JP3976109B2 - 遠紫外線露光用ポジ型フォトレジスト組成物 - Google Patents

遠紫外線露光用ポジ型フォトレジスト組成物 Download PDF

Info

Publication number
JP3976109B2
JP3976109B2 JP18660799A JP18660799A JP3976109B2 JP 3976109 B2 JP3976109 B2 JP 3976109B2 JP 18660799 A JP18660799 A JP 18660799A JP 18660799 A JP18660799 A JP 18660799A JP 3976109 B2 JP3976109 B2 JP 3976109B2
Authority
JP
Japan
Prior art keywords
group
alkyl group
carbon atoms
alicyclic hydrocarbon
positive photoresist
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP18660799A
Other languages
English (en)
Japanese (ja)
Other versions
JP2001013686A5 (enExample
JP2001013686A (ja
Inventor
健一郎 佐藤
保雅 河辺
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Corp
Original Assignee
Fujifilm Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujifilm Corp filed Critical Fujifilm Corp
Priority to JP18660799A priority Critical patent/JP3976109B2/ja
Priority to US09/563,436 priority patent/US6596458B1/en
Priority to TW089108532A priority patent/TW546548B/zh
Priority to KR1020000025558A priority patent/KR100645847B1/ko
Publication of JP2001013686A publication Critical patent/JP2001013686A/ja
Publication of JP2001013686A5 publication Critical patent/JP2001013686A5/ja
Application granted granted Critical
Publication of JP3976109B2 publication Critical patent/JP3976109B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Landscapes

  • Materials For Photolithography (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
JP18660799A 1999-05-07 1999-06-30 遠紫外線露光用ポジ型フォトレジスト組成物 Expired - Fee Related JP3976109B2 (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP18660799A JP3976109B2 (ja) 1999-06-30 1999-06-30 遠紫外線露光用ポジ型フォトレジスト組成物
US09/563,436 US6596458B1 (en) 1999-05-07 2000-05-03 Positive-working photoresist composition
TW089108532A TW546548B (en) 1999-05-07 2000-05-04 Positive-working photoresist composition
KR1020000025558A KR100645847B1 (ko) 1999-05-07 2000-05-08 포지티브-작용 포토레지스트 조성물

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP18660799A JP3976109B2 (ja) 1999-06-30 1999-06-30 遠紫外線露光用ポジ型フォトレジスト組成物

Publications (3)

Publication Number Publication Date
JP2001013686A JP2001013686A (ja) 2001-01-19
JP2001013686A5 JP2001013686A5 (enExample) 2005-07-07
JP3976109B2 true JP3976109B2 (ja) 2007-09-12

Family

ID=16191541

Family Applications (1)

Application Number Title Priority Date Filing Date
JP18660799A Expired - Fee Related JP3976109B2 (ja) 1999-05-07 1999-06-30 遠紫外線露光用ポジ型フォトレジスト組成物

Country Status (1)

Country Link
JP (1) JP3976109B2 (enExample)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4102032B2 (ja) * 2001-03-12 2008-06-18 富士フイルム株式会社 ポジ型レジスト組成物
JP4186497B2 (ja) * 2001-04-12 2008-11-26 東レ株式会社 ポジ型感放射線性組成物およびこれを用いたレジストパターンの製造方法
JP3912767B2 (ja) * 2001-06-21 2007-05-09 富士フイルム株式会社 ポジ型感光性組成物
JP4494161B2 (ja) * 2004-10-14 2010-06-30 東京応化工業株式会社 高分子化合物、ポジ型レジスト組成物およびレジストパターン形成方法
JP4684740B2 (ja) * 2005-05-19 2011-05-18 東京応化工業株式会社 ポジ型レジスト組成物およびレジストパターン形成方法

Also Published As

Publication number Publication date
JP2001013686A (ja) 2001-01-19

Similar Documents

Publication Publication Date Title
JP3444821B2 (ja) ポジ型フォトレジスト組成物
JP4102032B2 (ja) ポジ型レジスト組成物
JP4187949B2 (ja) ポジ型レジスト組成物
JP4149154B2 (ja) ポジ型レジスト組成物
JP3547047B2 (ja) 遠紫外線露光用ポジ型フォトレジスト組成物
JP4255100B2 (ja) ＡｒＦエキシマレ−ザ−露光用ポジ型フォトレジスト組成物及びそれを用いたパタ−ン形成方法
JP4149148B2 (ja) ポジ型レジスト組成物
JP4124978B2 (ja) ポジ型レジスト組成物
JP2003122007A (ja) ポジ型レジスト組成物
JP3948506B2 (ja) ポジ型フォトレジスト組成物
JP2008299350A (ja) 遠紫外線露光用ポジ型フォトレジスト組成物
JP4049236B2 (ja) ポジ型レジスト組成物
JP2002351079A (ja) ポジ型レジスト組成物
JP3929648B2 (ja) 遠紫外線露光用ポジ型フォトレジスト組成物
JP4070521B2 (ja) ポジ型レジスト組成物
JP4210439B2 (ja) ポジ型フォトレジスト組成物
JP3934291B2 (ja) 遠紫外線露光用ポジ型レジスト組成物
JP3976109B2 (ja) 遠紫外線露光用ポジ型フォトレジスト組成物
JP2001022072A (ja) 遠紫外線露光用ポジ型フォトレジスト組成物
JP4090773B2 (ja) ポジ型レジスト組成物
JP3890390B2 (ja) ポジ型レジスト組成物
JP3976111B2 (ja) 遠紫外線露光用ポジ型フォトレジスト組成物
JP2002296782A (ja) ポジ型レジスト組成物
JP2001022070A (ja) 遠紫外線露光用ポジ型フォトレジスト組成物
JP2002341541A (ja) ポジ型レジスト組成物

Legal Events

Date Code Title Description
A521 Written amendment

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20041105

A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20041105

RD04 Notification of resignation of power of attorney

Free format text: JAPANESE INTERMEDIATE CODE: A7424

Effective date: 20060324

A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20061110

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20061115

A711 Notification of change in applicant

Free format text: JAPANESE INTERMEDIATE CODE: A712

Effective date: 20061124

A521 Written amendment

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20070111

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20070228

A521 Written amendment

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20070426

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20070606

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20070613

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20100629

Year of fee payment: 3

R150 Certificate of patent or registration of utility model

Ref document number: 3976109

Country of ref document: JP

Free format text: JAPANESE INTERMEDIATE CODE: R150

Free format text: JAPANESE INTERMEDIATE CODE: R150

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20100629

Year of fee payment: 3

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20110629

Year of fee payment: 4

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20110629

Year of fee payment: 4

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20120629

Year of fee payment: 5

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20120629

Year of fee payment: 5

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20130629

Year of fee payment: 6

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

LAPS Cancellation because of no payment of annual fees