JP3976099B2 - モジュール式のコーティング用取付具 - Google Patents

モジュール式のコーティング用取付具 Download PDF

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Publication number
JP3976099B2
JP3976099B2 JP53083898A JP53083898A JP3976099B2 JP 3976099 B2 JP3976099 B2 JP 3976099B2 JP 53083898 A JP53083898 A JP 53083898A JP 53083898 A JP53083898 A JP 53083898A JP 3976099 B2 JP3976099 B2 JP 3976099B2
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JP
Japan
Prior art keywords
fixture
workpiece
shaft
coated
support structure
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP53083898A
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English (en)
Japanese (ja)
Other versions
JP2001507985A5 (OSRAM
JP2001507985A (ja
Inventor
ウイリアム メンチェッチ ジョーン
マイケル バーンズ スチーブン
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
RTX Corp
Original Assignee
United Technologies Corp
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Filing date
Publication date
Application filed by United Technologies Corp filed Critical United Technologies Corp
Publication of JP2001507985A publication Critical patent/JP2001507985A/ja
Publication of JP2001507985A5 publication Critical patent/JP2001507985A5/ja
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Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C13/00—Means for manipulating or holding work, e.g. for separate articles
    • B05C13/02—Means for manipulating or holding work, e.g. for separate articles for particular articles
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/50—Substrate holders
    • C23C14/505—Substrate holders for rotation of the substrates
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/458—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for supporting substrates in the reaction chamber

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Coating Apparatus (AREA)
  • Details Or Accessories Of Spraying Plant Or Apparatus (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
JP53083898A 1997-01-13 1997-09-02 モジュール式のコーティング用取付具 Expired - Fee Related JP3976099B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US08/782,398 1997-01-13
US08/782,398 US5803971A (en) 1997-01-13 1997-01-13 Modular coating fixture
PCT/US1997/015329 WO1998030338A1 (en) 1997-01-13 1997-09-02 Modular coating fixture

Publications (3)

Publication Number Publication Date
JP2001507985A JP2001507985A (ja) 2001-06-19
JP2001507985A5 JP2001507985A5 (OSRAM) 2005-02-10
JP3976099B2 true JP3976099B2 (ja) 2007-09-12

Family

ID=25125927

Family Applications (1)

Application Number Title Priority Date Filing Date
JP53083898A Expired - Fee Related JP3976099B2 (ja) 1997-01-13 1997-09-02 モジュール式のコーティング用取付具

Country Status (7)

Country Link
US (1) US5803971A (OSRAM)
EP (1) EP0975435B1 (OSRAM)
JP (1) JP3976099B2 (OSRAM)
DE (1) DE69737037T2 (OSRAM)
RU (1) RU2161075C2 (OSRAM)
UA (1) UA49876C2 (OSRAM)
WO (1) WO1998030338A1 (OSRAM)

Families Citing this family (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6332926B1 (en) 1999-08-11 2001-12-25 General Electric Company Apparatus and method for selectively coating internal and external surfaces of an airfoil
US7754016B2 (en) * 2002-10-07 2010-07-13 United Technologies Corporation Multiple axis tumbler coating apparatus
US8349086B2 (en) * 2004-07-30 2013-01-08 United Technologies Corporation Non-stick masking fixtures and methods of preparing same
EP1713110B1 (de) * 2005-04-08 2016-03-09 Applied Materials GmbH & Co. KG Anlage zum Beschichten eines Substrats und Modul
RU2294395C2 (ru) * 2005-04-29 2007-02-27 Открытое акционерное общество "Национальный институт авиационных технологий" (ОАО "НИАТ") Установка для вакуумной ионно-плазменной обработки поверхностей
RU2312170C2 (ru) * 2005-08-17 2007-12-10 Институт физики полупроводников Сибирского отделения Российской академии наук Устройство для нанесения многослойных оптических покрытий
DE502007003308D1 (de) * 2007-07-12 2010-05-12 Siemens Ag Halterung für Turbinenschaufeln
JP4897087B2 (ja) 2007-10-03 2012-03-14 ミリポア・コーポレイション 積層プレート式ろ過カートリッジ
US8968830B2 (en) * 2007-12-06 2015-03-03 Oerlikon Trading Ag, Trubbach PVD—vacuum coating unit
US8323409B2 (en) * 2008-05-08 2012-12-04 United Technologies Corporation Systems and methods for forming components with thermal barrier coatings
US8211234B2 (en) * 2008-09-02 2012-07-03 United Technologies Corporation Coater platter homing tool
RU2425173C2 (ru) * 2009-01-11 2011-07-27 Общество с ограниченной ответственностью Научно-производственное предприятие "Уралавиаспецтехнология" Установка для комбинированной ионно-плазменной обработки
US20110171390A1 (en) * 2010-01-08 2011-07-14 United Technologies Corporation One Financial Plaza Fixture for coating application
TWI531419B (zh) * 2011-05-26 2016-05-01 艾德維尼拉企業公司 塗佈裝置
EP2788525B1 (en) 2011-12-08 2016-02-24 Praxair S.T. Technology, Inc. Tooling fixture assembly for use in a coating operation
WO2013086339A2 (en) * 2011-12-08 2013-06-13 Praxair S.T. Technology, Inc. Multifuntion tooling fixture assembly for use in a coating related operations
US8889222B1 (en) * 2013-12-03 2014-11-18 Advenira Enterprises, Inc. Coating material distribution using simultaneous rotation and vibration
US9759089B2 (en) 2013-12-10 2017-09-12 General Electric Company Transportable modular coating systems and methods
CN103707203B (zh) * 2013-12-11 2016-08-17 中原内配集团股份有限公司 气缸套喷砂、喷涂用工装夹具
DE102015208783A1 (de) 2015-05-12 2016-11-17 MTU Aero Engines AG Abdeckverfahren zur Herstellung einer Kombination von Schaufelspitzenpanzerung und Erosionsschutzschicht
US11117151B2 (en) * 2017-08-23 2021-09-14 Raytheon Technologies Corporation Fixture assembly for coating combustor panels
USD881242S1 (en) * 2018-01-29 2020-04-14 Oerlikon Surface Solutions Ag, Pfaffikon Tool holder

