JP3980408B2 - 安定性が高められた光学部品の製造方法及びそれにより得られる部品 - Google Patents
安定性が高められた光学部品の製造方法及びそれにより得られる部品 Download PDFInfo
- Publication number
- JP3980408B2 JP3980408B2 JP2002144739A JP2002144739A JP3980408B2 JP 3980408 B2 JP3980408 B2 JP 3980408B2 JP 2002144739 A JP2002144739 A JP 2002144739A JP 2002144739 A JP2002144739 A JP 2002144739A JP 3980408 B2 JP3980408 B2 JP 3980408B2
- Authority
- JP
- Japan
- Prior art keywords
- coating layer
- layer
- optical
- optical component
- dimensional shape
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 230000003287 optical effect Effects 0.000 title claims description 48
- 238000000034 method Methods 0.000 title claims description 32
- 238000004519 manufacturing process Methods 0.000 title description 9
- 239000000463 material Substances 0.000 claims description 34
- 239000011247 coating layer Substances 0.000 claims description 31
- 239000010410 layer Substances 0.000 claims description 26
- 238000012545 processing Methods 0.000 claims description 10
- 238000002679 ablation Methods 0.000 claims description 9
- 229910004261 CaF 2 Inorganic materials 0.000 claims description 4
- 238000010884 ion-beam technique Methods 0.000 claims description 4
- 229910004298 SiO 2 Inorganic materials 0.000 claims description 3
- 229910016036 BaF 2 Inorganic materials 0.000 claims description 2
- PQXKHYXIUOZZFA-UHFFFAOYSA-M lithium fluoride Inorganic materials [Li+].[F-] PQXKHYXIUOZZFA-UHFFFAOYSA-M 0.000 claims description 2
- 238000007493 shaping process Methods 0.000 claims description 2
- 150000001722 carbon compounds Chemical class 0.000 claims 1
- 238000000608 laser ablation Methods 0.000 claims 1
- 239000013078 crystal Substances 0.000 description 26
- 238000005498 polishing Methods 0.000 description 13
- 230000007547 defect Effects 0.000 description 9
- 230000035882 stress Effects 0.000 description 9
- 238000000149 argon plasma sintering Methods 0.000 description 8
- 238000000227 grinding Methods 0.000 description 7
- 238000000151 deposition Methods 0.000 description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 3
- 238000007796 conventional method Methods 0.000 description 2
- 239000002178 crystalline material Substances 0.000 description 2
- 230000008021 deposition Effects 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 230000013011 mating Effects 0.000 description 2
- 239000011159 matrix material Substances 0.000 description 2
- 238000000206 photolithography Methods 0.000 description 2
- 238000007781 pre-processing Methods 0.000 description 2
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 1
- 229910017768 LaF 3 Inorganic materials 0.000 description 1
- 206010037660 Pyrexia Diseases 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 230000003667 anti-reflective effect Effects 0.000 description 1
- 238000013459 approach Methods 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 230000001419 dependent effect Effects 0.000 description 1
- 238000005137 deposition process Methods 0.000 description 1
- 239000010432 diamond Substances 0.000 description 1
- 229910003460 diamond Inorganic materials 0.000 description 1
- 230000005670 electromagnetic radiation Effects 0.000 description 1
- 238000000313 electron-beam-induced deposition Methods 0.000 description 1
- 230000003628 erosive effect Effects 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- 238000007737 ion beam deposition Methods 0.000 description 1
- 125000003473 lipid group Chemical group 0.000 description 1
- 238000000691 measurement method Methods 0.000 description 1
- 239000005304 optical glass Substances 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 229920003023 plastic Polymers 0.000 description 1
- 238000005496 tempering Methods 0.000 description 1
- 230000008646 thermal stress Effects 0.000 description 1
- 235000012431 wafers Nutrition 0.000 description 1
Images
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/11—Anti-reflection coatings
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/22—Surface treatment of glass, not in the form of fibres or filaments, by coating with other inorganic material
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/22—Surface treatment of glass, not in the form of fibres or filaments, by coating with other inorganic material
- C03C17/23—Oxides
