JP3623676B2 - High frequency heating device - Google Patents

High frequency heating device Download PDF

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Publication number
JP3623676B2
JP3623676B2 JP35712898A JP35712898A JP3623676B2 JP 3623676 B2 JP3623676 B2 JP 3623676B2 JP 35712898 A JP35712898 A JP 35712898A JP 35712898 A JP35712898 A JP 35712898A JP 3623676 B2 JP3623676 B2 JP 3623676B2
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Japan
Prior art keywords
heated
heating chamber
mounting table
rotating body
waveguide
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JP35712898A
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Japanese (ja)
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JP2000179864A (en
Inventor
隆幸 平光
正史 長田
哲也 宮前
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Mitsubishi Electric Home Appliance Co Ltd
Mitsubishi Electric Corp
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Mitsubishi Electric Home Appliance Co Ltd
Mitsubishi Electric Corp
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Priority to JP35712898A priority Critical patent/JP3623676B2/en
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Description

【0001】
【発明の属する技術分野】
この発明は、マグネトロンから放射されるマイクロ波を被加熱物に照射して加熱調理する高周波加熱装置に関するものである。
【0002】
【従来の技術】
図9は、従来例である一般的な高周波加熱装置を示す正断面図である。図9において、1は被加熱物2を収容する加熱室、3は加熱室1の下部に配設されて被加熱物2を載置する円板状の載置台、4はこの載置台3を支持する金属製の円状の回転板、5は加熱室1外に設けられて円状の回転板4を回転させるモータである。6は加熱室1の外側壁部に配置してマグネトロン7で放射するマイクロ波をマグネトロン保護部材8を介して加熱室1に伝送する導波管である。
【0003】
次に、従来の高周波加熱装置の動作について説明する。図9において、マグネトロン7で放射されるマイクロ波は導波管6からマグネトロン保護部材8を経て加熱室1に伝送していく。そして、加熱室1に伝送されたマイクロ波はこの壁面への入射と反射とを繰り返しながら被加熱物2に照射することにより、被加熱物2が加熱調理される。このとき、モータ5は回転駆動することによって被加熱物2が回転することになる。
【0004】
【発明が解決しようとする課題】
従来の高周波加熱装置において、前述のようにマイクロ波は被加熱物に直接入射することが少なく、加熱室の側壁面に対して入射と反射とを繰り返しながら被加熱物に照射される。しかし、マイクロ波のエネルギーは加熱室の側壁面に入射した時点で減衰する。このため、加熱室の側壁面での反射回数が増えるとマイクロ波のエネルギーロスが大きくなるということになる。したがって、被加熱物の加熱効率低下や加熱ムラを生じ易いという問題点があった。
【0005】
また、マイクロ波は前述の伝送経路のために被加熱物の概中央下部の領域へ集中的に照射されにくい。したがって、例えば縦長状の容器内に日本酒やミルクなどを入れて加熱調理した場合に、十分に加熱するまでの経過時間が比較的長く、かつ加熱ムラを生じるという問題点があった。
【0006】
さらに、加熱室の高さが比較的低く、かつ加熱室の底部より上方側に載置台や回転板を配設するので有効容積が小さくなり、これによって高さがある容器例えば2合徳利などが収容できないという問題点があった。
【0007】
この発明は、このような問題点を解決するためになされたもので導波管の配置、載置台および回転板の形状・設置場所を工夫して被加熱物の概中央下部の領域にマイクロ波を集中的に照射させ、被加熱物の加熱不足や加熱ムラを解消し、さらに加熱室の有効容積を大きくした高周波加熱装置を提供することを目的としている。
【0008】
【課題を解決するための手段】
この発明に係わる高周波加熱装置は、被加熱物を収容する加熱室を設け、加熱室の底部中央に給電口を設け、給電口に接続されかつ加熱室底部に沿って平行に導波管を設け、導波管内であって給電口を臨む位置に回転体を配設し、この回転体をマイクロ波の1波長にほぼ等しい内径を有する複数の環状板を上下に所定間隔を置いて配置するようにした。
【0009】
また、回転体を着脱自在に配設するようにした。
【0010】
また、回転体に被加熱物を載せる皿を着脱自在に載置するようにした。
【0011】
また、被加熱物を収容する加熱室と、この加熱室の底部中央に設けられた給電口と、この給電口に接続されかつ加熱室底部に沿って平行に設けられた導波管と、この導波管の給電口を臨む位置に配設された回転体と、加熱室内に配設され中央部に給電口を介して前記導波管内に配設されて前記回転体上に載置される凹部を形成した載置台とを具備するようにした。
【0012】
また、回転体の外径および載置台凹部の内径をマイクロ波の1波長にほぼ等しく形成するようにした。
【0013】
前記載置台凹部の内壁面の対向する位置に複数の金属片を取り付けるようにした。
【0014】
また、載置台に被加熱物を載せる皿を着脱自在に載置するようにした。
【0015】
【発明の実施の形態】
実施の形態1.
