JP3795515B1 - 半導体光電気化学セルの製造方法 - Google Patents
半導体光電気化学セルの製造方法 Download PDFInfo
- Publication number
- JP3795515B1 JP3795515B1 JP2005231668A JP2005231668A JP3795515B1 JP 3795515 B1 JP3795515 B1 JP 3795515B1 JP 2005231668 A JP2005231668 A JP 2005231668A JP 2005231668 A JP2005231668 A JP 2005231668A JP 3795515 B1 JP3795515 B1 JP 3795515B1
- Authority
- JP
- Japan
- Prior art keywords
- titanium
- titanium oxide
- photoelectrochemical cell
- oxide layer
- semiconductor
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- 239000004065 semiconductor Substances 0.000 title claims abstract description 30
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 16
- 229910052719 titanium Inorganic materials 0.000 claims abstract description 40
- 239000010936 titanium Substances 0.000 claims abstract description 40
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 claims abstract description 39
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims abstract description 39
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 claims abstract description 39
- 239000002184 metal Substances 0.000 claims abstract description 24
- 229910052751 metal Inorganic materials 0.000 claims abstract description 23
- 239000000758 substrate Substances 0.000 claims abstract description 13
- 229910001069 Ti alloy Inorganic materials 0.000 claims abstract description 7
- 238000010304 firing Methods 0.000 claims description 11
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 9
- 238000001816 cooling Methods 0.000 claims description 5
- 238000010438 heat treatment Methods 0.000 claims description 4
- 230000001699 photocatalysis Effects 0.000 abstract description 13
- 238000000034 method Methods 0.000 abstract description 12
- 229910000510 noble metal Inorganic materials 0.000 abstract description 3
- 230000000630 rising effect Effects 0.000 abstract description 2
- 239000010410 layer Substances 0.000 description 23
- JVTAAEKCZFNVCJ-UHFFFAOYSA-N lactic acid Chemical compound CC(O)C(O)=O JVTAAEKCZFNVCJ-UHFFFAOYSA-N 0.000 description 20
- 239000000463 material Substances 0.000 description 12
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 12
- 239000004310 lactic acid Substances 0.000 description 10
- 235000014655 lactic acid Nutrition 0.000 description 10
- 238000013032 photocatalytic reaction Methods 0.000 description 8
- 239000000243 solution Substances 0.000 description 8
- 230000000052 comparative effect Effects 0.000 description 6
- 229910052697 platinum Inorganic materials 0.000 description 6
- 239000008151 electrolyte solution Substances 0.000 description 5
- 239000002344 surface layer Substances 0.000 description 5
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 4
- 230000004888 barrier function Effects 0.000 description 4
- 239000013078 crystal Substances 0.000 description 4
- 238000006722 reduction reaction Methods 0.000 description 4
- WSFSSNUMVMOOMR-UHFFFAOYSA-N Formaldehyde Chemical compound O=C WSFSSNUMVMOOMR-UHFFFAOYSA-N 0.000 description 3
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- 230000008859 change Effects 0.000 description 3
- 239000010419 fine particle Substances 0.000 description 3
- 238000007254 oxidation reaction Methods 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- 239000002253 acid Substances 0.000 description 2
- 238000001354 calcination Methods 0.000 description 2
- 230000015556 catabolic process Effects 0.000 description 2
- 238000006731 degradation reaction Methods 0.000 description 2
- -1 hydrogen ions Chemical class 0.000 description 2
- 229910052760 oxygen Inorganic materials 0.000 description 2
- 238000005554 pickling Methods 0.000 description 2
- 239000010970 precious metal Substances 0.000 description 2
- 229910001128 Sn alloy Inorganic materials 0.000 description 1
- FAPWRFPIFSIZLT-UHFFFAOYSA-M Sodium chloride Chemical compound [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 description 1
