JP3804921B2

JP3804921B2 - Cleaning brush unit, substrate cleaning apparatus equipped with the same, and cleaning brush

Info

Publication number: JP3804921B2
Application number: JP2001132650A
Authority: JP
Inventors: 敦史澤田; 貴之澤田
Original assignee: Screen Holdings Co Ltd; Dainippon Screen Manufacturing Co Ltd
Current assignee: Screen Holdings Co Ltd; Dainippon Screen Manufacturing Co Ltd
Priority date: 2001-04-27
Filing date: 2001-04-27
Publication date: 2006-08-02
Anticipated expiration: 2021-04-27
Also published as: JP2002329698A

Description

【０００１】
【発明の属する技術分野】
この発明は、各種基板の表面にスクラブ洗浄処理を施すための基板洗浄装置、ならびにこの基板洗浄装置に備えられる洗浄ブラシユニットおよび洗浄ブラシに関する。各種基板には、半導体ウエハ、液晶表示装置用ガラス基板、プラズマディスプレイパネル用ガラス基板、磁気／光ディスク用基板などが含まれる。
【０００２】
【従来の技術】
超ＬＳＩや液晶表示装置の製造工程の中で、半導体ウエハや液晶表示装置用ガラス基板の表面やその表面に形成された薄膜に洗浄処理を施す工程は重要な工程の１つである。
洗浄処理工程を実施するための装置に、たとえば、基板の両面をスクラブ洗浄する両面スクラブ洗浄装置がある。この両面スクラブ洗浄装置は、ほぼ水平に保持された基板の上下に、それぞれ、ほぼ鉛直な支持軸に取り付けられて支持された洗浄ブラシユニットを有している。洗浄処理の際には、ほぼ水平に保持された基板の上下面に、それぞれ洗浄ブラシユニットの洗浄ブラシが所定の押圧力で押し付けられる。その状態で、基板がその中心を通る鉛直軸線まわりに低速回転されるとともに、洗浄ブラシユニットを支持している支持軸に回転力が与えられて、一対の洗浄ブラシユニットが所定の方向に回転される。また、洗浄ブラシが基板に接触している間、その基板の上下面に洗浄液が供給される。これにより、基板の上下面が洗浄ブラシによってスクラブ洗浄され、基板の表面に付着している汚染物質が化学的および機械的に除去される。
【０００３】
洗浄ブラシユニットの構成は、図７に示されている。すなわち、洗浄ブラシユニット９０は、たとえば、ＰＶＡ（ポリビニルアルコール）からなる４個の洗浄ブラシ９１と、図示しない支持軸に取り付けられる取付ベース９２と、この取付ベース９２に洗浄ブラシ９１をそれぞれ固定するための４個のブラシ押さえ部材９３とを備えている。
洗浄ブラシ９１は、ほぼ平面長方形状の平板部９１１と、この平板部９１１の一方面９１１ａに長手方向に沿って形成された接触部９１２とを有している。
【０００４】
取付ベース９２は、全体として円板状に形成されている。取付ベース９２の洗浄ブラシ９１が固定される面には、洗浄ブラシ９１をそれぞれ嵌め込むための４つの取付凹部９２１が９０度ずつずれて形成されている。取付凹部９２１は、洗浄ブラシ９１の平板部９１１の短辺よりも幅広に形成されていて、洗浄ブラシ９１を嵌め込んだときにその洗浄ブラシ９１が接触しない領域（洗浄ブラシ９１の長辺の側方の領域）には、固定用ピン９４の先端部をそれぞれ挿入可能な６個の挿入孔９２２が形成されている。
【０００５】
ブラシ押さえ部材９３は、取付ベース９２の取付凹部９２１に対応した外形サイズを有する板状の部材である。ブラシ押さえ部材９３には、洗浄ブラシ９１の接触部９１２が通過可能な切欠部９３１が、取付ベース９２の周縁に対応して円弧状に形成された端縁から切り欠いて形成されている。また、ブラシ押さえ部材９３には、このブラシ押さえ部材９３が取付凹部９２１に嵌め込まれた状態で各挿入孔９２２と重なる位置に、固定用ピン９４を挿通可能な挿通孔９３２が形成されている。
【０００６】
この構成により、洗浄ブラシ９１の接触部９１２をブラシ押さえ部材９３の切欠部９３１に挿通し、接触部９１２を取付ベース９２と反対に向けて、ブラシ押さえ部材９３を取付ベース９２の取付凹部９２１に嵌め込むことにより、ブラシ押さえ部材９３の切欠部９３１の両側の部分９３３で、洗浄ブラシ９１の平板部９１１を取付ベース９２に押し付けることができる。そして、その状態で連通している挿通孔９３２および挿入孔９２２に固定用ピン９４を挿入することにより、洗浄ブラシ９１を取付ベース９２に固定することができる。
【０００７】
【発明が解決しようとする課題】
ところが、洗浄ブラシ９１は、ブラシ押さえ部材９３で取付ベース９２に押し付けられているだけであるから、使用に伴って、洗浄ブラシユニット９０の回転方向とは逆方向に徐々にずれるおそれがあった。また、洗浄ブラシユニット９０の回転による遠心力を受けて、取付ベース９２の半径方向外方にずれるおそれもある。いずれにしても、洗浄ブラシ９１のずれ量が大きくなると、洗浄ブラシ９１が取付ベース９２とブラシ押さえ部材９３との間から抜けてしまう。
【０００８】
また、従来の洗浄ブラシ９１は、平板部９１１の一方面９１１ａと接触部９１２の側面９１２ａとが、平板部９１１と接触部９１２との境界部分で直交している。そのため、洗浄ブラシ９１で基板をスクラブしたときに、洗浄ブラシ９１が基板から受ける力が平板部９１１と接触部９１２との境界部分に集中し、この境界部分に亀裂が生じるおそれがあった。とくに、回転方向上流側の境界部分（側面９１２ａ）は、ブラシ押さえ部材９３の切欠部９３１の端縁（角）に強く押し付けられることも亀裂を生じる要因になっている。
【０００９】
そこで、この発明の目的は、洗浄ブラシの脱落や亀裂の発生のおそれがない洗浄ブラシユニットおよびこれを備えた基板洗浄装置を提供することである。
また、この発明の他の目的は、脱落や亀裂が発生しにくく、長期間の使用に耐えることができる洗浄ブラシを提供することである。
【００１０】
【課題を解決するための手段および発明の効果】
上記の目的を達成するための請求項１記載の発明は、基板（Ｗ）の表面に対してスクラブ洗浄処理を施すための基板洗浄装置に適用されて、基板の表面にほぼ直交する回転軸線（Ｏ）まわりに回転される回転体（２１）に取り付けられる洗浄ブラシユニット（２２）であって、上記回転体に対して着脱可能な取付ベース（４０）と、この取付ベースに取り付けられ、基板の表面をスクラブ洗浄するための洗浄ブラシ（５０）と、この洗浄ブラシを上記取付ベースに押し付けるためのブラシ押さえ部材（６０）と、このブラシ押さえ部材によって上記洗浄ブラシが上記取付ベースに押し付けられた状態で、上記ブラシ押さえ部材および洗浄ブラシに挿通されて、これらのブラシ押さえ部材および洗浄ブラシを上記取付ベースに固定するためのピン状部材（７０）とを含み、上記洗浄ブラシは、一方面が上記取付ベースへの取付面とされ、上記ピン状部材が挿通される挿通孔（５１１）が形成された取付部（５１）と、この取付部の上記一方面とは反対側の他方面（５１ａ）に突設されていて、スクラブ洗浄時に基板の表面に接触される接触部（５２）とを含むものであり、上記ブラシ押さえ部材には、上記洗浄ブラシの取付部に形成された挿通孔に対応する位置（当該ブラシ押さえ部材によって上記洗浄ブラシを上記取付ベースに押し付けたときに、上記洗浄ブラシの取付部に形成された挿通孔と重なる位置）に、上記ピン状部材が挿通される挿通孔（６２）が形成されていることを特徴とする洗浄ブラシユニットである。
【００１１】
なお、括弧内の英数字は、後述の実施形態における対応構成要素等を表す。以下、この項において同じ。
この発明によれば、ブラシ押さえ部材によって洗浄ブラシを取付ベースに押し付けた状態で、そのブラシ押さえ部材および洗浄ブラシにピン状部材を挿通することにより、ブラシ押さえ部材および洗浄ブラシが取付ベースに固定される。すなわち、ピン状部材が、ブラシ押さえ部材と洗浄ブラシとの両方に挿通されている。これにより、使用に伴って取付ベースに対する洗浄ブラシの取付位置がずれることを防止でき、取付ベースから洗浄ブラシが脱落することを防止できる。
【００１３】
また、ブラシ押さえ部材に形成されている挿通孔および洗浄ブラシに形成されている挿通孔にピン状部材を挿通することにより、ブラシ押さえ部材および洗浄ブラシへのピン状部材の挿通が達成される。
請求項２記載の発明は、基板（Ｗ）の表面に対してスクラブ洗浄処理を施すための基板洗浄装置に適用されて、基板の表面にほぼ直交する回転軸線（Ｏ）まわりに回転される回転体（２１）に取り付けられる洗浄ブラシユニット（２２）であって、上記回転体に対して着脱可能な取付ベース（４０）と、この取付ベースに取り付けられ、基板の表面をスクラブ洗浄するための洗浄ブラシ（５０）と、この洗浄ブラシを上記取付ベースに押し付けるためのブラシ押さえ部材（６０）と、上記ブラシ押さえ部材によって上記洗浄ブラシが上記取付ベースに押し付けられた状態で、上記ブラシ押さえ部材および洗浄ブラシに挿通されて、これらのブラシ押さえ部材および洗浄ブラシを上記取付ベースに固定するためのピン状部材（７０）とを含み、上記洗浄ブラシは、一方面が上記取付ベースへの取付面とされた取付部（５１）と、この取付部の上記一方面とは反対側の他方面（５１ａ）に突設されていて、スクラブ洗浄時に基板の表面に接触される接触部（５２）とを有し、上記取付部の他方面と上記接触部の側面（５２ａ）とが曲面で接続されており、上記洗浄ブラシの上記取付部には、上記ピン状部材が挿通される挿通孔（５１１）が形成されていて、上記ブラシ押さえ部材には、上記洗浄ブラシの取付部に形成された挿通孔に対応する位置に、上記ピン状部材が挿通される挿通孔（６２）が形成されていることを特徴とする洗浄ブラシユニットである。
【００１４】
この発明によれば、基板のスクラブ洗浄時に洗浄ブラシ（接触部）が基板から受ける力が、取付部と接触部との境界部分に集中することを防止できる。これにより、その境界部分（曲面）における亀裂の発生を防止でき、従来の洗浄ブラシよりも寿命を延ばすことができる。
【００１５】
また、ブラシ押さえ部材に形成されている挿通孔および洗浄ブラシに形成されている挿通孔にピン状部材を挿通することにより、ブラシ押さえ部材および洗浄ブラシへのピン状部材の挿通が達成される。
なお、請求項３に記載のように、上記ブラシ押さえ部材は、上記洗浄ブラシの接触部を挿通可能な開口（６１）が形成されていて、この開口の周囲の部分（６５）で上記洗浄ブラシの取付部を上記取付ベースに押し付けるものであってもよい。
【００１６】
この場合、請求項４に記載のように、上記洗浄ブラシの接触部と接触する面（６０ａ）側の上記開口の端縁には面取り加工が施されていることが好ましい。この面取り加工が施されていることにより、洗浄ブラシがブラシ押さえ部材の開口の端縁に強く押し付けられても、その端縁から洗浄ブラシの曲面に局所的な力が作用するおそれがない。よって、洗浄ブラシの取付部と接触部との境界部分における亀裂の発生を一層良好に防止できる。
【００１７】
請求項５記載の発明は、上記ブラシ押さえ部材は、上記取付ベースに固定されたときに当該洗浄ブラシユニットの回転半径方向外方に位置する端縁から上記洗浄ブラシ（の接触部）と接触する面（６０ａ）側に立ち上がった壁部（６４）を有するものであることを特徴とする請求項１ないし４のいずれかに記載の洗浄ブラシユニットである。
この発明によれば、洗浄ブラシが洗浄ブラシユニットの回転による遠心力で回転半径方向外方にずれることを確実に防止でき、洗浄ブラシの脱落のおそれを一層なくすことができる。
【００１８】
請求項６記載の発明は、上記ブラシ押さえ部材の上記洗浄ブラシ（の接触部）と接触する面（６０ａ）には、上記洗浄ブラシのずれを防止するための突起（６３）が形成されていることを特徴とする請求項１ないし５のいずれかに記載の洗浄ブラシユニットである。
この発明によれば、洗浄ブラシがブラシ押さえ部材によって取付ベースに押し付けられたときに、ブラシ押さえ部材のブラシ接触面に形成されている突起が洗浄ブラシに食い込む。これにより、洗浄ブラシの位置がずれるのを防止できる。ゆえに、洗浄ブラシの脱落のおそれを一層なくすことができる。
請求項７記載の発明は、基板（Ｗ）の表面に対してスクラブ洗浄処理を施すための基板洗浄装置に適用されて、基板の表面にほぼ直交する回転軸線（Ｏ）まわりに回転される回転体（２１）に取り付けられる洗浄ブラシユニット（２２）であって、上記回転体に対して着脱可能な取付ベース（４０）と、この取付ベースに取り付けられ、基板の表面をスクラブ洗浄するための洗浄ブラシ（５０）と、この洗浄ブラシを上記取付ベースに押し付けるためのブラシ押さえ部材（６０）と、このブラシ押さえ部材によって上記洗浄ブラシが上記取付ベースに押し付けられた状態で、上記ブラシ押さえ部材および洗浄ブラシに挿通されて、これらのブラシ押さえ部材および洗浄ブラシを上記取付ベースに固定するためのピン状部材（７０）とを含み、上記ブラシ押さえ部材の上記洗浄ブラシ（の接触部）と接触する面（６０ａ）には、上記洗浄ブラシのずれを防止するための突起（６３）が形成されていることを特徴とする洗浄ブラシユニットである。
この発明によれば、ブラシ押さえ部材によって洗浄ブラシを取付ベースに押し付けた状態で、そのブラシ押さえ部材および洗浄ブラシにピン状部材を挿通することにより、ブラシ押さえ部材および洗浄ブラシが取付ベースに固定される。すなわち、ピン状部材が、ブラシ押さえ部材と洗浄ブラシとの両方に挿通されている。これにより、使用に伴って取付ベースに対する洗浄ブラシの取付位置がずれることを防止でき、取付ベースから洗浄ブラシが脱落することを防止できる。
また、洗浄ブラシがブラシ押さえ部材によって取付ベースに押し付けられたときに、ブラシ押さえ部材のブラシ接触面に形成されている突起が洗浄ブラシに食い込む。これにより、洗浄ブラシの位置がずれるのを防止できる。ゆえに、洗浄ブラシの脱落のおそれを一層なくすことができる。
請求項８記載の発明は、基板（Ｗ）の表面に対してスクラブ洗浄処理を施すための基板洗浄装置に適用されて、基板の表面にほぼ直交する回転軸線（Ｏ）まわりに回転される回転体（２１）に取り付けられる洗浄ブラシユニット（２２）であって、上記回転体に対して着脱可能な取付ベース（４０）と、この取付ベースに取り付けられ、基板の表面をスクラブ洗浄するための洗浄ブラシ（５０）と、この洗浄ブラシを上記取付ベースに押し付けるためのブラシ押さえ部材（６０）とを含み、上記洗浄ブラシは、一方面が上記取付ベースへの取付面とされた取付部（５１）と、この取付部の上記一方面とは反対側の他方面（５１ａ）に突設されていて、スクラブ洗浄時に基板の表面に接触される接触部（５２）とを有し、上記取付部の他方面と上記接触部の側面（５２ａ）とが曲面で接続されており、上記ブラシ押さえ部材の上記洗浄ブラシ（の接触部）と接触する面（６０ａ）には、上記洗浄ブラシのずれを防止するための突起（６３）が形成されているいるものであることを特徴とする洗浄ブラシユニットである。
この発明によれば、基板のスクラブ洗浄時に洗浄ブラシ（接触部）が基板から受ける力が、取付部と接触部との境界部分に集中することを防止できる。これにより、その境界部分（曲面）における亀裂の発生を防止でき、従来の洗浄ブラシよりも寿命を延ばすことができる。
また、洗浄ブラシがブラシ押さえ部材によって取付ベースに押し付けられたときに、ブラシ押さえ部材のブラシ接触面に形成されている突起が洗浄ブラシに食い込む。これにより、洗浄ブラシの位置がずれるのを防止できる。ゆえに、洗浄ブラシの脱落のおそれを一層なくすことができる。
【００１９】
請求項９記載の発明は、基板（Ｗ）の表面に洗浄液を供給するための洗浄液供給手段（２３，２４，２５）と、この洗浄液供給手段から洗浄液が供給される基板の表面をスクラブ洗浄するための洗浄ブラシを保持した洗浄ブラシユニット（２２）とを含み、上記洗浄ブラシユニットとして、請求項１ないし８のいずれかに記載の洗浄ブラシユニットが適用されていることを特徴とする基板洗浄装置である。
【００２０】
この発明によれば、洗浄ブラシの脱落のおそれがない基板洗浄装置を提供することができる。また、洗浄ブラシに亀裂が発生しにくく、洗浄ブラシ（洗浄ブラシユニット）を長期間使用することができる基板洗浄装置を提供することができる。
