JP3934286B2 - Substrate transfer apparatus and substrate processing apparatus - Google Patents

Abstract

PROBLEM TO BE SOLVED: To reduce a flowout of processing liquid for performing a treatment by forming the layer of the processing liquid on a substrate in a conveyance configuration using rollers. SOLUTION: This roller mechanism conveys a substrate 8 using a plurality of rotating members 111. Supporting rollers 113 are disposed so as to be not in contact with both end parts of the substrate 8 on the sides vertical relative to a transfer direction 11A. Also, the substrate is disposed so that both end parts of the substrate 8 on the transfer direction 11A side do not ride on any supporting roller 113 at a stop position of the substrate 8. Thus the processing liquid put on the substrate 8 can be suppressed from flowing out along the supporting rollers 113.

Description

[0001]
BACKGROUND OF THE INVENTION
The present invention relates to a substrate processing apparatus for forming a processing liquid layer on various substrates such as a glass substrate for a liquid crystal display and a plasma display, a semiconductor substrate for manufacturing a semiconductor device, and a printed circuit board on which wiring is formed, and a substrate processing apparatus. The present invention relates to a substrate transfer device used in a substrate processing apparatus.
[0002]
[Prior art]
Conventionally, when a glass substrate used for manufacturing a liquid crystal display is transported, a method of transporting the substrate using a roller that supports an end surface of the substrate has been used. FIG. 10 is a diagram showing an example of one rotating member 9 in which two end surface support rollers 92 and a central support roller 93 are provided on the rotating shaft 91. Such a rotating member 9 is in the transport direction of the substrate 8 (FIG. 10). 10, a roller mechanism for transporting the substrate 8 is configured by being arranged in a large number along the direction perpendicular to the paper surface.
[0003]
In the case of the rotating member 9 shown in FIG. 10, when transporting the substrate 8, the two end surface support rollers 92 support the both end portions 81 of the substrate 8 from below, and the flange portions 921 of the end surface support roller 92 are the end surfaces of the substrate 8. Regulate the position of That is, both end surfaces of the substrate 8 positioned in a direction perpendicular to the transport direction are in contact with the flange portion 921, thereby positioning the substrate 8 in a direction perpendicular to the transport direction.
[0004]
[Problems to be solved by the invention]
However, depending on the type of processing, such a substrate support method may adversely affect the substrate processing. For example, when developing with the developer applied on the substrate 8 using surface tension, the developer may spill from the end portion 81 of the substrate 8 through the end surface support roller 92 as indicated by an arrow 811. . The same applies to the case where other processing liquids used for etching, resist peeling, cleaning, etc. are deposited on the substrate 8.
[0005]
Further, when the substrate 8 is supported by the end surface support roller 92, there arises a problem that the substrate 8 bends due to gravity and a reaction force from the roller. In FIG. 10, a central support roller 93 is provided below the center of the substrate 8 in order to alleviate the bending. However, even in such a configuration, if the contact area between the central support roller 93 and the substrate 8 is small, end surface support is provided. The substrate 8 bends downward between the roller 92 and the center support roller 93.
[0006]
Therefore, when processing is performed while forming a layer of the processing liquid on the substrate 8, the processing liquid moves according to the bending of the substrate 8, and the layer of the processing liquid 82 is partially thick as shown in FIG. Become. As a result, there arises a problem that in the region where the processing liquid 82 is collected, the processing liquid 82 spills from the end surface on the transport direction side of the substrate 8 as indicated by an arrow 812.
[0007]
On the other hand, depending on the positional relationship between the substrate 8 and the rotating member 9 when the substrate 8 stops on the transport path, the processing liquid on the substrate 8 may flow down along the roller. FIG. 11 is a diagram illustrating such a state, in which the substrate 8 is transported in a state where the end portion 84 on the side of the transport direction 83 (the direction from the left to the right of the paper surface) of the substrate 8 is located on the rotating member 9. Shows a state where has stopped. In the state shown in FIG. 11, the treatment liquid 82 on the substrate 8 is conveyed not only on the end surface support roller 92 of the rotating member 9 but also on the center support roller 93 as indicated by an arrow 813 on the end 84 (conveyance side). The same applies to the end opposite to the direction.)
