a sputtering method or a vacuum evaporation method, the productivity is improved and Cost reduction can be achieved.
Further, prior to the step of discharging the liquid material for forming the transflective layer in the area surrounded by the bank, a part of the substrate in the area surrounded by the bank is subjected to a liquid repellent treatment, so that the liquid material was discharged. The liquid material forms a coating film in a region excluding a portion subjected to the liquid repellent treatment. Accordingly, no coating film is formed on the liquid-repellent-treated region, so that the opening of the semi-transmissive reflective layer can be easily formed in this portion.
Further, since the colored layer is formed in the bank after the semi-transmissive reflective layer is formed in the bank, the bank plays a role of preventing the adjacent colored layers from being mixed with each other. As a result, a color filter substrate having a structure in which a colored layer is laminated on the transflective layer in the region surrounded by the bank and the colored layer is laminated on the substrate at the opening of the transflective layer is obtained.
[0008]
The method of the present invention preferably includes a lyophilic treatment step of performing a lyophilic treatment on the liquid-repellent treated portion after the transflective layer forming step and before the colored layer forming step.
According to this method, when the colored layer is formed in the region surrounded by the bank, the affinity between the substrate surface and the colored layer forming material at the portion to be the opening is improved, so that the adhesion with the substrate is improved. A good colored layer is obtained.
[0009]
In the present invention, the colored layer forming step includes a step of introducing a colored layer forming material made of an ultraviolet curable resin composition into a region partitioned by the bank, and irradiating the region with ultraviolet rays, It is good also as a structure which has the process of carrying out the lyophilic process of the said liquid-repellent-treated site | part in this area | region simultaneously with hardening a colored layer forming material.
According to such a configuration, since the lyophilic treatment can be performed in the step of curing the colored layer, the lyophilic treatment can be performed without increasing the number of steps.
[0010]
In the present invention, it is preferable that the colored layer forming step is performed by a method in which a liquid colored layer forming material is discharged by an ink jet method into a region partitioned by the bank.
If such a method is used, not only the transflective layer forming step but also the subsequent colored layer forming step is performed by the ink jet method, so that a large-scale apparatus and complicated work are not required, and further improvement in productivity and low Cost can be reduced.
[0011]
In the present invention, the liquid material forming the transflective layer may contain a light scattering material.
According to such a configuration, a transflective layer containing a light scattering material can be formed, and the effect of scattering the reflected light from the transflective layer can be obtained without performing a frosting process on the substrate. Therefore, a color filter substrate with good reflective display characteristics can be obtained with a simple manufacturing process.
[0012]
The color filter substrate of the present invention is a color filter substrate in which a color filter in which a colored layer composed of a plurality of color elements is formed in a matrix is formed on the substrate, each provided on the substrate, A bank for partitioning each colored layer; a transflective layer having an opening formed in a region surrounded by the bank; and a colored layer formed to cover the transflective layer. Features.
In the color filter substrate having such a configuration, since the transflective layer is provided only in the region surrounded by the bank for partitioning each colored layer, the light in the region where the colored layer is not formed is provided. The contrast of reflected light is good.
[0013]
Alternatively, the color filter substrate of the present invention is a color filter substrate in which a color filter in which a colored layer composed of a plurality of color elements is formed in a matrix is formed on the substrate, and is provided on the substrate. A bank for partitioning each colored layer, a transflective layer having an opening formed in a region surrounded by the bank, and a colored layer formed so as to cover the transflective layer. In addition, a light scattering material is contained in the transflective layer.
In the color filter substrate having such a configuration, since the transflective layer is provided only in the region surrounded by the bank for partitioning each colored layer, the light in the region where the colored layer is not formed is provided. In addition, the contrast of reflected light is good and the scattering characteristics of the transflective layer are excellent, so that reflection on the reflecting surface is prevented and a good display can be obtained.
[0014]
In the liquid crystal device of the present invention, a liquid crystal is sandwiched between a color filter substrate in which a color filter in which a colored layer composed of a plurality of color elements is formed in a matrix is formed on a substrate, and a counter substrate. A liquid crystal device, the bank for partitioning each colored layer provided on the substrate, a transflective layer having an opening formed in a region surrounded by the bank, and the transflective It has the said colored layer formed so that a reflection layer might be covered.
According to the liquid crystal device having such a configuration, since the transflective layer is provided only in the region surrounded by the bank for partitioning each colored layer in the color filter substrate, the region where the colored layer is not formed. There is no reflection of light at the light source, and the contrast of the reflected light is good. Therefore, a liquid crystal device having excellent display characteristics can be obtained.
[0015]
Alternatively, in the liquid crystal device of the present invention, the liquid crystal is sandwiched between a counter substrate and a color filter substrate in which a color filter in which a colored layer composed of a plurality of color elements is formed in a matrix is formed on the substrate. A bank for partitioning each colored layer provided on the substrate, a transflective layer having an opening formed in a region surrounded by the bank, It has the said colored layer formed so that a semi-transmissive reflective layer may be covered, The light-scattering material contains in the said semi-transmissive reflective layer, It is characterized by the above-mentioned.
According to the liquid crystal device having such a configuration, since the transflective layer is provided only in the region surrounded by the bank for partitioning each colored layer in the color filter substrate, the region where the colored layer is not formed. The reflection of the reflected light is good, the contrast of the reflected light is good, and the scattering property of the transflective layer is excellent, so that reflection on the reflecting surface is prevented. Therefore, a liquid crystal device having excellent display characteristics can be obtained.