図1は、この発明による高周波加熱装置の実施の形態を説明する正断面図である。図1において、従来例と同一の符号は同一又は相当部分を示す。図1において、9は加熱室1の底部中央に形成される開口部であり、この開口部9に連通して横置き状に導波管6が設けられる。ここで、例えば導波管6の幅を60乃至80mm(マイクロ波の波長の1/2相当の範囲)、高さを約35mmに設定し、さらにマイクロ波の出口部内径(図1中のA)を約160mmに設定する。そして、導波管6のマイクロ波出口部の空間にモータ5の回転駆動で回転するリング状の回転板10を配設し、このリング状の回転板10の上に円板状の載置台3を載せる。さらに、この載置台3の上に被加熱物2が置かれたガラスの皿11を載せておく。
【0016】
リング状の回転板10の具体的な構成は図2に示すように、リング状の第1の回転板10aの複数箇所に支持棒10bの一端を取り付け、支持棒10bの他端にはリング状の第2の回転板10cを取り付ける。この第2の回転板10cの内周部に十字状の支持板10dを設け、支持板10dの中心部にモータ5の軸孔を形成させる。ここで、リング状の第1の回転板10aおよび第2の回転板10cの外側直径を約140mm、内側直径を約120mmに設定する。
【0017】
次に、この発明の高周波加熱装置の動作について、図1と図2を併用して説明する。 図1と図2において、加熱装置を運転開始させるとマグネトロン7から放射されるマイクロ波は導波管6の所定箇所に配置するマグネトロン保護部材8を通過していく。そして、このマイクロ波は第1の回転板10aと第2の回転板10cとの間や第2の回転板10cの下部を進行して加熱室1の底部に形成する開口部9から円板状の載置台3を経て、さらにガラスの皿11を通過していく。ここで、円板状の載置台3はマイクロ波を通過させる特性をもつ例えばセラミック、硝子などの低誘電率タイプのものを採用する。
【0018】
これによって、マイクロ波がリング状の回転板10と一体となって回転する被加熱物2の概中央下部の領域へ集中的に照射することにより、この領域で発生した熱が被加熱物2の全体部に移動して均一な温度となる。したがって、被加熱物2の加熱ムラが少なく、かつこの物が加熱されるまでの経過時間は短くなる。
【0019】
また、高さがある容器内の被加熱物2例えば2合徳利内の日本酒あるいはグラス内のミルクを加熱調理する場合は、円板状の載置台3およびガラスの皿11を取り除き、内側直径が約120mmに設定されたリング状の回転板10の中にこの容器を収容させる。次に、加熱装置を運転開始させるとマグネトロン保護部材8を通過したマイクロ波が、リング状の回転板10と一体となって回転する被加熱物2の下部へ直接的かつ集中的に照射される。これにより、導波管6の側壁面へのマイクロ波の入射/反射回数が極端に少なくできるので、高いエネルギーをもつマイクロ波が被加熱物に照射される状態となる。
こうした構成により、縦長状の例えば2合徳利内の日本酒やグラス内のミルクなどにあっては、被加熱部の下部を加熱すれば対流作用で加熱ムラが少なく、かつ加熱調理時間が短くなる。
【0020】
以上のように、容積が大きい被加熱物2又は高さがある容器内の被加熱物2を加熱調理する場合に、導波管6の一部の空間を適宜有効利用する/しないなどして、有効容積を調整しながら均一に加熱調理することができる。
【0021】
実施の形態2.
図3は、この発明による高周波加熱装置の他の実施の形態を説明する正断面図である。図3において、従来例または実施の形態1と同一の符号は同一又は相当部分を示す。12は円板状の載置台3の中央箇所に凹部が形成される凹状の載置台であり、この凹部を導波管6のマイクロ波出口部の空間下部に配設される円状の回転板4の上に載るように配置させる。そして、被加熱物2が載っているガラスの皿11を凹状の載置台12の凹部を塞ぐ状態で置く。ここで、凹状の載置台12は実施の形態1と同様に例えばセラミック、硝子などの低誘電率タイプのものを採用する。
【0022】
次に、加熱装置を運転開始させるとマグネトロンより放射されるマイクロ波がマグネトロン保護部材8から凹状の載置台12の側壁部を通過していく。そして、このマイクロ波が円状の回転板4と一体となって回転する被加熱物2の概中央下部の領域へ集中的に照射される。これにより、前述と同様に被加熱物2の加熱ムラの解消や加熱時間の短縮化が得られる。
【0023】
また、高さがある容器内の被加熱物2例えば2合徳利内の日本酒あるいはグラス内のミルクを加熱調理する場合は、ガラスの皿11を取り除いて凹状の載置台12の凹部内に前述の容器を収容させる。これにより、マイクロ波が凹状の載置台12の側壁部を通過して円状の回転板4と一体となって回転する被加熱物2の下部へ直接的かつ集中的に照射される。
こうした構成により、実施の形態1と同様に被加熱物の加熱ムラが少なく、かつ加熱調理時間が短くなる。
【0024】
また、凹状の載置台12の凹部の中央箇所に孔を形成し、この孔部にモータ5の回転軸を嵌め込むようにしても良い。これにより、円状の回転板4を使用せずに被加熱物2を加熱調理できる。このことは、実施の形態3についても同様である。
【0025】
また、高さがある容器内の被加熱物2を加熱調理する場合は、図4に示すようにガラスの皿11の他に凹状の載置台12を取り除き、前述の容器を円状の回転板4の上に直接置いて加熱調理しても良い。これによって、前述と同様の効果を得ることができる。
【0026】
実施の形態3.
