JP3776521B2 - 光スキャナ - Google Patents
光スキャナ Download PDFInfo
- Publication number
- JP3776521B2 JP3776521B2 JP24055896A JP24055896A JP3776521B2 JP 3776521 B2 JP3776521 B2 JP 3776521B2 JP 24055896 A JP24055896 A JP 24055896A JP 24055896 A JP24055896 A JP 24055896A JP 3776521 B2 JP3776521 B2 JP 3776521B2
- Authority
- JP
- Japan
- Prior art keywords
- movable plate
- optical scanner
- support
- elastic member
- coil
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 230000003287 optical effect Effects 0.000 title claims description 147
- 238000005452 bending Methods 0.000 claims description 47
- 238000001514 detection method Methods 0.000 claims description 30
- 229920001721 polyimide Polymers 0.000 description 45
- 239000004642 Polyimide Substances 0.000 description 35
- 239000000463 material Substances 0.000 description 27
- 239000010410 layer Substances 0.000 description 21
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 17
- 238000004519 manufacturing process Methods 0.000 description 17
- 229910052710 silicon Inorganic materials 0.000 description 17
- 239000010703 silicon Substances 0.000 description 17
- 230000004048 modification Effects 0.000 description 16
- 238000012986 modification Methods 0.000 description 16
- 239000000758 substrate Substances 0.000 description 16
- 229910052581 Si3N4 Inorganic materials 0.000 description 15
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 15
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 14
- 229910052782 aluminium Inorganic materials 0.000 description 14
- 230000000694 effects Effects 0.000 description 12
- 229910021421 monocrystalline silicon Inorganic materials 0.000 description 11
- 238000009413 insulation Methods 0.000 description 7
- 230000003993 interaction Effects 0.000 description 7
- 238000000034 method Methods 0.000 description 7
- 239000004065 semiconductor Substances 0.000 description 6
- 238000005530 etching Methods 0.000 description 4
- 230000004907 flux Effects 0.000 description 4
- 230000005415 magnetization Effects 0.000 description 4
- 230000010355 oscillation Effects 0.000 description 4
- 230000008859 change Effects 0.000 description 3
- 238000010586 diagram Methods 0.000 description 3
- 238000001312 dry etching Methods 0.000 description 3
- 230000005489 elastic deformation Effects 0.000 description 3
- 238000005516 engineering process Methods 0.000 description 3
- 230000007613 environmental effect Effects 0.000 description 3
- 230000001747 exhibiting effect Effects 0.000 description 3
- 239000000047 product Substances 0.000 description 3
- 239000000853 adhesive Substances 0.000 description 2
- 230000001070 adhesive effect Effects 0.000 description 2
- 239000006227 byproduct Substances 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 239000012141 concentrate Substances 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- 239000000243 solution Substances 0.000 description 2
- 238000004528 spin coating Methods 0.000 description 2
- 238000004544 sputter deposition Methods 0.000 description 2
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 1
- 239000003463 adsorbent Substances 0.000 description 1
- 239000012670 alkaline solution Substances 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000013016 damping Methods 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 238000004512 die casting Methods 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- 230000005484 gravity Effects 0.000 description 1
- 238000004518 low pressure chemical vapour deposition Methods 0.000 description 1
- 238000012544 monitoring process Methods 0.000 description 1
- 238000000059 patterning Methods 0.000 description 1
- 230000002093 peripheral effect Effects 0.000 description 1
- 230000010363 phase shift Effects 0.000 description 1
- 238000000206 photolithography Methods 0.000 description 1
- 238000007639 printing Methods 0.000 description 1
- 239000011241 protective layer Substances 0.000 description 1
- 238000002310 reflectometry Methods 0.000 description 1
- 238000007789 sealing Methods 0.000 description 1
- 125000006850 spacer group Chemical group 0.000 description 1
- 230000009466 transformation Effects 0.000 description 1
Images
Landscapes
- Mechanical Optical Scanning Systems (AREA)
- Facsimile Scanning Arrangements (AREA)
Priority Applications (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP24055896A JP3776521B2 (ja) | 1996-09-11 | 1996-09-11 | 光スキャナ |
| US09/213,062 US6188504B1 (en) | 1996-06-28 | 1998-12-16 | Optical scanner |
| US09/704,284 US6392776B1 (en) | 1996-06-28 | 2000-11-01 | Optical scanner |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP24055896A JP3776521B2 (ja) | 1996-09-11 | 1996-09-11 | 光スキャナ |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JPH1090625A JPH1090625A (ja) | 1998-04-10 |
| JPH1090625A5 JPH1090625A5 (enExample) | 2004-09-24 |
| JP3776521B2 true JP3776521B2 (ja) | 2006-05-17 |
Family
ID=17061320
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP24055896A Expired - Fee Related JP3776521B2 (ja) | 1996-06-28 | 1996-09-11 | 光スキャナ |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP3776521B2 (enExample) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6108118A (en) * | 1998-07-09 | 2000-08-22 | Olympus Optical Co., Ltd. | Optical deflector |
| JP4590081B2 (ja) * | 2000-09-26 | 2010-12-01 | オリンパス株式会社 | アクチュエータ駆動装置 |
| JP4720699B2 (ja) * | 2006-09-20 | 2011-07-13 | セイコーエプソン株式会社 | アクチュエータ、光スキャナおよび画像形成装置 |
| WO2018159077A1 (ja) | 2017-02-28 | 2018-09-07 | 浜松ホトニクス株式会社 | 光モジュール及び測距装置 |
| FR3098606B1 (fr) | 2019-07-08 | 2022-09-02 | Commissariat Energie Atomique | Scanner a reseau optique a commande de phase mobile |
-
1996
- 1996-09-11 JP JP24055896A patent/JP3776521B2/ja not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| JPH1090625A (ja) | 1998-04-10 |
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| A61 | First payment of annual fees (during grant procedure) |
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