[0016]
The liquid crystal device of the present invention may be configured such that a pixel electrode corresponding to each colored layer and an active element connected to the pixel electrode are formed on the counter substrate.
In the liquid crystal device of the present invention, a transparent electrode may be formed on the colored layer.
An electronic apparatus according to the present invention includes the liquid crystal display device according to the present invention.
[0017]
DETAILED DESCRIPTION OF THE INVENTION
(First embodiment)
A first embodiment according to the present invention will be described below with reference to FIGS. 1A and 1B show a color filter substrate of this embodiment, where FIG. 1A is a plan view and FIG. 1B is a schematic cross-sectional view of one pixel. The color filter substrate 10 includes a color filter including a colored layer 15 arranged in a matrix on a substrate 11 and a partition 14 formed at the boundary between the colored layers. The colored layer 15 is made of any color element of R (red), G (green), and B (blue), and the partition 14 is a black matrix 12 made of a light shielding layer and a bank formed thereon. It consists of thirteen. The region surrounded by the partition 14 forms individual pixels, and a transflective layer 21 is formed on the substrate 11 in each pixel.
Moreover, although not shown in figure, the protective film etc. which cover these collectively are provided in the upper surface of the partition 14 and the colored layer 15 as needed.
In the example of FIG. 1, the arrangement of R, G, and B in the color filter is a stripe arrangement, but other arrangements may be used. For example, a mosaic arrangement as shown in FIG. 2A or a delta arrangement as shown in FIG.
[0018]
The transflective layer 21 is provided with an opening 21a for light transmission. The planar shape of the opening 21a is not particularly limited. For example, as shown in FIG. 3A, a long strip-shaped opening 21a may be provided at the center of one pixel, as shown in FIG. Two short strip-shaped openings 21a may be provided in the diagonal part of one pixel, and as shown in FIG. 3C, a circular opening 21a may be provided in the center of one pixel. .
The size of the opening 21a changes the reflectivity and transmissivity in the transflective layer 21, but in order to perform both the reflective and transmissive displays satisfactorily, the area of one pixel The area of the opening 21a is preferably about 10 to 25%.
[0019]
FIG. 4 is a schematic perspective view showing an example of an ink jet apparatus suitably used for manufacturing the color filter substrate 10 of the present embodiment.
The apparatus 100 in this example includes an inkjet head group 1, an X direction drive shaft 4, a Y direction guide shaft 5, a control device 6, a mounting table 7, a cleaning mechanism unit 8, and a base 9.
The mounting table 7 is configured to be movable on the Y-direction guide shaft 5 and includes a mechanism for fixing the substrate 11 to which the liquid material is applied at a reference position.
The inkjet head group 1 is provided with a plurality of inkjet heads provided with nozzles (ejection ports) that eject a liquid material toward the substrate 11 on the mounting table 7.
[0020]
An X-direction drive motor 2 is connected to the X-direction drive shaft 4. The X direction drive motor 2 is a stepping motor or the like, and rotates the X direction drive shaft 4 when a drive signal in the X axis direction is supplied from the control device 6. When the X-direction drive shaft 4 rotates, the inkjet head group 1 moves in the X-axis direction.
The Y direction guide shaft 5 is fixed so as not to move with respect to the base 9, and the mounting table 7 on the Y direction guide shaft 5 is connected to the Y direction drive motor 3. The Y-direction drive motor 3 is a stepping motor or the like, and moves the mounting table 7 in the Y-axis direction when a drive signal in the Y-axis direction is supplied from the control device 6.
The control circuit 6 supplies a voltage for ink droplet ejection control to each inkjet head provided in the inkjet head group 1. Further, a drive pulse signal (drive signal in the X-axis direction) for controlling the movement of the inkjet head group 1 in the X-axis direction is supplied to the X-direction drive motor 2, and the Y-direction drive motor 3 is also supplied. A drive pulse signal (a drive signal in the Y-axis direction) for controlling the movement of the mounting table 7 in the Y-axis direction is supplied.
[0021]
The cleaning mechanism unit 8 includes a mechanism for cleaning the inkjet head group 1. The cleaning mechanism unit 8 is connected to a drive motor (not shown), and is configured to move along the Y-direction guide shaft 5 by driving the drive motor. The movement of the cleaning mechanism 8 is also controlled by the control device 6.
[0022]
FIGS. 5A to 5F are schematic cross-sectional views illustrating a method for manufacturing the color filter substrate 10 of the present embodiment in the order of steps. In these figures, one pixel is shown. First, as shown in FIG. 5A, a black matrix 12 is formed on a substrate 11.
As the substrate 11, a glass substrate is generally used, but materials other than glass can be used as long as they have characteristics such as transparency and mechanical strength required for use as a color filter substrate.
[0023]
The black matrix 12 is formed of metal chromium, a laminate of metal chromium and chromium oxide, or resin black. To form the black matrix 12 made of a metal thin film, a sputtering method or a vapor deposition method can be used. Further, to form the black matrix 12 made of a resin thin film, a gravure printing method, a photoresist method, a thermal transfer method, or the like can be used. The film thickness of the black matrix 12 made of a metal thin film is about 0.1 to 0.2 μm.
[0024]
Subsequently, a bank 13 is formed on the black matrix 12.