図5は、この発明による高周波加熱装置のさらに他の実施の形態を説明する正断面図である。図5において、従来例または実施の形態1,2と同一の符号は同一又は相当部分を示す。13は実施の形態2で述べた凹状の載置台12の凹部の内側壁面に固着する2枚の金属片である。また、図6の(a),(b)は凹状の載置台12の凹部の平断面図を示すものであり、この内側壁面(図6中のA)の対向する位置に2枚の金属片13が固着される。なお、図6の(a)は凹状の載置台12が所定速度で一方向に回転し、ある方向から進行するマイクロ波が凹状の載置台12の側壁部を通過して2枚の金属片13に向かっていく状態を示す。また、図6の(b)は凹状の載置台12が一方向に回転し、ある方向から進行するマイクロ波が凹状の載置台12の側壁部を通過して2枚の金属片13で反射される状態を示す。
【0027】
次に、この発明の高周波加熱装置の動作について、図5を併用して説明する。図5において、マグネトロン7より放射されるマイクロ波がマグネトロン保護部材8から凹状の載置台12の側壁部を通過して2枚の金属片13に向かう(図6のaの状態)。ここで、凹部内の複数の金属片13によるアンテナ作用即ち電磁波集合作用で図7に示すようなマイクロ波の電界強度分布特性を示す。
【0028】
図7において、凹部内の2枚の金属片13が存在する箇所は、マイクロ波の電界強度が非常に高くEp(KV/m)を示している。そして、各々の金属片13から遠ざかるに伴なってマイクロ波の電界強度は徐々に低下していることが分かる(図7中のA,Bパターン)。しかし、実際上は各々の金属片13の電界強度が合成されたCパターンが形成すると推測する。このため、凹部内の電界強度の大きさにムラがなく、Epをほぼ一定維持することができる。
【0029】
こうした構成により、円状の回転板4と一体となって回転するガラスの皿11の上に載る被加熱物2の概中央下部の領域に、電界強度Ep(KV/m)をもつマイクロ波を集中的に照射させることができる。また、高さがある容器内の被加熱物2例えば2合徳利内の日本酒あるいはグラス内のミルクを加熱調理する場合は、ガラスの皿11を取り除いて凹状の載置台12の凹部内にこの容器を収容させる。これにより、電界強度EP(KV/m)をもつマイクロ波が円状の回転板4と一体となって回転する前述の容器の下部へ直接的かつ集中的に照射される。したがって、被加熱物2の加熱ムラが非常に少なく、かつ加熱調理の時間が一層短くなる。
【0030】
また、図8に示すように実施の形態1乃至実施の形態3で述べた加熱室1の底部中央に形成する開口部9の近傍の導波管6内に設けられた円状の回転板4、リング状の回転板10、凹状の載置台12、さらにこれらを回転駆動させるモータ5を取り除く。そして、導波管6内に液状の被加熱物2が入っている高さのある容器を直接収容させても良い。これによって、静止状態のこの容器の下部にマイクロ波が集中的に照射されるため、対流作用で加熱ムラが殆どなく、かつ加熱調理時間を短くできるという効果が得られる。
【0031】
【発明の効果】
この発明は、以上説明したように構成されているので、以下に記載されるような効果を奏する。
【0032】
この発明に係わる高周波加熱装置は、被加熱物を収容する加熱室を設け、加熱室の底部中央に給電口を設け、給電口に接続されかつ加熱室底部に沿って平行に導波管を設け、導波管内であって給電口を臨む位置に回転体を配設し、この回転体をマイクロ波の1波長にほぼ等しい内径を有する複数の環状板を上下に所定間隔を置いて配置するようにしたので、マグネトロンから放射されるマイクロ波が上下の環状板の間などを通過して、この環状板と一体となって回転する平板状の載置台の上に載る被加熱物の概中央下部の領域に照射される。また、高さがある容器を上下の環状板の中に収容させ、この環状板と一体となって回転する容器内の被加熱物の下部にマイクロ波を集中的に照射させることが可能である。したがって、加熱室の有効容積を拡大させると共に、被加熱物の加熱ムラが少なく、かつ加熱調理の時間が短くなるという効果を期待できる。
【0033】
また、回転体を着脱自在に配設するようにしたので、加熱室の底部中央に形成する開口部近傍の導波管内に液状の被加熱物が入っている高さのある縦長状の容器を容易に収容させ、即ち有効スペースの拡大化が実現できる。そして、回転駆動部品であるモータが不要であるために部品コストを削減できるという効果を期待できる。
【0034】
また、回転体に被加熱物を載せる皿を着脱自在に載置するようにしたので、容積が大きい被加熱物の場合は皿を使用して加熱調理を行い、容積が小さい被加熱物の場合は皿なしの状態で加熱調理を行うという、加熱室内の有効容積を自由自在に調整して加熱ムラを少なくするという効果を期待できる。
【0035】
また、被加熱物を収容する加熱室と、この加熱室の底部中央に設けられた給電口と、この給電口に接続されかつ加熱室底部に沿って平行に設けられた導波管と、この導波管の給電口を臨む位置に配設された回転体と、加熱室内に配設され中央部に給電口を介して前記導波管内に配設されて前記回転体上に載置される凹部を形成した載置台とを具備するようにしたので、マグネトロンから放射されるマイクロ波が載置台と一体となって回転する容積の大きい被加熱物の概中央下部の領域に照射される。さらに、高さがある容器を載置台の凹部内に収容させ、この載置台と一体となって回転する容器内の被加熱物の下部にマイクロ派を集中的に照射させることが可能である。したがって、加熱室の有効容積を自由自在に調整して被加熱物をムラなく加熱し、かつ加熱調理の時間が短くなるという効果を期待できる。
【0036】
また、回転体の外径および載置台凹部の内径をマイクロ波の1波長にほぼ等しく形成するようにしたので、前述の凹部内に高さがある容器を容易に収容させ、回転しながら液状の被加熱物を加熱調理することが期待できる。
【0037】
また、前記載置台凹部の内壁面の対向する位置に複数の金属片を取り付けるようにしたので、アンテナ作用即ち電磁波集合作用によってマイクロ波が金属片の方に向かっていく。これにより、前述の凹部内におけるマイクロ波のエネルギー即ち電界強度の大きさにムラがなく、このマイクロ波が被加熱物へ集中的に照射される状態となる。したがって、被加熱物の加熱ムラをより一層解消できるという効果を期待できる。
【0038】
