JP3878878B2 - Wiring board - Google Patents

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JP3878878B2
JP3878878B2 JP2002109654A JP2002109654A JP3878878B2 JP 3878878 B2 JP3878878 B2 JP 3878878B2 JP 2002109654 A JP2002109654 A JP 2002109654A JP 2002109654 A JP2002109654 A JP 2002109654A JP 3878878 B2 JP3878878 B2 JP 3878878B2
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conductor layer
ground
power supply
connection land
connection
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JP2003303913A (en
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英樹 福永
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Kyocera Corp
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Kyocera Corp
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Description

【0001】
【発明の属する技術分野】
本発明は、半導体集積回路素子等の半導体素子を搭載するための半導体素子搭載用基板に用いられる配線基板に関するものである。
【0002】
【従来の技術】
従来、半導体集積回路素子を搭載するための半導体素子搭載用基板に用いられる配線基板は、例えば酸化アルミニウム質焼結体等の無機系絶縁物やエポキシ樹脂等の有機系絶縁物から成る複数の絶縁層を上下に積層一体化して成る絶縁基体の各絶縁層間に、半導体集積回路素子に接地電位を供給するための接地用導体層と半導体集積回路素子に電源電位を供給するための電源用導体層と半導体集積回路素子に信号の出し入れをするための信号用導体層とが配設されているとともに、絶縁基体の上面および下面に前記接地用導体層、電源用導体層、信号用導体層にそれぞれ電気的に接続された略円形の多数の電極パッドが被着形成されている。また、これらの接地用導体層、電源用導体層、信号用導体層と電極パッドとは、接地用導体層、電源用導体層、信号用導体層からそれぞれ絶縁層を貫通して絶縁基体の表面にかけて導出する多数の貫通導体により互いに電気的に接続されている。そして、この配線基板は、絶縁基体の上面に半導体集積回路素子を、その電極が絶縁基体の上面の電極パッドに半田バンプ等の導電性接合部材を介して電気的に接続されるようにして搭載するとともに、その絶縁基体の上面に例えばエポキシ樹脂等の熱硬化性樹脂から成る封止樹脂を半導体集積回路素子を覆うように固着させることにより製品としての半導体装置となり、この半導体装置は絶縁基体の下面の電極パッドを外部電気回路基板の配線導体に半田等の導電性接合部材を介して接続することにより外部電気回路基板に実装される。
【0003】
ところで、このような配線基板においては、近時の半導体集積回路素子の高集積化に伴い、半導体集積回路素子に接地電位や電源電位を供給するための接地用導体層や電源用導体層は、それぞれ絶縁基体の絶縁層間の一つあるいはいくつかの略全面にわたる広面積のパターンとして設けられる場合が多くなっている。このような広面積の接地用導体層や電源用導体層から半導体集積回路素子に接地電位や電源電位を供給することによって安定した接地電位や電源電位の供給が可能となるとともに接地用導体層や電源用導体層が電磁シールドの役目を果たし、信号用導体層に外部から電磁ノイズが入り込んだり、外部に不要な電磁ノイズの放射が行われたりすることを防止するようにしている。