[0008]
In addition to the rollers, there are other factors that cause the processing liquid to flow out in the processing of depositing the processing liquid on the substrate. FIG. 12 is a diagram illustrating a state in which the processing liquid 82 on the substrate 8 is spilled by the contact sensor 94. In addition, illustration of the rotation member 9 is abbreviate | omitted in FIG. As shown in FIG. 12, when the substrate 8 is transported in the transport direction 83, the end portion 84 on the transport direction side of the substrate 8 contacts the pendulum 941 of the contact sensor 94, thereby transporting the substrate 8. When stopped, the substrate 8 and the pendulum 941 remain in contact with each other. As a result, the treatment liquid 82 spills down from the end portion 84 along the pendulum 941 as indicated by an arrow 814.
[0009]
As described above, conventionally, when processing is performed while forming a layer of processing liquid (so-called paddle) on a substrate, the processing liquid spills due to various causes when the substrate is transferred by a roller. There was a problem that the layer of the treatment liquid could not be maintained. That is, when carrying out such processing, it has not been possible to use a conveyance form using rollers.
[0010]
However, the roller conveyance can stably convey the substrate and is also used in other processing apparatuses, and the processing performed by forming a layer of the processing liquid on the substrate reduces the consumption of the processing liquid. Since it has the advantage that it can be performed, there is an increasing demand for realizing a process for forming a layer of a processing solution on a substrate on a roller mechanism.
[0011]
Accordingly, the present invention has been made in view of the above-described various problems, and an object thereof is to reduce the outflow of the processing liquid on the substrate in a transport mode using a roller.
[0012]
[Means for Solving the Problems]
The invention according to claim 1 is a substrate transport apparatus for transporting a substrate in a horizontal posture in which a layer of a processing solution is formed on the upper surface, and is provided on each of a plurality of rotating members arranged in the transport direction , with respect to the transport direction. contactless der to both ends of the substrate in the vertical direction Te is, a plurality of cylindrical roller, a roller mechanism which supports while line contact with said substrate a layer of treatment liquid has been formed on the upper surface from the lower Driving the roller mechanism to drive the substrate in the transport direction; and supporting the substrate from below by the roller mechanism and transporting the substrate in the transport direction by a predetermined distance; and a control means for controlling said drive means so as to stop the substrate for a predetermined time at a stop position without the positioned either of the rollers below the leading end and the trailing end of the substrate in the conveying direction The stop position is a position such as to be located in a region other than a predetermined margin from the area between the centers of the rotating members leading and trailing ends of the substrate are adjacent to each other.
[0015]
Invention of Claim 2 is a board | substrate conveyance apparatus of Claim 1 , Comprising: The contact-type sensor which detects the position of the said board | substrate by contacting the front-end | tip of the said board | substrate conveyed by the said drive means is further provided, The stop position is a position that has passed a position where the contact sensor and the tip of the substrate are in contact with each other.
[0016]
The invention according to claim 3 is a substrate processing apparatus for performing processing on the substrate while forming a layer of processing liquid on the upper surface of the substrate in a horizontal position, and supplying the processing liquid to the upper surface of the substrate to process the upper surface. a treatment liquid supply means for forming a layer of liquid, provided on each of the plurality of rotary members which are arranged in the conveying direction, Ri contactless der to both ends of the substrate in the vertical direction relative to the conveying direction, a cylindrical shape conveying a plurality of rollers by the treatment liquid roller mechanism which supports while contacting line of the substrate a layer of treatment liquid has been formed on the upper surface thereof from below by a supply means, said substrate by driving the roller mechanism the Driving means for transporting in the direction, and transporting the substrate by a predetermined distance in the transport direction while supporting the substrate from below by the roller mechanism, and then below the front and rear ends of the substrate in the transport direction. Izu Control means for controlling the driving means so as to stop the substrate for a predetermined time at a stop position where no roller is located, and the stop position is such that the front end and the rear end of the substrate are adjacent to each other. The position is such that it is located in a region excluding a predetermined margin from the region between the centers of the rotating members .
