JP3788093B2 - 液晶パネル用基板、液晶パネル及びそれを用いた電子機器並びに液晶パネル用基板の製造方法 - Google Patents
液晶パネル用基板、液晶パネル及びそれを用いた電子機器並びに液晶パネル用基板の製造方法 Download PDFInfo
- Publication number
- JP3788093B2 JP3788093B2 JP7789999A JP7789999A JP3788093B2 JP 3788093 B2 JP3788093 B2 JP 3788093B2 JP 7789999 A JP7789999 A JP 7789999A JP 7789999 A JP7789999 A JP 7789999A JP 3788093 B2 JP3788093 B2 JP 3788093B2
- Authority
- JP
- Japan
- Prior art keywords
- liquid crystal
- substrate
- crystal panel
- conductive layer
- guard ring
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 239000004973 liquid crystal related substance Substances 0.000 title claims description 167
- 239000000758 substrate Substances 0.000 title claims description 133
- 238000004519 manufacturing process Methods 0.000 title claims description 16
- 238000000034 method Methods 0.000 title claims description 16
- 230000002093 peripheral effect Effects 0.000 claims description 18
- 229910052581 Si3N4 Inorganic materials 0.000 claims description 14
- 239000011159 matrix material Substances 0.000 claims description 14
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 claims description 14
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 13
- 239000000463 material Substances 0.000 claims description 10
- 235000012239 silicon dioxide Nutrition 0.000 claims description 7
- 239000000377 silicon dioxide Substances 0.000 claims description 6
- 239000010408 film Substances 0.000 description 111
- 239000010410 layer Substances 0.000 description 81
- 239000011229 interlayer Substances 0.000 description 32
- 230000010287 polarization Effects 0.000 description 20
- 239000004065 semiconductor Substances 0.000 description 15
- 239000003990 capacitor Substances 0.000 description 9
- 238000002161 passivation Methods 0.000 description 9
- 239000011521 glass Substances 0.000 description 7
- 239000012535 impurity Substances 0.000 description 6
- 230000003287 optical effect Effects 0.000 description 6
- 239000002184 metal Substances 0.000 description 5
- 229910052751 metal Inorganic materials 0.000 description 5
- 230000003647 oxidation Effects 0.000 description 5
- 238000007254 oxidation reaction Methods 0.000 description 5
- 239000002245 particle Substances 0.000 description 4
- 229910021420 polycrystalline silicon Inorganic materials 0.000 description 4
- 229920005591 polysilicon Polymers 0.000 description 4
- 229910052782 aluminium Inorganic materials 0.000 description 3
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 3
- 238000006243 chemical reaction Methods 0.000 description 3
- 238000010586 diagram Methods 0.000 description 3
- 230000010365 information processing Effects 0.000 description 3
- 239000003566 sealing material Substances 0.000 description 3
- 229910021332 silicide Inorganic materials 0.000 description 3
- FVBUAEGBCNSCDD-UHFFFAOYSA-N silicide(4-) Chemical compound [Si-4] FVBUAEGBCNSCDD-UHFFFAOYSA-N 0.000 description 3
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 2
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 2
- 239000000853 adhesive Substances 0.000 description 2
- 230000001070 adhesive effect Effects 0.000 description 2
- 239000000919 ceramic Substances 0.000 description 2
- 238000005229 chemical vapour deposition Methods 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 230000005669 field effect Effects 0.000 description 2
- 230000004907 flux Effects 0.000 description 2
- 229910021421 monocrystalline silicon Inorganic materials 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- 230000005540 biological transmission Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 230000000903 blocking effect Effects 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000007667 floating Methods 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 238000002955 isolation Methods 0.000 description 1
- 238000004518 low pressure chemical vapour deposition Methods 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- 239000003870 refractory metal Substances 0.000 description 1
