JPH0441976Y2 - - Google Patents
Info
- Publication number
- JPH0441976Y2 JPH0441976Y2 JP1985153310U JP15331085U JPH0441976Y2 JP H0441976 Y2 JPH0441976 Y2 JP H0441976Y2 JP 1985153310 U JP1985153310 U JP 1985153310U JP 15331085 U JP15331085 U JP 15331085U JP H0441976 Y2 JPH0441976 Y2 JP H0441976Y2
- Authority
- JP
- Japan
- Prior art keywords
- workpiece
- case
- suction chamber
- spinner
- coating liquid
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000011248 coating agent Substances 0.000 claims description 36
- 238000000576 coating method Methods 0.000 claims description 36
- 239000007788 liquid Substances 0.000 claims description 26
- 239000002904 solvent Substances 0.000 claims description 24
- 239000007789 gas Substances 0.000 description 6
- 239000003595 mist Substances 0.000 description 5
- 229910052787 antimony Inorganic materials 0.000 description 3
- WATWJIUSRGPENY-UHFFFAOYSA-N antimony atom Chemical compound [Sb] WATWJIUSRGPENY-UHFFFAOYSA-N 0.000 description 3
- 238000000034 method Methods 0.000 description 3
- 230000000694 effects Effects 0.000 description 2
- 239000012634 fragment Substances 0.000 description 2
- 239000011261 inert gas Substances 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 238000010521 absorption reaction Methods 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 238000007599 discharging Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 238000005192 partition Methods 0.000 description 1
- 229920002120 photoresistant polymer Polymers 0.000 description 1
Landscapes
- Coating Apparatus (AREA)
Description
【考案の詳細な説明】
（産業上の利用分野）
本考案は半導体ウエハー、金属板、セラミツク
ス、プリント基板或いはガラス板等の被処理物表
面に膜形成用塗布液を塗布する装置に関する。[Detailed Description of the Invention] (Industrial Application Field) The present invention relates to an apparatus for applying a film-forming coating liquid to the surface of a workpiece such as a semiconductor wafer, metal plate, ceramics, printed circuit board, or glass plate.
（従来の技術）
半導体ウエハーなどの被処理物の表面にホトレ
ジスト或いは拡散材を塗布する装置としてスピン
ナーを備えた装置が知られている。(Prior Art) A device equipped with a spinner is known as a device for applying photoresist or a diffusion material to the surface of a workpiece such as a semiconductor wafer.
この塗布装置は上方が開放された筒状ケース内
にスピンナーを配置し、このスピンナー上面に被
処理物を載置するとともにスピンナー上面に形成
した真空引き用の溝で被処理物を吸着し、スピン
ナーの回転によつて被処理物を一体的に回転せし
め、この回転に伴う遠心力で、上方のノズルから
滴下した塗布液を、被処理物表面に均一に広げる
ようにしたものである。 In this coating device, a spinner is placed in a cylindrical case with an open top, and the workpiece is placed on top of the spinner, and the workpiece is sucked by a vacuum groove formed on the top of the spinner. The object to be treated is rotated integrally by the rotation of the , and the centrifugal force accompanying this rotation causes the coating liquid dropped from the upper nozzle to be spread uniformly over the surface of the object to be treated.
ここで、被処理物表面に滴下された塗布液の一
部は遠心力によつて被処理物表面から飛散し、そ
の一部は気化或いは霧化してケース内及び被処理
物上方に浮遊する。そして、被処理物から飛散し
た塗布液或いは気化又は霧化した塗布液がケース
内壁に付着し、塗布液の溶媒が蒸発すると、ケー
ス内壁に溶質が析出し、これが累積すると溶質片
が舞つて被処理物表面に落下し、ピンホール或い
は突起物を形成することになる。 Here, a part of the coating liquid dropped onto the surface of the object to be processed is scattered from the surface of the object to be processed by centrifugal force, and a part of it is vaporized or atomized and floats inside the case and above the object to be processed. Then, the coating liquid scattered from the object to be treated, or the coating liquid that has been vaporized or atomized, adheres to the inner wall of the case, and when the solvent of the coating liquid evaporates, the solute is precipitated on the inner wall of the case, and when this accumulates, solute fragments fly and become coated. It falls onto the surface of the object to be treated, forming pinholes or protrusions.