請求項１０記載の発明は、基板（Ｗ）の表面をスクラブ洗浄するための洗浄ブラシ（５０）であって、一方面が所定の回転体（４０）への取付面とされ、上記回転体への固定のためのピン状部材が挿通される挿通孔が形成された取付部（５１）と、この取付部の上記一方面とは反対側の他方面（５１ａ）に突設されていて、スクラブ洗浄時に基板の表面に接触される接触部（５２）とを含むことを特徴とする洗浄ブラシである。
【００２１】
この発明によれば、取付部に形成されている挿通孔にピン状部材を挿通して、洗浄ブラシを所定の回転体に固定することができる。これにより、使用に伴って回転体に対する洗浄ブラシの取付位置がずれることを防止でき、回転体から洗浄ブラシが脱落することを防止できる。
請求項１１記載の発明は、上記取付部の他方面と上記接触部の側面（５２ａ）とが曲面（５３）で接続されていることを特徴とする請求項１０記載の洗浄ブラシである。
【００２２】
この発明によれば、基板のスクラブ洗浄時に接触部が基板から受ける力が、取付部と接触部との境界部分に集中することを防止できる。これにより、その境界部分（曲面）における亀裂の発生を防止でき、従来の洗浄ブラシよりも寿命を延ばすことができる。
【００２３】
【発明の実施の形態】
以下では、この発明の実施の形態を、添付図面を参照して詳細に説明する。
図１は、この発明の一実施形態に係る基板洗浄装置の構成を概念的に示す側面図である。この基板洗浄装置は、基板の一例である半導体ウエハ（以下、単に「ウエハ」という。）Ｗの両面（上下面）に薬液を供給しつつ、そのウエハＷの両面を一対の洗浄ブラシ部でスクラブ洗浄することにより、ウエハＷの両面に付着している汚染物質（パーティクル、研磨剤、余分な薄膜などの異物）を除去するための装置である。
【００２４】
この基板洗浄装置は、ウエハＷをほぼ水平に保持して回転させることができるウエハ保持装置１と、ウエハ保持装置１に保持されたウエハＷの上面をスクラブ洗浄する上面ブラシ装置２と、ウエハ保持装置１に保持されたウエハＷの下面をスクラブ洗浄する下面ブラシ装置３とを備えている。
ウエハ保持装置１は、複数個（たとえば、６個）の保持ローラ１１を備えている。この複数個の保持ローラ１１は、ウエハ処理位置に配置されたウエハＷの端面に当接および離間可能に設けられており、すべての保持ローラ１１をウエハＷの端面に当接させることによって、ウエハＷをほぼ水平面に沿った状態に保持することができる。また、複数個の保持ローラ１１は、回転自在に設けられており、そのうちの予め定める保持ローラ１１Ａには、モータＭの回転力がベルト１２などを含む回転力伝達機構を介して入力されるようになっている。保持ローラ１１にウエハＷが保持された状態で、モータＭの回転力が保持ローラ１１Ａに入力されると、その保持ローラ１１Ａの回転により、ウエハＷがほぼ水平な面内でその中心を通る鉛直軸線まわりに回転する。このとき、保持ローラ１１Ａ以外の保持ローラ１１Ｂは、ウエハＷの回転につられて回転する。
【００２５】
上面ブラシ装置２および下面ブラシ装置３は、それぞれウエハ保持装置１に保持されたウエハＷを挟んで上下に設けられていて、ほぼ上下対称な構成を有している。そこで、以下では、上面ブラシ装置２を取り上げて説明し、下面ブラシ装置３の構成についての説明を省略する。また、この図１において、下面ブラシ装置３の各部には、上面ブラシ装置２の対応部分に付した参照符号と同一の参照符号を付している。
【００２６】
上面ブラシ装置２は、ほぼ鉛直な回転軸線Ｏを中心に回転自在に設けられた回転軸２１と、この回転軸２１の下端に取り付けられて、ウエハＷの上面をスクラブするための洗浄ブラシユニット２２とを備えている。回転軸２１は、中空軸とされていて、その内部には、ウエハＷの上面に洗浄液を供給するための洗浄液ノズル２３が挿通されている。この洗浄液ノズル２３は、洗浄ブラシユニット２２の下面中央に形成された開口２２ａ内に吐出口を有しており、この吐出口からウエハＷの上面中央に向けて処理液を供給する中心軸ノズルの形態を有している。洗浄液ノズル２３には、処理液供給源２４から処理液供給バルブ２５を介して処理液が供給されるようになっている。
【００２７】
回転軸２１には、モータなどを含む回転駆動部２６から回転力が入力されるようになっている。回転駆動部２６から回転軸２１に回転力が入力されると、回転軸２１および洗浄ブラシユニット２２が回転軸線Ｏまわりに回転する。また、回転軸２１には、昇降駆動部２７が結合されており、洗浄ブラシユニット２２を、その下面がウエハＷの上面に接触する接触位置とウエハＷの上面から大きく離間した離間位置との間で昇降できるようになっている。
【００２８】
ウエハ保持装置１に対するウエハＷの受け渡し時には、上面ブラシ装置２および下面ブラシ装置３の洗浄ブラシユニット２２が離間位置にされている。ウエハ保持装置１にウエハＷが保持されると、上面ブラシ装置２および下面ブラシ装置３の洗浄ブラシユニット２２が互いに接近する方向に移動されて、上面ブラシ装置２および下面ブラシ装置３の洗浄ブラシユニット２２でウエハＷを挟み込んだ状態とされる。この状態で、ウエハＷが回転されるとともに、上面ブラシ装置２および下面ブラシ装置３の洗浄ブラシユニット２２が回転されることにより、ウエハＷの上下面が洗浄ブラシユニット２２によってスクラブされる。また、洗浄ブラシユニット２２によるスクラブの間、そのウエハＷの上下面の中央に、洗浄液ノズル２３から洗浄液が供給される。これにより、ウエハＷの上下面がスクラブ洗浄され、基板の表面に付着している汚染物質が化学的および機械的に除去される。
【００２９】
なお、洗浄液ノズル２３から供給される洗浄液としては、たとえば、フッ酸、塩酸、硫酸、リン酸、硝酸、酢酸、アンモニアおよびこれらの過酸化水素水溶液などの薬液、ならびに純水を例示することができる。
図２は、洗浄ブラシユニット２２の構成を示す分解斜視図である。洗浄ブラシユニット２２は、回転軸２１に対して着脱可能に構成された取付ベース４０と、この取付ベース４０にブラシ押さえ部材６０によって取り付けられる４個の洗浄ブラシ５０とを備えている。
【００３０】
取付ベース４０は、円板部４１と円板部４１の周縁から立ち上がった周壁部４２とを有しており、円板部４１と周壁部４２とで囲まれる空間４０ａは、回転軸２１の下端を嵌め込むことができる凹部になっている。円板部４１の中央には、図１に示す洗浄液ノズル２３の吐出口が配置される開口２２ａが形成されている。また、円板部４１の空間４０ａに臨む面と反対側の面には、洗浄ブラシ５０を取り付けるための取付凹部４３が、円板部４１の周方向にほぼ９０度ずつずれた４つの位置に空間４０ａ側に一段窪んで形成されている。取付凹部４３内には、固定用ピン７０の先端部をそれぞれ挿入可能な６個の挿入孔４３１が形成されている。
【００３１】
４個の洗浄ブラシ５０は、それぞれ、ＰＶＡ、ポリウレタン、ポリプロピレンまたはポリエチレンなどの材料を用いて一体的に形成されており、図３の平面図および図４の断面図に示すように、平板部５１と、この平板部５１の一方面５１ａに長手方向に沿って形成された接触部５２とからなる。
平板部５１は、取付ベース４０の取付凹部４３に対応した平面形状に形成されていて、取付凹部４３に嵌め込むことができるようになっている。平板部５１には、取付凹部４３に嵌め込まれたときに、その取付凹部４３に形成されている各挿入孔４３１と重なる位置に挿通孔５１１が形成されている。各挿通孔５１１は、固定用ピン７０を挿通することができる径を有している。
【００３２】
接触部５２は、ウエハＷの表面に接触してスクラブする部分であり、断面形状が山型の２つの突条部５２１と、この２つの突条部５２１に挟まれたＶ字状の谷部５２２とを有している。谷部５２２が設けられていることにより、ウエハＷの表面中央に供給された洗浄液の一部を、その谷部５２２を通してウエハＷの端縁へ良好に導くことができる。
また、接触部５２の長手方向に沿った側面５２ａは、曲面５３を介して平板部５１の一方面５１ａと接続されている。すなわち、この洗浄ブラシ５０では、平板部５１の一方面５１ａと接触部５２の側面５２ａとが曲面５３で接続されている。別の言い方をすれば、洗浄ブラシ５０の根元のくびれた部分が曲面５３となっている。これにより、洗浄ブラシ５０の接触部５２をウエハＷの表面に接触させた状態で洗浄ブラシユニット２２が回転されたときに、その回転によって接触部５２がウエハＷから受ける力が平板部５１と接触部５２との境界部分に集中することを防止できる。
【００３３】
ブラシ押さえ部材６０は、図５の平面図に示すように、平面視において洗浄ブラシ５０の平板部５１とほぼ同じ外形サイズを有する板状の部材である。言い換えれば、ブラシ押さえ部材６０は、取付ベース４０の取付凹部４３に対応した外形を有しており、その取付凹部４３に、取付凹部４３の内側面との間にほとんど隙間を生じることなく嵌め込むことができるようになっている。
ブラシ押さえ部材６０には、洗浄ブラシ５０の接触部５２が通過可能な開口部６１が形成されている。また、取付凹部４３に嵌め込まれたときに、その取付凹部４３に形成されている各挿入孔４３１と重なる位置に挿通孔６２が形成されている。各挿通孔６２は、固定用ピン７０を挿通することができる径を有している。さらに、ブラシ押さえ部材６０の洗浄ブラシ５０と接触する面６０ａには、複数個（たとえば、６個）の突起６３が形成されている。ブラシ押さえ部材６０にはさらに、洗浄ブラシ５０の脱落を防止するための脱落防止壁部６４が、取付ベース４０の周縁に対応して円弧状に形成された端縁から洗浄ブラシ５０との接触面６０ａ側に立ち上がって形成されている。
【００３４】
上記の構成により、洗浄ブラシ５０の接触部５２をブラシ押さえ部材６０のブラシ接触面６０ａ側からブラシ押さえ部材６０の開口部６１に挿通し、接触部５２を取付ベース４０と反対に向けて、ブラシ押さえ部材６０を取付ベース４０の取付凹部４３に嵌め込むことにより、ブラシ押さえ部材６０の開口部６１の両側の部分６５で洗浄ブラシ５０の平板部５１を取付ベース４０に押し付けることができる。この状態で、洗浄ブラシ５０に形成されている挿通孔５１１とブラシ押さえ部材６０に形成されている挿通孔６２とが連通し、さらに、これらの挿通孔５１１および挿通孔６２が取付凹部４３内の挿入孔４３１と連通する。そして、その連通している挿通孔６２および挿通孔５１１を介して挿入孔４３１に固定用ピン７０を挿入することにより、洗浄ブラシ５０を、ブラシ押さえ部材６０で取付ベース４０に押し付けた状態で固定することができる。
【００３５】
このように固定用ピン７０が洗浄ブラシ５０にも挿通されているので、使用に伴って、洗浄ブラシ５０の取付位置がずれるおそれがない。また、洗浄ブラシ５０がブラシ押さえ部材６０によって取付ベース４０に押し付けられたときに、ブラシ押さえ部材６０のブラシ接触面６０ａに形成されている突起６３が洗浄ブラシ５０に食い込むので、これによっても、洗浄ブラシ５０の位置がずれるのを防止できる。ゆえに、この実施形態に係る洗浄ブラシユニット２２は、洗浄ブラシ５０の脱落のおそれがない。
【００３６】
さらに、洗浄ブラシ５０が取付ベース４０に取り付けられた状態で、洗浄ブラシ５０の平板部５１は、その取付ベース４０の周縁側の端面がブラシ押さえ部材６０の脱落防止壁部６４に対向する。これにより、洗浄ブラシ５０が洗浄ブラシユニット２２の回転による遠心力で取付ベース４０の半径方向外方にずれることを確実に防止でき、洗浄ブラシ５０の脱落のおそれを一層なくすことができる。また、洗浄ブラシ５０の平板部５１の一方面５１ａと接触部５２の側面５２ａとが曲面５３で接続されていることにより、ウエハＷから受ける力が平板部５１と接触部５２との境界部分に集中することを防止できる。そのうえ、図６の断面図に示すように、ブラシ押さえ部材６０の開口部６１の周縁であって、その開口部６１に洗浄ブラシ５０の接触部５２が挿通されたときに曲面５３と対向する端縁６１１には面取り加工が施されていて、曲面５３に対応した曲面にされている。これにより、洗浄ブラシユニット２２の回転によって、洗浄ブラシ５０がブラシ押さえ部材６０の開口部６１の端縁６１１に強く押し付けられても、その端縁６１１から洗浄ブラシ５０の曲面５３に局所的な力が作用するおそれがない。よって、洗浄ブラシ５０は、平板部５１と接触部５２との境界部分（曲面５３）に亀裂などを生じにくく、従来の洗浄ブラシよりも長い期間の使用に耐えることができる。
【００３７】
以上、この発明の一実施形態について説明したが、この発明は他の形態で実施することも可能である。たとえば、上述の実施形態では、洗浄ブラシユニット２２の下面中央からウエハＷに洗浄液が供給されるとしたが、ウエハＷに洗浄液を供給するための洗浄液ノズルを洗浄ブラシユニット２２から離れた位置に設けて、洗浄ブラシユニット２２の外からウエハＷに洗浄液が供給されるようにしてもよい。
【００３８】
また、上述の実施形態では、ウエハＷの両面にスクラブ洗浄を行う装置を例にとったが、この発明は、ウエハＷの一方面のみをスクラブ洗浄する装置に適用されてもよい。この場合、ウエハＷを保持して回転させるための装置として、複数個の保持ローラ１１でウエハＷを保持して回転させる構成のものに限らず、ウエハＷの上面または下面を真空吸着して保持するバキュームチャックが採用されてもよい。
【００３９】
さらに、基板洗浄装置による処理対象の基板は、ウエハＷに限らず、液晶表示装置用ガラス基板、プラズマディスプレイパネル用ガラス基板および磁気／光ディスク用基板などの他の種類の基板であってもよい。
その他、特許請求の範囲に記載された事項の範囲で種々の設計変更を施すことが可能である。
【図面の簡単な説明】
【図１】この発明の一実施形態に係る基板洗浄装置の構成を概念的に示す側面図である。
【図２】洗浄ブラシユニットの構成を示す分解斜視図である。
【図３】洗浄ブラシの平面図である。
【図４】図３に示す切断面線IV−IVから見た断面図である。
【図５】ブラシ押さえ部材の平面図である。
【図６】図５に示す切断面線VI−VIから見た断面図である。
【図７】従来の洗浄ブラシユニットの構成を示す分解斜視図である。
【符号の説明】
１ウエハ保持装置
２上面ブラシ装置
３下面ブラシ装置
２１回転軸
２２洗浄ブラシユニット
２３洗浄液ノズル
２４処理液供給源
２５処理液供給バルブ
２６回転駆動部
４０取付ベース
５０洗浄ブラシ
５１平板部
５１ａ一方面
５１１挿通孔
５２接触部
５２ａ側面
５３曲面
６０ブラシ押さえ部材
６０ａブラシ接触面
６１開口部
６２挿通孔
６３突起
６４脱落防止壁部
７０固定用ピン
Ｏ回転軸線
Ｗウエハ[0001]
BACKGROUND OF THE INVENTION
The present invention relates to a substrate cleaning apparatus for performing a scrub cleaning process on the surfaces of various substrates, and a cleaning brush unit and a cleaning brush provided in the substrate cleaning apparatus. Various substrates include semiconductor wafers, glass substrates for liquid crystal display devices, glass substrates for plasma display panels, magnetic / optical disk substrates, and the like.
[0002]
[Prior art]
In the manufacturing process of the VLSI and the liquid crystal display device, the step of cleaning the surface of the semiconductor wafer or the glass substrate for the liquid crystal display device and the thin film formed on the surface is one of the important steps.
