JP3647143B2 - 電子ビーム露光装置及びその露光方法 - Google Patents

電子ビーム露光装置及びその露光方法 Download PDF

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Publication number
JP3647143B2
JP3647143B2 JP15099096A JP15099096A JP3647143B2 JP 3647143 B2 JP3647143 B2 JP 3647143B2 JP 15099096 A JP15099096 A JP 15099096A JP 15099096 A JP15099096 A JP 15099096A JP 3647143 B2 JP3647143 B2 JP 3647143B2
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JP
Japan
Prior art keywords
optical system
electron
electron beam
electron optical
exposure apparatus
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP15099096A
Other languages
English (en)
Japanese (ja)
Other versions
JPH09330870A5 (enExample
JPH09330870A (ja
Inventor
真人 村木
進 後藤
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority to JP15099096A priority Critical patent/JP3647143B2/ja
Application filed by Canon Inc filed Critical Canon Inc
Priority to DE69738276T priority patent/DE69738276T2/de
Priority to KR1019970007085A priority patent/KR100225335B1/ko
Priority to EP03077053A priority patent/EP1369897A3/en
Priority to EP97301406A priority patent/EP0794552B1/en
Priority to EP03077051A priority patent/EP1369895B1/en
Priority to US08/811,602 priority patent/US5834783A/en
Priority to EP03077052A priority patent/EP1369896A3/en
Publication of JPH09330870A publication Critical patent/JPH09330870A/ja
Priority to US09/098,432 priority patent/US5973332A/en
Priority to US09/313,072 priority patent/US6166387A/en
Priority to US09/596,052 priority patent/US6323499B1/en
Application granted granted Critical
Publication of JP3647143B2 publication Critical patent/JP3647143B2/ja
Publication of JPH09330870A5 publication Critical patent/JPH09330870A5/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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  • Electron Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP15099096A 1996-03-04 1996-06-12 電子ビーム露光装置及びその露光方法 Expired - Fee Related JP3647143B2 (ja)

Priority Applications (11)

Application Number Priority Date Filing Date Title
JP15099096A JP3647143B2 (ja) 1996-06-12 1996-06-12 電子ビーム露光装置及びその露光方法
EP03077052A EP1369896A3 (en) 1996-03-04 1997-03-04 Electron beam exposure apparatus and method and device manufacturing method
EP03077053A EP1369897A3 (en) 1996-03-04 1997-03-04 Electron beam exposure apparatus and method, and device manufacturing method
EP97301406A EP0794552B1 (en) 1996-03-04 1997-03-04 Electron beam exposure apparatus and method, and device manufacturing method
EP03077051A EP1369895B1 (en) 1996-03-04 1997-03-04 Electron beam exposure apparatus and method, and device manufacturing method
US08/811,602 US5834783A (en) 1996-03-04 1997-03-04 Electron beam exposure apparatus and method, and device manufacturing method
DE69738276T DE69738276T2 (de) 1996-03-04 1997-03-04 Elektronenstrahl-Belichtungsgerät, Belichtungsverfahren und Verfahren zur Erzeugung eines Objekts
KR1019970007085A KR100225335B1 (ko) 1996-03-04 1997-03-04 전자빔노광장치와 그 방법 및 디바이스제조방법
US09/098,432 US5973332A (en) 1996-03-04 1998-06-17 Electron beam exposure method, and device manufacturing method using same
US09/313,072 US6166387A (en) 1996-03-04 1999-05-17 Electron beam exposure apparatus and method
US09/596,052 US6323499B1 (en) 1996-03-04 2000-06-16 Electron beam exposure apparatus and method, and device manufacturing method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP15099096A JP3647143B2 (ja) 1996-06-12 1996-06-12 電子ビーム露光装置及びその露光方法

Publications (3)

Publication Number Publication Date
JPH09330870A JPH09330870A (ja) 1997-12-22
JP3647143B2 true JP3647143B2 (ja) 2005-05-11
JPH09330870A5 JPH09330870A5 (enExample) 2005-08-04

Family

ID=15508881

Family Applications (1)

Application Number Title Priority Date Filing Date
JP15099096A Expired - Fee Related JP3647143B2 (ja) 1996-03-04 1996-06-12 電子ビーム露光装置及びその露光方法

Country Status (1)

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JP (1) JP3647143B2 (enExample)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3647128B2 (ja) * 1996-03-04 2005-05-11 キヤノン株式会社 電子ビーム露光装置とその露光方法
JP2001267221A (ja) * 2000-03-17 2001-09-28 Canon Inc 荷電粒子線露光装置及びデバイス製造方法
JP2003077813A (ja) * 2001-09-05 2003-03-14 Nikon Corp 荷電粒子線露光装置の結像性能の評価方法、荷電粒子線露光装置の調整方法、ビームぼけ計測装置及び荷電粒子線露光装置
JP2005032837A (ja) * 2003-07-08 2005-02-03 Canon Inc 荷電粒子描画方法及び該方法を用いたデバイス製造方法
JP4477436B2 (ja) 2004-06-30 2010-06-09 キヤノン株式会社 荷電粒子線露光装置
NL2006868C2 (en) 2011-05-30 2012-12-03 Mapper Lithography Ip Bv Charged particle multi-beamlet apparatus.
JP6791051B2 (ja) * 2017-07-28 2020-11-25 株式会社ニューフレアテクノロジー マルチ荷電粒子ビーム描画装置及びマルチ荷電粒子ビーム描画方法

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Publication number Publication date
JPH09330870A (ja) 1997-12-22

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