JP3976111B2 - 遠紫外線露光用ポジ型フォトレジスト組成物 - Google Patents

遠紫外線露光用ポジ型フォトレジスト組成物 Download PDF

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Publication number
JP3976111B2
JP3976111B2 JP19360299A JP19360299A JP3976111B2 JP 3976111 B2 JP3976111 B2 JP 3976111B2 JP 19360299 A JP19360299 A JP 19360299A JP 19360299 A JP19360299 A JP 19360299A JP 3976111 B2 JP3976111 B2 JP 3976111B2
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Japan
Prior art keywords
group
alkyl group
carbon atoms
alicyclic hydrocarbon
positive photoresist
Prior art date
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Expired - Fee Related
Application number
JP19360299A
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English (en)
Japanese (ja)
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JP2001022071A5 (enExample
JP2001022071A (ja
Inventor
健一郎 佐藤
保雅 河辺
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Corp
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Fujifilm Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Publication date
Application filed by Fujifilm Corp filed Critical Fujifilm Corp
Priority to JP19360299A priority Critical patent/JP3976111B2/ja
Priority to US09/563,436 priority patent/US6596458B1/en
Priority to TW089108532A priority patent/TW546548B/zh
Priority to KR1020000025558A priority patent/KR100645847B1/ko
Publication of JP2001022071A publication Critical patent/JP2001022071A/ja
Publication of JP2001022071A5 publication Critical patent/JP2001022071A5/ja
Application granted granted Critical
Publication of JP3976111B2 publication Critical patent/JP3976111B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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  • Materials For Photolithography (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
JP19360299A 1999-05-07 1999-07-07 遠紫外線露光用ポジ型フォトレジスト組成物 Expired - Fee Related JP3976111B2 (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP19360299A JP3976111B2 (ja) 1999-07-07 1999-07-07 遠紫外線露光用ポジ型フォトレジスト組成物
US09/563,436 US6596458B1 (en) 1999-05-07 2000-05-03 Positive-working photoresist composition
TW089108532A TW546548B (en) 1999-05-07 2000-05-04 Positive-working photoresist composition
KR1020000025558A KR100645847B1 (ko) 1999-05-07 2000-05-08 포지티브-작용 포토레지스트 조성물

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP19360299A JP3976111B2 (ja) 1999-07-07 1999-07-07 遠紫外線露光用ポジ型フォトレジスト組成物

Publications (3)

Publication Number Publication Date
JP2001022071A JP2001022071A (ja) 2001-01-26
JP2001022071A5 JP2001022071A5 (enExample) 2005-07-07
JP3976111B2 true JP3976111B2 (ja) 2007-09-12

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ID=16310685

Family Applications (1)

Application Number Title Priority Date Filing Date
JP19360299A Expired - Fee Related JP3976111B2 (ja) 1999-05-07 1999-07-07 遠紫外線露光用ポジ型フォトレジスト組成物

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JP (1) JP3976111B2 (enExample)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4186497B2 (ja) * 2001-04-12 2008-11-26 東レ株式会社 ポジ型感放射線性組成物およびこれを用いたレジストパターンの製造方法
JP4494061B2 (ja) 2004-03-30 2010-06-30 東京応化工業株式会社 ポジ型レジスト組成物
JP5608492B2 (ja) * 2009-09-18 2014-10-15 富士フイルム株式会社 感活性光線性又は感放射線性樹脂組成物、及びそれを用いたパターン形成方法

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Publication number Publication date
JP2001022071A (ja) 2001-01-26

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