【0004】
なお、このように接地用導体層や電源用導体層が、ある絶縁層間の略全面にわたり広面積のパターンに設けられた配線基板では、接地用導体層や電源用導体層や信号用導体層と絶縁基体の表面の電極パッドとを電気的に接続するための貫通導体を接地用導体層や電源用導体層を貫通して複数の絶縁層にわたって設ける必要があり、そのような場合、接地用導体層や電源用導体層を貫通導体が貫通する部位には、それらの貫通導体と接地用導体層や電源用導体層との電気的短絡を防止するために貫通導体を取り囲む開口部が設けられており、さらにその開口部内には、貫通導体よりも大きな径を有する円形の接続ランドと呼ばれる導体パターンが接地用導体層や電源用導体層から一定の間隔で離間して形成されており、この接続ランドに貫通導体を接続させることにより接地用導体層や電源用導体層を貫通する上下の貫通導体同士の電気的な接続を良好なものとしている。また、接地用導体層や電源用導体層と電極パッドとを接続する貫通導体は、半導体集積回路素子に接地電位や電源電位を安定して供給するために、一つの電極パッドに対して例えば3本ずつ接続されることがあり、そのような場合、それらの貫通導体を一つの円形の接続ランドに3本ずつ接続するようにしていた。
【0005】
【発明が解決しようとする課題】
しかしながら、近時の半導体集積回路素子の超高集積化に伴い、配線基板もその電極パッドの高密度配列が要求されてきており、このため、電極パッドの配列ピッチが1mm以下の狭いものが製造されるようになってきている。そして、このような高密度配列された電極パッドに例えば3本ずつの貫通導体を接続させた場合、この3本の貫通導体が接続された円形の接続ランド同士の間隔も極めて狭いものとなり、それらの接続ランド間に接地または電源用導体層を十分な幅で設けることができなくなる。そうすると、半導体集積回路素子に接地または電源電位を供給するための接地または電源用導体層の実効インダクタンスが大きなものとなり、その結果、この接地または電源用導体層からの半導体集積回路素子への均一、かつ効率の良い接地または電源電位の供給ができなくなるため、半導体集積回路素子に誤動作を発生させてしまうという問題点を有していた。
【0006】
本発明は、かかる従来の問題点に鑑み案出されたものであり、その目的は、複数の貫通導体が接続された接続ランド間に接地または電源用導体層を大きな幅で設けることができ、その結果、接地または電源用導体層の実効インダクタンスを小さなものとして、搭載する半導体集積回路素子を正常に作動させることが可能な配線基板を提供することにある。
【0007】
【課題を解決するための手段】
本発明の配線基板は、複数の絶縁層を積層して成る絶縁基体と、前記絶縁層間の一つに配設されており、複数の開口部を有する接地または電源層と、前記各開口部内に前記接地または電源層から一定の間隔で離間してそれぞれ配設された複数の接続ランドと、前記絶縁層を貫通して前記接続ランドに接続するように配設された複数の貫通導体とを具備して成る配線基板であって、前記接続ランドは、三角形であるとともに、その隣接する前記接続ランド同士において、一方の接続ランドの角部のうち他方の接続ランドに最も近いものと前記他方の接続ランドの中心とを結ぶ線分が前記他方の接続ランドの辺部と交差するように配置されており、かつその各角部に前記貫通導体がそれぞれ接続されていることを特徴とするものである。
【0008】
本発明の配線基板によれば、接地または電源用導体層の開口部内に接地または電源用導体層から一定の間隔で離間して設けられた接続ランドは、三角形であるとともに、その隣接する接続ランド同士において、一方の接続ランドの角部のうち他方の接続ランドに最も近いものと他方の接続ランドの中心とを結ぶ線分が他方の接続ランドの辺部と交差するように配置されており、かつその各角部に貫通導体がそれぞれ接続されていることから、各接続ランドに3本ずつの貫通導体を接続することが可能であるとともに、各接続ランド間に大きな間隔を形成することができ、その間に接地または電源用導体層を大きな幅で形成することができる。
【0009】
【発明の実施の形態】
次に、本発明の配線基板を添付の図面に基づいて詳細に説明する。