そこで従来にあつては、ケース内壁に沿つて溶
剤を流下せしめるとともに、ケース内を真空装置
等につながる吸引室とし、気化又は霧化した塗布
液を外部に排出するようにしている。 Therefore, in the past, the solvent was allowed to flow down along the inner wall of the case, and the inside of the case was made into a suction chamber connected to a vacuum device, etc., and the vaporized or atomized coating liquid was discharged to the outside.
（考案が解決しようとする問題点）
上述した如くケース内壁に付着した塗布液は、
ケース内壁に沿つて流下する溶剤によつて洗い流
されて排出することができるのであるが、洗い流
された溶剤（塗布液を含む）はケース底部の溜り
部に一旦溜り、その後底部に形成された排出口に
流れ込み排出されるため、排出される過程で揮発
が進行し、溶質が析出してしまうこととなる。そ
こで前述した如くこの溶質片が同じく被処理物表
面に舞い落ち、ピンホール等の原因となつてい
た。(Problem to be solved by the invention) As mentioned above, the coating liquid that adheres to the inner wall of the case is
The solvent that flows down along the inner wall of the case can be washed away and discharged, but the washed away solvent (including the coating solution) temporarily collects in a pool at the bottom of the case, and then drains away at the drain formed at the bottom. Since it flows into the outlet and is discharged, volatilization progresses during the discharge process and the solute is precipitated. Therefore, as described above, these solute fragments also fall onto the surface of the object to be treated, causing pinholes and the like.
（問題点を解決するための手段）
上記問題点を解決すべく本考案は、ケース内の
吸引室と溶剤の溜り部との間に、両者の連通を確
保しながらも両者を仕切るガイド部をケース壁板
から突出形成し、このガイド部によつて溜り部内
に流入した溶剤等の揮発を防止するようにした。(Means for Solving the Problems) In order to solve the above problems, the present invention provides a guide part between the suction chamber and the solvent reservoir in the case, which partitions the two while ensuring communication between the two. The guide portion is formed to protrude from the case wall plate, and the guide portion prevents the solvent, etc. that has flowed into the reservoir portion from volatilizing.
（実施例）
以下に本考案の実施例を添付図面に基いて説明
する。(Example) An example of the present invention will be described below based on the accompanying drawings.
第１図は本考案に係る塗布装置の縦断面図、第
２図は同塗布装置の平面図であり、塗布装置のケ
ース１は上板２、壁板３及び底板４から構成さ
れ、上板２及び底板４の中央には円孔５，６が形
成され、底板４の円孔６の周囲には突部７が形成
され、この突部７上にスピンナーガイド８が取付
けられ、このスピンナーガイド８によつて形成さ
れる空間に下方からスピンナー９が臨んでいる。
スピンナー９はモータ１０によつて回転せしめら
れるとともに、その上部は大径部とされ、上面に
は第３図に示す如く同心円状の多数の真空引き用
の溝１１及びこれら溝１１をつなぐ十字状の真空
引き用の溝１２が穿設されている。 FIG. 1 is a longitudinal cross-sectional view of a coating device according to the present invention, and FIG. 2 is a plan view of the same coating device. 2 and the bottom plate 4 are formed with circular holes 5 and 6, and a protrusion 7 is formed around the circular hole 6 of the bottom plate 4, and a spinner guide 8 is mounted on this protrusion 7. A spinner 9 faces the space formed by the spinner 8 from below.
The spinner 9 is rotated by a motor 10, and its upper part has a large diameter part, and the upper surface has a number of concentric vacuum grooves 11 and a cross shape connecting these grooves 11, as shown in FIG. A groove 12 for vacuuming is provided.
また、上板２の下部には径方向外方に向つて下
方に下がる壁部１３を形成し、この壁部１３によ
つて真空ポンプとつながる排気通路１４を画成
し、この排気通路１４と壁板３及び壁部１３間に
形成される吸引室１５とを孔１６によつて連通し
ている。 Further, a wall portion 13 is formed at the lower part of the upper plate 2 and extends downward in the radial direction, and this wall portion 13 defines an exhaust passage 14 connected to a vacuum pump. A suction chamber 15 formed between the wall plate 3 and the wall portion 13 is communicated with each other through a hole 16 .
また、上板２の円孔５にはリング部材１７を嵌
着している。このリング部材１７の下部はスカー
ト部１７ａとされ、このスカート部１７ａは前記
吸引室１５に垂下し、スピンナーガイド８上面と
スカート部１７ａ下端との間の隙間を絞つてい
る。。 Further, a ring member 17 is fitted into the circular hole 5 of the upper plate 2. The lower part of the ring member 17 is a skirt portion 17a, which hangs down into the suction chamber 15 and narrows the gap between the upper surface of the spinner guide 8 and the lower end of the skirt portion 17a. .