As an apparatus for performing the cleaning process, for example, there is a double-side scrub cleaning apparatus that scrubs both surfaces of a substrate. This double-sided scrub cleaning apparatus has cleaning brush units mounted on and supported by a substantially vertical support shaft on the upper and lower sides of a substrate held substantially horizontally. In the cleaning process, the cleaning brush of the cleaning brush unit is pressed against the upper and lower surfaces of the substrate held almost horizontally with a predetermined pressing force. In this state, the substrate is rotated at a low speed around the vertical axis passing through the center thereof, and a rotational force is applied to the support shaft supporting the cleaning brush unit, so that the pair of cleaning brush units are rotated in a predetermined direction. The Further, while the cleaning brush is in contact with the substrate, the cleaning liquid is supplied to the upper and lower surfaces of the substrate. As a result, the upper and lower surfaces of the substrate are scrubbed by the cleaning brush, and contaminants adhering to the surface of the substrate are chemically and mechanically removed.
[0003]
The configuration of the cleaning brush unit is shown in FIG. That is, the cleaning brush unit 90 includes, for example, four cleaning brushes 91 made of PVA (polyvinyl alcohol), a mounting base 92 attached to a support shaft (not shown), and the cleaning brush 91 fixed to the mounting base 92, respectively. The four brush pressing members 93 are provided.
The cleaning brush 91 has a flat plate portion 911 having a substantially flat rectangular shape, and a contact portion 912 formed on one surface 911a of the flat plate portion 911 along the longitudinal direction.
[0004]
The mounting base 92 is formed in a disk shape as a whole. On the surface of the mounting base 92 to which the cleaning brush 91 is fixed, four mounting recesses 921 for fitting the cleaning brush 91 are formed 90 degrees apart. The mounting recess 921 is formed wider than the short side of the flat plate portion 911 of the cleaning brush 91, and the region where the cleaning brush 91 does not contact when the cleaning brush 91 is fitted (on the long side of the cleaning brush 91). In this region, six insertion holes 922 into which the distal ends of the fixing pins 94 can be respectively inserted are formed.
[0005]
The brush pressing member 93 is a plate-like member having an outer size corresponding to the mounting recess 921 of the mounting base 92. The brush holding member 93 is formed with a notch 931 through which the contact portion 912 of the cleaning brush 91 can pass, by notching from an edge formed in an arc shape corresponding to the periphery of the mounting base 92. The brush pressing member 93 is formed with an insertion hole 932 through which the fixing pin 94 can be inserted at a position overlapping the insertion holes 922 in a state where the brush pressing member 93 is fitted in the mounting recess 921.
[0006]
With this configuration, the contact portion 912 of the cleaning brush 91 is inserted into the notch portion 931 of the brush pressing member 93, the contact portion 912 is directed away from the mounting base 92, and the brush pressing member 93 is inserted into the mounting recess 921 of the mounting base 92. By fitting, the flat plate portion 911 of the cleaning brush 91 can be pressed against the mounting base 92 at the portions 933 on both sides of the notch portion 931 of the brush pressing member 93. Then, the cleaning brush 91 can be fixed to the mounting base 92 by inserting the fixing pin 94 into the insertion hole 932 and the insertion hole 922 that communicate with each other in this state.
[0007]
[Problems to be solved by the invention]
However, since the cleaning brush 91 is only pressed against the mounting base 92 by the brush pressing member 93, there is a possibility that the cleaning brush 91 gradually shifts in the direction opposite to the rotation direction of the cleaning brush unit 90 with use. In addition, the mounting base 92 may be displaced radially outwardly due to centrifugal force generated by the rotation of the cleaning brush unit 90. In any case, when the amount of displacement of the cleaning brush 91 increases, the cleaning brush 91 comes out from between the mounting base 92 and the brush pressing member 93.
[0008]
Further, in the conventional cleaning brush 91, the one surface 911 a of the flat plate portion 911 and the side surface 912 a of the contact portion 912 are orthogonal to each other at the boundary portion between the flat plate portion 911 and the contact portion 912. For this reason, when the substrate is scrubbed with the cleaning brush 91, the force received from the substrate by the cleaning brush 91 is concentrated on the boundary portion between the flat plate portion 911 and the contact portion 912, and there is a possibility that the boundary portion is cracked. In particular, the boundary portion (side surface 912 a) on the upstream side in the rotation direction is strongly pressed against the edge (corner) of the notch 931 of the brush pressing member 93, which causes a crack.
[0009]
SUMMARY OF THE INVENTION An object of the present invention is to provide a cleaning brush unit and a substrate cleaning apparatus including the cleaning brush unit that do not cause the cleaning brush to drop or crack.
Another object of the present invention is to provide a cleaning brush that does not easily drop or crack and can withstand long-term use.
[0010]
[Means for Solving the Problems and Effects of the Invention]
  The invention according to claim 1 for achieving the above object is applied to a substrate cleaning apparatus for performing a scrub cleaning process on the surface of a substrate (W), and a rotation axis (substantially orthogonal to the surface of the substrate). O) A cleaning brush unit (22) attached to a rotating body (21) rotated around, a mounting base (40) detachably attached to the rotating body, and attached to the mounting base, A cleaning brush (50) for scrubbing the surface, a brush pressing member (60) for pressing the cleaning brush against the mounting base, and the cleaning brush pressed against the mounting base by the brush pressing member The brush holding member and the cleaning brush are inserted through the brush holding member and the cleaning brush to fix the brush holding member and the cleaning brush to the mounting base. Jo member (70) and containingThe cleaning brush has an attachment portion (51) in which one surface is an attachment surface to the attachment base and an insertion hole (511) through which the pin-like member is inserted, and the one of the attachment portions. And a contact portion (52) that protrudes from the other surface (51a) opposite to the surface and contacts the surface of the substrate during scrub cleaning. The brush holding member includes the cleaning brush In a position corresponding to the insertion hole formed in the attachment part (position where it overlaps with the insertion hole formed in the attachment part of the cleaning brush when the cleaning brush is pressed against the attachment base by the brush pressing member), An insertion hole (62) through which the pin-shaped member is inserted is formed.This is a cleaning brush unit.