【0010】
図1は、本発明の配線基板を半導体素子集積回路素子を搭載するための半導体素子搭載用基板に用いられる配線基板に適用した場合の実施の形態の一例を示す断面図であり、1は絶縁基体、3は接地または電源用導体層、5は貫通導体、6は接続ランドである。
【0011】
絶縁基体1は例えば酸化アルミニウム質焼結体や窒化アルミニウム質焼結体、ムライト質焼結体、炭化珪素質焼結体、窒化珪素質焼結体、ガラス−セラミックス等の無機系絶縁物やエポキシ樹脂やポリイミド樹脂、変性ポリフェニレンエーテル樹脂、ビスマレイミドトリアジン樹脂等の有機系絶縁物から成る4層の絶縁層1a、1b、1c、1dを積層一体化して成り、その上面中央部には、半導体集積回路素子が搭載される搭載部を有し、その下面は外部電気回路基板に接続される接続面を形成している。
【0012】
このような絶縁基体1は、例えば各絶縁層1a、1b、1c、1dが酸化アルミニウム質焼結体等の無機系絶縁物から成る場合であれば、酸化アルミニウム等のセラミック原料粉末に適当な有機バインダーおよび溶剤を添加混合して泥漿状となすとともに、これを従来周知のドクターブレード法を採用してシート状に形成して各絶縁層1a、1b、1c、1dとなるセラミックグリーンシートをそれぞれ準備し、しかる後、これらのセラミックグリーンシートに適当な打ち抜き加工を施すとともに所定の順に積層して絶縁基体1用のセラミックグリーンシート積層体となし、最後にこのセラミックグリーンシート積層体を高温で焼成することによって製作され、他方、各絶縁層1a、1b、1c、1dがエポキシ樹脂等の有機系絶縁物から成る場合であれば、各絶縁層1a、1b、1c、1d用の未硬化の熱硬化性樹脂シートを準備するとともにそれらを所定の順に積層して熱硬化させることによって製作される。なお、この熱硬化性樹脂シート中にはガラス繊維や無機絶縁物フィラーを含有させてもよい。
【0013】
また、絶縁基体1の絶縁層1aと1bとの間には半導体集積回路素子に信号の出し入れをするための信号用導体層2が所定の配線パターンに被着されており、絶縁層1bと1cとの間および1cと1dとの間には半導体集積回路素子に接地または電源電位を供給するための接地または電源用導体層3が略全面にわたり被着されている。さらに絶縁基体1の上面には半導体集積回路素子の各電極が接続される素子接続用の電極パッド4aが、絶縁基体1の下面には外部電気回路基板の配線導体に接続される外部接続用の電極パッド4bが被着されている。そして、これらの電極パッド4a、4bと信号用導体層2および接地または電源用導体層3とが絶縁層1a、1b、1c、1dを貫通する貫通導体5により電気的に接続されている。なお、絶縁層1bと1cとの間および1cと1dとの間に被着された接地または電源用導体層3は、それぞれ互いに異なる接地電位または電源電位を半導体集積回路素子に供給するための導体層である。そして、これらの接地または電源用導体層3には、他の接地または電源用導体層3や信号導体層2に接続された貫通導体5との電気的な短絡を防止するために、それらの貫通導体5を取り囲む開口部3aが形成されており、この開口部3a内には上下の貫通導体5同士の電気的接続を良好とするための接続ランド6が接地または電源用導体層3から一定の間隔で離間して形成されている。なお、接地または電源用導体層3とこれに対応する電極パッド4bとの間は例えば3本ずつの貫通導体5により接続されており、それにより接地または電源電位をより効率よく供給できるようにしている。
【0014】
このような信号用導体層2および接地または電源用導体層3、電極パッド4a、4b、貫通導体5、接続ランド6は、絶縁層1a、1b、1c、1dが酸化アルミニウム質焼結体等の無機系絶縁物から成る場合であれば、例えばタングステンやモリブデン、銅、銀等の金属粉末メタライズから成り、タングステン等の金属粉末に適当な有機バインダー、溶剤を添加混合して得た金属ペーストを絶縁層1a、1b、1c、1d用のセラミックグリーンシートに従来周知のスクリーン印刷法を採用して印刷塗布しておくとともにそれを絶縁基体1用のセラミックグリーンシート積層体とともに焼成することによって形成され、他方、絶縁層1a、1b、1c、1dがエポキシ樹脂等の有機系絶縁物から成る場合であれば、例えば、銅箔や銅めっきや銅ペースト硬化物から成り、絶縁層1a、1b、1c、1d用のシートに銅箔や銅めっき層を被着させるとともに、それをフォトリソグラフィー技術を採用して所定のパターンにエッチングすることによって、あるいは銅ペーストを所定のパターンに印刷や充填してそれを熱硬化させることによって形成される。
