JP3925882B2 - ポジ型感光性樹脂組成物 - Google Patents
ポジ型感光性樹脂組成物 Download PDFInfo
- Publication number
- JP3925882B2 JP3925882B2 JP14768998A JP14768998A JP3925882B2 JP 3925882 B2 JP3925882 B2 JP 3925882B2 JP 14768998 A JP14768998 A JP 14768998A JP 14768998 A JP14768998 A JP 14768998A JP 3925882 B2 JP3925882 B2 JP 3925882B2
- Authority
- JP
- Japan
- Prior art keywords
- group
- acid
- photosensitive resin
- resin composition
- positive photosensitive
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 0 CC(CCC(OC(C)(C)C)=O)C(CCC1C(C(C2)C(*)(CCC(C3)O)C3C3)C3O)C1(C)C2O Chemical compound CC(CCC(OC(C)(C)C)=O)C(CCC1C(C(C2)C(*)(CCC(C3)O)C3C3)C3O)C1(C)C2O 0.000 description 1
Landscapes
- Materials For Photolithography (AREA)
- Compositions Of Macromolecular Compounds (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP14768998A JP3925882B2 (ja) | 1998-05-28 | 1998-05-28 | ポジ型感光性樹脂組成物 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP14768998A JP3925882B2 (ja) | 1998-05-28 | 1998-05-28 | ポジ型感光性樹脂組成物 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JPH11338152A JPH11338152A (ja) | 1999-12-10 |
| JPH11338152A5 JPH11338152A5 (enExample) | 2005-02-24 |
| JP3925882B2 true JP3925882B2 (ja) | 2007-06-06 |
Family
ID=15436061
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP14768998A Expired - Fee Related JP3925882B2 (ja) | 1998-05-28 | 1998-05-28 | ポジ型感光性樹脂組成物 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP3925882B2 (enExample) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2002006483A (ja) * | 2000-06-20 | 2002-01-09 | Sumitomo Chem Co Ltd | フォトレジスト組成物 |
| KR100642416B1 (ko) * | 2004-08-31 | 2006-11-03 | 주식회사 하이닉스반도체 | 상부 반사방지막 조성물 및 이를 이용한 반도체 소자의패턴 형성 방법 |
| KR100745064B1 (ko) * | 2004-09-17 | 2007-08-01 | 주식회사 하이닉스반도체 | 상부 반사방지막 조성물 및 이를 이용한 반도체 소자의패턴 형성 방법 |
-
1998
- 1998-05-28 JP JP14768998A patent/JP3925882B2/ja not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| JPH11338152A (ja) | 1999-12-10 |
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