また、載置台に被加熱物を載せる皿を着脱自在に載置するようにしたので、載置台と一体となって回転する容積の大きい被加熱物や高さがある容器内の被加熱物の概中央下部にマイクロ波を集中的に照射させることが可能である。したがって、加熱室の有効容積を自由自在に調整して被加熱物をムラなく加熱し、かつ加熱調理の時間が短くなるという効果を期待できる。
【図面の簡単な説明】
【図1】実施の形態1における高周波加熱装置の正断面図である。
【図2】実施の形態1に係るリング状回転板の拡大斜視図である。
【図3】実施の形態2における高周波加熱装置の正断面図である。
【図4】実施の形態2における他の高周波加熱装置の正断面図である。
【図5】実施の形態3における高周波加熱装置の正断面図である。
【図6】実施の形態3に係る凹状載置台の拡大斜視図である。
【図7】実施の形態3に係る凹状載置台の凹部内のマイクロ波電界強度の分布特性図である。
【図8】実施の形態1乃至実施の形態3における高周波加熱装置の正断面図である。
【図9】従来の高周波加熱装置の正断面図である。
【符号の説明】
1 加熱室、2 被加熱物、3 平板状の載置台、4 金属製の円状の回転板、5 モータ、6 導波管、 7 マグネトロン、8 マグネトロン保護部材、 9 開口部、10 リング状の回転板、11 皿、12 凹状の載置台、13 金属片。
[0001]
BACKGROUND OF THE INVENTION
The present invention relates to a high-frequency heating apparatus that irradiates an object to be heated with microwaves radiated from a magnetron and cooks it.
[0002]
[Prior art]
FIG. 9 is a front sectional view showing a general high-frequency heating apparatus as a conventional example. In FIG. 9, reference numeral 1 denotes a heating chamber in which the object to be heated 2 is accommodated, 3 denotes a disk-like mounting table disposed on the lower part of the heating chamber 1 to place the object to be heated 2, and 4 denotes the mounting table 3. A metal circular rotating plate 5 to be supported is a motor which is provided outside the heating chamber 1 and rotates the circular rotating plate 4. Reference numeral 6 denotes a waveguide that is arranged on the outer wall portion of the heating chamber 1 and transmits microwaves radiated from the magnetron 7 to the heating chamber 1 through the magnetron protection member 8.
[0003]
Next, the operation of the conventional high frequency heating apparatus will be described. In FIG. 9, the microwave radiated from the magnetron 7 is transmitted from the waveguide 6 to the heating chamber 1 through the magnetron protection member 8. And the to-be-heated material 2 is cooked by irradiating the to-be-heated material 2 with the microwave transmitted to the heating chamber 1 repeating incidence and reflection to this wall surface. At this time, the object 5 is rotated by rotating the motor 5.
[0004]
[Problems to be solved by the invention]
In the conventional high-frequency heating apparatus, as described above, the microwave is not directly incident on the object to be heated, and is irradiated on the object to be heated while repeating incidence and reflection on the side wall surface of the heating chamber. However, the energy of the microwave attenuates when it enters the side wall surface of the heating chamber. For this reason, if the frequency | count of reflection on the side wall surface of a heating chamber increases, the energy loss of a microwave will become large. Therefore, there is a problem that the heating efficiency of the article to be heated is reduced and heating unevenness is likely to occur.
