JP3945569B2 - Development device - Google Patents

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Publication number
JP3945569B2
JP3945569B2 JP2001372171A JP2001372171A JP3945569B2 JP 3945569 B2 JP3945569 B2 JP 3945569B2 JP 2001372171 A JP2001372171 A JP 2001372171A JP 2001372171 A JP2001372171 A JP 2001372171A JP 3945569 B2 JP3945569 B2 JP 3945569B2
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Japan
Prior art keywords
developer
substrate
developing device
pocket
collection
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JP2001372171A
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JP2003173957A (en
Inventor
太 島井
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Tokyo Ohka Kogyo Co Ltd
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Tokyo Ohka Kogyo Co Ltd
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Priority to JP2001372171A priority Critical patent/JP3945569B2/en
Priority to TW091132314A priority patent/TW200300959A/en
Priority to KR1020020070612A priority patent/KR100902724B1/en
Publication of JP2003173957A publication Critical patent/JP2003173957A/en
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/3092—Recovery of material; Waste processing
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/3021—Imagewise removal using liquid means from a wafer supported on a rotating chuck
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/707—Chucks, e.g. chucking or un-chucking operations or structural details
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L21/687—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
    • H01L21/68714—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support
    • H01L21/68785—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support characterised by the mechanical construction of the susceptor, stage or support

Description

【０００１】
【発明の属する技術分野】
本発明は半導体ウェーハやガラス基板等の基板の表面に形成されたホトレジスト被膜に対して現像を施す装置に関する。
【０００２】
【従来の技術】
半導体ウェーハやガラス基板等の基板に微細な配線パターン等を形成するには、微細パターンのマスクを介してエッチングやイオンドーピングなどの各種処理を行う。
そして、上記の微細パターンのマスクを形成するには、基板表面にホトレジスト膜を形成し、このホトレジスト膜に対して選択的に露光を行い、露光後のホトレジスト膜に現像液を供給して、ネガ型のホトレジスト膜であれば非露光部分を溶出し、ポジ型のホトレジスト膜であれば露光部分を溶出して微細パターンを形成する。
【０００３】
上記の現像処理を行う装置として、基板を回転せしめ、この基板上に現像液を供給し、遠心力で基板全体に現像液を行き渡らせる回転式の現像装置が従来から用いられている。この回転式の現像装置は基板上に供給された現像液のうち、実際に現像に寄与する現像液は僅かで、残りの現像液は基板の回転に伴って飛散してしまい、大量の現像液が未使用に近い状態で捨てられてしまうという問題があった。
【０００４】
上記の問題を解消する現像装置として、特開平１１−３０５４５０号公報および特開２０００−１６４５０３号公報に開示される装置が知られている。
特開平１１−３０５４５０号公報に開示される現像装置は、カップの内底部に現像液の回収ポケットを設け、特開２０００−１６４５０３号公報に開示される現像装置は、外側整流リングに直接現像液を衝突させて回収口より回収するようにしている。
【０００５】
【発明が解決しようとする課題】
上述した特開平１１−３０５４５０号公報に開示される現像装置にあっては、基板の回転速度を上げると、現像液が飛び散って回収ポケットに回収できる現像液が少なくなり、回転速度を遅くすると回収に時間がかかる不利がある。また、特開２０００−１６４５０３号公報に開示される現像装置にあっては、整流リングから回収口へ現像液が落下する際に空気を巻き込んでしまい、現在多用されている現像液はアルカリ性であることから、空気中の炭酸ガスによって現像液が劣化し、再利用に支障をきたすことになる。