【0015】
さらに、本発明の配線基板においては、図2に要部平面図で示すように、接地または電源用導体層3とこれに対応する電極パッド4bとを接続する3本の貫通導体5が接続される接続ランド6の形状を三角形としている。また、その隣接する接続ランド6同士において、一方の接続ランド6の角部のうち他方の接続ランド6に最も近いものと他方の接続ランド6の中心とを結ぶ線分が他方の接続ランド6の辺部と交差するように配置、すなわち、隣接する接続ランド6同士の角部が互いに正面で向かい合わないように配置している。さらに、貫通導体5を接続ランド6の各角部にそれぞれ接続している。
この構成により、隣接する接続ランド6の間に大きな間隔が形成され、その間に接地または電源用導体層3を大きな幅で配置することができる。
したがって、本発明の配線基板によれば、接地または電源用導体層3の実効インダクタンスを小さなものとして、搭載する半導体集積回路素子を正常に作動させることが可能となる。
【0016】
なお、接続ランド6の各角部に接続された貫通導体5は、接続ランド6の外周から20〜50μm内側の位置に接続されていることが好ましい。貫通導体5が接続ランド6の外周から20μm未満内側に位置している場合、貫通導体5と接続ランド6との接続信頼性が低いものとなってしまう危険性があり、他方、50μmを超えると、接続ランド6の面積をその分大きくする必要があるので、接続ランド6を高密度で配置することが困難となる傾向にある。
【0017】
また、接続ランド6同士の間隔は、30〜100μmの範囲であることが好ましい。接続ランド6同士の間隔が30μm未満であると、接続ランド6同士の電気的な絶縁信頼性が低いものとなる傾向にあり、他方、100μmを超えると、接続ランド6を高密度で配置することが困難となる傾向にある。
【0018】
なお、本発明は上述の実施の形態例に限定されるものではなく、本発明の要旨を逸脱しない範囲であれば、種々の変更が可能であることはいうまでもない。
【0019】
【発明の効果】
本発明の配線基板によれば、接地または電源用導体層の開口部内に接地または電源用導体層から一定の間隔で離間して設けられた接続ランドは、三角形であるとともに、その隣接する接続ランド同士において、一方の接続ランドの角部のうち他方の接続ランドに最も近いものと他方の接続ランドの中心とを結ぶ線分が他方の接続ランドの辺部と交差するように配置されており、かつその各角部に貫通導体がそれぞれ接続されていることから、各接続ランドに3本ずつの貫通導体を接続することが可能であるとともに、各接続ランド間に大きな間隔を形成することができ、その間に接地または電源用導体層を大きな幅で形成することができる。
したがって、接地または電源用導体層の実効インダクタンスを小さいものとして、搭載する半導体集積回路素子を正常に作動させることが可能な配線基板を提供することができる。
【図面の簡単な説明】
【図1】本発明の配線基板の実施の形態の一例を示す断面図である。
【図2】本発明の配線基板の要部平面図である。
【符号の説明】
1・・・・・・絶縁基板
1a〜1d・・・・絶縁層
3・・・・・・接地または電源用導体層
3a・・・・・接地または電源用導体層3の開口部
5・・・・・・貫通導体
6・・・・・・接続ランド
[0001]
BACKGROUND OF THE INVENTION
The present invention relates to a wiring substrate used for a semiconductor element mounting substrate for mounting a semiconductor element such as a semiconductor integrated circuit element.