According to a fourth aspect of the present invention, there is provided the substrate processing apparatus according to the third aspect, further comprising a contact-type sensor that detects a position of the substrate by contacting a tip of the substrate conveyed by the driving unit. The stop position is a position that has passed a position where the contact sensor and the tip of the substrate are in contact with each other.
[0017]
DETAILED DESCRIPTION OF THE INVENTION
FIG. 1 is a longitudinal sectional view showing a simplified configuration of a substrate processing apparatus 1 according to an embodiment of the present invention. The substrate processing apparatus 1 is an apparatus that performs development processing on a rectangular glass substrate (hereinafter referred to as “substrate”) 8 used in a liquid crystal display, and a roller mechanism 11 that conveys the substrate 8 in the direction of an arrow 11A using a roller. The contact type sensor 12 for detecting the position of the substrate 8 to be transported, the nozzle 21 for discharging the processing liquid 82 as a developing solution and supplying it to the substrate 8, the collection container 22 for collecting the used developing solution, A processing chamber (chamber) 23 that forms a processing space and a control unit 31 that controls the operation of the apparatus 1 are provided. The substrate processing apparatus 1 may be regarded as a configuration in which the substrate transport device having the roller mechanism 11, the contact sensor 12 and the control unit 31 and the processing unit having the nozzle 21, the recovery container 22 and the control unit 31 are combined. it can.
[0018]
The roller mechanism 11 is a mechanism that forms a transport path of the substrate 8 by arranging a plurality of rotating members 111 having rollers in the transport direction, and some of the plurality of rotating members 111 are motors (reference numerals in FIG. 7 described later). 13), the substrate 8 on the rotating member 111 is conveyed in the direction of the arrow 11A.
[0019]
FIG. 2 is a diagram showing a state in which one of the plurality of rotating members 111 constituting the roller mechanism 11 is viewed from the conveying direction side, and FIG. 3 is a direction of an arrow 11A in a horizontal posture on the plurality of rotating members 111. It is a figure which shows a mode that the board | substrate 8 (it shows with an imaginary line) which moves to (3) was seen from upper direction. As shown in FIG. 2, the rotating member 111 has a configuration in which three supporting rollers 113 are provided on a rotating shaft 112, and each supporting roller 113 has a cylindrical shape with the rotating shaft 112 as a central axis. Accordingly, each support roller 113 is in line contact with the lower surface of the substrate 8.
[0020]
In the substrate processing apparatus 1, the support roller 113 has a cylindrical shape, thereby increasing the contact area with the lower surface of the substrate 8 and reducing the stress generated in the substrate 8. As a result, as shown in FIG. 10, the substrate 8 is prevented from being greatly bent, and the outflow of the processing liquid 82 due to the biasing of the processing liquid 82 on the substrate 8 is prevented as much as possible.
[0021]
Further, these support rollers 113 are located on the inner side of both end portions 81 (see FIG. 2) of the substrate 8 with respect to the direction perpendicular to the conveyance direction of the substrate 8. That is, the end surface of the substrate 8 is not positioned on the support roller 113. Therefore, the processing liquid 82 on the substrate 8 does not flow down from the both ends 81 along the support roller 113.
[0022]
The contact sensor 12 shown in FIG. 1 is arranged on the transport path to detect the position of the substrate 8, and the pendulum 121 of the contact sensor 12 contacts the tip of the substrate 8 that has been transported. As a result, the pendulum 121 is tilted, and the position of the substrate 8 is detected.
