JP3643783B2 - Substrate edge cleaning apparatus and substrate edge cleaning method - Google Patents

Substrate edge cleaning apparatus and substrate edge cleaning method Download PDF

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JP3643783B2
JP3643783B2 JP2001111163A JP2001111163A JP3643783B2 JP 3643783 B2 JP3643783 B2 JP 3643783B2 JP 2001111163 A JP2001111163 A JP 2001111163A JP 2001111163 A JP2001111163 A JP 2001111163A JP 3643783 B2 JP3643783 B2 JP 3643783B2
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substrate
solvent
edge
gas
nozzles
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JP2002015988A (en
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伊雄 岡本
泰正 志摩
由雄 酒井
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Screen Holdings Co Ltd
Dainippon Screen Manufacturing Co Ltd
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Screen Holdings Co Ltd
Dainippon Screen Manufacturing Co Ltd
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【0001】
【発明の属する技術分野】
本発明は、フォトレジスト塗布液や感光性ポリイミド樹脂やカラーフィルター用の染色剤といった薄膜が表面に形成された液晶用のガラス基板やフォトマスク用のガラス基板、半導体ウエハなどの基板に対し、その薄膜形成後の基板の端縁に溶剤を吐出して、基板の端縁に付着した不要薄膜を溶解除去するために、表面に薄膜が形成された基板を保持する基板保持手段と、その基板保持手段によって保持された基板の端縁の表裏両面の少なくともいずれか一方に溶剤を吐出して不要薄膜を溶解する溶剤ノズルと、溶剤によって溶解された溶解物をガスの吹き付けにより基板の端縁よりも外方に吹き飛ばすガスノズルとを備えた基板端縁洗浄装置および基板端縁洗浄方法に関する。
【0002】
【従来の技術】
上述のような基板端縁洗浄装置としては、従来、特公平3−78777号公報に開示されているものがあった。この従来例によれば、表面に薄膜が形成された基板の周縁部の上面と下面に対向して第1の管と第2の管が設けられるとともに、第1および第2の管の間の間隙部でかつ基板端部の延長上に第3の管が設けられ、第1および第2の管から基板の周縁部の上面と下面に溶剤を供給するとともに、それらの溶剤ならびに溶解除去された不要薄膜を第3の管から吸引排出できるように構成されている。
【0003】
ところが、上述従来例の場合、第1および第2の管の開口端と第3の管の開口端とが近接しているものの、排気時にその吸引力を十分作用させることができず、また、第3の管内において、気流の乱れを生じ、第1および第2の管から吐出された溶剤をすぐに排出しにくく、基板の端縁に近い位置で不測に残り、その残った溶剤が基板の端部に付着してフォトレジストの塗布面に侵入し、基板に塗布された膜厚の均一性を低下する欠点があった。
【0004】
このような欠点を解消するため、本願出願人は、先に、表面に薄膜が形成された基板を保持する基板保持手段と、その基板保持手段によって保持された基板の端縁の表裏両面に溶剤を吐出して不要薄膜を溶解する溶剤ノズルと、溶剤によって溶解された溶解物をガスの吹き付けにより基板の端縁よりも外方に吹き飛ばすガスノズルとを備え、溶剤ノズルとガスノズルとを一体化した状態で基板端縁と相対的に移動させ、基板の端縁を洗浄するように構成した基板端縁洗浄装置を提案した(特願平3−357131号参照)。
【0005】
【発明が解決しようとする課題】
しかしながら、上述提案の基板端縁洗浄装置では、先端側をナイフ状に絞ったガスノズルからガスを帯状に吹き出すように構成しており、吹き出された空気が基板表面に当たるに伴い、圧力が低下して大きく拡がってしまい、基板表面の所望の箇所に所望の圧力でガスを当てにくく、また、ガスの圧力によって、基板表面に塗布された薄膜の膜厚の均一性を乱してしまう欠点があった。
【0006】
本発明は、このような事情に鑑みてなされたものであって、基板表面の所望の位置において溶解物を正確に吹き飛ばすことができるとともに、基板表面に塗布された薄膜の膜厚の均一性を乱すこと無く端縁を洗浄できる基板端縁洗浄装置および基板端縁洗浄方法を提供することを目的とする。
【0007】
【課題を解決するための手段】
請求項1に係る発明の基板端縁洗浄装置は、上述のような目的を達成するために、表面に薄膜が形成され、直線状の端縁を有する基板を保持する基板保持手段と、その基板保持手段によって保持された前記基板の端縁の表裏両面の少なくともいずれか一方に溶剤を吐出して不要薄膜を溶解する溶剤ノズルと、溶剤によって溶解された溶解物をガスの吹き付けにより前記基板の端縁よりも外方に吹き飛ばすガスノズルと、溶剤および溶解物を吸引する排気管とを備えた基板端縁洗浄装置において、前記ガスを前記基板の表面にスポット状に吹き付けるガスノズルを複数設けるとともに、前記溶剤を前記基板の表面にスポット状に吹き付ける溶剤ノズルを複数設け、前記複数の溶剤ノズルを、基板の前記直線状の端縁に沿った長さが当該端縁の長さよりも短い固定部材に対して、前記端縁に沿った長さ方向に沿って固定するとともに、前記複数のガスノズルを、前記複数の溶剤ノズルよりも基板の中心側の前記端縁に沿った長さ方向に沿って固定し、前記固定部材を前記直線状の端縁に対して該直線状の端縁に沿った方向に移動させる移動手段を設け、前記溶剤ノズルの溶剤吐出部とガスノズルのガス吐出部とは前記直線状の端縁に対して直交する直線上に並んだ状態で固定部材に設けられているとともに、前記ガス吐出部の開口面積は前記溶剤吐出部の開口面積よりも大きいことを特徴とする。
【0008】
前記固定部材内に溶剤パイプとガスパイプとが設けられ、前記複数の溶剤ノズルは前記溶剤パイプに、前記複数のガスノズルは前記ガスパイプに、それぞれ接続するようにしてもよい。
【0010】
前記基板は角型基板であり、前記溶剤ノズルとガスノズルとが固定された固定部材、及び、該固定部材を前記直線状の端縁に対して該直線状の端縁に沿った方向に相対的に移動させる移動手段を前記角型基板の各辺に対応させて設けるようにしてもよい。
【0011】
前記排気管に対し、前記基板の端縁よりも基板中心側に至る所定長さの部分を設けるとともに、前記溶剤ノズルの吐出部と前記ガスノズルの吐出部とを、前記排気管の前記所定長さの部分と前記基板との間に位置させるようにしてもよい。
【0012】
請求項に係る発明の基板端縁洗浄装置は、上述のような目的を達成するために、表面に薄膜が形成され、直線状の端縁を有する基板を保持する基板保持手段と、その基板保持手段によって保持された前記基板の端縁の表裏両面の少なくともいずれか一方に溶剤を吐出して不要薄膜を溶解する溶剤ノズルと、溶剤によって溶解された溶解物をガスの吹き付けにより前記基板の端縁よりも外方に吹き飛ばすガスノズルとを備えた基板端縁洗浄装置において、前記溶剤を前記基板の表面にスポット状に吹き付ける溶剤ノズルを複数設けるとともに、前記ガスを前記基板の表面にスポット状に吹き付けるガスノズルを前記溶剤ノズルの数よりも多数設け、前記複数の溶剤ノズルを、基板の前記直線状の端縁に沿った長さが当該端縁の長さよりも短い固定部材に対して、前記端縁に沿った長さ方向に沿って固定するとともに、前記多数のガスノズルを、前記複数の溶剤ノズルよりも基板の中心側の前記端縁に沿った長さ方向に沿って固定し、前記固定部材を前記直線状の端縁に対して該直線状の端縁に沿った方向に移動させる移動手段を設け、前記多数のガスノズルの配列範囲が、前記複数の溶剤ノズルの配列範囲よりも大きいことを特徴とする。
【0013】
前記溶剤ノズルは、隣合う前記ガスノズルの間に対応する位置に設けてもよい。
【0014】
