JP3886759B2 - 酸化チタン薄膜被覆ガラス板の製造方法 - Google Patents

酸化チタン薄膜被覆ガラス板の製造方法 Download PDF

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Publication number
JP3886759B2
JP3886759B2 JP2001303569A JP2001303569A JP3886759B2 JP 3886759 B2 JP3886759 B2 JP 3886759B2 JP 2001303569 A JP2001303569 A JP 2001303569A JP 2001303569 A JP2001303569 A JP 2001303569A JP 3886759 B2 JP3886759 B2 JP 3886759B2
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Prior art keywords
titanium oxide
thin film
oxide thin
glass substrate
glass plate
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Expired - Lifetime
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JP2001303569A
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Japanese (ja)
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JP2003112949A (ja
JP2003112949A5 (enExample
Inventor
武司 中島
健 勇木
勝 秋山
圭三 政田
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Nakajima Glass Co Inc
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Nakajima Glass Co Inc
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Priority to JP2001303569A priority Critical patent/JP3886759B2/ja
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Publication of JP2003112949A5 publication Critical patent/JP2003112949A5/ja
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  • Joining Of Glass To Other Materials (AREA)
  • Surface Treatment Of Glass (AREA)
JP2001303569A 2001-09-28 2001-09-28 酸化チタン薄膜被覆ガラス板の製造方法 Expired - Lifetime JP3886759B2 (ja)

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JP2001303569A JP3886759B2 (ja) 2001-09-28 2001-09-28 酸化チタン薄膜被覆ガラス板の製造方法

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JP2001303569A JP3886759B2 (ja) 2001-09-28 2001-09-28 酸化チタン薄膜被覆ガラス板の製造方法

Related Child Applications (1)

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JP2006184231A Division JP2006342055A (ja) 2006-07-04 2006-07-04 酸化チタン薄膜被覆ガラス板の製造方法、その方法で製造されたガラス板及びその用途

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JP2003112949A JP2003112949A (ja) 2003-04-18
JP2003112949A5 JP2003112949A5 (enExample) 2006-05-11
JP3886759B2 true JP3886759B2 (ja) 2007-02-28

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Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP2735367B1 (en) 2005-07-15 2018-10-17 Toshiba Mitsubishi-Electric Industrial Systems Corporation Photocatalyst material producing method and photocatalyst material producing apparatus
CN101484387B (zh) * 2006-07-13 2011-07-20 东海旅客铁道株式会社 涂布液、使用该涂布液形成的氧化钛薄膜及其形成方法
US9359251B2 (en) * 2012-02-29 2016-06-07 Corning Incorporated Ion exchanged glasses via non-error function compressive stress profiles
CN120622960A (zh) * 2025-06-05 2025-09-12 湖南太阳电瓷有限公司 一种具有复合过渡层的电瓷釉面结构及其制备方法

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