[0023]
The nozzle 21 is a slit-type nozzle having a slit extending in a direction perpendicular to the transport direction (that is, a direction perpendicular to the paper surface), and the substrate 8 is transported below the nozzle 21 in the direction indicated by the arrow 11A. Then, the processing liquid 82 is ejected in the form of a curtain to form a processing liquid layer (so-called paddle) on the substrate 8. As described above, the substrate processing apparatus 1 drives the roller mechanism 11 and discharges the processing liquid 82 from the nozzle 21 to form a layer of the processing liquid 82 on the substrate 8, thereby processing the upper surface of the substrate 8. It is like that.
[0024]
The substrate 8 on which the layer of the processing liquid 82 is formed temporarily stops on the roller mechanism 11 based on position detection by the contact sensor 12 (details will be described later), and is left for a predetermined time to perform development processing. Done.
[0025]
The recovery container 22 is a container for recovering the used processing liquid, and the processing liquid 82 on the substrate 8 is recovered from the recovery container 22 by tilting the processed substrate 8 about the axis in the traveling direction on the recovery container 22. It flows down to 22. The substrate 8 from which most of the processing liquid 82 has been removed is conveyed on the roller mechanism 11 while being tilted, and is sent to the processing apparatus of the next process.
[0026]
The processing chamber 23 accommodates the nozzle 21, the recovery container 22, and the like to form the outer shape of the substrate processing apparatus 1, prevents dust from adhering to the substrate 8 during processing, and contaminates the outside of the substrate processing apparatus 1. Play a role in preventing.
[0027]
The control unit 31 is a part that controls the overall operation of the substrate processing apparatus 1. A signal from the contact sensor 12 or the like is input to the control unit 31, drive control of the roller mechanism 11, discharge control of the processing liquid 82 from the nozzle 21, Various controls related to substrate processing such as control of the operation of tilting the substrate 8 are performed.
[0028]
Next, the operation of the substrate processing apparatus 1 will be described. FIG. 4 is a flowchart showing an operation flow of the substrate processing apparatus 1.
[0029]
First, the control unit 31 controls the roller mechanism 11 to carry the substrate 8 from the previous process into the processing chamber 23 from the inlet of the processing chamber 23 (step S11). At this time, the processing liquid 82 is continuously discharged from the nozzle 21, and when the front end of the substrate 8 reaches below the nozzle 21, the processing liquid 82 is sequentially stacked on the upper surface of the substrate 8 from the front end in the transport direction. (Step S12). FIG. 1 is a diagram showing the situation at this time.
[0030]
When the substrate 8 is further transported, as shown in FIG. 5, the end portion 84 of the substrate 8 on the transport direction side contacts the pendulum 121 of the contact sensor 12, and a signal is transmitted from the contact sensor 12 to the control unit 31. (Step S13). Further, the rear end of the substrate 8 passes under the nozzle 21 before and after the detection of the substrate 8 by the contact sensor 12. As a result, the processing liquid 82 is deposited on the entire top surface of the substrate 8 using surface tension.
[0031]
The substrate 8 is further transported, and after the signal is sent from the contact sensor 12 to the control unit 31, the substrate 8 is moved by a predetermined distance, and then the transport of the substrate 8 is stopped (step S14). That is, the stop position of the substrate 8 on the transport path is a position that has passed the position where the contact sensor 12 and the substrate 8 are in contact (FIG. 5). FIG. 6 is a diagram illustrating a state of the substrate 8 when the conveyance is temporarily stopped.
[0032]
When the substrate 8 stops on the transport path, as shown in FIG. 6, the rotating member 111 of the roller mechanism 11 is not positioned below the front end and the rear end of the substrate 8 (that is, the front end and the rear end). The stop position of the substrate 8 is controlled by the control unit 31 (so that the end does not ride on the support roller 113). FIG. 3 already shown shows the positional relationship between the substrate 8 and the rotating member 111 in the state shown in FIG. 6, and when the substrate 8 is stopped as shown in FIG. It will be in the state which does not contact the support roller 113 of this. Therefore, when the substrate 8 is stopped, the processing liquid 82 on the substrate 8 does not flow down along the support roller 113.