- 229910000756 V alloy Inorganic materials 0.000 description 1
- 229910001093 Zr alloy Inorganic materials 0.000 description 1
- CPTCUNLUKFTXKF-UHFFFAOYSA-N [Ti].[Zr].[Mo] Chemical compound [Ti].[Zr].[Mo] CPTCUNLUKFTXKF-UHFFFAOYSA-N 0.000 description 1
- UQZIWOQVLUASCR-UHFFFAOYSA-N alumane;titanium Chemical compound [AlH3].[Ti] UQZIWOQVLUASCR-UHFFFAOYSA-N 0.000 description 1
- 238000007743 anodising Methods 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 238000005452 bending Methods 0.000 description 1
- 230000005587 bubbling Effects 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005868 electrolysis reaction Methods 0.000 description 1
- 238000004453 electron probe microanalysis Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 235000013305 food Nutrition 0.000 description 1
- 238000009499 grossing Methods 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 238000007146 photocatalysis Methods 0.000 description 1
- 239000011941 photocatalyst Substances 0.000 description 1
- 235000021110 pickles Nutrition 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- OTYBMLCTZGSZBG-UHFFFAOYSA-L potassium sulfate Chemical compound [K+].[K+].[O-]S([O-])(=O)=O OTYBMLCTZGSZBG-UHFFFAOYSA-L 0.000 description 1
- 229910052939 potassium sulfate Inorganic materials 0.000 description 1
- 235000011151 potassium sulphates Nutrition 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- 238000010791 quenching Methods 0.000 description 1
- 230000000171 quenching effect Effects 0.000 description 1
- 239000011780 sodium chloride Substances 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01G—CAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES OR LIGHT-SENSITIVE DEVICES, OF THE ELECTROLYTIC TYPE
- H01G9/00—Electrolytic capacitors, rectifiers, detectors, switching devices, light-sensitive or temperature-sensitive devices; Processes of their manufacture
- H01G9/20—Light-sensitive devices
- H01G9/2027—Light-sensitive devices comprising an oxide semiconductor electrode
- H01G9/2031—Light-sensitive devices comprising an oxide semiconductor electrode comprising titanium oxide, e.g. TiO2
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01G—COMPOUNDS CONTAINING METALS NOT COVERED BY SUBCLASSES C01D OR C01F
- C01G23/00—Compounds of titanium
- C01G23/04—Oxides; Hydroxides
- C01G23/047—Titanium dioxide
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
- Y02E10/542—Dye sensitized solar cells
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
- Y02P70/50—Manufacturing or production processes characterised by the final manufactured product
Abstract
【解決手段】チタン又はチタン合金からなる基材を、700〜1000℃の大気中にて、5℃/秒以上の昇温速度で焼成して表面に酸化チタン層を形成し、酸化チタン層中に金属チタンを混在させる半導体光電気化学セルの製造方法。
【選択図】図2
Description
(実施例1)
直径約3mm、長さ約80mmの純チタン(99.5wt%)棒を基材として用いた。この基材を、予めフッ化水素酸溶液で酸洗し、乾燥した後、電気炉にて昇温速度7℃/秒で、1000℃×4〜30分大気中にて加熱・焼成し、約10℃の冷水中に急冷した。金属チタンと酸化チタン層の表出割合は、EPMA(日本電子株式会社製:JXA−8800RM)にてTiとOのX線像を撮影した後、その表面積から確認した。実施例1の場合、急冷後、絶縁性の高い最表面層は剥離して除かれたが、その下部組織には、金属チタンが酸化チタン層中に約20%混在していた。
(実施例2)
昇温速度5℃/秒で焼成温度を810℃とした他は、実施例1と同様の処理を行った。実施例2は、急冷しても最表面層の剥離は起こらなかったが、生成された表面の酸化チタンは絶縁性の高いものではなく、組織観察したところ、金属チタンが酸化チタン層中に約20%混在していた。
(実施例3)
焼成温度を700℃とした他は、実施例2と同様の処理を行った。この実施例も、実施例2と同様に、急冷しても最表面層の剥離は起こらなかった。
(比較例1)
焼成温度を1200℃とした他は、実施例2と同様の処理を行った。この場合、実施例1と同様に、急冷後、絶縁性の高い最表面層は剥離して除かれたが、その下部組織には、金属チタンが酸化チタン層中にほとんど混在していなかった。
(比較例2)
焼成温度を500℃とした他は、実施例2と同様の処理を行った。この場合は、実施例2,3と同様に、急冷しても最表面層の剥離は起こらず、酸化チタン層の生成も不十分であった。
次に、上記実施例2の試料(焼成時間は4分のもの)を用いて乳酸分解試験を行った。0.3Mの硫酸カリウム水溶液にて乳酸を0.01%に希釈し、更に水酸化ナトリウムを加えてpHを5.7に調整した。の乳酸溶液2mLに実施例2の試料を投入し、20Wケミカルランプを2.5cmの距離から光照射した(A)。pHは、市販のpHメーター(堀場製作所製:M−8)を用いた。比較のため、上記乳酸溶液に実施例2の試料を投入したが光照射しなかった場合(B)、および上記乳酸溶液(C)のみのpH変化も合わせて示してある。なお、溶液の撹拌を促進するため、酸素によりバブリングを行った。そのときの照射時間によるpH変化を、図4に示す。
CH3COCOOH+2H++2e−→CH3COCOOH+H2
〔別実施の形態〕
