JP3880155B2 - 位置決め方法及び位置決め装置 - Google Patents

位置決め方法及び位置決め装置 Download PDF

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Publication number
JP3880155B2
JP3880155B2 JP28467597A JP28467597A JP3880155B2 JP 3880155 B2 JP3880155 B2 JP 3880155B2 JP 28467597 A JP28467597 A JP 28467597A JP 28467597 A JP28467597 A JP 28467597A JP 3880155 B2 JP3880155 B2 JP 3880155B2
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JP
Japan
Prior art keywords
stage
wafer
detection
exposure
positional deviation
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP28467597A
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English (en)
Japanese (ja)
Other versions
JPH11111610A5 (enExample
JPH11111610A (ja
Inventor
邦保 萩庭
雄一 山田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP28467597A priority Critical patent/JP3880155B2/ja
Priority to US09/168,335 priority patent/US6130751A/en
Publication of JPH11111610A publication Critical patent/JPH11111610A/ja
Publication of JPH11111610A5 publication Critical patent/JPH11111610A5/ja
Application granted granted Critical
Publication of JP3880155B2 publication Critical patent/JP3880155B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
    • G03F9/7023—Aligning or positioning in direction perpendicular to substrate surface
    • G03F9/7026—Focusing
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70358—Scanning exposure, i.e. relative movement of patterned beam and workpiece during imaging

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP28467597A 1997-10-01 1997-10-01 位置決め方法及び位置決め装置 Expired - Fee Related JP3880155B2 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP28467597A JP3880155B2 (ja) 1997-10-01 1997-10-01 位置決め方法及び位置決め装置
US09/168,335 US6130751A (en) 1997-10-01 1998-09-28 Positioning method and apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP28467597A JP3880155B2 (ja) 1997-10-01 1997-10-01 位置決め方法及び位置決め装置

Publications (3)

Publication Number Publication Date
JPH11111610A JPH11111610A (ja) 1999-04-23
JPH11111610A5 JPH11111610A5 (enExample) 2005-06-16
JP3880155B2 true JP3880155B2 (ja) 2007-02-14

Family

ID=17681532

Family Applications (1)

Application Number Title Priority Date Filing Date
JP28467597A Expired - Fee Related JP3880155B2 (ja) 1997-10-01 1997-10-01 位置決め方法及び位置決め装置

Country Status (2)

Country Link
US (1) US6130751A (enExample)
JP (1) JP3880155B2 (enExample)

Families Citing this family (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1001457A4 (en) * 1997-06-09 2000-08-02 Nikon Corp SENSOR AND METHOD FOR DETECTING THE POSITION OF THE SURFACE OF AN OBJECT ALIGNMENT DEVICE EQUIPPED WITH THIS SENSOR AND PRODUCTION METHOD FOR THIS ALIGNMENT DEVICE AND MANUFACTURING METHOD OF DEVICES BY USE OF THIS DEVICE
JP4365908B2 (ja) 1998-09-04 2009-11-18 キヤノン株式会社 面位置検出装置、露光装置およびデバイス製造方法
AU6122099A (en) * 1998-10-14 2000-05-01 Nikon Corporation Shape measuring method and shape measuring device, position control method, stage device, exposure apparatus and method for producing exposure apparatus, and device and method for manufacturing device
KR100303057B1 (ko) * 1999-01-22 2001-09-26 윤종용 노광장치의 포커싱 방법 및 시스템
US6643049B2 (en) * 2001-02-01 2003-11-04 Kodak Polychrome Graphics Llc Compact imaging head and high speed multi-head laser imaging assembly and method
US6973355B2 (en) * 2001-04-25 2005-12-06 Tisue J Gilbert Accurate positioner suitable for sequential agile tuning of pulse burst and CW lasers
JP2003203846A (ja) * 2002-01-08 2003-07-18 Canon Inc 位置合わせ方法及びパラメータ選択方法
JP3913079B2 (ja) * 2002-02-28 2007-05-09 キヤノン株式会社 面位置検出装置及び方法並びに露光装置と該露光装置を用いたデバイスの製造方法
JP4652667B2 (ja) * 2003-02-13 2011-03-16 キヤノン株式会社 面位置計測方法及び走査型露光装置
US20050134865A1 (en) * 2003-12-17 2005-06-23 Asml Netherlands B.V. Method for determining a map, device manufacturing method, and lithographic apparatus
US7271914B2 (en) * 2005-02-02 2007-09-18 National Taiwan University Biomolecular sensor system utilizing a transverse propagation wave of surface plasmon resonance (SPR)
JP2008140814A (ja) * 2006-11-30 2008-06-19 Matsushita Electric Ind Co Ltd 露光装置及び露光方法
JP4974821B2 (ja) * 2007-09-20 2012-07-11 富士フイルム株式会社 画像記録方法、および画像記録システム
JP4974826B2 (ja) * 2007-09-27 2012-07-11 富士フイルム株式会社 画像記録方法、および画像記録システム
JP2014527312A (ja) * 2011-09-16 2014-10-09 エーエスエムエル ネザーランズ ビー．ブイ． リソグラフィパターニングデバイスを監視する装置
JP5624580B2 (ja) * 2012-04-03 2014-11-12 株式会社アドテックエンジニアリング 画像記録方法、および画像記録システム
CN105632972B (zh) * 2014-12-01 2019-02-19 北京北方华创微电子装备有限公司 反应腔室
CN113138546B (zh) * 2020-01-20 2022-08-05 上海微电子装备（集团）股份有限公司 一种调焦调平系统、方法及光刻机

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2910327B2 (ja) * 1991-05-31 1999-06-23 キヤノン株式会社 面位置検出装置及びそれを用いた半導体素子の製造方法
JP3309927B2 (ja) * 1993-03-03 2002-07-29 株式会社ニコン 露光方法、走査型露光装置、及びデバイス製造方法
JPH0864518A (ja) * 1994-06-14 1996-03-08 Canon Inc 露光方法
US5783833A (en) * 1994-12-12 1998-07-21 Nikon Corporation Method and apparatus for alignment with a substrate, using coma imparting optics

Also Published As

Publication number Publication date
US6130751A (en) 2000-10-10
JPH11111610A (ja) 1999-04-23

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