JP3722733B2 - 放電プラズマ処理装置 - Google Patents
放電プラズマ処理装置 Download PDFInfo
- Publication number
- JP3722733B2 JP3722733B2 JP2001298025A JP2001298025A JP3722733B2 JP 3722733 B2 JP3722733 B2 JP 3722733B2 JP 2001298025 A JP2001298025 A JP 2001298025A JP 2001298025 A JP2001298025 A JP 2001298025A JP 3722733 B2 JP3722733 B2 JP 3722733B2
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- electrode
- discharge
- voltage application
- ground electrode
- processing apparatus
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- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
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- 230000015556 catabolic process Effects 0.000 description 1
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- KYKAJFCTULSVSH-UHFFFAOYSA-N chloro(fluoro)methane Chemical compound F[C]Cl KYKAJFCTULSVSH-UHFFFAOYSA-N 0.000 description 1
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- 229910052736 halogen Inorganic materials 0.000 description 1
- 150000002367 halogens Chemical class 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 229920001477 hydrophilic polymer Polymers 0.000 description 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 1
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- 238000004519 manufacturing process Methods 0.000 description 1
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- 229910052754 neon Inorganic materials 0.000 description 1
- GKAOGPIIYCISHV-UHFFFAOYSA-N neon atom Chemical compound [Ne] GKAOGPIIYCISHV-UHFFFAOYSA-N 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
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- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
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- 238000004381 surface treatment Methods 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 229910052724 xenon Inorganic materials 0.000 description 1
- FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 description 1
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- Plasma Technology (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
- Chemical Vapour Deposition (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2001298025A JP3722733B2 (ja) | 2001-09-27 | 2001-09-27 | 放電プラズマ処理装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2001298025A JP3722733B2 (ja) | 2001-09-27 | 2001-09-27 | 放電プラズマ処理装置 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2003100733A JP2003100733A (ja) | 2003-04-04 |
| JP2003100733A5 JP2003100733A5 (enrdf_load_stackoverflow) | 2005-08-11 |
| JP3722733B2 true JP3722733B2 (ja) | 2005-11-30 |
Family
ID=19118993
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2001298025A Expired - Fee Related JP3722733B2 (ja) | 2001-09-27 | 2001-09-27 | 放電プラズマ処理装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP3722733B2 (enrdf_load_stackoverflow) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2010103188A (ja) * | 2008-10-21 | 2010-05-06 | Mitsubishi Electric Corp | 大気圧プラズマ処理装置 |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2009119356A (ja) * | 2007-11-14 | 2009-06-04 | Toshiba Corp | 放電表面処理装置及び放電表面処理方法 |
| JP2010103455A (ja) * | 2008-09-26 | 2010-05-06 | Mitsubishi Electric Corp | プラズマ処理装置 |
| JP2010227897A (ja) * | 2009-03-30 | 2010-10-14 | Toray Eng Co Ltd | 塗布装置システム及び塗布基板の作製方法 |
| US10121655B2 (en) * | 2015-11-20 | 2018-11-06 | Applied Materials, Inc. | Lateral plasma/radical source |
| KR102841605B1 (ko) * | 2019-08-06 | 2025-08-01 | 더 로얄 인스티튜션 포 디 어드밴스먼트 오브 러닝/맥길 유니버시티 | 컨버터블 플라즈마 소스 및 방법 |
-
2001
- 2001-09-27 JP JP2001298025A patent/JP3722733B2/ja not_active Expired - Fee Related
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2010103188A (ja) * | 2008-10-21 | 2010-05-06 | Mitsubishi Electric Corp | 大気圧プラズマ処理装置 |
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| Publication number | Publication date |
|---|---|
| JP2003100733A (ja) | 2003-04-04 |
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