[0005]
In addition, the microwave is difficult to irradiate intensively on the region near the center of the object to be heated due to the transmission path described above. Therefore, for example, when sake or milk is put in a vertically long container and cooked, there is a problem that the elapsed time until it is sufficiently heated and heating unevenness occurs.
[0006]
Furthermore, since the height of the heating chamber is relatively low and the mounting table and the rotating plate are disposed above the bottom of the heating chamber, the effective volume is reduced, and thus a container having a high height, such as 2 Tokutoshi There was a problem that it could not be accommodated.
[0007]
The present invention has been made to solve such problems, and devised the arrangement of the waveguide, the shape of the mounting table and the rotating plate, and the location of the microwave in the region at the lower center of the object to be heated. The object is to provide a high-frequency heating apparatus that irradiates the target object intensively, eliminates insufficient heating and uneven heating of the object to be heated, and further increases the effective volume of the heating chamber.
[0008]
[Means for Solving the Problems]
The high-frequency heating device according to the present invention is provided with a heating chamber that accommodates an object to be heated, a power supply port provided at the center of the bottom of the heating chamber, and a waveguide connected to the power supply port and parallel to the bottom of the heating chamber. In the waveguide, a rotating body is arranged at a position facing the power feeding port, and a plurality of annular plates having an inner diameter substantially equal to one wavelength of the microwave are arranged vertically at predetermined intervals. I made it.
[0009]
In addition, the rotating body is detachably disposed.
[0010]
In addition, a plate for placing an object to be heated on the rotating body is detachably mounted.
[0011]
A heating chamber that accommodates an object to be heated; a power supply port provided at the center of the bottom of the heating chamber; a waveguide connected to the power supply port and provided in parallel along the bottom of the heating chamber; a rotating body disposed at a position facing the feeding port of the waveguide, is mounted in front Symbol rotating body on which disposed in the waveguide through the feeding opening in the central portion is disposed in the heating chamber And a mounting table in which a concave portion is formed.
[0012]
Further, the outer diameter of the rotating body and the inner diameter of the mounting table recess are formed to be substantially equal to one wavelength of the microwave.
[0013]
A plurality of metal pieces are attached to the opposing positions of the inner wall surface of the mounting table recess.
[0014]
In addition, the dish on which the object to be heated is placed on the placing table is detachably placed.
[0015]
DETAILED DESCRIPTION OF THE INVENTION
Embodiment 1 FIG.
FIG. 1 is a front sectional view for explaining an embodiment of a high-frequency heating device according to the present invention. In FIG. 1, the same reference numerals as in the conventional example indicate the same or corresponding parts. In FIG. 1, reference numeral 9 denotes an opening formed in the center of the bottom of the heating chamber 1, and a waveguide 6 is provided in a horizontal manner so as to communicate with the opening 9. Here, for example, the width of the waveguide 6 is set to 60 to 80 mm (a range corresponding to ½ of the wavelength of the microwave), the height is set to about 35 mm, and the inner diameter of the microwave outlet (A in FIG. 1) is set. ) Is set to about 160 mm. A ring-shaped rotating plate 10 that is rotated by the rotation of the motor 5 is disposed in the space of the microwave outlet of the waveguide 6, and the disk-shaped mounting table 3 is placed on the ring-shaped rotating plate 10. Put on. Further, a glass dish 11 on which the article to be heated 2 is placed is placed on the mounting table 3.
[0016]
As shown in FIG. 2, the specific structure of the ring-shaped rotating plate 10 is such that one end of a support bar 10b is attached to a plurality of locations of the ring-shaped first rotating plate 10a, and the other end of the support bar 10b is a ring-like shape. The second rotating plate 10c is attached. A cross-shaped support plate 10d is provided on the inner periphery of the second rotating plate 10c, and a shaft hole of the motor 5 is formed at the center of the support plate 10d. Here, the outer diameter of the ring-shaped first rotating plate 10a and the second rotating plate 10c is set to about 140 mm, and the inner diameter is set to about 120 mm.
[0017]
Next, the operation of the high-frequency heating device of the present invention will be described with reference to FIGS. In FIG. 1 and FIG. 2, when the operation of the heating device is started, the microwave radiated from the magnetron 7 passes through the magnetron protection member 8 disposed at a predetermined position of the waveguide 6. And this microwave progresses between the 1st rotation board 10a and the 2nd rotation board 10c, or the lower part of the 2nd rotation board 10c, and it is disk shape from the opening part 9 formed in the bottom part of the heating chamber 1. FIG. The glass plate 11 is further passed through the mounting table 3. Here, the disk-shaped mounting table 3 employs a low dielectric constant type such as ceramic or glass having a characteristic of allowing microwaves to pass therethrough.
[0018]
As a result, the microwave is radiated in a concentrated manner to the region at the substantially lower center of the object to be heated 2 that rotates integrally with the ring-shaped rotating plate 10, so that the heat generated in this region is applied to the object to be heated 2. It moves to the whole part and becomes a uniform temperature. Therefore, there is little uneven heating of the article 2 to be heated, and the elapsed time until this article is heated is shortened.