請求項に係る発明の基板端縁洗浄装置は、上述のような目的を達成するために、表面に薄膜が形成され、直線状の端縁を有する基板を保持する基板保持手段と、その基板保持手段によって保持された前記基板の端縁の表裏両面の少なくともいずれか一方に溶剤を吐出して不要薄膜を溶解する溶剤ノズルと、溶剤によって溶解された溶解物をガスの吹き付けにより前記基板の端縁よりも外方に吹き飛ばすガスノズルとを備えた基板端縁洗浄装置において、前記溶剤を前記基板の表面にスポット状に吹き付ける溶剤ノズルを複数設けるとともに、前記ガスを前記基板の表面にスポット状に吹き付けるガスノズルを複数設け、前記複数の溶剤ノズルが前記直線状の端縁に沿った方向に固定されるとともに、前記複数のガスノズルが前記複数の溶剤ノズルよりも基板の中心側の前記端縁に沿った方向に固定され、且つ、前記溶剤ノズルと前記ガスノズルとは千鳥状に配置されている固定部材を設け、前記複数のガスノズルの配列範囲が、前記複数の溶剤ノズルの配列範囲よりも大きいことを特徴とする。
【0016】
上記構成の本発明によれば、ガスノズルからガスを基板表面にスポット状に吹き付けるから、基板表面の所望の位置に十分な圧力でガスを吹き付けることができ、基板表面に当たるに伴っての圧力低下が少なく、基板表面でのガスの拡がりを少なくでき、基板表面の所望の位置において溶解物を正確に吹き飛ばすことができるとともに、基板表面に塗布された薄膜の膜厚の均一性を乱すこと無く基板端縁を洗浄できるようになり、また基板に対してスポット状に溶剤を出す溶剤ノズルと、基板に対してスポット状にガスを出すガスノズルとを基板端縁に沿った方向に複数設けているので、一つの溶剤ノズルからの液で薄膜を溶解する都度その溶解物をスポット状のガスで強力に除去して清浄にする、という溶解と除去よりなる洗浄プロセスを複数の溶剤ノズルの数だけ複数回繰り返して実行することができ、一回一回の洗浄で単にレジストを溶解するだけでなく溶解物の除去まで行い、しかもそれを繰り返すことで、短時間に強力に清浄に洗浄することができ、しかもそれらノズルが一つの固定部材に設けられているので、固定部材の1回の移動で実質的に複数回洗浄することができ、時間的にも洗浄効率が高く、かつそれら複数の溶剤ノズルおよび複数のガスノズルは総計すると極めて多数となるが、溶剤の吐出位置とガスの吐出位置との相対的な位置精度が高く、基板に対するそれら多数の溶剤ノズルおよびガスノズルの位置調整がきわめて容易に行なえ、また固定部材は基板の端縁の長さよりも小さくしているので、固定部材自体が小型であるだけでなく、固定部材を移動させる移動手段も小型のものですみ、装置全体の小型化にも貢献できる。
【0017】
なお、使用する溶剤としては、フォトレジスト塗布液を溶解する場合には、アセトン、メチルエチルケトン、メチルイソブチルケトン、シクロヘキサノン、ジイソブチルケトンなどのケトン類や、酢酸エチル、酢酸ブチル、酢酸−n−アミル、蟻酸メチル、プロピオン酸エチル、フタル酸ジメチル、安息香酸エチルなどのエステル類や、トルエン、キシレン、ベンゼン、エチルベンゼンなどの芳香族炭化水素類や、四塩化炭素、トリクロルエチレン、クロロホルム、1,1,1−トリクロルエタン、モノクロルベンゼン、クロルナフタリンなどのハロゲン化炭化水素類や、テトラヒドロブラン、ジエチルエーテル、エチレングリコールモノメチルエーテル、エチレングリコールモノエチルエーテルアセテートなどのエーテル類や、ジメチルホルムアミドやジメチルスルホキサイドなどを用いることができる。また、染色剤を溶解する場合には、30〜60℃の温湯や、メタノール、エタノール、プロパノールなどの低級アルコールや、アセトンなどを用いることができ、そして、これらの液体中に基板との濡れを良くするために界面活性剤を添加しても良い。
【0018】
【発明の実施の形態】
次に、本発明の実施の形態を図面を用いて詳細に説明する。図1は、本発明の第1実施形態に係る基板端縁洗浄装置の一部切欠全体概略側面図、図2は全体概略平面図であり、回転塗布によって表面に薄膜が形成された角型基板1を載置して真空吸着により保持する基板保持手段2の周囲4箇所それぞれに、角型基板1の表面の端縁に溶剤を吐出して不要薄膜を溶解する4本の溶剤ノズル3a…と、溶剤および溶解した不要薄膜を角型基板1の端縁の外方に吹き飛ばす4本のガスノズル4a…と、角型基板1の裏面の端縁に溶剤を吐出して不要薄膜を溶解する1本の溶剤ノズル3bと、溶剤および溶解した不要薄膜を角型基板1の端縁の外方に吹き飛ばす1本のガスノズル4b…と、それらの溶剤および溶解した不要薄膜を吸引する排気管5…とが備えられて、基板端縁洗浄装置6が構成されている。
【0019】
排気管5に、接続チューブ7とドレンタンク8とを介して真空吸引源9が接続されるとともに、図3の拡大断面図に示すように、排気管5の開口端5aに近接させて針状の吐出部S1を有する上下の溶剤ノズル3a…,3bが取り付けられている。
【0020】
また、溶剤ノズル3a…,3bそれぞれに近接したそれよりも角型基板1の中心側に針状の吐出部S2を有する上側のガスノズル4a…とピストル状のガスノズル4bとが取り付けられ、図4の平面図に示すように、角型基板1の表面側でその端縁に溶剤ノズル3a…からスポット状に溶剤を供給するとともに、ガスノズル4a…からもスポット状にガスを供給し、溶剤ならびに溶剤によって溶解された溶解物をガスによって角型基板1の端縁の外方に吹き飛ばすように構成されている。
【0021】
前記ガスノズル4a…の針状の吐出部S2の開口面積は、溶剤ノズル3a…の針状の吐出部S1の開口面積の約2倍程度であり、そして、溶剤ノズル3a…とガスノズル4a…とが角型基板1の端縁に直交する方向の同一直線上に位置するように並設されている。
【0022】
前記溶剤ノズル3a…,3b、ガスノズル4a…,4bおよび排気管5がノズルブロック10に一体的に取り付けられ、そのノズルブロック10を取り付けた支持アーム11が、固定フレーム12に付設した上下一対のガイド13,13を介して、角型基板1の端縁に沿って移動可能に設けられている。
【0023】
基板保持手段2に保持された角型基板1のひとつの角部に対応する箇所に、正逆転可能な駆動機構としての電動モータ14を設けたモータブラケット15が立設されるとともに、電動モータ14の駆動軸に駆動プーリー16が連動連結されている。
【0024】
基板保持手段2に保持された角型基板1のひとつの角部に対応する箇所に1個の遊転プーリー17が、そして、他の3箇所の角部に対応する箇所に2個づつの遊転プーリー17,17がそれぞれ設けられ、駆動プーリー16と遊転プーリー17…とにわたって一対のワイヤー18,18が巻回され、そのワイヤー18,18の所定の四箇所それぞれに支持アーム11が連結され、電動モータ14の正逆転により、四個のノズルブロック10…それぞれを角型基板1の各辺に沿わせて往復移動し、角型基板1の端縁を洗浄できるように構成されている。
【0025】
以上の構成により、角型基板1の端縁を洗浄するときには、先ず、ガスノズル4a…,4bからのガスの吐出と排気管5からの排気とを開始してからノズルブロック10…の移動を開始し、ノズルブロック10が角型基板1の端部にきたことをセンサ(図示せず)で検出するに伴って溶剤ノズル3a…,3bから溶剤を供給する。しかる後、ノズルブロック10を設定回数往復移動させて、溶剤およびガスの供給により角型基板1の端縁に対する洗浄を行い、その洗浄処理が終了して、ノズルブロック10が角型基板1の端部から外れたことをセンサ(図示せず)で検出するに伴って溶剤ノズル3a…,3bからの溶剤の供給を停止し、そして、ノズルブロック10が原点位置に復帰したときにガスノズル4a…,4bからのガスの吐出と排気管5からの排気とを停止し、角型基板1の四辺の端縁に対する洗浄処理を一挙に行うことができるようになっている。
【0026】
図5の(a)は、本発明に係る基板端縁洗浄装置の第2実施形態を示す要部の側面図であり、第1実施形態と異なるところは次の通りである。すなわち、排気管5の開口端5aに近い所定長さの部分が、角型基板1の面に平行で、かつ、基板面に直交する方向での長さが等しくなるように構成されている。他の構成は第1実施形態と同じであり、同一図番を付すことにより、その説明は省略する。
【0027】
図5の(b)は、本発明に係る基板端縁洗浄装置の第3実施形態を示す要部の側面図であり、第2実施形態と異なるところは次の通りである。排気管5の開口端5aに近い箇所に、角型基板1の表面側にのみ溶剤を吐出する溶剤ノズル3a…が差し込まれ、角型基板1の表面の端縁に溶剤を吐出して洗浄処理できるように構成されている。他の構成は第2実施形態と同じであり、同一図番を付すことにより、その説明は省略する。
【0028】
図5の(c)は、本発明に係る基板端縁洗浄装置の第4実施形態を示す要部の側面図であり、第3実施形態と異なるところは次の通りである。排気管5の開口端5aに近い箇所に、溶剤ノズル3a…よりも開口端側に位置させてガスノズル4a…が設けられている。他の構成は第3実施形態と同じであり、同一図番を付すことにより、その説明は省略する。
【0029】
図6の(a)は、本発明に係る基板端縁洗浄装置の第5実施形態を示す要部の平面図であり、第1実施形態と異なるところは次の通りである。角型基板1の表面に溶剤を供給する溶剤ノズル3a…が四本であるのに対して、ガスを供給するガスノズル4a…が倍の八本設けられている。また、ガスノズル4a…の針状の吐出部S2の開口面積が、溶剤ノズル3a…の針状の吐出部S1の開口面積と等しい小径に構成されている。他の構成は第1実施形態と同じであり、同一図番を付すことにより、その説明は省略する。
【0030】