[0033]
Further, as shown in FIG. 6, the stop position of the substrate 8 is a position past the position where the contact sensor 12 and the substrate 8 are in contact with each other. Therefore, the pendulum 121 of the contact sensor 12 and the end of the substrate 8 are stopped at the stop position. The portion 84 does not come into contact with the portion 84, and the problem that the processing liquid 82 on the substrate 8 flows down through the pendulum 121 does not occur.
[0034]
The conveyance of the substrate 8 is stopped for a predetermined time (step S15), and during this time, development processing of the upper surface of the substrate 8 proceeds. Thereafter, the substrate 8 is tilted about an axis that faces the traveling direction, and the processing liquid 82 on the substrate 8 is removed and recovered into the recovery container 22 (step S16).
[0035]
When the collection of the treatment liquid 82 is completed, the substrate 8 is carried out of the treatment chamber 23 from the carry-out port in an inclined posture. The board | substrate 8 carried out is guide | induced to the washing | cleaning apparatus of the next process (step S17).
[0036]
FIG. 7 is a view for explaining the positional relationship among the rotating member 111, the contact sensor 12 and the substrate 8 when the substrate 8 is stopped (FIG. 6). In FIG. 7, the end portion 84 on the traveling direction side of the substrate 8 is shown in an enlarged manner, and the motor 13 that is a drive source of the roller mechanism 11 omitted in FIG. 1 is also shown. The motor 13 is connected to several rotating members 111 through gears and belts, and serves as a drive source that applies a rotational force to the rotating member 111.
[0037]
In the above description, when the substrate 8 is stopped, the end portion 84 on the traveling direction side of the substrate 8 is not in contact with any rotating member 111 (supporting roller 113), but strictly speaking, adjacent to each other in FIG. It is located in a region R3 excluding slight margins R1, R2 from the region between the centers of the two rotating members 111a, 111b. This is because if the rotating member 111 and the end portion 84 (end surface) of the substrate 8 are close to each other when the processing liquid 82 is spilled, the processing liquid 82 may flow continuously through the rotating member 111. Because there is.
[0038]
That is, the margins R1 and R2 are determined as distances at which a continuous flow of the processing liquid 82 does not occur between the rotating member 111 even if the processing liquid 82 is spilled due to vibration during conveyance. Thereby, in the stop position of the board | substrate 8 by control of the control part 31, the state that the edge part 84 of the board | substrate 8 and the rotation member 111 contact | abut substantially is avoided. Note that the end opposite to the traveling direction is also located in a region where a slight margin is removed from the region between the two rotating members 111 adjacent to each other in the stopped state. Further, the positional relationship between the pendulum 121 of the contact sensor 12 and the end portion 84 of the substrate 8 at the stop position of the substrate 8 is also a positional relationship that does not substantially contact. Similarly, the positional relationship between the both end portions 81 of the substrate 8 and the support roller 113 in FIG.
[0039]
As described above, in the substrate processing apparatus 1, the support roller 113 is not positioned below both ends of the substrate 8 on the direction side perpendicular to the transport direction, and these both ends are not in contact with the roller mechanism 11 and the substrate 8 is not in contact with the roller mechanism 11. Supported. Therefore, it is possible to minimize the processing liquid 82 from spilling out from both end portions on the side perpendicular to the transport direction.
[0040]
Further, in the substrate processing apparatus 1, when the horizontal substrate 8 on which the processing liquid 82 is piled up stops in the course of transportation, both ends with respect to the transportation direction are not in contact with the rotating member 111. Accordingly, the outer peripheral portion of the substrate 8 is not in contact with all the support rollers 113 at the stop position, and the processing liquid 82 is prevented from flowing out from the outer peripheral portion of the substrate 8 through the support roller 113.