[0002]
[Prior art]
2. Description of the Related Art Conventionally, a wiring board used as a semiconductor element mounting substrate for mounting a semiconductor integrated circuit element has a plurality of insulating layers made of an inorganic insulator such as an aluminum oxide sintered body and an organic insulator such as an epoxy resin. A grounding conductor layer for supplying a ground potential to the semiconductor integrated circuit element and a power supply conductor layer for supplying a power supply potential to the semiconductor integrated circuit element between the insulating layers of the insulating base formed by integrating the layers vertically And a signal conductor layer for inputting / outputting signals to / from the semiconductor integrated circuit element, and the grounding conductor layer, the power source conductor layer, and the signal conductor layer on the upper and lower surfaces of the insulating substrate, respectively. A large number of substantially circular electrode pads that are electrically connected are formed. The grounding conductor layer, the power supply conductor layer, the signal conductor layer and the electrode pad pass through the insulating layer from the grounding conductor layer, the power supply conductor layer, and the signal conductor layer, respectively. Are electrically connected to each other by a large number of through conductors led out from the top to the bottom. The wiring board is mounted so that the semiconductor integrated circuit element is electrically connected to the upper surface of the insulating base, and the electrode is electrically connected to the electrode pad on the upper surface of the insulating base via a conductive bonding member such as a solder bump. At the same time, a sealing resin made of a thermosetting resin such as an epoxy resin is fixed on the upper surface of the insulating base so as to cover the semiconductor integrated circuit element, and the semiconductor device is a product of the insulating base. It is mounted on the external electric circuit board by connecting the electrode pads on the lower surface to the wiring conductor of the external electric circuit board via a conductive bonding member such as solder.
[0003]
By the way, in such a wiring board, with the recent high integration of semiconductor integrated circuit elements, a grounding conductor layer and a power supply conductor layer for supplying a ground potential and a power supply potential to the semiconductor integrated circuit element are: In many cases, each pattern is provided as a wide area pattern covering one or several of the entire insulating layers of the insulating base. By supplying a ground potential or a power supply potential from such a large-area ground conductor layer or power supply conductor layer to the semiconductor integrated circuit element, a stable ground potential or power supply potential can be supplied and a ground conductor layer or The power supply conductor layer serves as an electromagnetic shield, and prevents electromagnetic noise from entering the signal conductor layer from the outside and unnecessary electromagnetic noise from being emitted to the outside.
[0004]
In addition, in the wiring board in which the grounding conductor layer and the power supply conductor layer are provided in a pattern with a wide area over almost the entire surface of a certain insulating layer, the grounding conductor layer, the power supply conductor layer, the signal conductor layer, It is necessary to provide a through conductor for electrically connecting the electrode pad on the surface of the insulating substrate across a plurality of insulating layers through the grounding conductor layer and the power supply conductor layer. An opening surrounding the through conductor is provided at a portion where the through conductor penetrates the layer and the power conductor layer in order to prevent an electrical short circuit between the through conductor and the ground conductor layer or the power conductor layer. Furthermore, in the opening, a conductor pattern called a circular connection land having a diameter larger than that of the through conductor is formed at regular intervals from the ground conductor layer and the power conductor layer. Lead to land Are electrically connected between the upper and lower through-conductors each other through the grounding conductive layer and the power supply conductor layer made favorable by connecting. In addition, the through conductor connecting the grounding conductor layer or the power source conductor layer and the electrode pad has, for example, 3 for one electrode pad in order to stably supply the ground potential or the power source potential to the semiconductor integrated circuit element. In some cases, three through conductors are connected to one circular connection land.