図6の(b)は、本発明に係る基板端縁洗浄装置の第6実施形態を示す要部の平面図であり、第1実施形態と異なるところは次の通りである。角型基板1の表面に溶剤を供給する溶剤ノズル3a…が四本であるのに対して、ガスを供給するガスノズル4a…が五本設けられ、そして、隣合うガスノズル4a,4a…間それぞれに対応する位置に溶剤ノズル3a…が設けられている。また、ガスノズル4a…の針状の吐出部S2の開口面積が、溶剤ノズル3a…の針状の吐出部S1の開口面積と等しい小径に構成されている。他の構成は第1実施形態と同じであり、同一図番を付すことにより、その説明は省略する。
【0031】
図7は、本発明に係る基板端縁洗浄装置の第7実施形態を示す要部の側面図、図8は、図7のA−A線矢視図、図9は要部の拡大図であり、第1実施形態と異なるところは次の通りである。ケーシング本体19内に溶剤パイプ20とガスパイプ21とが水平姿勢で取り付けられている。溶剤パイプ20には、角型基板1の表面に溶剤を供給する8本の溶剤ノズル3a…と溶剤供給管22とが接続され、一方、ガスパイプ21には、角型基板1の表面にガスを供給する8本のガスノズル4a…とガス供給管23とが接続されている。
【0032】
ノズルブロック10に取り付けられた排気管5に前記ケーシング本体19が着脱可能に取り付けられるとともに、排気管5に、角型基板1の裏面に溶剤を供給する8本の溶剤ノズル3b…が取り付けられている。
【0033】
また、ノズルブロック10に中継ブロック24が取り付けられ、その中継ブロック24と、溶剤供給管22、ガス供給管23、排気管5に接続された吸気管25、および、裏面側の溶剤ノズル3b…に対する溶剤供給管26それぞれとがチューブ27を介して接続されている。他の構成は第1実施形態と同じであり、同一図番を付すことにより、その説明は省略する。
【0034】
この第7実施形態の構成によれば、溶剤ノズル3a…とガスノズル4a…とがケーシング本体19に一体的に取り付けられているため、それぞれを個別に取り付ける場合に比べ、溶剤の吐出位置とガスの吐出位置との相対的な位置精度を高くできる利点を有している。
【0035】
上述実施形態では、基板端縁洗浄装置をフォトレジスト塗布液などによる薄膜形成のための回転塗布装置とは別に専用に構成し、スループットを向上できるように構成しているが、本発明としては、回転塗布装置内に組み込み、回転塗布装置の基板保持手段を基板端縁洗浄装置の基板保持手段2に兼用構成するものでも良い。
【0036】
また、上記実施形態では、基板保持手段2に保持された角型基板1の四辺それぞれに対応して溶剤ノズル3a…,3bとガスノズル4a…,4bと排気管5とを設けているが、本発明としては、一辺あるいは二辺にのみ対応させて設け、角型基板1を保持して回転させる構成と組合わせ、角型基板1を90°あるいは 180°づつ回転させながらその端縁の洗浄を行うように構成するものでも良い。
【0037】
また、上記実施形態では、溶剤ノズル3a…,3bとガスノズル4a…,4bとを角型基板1の表裏両面の端縁に対して洗浄するように設けているが、本発明としては、表裏両面のいずれか一方の端縁に対して洗浄するように設けるように構成するものでも良い。また、裏面側のガスノズル4bの吐出部を針状に構成しても良い。
【0038】
また、本発明は角型基板1に限らず、円形の基板を洗浄処理する基板端縁洗浄装置にも適用できる。
【0039】
【発明の効果】
以上の説明から明らかなように、本発明によれば、溶剤ノズルから吐出された溶剤によって溶解した不要薄膜ならびに溶剤を基板の端縁の外方に吹き飛ばすのに、ガスノズルからガスを基板表面にスポット状に吹き付けるから、基板表面の所望の位置に十分な圧力でガスを吹き付けることができ、基板表面に当たるに伴っての圧力低下が少なく、基板表面でのガスの拡がりを少なくでき、基板表面の所望の位置において溶解物を正確に吹き飛ばすことができるとともに、基板表面に塗布された薄膜の膜厚の均一性を乱すこと無く基板端縁を洗浄できるようになった。
【図面の簡単な説明】
【図1】本発明の第1実施形態に係る基板端縁洗浄装置の一部切欠全体概略側面図である。
【図2】全体概略平面図である。
【図3】要部の拡大側面図である。
【図4】要部の平面図である。
【図5】(a)は、本発明の第2実施形態に係る基板端縁洗浄装置の要部の側面図、(b)は、本発明の第3実施形態に係る基板端縁洗浄装置の要部の側面図、(c)は、本発明の第4実施形態に係る基板端縁洗浄装置の要部の側面図である。
【図6】(a)は、本発明の第5実施形態に係る基板端縁洗浄装置の要部の平面図、(b)は、本発明の第6実施形態に係る基板端縁洗浄装置の要部の平面図である。
【図7】本発明の第7実施形態に係る基板端縁洗浄装置の要部の側面図である。
【図8】図7のA−A線矢視図である。
【図9】要部の拡大図である。
【符号の税明】
1・・・角型基板
2・・・基板保持手段
3a,3b・・・溶剤ノズル
4a,4b・・・排気管
S2・・・ガスノズルの吐出部
[0001]
BACKGROUND OF THE INVENTION
The present invention relates to a substrate such as a glass substrate for a liquid crystal, a glass substrate for a photomask, or a semiconductor wafer on which a thin film such as a photoresist coating solution, a photosensitive polyimide resin, or a color filter stain is formed. Substrate holding means for holding the substrate with the thin film formed on the surface and discharging the solvent to the edge of the substrate after forming the thin film to dissolve and remove the unnecessary thin film adhering to the edge of the substrate. A solvent nozzle that discharges the solvent onto at least one of the front and back surfaces of the edge of the substrate held by the means and dissolves the unnecessary thin film; and the dissolved material dissolved by the solvent is blown out of the edge of the substrate by gas blowing The present invention relates to a substrate edge cleaning apparatus and a substrate edge cleaning method including a gas nozzle that blows outward.
[0002]
[Prior art]
Conventionally, as the above-described substrate edge cleaning apparatus, there has been one disclosed in Japanese Patent Publication No. 3-78777. According to this conventional example, the first tube and the second tube are provided so as to face the upper surface and the lower surface of the peripheral edge of the substrate having a thin film formed on the surface, and between the first and second tubes. A third tube is provided in the gap and on the extension of the end of the substrate, and the solvent is supplied from the first and second tubes to the upper and lower surfaces of the peripheral edge of the substrate and the solvent and dissolved and removed. The unnecessary thin film can be sucked and discharged from the third tube.
[0003]
