JP3907171B2 - ポジ型レジスト組成物 - Google Patents

ポジ型レジスト組成物 Download PDF

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Publication number
JP3907171B2
JP3907171B2 JP2002032449A JP2002032449A JP3907171B2 JP 3907171 B2 JP3907171 B2 JP 3907171B2 JP 2002032449 A JP2002032449 A JP 2002032449A JP 2002032449 A JP2002032449 A JP 2002032449A JP 3907171 B2 JP3907171 B2 JP 3907171B2
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JP
Japan
Prior art keywords
group
alicyclic hydrocarbon
general formula
alkyl group
carbon atoms
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2002032449A
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English (en)
Japanese (ja)
Other versions
JP2003233188A5 (enrdf_load_stackoverflow
JP2003233188A (ja
Inventor
健一郎 佐藤
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Corp
Original Assignee
Fujifilm Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujifilm Corp filed Critical Fujifilm Corp
Priority to JP2002032449A priority Critical patent/JP3907171B2/ja
Publication of JP2003233188A publication Critical patent/JP2003233188A/ja
Publication of JP2003233188A5 publication Critical patent/JP2003233188A5/ja
Application granted granted Critical
Publication of JP3907171B2 publication Critical patent/JP3907171B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Materials For Photolithography (AREA)
JP2002032449A 2002-02-08 2002-02-08 ポジ型レジスト組成物 Expired - Fee Related JP3907171B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2002032449A JP3907171B2 (ja) 2002-02-08 2002-02-08 ポジ型レジスト組成物

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2002032449A JP3907171B2 (ja) 2002-02-08 2002-02-08 ポジ型レジスト組成物

Publications (3)

Publication Number Publication Date
JP2003233188A JP2003233188A (ja) 2003-08-22
JP2003233188A5 JP2003233188A5 (enrdf_load_stackoverflow) 2005-04-07
JP3907171B2 true JP3907171B2 (ja) 2007-04-18

Family

ID=27775568

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2002032449A Expired - Fee Related JP3907171B2 (ja) 2002-02-08 2002-02-08 ポジ型レジスト組成物

Country Status (1)

Country Link
JP (1) JP3907171B2 (enrdf_load_stackoverflow)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100821440B1 (ko) * 2003-01-31 2008-04-10 미츠비시 레이온 가부시키가이샤 레지스트용 중합체 및 레지스트 조성물
WO2004096787A1 (ja) * 2003-04-28 2004-11-11 Mitsubishi Chemical Corporation 多環式ラクトン化合物及び多環式ラクトン構造を有する(メタ)アクリレート化合物、並びにその製造方法
JP4191103B2 (ja) 2004-07-02 2008-12-03 東京応化工業株式会社 ポジ型レジスト組成物およびレジストパターン形成方法
JP5250226B2 (ja) * 2007-09-04 2013-07-31 東京応化工業株式会社 高分子化合物、ポジ型レジスト組成物、およびレジストパターン形成方法
US8029972B2 (en) * 2007-10-11 2011-10-04 Tokyo Ohka Kogyo Co., Ltd. Resist composition and method of forming resist pattern
JP6959726B2 (ja) * 2015-11-16 2021-11-05 住友化学株式会社 化合物、樹脂、レジスト組成物及びレジストパターンの製造方法

Also Published As

Publication number Publication date
JP2003233188A (ja) 2003-08-22

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