[0019]
In addition, when cooking a heated object 2 in a container with height, for example, sake or milk in a glass of 2 Gotoku Tori, the disk-shaped mounting table 3 and the glass dish 11 are removed, and the inner diameter is reduced. This container is accommodated in a ring-shaped rotating plate 10 set to about 120 mm. Next, when the operation of the heating device is started, the microwave that has passed through the magnetron protection member 8 is directly and intensively applied to the lower part of the object to be heated 2 that rotates together with the ring-shaped rotating plate 10. . As a result, the number of microwaves incident / reflected on the side wall surface of the waveguide 6 can be extremely reduced, so that the object to be heated is irradiated with microwaves having high energy.
With such a configuration, in the case of vertically long sake, for example, sake in milk of 2 Gotoku or milk in a glass, heating the lower part of the heated portion reduces heating unevenness and shortens the cooking time.
[0020]
As described above, when cooking the heated object 2 having a large volume or the heated object 2 in a container having a height, a part of the space of the waveguide 6 is appropriately used or not used appropriately. It is possible to cook evenly while adjusting the effective volume.
[0021]
Embodiment 2. FIG.
FIG. 3 is a front sectional view for explaining another embodiment of the high-frequency heating device according to the present invention. In FIG. 3, the same reference numerals as those of the conventional example or the first embodiment indicate the same or corresponding parts. Reference numeral 12 denotes a concave mounting table in which a concave portion is formed at the central portion of the disk-shaped mounting table 3, and this concave portion is a circular rotating plate disposed in the lower space of the microwave outlet portion of the waveguide 6. 4 to be placed on top of each other. And the glass dish 11 in which the to-be-heated material 2 is mounted is put in the state which block | closes the recessed part of the concave mounting base 12. FIG. Here, as in the first embodiment, the concave mounting table 12 is of a low dielectric constant type such as ceramic or glass.
[0022]
Next, when the operation of the heating device is started, the microwave radiated from the magnetron passes through the side wall portion of the concave mounting table 12 from the magnetron protection member 8. Then, this microwave is intensively applied to the region at the lower part of the approximate center of the object to be heated 2 that rotates together with the circular rotating plate 4. Thereby, the elimination of the heating unevenness of the article 2 to be heated and the shortening of the heating time can be obtained as described above.
[0023]
In addition, when cooking the heated object 2 in a container with height, for example, sake or milk in 2 glass bottles, the glass plate 11 is removed and the concave platen 12 has the above-mentioned recess. Hold the container. Thereby, the microwave passes through the side wall of the concave mounting table 12 and is directly and intensively irradiated to the lower part of the object to be heated 2 that rotates together with the circular rotating plate 4.
With such a configuration, similarly to the first embodiment, the heating unevenness of the object to be heated is small, and the cooking time is shortened.
[0024]
Alternatively, a hole may be formed in the central portion of the concave portion of the concave mounting table 12, and the rotation shaft of the motor 5 may be fitted into the hole portion. Thereby, the to-be-heated material 2 can be cooked without using the circular rotating plate 4. The same applies to the third embodiment.
[0025]
In addition, when cooking the heated object 2 in a container having a height, as shown in FIG. 4, the concave mounting table 12 is removed in addition to the glass dish 11, and the container is replaced with a circular rotating plate. It may be placed directly on 4 and cooked by heating. As a result, the same effect as described above can be obtained.
[0026]
Embodiment 3 FIG.
FIG. 5 is a front sectional view for explaining still another embodiment of the high-frequency heating device according to the present invention. In FIG. 5, the same reference numerals as those of the conventional example or the first and second embodiments indicate the same or corresponding parts. Reference numeral 13 denotes two metal pieces that are fixed to the inner wall surface of the concave portion of the concave mounting table 12 described in the second embodiment. 6 (a) and 6 (b) are plan sectional views of the concave portion of the concave mounting table 12, and two pieces of metal are provided at positions facing the inner wall surface (A in FIG. 6). 13 is fixed. In FIG. 6A, the concave mounting table 12 rotates in one direction at a predetermined speed, and microwaves traveling from a certain direction pass through the side wall of the concave mounting table 12 and two metal pieces 13 are obtained. It shows the state going to. 6B, the concave mounting table 12 rotates in one direction, and the microwave traveling from a certain direction passes through the side wall of the concave mounting table 12 and is reflected by the two metal pieces 13. State.
[0027]
Next, the operation of the high-frequency heating device of the present invention will be described with reference to FIG. In FIG. 5, the microwave radiated from the magnetron 7 passes through the side wall portion of the concave mounting table 12 from the magnetron protection member 8 toward the two metal pieces 13 (a state in FIG. 6A). Here, a microwave electric field strength distribution characteristic as shown in FIG. 7 is shown by an antenna action, that is, an electromagnetic wave gathering action by the plurality of metal pieces 13 in the recess.