[0041]
In addition, each support roller 113 has a cylindrical shape and is in line contact with the lower surface of the substrate 8, so that bending of the substrate 8 on the roller mechanism 11 is suppressed. Thereby, the uneven distribution of the processing liquid 82 on the substrate 8 is prevented, and the amount of the processing liquid 82 on the substrate 8 spilling from both ends corresponding to the transport direction can be reduced. Further, since the contact area between the substrate 8 and the support roller 113 is large, the substrate 8 can be transported more stably.
[0042]
Further, since the stop position of the substrate 8 is a position that has passed the position where it contacts the contact sensor 12, the amount of the processing liquid 82 on the substrate 8 flowing out through the contact sensor 12 can be minimized. it can.
[0043]
As described above, the substrate processing apparatus 1 can reduce the amount of the processing liquid 82 flowing out from the substrate 8.
[0044]
The substrate processing apparatus 1 according to the present invention has been described above. However, the present invention is not limited to the above-described embodiment, and various modifications can be made.
[0045]
For example, FIG. 2 shows the rotating member 111 having three cylindrical supporting rollers 113 on the rotating shaft 112, but even if one cylindrical supporting roller 113a is provided on the rotating shaft 112 as shown in FIG. Good. Thereby, the bending which arises in the board | substrate 8 can be reduced more. The lower surface of the substrate 8 is appropriately cleaned by a separately provided cleaning means.
[0046]
Further, in the above embodiment, the developing process is performed by depositing the developing solution as the processing liquid 82 on the substrate 8, but the processing to be performed is not limited to the developing process, and etching, resist stripping, Water washing, chemical solution washing, etc. may be used. That is, by appropriately changing the processing liquid to an etching liquid, a resist stripping liquid, pure water, a cleaning chemical liquid, or the like, a substrate processing apparatus that performs these processes can be obtained.
[0047]
In the above embodiment, the treatment liquid 82 is discharged from the nozzle 21 in the form of a curtain and the substrate 8 is transported to form a layer of the treatment liquid 82 on the entire upper surface of the substrate 8. Any method may be used for forming the layer of the treatment liquid 82. For example, after the substrate 8 is positioned at a predetermined stop position, the nozzle 21 may be moved along the transport direction of the substrate 8, or while transporting the substrate 8 using the nozzle 21 as a spray-type nozzle. The nozzle 21 may be swung in a direction perpendicular to the transport direction. That is, the present invention relates to transport of a substrate on which a layer of processing liquid is formed on the upper surface, and the timing at which the layer of processing liquid is formed is when the transport of the substrate is stopped even during the transport of the substrate. Also good.
[0048]
Moreover, although the substrate processing apparatus 1 which processes the glass substrate for liquid crystal displays was taken as an example in the said embodiment, the board | substrate 8 processed may be a glass substrate used for other FPDs, such as PDP, A semiconductor substrate, a printed circuit board, etc. may be sufficient. FIG. 9 is a diagram showing an example of the positional relationship between the semiconductor substrate 8a and the plurality of rotating members 111 at the conveyance stop position. As shown in FIG. 9, the shape of the substrate is not limited to a rectangle, and the present invention can be used by appropriately adjusting the size and position of the support roller 113 even if it is a substantially circular shape or other complicated shapes. be able to.
[0049]
【The invention's effect】
In the invention according to claim 1 or 3 , the outflow amount of the processing liquid on the substrate can be reduced.
[0050]
In the invention according to claim 2 or 4 , the outflow of the processing liquid on the substrate can be further suppressed.
[Brief description of the drawings]
FIG. 1 is a longitudinal sectional view schematically showing a configuration of a substrate processing apparatus according to an embodiment of the present invention.
FIG. 2 is a diagram illustrating a state when a rotating member and a substrate are viewed from a conveyance direction side.
FIG. 3 is a diagram showing a state when a rotating member and a substrate are viewed from above.