[0005]
[Problems to be solved by the invention]
However, with the recent ultra-high integration of semiconductor integrated circuit elements, the wiring board is also required to have a high-density array of electrode pads. For this reason, a product having a narrow electrode pad array pitch of 1 mm or less is manufactured. It has come to be. When, for example, three through conductors are connected to such high-density electrode pads, the distance between the circular connection lands to which the three through conductors are connected becomes extremely narrow. It becomes impossible to provide a ground or power source conductor layer with a sufficient width between the connection lands. Then, the effective inductance of the ground or power supply conductor layer for supplying the ground or power supply potential to the semiconductor integrated circuit element becomes large, and as a result, the uniform from the ground or power supply conductor layer to the semiconductor integrated circuit element, In addition, since efficient grounding or power supply potential cannot be supplied, the semiconductor integrated circuit device has a problem of malfunction.
[0006]
The present invention has been devised in view of such conventional problems, and the purpose thereof is to provide a ground or power supply conductor layer with a large width between connection lands to which a plurality of through conductors are connected, As a result, it is an object of the present invention to provide a wiring board capable of normally operating a semiconductor integrated circuit element to be mounted by reducing the effective inductance of a ground or power source conductor layer.
[0007]
[Means for Solving the Problems]
The wiring board according to the present invention includes an insulating substrate formed by laminating a plurality of insulating layers, one of the insulating layers, a ground or power supply layer having a plurality of openings, and each opening. A plurality of connection lands disposed at a predetermined distance from the ground or power supply layer, and a plurality of through conductors disposed so as to penetrate the insulating layer and connect to the connection lands. The connection lands are triangular, and the adjacent connection lands are adjacent to each other at the corners of one connection land and the other connection land. A line segment connecting the center of the land is arranged so as to intersect with a side portion of the other connection land, and the through conductor is connected to each corner portion thereof. .
[0008]
According to the wiring board of the present invention, the connection land provided in the opening of the ground or power supply conductor layer and spaced apart from the ground or power supply conductor layer at a constant interval is a triangle and its adjacent connection land. Between each other, the line segment connecting the corner of one connection land closest to the other connection land and the center of the other connection land intersects with the side of the other connection land, In addition, since the through conductors are connected to the respective corners, it is possible to connect three through conductors to each connection land and to form a large space between the connection lands. In the meantime, a ground or power source conductor layer can be formed with a large width.
[0009]
DETAILED DESCRIPTION OF THE INVENTION
Next, the wiring board of the present invention will be described in detail with reference to the accompanying drawings.
[0010]
FIG. 1 is a cross-sectional view showing an example of an embodiment in which the wiring board of the present invention is applied to a wiring board used as a semiconductor element mounting board for mounting a semiconductor element integrated circuit element. The substrate 3 is a ground or power source conductor layer, 5 is a through conductor, and 6 is a connection land.
[0011]
The insulating substrate 1 is made of, for example, an inorganic insulator such as an aluminum oxide sintered body, an aluminum nitride sintered body, a mullite sintered body, a silicon carbide sintered body, a silicon nitride sintered body, a glass-ceramics, or an epoxy. 4 layers of insulating layers 1a, 1b, 1c, 1d made of organic insulators such as resin, polyimide resin, modified polyphenylene ether resin, bismaleimide triazine resin, etc. are laminated and integrated. A mounting portion on which the circuit element is mounted is formed, and a lower surface thereof forms a connection surface connected to the external electric circuit board.
[0012]
Such an insulating substrate 1 is suitable for a ceramic raw material powder such as aluminum oxide if each insulating layer 1a, 1b, 1c and 1d is made of an inorganic insulator such as an aluminum oxide sintered body. A binder and a solvent are added and mixed to form a slurry, and this is formed into a sheet by using a conventionally known doctor blade method, and ceramic green sheets to be the insulating layers 1a, 1b, 1c, and 1d are prepared. Thereafter, these ceramic green sheets are appropriately punched and laminated in a predetermined order to form a ceramic green sheet laminate for the insulating substrate 1, and finally the ceramic green sheet laminate is fired at a high temperature. On the other hand, each insulating layer 1a, 1b, 1c, 1d is made of an organic insulating material such as an epoxy resin. In the case, each of the insulating layers 1a, 1b, 1c, thereby preparing a thermosetting resin sheet of uncured for 1d by stacking them in a predetermined order is produced by thermally curing. In addition, you may contain glass fiber and an inorganic insulator filler in this thermosetting resin sheet.