That is, as shown in FIG. 5B, a resist layer 17 made of a negative transparent photosensitive resin composition is formed so as to cover the substrate base material 11 and the black matrix 12, and a matrix pattern is formed on the upper surface thereof. Exposure processing is performed in a state where the mask film 18 formed in the shape is in close contact. Then, as shown in FIG. 5C, the resist layer 17 is patterned by etching an unexposed portion of the resist layer 17 to form a bank 13. The height of the bank 13 is about 2.5 to 2.8 μm.
This bank 13 and the black matrix 12 therebelow serve as a partition 14 that plays a role of regulating the spread of the liquid material when the liquid material is introduced into the pixels in the subsequent process.
[0025]
When a resin material having a coating film surface that is liquid repellent is used as a material for forming the bank 13, the liquid material is discharged into the pixels surrounded by the bank 13 by an inkjet method in the subsequent process. The droplet landing position accuracy is improved, which is preferable. When the bank 13 is made of a liquid repellent material, it is preferable to make the surface of the bank 13 lyophilic after forming the colored layer 15 and before forming a protective film or the like on the upper surface of the bank 13.
For example, the liquid-repellent bank 13 is formed using a fluorine-based resin material, a liquid material for forming the colored layer 15 is introduced into the pixel, and then the bank 13 is irradiated with ultraviolet rays, whereby the surface of the bank 13 is Can be lyophilic.
[0026]
Next, as shown in FIG. 5 (d), a liquid repellent portion 19 is formed by applying a liquid repellent treatment to the region surrounded by the partition 14, that is, within the pixel, where the opening 21 is to be formed. To do.
The liquid repellent treatment can be performed using, for example, the following plasma polymerization method. In the liquid repellent treatment by plasma polymerization, first, a raw material liquid for the liquid repellent treatment is prepared. As a liquid material for liquid repellent treatment, C Four F Ten Or C 8 F 16 A liquid organic material composed of linear PFC such as is preferably used.
Then, the vapor of the liquid material for liquid repellent treatment is turned into plasma in the plasma processing apparatus. When the linear PFC vapor is converted into plasma in this way, the bonds of the linear PFC are partially broken and activated. When the activated PFC reaches the surface of the substrate 11, the PFCs are polymerized on the substrate 11 to form a fluororesin polymer film having liquid repellency.
Here, since it is difficult to maintain discharge with a PFC having a large molecular weight, it is possible to easily maintain discharge by adding a rare gas such as Ar. Further, when the raw material liquid for the liquid repellent treatment is fluorocarbon, PFC having a molecular weight smaller than that of the raw material liquid, for example, CF Four Etc. can also be added. Activated CF Four Is added, even when a part of the fluorocarbon fluorine, which is the raw material liquid, is released when the raw material is turned into plasma, active fluorine is taken into the polymer film, so that the liquid repellency of the polymer film can be improved. . Preferably, a fluorinated polymer film is formed by combining a plurality of these.
For example, if the discharge gas flow rate is C 8 F 18 20ccm, CF Four Is preferably 120 to 130 ccm, and Ar is preferably 150 ccm.
[0027]
In the present embodiment, the liquid repellent portion 19 is formed only at a portion where the opening 21 in the pixel is formed. For this purpose, it is preferable to perform the above-described liquid repellency treatment using a mask having a transmission portion corresponding to a portion where the opening 21 is formed.
Alternatively, since the fluororesin polymer film obtained by the above liquid repellent treatment becomes lyophilic by being decomposed and removed by irradiation with ultraviolet rays, the above liquid repellent treatment is applied to the entire surface of the substrate 11 in the pixel. Thereafter, the liquid repellent part 19 can be formed only in the part where the opening 21 is formed by performing ultraviolet irradiation through a mask having a shielding part corresponding to the part where the opening 21 is formed.
[0028]
Next, as shown in FIG. 5E, the transflective layer 21 is formed in the region surrounded by the partition 14, that is, in the pixel by using the ink jet method.
The transflective layer 21 is made of silver, aluminum, an aluminum alloy, a silver alloy, APC (silver-palladium-copper alloy), or the like. Specifically, as a liquid material for forming the transflective layer 21, a dispersion in which ultrafine metal particles constituting the transflective layer 21 are dispersed in a solvent is used, and this dispersion is configured as shown in FIG. It discharges in a pixel using an inkjet apparatus. As the ink jet head, it is preferable to use a precision head to which the piezoelectric effect is applied. The liquid material discharged into the pixel spreads in a region other than the liquid repellent part 19, and a coating film having an opening is formed on the liquid repellent part 19.
After drying this coating film, the semi-transmissive reflective layer 21 having the opening 21a is formed by firing.
[0029]
Next, as shown in FIG. 5F, the colored layer 15 is formed in the region surrounded by the partition 14, that is, in the pixel in which the semi-transmissive reflective layer 21 is formed. Specifically, the colored layer 15 is formed by ejecting a liquid colored layer forming material (ink) into the pixel and drying and / or curing it using the inkjet apparatus having the configuration shown in FIG.
The colored layers 15 of the three colors R, G, and B may be formed in order for each color element, or the three colors of ink may be ejected simultaneously to form a predetermined color arrangement pattern according to a preset program. Good. The thickness of the colored layer 15 on the transflective layer 21 is about 0.8 to 1.2 μm.