However, in the case of the above-described conventional example, although the opening ends of the first and second tubes and the opening end of the third tube are close to each other, the suction force cannot be sufficiently applied during exhaust, In the third tube, the turbulence of the air flow is generated, the solvent discharged from the first and second tubes is difficult to be discharged immediately, and it remains unexpectedly near the edge of the substrate. There is a drawback in that it adheres to the edge portion and penetrates into the coated surface of the photoresist to reduce the uniformity of the film thickness coated on the substrate.
[0004]
In order to eliminate such drawbacks, the applicant of the present application first has a substrate holding means for holding a substrate having a thin film formed on the surface, and a solvent on both sides of the edge of the substrate held by the substrate holding means. The solvent nozzle and the gas nozzle are integrated with the solvent nozzle that discharges the unnecessary thin film by discharging the gas and the gas nozzle that blows away the dissolved material dissolved by the solvent to the outside of the edge of the substrate by blowing the gas. Proposed a substrate edge cleaning apparatus configured to move relative to the substrate edge to clean the edge of the substrate (see Japanese Patent Application No. 3-357131).
[0005]
[Problems to be solved by the invention]
However, the proposed substrate edge cleaning apparatus is configured such that gas is blown out in a band form from a gas nozzle whose tip side is squeezed into a knife shape, and the pressure drops as the blown air hits the substrate surface. There is a drawback that the gas spreads greatly, it is difficult to apply gas to a desired location on the substrate surface at a desired pressure, and the uniformity of the film thickness of the thin film applied to the substrate surface is disturbed by the gas pressure. .
[0006]
The present invention has been made in view of such circumstances, and can accurately blow off a melt at a desired position on the surface of the substrate, and can improve the uniformity of the thickness of the thin film applied to the surface of the substrate. It is an object of the present invention to provide a substrate edge cleaning apparatus and a substrate edge cleaning method capable of cleaning the edge without disturbing.
[0007]
[Means for Solving the Problems]
In order to achieve the above object, a substrate edge cleaning apparatus according to a first aspect of the present invention is a substrate holding means for holding a substrate having a thin edge formed thereon and having a linear edge, and the substrate. A solvent nozzle for discharging the solvent onto at least one of the front and back surfaces of the edge of the substrate held by the holding means and dissolving the unnecessary thin film; and the edge of the substrate by blowing the dissolved material dissolved in the solvent by gas blowing In the substrate edge cleaning apparatus comprising a gas nozzle that blows outward from the edge and an exhaust pipe that sucks the solvent and dissolved matter, a plurality of gas nozzles that spray the gas onto the surface of the substrate are provided, and the solvent A plurality of solvent nozzles are sprayed on the surface of the substrate in a spot shape, and the length of the plurality of solvent nozzles along the straight edge of the substrate is the length of the edge. And fixing the plurality of gas nozzles along the edge on the center side of the substrate with respect to the plurality of solvent nozzles. And a moving means for moving the fixing member with respect to the linear end edge in a direction along the linear end edge, and providing a solvent discharge portion of the solvent nozzle and a gas of the gas nozzle. The discharge part is provided on the fixing member in a state of being aligned on a straight line orthogonal to the linear edge, and the opening area of the gas discharge part is larger than the opening area of the solvent discharge part It is characterized by.