[0013]
Further, a signal conductor layer 2 for inputting / outputting signals to / from the semiconductor integrated circuit element is attached to a predetermined wiring pattern between the insulating layers 1a and 1b of the insulating base 1, and the insulating layers 1b and 1c are provided. Between 1 and 1c and 1d, a ground or power supply conductor layer 3 for supplying a ground or power supply potential to the semiconductor integrated circuit element is applied over substantially the entire surface. Further, an electrode pad 4a for element connection to which each electrode of the semiconductor integrated circuit element is connected is provided on the upper surface of the insulating substrate 1, and an external connection electrode connected to the wiring conductor of the external electric circuit board is provided on the lower surface of the insulating substrate 1. An electrode pad 4b is applied. The electrode pads 4a and 4b are electrically connected to the signal conductor layer 2 and the ground or power source conductor layer 3 through a through conductor 5 that penetrates the insulating layers 1a, 1b, 1c, and 1d. The ground or power supply conductor layer 3 deposited between the insulating layers 1b and 1c and between 1c and 1d is a conductor for supplying different ground potentials or power supply potentials to the semiconductor integrated circuit element. Is a layer. In order to prevent an electrical short circuit with the ground conductors 3 connected to the other ground or power conductor layers 3 and the signal conductor layers 2, the ground or power conductor layers 3 pass through the ground or power conductor layers 3. An opening 3a surrounding the conductor 5 is formed, and a connection land 6 for improving the electrical connection between the upper and lower through conductors 5 is fixed in the opening 3a from the ground or power supply conductor layer 3. They are formed at intervals. The ground or power supply conductor layer 3 and the corresponding electrode pad 4b are connected by, for example, three through conductors 5 so that the ground or power supply potential can be supplied more efficiently. Yes.
[0014]
The signal conductor layer 2 and the ground or power source conductor layer 3, the electrode pads 4a and 4b, the through conductor 5, and the connection land 6 have insulating layers 1a, 1b, 1c, and 1d made of an aluminum oxide sintered body or the like. If it is made of an inorganic insulator, it consists of metal powder metallization such as tungsten, molybdenum, copper, silver, etc., and insulates the metal paste obtained by adding and mixing an appropriate organic binder and solvent to metal powder such as tungsten. The ceramic green sheets for the layers 1a, 1b, 1c, and 1d are formed by applying a screen printing method known in the art and firing the ceramic green sheets together with the ceramic green sheet laminate for the insulating substrate 1, On the other hand, if the insulating layers 1a, 1b, 1c, 1d are made of an organic insulator such as an epoxy resin, for example, copper foil or copper plating It consists of a cured copper paste, and a copper foil or copper plating layer is deposited on the sheets for the insulating layers 1a, 1b, 1c, and 1d, and it is etched into a predetermined pattern using a photolithography technique. Alternatively, it is formed by printing or filling a copper paste in a predetermined pattern and thermosetting it.
[0015]
Further, in the wiring board of the present invention, as shown in the plan view of the main part in FIG. 2, three through conductors 5 that connect the ground or power source conductor layer 3 and the corresponding electrode pad 4b are connected. The shape of the connecting land 6 is a triangle. Further, in the adjacent connection lands 6, the line segment connecting the corner of one connection land 6 closest to the other connection land 6 and the center of the other connection land 6 is the other connection land 6. It arrange | positions so that it may cross | intersect a side part, ie, it arrange | positions so that the corner | angular part of adjacent connection land 6 may not mutually face in front. Further, the through conductor 5 is connected to each corner of the connection land 6.
With this configuration, a large space is formed between adjacent connection lands 6, and the ground or power supply conductor layer 3 can be disposed with a large width therebetween.