[0030]
The colored layer forming material (ink) preferably has a viscosity of 2 to 20 mPa · s, a contact angle with the nozzle plate surrounding the nozzle holes of more than 50 °, and a surface tension of 20 to 40 mN / m. If the viscosity of the ink is too high, the supply of the next ink after the ink has been ejected may not be in time, and ejection failure may occur. is there. If the contact angle of the ink to the nozzle plate is too low, the nozzle plate gets wet with ink, and when the ink droplet is ejected, the ink droplet is attracted to the ink attached to the nozzle plate and ejected to the correct position. There is a risk that it will not be. If the surface tension of the ink is too large or too small, stable meniscus control due to vibration of the piezoelectric element cannot be performed.
As the colored layer forming material (ink), for example, an acrylic resin color paste, an aqueous melamine color paste, an acrylate composition, or the like can be used.
[0031]
According to this embodiment, since the transflective layer is formed in the pixels partitioned by the bank 13, a color filter substrate having no reflective film between the pixels can be obtained. In addition, since the liquid repellent treatment is performed on the portion where the opening 21a is formed, a coating film having an opening can be formed simply by discharging the liquid material forming the transflective layer in the pixel. Therefore, the transflective layer 21 having the opening 21a can be easily formed by curing the coating film.
Further, since the colored layer is formed in the pixels partitioned by the bank 13, it is possible to easily form a colored layer in which adjacent colored layers are not mixed.
Further, since the formation of the transflective layer 21 and the formation of the colored layer 15 are both performed by the ink jet method, a large-scale apparatus and complicated work are not required, and the cost can be reduced.
The liquid material for forming the colored layer 15 is discharged in a relatively large amount so that the upper surface of the transflective layer 21 in the pixel is completely filled. It is formed.
[0032]
(Second Embodiment)
FIG. 6 shows a second embodiment of the color filter substrate of the present invention and is a schematic sectional view of one pixel.
The color filter substrate 20 of this embodiment is different from that of the first embodiment in that a light scattering material 22 is contained in the transflective layer 21. In FIG. 6, the same components as those in FIG. 1 are denoted by the same reference numerals, and the description thereof is simplified.
[0033]
The color filter substrate 20 of the present embodiment includes pixels arranged in a matrix on the substrate 11, and the boundary between the pixels is a black matrix 12 formed of a light shielding layer and a bank formed thereon. 13 is divided by a partition 14 composed of 13. A transflective layer 21 having an opening 21a is formed in each pixel, and a colored layer 15 made of any of R (red), G (green), and B (blue) ink is formed thereon. Is formed. The arrangement of R, G, and B may be a so-called mosaic arrangement, or other arrangement such as a stripe arrangement or a delta arrangement.
Moreover, although not shown in figure, the protective film etc. which cover these collectively are provided in the upper surface of the partition 14 and the colored layer 15 as needed.
[0034]
The light scattering material 22 contained in the transflective layer 21 gives unevenness to the surface shape of the transflective layer 21 to improve the light scattering characteristics. Specifically, beads 22 made of spherical alumina, silica, titania or the like are preferably used.
[0035]
In the color filter substrate 20 of the present embodiment, in the method for manufacturing the color filter substrate 10 of the first embodiment, the light dispersion material 22 is dispersed in advance in the liquid material forming the transflective layer 21. The dispersion can be produced in the same manner except that it is discharged from the inkjet head.
If the particle size of the beads 22 is too large or the content of the beads 22 is too large with respect to the nozzle diameter of the ink jet head, there is a risk that ejection failure may occur. It is preferable to use an ink jet head having an inner diameter of about 25 to 100 μm. Further, if the content of the beads 22 in the liquid material forming the transflective layer 21 is too small, a sufficient scattering effect cannot be obtained, and therefore it is preferably about 5 to 20% by volume.
[0036]
According to the present embodiment, the same operational effects as those of the first embodiment can be obtained, and since the light-transmitting material 22 is contained in the transflective layer 21, the light scattering characteristics in the transflective layer 21 are improved. It has improved. Therefore, it is possible to prevent the reflection of a regular reflection image on the transflective layer without performing a conventional substrate frosting process, and the reflective display characteristics are improved when used in a liquid crystal device. A color filter substrate is obtained.
[0037]
(Third embodiment)
This embodiment is different from the first and second embodiments in that a lyophilic process is performed between the step of forming the semi-transmissive reflective layer 21 and the step of forming the colored layer 15.
That is, in the present embodiment, as in the first embodiment or the second embodiment, the black matrix 12, the bank 13, and the liquid repellent portion 19 are formed on the substrate 11, and the transflective layer 21 is formed. Thereafter, a lyophilic process is performed to make the lyophobic portion 19 lyophilic. This lyophilic treatment is performed at least on the portion subjected to the liquid repellency treatment in the previous step, that is, the lyophobic portion 19, but the upper surface of the transflective layer 21 may be lyophilic by this treatment. However, it is not preferable to make the upper surface of the bank 13 lyophilic before the colored layer 15 is formed.
[0038]
For example, in the case where the liquid repellent portion 19 is made of a fluororesin polymer film, the polymer film is decomposed by irradiating it with ultraviolet rays. In addition, the ultraviolet ray has an action of not only decomposing the fluororesin polymer film but also decomposing organic substances adhering to the irradiated surface, so that the lyophilicity is improved by this cleaning action. Therefore, it is preferable to irradiate the upper surface of the transflective layer 21 simultaneously with the liquid repellent portion 19 with ultraviolet rays. When the bank 13 is made of a fluorine compound, it is preferable to prevent the bank 13 from being irradiated with ultraviolet rays by using a mask or the like.