[0008]
A solvent pipe and a gas pipe may be provided in the fixing member, and the plurality of solvent nozzles may be connected to the solvent pipe, and the plurality of gas nozzles may be connected to the gas pipe.
[0010]
The substrate is a square substrate, the fixing member to which the solvent nozzle and the gas nozzle are fixed, and the fixing member relative to the linear edge in a direction along the linear edge. A moving means for moving to each other may be provided corresponding to each side of the square substrate.
[0011]
The exhaust pipe is provided with a portion having a predetermined length from the edge of the substrate to the substrate center side, and the discharge portion of the solvent nozzle and the discharge portion of the gas nozzle are connected to the predetermined length of the exhaust pipe. You may make it locate between this part and the said board | substrate.
[0012]
In order to achieve the above object, a substrate edge cleaning apparatus according to a fifth aspect of the present invention is a substrate holding means for holding a substrate having a thin edge formed thereon and having a linear edge, and the substrate. A solvent nozzle for discharging the solvent onto at least one of the front and back surfaces of the edge of the substrate held by the holding means and dissolving the unnecessary thin film; and the edge of the substrate by blowing the dissolved material dissolved in the solvent by gas blowing In a substrate edge cleaning apparatus comprising a gas nozzle that blows outward from the edge, a plurality of solvent nozzles that spray the solvent onto the surface of the substrate are provided, and the gas is sprayed onto the surface of the substrate in a spot shape More gas nozzles are provided than the number of solvent nozzles, and the plurality of solvent nozzles have a length along the straight edge of the substrate shorter than the length of the edge. The fixed member is fixed along the length direction along the edge, and the plurality of gas nozzles are arranged in the length direction along the edge on the center side of the substrate with respect to the plurality of solvent nozzles. And moving means for moving the fixing member in a direction along the linear end edge with respect to the linear end edge, and the array range of the plurality of gas nozzles includes the plurality of solvent nozzles. It is characterized by being larger than the arrangement range .
[0013]
The solvent nozzle may be provided at a corresponding position between the adjacent gas nozzles.
[0014]
In order to achieve the above object, a substrate edge cleaning apparatus according to a seventh aspect of the present invention is a substrate holding means for holding a substrate having a thin film formed on its surface and having a linear edge, and the substrate. A solvent nozzle for discharging the solvent onto at least one of the front and back surfaces of the edge of the substrate held by the holding means and dissolving the unnecessary thin film; and the edge of the substrate by blowing the dissolved material dissolved in the solvent by gas blowing In a substrate edge cleaning apparatus comprising a gas nozzle that blows outward from the edge, a plurality of solvent nozzles that spray the solvent onto the surface of the substrate are provided, and the gas is sprayed onto the surface of the substrate in a spot shape A plurality of gas nozzles are provided, the plurality of solvent nozzles are fixed in a direction along the linear edge, and the plurality of gas nozzles are the plurality of solvents. Fixed in a direction along the edge of the center of the substrate than the nozzle, and wherein providing the fixing member are disposed in a staggered manner to the solvent nozzle and the gas nozzle, arrangement range of the plurality of gas nozzles, It is larger than the arrangement range of the plurality of solvent nozzles .
[0016]
According to the present invention having the above configuration, since the gas is sprayed from the gas nozzle onto the surface of the substrate in a spot shape, the gas can be sprayed to a desired position on the surface of the substrate with a sufficient pressure, and the pressure drops as it hits the substrate surface. Less gas spread on the surface of the substrate, and it is possible to accurately blow off the melt at a desired position on the surface of the substrate, and at the edge of the substrate without disturbing the uniformity of the thickness of the thin film applied to the substrate surface. Since the edge can be cleaned, and a plurality of solvent nozzles that discharge the solvent in a spot shape to the substrate and gas nozzles that discharge the gas in a spot shape to the substrate are provided in the direction along the substrate edge, Each time the thin film is dissolved with the liquid from one solvent nozzle, the cleaning process consists of dissolution and removal, in which the dissolved substance is strongly removed with a spot-like gas and cleaned. The number of solvent nozzles can be repeated several times, and the cleaning is performed not only for dissolving the resist, but also for removing the dissolved material. In addition, since these nozzles are provided on one fixed member, it is possible to perform cleaning multiple times by one movement of the fixed member, and the cleaning efficiency is also improved in terms of time. The number of solvent nozzles and gas nozzles is very large in total, but the relative positional accuracy between the solvent discharge position and the gas discharge position is high, and the solvent nozzles and gas nozzles on the substrate have high relative accuracy. The position can be adjusted very easily, and the fixing member is smaller than the length of the edge of the board, so that not only the fixing member itself is small, but also the fixing member is moved. That the movement means also requires only small in size, it can contribute to the miniaturization of the entire apparatus.
[0017]
In addition, as a solvent to be used, when dissolving a photoresist coating solution, ketones such as acetone, methyl ethyl ketone, methyl isobutyl ketone, cyclohexanone, diisobutyl ketone, ethyl acetate, butyl acetate, acetic acid-n-amyl, formic acid Esters such as methyl, ethyl propionate, dimethyl phthalate, and ethyl benzoate, aromatic hydrocarbons such as toluene, xylene, benzene, ethylbenzene, carbon tetrachloride, trichloroethylene, chloroform, 1,1,1- Halogenated hydrocarbons such as trichloroethane, monochlorobenzene, and chloronaphthalene; ethers such as tetrahydroblanc, diethyl ether, ethylene glycol monomethyl ether, and ethylene glycol monoethyl ether acetate; Or the like can be used Muamido and dimethyl sulfoxide. In addition, when dissolving the stain, hot water of 30 to 60 ° C., lower alcohols such as methanol, ethanol, and propanol, acetone, etc. can be used, and wetting with the substrate in these liquids In order to improve, a surfactant may be added.
[0018]
DETAILED DESCRIPTION OF THE INVENTION
Next, embodiments of the present invention will be described in detail with reference to the drawings. FIG. 1 is an overall schematic side view of a partially cutout substrate edge cleaning apparatus according to a first embodiment of the present invention, and FIG. 2 is an overall schematic plan view of a square substrate having a thin film formed on the surface by spin coating. Four solvent nozzles 3a for discharging the solvent to the edge of the surface of the square substrate 1 to dissolve the unnecessary thin film at each of the four locations around the substrate holding means 2 on which 1 is placed and held by vacuum suction; The four gas nozzles 4a for blowing off the solvent and the dissolved unnecessary thin film to the outside of the edge of the square substrate 1, and one for discharging the solvent to the edge of the back surface of the square substrate 1 to dissolve the unnecessary thin film Solvent nozzle 3b, one gas nozzle 4b for blowing off the solvent and the dissolved unnecessary thin film to the outside of the edge of the square substrate 1, and an exhaust pipe 5 for sucking the solvent and the dissolved unnecessary thin film. The substrate edge cleaning apparatus 6 is provided.
