JP2003114301A5 - - Google Patents
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- Publication number
- JP2003114301A5 JP2003114301A5 JP2002144739A JP2002144739A JP2003114301A5 JP 2003114301 A5 JP2003114301 A5 JP 2003114301A5 JP 2002144739 A JP2002144739 A JP 2002144739A JP 2002144739 A JP2002144739 A JP 2002144739A JP 2003114301 A5 JP2003114301 A5 JP 2003114301A5
- Authority
- JP
- Japan
- Prior art keywords
- dimensional shape
- coating layer
- layer
- covering layer
- ablation
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000000034 method Methods 0.000 claims 7
- 239000010410 layer Substances 0.000 claims 5
- 239000011247 coating layer Substances 0.000 claims 4
- 238000002679 ablation Methods 0.000 claims 2
- 229910016036 BaF 2 Inorganic materials 0.000 claims 1
- 229910004261 CaF 2 Inorganic materials 0.000 claims 1
- 229910004298 SiO 2 Inorganic materials 0.000 claims 1
- 150000001722 carbon compounds Chemical class 0.000 claims 1
- 238000010884 ion-beam technique Methods 0.000 claims 1
- 238000000608 laser ablation Methods 0.000 claims 1
- PQXKHYXIUOZZFA-UHFFFAOYSA-M lithium fluoride Inorganic materials [Li+].[F-] PQXKHYXIUOZZFA-UHFFFAOYSA-M 0.000 claims 1
- 239000000463 material Substances 0.000 claims 1
- 230000003287 optical effect Effects 0.000 claims 1
- 238000007493 shaping process Methods 0.000 claims 1
Applications Claiming Priority (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE10124425.8 | 2001-05-18 | ||
| DE10124425 | 2001-05-18 | ||
| DE10132819.2 | 2001-07-06 | ||
| DE10132819A DE10132819B4 (de) | 2001-05-18 | 2001-07-06 | Verfahren zur Herstellung optischer Bauteile mit erhöhter Stabilität, damit erhaltene optische Elemente und ihre Verwendung |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2003114301A JP2003114301A (ja) | 2003-04-18 |
| JP2003114301A5 true JP2003114301A5 (enExample) | 2005-09-29 |
| JP3980408B2 JP3980408B2 (ja) | 2007-09-26 |
Family
ID=26009341
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2002144739A Expired - Lifetime JP3980408B2 (ja) | 2001-05-18 | 2002-05-20 | 安定性が高められた光学部品の製造方法及びそれにより得られる部品 |
Country Status (2)
| Country | Link |
|---|---|
| US (1) | US6855380B2 (enExample) |
| JP (1) | JP3980408B2 (enExample) |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR100504246B1 (ko) * | 2002-12-13 | 2005-07-28 | 정연철 | 수정렌즈의 코팅방법 |
| DE102004008752A1 (de) * | 2004-02-23 | 2005-09-08 | Schott Ag | Herstellung von großvolumigen CaF2-Einkristallen für die Verwendung als optische Bauelemente mit einer optischen Achse parallel zur (100) oder (110)-Kristallachse |
| WO2009016921A1 (ja) * | 2007-07-27 | 2009-02-05 | Hoya Corporation | 眼鏡レンズの製造方法 |
| JP5432143B2 (ja) * | 2007-07-31 | 2014-03-05 | コーニング インコーポレイテッド | Duv用光学素子の寿命を延長する洗浄方法 |
| DE102009021330A1 (de) | 2008-06-25 | 2009-12-31 | Carl Zeiss Smt Ag | Verfahren zum Verringern der Oberflächenrauhigkeit einer porösen Oberfläche |
| US10401539B2 (en) * | 2016-04-21 | 2019-09-03 | Corning Incorporated | Coated articles with light-altering features and methods for the production thereof |
Family Cites Families (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4388344A (en) * | 1981-08-31 | 1983-06-14 | United Technolgies Corporation | Method of repairing surface defects in coated laser mirrors |
| DD288466A5 (de) | 1989-10-12 | 1991-03-28 | Physikalisch-Technisches Inst.,De | Verfahren zur glaettung optischer oberflaechen, insbesondere caf2-oberflaechen |
| EP0959051A4 (en) | 1996-08-13 | 1999-12-15 | Nippon Sheet Glass Co Ltd | Laser machining method for glass substrate, diffraction type optical device fabricated by the machining method, and method of manufacturing optical device |
| US6332922B1 (en) | 1998-02-26 | 2001-12-25 | Nikon Corporation | Manufacturing method for calcium fluoride and calcium fluoride for photolithography |
| DE19830449A1 (de) | 1998-07-08 | 2000-01-27 | Zeiss Carl Fa | SiO¶2¶-beschichtetes Spiegelsubstrat für EUV |
| JP2000034193A (ja) | 1998-07-16 | 2000-02-02 | Nikon Corp | フッ化物単結晶の熱処理方法及び製造方法 |
-
2002
- 2002-05-17 US US10/147,709 patent/US6855380B2/en not_active Expired - Fee Related
- 2002-05-20 JP JP2002144739A patent/JP3980408B2/ja not_active Expired - Lifetime
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