- 239000000565 sealant Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Images
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
- G02F1/1362—Active matrix addressed cells
- G02F1/136277—Active matrix addressed cells formed on a semiconductor substrate, e.g. of silicon
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1339—Gaskets; Spacers; Sealing of cells
Landscapes
- Physics & Mathematics (AREA)
- Nonlinear Science (AREA)
- Liquid Crystal (AREA)
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Mathematical Physics (AREA)
- Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP7789999A JP3788093B2 (ja) | 1998-06-11 | 1999-03-23 | 液晶パネル用基板、液晶パネル及びそれを用いた電子機器並びに液晶パネル用基板の製造方法 |
| US09/323,484 US6313900B1 (en) | 1998-06-11 | 1999-06-01 | LCD with anti-moisture conductive guard ring |
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10-163972 | 1998-06-11 | ||
| JP16397298 | 1998-06-11 | ||
| JP7789999A JP3788093B2 (ja) | 1998-06-11 | 1999-03-23 | 液晶パネル用基板、液晶パネル及びそれを用いた電子機器並びに液晶パネル用基板の製造方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2000066241A JP2000066241A (ja) | 2000-03-03 |
| JP2000066241A5 JP2000066241A5 (enExample) | 2004-09-24 |
| JP3788093B2 true JP3788093B2 (ja) | 2006-06-21 |
Family
ID=26418948
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP7789999A Expired - Fee Related JP3788093B2 (ja) | 1998-06-11 | 1999-03-23 | 液晶パネル用基板、液晶パネル及びそれを用いた電子機器並びに液晶パネル用基板の製造方法 |
Country Status (2)
| Country | Link |
|---|---|
| US (1) | US6313900B1 (enExample) |
| JP (1) | JP3788093B2 (enExample) |
Families Citing this family (16)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2001053283A (ja) * | 1999-08-12 | 2001-02-23 | Semiconductor Energy Lab Co Ltd | 半導体装置及びその作製方法 |
| US7091942B2 (en) * | 2000-01-31 | 2006-08-15 | Seiko Epson Corporation | Electrooptic device and driving method thereof |
| US6509616B2 (en) * | 2000-09-29 | 2003-01-21 | Semiconductor Energy Laboratory Co., Ltd. | Semiconductor device and its manufacturing method |
| JP4118029B2 (ja) * | 2001-03-09 | 2008-07-16 | 富士通株式会社 | 半導体集積回路装置とその製造方法 |
| JP3736513B2 (ja) | 2001-10-04 | 2006-01-18 | セイコーエプソン株式会社 | 電気光学装置及びその製造方法並びに電子機器 |
| JP3933497B2 (ja) * | 2002-03-01 | 2007-06-20 | シャープ株式会社 | 表示装置の製造方法 |
| JP4088120B2 (ja) * | 2002-08-12 | 2008-05-21 | 株式会社ルネサステクノロジ | 半導体装置 |
| US7021124B2 (en) * | 2004-08-27 | 2006-04-04 | International Business Machines Corporation | Method and apparatus for detecting leaks in a fluid cooling system |
| US7893459B2 (en) | 2007-04-10 | 2011-02-22 | Taiwan Semiconductor Manufacturing Company, Ltd. | Seal ring structures with reduced moisture-induced reliability degradation |
| JP5535490B2 (ja) * | 2009-01-30 | 2014-07-02 | 住友電工デバイス・イノベーション株式会社 | 半導体装置 |
| JP5262854B2 (ja) * | 2009-03-09 | 2013-08-14 | セイコーエプソン株式会社 | 配線基板の接続方法 |
| CN102540524B (zh) * | 2010-12-30 | 2015-10-07 | 北京京东方光电科技有限公司 | 防止静电击穿的方法、阵列基板的制造方法和显示背板 |
| JP6127570B2 (ja) * | 2013-02-20 | 2017-05-17 | セイコーエプソン株式会社 | 半導体装置及び電子機器 |
| JP6231778B2 (ja) | 2013-06-05 | 2017-11-15 | キヤノン株式会社 | 電気デバイスおよび放射線検査装置 |
| JP6182985B2 (ja) * | 2013-06-05 | 2017-08-23 | セイコーエプソン株式会社 | 電気光学装置、電気光学装置の製造方法、電子機器 |
| WO2018163892A1 (ja) * | 2017-03-06 | 2018-09-13 | シャープ株式会社 | 液晶表示装置 |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE69319760T2 (de) * | 1992-02-21 | 1999-02-11 | International Business Machines Corp., Armonk, N.Y. | Flüssigkristallanzeigevorrichtung |
| US5841490A (en) * | 1994-10-31 | 1998-11-24 | Kyocera Corporation | Liquid crystal display device and its fabricating method |
-
1999
- 1999-03-23 JP JP7789999A patent/JP3788093B2/ja not_active Expired - Fee Related
- 1999-06-01 US US09/323,484 patent/US6313900B1/en not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JP2000066241A (ja) | 2000-03-03 |
| US6313900B1 (en) | 2001-11-06 |
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