[0028]
In FIG. 7, the location where the two metal pieces 13 are present in the recess has a very high electric field strength of the microwave and indicates Ep (KV / m). And it turns out that the electric field strength of a microwave is gradually falling as it moves away from each metal piece 13 (A and B patterns in FIG. 7). However, in practice, it is assumed that a C pattern in which the electric field strength of each metal piece 13 is synthesized is formed. For this reason, there is no unevenness in the electric field strength in the recess, and Ep can be maintained substantially constant.
[0029]
With such a configuration, a microwave having an electric field intensity Ep (KV / m) is applied to a region at the lower part of the center of the object to be heated 2 placed on the glass dish 11 that rotates integrally with the circular rotating plate 4. It can be irradiated intensively. In addition, when cooking a heated object 2 in a container with height, for example, sake or milk in a glass of 2 Gotoku, this container is removed in the recess of the recess 12 by removing the glass plate 11. Contain. As a result, a microwave having an electric field strength EP (KV / m) is directly and intensively applied to the lower part of the container rotating integrally with the circular rotating plate 4. Therefore, the heating unevenness of the article to be heated 2 is very small, and the cooking time is further shortened.
[0030]
Further, as shown in FIG. 8, a circular rotating plate 4 provided in the waveguide 6 in the vicinity of the opening 9 formed in the center of the bottom of the heating chamber 1 described in the first to third embodiments. The ring-shaped rotating plate 10, the concave mounting table 12, and the motor 5 for rotationally driving them are removed. And the container with the height which contains the liquid to-be-heated material 2 in the waveguide 6 may be directly accommodated. As a result, microwaves are intensively applied to the lower portion of the stationary container, so that there is almost no heating unevenness due to the convection effect and the cooking time can be shortened.
[0031]
【The invention's effect】
Since the present invention is configured as described above, the following effects can be obtained.
[0032]
The high-frequency heating device according to the present invention is provided with a heating chamber that accommodates an object to be heated, a power supply port provided at the center of the bottom of the heating chamber, and a waveguide connected to the power supply port and parallel to the bottom of the heating chamber. In the waveguide, a rotating body is arranged at a position facing the power feeding port, and a plurality of annular plates having an inner diameter substantially equal to one wavelength of the microwave are arranged vertically at predetermined intervals. Since the microwave radiated from the magnetron passes between the upper and lower annular plates, etc., the region at the lower part of the approximate center of the object to be heated placed on the plate-shaped mounting table that rotates integrally with the annular plates Is irradiated. In addition, it is possible to house a container having a height in the upper and lower annular plates, and to irradiate the microwave intensively to the lower part of the object to be heated in the container that rotates integrally with the annular plates. . Therefore, it is possible to expect the effects that the effective volume of the heating chamber is expanded, the heating unevenness of the object to be heated is small, and the cooking time is shortened.
[0033]
In addition, since the rotating body is detachably disposed, a vertically long container having a height in which a liquid object to be heated is contained in a waveguide near the opening formed in the center of the bottom of the heating chamber. It can be accommodated easily, that is, the effective space can be expanded. And since the motor which is a rotational drive component is unnecessary, the effect that component cost can be reduced can be anticipated.
[0034]
In addition, since the dish on which the object to be heated is placed on the rotating body is detachably mounted, if the object to be heated has a large volume, cooking is performed using the dish, and the object to be heated has a small volume. The effect of reducing the heating unevenness by freely adjusting the effective volume in the heating chamber, in which cooking is performed without a dish, can be expected.
[0035]
A heating chamber that accommodates an object to be heated; a power supply port provided at the center of the bottom of the heating chamber; a waveguide connected to the power supply port and provided in parallel along the bottom of the heating chamber; a rotating body disposed at a position facing the feeding port of the waveguide, is mounted in front Symbol rotating body on which disposed in the waveguide through the feeding opening in the central portion is disposed in the heating chamber The microwave radiated from the magnetron is applied to the region near the center of the heated object having a large volume that rotates together with the mounting table. Furthermore, it is possible to house a container having a height in the recess of the mounting table, and to irradiate the micro group intensively to the lower part of the object to be heated in the container that rotates integrally with the mounting table. Therefore, it is possible to expect an effect that the effective volume of the heating chamber is freely adjusted to heat the object to be heated evenly and the cooking time is shortened.
[0036]
In addition, since the outer diameter of the rotating body and the inner diameter of the mounting table recess are formed to be approximately equal to one wavelength of the microwave, a container having a height in the aforementioned recess can be easily accommodated and rotated while being liquid. It can be expected that the object to be heated is cooked.
[0037]
In addition, since the plurality of metal pieces are attached to the opposing positions of the inner wall surface of the mounting table recess, the microwaves are directed toward the metal piece by the antenna action, that is, the electromagnetic wave gathering action. Thereby, there is no unevenness in the magnitude of the microwave energy, that is, the electric field strength in the recess, and the microwave is intensively irradiated onto the object to be heated. Therefore, the effect that the heating unevenness of the article to be heated can be further eliminated can be expected.