[0039]
The lyophilic treatment can be performed not only by treatment with ultraviolet irradiation but also by a method of treating with activated oxygen gas or ozone gas. Alternatively, a method of treating with an alkaline solvent is also possible.
In any method, at least the liquid repellent part 19 is made lyophilic, preferably the liquid repellent part 19 and the upper surface of the transflective layer 21 are made lyophobic, and the upper surface of the bank 13 is not made lyophilic. In addition, it is preferable to perform the treatment using a mask or the like as appropriate.
Then, after performing the lyophilic treatment, the colored layer 15 is formed in the region surrounded by the partition 14, that is, in the pixel in the same manner as in the first embodiment or the second embodiment. The filter substrate 10 (20) is obtained.
[0040]
According to the present embodiment, the liquid repellent portion 19 in the pixel is made lyophilic, particularly when the liquid coloring layer forming material is discharged into the pixel, so that it is on the transflective layer 21 and in the opening 21a. A coating film is quickly formed, and a colored layer 15 having good adhesion to the lower layer is obtained.
[0041]
(Fourth embodiment)
Further, even if a new lyophilic treatment step is not provided as in the third embodiment, the ultraviolet curable resin composition is used as the colored layer forming material (ink) in the manufacturing methods of the first and second embodiments. If an ink made of a material is used, it is possible to make the lyophobic portion 19 lyophilic at the same time as irradiating ultraviolet rays to cure the colored layer.
That is, in this embodiment, as in the first embodiment or the second embodiment, the black matrix 12 and the bank 13 are formed on the substrate 11, the liquid repellent portion 19 is formed, and then the transflective layer is formed. 21 is formed.
Next, a colored layer forming material made of an ultraviolet curable resin composition is ejected by an inkjet method into the pixel on which the semi-transmissive reflective layer 21 is formed, and then irradiated with ultraviolet rays.
The lyophobic portion 19 is made lyophilic by this ultraviolet irradiation, and at the same time, the colored layer forming material discharged into the pixel is cured to form the colored layer 15. It is more effective to irradiate ultraviolet rays from both sides of the substrate 11.
[0042]
In the present embodiment, an acrylate composition or the like can be used as the ultraviolet curable resin composition for forming the colored layer 15.
In the present embodiment, since the ultraviolet ray is irradiated after the forming material of the colored layer 15 is discharged, it is preferable that the upper surface of the bank 13 is irradiated with the ultraviolet ray at the same time as the colored layer 15 is cured to make it lyophilic. In this way, when forming a protective film or the like that covers the colored layer 15 and the bank 13, the affinity between the protective film and the upper surface of the bank 15 is improved.
[0043]
According to the present embodiment, since the liquid repellent part 19 is made lyophilic particularly during the curing of the colored layer forming material discharged onto the liquid repellent part 19, this allows coloring with good adhesion to the lower layer. Layer 15 is obtained.
[0044]
FIG. 7 shows a first example in which a liquid crystal device is configured by using the color filter substrate 10 of the first embodiment, and is a cross-sectional view showing a schematic configuration of a passive matrix liquid crystal device (liquid crystal device). FIG. By attaching auxiliary elements such as a liquid crystal driving IC and a support to the liquid crystal device 200 of this example, a transflective liquid crystal device as a final product can be obtained.
[0045]
The liquid crystal device 200 includes the color filter substrate 10 described in the first embodiment, and the color filter substrate 10 is disposed below the liquid crystal composition layer 203 (on the backlight 212 side). In the present embodiment, the color filter substrate 10 will be briefly described.
The liquid crystal device 200 of this example is schematically configured by sandwiching a liquid crystal composition layer 203 made of STN (Super Twisted Nematic) liquid crystal composition or the like between a color filter substrate 10 and a counter substrate 201 made of a glass substrate or the like. Yes.
The color filter substrate 10 includes a substrate 11, a partition 14 composed of a black matrix 12 and a bank 13, a transflective layer 21 having an opening 21a, and colored layers 15r, 15g, and 15b. A protective film 16 is formed so as to cover it.
[0046]
On the protective film 16 of the color filter substrate 10 (the liquid crystal composition layer 203 side), a plurality of first electrodes 206 are formed in stripes at predetermined intervals, and the upper surface thereof (the liquid crystal composition layer 203 side) An alignment film 209 is formed so as to cover the surface.
On the other hand, a plurality of second electrodes 205 extending in a direction orthogonal to the first electrode 206 on the color filter substrate 10 side are provided in a stripe shape on the surface of the counter substrate 201 facing the color filter substrate 10. An alignment film 207 is formed so as to cover the upper surface (the liquid crystal composition layer 203 side) of the layers. A portion where the first electrode 206 and the second electrode 205 intersect with each other is a pixel, and the colored layers 15r, 15g, and 15b of the color filter substrate 10 are located in the portion that becomes the pixel.
In addition, a polarizing plate 211 a is provided on the outer surface side (viewing side) of the counter substrate 201. A polarizing plate 211b is also provided on the outer surface side of the color filter substrate 10, and a backlight 212 is further provided on the outer side thereof.