Therefore, according to the wiring board of the present invention, it is possible to normally operate the mounted semiconductor integrated circuit element with the effective inductance of the ground or power supply conductor layer 3 being small.
[0016]
The through conductor 5 connected to each corner of the connection land 6 is preferably connected to a position 20 to 50 μm inside from the outer periphery of the connection land 6. When the through conductor 5 is located less than 20 μm inside from the outer periphery of the connection land 6, there is a risk that the connection reliability between the through conductor 5 and the connection land 6 becomes low. Since the area of the connection land 6 needs to be increased correspondingly, it tends to be difficult to arrange the connection lands 6 at a high density.
[0017]
Moreover, it is preferable that the space | interval of the connection lands 6 is the range of 30-100 micrometers. When the distance between the connection lands 6 is less than 30 μm, the electrical insulation reliability between the connection lands 6 tends to be low. On the other hand, when the distance between the connection lands 6 exceeds 100 μm, the connection lands 6 are arranged at a high density. Tend to be difficult.
[0018]
In addition, this invention is not limited to the above-mentioned embodiment, It goes without saying that various modifications are possible within a range not departing from the gist of the present invention.
[0019]
【The invention's effect】
According to the wiring board of the present invention, the connection land provided in the opening of the ground or power supply conductor layer and spaced apart from the ground or power supply conductor layer at a constant interval is a triangle and its adjacent connection land. Between each other, it is arranged so that a line segment connecting the corner of one connection land closest to the other connection land and the center of the other connection land intersects the side of the other connection land, In addition, since the through conductors are connected to the respective corners, three through conductors can be connected to each connection land, and a large interval can be formed between the connection lands. In the meantime, a ground or power source conductor layer can be formed with a large width.
Therefore, it is possible to provide a wiring board capable of normally operating a semiconductor integrated circuit element to be mounted, with the effective inductance of the ground or power supply conductor layer being small.
[Brief description of the drawings]
FIG. 1 is a cross-sectional view showing an example of an embodiment of a wiring board according to the present invention.
FIG. 2 is a plan view of an essential part of a wiring board according to the present invention.
[Explanation of symbols]
DESCRIPTION OF SYMBOLS 1 ... Insulating substrate 1a-1d ... Insulating layer 3 ... Grounding or power supply conductor layer 3a ... Opening 5 of grounding or power supply conductor layer 3 .... Penetration conductor 6 ... Connection land

Claims (1)

複数の絶縁層を積層して成る絶縁基体と、前記絶縁層間の一つに配設されており、複数の開口部を有する接地または電源層と、前記各開口部内に前記接地または電源層から一定の間隔で離間してそれぞれ配設された複数の接続ランドと、前記絶縁層を貫通して前記接続ランドに接続するように配設された複数の貫通導体とを具備して成る配線基板であって、前記接続ランドは、三角形であるとともに、その隣接する前記接続ランド同士において、一方の接続ランドの角部のうち他方の接続ランドに最も近いものと前記他方の接続ランドの中心とを結ぶ線分が前記他方の接続ランドの辺部と交差するように配置されており、かつその各角部に前記貫通導体がそれぞれ接続されていることを特徴とする配線基板。An insulating substrate formed by laminating a plurality of insulating layers, a ground or power layer disposed in one of the insulating layers, having a plurality of openings, and constant from the ground or power layer in each opening. A wiring board comprising a plurality of connecting lands arranged at intervals of each other and a plurality of through conductors arranged so as to penetrate the insulating layer and connect to the connecting lands. In addition, the connection land is a triangle, and a line connecting the connection land adjacent to the other connection land and the center of the other connection land among the adjacent connection lands. A wiring board characterized in that a portion is arranged so as to intersect with a side portion of the other connection land , and the through conductor is connected to each corner portion.
JP2002109654A 2002-04-11 2002-04-11 Wiring board Expired - Fee Related JP3878878B2 (en)

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