[0038]
In addition, since the dish on which the object to be heated is placed on the mounting table is detachably mounted, the heated object having a large volume that rotates integrally with the mounting table or the object to be heated in a container having a height is arranged. It is possible to irradiate the microwave to the lower part of the center. Therefore, it is possible to expect an effect that the effective volume of the heating chamber is freely adjusted to heat the object to be heated evenly and the cooking time is shortened.
[Brief description of the drawings]
FIG. 1 is a front sectional view of a high-frequency heating device according to a first embodiment.
FIG. 2 is an enlarged perspective view of a ring-shaped rotating plate according to the first embodiment.
FIG. 3 is a front sectional view of a high-frequency heating device according to a second embodiment.
4 is a front sectional view of another high-frequency heating device according to Embodiment 2. FIG.
5 is a front sectional view of a high-frequency heating device according to Embodiment 3. FIG.
6 is an enlarged perspective view of a concave mounting table according to Embodiment 3. FIG.
FIG. 7 is a distribution characteristic diagram of microwave electric field strength in a concave portion of the concave mounting table according to the third embodiment.
FIG. 8 is a front sectional view of the high-frequency heating device according to Embodiments 1 to 3.
FIG. 9 is a front sectional view of a conventional high-frequency heating device.
[Explanation of symbols]
DESCRIPTION OF SYMBOLS 1 Heating chamber, 2 To-be-heated object, 3 Plate-shaped mounting base, 4 Metal circular rotary plate, 5 Motor, 6 Waveguide, 7 Magnetron, 8 Magnetron protection member, 9 Opening part, 10 Ring-shaped Rotating plate, 11 dishes, 12 concave mounting table, 13 metal pieces.

Claims (7)

被加熱物を収容する加熱室と、この加熱室の底部中央に設けられた給電口と、この給電口に接続されかつ加熱室底部に沿って平行に設けられた導波管と、この導波管内であって給電口を臨む位置に配設された回転体とを具備し、この回転体はマイクロ波の1波長にほぼ等しい内径を有する複数の環状板を上下に所定間隔を置いて配置してなることを特徴とする高周波加熱装置。A heating chamber for storing an object to be heated, a power supply port provided at the center of the bottom of the heating chamber, a waveguide connected to the power supply port and provided in parallel along the bottom of the heating chamber, and the waveguide A rotating body disposed in a tube at a position facing the power supply port, and the rotating body includes a plurality of annular plates having an inner diameter substantially equal to one wavelength of the microwave at a predetermined interval in the vertical direction. A high-frequency heating device characterized by comprising: 前記回転体を着脱自在に配設したことを特徴とする請求項1記載の高周波加熱装置。The high-frequency heating device according to claim 1, wherein the rotating body is detachably disposed. 前記回転体に被加熱物を載せる皿を着脱自在に配置したことを特徴とする請求項1記載の高周波加熱装置。The high-frequency heating device according to claim 1, wherein a dish on which the object to be heated is placed on the rotating body is detachable. 被加熱物を収容する加熱室と、この加熱室の底部中央に設けられた給電口と、この給電口に接続されかつ加熱室底部に沿って平行に設けられた導波管と、この導波管の給電口を臨む位置に配設された回転体と、加熱室内に配設され中央部に給電口を介して前記導波管内に配設されて前記回転体上に載置される凹部を形成した載置台とを具備したことを特徴とする高周波加熱装置。A heating chamber for storing an object to be heated, a power supply port provided at the center of the bottom of the heating chamber, a waveguide connected to the power supply port and provided in parallel along the bottom of the heating chamber, and the waveguide a rotating body disposed at a position facing the feeding port of the tube, the recess being placed before Symbol rotating body on which disposed in the waveguide through the feeding opening in the central portion is disposed in the heating chamber A high-frequency heating apparatus comprising: a mounting table on which is formed. 前記回転体の外径および載置台凹部の内径をマイクロ波の1波長にほぼ等しく形成したことを特徴とする請求項4記載の高周波加熱装置。5. The high frequency heating apparatus according to claim 4, wherein the outer diameter of the rotating body and the inner diameter of the mounting table recess are formed approximately equal to one wavelength of the microwave. 前記載置台凹部の内壁面の対向する位置に複数の金属片を取り付けたことを特徴とする請求項4または請求項5記載の高周波加熱装置。6. The high frequency heating apparatus according to claim 4 or 5 , wherein a plurality of metal pieces are attached to positions facing the inner wall surface of the mounting table recess. 前記載置台に被加熱物を載せる皿を着脱自在に載置したことを特徴とする請求項4乃至請求項6の何れかに記載の高周波加熱装置。The high-frequency heating apparatus according to any one of claims 4 to 6, wherein a dish on which an object to be heated is placed is detachably placed on the placing table.
JP35712898A 1998-12-16 1998-12-16 High frequency heating device Expired - Fee Related JP3623676B2 (en)

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JP4813837B2 (en) * 2005-07-20 2011-11-09 日立協和エンジニアリング株式会社 Microwave heating device
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KR100937909B1 (en) 2007-05-04 2010-01-21 김성열 Plasma lamp comprising protective layer and manufacturing method thereof
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