Reference numeral 204 denotes a spacer for keeping the distance between the substrates (referred to as a cell gap) constant within the substrate surface, and reference numeral 210 denotes a sealing material for holding the liquid crystal composition between the substrates.
The first electrode 206 and the second electrode 205 are formed by forming a transparent conductive material such as ITO (Indium Tin Oxide) in a stripe shape in plan view.
[0047]
In the liquid crystal device 200 having such a configuration, the reflective liquid crystal display is performed using the reflected light from the transflective layer 21 of the color filter substrate 10 in a bright place, and the backlight 212 is turned on in a dark place. A transmissive liquid crystal display can be performed by using the transmitted light of the transflective layer 21.
In the liquid crystal device 200 of the present embodiment, the step of forming the transflective layer of the color filter substrate 10 and the step of forming the colored layer can be performed by an ink jet method. The cost can be reduced without requiring complicated work.
Further, according to the liquid crystal device 200 of the present embodiment, the transflective layer 21 is provided only in the pixel in the color filter substrate 10 and a bank is formed between adjacent pixels. There is no reflection of light in areas other than the above, and the contrast when performing a reflective liquid crystal display is good.
[0048]
FIG. 8 shows a second example in which a liquid crystal device is configured using the color filter substrate 10 of the first embodiment, and is an exploded perspective view showing a schematic configuration of a TFT type (Thin Film Transistor type) liquid crystal device. FIG. The liquid crystal device 300 of this example includes a liquid crystal driving IC, a support, a backlight,. A semi-transmission reflection type liquid crystal device as a final product is obtained by attaching the incidental elements such as.
The liquid crystal device 300 includes the color filter substrate 10 described in the first embodiment, and the color filter substrate 10 is disposed on the lower side (backlight side) of the liquid crystal composition layer. In the present embodiment, the description of the color filter substrate 10 is simplified.
[0049]
The liquid crystal device 300 of this embodiment is mainly composed of a color filter substrate 10, a counter substrate 314 disposed so as to face the color filter substrate 10, and a liquid crystal composition layer (not shown) sandwiched therebetween. .
Although not shown, a polarizing plate 316 is laid on the lower surface side (the side opposite to the liquid crystal layer composition side) of the color filter substrate 10, and a backlight is provided below the polarizing plate 316. Further, a polarizing plate (not shown) is provided on the upper surface side (observer side) of the counter substrate 314.
[0050]
The color filter substrate 10 includes a substrate 11, a partition 14 composed of a black matrix 12 and a bank 13, and colored layers 15 r, 15 g, and 15 b, and a protective film 16 is formed so as to cover the upper surfaces thereof.
An electrode 318 for driving liquid crystal is formed on the protective film 16 (liquid crystal composition layer side) of the color filter substrate 10. The electrode 318 is made of a transparent conductive material such as ITO (Indium Tin Oxide), and is a full surface electrode that covers the entire region where a pixel electrode 332 described later is formed. An alignment film 319 is provided on the liquid crystal composition layer side so as to cover the electrode 318.
[0051]
On the other hand, an insulating layer 325 is formed over the counter substrate 314, and a TFT type switching element and a pixel electrode 332 are formed over the insulating film 325. In an actual liquid crystal device, an alignment film is provided on the pixel electrode 332, which is omitted in this figure.
A thin film transistor T (TFT) as a switching element has a scanning line 351... And a signal line 352... Formed in a matrix on an insulating layer 325 formed on a counter substrate 314, and these scanning lines 351. 352... Is provided in each region surrounded by 352..., And a source electrode, a drain electrode, a semiconductor, and a gate electrode are provided at a corner portion of each pixel electrode 332 and a portion between the scanning line 351 and the signal line 352. A thin film transistor T including The thin film transistor T is turned on / off by application of signals to the scanning line 351 and the signal line 352 so that energization control to the pixel electrode 332 can be performed.
[0052]
According to the liquid crystal device 300 having such a configuration, the reflective liquid crystal display is performed using the reflected light from the transflective layer 21 of the color filter substrate 10 in a bright place, and the backlight is turned on in a dark place. A transmissive liquid crystal display can be performed using the light transmitted through the transmissive reflective layer 21.
Since the liquid crystal device 300 of this embodiment can perform the process of forming the transflective layer of the color filter substrate 10 and the process of forming the colored layer by an ink jet method, it is a large-scale device for manufacturing the color filter substrate. The cost can be reduced without requiring complicated work.
Further, according to the liquid crystal device 300 of the present embodiment, the transflective layer 21 is provided only in the pixel in the color filter substrate 10 and the bank is formed between the adjacent pixels. There is no reflection of light in areas other than the above, and the contrast when performing a reflective liquid crystal display is good.
[0053]
FIG. 9 shows a third example in which a liquid crystal device is configured using the color filter substrate 10 of the first embodiment, and is an exploded perspective view showing a schematic configuration of a TFD type (Thin Film Diode type) liquid crystal device. FIG. By attaching accessory elements such as a liquid crystal driving IC, a support, and a backlight to the liquid crystal device 400 of this example, a transflective liquid crystal device as a final product can be obtained.
The liquid crystal device 400 includes the color filter substrate 10 described in the first embodiment, and the color filter substrate 10 is disposed on the lower side (backlight side) of the liquid crystal composition layer. In the present embodiment, the description of the color filter substrate 10 is simplified.
[0054]
The liquid crystal device 400 of this embodiment is mainly composed of the color filter substrate 10, a counter substrate 430 disposed so as to oppose the color filter substrate 10, and a liquid crystal composition layer (not shown) sandwiched therebetween. .