[0019]
A vacuum suction source 9 is connected to the exhaust pipe 5 via a connection tube 7 and a drain tank 8, and as shown in an enlarged sectional view of FIG. Upper and lower solvent nozzles 3a,..., 3b having a discharge portion S1 are attached.
[0020]
Also, an upper gas nozzle 4a... Having a needle-like discharge part S2 on the center side of the square substrate 1 and a pistol gas nozzle 4b closer to the solvent nozzles 3a. As shown in the plan view, on the surface side of the square substrate 1, the solvent is supplied in a spot shape from the solvent nozzle 3 a... To the edge thereof, and the gas is supplied in a spot shape from the gas nozzle 4 a. The dissolved material is blown off to the outside of the edge of the square substrate 1 by gas.
[0021]
The opening area of the needle-like discharge part S2 of the gas nozzle 4a is about twice the opening area of the needle-like discharge part S1 of the solvent nozzle 3a, and the solvent nozzle 3a and the gas nozzle 4a are They are arranged side by side so as to be located on the same straight line in the direction orthogonal to the edge of the square substrate 1.
[0022]
The solvent nozzles 3a, 3b, gas nozzles 4a, 4b and the exhaust pipe 5 are integrally attached to the nozzle block 10, and a pair of upper and lower guides attached to the fixed frame 12 is provided with a support arm 11 to which the nozzle block 10 is attached. 13 and 13 are provided so as to be movable along the edge of the square substrate 1.
[0023]
A motor bracket 15 provided with an electric motor 14 as a drive mechanism capable of forward and reverse rotation is erected at a position corresponding to one corner portion of the square substrate 1 held by the substrate holding means 2, and the electric motor 14. A drive pulley 16 is interlocked to the drive shaft.
[0024]
One idler pulley 17 is provided at a location corresponding to one corner of the square substrate 1 held by the substrate holding means 2, and two idle pulleys are provided at locations corresponding to the other three corners. Rolling pulleys 17 and 17 are provided, respectively, and a pair of wires 18 and 18 are wound around the driving pulley 16 and the idle pulleys 17..., And the support arm 11 is connected to each of predetermined four portions of the wires 18 and 18. The four nozzle blocks 10... Are reciprocated along the sides of the square substrate 1 by forward and reverse rotation of the electric motor 14 so that the edge of the square substrate 1 can be cleaned.
[0025]
With the above configuration, when the edge of the square substrate 1 is cleaned, first, the discharge of the gas from the gas nozzles 4a..., 4b and the exhaust from the exhaust pipe 5 are started, and then the movement of the nozzle block 10. Then, the solvent is supplied from the solvent nozzles 3a,... 3b as the nozzle block 10 comes to the end of the square substrate 1 with a sensor (not shown). Thereafter, the nozzle block 10 is reciprocated a set number of times, and the edge of the rectangular substrate 1 is cleaned by supplying the solvent and gas. After the cleaning process is completed, the nozzle block 10 is moved to the end of the rectangular substrate 1. The supply of the solvent from the solvent nozzles 3a,..., 3b is stopped as the sensor (not shown) detects that the nozzle block 10 is detached, and the gas nozzles 4a,. The discharge of the gas from 4b and the exhaust from the exhaust pipe 5 are stopped, and the cleaning process for the four edges of the square substrate 1 can be performed at once.
[0026]
(A) of FIG. 5 is a side view of the principal part which shows 2nd Embodiment of the board | substrate edge cleaning apparatus based on this invention, The difference from 1st Embodiment is as follows. That is, a portion having a predetermined length near the opening end 5a of the exhaust pipe 5 is configured to be equal in length in a direction parallel to the surface of the square substrate 1 and orthogonal to the substrate surface. Other configurations are the same as those of the first embodiment, and the description thereof is omitted by assigning the same reference numerals.
[0027]
FIG. 5B is a side view of the main part showing the third embodiment of the substrate edge cleaning apparatus according to the present invention. The difference from the second embodiment is as follows. A solvent nozzle 3a... For discharging the solvent only on the surface side of the square substrate 1 is inserted in a location near the opening end 5a of the exhaust pipe 5, and the solvent is discharged to the edge of the surface of the square substrate 1 to perform the cleaning process It is configured to be able to. Other configurations are the same as those of the second embodiment, and the description thereof is omitted by assigning the same reference numerals.
[0028]
FIG. 5C is a side view of the main part showing the fourth embodiment of the substrate edge cleaning apparatus according to the present invention. The differences from the third embodiment are as follows. Gas nozzles 4a are provided at positions closer to the opening end 5a of the exhaust pipe 5 than the solvent nozzles 3a. Other configurations are the same as those of the third embodiment, and the description thereof is omitted by assigning the same reference numerals.
[0029]
FIG. 6A is a plan view of an essential part showing the fifth embodiment of the substrate edge cleaning apparatus according to the present invention, and the differences from the first embodiment are as follows. In contrast to the four solvent nozzles 3a for supplying the solvent to the surface of the square substrate 1, eight gas nozzles 4a for supplying the gas are provided. Further, the opening area of the needle-like discharge part S2 of the gas nozzle 4a is configured to have a small diameter equal to the opening area of the needle-like discharge part S1 of the solvent nozzle 3a. Other configurations are the same as those of the first embodiment, and the description thereof is omitted by assigning the same reference numerals.
[0030]
FIG. 6B is a plan view of the main part showing the sixth embodiment of the substrate edge cleaning apparatus according to the present invention, and the differences from the first embodiment are as follows. Whereas there are four solvent nozzles 3a for supplying the solvent to the surface of the square substrate 1, five gas nozzles 4a for supplying gas are provided, and between the adjacent gas nozzles 4a, 4a, respectively. Solvent nozzles 3a are provided at corresponding positions. Further, the opening area of the needle-like discharge part S2 of the gas nozzle 4a is configured to have a small diameter equal to the opening area of the needle-like discharge part S1 of the solvent nozzle 3a. Other configurations are the same as those of the first embodiment, and the description thereof is omitted by assigning the same reference numerals.
[0031]
7 is a side view of an essential part showing a seventh embodiment of a substrate edge cleaning apparatus according to the present invention, FIG. 8 is a view taken along the line AA of FIG. 7, and FIG. 9 is an enlarged view of the essential part. There are the following differences from the first embodiment. A solvent pipe 20 and a gas pipe 21 are mounted in the casing body 19 in a horizontal posture. The solvent pipe 20 is connected to eight solvent nozzles 3 a... For supplying a solvent to the surface of the square substrate 1 and a solvent supply pipe 22, while the gas pipe 21 supplies gas to the surface of the square substrate 1. The eight gas nozzles 4a to be supplied and the gas supply pipe 23 are connected.