更に、壁板３の下部にはケース内方に向つて突
出するガイド部１８を一体的に形成し、このガイ
ド部１８上面を傾斜面とし、ガイド部１８の内端
部と前記突部７外周部との間に溶剤等（塗布液を
含む）の流入口１９を形成している。そして、ガ
イド部１８の下面と底板４の上面との間には溶剤
等の溜り部２０を形成し、この溜り部20内に流入
した溶剤等を排出口２１及びパイプ２２を介して
回収するようにしている。尚、ガイド部１８上面
を傾斜面としたのは溶剤を速やかに溜り部２０内
に導く為である。 Furthermore, a guide portion 18 that protrudes inward of the case is integrally formed at the lower part of the wall plate 3, and the upper surface of this guide portion 18 is an inclined surface, and the inner end of the guide portion 18 and the outer periphery of the protrusion 7 are formed integrally. An inlet 19 for a solvent or the like (including a coating liquid) is formed between the two parts. A reservoir 20 for the solvent or the like is formed between the lower surface of the guide section 18 and the upper surface of the bottom plate 4, and the solvent or the like that has flowed into the reservoir 20 is collected through the outlet 21 and the pipe 22. I have to. Note that the reason why the upper surface of the guide portion 18 is an inclined surface is to quickly guide the solvent into the reservoir portion 20.
一方、上板２には溶剤の供給源とつながる溶剤
の流路２３及びN2ガス等の不活性ガス源につな
がるガス通路２４が穿設され、溶剤の流路２３は
壁部１３に嵌め込んだノズル２３ａに接続され、
ノズル２３ａから壁部１３表面に溶剤を供給する
ようにしている。またガス通路２４はガス噴出孔
２５につながつており、このガス噴出孔２５は周
方向に等間隔で多数設けられ、且つガス噴出孔２
５の向きは塗布液の滴下ノズル２６の上方に向い
ており、スピンナー９に吸着された被処理物Ｗ上
方の雰囲気を例えばN2に富んだものとし、塗布
液がアンチモンを含むものであるような場合に、
アンチモンは空気中の水分と接触すると変質する
ので、空気中の水分を少なくし、吸湿防止を図つ
ている。 On the other hand, the upper plate 2 is provided with a solvent passage 23 connected to a solvent supply source and a gas passage 24 connected to an inert gas source such as N2 gas, and the solvent passage 23 is fitted into the wall 13. It is connected to the nozzle 23a,
The solvent is supplied to the surface of the wall portion 13 from the nozzle 23a. Further, the gas passage 24 is connected to gas ejection holes 25, and a large number of gas ejection holes 25 are provided at equal intervals in the circumferential direction.
5 faces above the coating liquid dripping nozzle 26, and the atmosphere above the workpiece W adsorbed by the spinner 9 is rich in N2 , for example, and the coating liquid contains antimony. To,
Antimony deteriorates when it comes into contact with moisture in the air, so efforts are being made to reduce moisture in the air and prevent moisture absorption.
また、底板４にも溶剤の供給源とつながる溶剤
の流路２７が穿設され、この流路２７はスピンナ
ーガイド８に穿設された溶剤の噴出流路２８に連
通し、この噴出流路２８から噴出した溶剤によつ
て被処理物Ｗの外周部下面に廻り込んだ塗布液を
除去し、戻り流路２９を通つて溶剤の溜り部２０
内に流入するようにしている。 Further, a solvent flow path 27 connected to a solvent supply source is also formed in the bottom plate 4, and this flow path 27 communicates with a solvent jet flow path 28 formed in the spinner guide 8. The coating liquid that has gone around the lower surface of the outer periphery of the workpiece W is removed by the solvent spouted from the
I'm trying to make it flow inside.
以上の如き構成からなる塗布装置の作用を以下
に述べる。 The operation of the coating device constructed as above will be described below.