【０００６】
【課題を解決するための手段】
上記課題を解決すべく本発明に係る現像装置は、カップ内に基板を保持して回転せしめるチャックを配置し、前記カップ側壁の内側に例えばスカート状裾広がり形状の整流リングを取り付け、この前記整流リングの下端に沿って環状の現像液回収ポケットを設けた。
上記構成とすることで、基板の回転をある程度遅くしても現像液の回収効率は高くなり、且つ現像液中への空気の混入を抑制できる。
【０００７】
なお、前記現像液回収ポケットについては、底面を回収箇所に向かって傾斜させることで回収効率を向上させることができる。回収箇所が複数ある場合には、それぞれの回収箇所に向かって傾斜せしめることが好ましい。
【０００８】
空気との接触の割合を少なくし現像液の劣化を防ぐため、現像液回収ポケットの上面の開口幅はできるだけ狭くし、深さは深くすることが好ましく、現像液回収ポケット内に窒素ガスなどを供給してもよい。また、整流リング及び現像液回収ポケット内面にフッ素樹脂コーティングを施すことで、現像液の流れがスムーズになり回収を効率よく行うことができる。
【０００９】
【発明の実施の形態】
以下に本発明の実施の形態を添付図面に基づいて説明する。ここで、図１は本発明に係る現像装置の縦断面図、図２は同現像装置の平面図、図３は同現像装置の要部拡大断面図、図４は現像液回収ポケットの斜視図である。
【００１０】
現像装置１は、平面視で矩形状をなすケース２内にカップ３を配置している。ケース２内は排気兼排液通路４とされ、ケース２の上面の四隅には点検用の開口５が形成され、この点検用開口５の下方の排気兼排液通路４内には排気中の現像液を落下せしめる邪魔板６を配置している。
尚、排気兼排液通路４の底板は若干傾斜しており、最も低くなった箇所に排気兼排液口４ａを形成している。
【００１１】
また、前記カップ３は側壁７と底部８から構成され、側壁７は上方に向かって徐々にその径が小さくなり、上端開口には整流筒９が設けられている。この整流筒９はシリンダユニット１０にて昇降可能とされ、現像装置１内に基板Ｗを投入する際には下降して基板Ｗの搬入の邪魔にならないようにし、現像処理中は上昇し、カップ３内に乱流が生じにくくしている。
【００１２】
一方、前記カップ３の底部８の中央部には開口１１が形成され、開口１１にはスピンナー軸１２が挿通し、このスピンナー軸１２はベース１３に取り付けたモータ１４にて回転せしめられるとともにシリンダユニット１５の作動で昇降動可能とされ、更にスピンナー軸１２の上端には基板Ｗを吸着保持するチャック１６が取り付けられている。
【００１３】
また、前記底部８は中央の開口１１から径方向外側に向かって下方に徐々に下がる傾斜部１７とこの傾斜部１７に連続する垂直部１８とこの垂直部１８に連続するとともに外端部が前記排気兼排液通路４に臨む水平部１９を有している。これら傾斜部１７、垂直部１８及び水平部１９の表面にはフッ素樹脂コーティングが施されており、表面に落下した現像液がスムーズに流れる
【００１４】
そして、前記傾斜部１７の下方に底板２０が配置され、これら傾斜部１７及び底板２０は支持片２１を介してベース１３に取り付けられ、これら傾斜部１７及び底板２０間の空間をトラップ部とし、開口１１を伝って内側まで入り込んだ現像液をこのトラップ部に取り込み、排出口２２から取り出すようにしている。
【００１５】
また、前記カップ３の側壁７内側には支持片２３を介してスカート状裾広がり形状の整流リング２５を取り付けている。即ち、整流リング２５にも支持片２４を設け、これら支持片２３，２４の何れか一方に長穴を形成し、ボルトにより上下位置調整可能に取り付けている。
【００１６】
前記整流リング２５の下端は現像液回収ポケット２６内に臨んでいる。この現像液回収ポケット２６は平面視が環状で断面が樋状をなすとともにその底面が一方向に向かって傾斜し、その最下点において、チューブ２７が接続され、ポンプ２８を駆動することで現像液回収ポケット２６内の現像液を図示しないタンク等に回収する構造になっている。
【００１７】
また前記現像液回収ポケット２６は円周上４箇所において取付金具２９によって側壁７に固着されている。
なお、図示例では回収ポケット２６の回収箇所は１箇所としたが、複数箇所を回収箇所として回収効率を高めてもよい。この場合は各回収箇所に向かって底面が傾斜するようにする。
【００１８】
以上において、ホトレジストに露光処理が終了した基板Ｗに現像処理を施すには、シリンダユニット１５の作動でスピンナー軸１２とともにチャック１６を上昇せしめ、また同時にシリンダユニット１０の作動で整流筒９を下降せしめた状態で、基板Ｗを側方から搬送してきてチャック１６上に載置する。
【００１９】
この後、それぞれのシリンダユニット１０，１５を逆方向に作動させて、整流筒９を上昇せしめるとともにチャック１６を下降せしめ、更に図示しないノズルから基板Ｗ表面に現像液を供給し液盛りする。現像液の供給ノズルとしては、例えば、スリットノズルが好ましい。
【００２０】
上記のように基板Ｗ表面に現像液を液盛りして所定時間経過したならば、モータ１４を駆動して基板Ｗを回転せしめ、基板Ｗ上に盛られた現像液を除去する。このときの回転速度は１０〜３００rpmとする。また、回転時間は３〜１５秒とする。
【００２１】
以上の現像処理において、基板Ｗから飛散する現像液の多くは整流リング２５内面に当たるが、整流リング２５の形状がスカート状をしているため飛散することなくまた空気と混合されることなく整流リング２５内面に沿って下方に流下し、回収ポケット２６内に入る。
【００２２】
そして、回収ポケット２６内に入った現像液は回収ポケット２６の底面の傾斜に沿って回収箇所まで流れ、ポンプ２８の駆動でタンクに回収され、再利用に供される。
【００２３】
【発明の効果】
以上に説明したように本発明によれば、基板から飛散する現像液をスムーズに回収することができる。特に飛散から回収までの時間を短縮することができるので、現像液と空気との接触の機会を減らすことができ、現像液の劣化を防止し、再生に有利である。
【図面の簡単な説明】
【図１】本発明に係る現像装置の縦断面図
【図２】同現像装置の平面図
【図３】同現像装置の要部拡大断面図
【図４】現像液回収ポケットの斜視図
【符号の説明】