[0032]
The casing body 19 is detachably attached to the exhaust pipe 5 attached to the nozzle block 10, and eight solvent nozzles 3 b... For supplying a solvent to the back surface of the square substrate 1 are attached to the exhaust pipe 5. Yes.
[0033]
Further, a relay block 24 is attached to the nozzle block 10, and the relay block 24, the solvent supply pipe 22, the gas supply pipe 23, the intake pipe 25 connected to the exhaust pipe 5, and the solvent nozzle 3 b on the back side are connected. Each of the solvent supply pipes 26 is connected via a tube 27. Other configurations are the same as those of the first embodiment, and the description thereof is omitted by assigning the same reference numerals.
[0034]
According to the configuration of the seventh embodiment, since the solvent nozzles 3a and the gas nozzles 4a are integrally attached to the casing body 19, compared with the case where they are individually attached, the solvent discharge position and the gas There is an advantage that the positional accuracy relative to the discharge position can be increased.
[0035]
In the above-described embodiment, the substrate edge cleaning device is configured exclusively for the spin coating device for forming a thin film by using a photoresist coating solution or the like, and configured to improve the throughput. The substrate holding means of the spin coating apparatus may be combined with the substrate holding means 2 of the substrate edge cleaning apparatus.
[0036]
In the above embodiment, the solvent nozzles 3a, 3b, gas nozzles 4a, 4b, and the exhaust pipe 5 are provided corresponding to the four sides of the square substrate 1 held by the substrate holding means 2, respectively. As an invention, it is provided corresponding to only one side or two sides, combined with a structure in which the square substrate 1 is held and rotated, and the edge of the square substrate 1 is cleaned while rotating by 90 ° or 180 °. It may be configured to do.
[0037]
Moreover, in the said embodiment, although solvent nozzle 3a ..., 3b and gas nozzle 4a ..., 4b are provided so that it may wash | clean with respect to the edge of both the front and back of the square board | substrate 1, as front and back both sides as this invention It may be configured to be provided so as to clean any one of the edges. Moreover, you may comprise the discharge part of the gas nozzle 4b on the back side in the shape of a needle.
[0038]
Further, the present invention is not limited to the square substrate 1 and can also be applied to a substrate edge cleaning apparatus for cleaning a circular substrate.
[0039]
【The invention's effect】
As is apparent from the above description, according to the present invention, the gas from the gas nozzle is spotted on the substrate surface in order to blow off the unnecessary thin film dissolved by the solvent discharged from the solvent nozzle and the solvent to the outside of the edge of the substrate. The gas can be blown at a desired position on the substrate surface with sufficient pressure, the pressure drop when hitting the substrate surface is small, the gas spread on the substrate surface can be reduced, and the desired substrate surface In this position, the melted material can be accurately blown off, and the edge of the substrate can be cleaned without disturbing the uniformity of the thickness of the thin film applied to the substrate surface.
[Brief description of the drawings]
FIG. 1 is an overall schematic side view of a partly cutout of a substrate edge cleaning apparatus according to a first embodiment of the present invention.
FIG. 2 is an overall schematic plan view.
FIG. 3 is an enlarged side view of a main part.
FIG. 4 is a plan view of a main part.
5A is a side view of the main part of the substrate edge cleaning apparatus according to the second embodiment of the present invention, and FIG. 5B is the side view of the substrate edge cleaning apparatus according to the third embodiment of the present invention. The side view of the principal part, (c) is a side view of the principal part of the substrate edge cleaning apparatus according to the fourth embodiment of the present invention.
6A is a plan view of a main part of a substrate edge cleaning apparatus according to a fifth embodiment of the present invention, and FIG. 6B is a view of a substrate edge cleaning apparatus according to the sixth embodiment of the present invention. It is a top view of the principal part.
FIG. 7 is a side view of an essential part of a substrate edge cleaning apparatus according to a seventh embodiment of the present invention.
8 is a view taken along line AA in FIG.
FIG. 9 is an enlarged view of a main part.
[Tax of the sign]
DESCRIPTION OF SYMBOLS 1 ... Square substrate 2 ... Substrate holding means 3a, 3b ... Solvent nozzle 4a, 4b ... Exhaust pipe S2 ... Gas nozzle discharge part

Claims (7)

表面に薄膜が形成され、直線状の端縁を有する基板を保持する基板保持手段と、その基板保持手段によって保持された前記基板の端縁の表裏両面の少なくともいずれか一方に溶剤を吐出して不要薄膜を溶解する溶剤ノズルと、溶剤によって溶解された溶解物をガスの吹き付けにより前記基板の端縁よりも外方に吹き飛ばすガスノズルと、溶剤および溶解物を吸引する排気管とを備えた基板端縁洗浄装置において、
前記ガスを前記基板の表面にスポット状に吹き付けるガスノズルを複数設けるとともに、
前記溶剤を前記基板の表面にスポット状に吹き付ける溶剤ノズルを複数設け、
前記複数の溶剤ノズルを、基板の前記直線状の端縁に沿った長さが当該端縁の長さよりも短い固定部材に対して、前記端縁に沿った長さ方向に沿って固定するとともに、前記複数のガスノズルを、前記複数の溶剤ノズルよりも基板の中心側の前記端縁に沿った長さ方向に沿って固定し、
前記固定部材を前記直線状の端縁に対して該直線状の端縁に沿った方向に移動させる移動手段を設け
前記溶剤ノズルの溶剤吐出部とガスノズルのガス吐出部とは前記直線状の端縁に対して直交する直線上に並んだ状態で固定部材に設けられているとともに、前記ガス吐出部の開口面積は前記溶剤吐出部の開口面積よりも大きいことを特徴とする基板端縁洗浄装置。
A solvent is discharged onto at least one of the substrate holding means for holding a substrate having a thin edge formed on its surface and having a linear edge, and the front and back surfaces of the edge of the substrate held by the substrate holding means. A substrate end provided with a solvent nozzle for dissolving the unnecessary thin film, a gas nozzle for blowing the dissolved material dissolved by the solvent outward from the edge of the substrate by gas blowing, and an exhaust pipe for sucking the solvent and the dissolved material In the edge cleaning device,
While providing a plurality of gas nozzles that spray the gas onto the surface of the substrate in a spot shape,
A plurality of solvent nozzles that spray the solvent onto the surface of the substrate in a spot shape,
Fixing the plurality of solvent nozzles along a length direction along the edge with respect to a fixing member whose length along the linear edge of the substrate is shorter than the length of the edge; Fixing the plurality of gas nozzles along a length direction along the edge on the center side of the substrate from the plurality of solvent nozzles;
A moving means for moving the fixing member in a direction along the linear edge with respect to the linear edge ;
The solvent discharge portion of the solvent nozzle and the gas discharge portion of the gas nozzle are provided on the fixed member in a state of being aligned on a straight line orthogonal to the linear edge, and the opening area of the gas discharge portion is A substrate edge cleaning apparatus having a larger opening area than the solvent discharge portion .