先ず、スピンナー９の上面に被処理物Ｗを載置
し、真空引きして被処理物Ｗをスピンナー９上面
に吸着する。次いで滴下ノズル２６から塗布液を
被処理物Ｗの中心に滴下する。このとき、被処理
物Ｗ上方の雰囲気は噴出孔２５からの不活性ガ
ス、例えばN2ガスによつて水分の少ない雰囲気
となつているため、例えば塗布液がアンチモンを
含むような場合であつても塗布液が吸湿すること
がない。 First, the workpiece W is placed on the upper surface of the spinner 9, and vacuum is applied to attract the workpiece W to the upper surface of the spinner 9. Next, the coating liquid is dropped from the dropping nozzle 26 onto the center of the object W to be processed. At this time, the atmosphere above the workpiece W is low in moisture due to the inert gas, such as N 2 gas, coming from the jet hole 25, so that, for example, in the case where the coating liquid contains antimony, Also, the coating solution does not absorb moisture.
そして、被処理物Ｗ上に塗布液を滴下するとと
もに、モータ１０によつてスピンナー９を回転せ
しめ、スピンナー９と一体的に被処理物Ｗを回転
せしめ、この回転に伴なう遠心力で塗布液を被処
理物Ｗ表面に均一に広げる。 Then, the coating liquid is dropped onto the workpiece W, and the spinner 9 is rotated by the motor 10, the workpiece W is rotated integrally with the spinner 9, and the centrifugal force accompanying this rotation is used to coat the workpiece W. Spread the liquid uniformly on the surface of the object W to be processed.
ここで、被処理物Ｗ上に滴下された塗布液の一
部は遠心力によつて飛散し、吸引室１５の内壁に
付着する。しかしながら吸引室１５の内壁にはノ
ズル２３ａからの溶剤が流下しているため、飛散
して付着した塗布液は、この溶剤中に溶け込み、
吸引室１５の内壁及びガイド部１８の上面をつた
つて溜り部２０内に流れ込み、この溜り部２０か
ら排出口２１及びパイプ２２を介して回収され
る。ここで溜り部２０の上方はガイド部１８で略
覆われて流入口１９が狭くなつている為、溶剤等
はその排出過程で揮発しにくくなつている。 Here, a part of the coating liquid dropped onto the workpiece W is scattered by centrifugal force and adheres to the inner wall of the suction chamber 15. However, since the solvent from the nozzle 23a is flowing down on the inner wall of the suction chamber 15, the coating liquid that has scattered and adhered will dissolve into this solvent.
It flows into the reservoir section 20 through the inner wall of the suction chamber 15 and the upper surface of the guide section 18, and is collected from the reservoir section 20 via the discharge port 21 and the pipe 22. Here, the upper part of the reservoir part 20 is substantially covered by the guide part 18 and the inlet port 19 is narrowed, so that the solvent etc. are difficult to volatilize during the discharge process.
また、滴下された塗布液の一部はミスト状とな
つて吸引室１５内及び被処理物Ｗ上方に飛散す
る。ここで、前記リング部材１７のスカート部１
７ａは吸引室１５内に垂下しているため、吸引室
１５内に飛散したミスト状塗布液は被処理物Ｗ上
方に流れることはなく、また垂下するスカート部
１７ａは、スピンナーガイド８上面とスカート部
１７ａ下端との間の隙間を絞つているため、被処
理物Ｗ上方に舞い上がつたミスト状塗布液は該隙
間を介して強制的に吸引室１５内に吸引され、ミ
スト状塗布液はいずれも孔１６を介して排気通路
１４内に吸引されて外部に排出されるので、被処
理物Ｗ表面にミスト状塗布液が落下することがな
い。 Further, a part of the dropped coating liquid becomes a mist and scatters inside the suction chamber 15 and above the object W to be processed. Here, the skirt portion 1 of the ring member 17
7a hangs down inside the suction chamber 15, the mist coating liquid scattered inside the suction chamber 15 does not flow above the workpiece W, and the hanging skirt part 17a is connected to the upper surface of the spinner guide 8 and the skirt. Since the gap between the lower end of the part 17a and the lower end of the part 17a is narrowed, the mist coating liquid that has risen above the workpiece W is forcibly sucked into the suction chamber 15 through the gap, and the mist coating liquid is Since both are sucked into the exhaust passage 14 through the hole 16 and discharged to the outside, the mist coating liquid does not fall onto the surface of the object W to be processed.
更に、被処理物Ｗ表面に広がつた塗布液の一部
は被処理物Ｗの周縁から下面に廻り込むが、この
廻り込んだ塗布液は噴出流路２８から噴出する溶
剤によつて除去される。 Further, a part of the coating liquid that has spread on the surface of the object W to be treated goes around from the periphery of the object W to the lower surface, but this coating liquid that has gone around is removed by the solvent jetted out from the jetting channel 28. Ru.