１…現像装置、２…ケース、３…カップ、４…排気兼排液通路、４ａ…排気兼排液口、５…点検用の開口、６…邪魔板、７…カップ側壁、８…カップ底部、９…整流筒、１２…スピンナー軸、１３…ベース、１４…モータ、１６…チャック、１７…底部の傾斜部、１８…底部の垂直部、１９…底部の水平部、２０…底板、２１，２４…支持片、２２…排出口、２５…整流リング、２６…現像液回収ポケット、２７…チューブ、２８…ポンプ。[0001]
BACKGROUND OF THE INVENTION
The present invention relates to an apparatus for developing a photoresist film formed on the surface of a substrate such as a semiconductor wafer or a glass substrate.
[0002]
[Prior art]
In order to form a fine wiring pattern or the like on a substrate such as a semiconductor wafer or a glass substrate, various processes such as etching and ion doping are performed through a fine pattern mask.
In order to form the above-mentioned fine pattern mask, a photoresist film is formed on the substrate surface, the photoresist film is selectively exposed, a developer is supplied to the exposed photoresist film, and a negative In the case of a type photoresist film, a non-exposed portion is eluted, and in the case of a positive type photoresist film, an exposed portion is eluted to form a fine pattern.
[0003]
As a device for performing the above development processing, a rotary developing device that rotates a substrate, supplies a developing solution onto the substrate, and spreads the developing solution over the entire substrate by centrifugal force has been conventionally used. In this rotary developing device, only a small amount of the developer supplied to the substrate actually contributes to the development, and the remaining developer is scattered as the substrate rotates. There was a problem that was thrown away in a state close to unused.
[0004]
As developing devices that solve the above-mentioned problems, there are known devices disclosed in JP-A-11-305450 and JP-A-2000-164503.
The developing device disclosed in Japanese Patent Laid-Open No. 11-305450 is provided with a developer recovery pocket at the inner bottom of the cup, and the developing device disclosed in Japanese Patent Laid-Open No. 2000-164503 is directly applied to the outer rectifying ring. Are collected from the collection port.
[0005]
[Problems to be solved by the invention]
In the developing device disclosed in Japanese Patent Application Laid-Open No. 11-305450 described above, when the rotation speed of the substrate is increased, the developer is scattered and less developer can be collected in the collection pocket. There is a disadvantage that takes time. Further, in the developing device disclosed in Japanese Patent Application Laid-Open No. 2000-164503, air is entrained when the developer falls from the rectifying ring to the recovery port, and the currently widely used developer is alkaline. For this reason, the developer is deteriorated by the carbon dioxide gas in the air, which hinders reuse.