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/3411—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/02—Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of crystals, e.g. rock-salt, semi-conductors
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/14—Protective coatings, e.g. hard coatings
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/20—Materials for coating a single layer on glass
- C03C2217/21—Oxides
- C03C2217/213—SiO2
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/20—Materials for coating a single layer on glass
- C03C2217/28—Other inorganic materials
- C03C2217/284—Halides
- C03C2217/285—Fluorides
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/70—Properties of coatings
- C03C2217/77—Coatings having a rough surface
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2218/00—Methods for coating glass
- C03C2218/30—Aspects of methods for coating glass not covered above
- C03C2218/32—After-treatment
- C03C2218/328—Partly or completely removing a coating
Landscapes
- Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Life Sciences & Earth Sciences (AREA)
- General Physics & Mathematics (AREA)
- Crystallography & Structural Chemistry (AREA)
- Surface Treatment Of Optical Elements (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
Applications Claiming Priority (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE10124425.8 | 2001-05-18 | ||
| DE10124425 | 2001-05-18 | ||
| DE10132819.2 | 2001-07-06 | ||
| DE10132819A DE10132819B4 (de) | 2001-05-18 | 2001-07-06 | Verfahren zur Herstellung optischer Bauteile mit erhöhter Stabilität, damit erhaltene optische Elemente und ihre Verwendung |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2003114301A JP2003114301A (ja) | 2003-04-18 |
| JP2003114301A5 JP2003114301A5 (enExample) | 2005-09-29 |
| JP3980408B2 true JP3980408B2 (ja) | 2007-09-26 |
Family
ID=26009341
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2002144739A Expired - Lifetime JP3980408B2 (ja) | 2001-05-18 | 2002-05-20 | 安定性が高められた光学部品の製造方法及びそれにより得られる部品 |
Country Status (2)
| Country | Link |
|---|---|
| US (1) | US6855380B2 (enExample) |
| JP (1) | JP3980408B2 (enExample) |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR100504246B1 (ko) * | 2002-12-13 | 2005-07-28 | 정연철 | 수정렌즈의 코팅방법 |
| DE102004008752A1 (de) * | 2004-02-23 | 2005-09-08 | Schott Ag | Herstellung von großvolumigen CaF2-Einkristallen für die Verwendung als optische Bauelemente mit einer optischen Achse parallel zur (100) oder (110)-Kristallachse |
| WO2009016921A1 (ja) * | 2007-07-27 | 2009-02-05 | Hoya Corporation | 眼鏡レンズの製造方法 |
| JP5432143B2 (ja) * | 2007-07-31 | 2014-03-05 | コーニング インコーポレイテッド | Ｄｕｖ用光学素子の寿命を延長する洗浄方法 |
| DE102009021330A1 (de) | 2008-06-25 | 2009-12-31 | Carl Zeiss Smt Ag | Verfahren zum Verringern der Oberflächenrauhigkeit einer porösen Oberfläche |
| US10401539B2 (en) * | 2016-04-21 | 2019-09-03 | Corning Incorporated | Coated articles with light-altering features and methods for the production thereof |
Family Cites Families (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4388344A (en) * | 1981-08-31 | 1983-06-14 | United Technolgies Corporation | Method of repairing surface defects in coated laser mirrors |
| DD288466A5 (de) | 1989-10-12 | 1991-03-28 | Physikalisch-Technisches Inst.,De | Verfahren zur glaettung optischer oberflaechen, insbesondere caf2-oberflaechen |
| EP0959051A4 (en) | 1996-08-13 | 1999-12-15 | Nippon Sheet Glass Co Ltd | Laser machining method for glass substrate, diffraction type optical device fabricated by the machining method, and method of manufacturing optical device |
| US6332922B1 (en) | 1998-02-26 | 2001-12-25 | Nikon Corporation | Manufacturing method for calcium fluoride and calcium fluoride for photolithography |
| DE19830449A1 (de) | 1998-07-08 | 2000-01-27 | Zeiss Carl Fa | SiO¶2¶-beschichtetes Spiegelsubstrat für EUV |
| JP2000034193A (ja) | 1998-07-16 | 2000-02-02 | Nikon Corp | フッ化物単結晶の熱処理方法及び製造方法 |
-
2002
- 2002-05-17 US US10/147,709 patent/US6855380B2/en not_active Expired - Fee Related
- 2002-05-20 JP JP2002144739A patent/JP3980408B2/ja not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| US6855380B2 (en) | 2005-02-15 |
| US20020172761A1 (en) | 2002-11-21 |
| JP2003114301A (ja) | 2003-04-18 |
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