[0011]
In addition, the alphanumeric characters in parentheses represent corresponding components in the embodiments described later. The same applies hereinafter.
According to this invention, the brush pressing member and the cleaning brush are fixed to the mounting base by inserting the pin-shaped member through the brush pressing member and the cleaning brush in a state where the cleaning brush is pressed against the mounting base by the brush pressing member. The That is, the pin-shaped member is inserted through both the brush pressing member and the cleaning brush. Thereby, it can prevent that the attachment position of the washing brush with respect to an attachment base shifts | hangs with use, and it can prevent that a washing brush falls from an attachment base.
[0013]
  AlsoBy inserting the pin-shaped member into the insertion hole formed in the brush pressing member and the insertion hole formed in the cleaning brush, insertion of the pin-shaped member into the brush pressing member and the cleaning brush is achieved.
  Claim2The described invention is applied to a substrate cleaning apparatus for performing a scrub cleaning process on the surface of a substrate (W), and is rotated around a rotation axis (O) substantially orthogonal to the surface of the substrate (21). A cleaning brush unit (22) attached to the rotating body, and a cleaning brush (50) attached to the mounting base for scrub cleaning the surface of the substrate. ), And a brush pressing member (60) for pressing the cleaning brush against the mounting baseA pin for inserting the brush pressing member and the cleaning brush into the mounting base in a state where the cleaning brush is pressed against the mounting base by the brush pressing member. Shaped member (70) andThe cleaning brush protrudes from an attachment portion (51) whose one surface is an attachment surface to the attachment base and the other surface (51a) opposite to the one surface of the attachment portion. A contact portion (52) that contacts the surface of the substrate during scrub cleaning, and the other surface of the mounting portion and the side surface (52a) of the contact portion are connected by a curved surface.An insertion hole (511) through which the pin-shaped member is inserted is formed in the attachment portion of the cleaning brush, and an insertion hole formed in the attachment portion of the cleaning brush is formed in the brush pressing member. An insertion hole (62) through which the pin-shaped member is inserted is formed at a position corresponding toThis is a cleaning brush unit.
[0014]
  According to the present invention, it is possible to prevent the force that the cleaning brush (contact portion) receives from the substrate during scrub cleaning of the substrate from being concentrated on the boundary portion between the attachment portion and the contact portion. This prevents cracks at the boundary (curved surface) and can extend the life of conventional cleaning brushes.The
[0015]
  AlsoBy inserting the pin-shaped member into the insertion hole formed in the brush pressing member and the insertion hole formed in the cleaning brush, insertion of the pin-shaped member into the brush pressing member and the cleaning brush is achieved.
  Claims3As described in the above, the brush pressing member has an opening (61) through which the contact portion of the cleaning brush can be inserted, and the cleaning brush mounting portion is formed at a portion (65) around the opening. You may press against an attachment base.
[0016]
  In this case, the claim4As described above, it is preferable that the edge of the opening on the surface (60a) side in contact with the contact portion of the cleaning brush is chamfered. Since the chamfering is performed, even if the cleaning brush is strongly pressed against the edge of the opening of the brush pressing member, there is no possibility that local force acts on the curved surface of the cleaning brush from the edge. Therefore, generation | occurrence | production of the crack in the boundary part of the attachment part and contact part of a washing brush can be prevented much more favorably.
[0017]
  Claim5In the described invention, the brush pressing member has a surface (60a) that comes into contact with the cleaning brush (contact portion thereof) from an edge located outward in the rotational radial direction of the cleaning brush unit when the brush pressing member is fixed to the mounting base. A wall portion (64) rising on the side) is provided.4The cleaning brush unit according to any one of the above.
  According to this invention, it is possible to reliably prevent the cleaning brush from being displaced outward in the rotational radial direction due to the centrifugal force generated by the rotation of the cleaning brush unit, and to further eliminate the possibility of the cleaning brush falling off.
[0018]
  Claim6The described invention is characterized in that a protrusion (63) for preventing the cleaning brush from shifting is formed on a surface (60a) of the brush pressing member that contacts the cleaning brush (contact portion thereof). Claims 1 to5The cleaning brush unit according to any one of the above.
  According to this invention, when the cleaning brush is pressed against the mounting base by the brush pressing member, the protrusion formed on the brush contact surface of the brush pressing member bites into the cleaning brush. Thereby, it can prevent that the position of a washing brush shifts. Therefore, the possibility of the cleaning brush falling off can be further eliminated.
The invention according to claim 7 is applied to a substrate cleaning apparatus for performing a scrub cleaning process on the surface of the substrate (W), and is rotated around a rotation axis (O) substantially orthogonal to the surface of the substrate. A cleaning brush unit (22) attached to the body (21), the attachment base (40) detachably attached to the rotating body, and the cleaning attached to the attachment base for scrub cleaning the surface of the substrate The brush (50), the brush pressing member (60) for pressing the cleaning brush against the mounting base, and the brush pressing member and the cleaning member in a state where the cleaning brush is pressed against the mounting base by the brush pressing member. A pin-like member (70) inserted through the brush for fixing the brush holding member and the cleaning brush to the mounting base, A cleaning brush unit characterized in that a protrusion (63) for preventing displacement of the cleaning brush is formed on a surface (60a) of the brush pressing member that contacts the cleaning brush (contact portion thereof). It is.
According to this invention, the brush pressing member and the cleaning brush are fixed to the mounting base by inserting the pin-shaped member through the brush pressing member and the cleaning brush in a state where the cleaning brush is pressed against the mounting base by the brush pressing member. The That is, the pin-shaped member is inserted through both the brush pressing member and the cleaning brush. Thereby, it can prevent that the attachment position of the washing brush with respect to an attachment base shifts | hangs with use, and it can prevent that a washing brush falls from an attachment base.