[0006]
[Means for Solving the Problems]
In order to solve the above-described problems, a developing device according to the present invention includes a chuck that holds and rotates a substrate in a cup, and a rectifying ring having, for example, a skirt-like flared shape is attached to the inside of the cup side wall. An annular developer recovery pocket was provided along the lower end of the ring.
With the above configuration, even when the rotation of the substrate is slowed to some extent, the recovery efficiency of the developer is increased, and mixing of air into the developer can be suppressed.
[0007]
Note that the recovery efficiency of the developer recovery pocket can be improved by inclining the bottom surface toward the recovery location. When there are a plurality of collection points, it is preferable to incline toward the respective collection points.
[0008]
In order to reduce the rate of contact with air and prevent deterioration of the developer, it is preferable to make the opening width of the upper surface of the developer recovery pocket as narrow and deep as possible. You may supply. Further, by applying a fluororesin coating on the inner surfaces of the rectifying ring and the developer recovery pocket, the flow of the developer can be made smooth and recovery can be performed efficiently.
[0009]
DETAILED DESCRIPTION OF THE INVENTION
Embodiments of the present invention will be described below with reference to the accompanying drawings. Here, FIG. 1 is a longitudinal sectional view of the developing device according to the present invention, FIG. 2 is a plan view of the developing device, FIG. 3 is an enlarged cross-sectional view of the main part of the developing device, and FIG. It is.
[0010]
The developing device 1 has a cup 3 disposed in a case 2 that is rectangular in plan view. The inside of the case 2 is an exhaust and drainage passage 4, and inspection openings 5 are formed at the four corners of the upper surface of the case 2, and the exhaust and drainage passage 4 below the inspection opening 5 is exhausted. A baffle plate 6 for dropping the developer is disposed.
The bottom plate of the exhaust / drain passage 4 is slightly inclined, and an exhaust / drain port 4a is formed at the lowest position.
[0011]
The cup 3 includes a side wall 7 and a bottom portion 8. The side wall 7 gradually decreases in diameter toward the upper side, and a rectifying cylinder 9 is provided at the upper end opening. The rectifying cylinder 9 can be moved up and down by a cylinder unit 10. When the substrate W is loaded into the developing device 1, the rectifying tube 9 is lowered so as not to obstruct the loading of the substrate W. 3 is less likely to cause turbulence.
[0012]
On the other hand, an opening 11 is formed at the center of the bottom 8 of the cup 3, and a spinner shaft 12 is inserted through the opening 11. The spinner shaft 12 is rotated by a motor 14 attached to a base 13 and a cylinder unit. 15 can be moved up and down, and a chuck 16 for attracting and holding the substrate W is attached to the upper end of the spinner shaft 12.
[0013]
Further, the bottom portion 8 is continuous with the inclined portion 17 that gradually falls downward from the central opening 11 toward the outer side in the radial direction, the vertical portion 18 that continues to the inclined portion 17, and the vertical portion 18, and the outer end portion of the bottom portion 8. It has a horizontal portion 19 that faces the exhaust and drainage passage 4. The surfaces of the inclined portion 17, the vertical portion 18 and the horizontal portion 19 are coated with a fluororesin, and the developer dropped on the surface flows smoothly.
A bottom plate 20 is disposed below the inclined portion 17, and the inclined portion 17 and the bottom plate 20 are attached to the base 13 via a support piece 21, and a space between the inclined portion 17 and the bottom plate 20 is used as a trap portion. The developer entering the inside through the opening 11 is taken into the trap portion and taken out from the discharge port 22.
[0015]
Further, a rectifying ring 25 having a skirt-like flared shape is attached to the inside of the side wall 7 of the cup 3 via a support piece 23. That is, the rectifying ring 25 is also provided with a support piece 24, and a long hole is formed in one of the support pieces 23 and 24, and is attached so that the vertical position can be adjusted by a bolt.
