JP3922673B2 - ポジ型感光性樹脂組成物及びパターン形成方法 - Google Patents

ポジ型感光性樹脂組成物及びパターン形成方法 Download PDF

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Publication number
JP3922673B2
JP3922673B2 JP25005098A JP25005098A JP3922673B2 JP 3922673 B2 JP3922673 B2 JP 3922673B2 JP 25005098 A JP25005098 A JP 25005098A JP 25005098 A JP25005098 A JP 25005098A JP 3922673 B2 JP3922673 B2 JP 3922673B2
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Japan
Prior art keywords
group
photosensitive resin
resin composition
positive photosensitive
acid
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Expired - Lifetime
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JP25005098A
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English (en)
Japanese (ja)
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JP2000010287A5 (enrdf_load_stackoverflow
JP2000010287A (ja
Inventor
保雅 河辺
健一郎 佐藤
利明 青合
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Fujifilm Corp
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Fujifilm Corp
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Publication date
Application filed by Fujifilm Corp filed Critical Fujifilm Corp
Priority to JP25005098A priority Critical patent/JP3922673B2/ja
Priority to KR1019990014184A priority patent/KR100601078B1/ko
Priority to EP99107339.6A priority patent/EP0952489B1/en
Priority to US09/295,329 priority patent/US6806022B1/en
Publication of JP2000010287A publication Critical patent/JP2000010287A/ja
Priority to US10/315,182 priority patent/US6846610B2/en
Publication of JP2000010287A5 publication Critical patent/JP2000010287A5/ja
Application granted granted Critical
Publication of JP3922673B2 publication Critical patent/JP3922673B2/ja
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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  • Materials For Photolithography (AREA)
JP25005098A 1998-04-22 1998-09-03 ポジ型感光性樹脂組成物及びパターン形成方法 Expired - Lifetime JP3922673B2 (ja)

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP25005098A JP3922673B2 (ja) 1998-04-22 1998-09-03 ポジ型感光性樹脂組成物及びパターン形成方法
KR1019990014184A KR100601078B1 (ko) 1998-04-22 1999-04-21 포지티브 감광성 수지 조성물
EP99107339.6A EP0952489B1 (en) 1998-04-22 1999-04-21 Positive photosensitive resin composition
US09/295,329 US6806022B1 (en) 1998-04-22 1999-04-21 Positive photosensitive resin composition
US10/315,182 US6846610B2 (en) 1998-04-22 2002-12-10 Positive photosensitive resin composition

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP11221998 1998-04-22
JP10-112219 1998-04-22
JP25005098A JP3922673B2 (ja) 1998-04-22 1998-09-03 ポジ型感光性樹脂組成物及びパターン形成方法

Publications (3)

Publication Number Publication Date
JP2000010287A JP2000010287A (ja) 2000-01-14
JP2000010287A5 JP2000010287A5 (enrdf_load_stackoverflow) 2005-02-24
JP3922673B2 true JP3922673B2 (ja) 2007-05-30

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Application Number Title Priority Date Filing Date
JP25005098A Expired - Lifetime JP3922673B2 (ja) 1998-04-22 1998-09-03 ポジ型感光性樹脂組成物及びパターン形成方法

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JP (1) JP3922673B2 (enrdf_load_stackoverflow)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3802732B2 (ja) * 2000-05-12 2006-07-26 信越化学工業株式会社 レジスト材料及びパターン形成方法
JP2002006483A (ja) * 2000-06-20 2002-01-09 Sumitomo Chem Co Ltd フォトレジスト組成物
JP2002097219A (ja) * 2000-09-21 2002-04-02 Sumitomo Chem Co Ltd 金属含量の低減されたポリ（メタ）アクリレート類の製造方法
JP4190167B2 (ja) * 2000-09-26 2008-12-03 富士フイルム株式会社 ポジ型レジスト組成物
JP4199914B2 (ja) * 2000-11-29 2008-12-24 富士フイルム株式会社 ポジ型レジスト組成物
JP4225699B2 (ja) 2001-03-12 2009-02-18 富士フイルム株式会社 ポジ型感光性組成物
EP1324134B1 (en) * 2001-12-27 2010-10-20 Shin-Etsu Chemical Co., Ltd. Resist composition and patterning process
JP4347110B2 (ja) * 2003-10-22 2009-10-21 東京応化工業株式会社 電子線又はｅｕｖ用ポジ型レジスト組成物
EP1720072B1 (en) 2005-05-01 2019-06-05 Rohm and Haas Electronic Materials, L.L.C. Compositons and processes for immersion lithography
TWI347495B (en) * 2006-01-08 2011-08-21 Rohm & Haas Elect Mat Coating compositions for photoresists
JP4857138B2 (ja) * 2006-03-23 2012-01-18 富士フイルム株式会社 レジスト組成物及びそれを用いたパターン形成方法
EP2420892A1 (en) 2006-10-30 2012-02-22 Rohm and Haas Electronic Materials LLC Compositions and processes for immersion lithography
KR101570986B1 (ko) 2007-11-05 2015-11-23 롬 앤드 하스 일렉트로닉 머트어리얼즈 엘엘씨 침지 리소그래피용 조성물 및 방법

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JP2000010287A (ja) 2000-01-14

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