A polarizing plate 416 is laid on the lower surface side (the side opposite to the liquid crystal layer composition side) of the color filter substrate 10, and a backlight (not shown) is provided below the polarizing plate 416. In addition, a polarizing plate (not shown) is provided on the upper surface side (observer side) of the counter substrate 430.
The color filter substrate 10 has the configuration shown in FIG. 1B, and includes a substrate 11, a partition made of a black matrix and a bank (not shown), a transflective layer (not shown) provided with an opening 21a, and Colored layers 15r, 15g, and 15b are provided, and a protective film 16 is formed so as to cover the upper surfaces thereof.
Striped electrodes 418 are formed on the protective film 16 (the liquid crystal composition layer side) of the color filter substrate 10. The electrode 418 is made of a transparent conductive material such as ITO (Indium Tin Oxide). Further, an alignment film 419 is provided on the liquid crystal composition layer side so as to cover the electrode 418.
[0055]
On the other hand, an insulating layer (not shown) is formed on the counter substrate 430 on the liquid crystal composition layer side, and a TFD type switching element and a pixel electrode described below are formed on the insulating film. . That is, on the insulating film, the data lines 434... Are aligned at a predetermined interval in a direction orthogonal to the stripe-shaped electrodes 418 on the color filter substrate 10, and the data lines 434. A plurality of pixel electrodes 432 made of a transparent conductive material such as ITO are formed through a two-terminal nonlinear element 436 so as to be aligned with the stripe-shaped electrode 418.
The colored layers 15 r, 15 g, and 15 b of the color filter substrate 10 are disposed at positions corresponding to the pixel electrodes 432.
[0056]
According to the liquid crystal device 400 having such a configuration, the reflective liquid crystal display is performed using the reflected light from the transflective layer of the color filter substrate 10 in a bright place, and the backlight is turned on in the dark place to make the transflective. A transmissive liquid crystal display can be performed using transmitted light transmitted through the opening 21a of the reflective layer.
Since the liquid crystal device 400 of this embodiment can perform the process of forming the transflective layer of the color filter substrate 10 and the process of forming the colored layer by an ink jet method, it is a large-scale device for manufacturing the color filter substrate. The cost can be reduced without requiring complicated work.
Further, according to the liquid crystal device 400 of the present embodiment, the transflective layer is provided only in the pixel in the color filter substrate 10 and a bank is formed between adjacent pixels. There is no reflection of light in this area, and the contrast when performing a reflective liquid crystal display is good.
[0057]
In the liquid crystal devices 200, 300, and 400 of the above examples, the color filter substrate 20 of the second embodiment or the color filter substrate of the third or fourth embodiment is used instead of the color filter substrate 10. However, the liquid crystal device can be configured in the same manner.
In particular, when the color filter substrate 20 of the second embodiment is used, the light scattering material 22 is dispersed in the transflective layer 21 and has excellent light scattering characteristics. Therefore, it is possible to obtain a good display without reflection and the like.
[0058]
Next, an embodiment of the electronic device of the present invention will be described.
FIG. 10A is a perspective view showing an example of a mobile phone. Reference numeral 600 denotes a mobile phone main body, and reference numeral 601 denotes a liquid crystal display unit.
FIG. 10B is a perspective view illustrating an example of a portable information processing apparatus such as a word processor or a personal computer. Reference numeral 700 denotes an information processing apparatus, reference numeral 701 denotes an input unit such as a keyboard, reference numeral 703 denotes an information processing apparatus body, and reference numeral 702 denotes a liquid crystal display unit.
FIG. 10C is a perspective view illustrating an example of a wristwatch type electronic device. Reference numeral 800 denotes a watch body, and reference numeral 801 denotes a liquid crystal display unit.
In these electronic devices, the liquid crystal display units 601, 702, and 801 are configured by using a liquid crystal device including any one of the color filter substrates of the first to fourth embodiments.
[0059]
【The invention's effect】
As described above, according to the present invention, conventionally, semi-transmission has been formed through complicated processes and processes that require a large-scale apparatus such as a film forming process and an etching process by a sputtering method or a vacuum evaporation method. The reflective layer can be formed by a simple process using an inkjet method. Therefore, a transflective color filter substrate can be manufactured in a short time and at a low cost.
Also, it is preferable to perform not only the transflective layer of the color filter substrate but also the colored layer using an ink jet method, thereby improving the productivity of the transflective color filter substrate and reducing the manufacturing cost. can do.
[Brief description of the drawings]
1A and 1B show a color filter substrate according to a first embodiment of the present invention, in which FIG. 1A is a plan view and FIG. 1B is a cross-sectional view taken along line bb in FIG.
FIG. 2 is a plan view showing an example of an arrangement of colored layers in a color filter substrate according to the present invention.
FIG. 3 is a plan view showing an example of a transflective layer in a color filter substrate according to the present invention.
FIG. 4 is a perspective view showing a schematic configuration of an example of an ink jet apparatus suitably used in the method for manufacturing a color filter substrate according to the present invention.
FIGS. 5A to 5F are schematic cross-sectional views illustrating a method of manufacturing the color filter substrate of the first embodiment in the order of steps.
FIG. 6 is a cross-sectional view of a main part showing a second embodiment of a color filter substrate according to the present invention.