Further, when the cleaning brush is pressed against the mounting base by the brush pressing member, the protrusion formed on the brush contact surface of the brush pressing member bites into the cleaning brush. Thereby, it can prevent that the position of a washing brush shifts. Therefore, the possibility of the cleaning brush falling off can be further eliminated.
The invention described in claim 8 is applied to a substrate cleaning apparatus for performing a scrub cleaning process on the surface of the substrate (W), and is rotated around a rotation axis (O) substantially orthogonal to the surface of the substrate. A cleaning brush unit (22) attached to the body (21), the attachment base (40) detachably attached to the rotating body, and the cleaning attached to the attachment base for scrub cleaning the surface of the substrate A mounting part (51) including a brush (50) and a brush pressing member (60) for pressing the cleaning brush against the mounting base, the cleaning brush having one surface as a mounting surface to the mounting base And a contact portion (52) that projects from the other surface (51a) opposite to the one surface of the mounting portion and contacts the surface of the substrate during scrub cleaning. On the other side The side surface (52a) of the contact portion is connected by a curved surface, and the surface (60a) of the brush pressing member that contacts the cleaning brush (contact portion thereof) is for preventing the cleaning brush from shifting. The cleaning brush unit is characterized in that a protrusion (63) is formed.
According to the present invention, it is possible to prevent the force that the cleaning brush (contact portion) receives from the substrate during scrub cleaning of the substrate from being concentrated on the boundary portion between the attachment portion and the contact portion. Thereby, generation | occurrence | production of the crack in the boundary part (curved surface) can be prevented, and lifetime can be extended rather than the conventional cleaning brush.
Further, when the cleaning brush is pressed against the mounting base by the brush pressing member, the protrusion formed on the brush contact surface of the brush pressing member bites into the cleaning brush. Thereby, it can prevent that the position of a washing brush shifts. Therefore, the possibility of the cleaning brush falling off can be further eliminated.
[0019]
According to the ninth aspect of the present invention, scrub cleaning is performed on the surface of the substrate to which the cleaning liquid is supplied from the cleaning liquid supplying means (23, 24, 25) for supplying the cleaning liquid to the surface of the substrate (W). And a cleaning brush unit (22) holding a cleaning brush for cleaning, wherein the cleaning brush unit according to any one of claims 1 to 8 is applied as the cleaning brush unit. It is.
[0020]
According to the present invention, it is possible to provide a substrate cleaning apparatus that does not cause the cleaning brush to drop off. Further, it is possible to provide a substrate cleaning apparatus in which cracks are hardly generated in the cleaning brush and the cleaning brush (cleaning brush unit) can be used for a long period of time.
The invention according to claim 10 is a cleaning brush (50) for scrub cleaning the surface of the substrate (W), wherein one surface is a mounting surface to a predetermined rotating body (40), and the rotating body is attached to the rotating body. A mounting part (51) formed with an insertion hole through which a pin-shaped member for fixing is inserted, and the other side (51a) opposite to the one surface of the mounting part, A cleaning brush comprising a contact portion (52) that contacts the surface of the substrate during cleaning.
[0021]
  According to the present invention, the cleaning brush can be fixed to the predetermined rotating body by inserting the pin-shaped member through the insertion hole formed in the attachment portion. Thereby, it can prevent that the mounting position of the cleaning brush with respect to a rotary body shifts | deviates with use, and it can prevent that a cleaning brush falls from a rotary body.
  The invention according to claim 11,UpThe other surface of the mounting portion and the side surface (52a) of the contact portion are connected by a curved surface (53).Claim 10It is a cleaning brush.
[0022]
According to the present invention, it is possible to prevent the force that the contact portion receives from the substrate during scrub cleaning of the substrate from being concentrated on the boundary portion between the attachment portion and the contact portion. Thereby, generation | occurrence | production of the crack in the boundary part (curved surface) can be prevented, and lifetime can be extended rather than the conventional cleaning brush.
[0023]
DETAILED DESCRIPTION OF THE INVENTION
Hereinafter, embodiments of the present invention will be described in detail with reference to the accompanying drawings.
FIG. 1 is a side view conceptually showing the structure of a substrate cleaning apparatus according to an embodiment of the present invention. This substrate cleaning apparatus supplies a chemical solution to both surfaces (upper and lower surfaces) of a semiconductor wafer (hereinafter simply referred to as “wafer”) W, which is an example of a substrate, and scrubs both surfaces of the wafer W with a pair of cleaning brush portions. This is an apparatus for removing contaminants (particles, abrasives, foreign matters such as excess thin film) adhering to both surfaces of the wafer W by cleaning.
[0024]
The substrate cleaning apparatus includes a wafer holding apparatus 1 that can hold and rotate a wafer W substantially horizontally, an upper surface brush apparatus 2 that scrubs and cleans the upper surface of the wafer W held by the wafer holding apparatus 1, and wafer holding. And a lower surface brush device 3 for scrub cleaning the lower surface of the wafer W held by the apparatus 1.
The wafer holding device 1 includes a plurality of (for example, six) holding rollers 11. The plurality of holding rollers 11 are provided so as to be able to contact and separate from the end surface of the wafer W disposed at the wafer processing position. By bringing all the holding rollers 11 into contact with the end surface of the wafer W, the wafer W can be maintained substantially along the horizontal plane. The plurality of holding rollers 11 are rotatably provided, and the rotational force of the motor M is input to a predetermined holding roller 11A among them via a rotational force transmission mechanism including the belt 12 and the like. It has become. When the rotational force of the motor M is input to the holding roller 11A in a state where the wafer W is held by the holding roller 11, the rotation of the holding roller 11A causes the wafer W to vertically pass through its center in a substantially horizontal plane. Rotate around the axis. At this time, the holding rollers 11B other than the holding roller 11A rotate as the wafer W rotates.