FIG. 4 is a flowchart showing an operation flow of the substrate processing apparatus.
FIG. 5 is a diagram showing a state of the substrate processing apparatus in operation at a certain point in time.
FIG. 6 is a diagram showing a state of the substrate processing apparatus in operation at a certain point in time.
FIG. 7 is an enlarged view showing the vicinity of the front end of the substrate in a state where the conveyance of the substrate is stopped.
FIG. 8 is a view showing another form of the support roller.
FIG. 9 is a diagram showing a state when the rotating member and the semiconductor substrate are viewed from the upper side at the conveyance stop position.
FIG. 10 is a diagram showing a form of a conventional rotating member.
FIG. 11 is a diagram showing a positional relationship between a stop position of a substrate and a rotating member in a conventional substrate processing apparatus.
FIG. 12 is a diagram showing a positional relationship between a substrate stop position and a contact sensor in a conventional substrate processing apparatus.
[Explanation of symbols]
DESCRIPTION OF SYMBOLS 1 Substrate processing apparatus 8 and 8a Substrate 11 Roller mechanism 11A Arrow 12 Contact sensor 13 Motor 21 Nozzle 31 Control part 81 End part 82 Treatment liquid 84 End part 113, 113a Support roller

Claims (4)

A substrate transport apparatus for transporting a substrate in a horizontal posture in which a layer of processing liquid is formed on an upper surface,
Respectively provided on the plurality of rotary members which are arranged in the conveying direction, Ri contactless der to both ends of the substrate in the vertical direction relative to the conveying direction, by a plurality of cylindrical roller, the treatment liquid on its upper surface A roller mechanism for supporting the substrate on which the layer is formed while being in line contact from below;
Drive means for transporting the substrate in the transport direction by driving the roller mechanism;
After the substrate is transported by a predetermined distance in the transport direction while supporting the substrate from below by the roller mechanism, the roller mechanism is at a stop position where none of the rollers is positioned below the front end and the rear end of the substrate. Control means for controlling the drive means to stop the substrate for a predetermined time;
Equipped with a,
The substrate transport apparatus according to claim 1, wherein the stop position is a position where a front end and a rear end of the substrate are located in a region excluding a predetermined margin from a region between centers of the rotating members adjacent to each other . The substrate transfer apparatus according to claim 1,
A contact-type sensor that detects the position of the substrate by contacting the tip of the substrate conveyed by the driving means;
Further comprising
The substrate transfer apparatus, wherein the stop position is a position that passes a position where the contact sensor and the tip of the substrate are in contact with each other. A substrate processing apparatus for processing a substrate while forming a layer of a processing solution on an upper surface of the substrate in a horizontal posture,
Treatment liquid supply means for supplying a treatment liquid to the upper surface of the substrate to form a layer of the treatment liquid on the upper surface;
Provided in each of a plurality of rotating members arranged in the transport direction, and not in contact with both ends of the substrate on the side perpendicular to the transport direction, and by the processing liquid supply means by a plurality of cylindrical rollers A roller mechanism for supporting the substrate having a processing liquid layer formed on the upper surface while making linear contact from below;
Drive means for transporting the substrate in the transport direction by driving the roller mechanism;
After the substrate is transported by a predetermined distance in the transport direction while supporting the substrate from below by the roller mechanism, the roller mechanism is at a stop position where none of the rollers is positioned below the front end and the rear end of the substrate. Control means for controlling the drive means to stop the substrate for a predetermined time;
With
The substrate processing apparatus, wherein the stop position is a position where a front end and a rear end of the substrate are located in a region excluding a predetermined margin from a region between centers of the rotating members adjacent to each other. The substrate processing apparatus according to claim 3,
A contact-type sensor that detects the position of the substrate by contacting the tip of the substrate conveyed by the driving means;
Further comprising
The substrate processing apparatus, wherein the stop position is a position past a position where the contact sensor and the tip of the substrate are in contact with each other.

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