（考案の効果）
以上に説明したように、本考案によれば溜り部
の上にガイド部を設け、吸引室と溜り部とを連通
する流入口を狭くしているので、溜り部内に流下
流入した溶剤等が外部に排出される過程で揮発し
にくく、つまり溶質が析出しにくくなり、溶質片
の飛散によつて生ずる弊害が防止でき、被処理物
の歩留りの向上が図れる。(Effect of the invention) As explained above, according to the invention, the guide part is provided above the pool part, and the inflow port that communicates the suction chamber and the pool part is narrowed, so that the flow can flow into the pool part. During the process of discharging the solvent, etc., it is difficult to volatilize, that is, the solute is difficult to precipitate, and the adverse effects caused by the scattering of solute pieces can be prevented, and the yield of the processed material can be improved.
第１図は本考案に係る塗布装置の縦断面図、第
２図は同塗布装置の平面図、第３図はスピンナー
の斜視図である。
尚、図面中１はケース、２は上板、３は壁板、
４は底板、９はスピンナー、１５は吸引室、１８
はガイド部、１９は流入口、２０は溜り部、Ｗは
被処理部材である。
FIG. 1 is a longitudinal sectional view of a coating device according to the present invention, FIG. 2 is a plan view of the coating device, and FIG. 3 is a perspective view of a spinner. In addition, in the drawing, 1 is the case, 2 is the upper plate, 3 is the wall plate,
4 is the bottom plate, 9 is the spinner, 15 is the suction chamber, 18
19 is a guide portion, 19 is an inlet, 20 is a reservoir portion, and W is a member to be processed.
Claims (1)
被処理物Ｗを載置し、スピンナー９にて被処理
物Ｗを回転せしめることで被処理物Ｗ表面にノ
ズル２６から滴下した塗布液を遠心力で被処理
物Ｗ表面に均一に広げるようにした塗布装置に
おいて、前記ケース１内には吸引室１５が形成
され、この吸引室１５の上方の壁部１３にはこ
の壁部１３を隔てて排気通路１４へ連通する孔
１６が形成され、吸引室１５の下方には前記ケ
ース１を構成する壁板３から前記ケース１内方
に向かつて突出するガイド部１８が設けられ、
このガイド部１８と前記ケース１を構成する底
板４との間に前記吸引室１５と連通する溶剤の
溜り部２０を形成したことを特徴とする塗布装
置。 ２ 前記ガイド部１８の上面を傾斜面としたこと
を特徴とする実用新案登録請求の範囲第１項記
載の塗布装置。[Claims for Utility Model Registration] 1. A workpiece W is placed on a spinner 9 facing from below in the case 1, and by rotating the workpiece W with the spinner 9, a nozzle 26 is formed on the surface of the workpiece W. In this coating device, a coating liquid dropped from a container is uniformly spread over the surface of a workpiece W by centrifugal force.A suction chamber 15 is formed in the case 1, and a wall 13 above the suction chamber 15 has a A hole 16 communicating with the exhaust passage 14 is formed across the wall portion 13, and a guide portion 18 protruding toward the inside of the case 1 from the wall plate 3 constituting the case 1 is provided below the suction chamber 15. provided,
A coating device characterized in that a solvent reservoir 20 communicating with the suction chamber 15 is formed between the guide portion 18 and the bottom plate 4 constituting the case 1. 2. The coating device according to claim 1, wherein the upper surface of the guide portion 18 is an inclined surface.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1985153310U JPH0441976Y2 (en) | 1985-10-07 | 1985-10-07 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1985153310U JPH0441976Y2 (en) | 1985-10-07 | 1985-10-07 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6262870U JPS6262870U (en) | 1987-04-18 |
| JPH0441976Y2 true JPH0441976Y2 (en) | 1992-10-02 |
Family
ID=31072077
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1985153310U Expired JPH0441976Y2 (en) | 1985-10-07 | 1985-10-07 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0441976Y2 (en) |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5990928A (en) * | 1982-11-16 | 1984-05-25 | Dainippon Screen Mfg Co Ltd | Rotary type surface treatment apparatus |
-
1985
- 1985-10-07 JP JP1985153310U patent/JPH0441976Y2/ja not_active Expired
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5990928A (en) * | 1982-11-16 | 1984-05-25 | Dainippon Screen Mfg Co Ltd | Rotary type surface treatment apparatus |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6262870U (en) | 1987-04-18 |
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