[0025]
The upper surface brush device 2 and the lower surface brush device 3 are respectively provided above and below the wafer W held by the wafer holding device 1 and have a substantially vertically symmetrical configuration. Therefore, in the following, the upper surface brush device 2 will be taken up and described, and the description of the configuration of the lower surface brush device 3 will be omitted. In FIG. 1, each part of the lower surface brush device 3 is denoted by the same reference numeral as that of the corresponding part of the upper surface brush device 2.
[0026]
The upper surface brush device 2 is provided with a rotation shaft 21 that is rotatable about a substantially vertical rotation axis O, and a cleaning brush unit 22 that is attached to the lower end of the rotation shaft 21 and scrubs the upper surface of the wafer W. And. The rotating shaft 21 is a hollow shaft, and a cleaning liquid nozzle 23 for supplying a cleaning liquid to the upper surface of the wafer W is inserted through the rotary shaft 21. The cleaning liquid nozzle 23 has a discharge port in an opening 22 a formed at the center of the lower surface of the cleaning brush unit 22, and is a central axis nozzle that supplies a processing liquid from the discharge port toward the center of the upper surface of the wafer W. It has a form. The cleaning liquid nozzle 23 is supplied with a processing liquid from a processing liquid supply source 24 via a processing liquid supply valve 25.
[0027]
A rotational force is input to the rotary shaft 21 from a rotary drive unit 26 including a motor and the like. When a rotational force is input from the rotation drive unit 26 to the rotation shaft 21, the rotation shaft 21 and the cleaning brush unit 22 rotate around the rotation axis O. The rotary shaft 21 is coupled with an elevating drive unit 27, and the cleaning brush unit 22 is disposed between a contact position where the lower surface of the cleaning brush unit 22 is in contact with the upper surface of the wafer W and a separated position where the cleaning surface is greatly separated from the upper surface of the wafer W. Can be moved up and down.
[0028]
When the wafer W is delivered to the wafer holding device 1, the cleaning brush units 22 of the upper surface brush device 2 and the lower surface brush device 3 are in the separated position. When the wafer W is held by the wafer holding device 1, the cleaning brush units 22 of the upper surface brush device 2 and the lower surface brush device 3 are moved in a direction approaching each other, and the cleaning brush units of the upper surface brush device 2 and the lower surface brush device 3 are moved. At 22, the wafer W is sandwiched. In this state, the wafer W is rotated, and the cleaning brush units 22 of the upper surface brush device 2 and the lower surface brush device 3 are rotated, whereby the upper and lower surfaces of the wafer W are scrubbed by the cleaning brush unit 22. Further, during the scrub by the cleaning brush unit 22, the cleaning liquid is supplied from the cleaning liquid nozzle 23 to the center of the upper and lower surfaces of the wafer W. As a result, the upper and lower surfaces of the wafer W are scrubbed and contaminants adhering to the surface of the substrate are removed chemically and mechanically.
[0029]
Examples of the cleaning liquid supplied from the cleaning liquid nozzle 23 include chemical liquids such as hydrofluoric acid, hydrochloric acid, sulfuric acid, phosphoric acid, nitric acid, acetic acid, ammonia, and hydrogen peroxide aqueous solutions thereof, and pure water. .
FIG. 2 is an exploded perspective view showing the configuration of the cleaning brush unit 22. The cleaning brush unit 22 includes an attachment base 40 configured to be detachable from the rotary shaft 21 and four cleaning brushes 50 attached to the attachment base 40 by a brush pressing member 60.
[0030]
The mounting base 40 has a disk part 41 and a peripheral wall part 42 rising from the periphery of the disk part 41, and a space 40 a surrounded by the disk part 41 and the peripheral wall part 42 is a lower end of the rotating shaft 21. It is a recess that can be fitted. In the center of the disc portion 41, an opening 22a is formed in which the discharge port of the cleaning liquid nozzle 23 shown in FIG. Further, on the surface of the disc portion 41 opposite to the surface facing the space 40a, there are mounting recesses 43 for attaching the cleaning brush 50 at four positions shifted by about 90 degrees in the circumferential direction of the disc portion 41. It is formed to be recessed by one step on the space 40a side. In the mounting recess 43, six insertion holes 431 into which the distal ends of the fixing pins 70 can be respectively inserted are formed.
[0031]
Each of the four cleaning brushes 50 is integrally formed using a material such as PVA, polyurethane, polypropylene, or polyethylene. As shown in the plan view of FIG. 3 and the cross-sectional view of FIG. And a contact portion 52 formed on the one surface 51a of the flat plate portion 51 along the longitudinal direction.
The flat plate portion 51 is formed in a planar shape corresponding to the mounting recess 43 of the mounting base 40 and can be fitted into the mounting recess 43. In the flat plate portion 51, insertion holes 511 are formed at positions that overlap the respective insertion holes 431 formed in the mounting recess 43 when fitted into the mounting recess 43. Each insertion hole 511 has a diameter through which the fixing pin 70 can be inserted.
[0032]
The contact portion 52 is a portion that contacts and scrubs the surface of the wafer W, and has two ridge portions 521 having a mountain shape in cross section and a V-shaped valley portion sandwiched between the two ridge portions 521. 522. By providing the valley portion 522, a part of the cleaning liquid supplied to the center of the surface of the wafer W can be favorably guided to the edge of the wafer W through the valley portion 522.
The side surface 52 a along the longitudinal direction of the contact portion 52 is connected to the one surface 51 a of the flat plate portion 51 through the curved surface 53. That is, in the cleaning brush 50, the one surface 51 a of the flat plate portion 51 and the side surface 52 a of the contact portion 52 are connected by the curved surface 53. In other words, the narrowed portion at the base of the cleaning brush 50 is a curved surface 53. Thereby, when the cleaning brush unit 22 is rotated in a state where the contact portion 52 of the cleaning brush 50 is in contact with the surface of the wafer W, the force received by the contact portion 52 from the wafer W by the rotation contacts the flat plate portion 51. It is possible to prevent concentration at the boundary with the part 52.
[0033]