請求項1に記載の基板端縁洗浄装置において、
前記固定部材内に溶剤パイプとガスパイプとが設けられ、前記複数の溶剤ノズルは前記溶剤パイプに、前記複数のガスノズルは前記ガスパイプに、それぞれ接続されていることを特徴とする基板端縁洗浄装置。
The substrate edge cleaning apparatus according to claim 1,
A substrate edge cleaning apparatus, wherein a solvent pipe and a gas pipe are provided in the fixing member, the plurality of solvent nozzles are connected to the solvent pipe, and the plurality of gas nozzles are connected to the gas pipe, respectively.
請求項1または2に記載の基板端縁洗浄装置において、
前記基板は角型基板であり、
前記溶剤ノズルとガスノズルとが固定された固定部材、及び、該固定部材を前記直線状の端縁に対して該直線状の端縁に沿った方向に相対的に移動させる移動手段を前記角型基板の各辺に対応させて設けたことを特徴とする基板端縁洗浄装置。
The substrate edge cleaning apparatus according to claim 1 or 2 ,
The substrate is a square substrate;
A fixing member in which the solvent nozzle and the gas nozzle are fixed, and a moving means for moving the fixing member relative to the linear edge in a direction along the linear edge. A substrate edge cleaning apparatus, which is provided corresponding to each side of a substrate.
請求項1乃至のいずれかに記載の基板端縁洗浄装置において、
前記排気管に対し、前記基板の端縁よりも基板中心側に至る所定長さの部分を設けるとともに、
前記溶剤ノズルの吐出部と前記ガスノズルの吐出部とを、前記排気管の前記所定長さの部分と前記基板との間に位置させたことを特徴とする基板端縁洗浄装置。
The substrate edge cleaning apparatus according to any one of claims 1 to 3 ,
For the exhaust pipe, a portion having a predetermined length reaching the substrate center side from the edge of the substrate is provided,
The substrate edge cleaning apparatus, wherein the discharge portion of the solvent nozzle and the discharge portion of the gas nozzle are positioned between the predetermined length portion of the exhaust pipe and the substrate.
表面に薄膜が形成され、直線状の端縁を有する基板を保持する基板保持手段と、その基板保持手段によって保持された前記基板の端縁の表裏両面の少なくともいずれか一方に溶剤を吐出して不要薄膜を溶解する溶剤ノズルと、溶剤によって溶解された溶解物をガスの吹き付けにより前記基板の端縁よりも外方に吹き飛ばすガスノズルとを備えた基板端縁洗浄装置において、
前記溶剤を前記基板の表面にスポット状に吹き付ける溶剤ノズルを複数設けるとともに、
前記ガスを前記基板の表面にスポット状に吹き付けるガスノズルを前記溶剤ノズルの数よりも多数設け、
前記複数の溶剤ノズルを、基板の前記直線状の端縁に沿った長さが当該端縁の長さよりも短い固定部材に対して、前記端縁に沿った長さ方向に沿って固定するとともに、前記多数のガスノズルを、前記複数の溶剤ノズルよりも基板の中心側の前記端縁に沿った長さ方向に沿って固定し、
前記固定部材を前記直線状の端縁に対して該直線状の端縁に沿った方向に移動させる移動手段を設け
前記多数のガスノズルの配列範囲が、前記複数の溶剤ノズルの配列範囲よりも大きいことを特徴とする基板端縁洗浄装置。
A solvent is discharged onto at least one of the substrate holding means for holding a substrate having a thin edge formed on its surface and having a linear edge, and the front and back surfaces of the edge of the substrate held by the substrate holding means. In a substrate edge cleaning apparatus comprising a solvent nozzle that dissolves an unnecessary thin film, and a gas nozzle that blows away a dissolved material dissolved by the solvent outward from the edge of the substrate by blowing a gas.
While providing a plurality of solvent nozzles that spray the solvent onto the surface of the substrate in a spot shape,
A number of gas nozzles that spray the gas onto the surface of the substrate in a spot shape are provided rather than the number of the solvent nozzles,
Fixing the plurality of solvent nozzles along a length direction along the edge with respect to a fixing member whose length along the linear edge of the substrate is shorter than the length of the edge; Fixing the plurality of gas nozzles along a length direction along the edge on the center side of the substrate with respect to the plurality of solvent nozzles;
A moving means for moving the fixing member in a direction along the linear edge with respect to the linear edge ;
The substrate edge cleaning apparatus , wherein an array range of the plurality of gas nozzles is larger than an array range of the plurality of solvent nozzles .
請求項に記載の基板端縁洗浄装置において、
前記溶剤ノズルは、隣合う前記ガスノズルの間に対応する位置に設けられていることを特徴とする基板端縁洗浄装置。
The substrate edge cleaning apparatus according to claim 5 , wherein
The substrate edge cleaning apparatus, wherein the solvent nozzle is provided at a position corresponding to between the adjacent gas nozzles.
表面に薄膜が形成され、直線状の端縁を有する基板を保持する基板保持手段と、その基板保持手段によって保持された前記基板の端縁の表裏両面の少なくともいずれか一方に溶剤を吐出して不要薄膜を溶解する溶剤ノズルと、溶剤によって溶解された溶解物をガスの吹き付けにより前記基板の端縁よりも外方に吹き飛ばすガスノズルとを備えた基板端縁洗浄装置において、
前記溶剤を前記基板の表面にスポット状に吹き付ける溶剤ノズルを複数設けるとともに、
前記ガスを前記基板の表面にスポット状に吹き付けるガスノズルを複数設け、
前記複数の溶剤ノズルが前記直線状の端縁に沿った方向に固定されるとともに、前記複数のガスノズルが前記複数の溶剤ノズルよりも基板の中心側の前記端縁に沿った方向に固定され、且つ、前記溶剤ノズルと前記ガスノズルとは千鳥状に配置されている固定部材を設け
前記複数のガスノズルの配列範囲が、前記複数の溶剤ノズルの配列範囲よりも大きいことを特徴とする基板端縁洗浄装置。
A solvent is discharged onto at least one of the substrate holding means for holding a substrate having a thin edge formed on its surface and having a linear edge, and the front and back surfaces of the edge of the substrate held by the substrate holding means. In a substrate edge cleaning apparatus comprising a solvent nozzle that dissolves an unnecessary thin film, and a gas nozzle that blows away a dissolved material dissolved by the solvent outward from the edge of the substrate by blowing a gas.
While providing a plurality of solvent nozzles that spray the solvent onto the surface of the substrate in a spot shape,
A plurality of gas nozzles that spray the gas onto the surface of the substrate in a spot shape,
The plurality of solvent nozzles are fixed in a direction along the linear edge, and the plurality of gas nozzles are fixed in a direction along the edge on the center side of the substrate from the plurality of solvent nozzles, And the solvent nozzle and the gas nozzle provide a fixing member arranged in a staggered manner ,
The substrate edge cleaning apparatus , wherein an array range of the plurality of gas nozzles is larger than an array range of the plurality of solvent nozzles .
JP2001111163A 2001-04-10 2001-04-10 Substrate edge cleaning apparatus and substrate edge cleaning method Expired - Fee Related JP3643783B2 (en)

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