[0016]
The lower end of the rectifying ring 25 faces the developer recovery pocket 26. The developer recovery pocket 26 has an annular shape in plan view and has a bowl-shaped cross section, and its bottom surface is inclined in one direction. At the lowest point, the tube 27 is connected and the pump 28 is driven to develop. The developer in the liquid collection pocket 26 is collected in a tank or the like (not shown).
[0017]
The developer recovery pocket 26 is fixed to the side wall 7 by mounting brackets 29 at four locations on the circumference.
In the illustrated example, the collection location of the collection pocket 26 is one, but the collection efficiency may be improved by using a plurality of collection locations. In this case, the bottom surface is inclined toward each collection location.
[0018]
In the above, in order to perform development processing on the substrate W after the exposure processing of the photoresist, the chuck 16 is lifted together with the spinner shaft 12 by the operation of the cylinder unit 15, and at the same time the flow straightening cylinder 9 is lowered by the operation of the cylinder unit 10. In this state, the substrate W is transported from the side and placed on the chuck 16.
[0019]
Thereafter, the cylinder units 10 and 15 are operated in the opposite directions to raise the rectifying cylinder 9 and lower the chuck 16, and further supply the developer onto the surface of the substrate W from a nozzle (not shown). As the developer supply nozzle, for example, a slit nozzle is preferable.
[0020]
As described above, when a predetermined time elapses after the developer is deposited on the surface of the substrate W, the motor 14 is driven to rotate the substrate W, and the developer accumulated on the substrate W is removed. The rotation speed at this time is 10 to 300 rpm. The rotation time is 3 to 15 seconds.
[0021]
In the above development processing, most of the developer splashed from the substrate W hits the inner surface of the rectifying ring 25. However, since the shape of the rectifying ring 25 is a skirt, it does not scatter and is not mixed with air. 25 flows downward along the inner surface and enters the collection pocket 26.
[0022]
Then, the developer that has entered the collection pocket 26 flows to the collection site along the inclination of the bottom surface of the collection pocket 26, is collected in the tank by driving the pump 28, and is reused.
[0023]
【The invention's effect】
As described above, according to the present invention, the developer scattered from the substrate can be collected smoothly. In particular, since the time from scattering to collection can be shortened, the chance of contact between the developer and air can be reduced, and the developer is prevented from deteriorating, which is advantageous for regeneration.
[Brief description of the drawings]
FIG. 1 is a longitudinal sectional view of a developing device according to the present invention. FIG. 2 is a plan view of the developing device. FIG. 3 is an enlarged sectional view of a main part of the developing device. Explanation of]
DESCRIPTION OF SYMBOLS 1 ... Developing apparatus, 2 ... Case, 3 ... Cup, 4 ... Exhaust and drainage passage, 4a ... Exhaust and drainage port, 5 ... Inspection opening, 6 ... Baffle plate, 7 ... Cup side wall, 8 ... Cup bottom , 9 ... Rectifying cylinder, 12 ... Spinner shaft, 13 ... Base, 14 ... Motor, 16 ... Chuck, 17 ... Bottom inclined part, 18 ... Bottom vertical part, 19 ... Bottom horizontal part, 20 ... Bottom plate, 21 24 ... support piece, 22 ... discharge port, 25 ... rectifying ring, 26 ... developer recovery pocket, 27 ... tube, 28 ... pump.

Claims (2)

カップ内に基板を保持して回転せしめるチャックを配置し、前記カップ側壁の内側にスカート状裾広がりの整流リングを取り付けた現像装置において、前記整流リングの下端に沿って環状の現像液回収ポケットを設け、整流リングの下端を前記回収ポケット内に臨ませたたことを特徴とする現像装置。In a developing device in which a chuck for holding and rotating a substrate is placed in a cup, and a rectifying ring having a skirt-like hem is attached to the inside of the cup side wall, an annular developer collecting pocket is formed along the lower end of the rectifying ring. A developing device, characterized in that the lower end of the rectifying ring is provided in the collection pocket . 請求項１に記載の現像装置において、前記現像液回収ポケットの底面は回収箇所に向かって傾斜していることを特徴とする現像装置。 2. The developing device according to claim 1, wherein a bottom surface of the developer recovery pocket is inclined toward a recovery location.
JP2001372171A 2001-12-06 2001-12-06 Development device Expired - Fee Related JP3945569B2 (en)

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