As shown in the plan view of FIG. 5, the brush pressing member 60 is a plate-like member having substantially the same outer size as the flat plate portion 51 of the cleaning brush 50 in plan view. In other words, the brush pressing member 60 has an outer shape corresponding to the mounting recess 43 of the mounting base 40 and is fitted into the mounting recess 43 with almost no gap between the inner surface of the mounting recess 43. Be able to.
The brush holding member 60 has an opening 61 through which the contact portion 52 of the cleaning brush 50 can pass. Further, the insertion hole 62 is formed at a position overlapping with each insertion hole 431 formed in the mounting recess 43 when fitted in the mounting recess 43. Each insertion hole 62 has a diameter through which the fixing pin 70 can be inserted. Furthermore, a plurality of (for example, six) protrusions 63 are formed on the surface 60 a of the brush pressing member 60 that contacts the cleaning brush 50. The brush holding member 60 further includes a drop prevention wall portion 64 for preventing the cleaning brush 50 from falling off from the edge formed in an arc shape corresponding to the peripheral edge of the mounting base 40. It is formed to stand on the 60a side.
[0034]
With the above configuration, the contact portion 52 of the cleaning brush 50 is inserted from the brush contact surface 60 a side of the brush pressing member 60 into the opening 61 of the brush pressing member 60, and the contact portion 52 is directed opposite to the mounting base 40. By fitting the pressing member 60 into the mounting recess 43 of the mounting base 40, the flat plate portion 51 of the cleaning brush 50 can be pressed against the mounting base 40 by the portions 65 on both sides of the opening 61 of the brush pressing member 60. In this state, the insertion hole 511 formed in the cleaning brush 50 communicates with the insertion hole 62 formed in the brush holding member 60, and further, the insertion hole 511 and the insertion hole 62 are in the mounting recess 43. It communicates with the insertion hole 431. Then, by inserting the fixing pin 70 into the insertion hole 431 through the communicating insertion hole 62 and insertion hole 511, the cleaning brush 50 is fixed in a state of being pressed against the mounting base 40 by the brush pressing member 60. can do.
[0035]
Since the fixing pin 70 is also inserted into the cleaning brush 50 as described above, there is no possibility that the mounting position of the cleaning brush 50 is shifted with use. Further, when the cleaning brush 50 is pressed against the mounting base 40 by the brush pressing member 60, the protrusion 63 formed on the brush contact surface 60a of the brush pressing member 60 bites into the cleaning brush 50. It is possible to prevent the brush 50 from being displaced. Therefore, the cleaning brush unit 22 according to this embodiment has no fear of the cleaning brush 50 falling off.
[0036]
Further, in the state where the cleaning brush 50 is attached to the mounting base 40, the flat plate portion 51 of the cleaning brush 50 has an end surface on the peripheral side of the mounting base 40 facing the drop prevention wall portion 64 of the brush pressing member 60. Thereby, it is possible to reliably prevent the cleaning brush 50 from being displaced outward in the radial direction of the mounting base 40 due to the centrifugal force caused by the rotation of the cleaning brush unit 22, and to further eliminate the possibility of the cleaning brush 50 falling off. Further, since one surface 51 a of the flat plate portion 51 of the cleaning brush 50 and the side surface 52 a of the contact portion 52 are connected by the curved surface 53, the force received from the wafer W is applied to the boundary portion between the flat plate portion 51 and the contact portion 52. Concentration can be prevented. In addition, as shown in the cross-sectional view of FIG. 6, it is the periphery of the opening 61 of the brush pressing member 60, and the end facing the curved surface 53 when the contact portion 52 of the cleaning brush 50 is inserted through the opening 61. The edge 611 is chamfered and has a curved surface corresponding to the curved surface 53. Thereby, even if the cleaning brush 50 is strongly pressed against the end edge 611 of the opening 61 of the brush pressing member 60 by the rotation of the cleaning brush unit 22, local force is applied from the end 611 to the curved surface 53 of the cleaning brush 50. There is no fear of acting. Therefore, the cleaning brush 50 is less likely to crack at the boundary portion (curved surface 53) between the flat plate portion 51 and the contact portion 52, and can withstand use for a longer period than the conventional cleaning brush.
[0037]
As mentioned above, although one Embodiment of this invention was described, this invention can also be implemented with another form. For example, in the above-described embodiment, the cleaning liquid is supplied to the wafer W from the center of the lower surface of the cleaning brush unit 22, but a cleaning liquid nozzle for supplying the cleaning liquid to the wafer W is provided at a position away from the cleaning brush unit 22. Thus, the cleaning liquid may be supplied to the wafer W from outside the cleaning brush unit 22.
[0038]
In the above-described embodiment, an apparatus for scrub cleaning on both surfaces of the wafer W is taken as an example. However, the present invention may be applied to an apparatus for scrub cleaning only one surface of the wafer W. In this case, the apparatus for holding and rotating the wafer W is not limited to a configuration in which the wafer W is held and rotated by the plurality of holding rollers 11, and the upper or lower surface of the wafer W is vacuum-sucked and held. A vacuum chuck may be employed.
[0039]
Furthermore, the substrate to be processed by the substrate cleaning apparatus is not limited to the wafer W, but may be other types of substrates such as a glass substrate for a liquid crystal display device, a glass substrate for a plasma display panel, and a magnetic / optical disk substrate.
In addition, various design changes can be made within the scope of the matters described in the claims.
[Brief description of the drawings]
FIG. 1 is a side view conceptually showing the structure of a substrate cleaning apparatus according to an embodiment of the present invention.
FIG. 2 is an exploded perspective view showing a configuration of a cleaning brush unit.
FIG. 3 is a plan view of a cleaning brush.
4 is a cross-sectional view taken along section line IV-IV shown in FIG.
FIG. 5 is a plan view of a brush pressing member.
6 is a cross-sectional view taken along section line VI-VI shown in FIG.
FIG. 7 is an exploded perspective view showing a configuration of a conventional cleaning brush unit.
[Explanation of symbols]
1 Wafer holding device
2 Top brush device
3 Lower surface brush device
21 Rotating shaft
22 Cleaning brush unit
23 Cleaning liquid nozzle
24 Treatment liquid supply source
25 Treatment liquid supply valve
26 Rotation drive part
40 Mounting base
50 Cleaning brush
51 Flat part
51a One side
511 insertion hole
52 Contact part
52a side
53 Curved surface
60 Brush holding member
60a Brush contact surface
61 opening
62 Insertion hole
63 Protrusion
64 Fall-off prevention wall
70 Pin for fixing
O rotation axis
W wafer