Family Cites Families (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3594227A (en) * 1968-07-12 1971-07-20 Bell Telephone Labor Inc Method for treating semiconductor slices with gases
US3796182A (en) * 1971-12-16 1974-03-12 Applied Materials Tech Susceptor structure for chemical vapor deposition reactor
US3699298A (en) * 1971-12-23 1972-10-17 Western Electric Co Methods and apparatus for heating and/or coating articles
US3865072A (en) * 1973-10-18 1975-02-11 Hls Ind Apparatus for chemically depositing epitaxial layers on semiconductor substrates
DE2813180C2 (de) * 1978-03-25 1985-12-19 Leybold-Heraeus GmbH, 5000 Köln Vakuumbeschichtungsanlage zum allseitigen Beschichten von Substraten durch Rotation der Substrate im Materialstrom
US4271005A (en) * 1979-12-03 1981-06-02 United Technologies Corporation Workpiece support apparatus for use with cathode sputtering devices
US4252626A (en) * 1980-03-10 1981-02-24 United Technologies Corporation Cathode sputtering with multiple targets
JPS59126541A (ja) * 1983-01-08 1984-07-21 Fuji Electric Co Ltd シ−ト状電子写真用感光体の製造方法
JPS59136541A (ja) * 1983-01-26 1984-08-06 Toyota Motor Corp アイドル回転数制御方法
US4496828A (en) * 1983-07-08 1985-01-29 Ultra Carbon Corporation Susceptor assembly
US4579080A (en) * 1983-12-09 1986-04-01 Applied Materials, Inc. Induction heated reactor system for chemical vapor deposition
DE3422718A1 (de) * 1984-06-19 1986-01-09 Plasmainvent AG, Zug Vakuum-plasma-beschichtungsanlage
US4823736A (en) * 1985-07-22 1989-04-25 Air Products And Chemicals, Inc. Barrel structure for semiconductor epitaxial reactor
JPS6312128A (ja) * 1986-03-20 1988-01-19 Toshiba Mach Co Ltd バレル型気相成長装置
GB2210387B (en) * 1987-09-30 1992-03-11 Rolls Royce Plc Chemical vapour deposition
JP2605810B2 (ja) * 1988-07-18 1997-04-30 日新電機株式会社 気相成長装置の回転シヤフト
US5264245A (en) * 1991-12-04 1993-11-23 Howmet Corporation CVD method for forming uniform coatings
RU2038417C1 (ru) * 1992-06-22 1995-06-27 Бурков Сергей Геннадьевич Устройство для нанесения покрытий на изделия в вакууме
US5421979A (en) * 1993-08-03 1995-06-06 Photran Corporation Load-lock drum-type coating apparatus
DE4425991C1 (de) * 1994-07-22 1995-12-07 Mtu Muenchen Gmbh Vorrichtung und Verfahren zur partiellen Beschichtung von Bauteilgruppen

Also Published As

Publication number Publication date
EP0975435A1 (en) 2000-02-02
RU2161075C2 (ru) 2000-12-27
DE69737037D1 (de) 2007-01-11
JP2001507985A (ja) 2001-06-19
EP0975435B1 (en) 2006-11-29
DE69737037T2 (de) 2007-04-26
US5803971A (en) 1998-09-08
EP0975435A4 (en) 2004-06-02
WO1998030338A1 (en) 1998-07-16
UA49876C2 (uk) 2002-10-15

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