FIG. 7 is a cross-sectional view of main parts showing an example of a liquid crystal device according to the present invention.
FIG. 8 is an exploded perspective view showing another example of the liquid crystal device according to the present invention.
FIG. 9 is an exploded perspective view showing another example of the liquid crystal device according to the present invention.
FIGS. 10A and 10B show an example of an electronic apparatus according to the present invention, in which FIG. 10A is a perspective view of a mobile phone, FIG. 10B is a perspective view of a portable information processing apparatus, and FIG. It is a perspective view of an electronic device.
[Explanation of symbols]
10, 20 ... Color filter substrate
11 ... Board
13 ... Bank
15, 15r, 15g, 15b ... colored layer
19 ... Liquid repellent part
21 ... Transflective layer
21a ... opening
22 ... Light scattering material
200, 300, 400 ... Liquid crystal device
201, 314, 430 ... counter substrate
203 ... Liquid crystal composition layer

Claims (4)

  1. A color filter substrate manufacturing method for manufacturing a color filter substrate comprising a transflective layer having an opening for light transmission on a substrate and a colored layer comprising a plurality of color elements,
    Forming a bank for partitioning each colored layer on the substrate;
    A liquid repellent treatment step in which a liquid repellent treatment is performed in a region partitioned by the bank and the opening is formed;
    After the liquid repellent treatment step, a transflective layer forming step of forming a transflective layer by discharging a liquid material by an ink jet method in an area partitioned by the bank;
    A lyophilic treatment step of applying a lyophilic treatment to the liquid-repellent treated portion;
    And a colored layer forming step of forming a colored layer in a region partitioned by the bank.
  2.   The colored layer forming step includes introducing a colored layer forming material made of an ultraviolet curable resin composition into a region partitioned by the bank, and irradiating the region with ultraviolet rays, thereby forming the colored layer forming material. The method for producing a color filter substrate according to claim 1, further comprising a step of lyophilic treatment of the liquid-repellent-treated portion in the region simultaneously with curing.
  3.   The color filter substrate according to claim 1, wherein the colored layer forming step includes a step of discharging a liquid colored layer forming material into an area partitioned by the bank by an ink jet method. Manufacturing method.
  4.   4. The method of manufacturing a color filter substrate according to claim 1, wherein the liquid material forming the transflective layer contains a light scattering material.
JP2001320001A 2001-10-17 2001-10-17 Manufacturing method of color filter substrate Expired - Fee Related JP3952729B2 (en)

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JP3882794B2 (en) 2002-08-07 2007-02-21 セイコーエプソン株式会社 Color filter substrate, electro-optical device, electronic device, color filter substrate manufacturing method, and electro-optical device manufacturing method
EP1476002B1 (en) 2003-05-08 2018-07-04 Samsung Display Co., Ltd. Method of manufacturing a substrate for organic electroluminescent device
CN100414369C (en) * 2003-05-10 2008-08-27 鸿富锦精密工业(深圳)有限公司 Semi-through type liquid crystal display, colour optical filter, and producing method thereof
JP4175300B2 (en) 2003-07-23 2008-11-05 セイコーエプソン株式会社 Color filter substrate, method for manufacturing color filter substrate, display device, electro-optical device, and electronic apparatus
JP4175299B2 (en) 2003-07-23 2008-11-05 セイコーエプソン株式会社 Color filter and display device
JP2005043718A (en) * 2003-07-23 2005-02-17 Seiko Epson Corp Color filter, method for manufacturing color filter, display device, electrooptical device, and electronic appliance
JP2005055823A (en) 2003-08-07 2005-03-03 Seiko Epson Corp Color filter substrate, method for manufacturing color filter substrate, display apparatus, liquid crystal display apparatus and electronic equipment
JP3953053B2 (en) 2003-08-28 2007-08-01 セイコーエプソン株式会社 Discharge method, color filter substrate manufacturing method, liquid crystal display device manufacturing method, and electronic device manufacturing method
JP2005084515A (en) * 2003-09-10 2005-03-31 Seiko Epson Corp Color filter substrate and its manufacturing method, electrooptical device, and electronic equipment
JP2006030650A (en) * 2004-07-16 2006-02-02 Koninkl Philips Electronics Nv Color filter, manufacturing method thereof, and liquid crystal display device using the color filter
JP2006201423A (en) * 2005-01-20 2006-08-03 Seiko Epson Corp Substrate with color element, film forming method, electro-optical device and electronic appliance
JP4333590B2 (en) 2005-01-21 2009-09-16 セイコーエプソン株式会社 Pattern forming method, color filter manufacturing method, color filter, electro-optical device manufacturing method, and electro-optical device
JP4507978B2 (en) * 2005-05-16 2010-07-21 セイコーエプソン株式会社 Method for forming a film pattern
JP4458075B2 (en) 2005-08-26 2010-04-28 セイコーエプソン株式会社 Layer forming method, active matrix substrate manufacturing method, and multilayer wiring substrate manufacturing method
JP4487889B2 (en) 2005-09-12 2010-06-23 セイコーエプソン株式会社 Layer formation method
KR101236515B1 (en) * 2006-04-14 2013-02-21 엘지디스플레이 주식회사 Color filter substrate for liquid crystal display and method for fabricating the same
TWI312540B (en) * 2006-10-11 2009-07-21 Icf Technology Limite Patterned thin-film layer and method for manufacturing same

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