(1)上記実施形態では、基材として純チタンを用いた例を挙げて説明したが、本発明に用いる基材としては、チタン−アルミニウム−バナジウム合金、チタン−モリブデン−ジルコニウム合金、チタン−アルミニウム−錫合金など、各種チタン合金を使用することもできる。
2 対極
Claims (2)
- チタン又はチタン合金からなる基材を、700〜1000℃の大気中にて、5℃/秒以上の昇温速度で焼成して表面に酸化チタン層を形成し、その後10℃以下の冷水中にて急冷して、前記酸化チタン層中に金属チタンを混在させる半導体光電気化学セルの製造方法。
- チタン又はチタン合金からなる基材を、900〜1000℃の大気中にて焼成して表面に酸化チタン層を形成し、その後10℃以下の冷水中にて急冷して、前記酸化チタン層中に金属チタンを混在させる半導体光電気化学セルの製造方法。
Priority Applications (7)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2005231668A JP3795515B1 (ja) | 2005-08-10 | 2005-08-10 | 半導体光電気化学セルの製造方法 |
TW095122881A TW200714359A (en) | 2005-08-10 | 2006-06-26 | Manufacturing method for semiconductor photoelectrochemical cell and semiconductor photoelectrochemical cell |
CA2554913A CA2554913C (en) | 2005-08-10 | 2006-07-31 | Manufacturing method for semiconductor photoelectrochemical cell and semiconductor photoelectrochemical cell |
CN2006101042149A CN1912171B (zh) | 2005-08-10 | 2006-08-01 | 半导体光电化学电池单元的制造方法及该电池单元 |
EP06015957.1A EP1752999B1 (en) | 2005-08-10 | 2006-08-01 | Manufacturing method for semiconductor photoelectrochemical cell and semiconductor photoelectrochemical cell |
US11/463,551 US7927914B2 (en) | 2005-08-10 | 2006-08-09 | Manufacturing method for semiconductor photoelectrochemical cell and semiconductor photoelectrochemical cell |
HK07102931.1A HK1095366A1 (en) | 2005-08-10 | 2007-03-19 | A method for producing a photoelectric chemical cell for semiconductor and said cell |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2005231668A JP3795515B1 (ja) | 2005-08-10 | 2005-08-10 | 半導体光電気化学セルの製造方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP3795515B1 true JP3795515B1 (ja) | 2006-07-12 |
JP2007044625A JP2007044625A (ja) | 2007-02-22 |
Family
ID=36739893
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2005231668A Active JP3795515B1 (ja) | 2005-08-10 | 2005-08-10 | 半導体光電気化学セルの製造方法 |
Country Status (7)
Country | Link |
---|---|
US (1) | US7927914B2 (ja) |
EP (1) | EP1752999B1 (ja) |
JP (1) | JP3795515B1 (ja) |
CN (1) | CN1912171B (ja) |
CA (1) | CA2554913C (ja) |
HK (1) | HK1095366A1 (ja) |
TW (1) | TW200714359A (ja) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2022153650A1 (ja) | 2021-01-15 | 2022-07-21 | 株式会社シケン | 半導体酸化チタンの製造方法 |
Family Cites Families (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5913831B2 (ja) * | 1975-03-17 | 1984-04-02 | 健一 本多 | 電気化学光電池 |
JPS5826623A (ja) | 1981-08-08 | 1983-02-17 | Hori Glass Kk | 自動車用窓ガラスのホルダ− |
US4511638A (en) * | 1983-06-01 | 1985-04-16 | Energy Conversion Devices, Inc. | Photoresponsive amorphous semiconductor materials, methods of making the same, and photoanodes made therewith |
JPH0624977B2 (ja) | 1988-05-11 | 1994-04-06 | 石原産業株式会社 | 針状二酸化チタン及びその製造方法 |
JPH0482570A (ja) | 1990-07-24 | 1992-03-16 | Shiken:Kk | 洗浄用ブラシ |
JPH0690824A (ja) | 1992-03-31 | 1994-04-05 | Shiken:Kk | 電動歯ブラシ |
JPH09231821A (ja) * | 1995-12-22 | 1997-09-05 | Toto Ltd | 照明器具及び照度維持方法 |
JP2000219513A (ja) * | 1999-01-28 | 2000-08-08 | Hideaki Tanaka | 結露防止と殺菌、耐光性、防油用のチタン酸化物 |
JP3370290B2 (ja) | 1999-03-25 | 2003-01-27 | 剛久 伊藤 | 光触媒材料の製造方法 |
PE20011010A1 (es) | 1999-12-02 | 2001-10-18 | Glaxo Group Ltd | Oxazoles y tiazoles sustituidos como agonista del receptor activado por el proliferador de peroxisomas humano |
CN1193117C (zh) * | 2001-05-17 | 2005-03-16 | 上海大学 | 一种二氧化钛光催化薄膜的制备方法 |
-
2005
- 2005-08-10 JP JP2005231668A patent/JP3795515B1/ja active Active
-
2006
- 2006-06-26 TW TW095122881A patent/TW200714359A/zh unknown
- 2006-07-31 CA CA2554913A patent/CA2554913C/en active Active
- 2006-08-01 EP EP06015957.1A patent/EP1752999B1/en active Active
- 2006-08-01 CN CN2006101042149A patent/CN1912171B/zh active Active
- 2006-08-09 US US11/463,551 patent/US7927914B2/en active Active
-
2007
- 2007-03-19 HK HK07102931.1A patent/HK1095366A1/xx unknown
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2022153650A1 (ja) | 2021-01-15 | 2022-07-21 | 株式会社シケン | 半導体酸化チタンの製造方法 |