Claims

A cleaning brush unit that is applied to a substrate cleaning apparatus for performing a scrub cleaning process on a surface of a substrate and is attached to a rotating body that rotates about a rotation axis substantially orthogonal to the surface of the substrate,
A mounting base detachable from the rotating body;
A cleaning brush attached to the mounting base for scrub cleaning the surface of the substrate;
A brush pressing member for pressing the cleaning brush against the mounting base;
In a state where the cleaning brush is pressed against the mounting base by the brush pressing member, a pin shape is inserted through the brush pressing member and the cleaning brush to fix the brush pressing member and the cleaning brush to the mounting base. and a member only contains,
The cleaning brush has an attachment surface in which one surface is an attachment surface to the attachment base, an insertion hole through which the pin-like member is inserted, and the other surface opposite to the one surface of the attachment portion. And a contact portion that comes into contact with the surface of the substrate during scrub cleaning,
The cleaning brush unit, wherein the brush holding member has an insertion hole through which the pin-shaped member is inserted at a position corresponding to the insertion hole formed in the mounting portion of the cleaning brush.

A cleaning brush unit that is applied to a substrate cleaning apparatus for performing a scrub cleaning process on a surface of a substrate and is attached to a rotating body that rotates about a rotation axis substantially orthogonal to the surface of the substrate,
A mounting base detachable from the rotating body;
A cleaning brush attached to the mounting base for scrub cleaning the surface of the substrate;
A brush pressing member for pressing the cleaning brush against the mounting base ;
In a state where the cleaning brush is pressed against the mounting base by the brush pressing member, a pin shape is inserted through the brush pressing member and the cleaning brush to fix the brush pressing member and the cleaning brush to the mounting base. Including members ,
The cleaning brush protrudes from the mounting portion whose one surface is the mounting surface to the mounting base and the other surface opposite to the one surface of the mounting portion, and is on the surface of the substrate during scrub cleaning. A contact portion to be contacted, the other surface of the mounting portion and the side surface of the contact portion are connected by a curved surface ,
The mounting portion of the cleaning brush has an insertion hole through which the pin-shaped member is inserted,
The cleaning brush unit, wherein the brush holding member has an insertion hole through which the pin-shaped member is inserted at a position corresponding to the insertion hole formed in the mounting portion of the cleaning brush.

The brush pressing member is formed with an opening through which the contact portion of the cleaning brush can be inserted, and presses the mounting portion of the cleaning brush against the mounting base at a portion around the opening. The cleaning brush unit according to claim 1 or 2 .

4. The cleaning brush unit according to claim 3 , wherein the brush pressing member is chamfered at an edge of the opening on the surface side that contacts the contact portion of the cleaning brush.

The brush pressing member has a wall portion that rises from the edge located on the outer side in the rotational radial direction of the cleaning brush unit to the surface side that comes into contact with the cleaning brush when fixed to the mounting base. The cleaning brush unit according to any one of claims 1 to 4 .

The cleaning brush unit according to any one of claims 1 to 5 , wherein a protrusion for preventing the cleaning brush from being displaced is formed on a surface of the brush pressing member that contacts the cleaning brush. .

  A cleaning brush unit that is applied to a substrate cleaning apparatus for performing a scrub cleaning process on a surface of a substrate, and is attached to a rotating body that rotates about a rotation axis substantially orthogonal to the surface of the substrate,
  A mounting base detachable from the rotating body;
  A cleaning brush attached to the mounting base for scrub cleaning the surface of the substrate;
  A brush pressing member for pressing the cleaning brush against the mounting base;
  In a state where the cleaning brush is pressed against the mounting base by the brush pressing member, a pin shape is inserted through the brush pressing member and the cleaning brush to fix the brush pressing member and the cleaning brush to the mounting base. A member,
  A cleaning brush unit, wherein a protrusion for preventing the cleaning brush from being displaced is formed on a surface of the brush pressing member that contacts the cleaning brush.

  A cleaning brush unit that is applied to a substrate cleaning apparatus for performing a scrub cleaning process on a surface of a substrate, and is attached to a rotating body that rotates about a rotation axis substantially orthogonal to the surface of the substrate,
  A mounting base detachable from the rotating body;
  A cleaning brush attached to the mounting base for scrub cleaning the surface of the substrate;
  A brush pressing member for pressing the cleaning brush against the mounting base,
  The cleaning brush protrudes from the mounting portion whose one surface is a mounting surface to the mounting base and the other surface opposite to the one surface of the mounting portion, and is on the surface of the substrate during scrub cleaning. A contact portion to be contacted, the other surface of the mounting portion and the side surface of the contact portion are connected by a curved surface,
  A cleaning brush unit, wherein a protrusion for preventing the cleaning brush from being displaced is formed on a surface of the brush pressing member that contacts the cleaning brush.

Cleaning liquid supply means for supplying a cleaning liquid to the surface of the substrate;
A cleaning brush unit holding a cleaning brush for scrub cleaning the surface of the substrate to which the cleaning liquid is supplied from the cleaning liquid supply means,
9. A substrate cleaning apparatus, wherein the cleaning brush unit according to claim 1 is applied as the cleaning brush unit.

A cleaning brush for scrub cleaning the surface of a substrate,
One surface is an attachment surface to a predetermined rotating body, and an attachment portion formed with an insertion hole through which a pin-like member for fixing to the rotating body is inserted;
A cleaning brush, comprising: a contact portion which protrudes from the other surface opposite to the one surface of the mounting portion and comes into contact with the surface of the substrate during scrub cleaning.

Cleaning brush of claim 10, wherein a and the side surface of the other surface and the contact portion of the upper Symbol attaching portion are connected by a curved surface.