Also Published As
Publication number | Publication date |
---|---|
CA2554913A1 (en) | 2007-02-10 |
CN1912171B (zh) | 2010-05-12 |
EP1752999A2 (en) | 2007-02-14 |
US20070034253A1 (en) | 2007-02-15 |
TWI327085B (ja) | 2010-07-11 |
JP2007044625A (ja) | 2007-02-22 |
CN1912171A (zh) | 2007-02-14 |
TW200714359A (en) | 2007-04-16 |
EP1752999B1 (en) | 2013-10-09 |
US7927914B2 (en) | 2011-04-19 |
HK1095366A1 (en) | 2007-05-04 |
EP1752999A3 (en) | 2009-05-13 |
CA2554913C (en) | 2013-04-16 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP4456378B2 (ja) | 導電性ダイヤモンド電極の製造方法 | |
JP4884333B2 (ja) | 電解用電極 | |
EP2749673B1 (en) | Silver plating and production method therefor | |
JP2008095173A (ja) | 電解用電極及びそれを用いた電解方法及びそれを用いた電解装置 | |
WO2007023543A1 (ja) | 陽極電解酸化処理による結晶性酸化チタン皮膜の製造方法 | |
US9353448B2 (en) | Electrolytic electrode, anode for electrolytic production of ozone, anode for electrolytic production of persulfuric acid and anode for electrolytic oxidation of chromium | |
TWI263701B (en) | Electrolytic electrode and process of producing the same | |
JPS5938394A (ja) | 耐久性を有する電解用電極及びその製造方法 | |
TW201040324A (en) | Method for titanium dioxide coating and the electrolyte used therein | |
TW200825212A (en) | Method of reactivating electrode for electrolysis | |
JP3795515B1 (ja) | 半導体光電気化学セルの製造方法 | |
KR100796718B1 (ko) | 반도체 광전기 화학셀의 제조 방법과 반도체 광전기 화학셀 | |
TWI358391B (ja) | ||
KR20120085787A (ko) | 제어된 결정 조직을 구비한 전기 분해 공정용 전극 | |
JP6066007B1 (ja) | 精製銅の製造方法及び電線の製造方法 | |
JP2004360067A (ja) | 電解用電極及びその製造方法 | |
JP2012045489A (ja) | 表面改質された導電性材料の製造方法 | |
JP6066010B1 (ja) | 精製銅並びに電線の製造方法 | |
CN109338428B (zh) | 一种金属钌掺杂的钛电极的制备方法 | |
JP2003318069A (ja) | アルミニウム電解コンデンサ陽極箔のエッチング方法 | |
JP5874437B2 (ja) | 亜鉛めっき鋼板の製造方法及び亜鉛めっき鋼板 | |
TW201328861A (zh) | 鈦合金複合積層材及其製備方法 | |
RU2553737C2 (ru) | Катод для электрохимического получения водорода и способ его изготовления | |
JP2000178783A (ja) | 光触媒露出Zn系めっき鋼板およびその製造方法 | |
JPS63243291A (ja) | オゾン生成におけるイオン交換膜用陽電極の製造方法 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
TRDD | Decision of grant or rejection written | ||
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20060411 |
|
A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20060412 |
|
R150 | Certificate of patent or registration of utility model |
Free format text: JAPANESE INTERMEDIATE CODE: R150 Ref document number: 3795515 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R150 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20090421 Year of fee payment: 3 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20100421 Year of fee payment: 4 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20100421 Year of fee payment: 4 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20110421 Year of fee payment: 5 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
S111 | Request for change of ownership or part of ownership |
Free format text: JAPANESE INTERMEDIATE CODE: R313113 |
|
S631 | Written request for registration of reclamation of domicile |
Free format text: JAPANESE INTERMEDIATE CODE: R313631 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20110421 Year of fee payment: 5 |
|
R360 | Written notification for declining of transfer of rights |
Free format text: JAPANESE INTERMEDIATE CODE: R360 |
|
R350 | Written notification of registration of transfer |
Free format text: JAPANESE INTERMEDIATE CODE: R350 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20110421 Year of fee payment: 5 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20110421 Year of fee payment: 5 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20120421 Year of fee payment: 6 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20130421 Year of fee payment: 7 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20160421 Year of fee payment: 10 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |