KR200153686Y1 - Microwave oven - Google Patents

Microwave oven Download PDF

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Publication number
KR200153686Y1
KR200153686Y1 KR2019960002787U KR19960002787U KR200153686Y1 KR 200153686 Y1 KR200153686 Y1 KR 200153686Y1 KR 2019960002787 U KR2019960002787 U KR 2019960002787U KR 19960002787 U KR19960002787 U KR 19960002787U KR 200153686 Y1 KR200153686 Y1 KR 200153686Y1
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South Korea
Prior art keywords
cooking
plate
high frequency
support plate
support
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KR2019960002787U
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Korean (ko)
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KR970052380U (en
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홍석원
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윤종용
삼성전자주식회사
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Priority to KR2019960002787U priority Critical patent/KR200153686Y1/en
Publication of KR970052380U publication Critical patent/KR970052380U/en
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Publication of KR200153686Y1 publication Critical patent/KR200153686Y1/en

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    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05BELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B6/00Heating by electric, magnetic or electromagnetic fields
    • H05B6/64Heating using microwaves
    • H05B6/6408Supports or covers specially adapted for use in microwave heating apparatus
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05BELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B6/00Heating by electric, magnetic or electromagnetic fields
    • H05B6/64Heating using microwaves
    • H05B6/647Aspects related to microwave heating combined with other heating techniques
    • H05B6/6482Aspects related to microwave heating combined with other heating techniques combined with radiant heating, e.g. infrared heating

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  • Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Constitution Of High-Frequency Heating (AREA)
  • Electric Ovens (AREA)

Abstract

본 고안은 전자렌지의 조리접시 받침판에 관한 것으로, 그 목적은 조리접시가 놓여지는 받침판을 개선하여 피조리물의 조리효율을 향상시키는 것이다.The present invention relates to a cooking plate support plate of a microwave oven, the purpose of which is to improve the cooking plate on which the cooking plate is placed to improve the cooking efficiency of the workpiece.

본 고안에 따른 전자렌지의 조리접시 받침판(60)은 테두리부분에 고리형상으로 돌출된 지지부(61)가 마련되어 조리접시(50)를 이격되게 지지하며, 이의 중심부위(62)와 지지부(61)에 제1안내공(621)과 제2안내공(614) 등이 천공되어 있어서, 이들을 통해 고주파가 조리접시(50) 하면을 통해 피조리물에 조사되어 전자렌지의 조리효율이 향상되는 이점이 있다.The cooking plate support plate 60 of the microwave oven according to the present invention is provided with a support portion 61 protruding in an annular shape on the rim to support the cooking plate 50 spaced apart, the upper portion of the center 62 and the support portion 61 thereof. The first guide hole 621 and the second guide hole 614 is perforated, through which the high frequency is irradiated to the workpiece through the lower surface of the cooking dish 50 has the advantage that the cooking efficiency of the microwave is improved. have.

Description

전자렌지의 조리접시 받침판Microwave Cooking Plate Support Plate

본 고안은 마그네트론을 이용하여 음식물을 조리하는 전자렌지에 관한 것으로, 더욱 상세하게는 조리실 내부에서 조리접시를 회전가능하게 지지하는 전자렌지의 조리접시 받침판에 관한 것이다.The present invention relates to a microwave oven for cooking food using a magnetron, and more particularly to a cooking plate support plate of a microwave oven to rotatably support a cooking plate inside the cooking chamber.

일반적으로 전자렌지는 마그네트론에서 기본파 2450㎒의 고주파를 조리실 내부로 방사하여 음식물에 함유된 수분의 분자배열을 반복변환시킴으로써, 분자들 간의 마찰열에 의해 음식물에 조리하는 기구이다.In general, a microwave oven is a device that cooks food by friction heat between molecules by repeatedly converting a high frequency of 2450 MHz fundamental wave into a cooking chamber in a magnetron to repeatedly convert a molecular array of moisture contained in the food.

이러한 기능을 하는 전자렌지는 외관을 이루는 본체 내부에 개방면을 가지는 조리실과 전장품이 장착되는 전장품실이 구획되게 마련된다. 그리고 본체 전방측에는 조리실의 개방면을 개폐하도록 도어가 힌지결합되어 있다.The microwave oven having such a function is provided such that a cooking chamber having an open surface and an electric equipment compartment in which the electric equipment is mounted are partitioned inside the main body forming the exterior. And the door is hinged to the main body front side so as to open and close the open surface of the cooking chamber.

전장품실에는 고주파를 발생시켜 조리실로 방사하는 마그네트론과 여기에 고전압을 인가하는 고압트랜스, 마그네트론과 고압트랜스 등을 냉각시키는 냉각팬 등이 장착되고, 전장품실 전방측에는 콘트롤부가 구성된다.The electronics compartment is equipped with a magnetron that generates high frequency radiation to the cooking chamber, a high pressure transformer for applying a high voltage thereto, a cooling fan for cooling the magnetron and a high voltage transformer, and the like, and a control unit is provided at the front side of the electrical equipment compartment.

그리고 조리실 내부에는 피조리물이 안착되는 조리접시와, 이를 하부에서 지지하는 받침판이 마련된다. 받침판은 고주파가 피조리물에 균일하게 조사되어 고르게 조리되도록 회전가능하게 설치된다. 이를 위해 조리실 저부에는 동력을 발생시키는 구동부가 장착되며, 받침판의 중심 저부에 구동부의 회전축 단부가 결합되어 있어서, 조리접시가 올려지는 받침판이 구동부의 회전축 회전에 따라 회전된다.And inside the cooking chamber is provided with a cooking plate on which the workpiece is placed, and a support plate for supporting it from the bottom. The support plate is rotatably installed so that the high frequency is uniformly irradiated to the workpiece and cooked evenly. To this end, a driving unit for generating power is mounted at the bottom of the cooking chamber, and an end portion of the rotary shaft of the driving unit is coupled to the center bottom of the supporting plate, such that the supporting plate on which the cooking plate is placed is rotated according to the rotation of the rotating shaft of the driving unit.

이와 같이 구성된 전자렌지에 피조리물을 넣고 콘트롤부를 통해 작동시키면, 마그네트론에서 기본파 2450㎒의 고주파가 조리실 내부로 방사된다. 고주파가 방사됨에 따라, 피조리물은 이에 함유된 수분의 분자배열이 순간적으로 반복 변환되며, 이것에 의해 열이 발생되어 조리가 이루어진다. 아울러 구동부에 의해 받침판이 회전되어 피조리물에 고주파가 균일하게 조사됨으로써, 조리가 고르게 이루어진다.When the cooking object is put into the microwave oven configured as described above and operated through the control unit, a high frequency of 2450 MHz fundamental wave is emitted from the magnetron into the cooking chamber. As the high frequency radiation is radiated, the cooked matter is repeatedly converted to a molecular sequence of moisture contained therein, whereby heat is generated to cook. In addition, the support plate is rotated by the drive unit, the high frequency is uniformly irradiated to the workpiece, the cooking is even.

한편, 최근에는 조리실 바닥면으로부터 조립접시를 일정간격 이격되게 설치하여, 조리실 바닥면에서 반사되는 고주파가 조리접시를 투과하도록 하여 조리효율을 향상시키는 전자렌지가 시판되고 있다.On the other hand, in recent years, microwave ovens have been commercially installed to install cooking plates from the bottom of the cooking chamber at a predetermined interval so that the high frequency reflected from the bottom of the cooking chamber is allowed to pass through the cooking dish.

그러나 이러한 전자렌지는 회전가능하게 설치된 금속판상의 받침판 위에 조리접시가 단순히 놓여지기 때문에, 받침판에 의해 대부분의 고주파는 반사된다. 즉, 고주파는 그 성질상 금속재질의 받침판을 투과하지 못하며, 또한 받침판 상부와 조리접시 하면 사이에 고주파가 투과할 수 있는 여유공간이 없기 때문에, 조리접시 하면을 통한 고주파 조사는 거의 이루어지지 않는다.However, since the cooking dish is simply placed on a supporting plate on a metal plate rotatably installed, most microwaves are reflected by the supporting plate. That is, since the high frequency does not penetrate the support plate made of metal, and there is no free space through which the high frequency can pass between the upper portion of the support plate and the lower surface of the cooking plate, the high frequency irradiation through the lower surface of the cooking plate is hardly made.

이에 따라 고주파의 일부는 받침판을 투과하지 못하고 반사되어 열로 소멸됨으로써, 조리효율을 향상시키는데에는 그 한계가 있다.As a result, some of the high frequency waves do not penetrate the support plate and are reflected and disappeared by heat, thereby limiting the improvement in cooking efficiency.

본 고안은 이러한 문제점을 해결하기 위한 것으로, 본 고안의 목적은 고주파가 조리접시 하면을 투과해서도 피조리물에 조사되도록 조리접시가 놓이는 받침판 구조를 개선하여 조리효율을 향상시키는 전자렌지의 조리접시 받침판을 제공하는 것이다.The present invention is to solve this problem, the object of the present invention is to improve the cooking efficiency of the cooking plate of the microwave oven to improve the efficiency of the cooking plate so that the cooking plate is irradiated to the workpiece even when the high frequency passes through the bottom of the cooking plate To provide a backing plate.

제1도는 본 고안이 적용되는 전자렌지의 내부구성을 보인 단면도이다.1 is a cross-sectional view showing the internal configuration of the microwave oven to which the present invention is applied.

제2도는 본 고안에 따른 조리접시의 받침판을 보인 사시도이다.Figure 2 is a perspective view showing the support plate of the cooking plate according to the present invention.

* 도면의 주요부분에 대한 부호의 설명* Explanation of symbols for main parts of the drawings

50 : 조리접시 60 : 받침판50: cooking plate 60: support plate

61 : 지지부 611 : 지지면61 support portion 611 support surface

612 : 내측구배면 614 : 제2안내공612: inner gradient surface 614: second guide hole

62 : 중심부위 621 : 제1안내공62: Central Committee 621: First guide

63 : 결합돌기 64 : 축결합부63: coupling projection 64: shaft coupling portion

65 : 개구부65: opening

이러한 목적을 달성하기 위한 본 고안은, 천장면에 전기히터가 부설된 조리실과 전장품실이 구획되게 마련된 본체과, 전장품실에 설치되어 조리실로 고주파를 방사하는 마그네트론과, 마그네트론에서 방사되는 고주파가 피조리물에 고르게 조사되도록 조리실 바닥면에서 이격된 상태로 회전가능하게 마련된 원판형상의 받침판, 받침판 위에 안착되어 피조리물이 놓이며 고주파가 투과할 수 있는 재질로 이루어진 조리접시를 갖춘 전자렌지에 있어서, 받침판은 테두리부분에 마련되며 조리접시와 받침판 사이에 공간을 형성하도록 상측으로 돌출되어 조리접시를 지지하는 고리형상의 지지부와, 지지부에 의해 형성된 공간으로 고주파가 조사되며 조리접시 하면을 투과하여 피조리물에 조사되도록 받침판의 중심부위에 다수개 천공된 제1안내공과 지지부의 상면을 따라 천공된 제2안내공을 구비하는 것을 특징으로 한다.The present invention for achieving this purpose, the main body is provided to partition the cooking chamber and the electrical equipment compartment in which the electric heater is installed on the ceiling surface, the magnetron is installed in the electrical equipment compartment radiates high frequency to the cooking chamber, the high frequency radiated from the magnetron In a microwave oven with a dish-shaped support plate rotatably spaced from the bottom of the cooking chamber to be irradiated evenly to the water, the cooking plate made of a material that is placed on the support plate, the material to be transmitted and high-frequency transmission, The supporting plate is provided at the rim and protrudes upwards to form a space between the cooking plate and the supporting plate to support the cooking plate, and the high frequency is irradiated into the space formed by the supporting part, and the cooking plate penetrates the bottom of the cooking plate. First guides and papers perforated on the center of the base to be irradiated with water It characterized in that it comprises a second guide hole perforations along the upper surface portion.

이하, 본 고안에 따른 하나의 바람직한 실시예를 첨부도면을 참조하여 상세히 설명한다. 제1도는 본 고안이 적용되는 전자렌지의 개략적인 단면도이고, 제2도는 본 고안에 따른 받침판의 사기도이다.Hereinafter, one preferred embodiment according to the present invention will be described in detail with reference to the accompanying drawings. 1 is a schematic cross-sectional view of a microwave oven to which the present invention is applied, and FIG. 2 is a fraud diagram of a support plate according to the present invention.

본 고안이 적용되는 전자렌지는 제1도와 제2도에 도시한 바와 같이, 외형 몸체를 이루는 본체(10)내부에 조리실(20)과 전장품실(30)이 구획되게 형성되어 있다.As shown in FIG. 1 and FIG. 2, the microwave oven to which the present invention is applied is formed such that the cooking chamber 20 and the electrical equipment compartment 30 are partitioned inside the main body 10 forming the outer body.

전장품실(30)에는 고주파를 발진하여 조리실(20)로 방사하는 마그네트론(31)과, 마그네트론(31)에 고전압을 인가하는 고압트랜스(32) 등 다수의 전장품이 장착되어 있다.The electrical equipment room 30 is equipped with a large number of electrical equipment such as a magnetron 31 which oscillates high frequency to radiate to the cooking chamber 20, and a high voltage transformer 32 which applies a high voltage to the magnetron 31.

그리고 조리실(20)은 본체(10) 전방측이 개방되게 형성되어 있으며, 개방면을 개폐하는 도어(미도시)가 힌지결합되어 있다. 이러한 조리실(20)에는 바닥면에 피조리물이 놓이는 턴테이블 방식의 조리접시(50)가 마련되며 천장면에 열을 발생하는 전기히터(70)가 부설되어 있는데, 이글의 구조를 좀 더 자세히 설명하면 다음과 같다.And the cooking chamber 20 is formed so that the front side of the main body 10 is open, the door (not shown) for opening and closing the open surface is hinged. The cooking chamber 20 is provided with a turntable type cooking plate 50 on which a workpiece is placed on the bottom surface, and an electric heater 70 generating heat on the ceiling surface is installed. The structure of the eagle will be described in more detail. Is as follows.

먼저, 절곡되게 형성된 전기히터(70)는 조리실(20) 천장면 측에 장착되어 있는데, 이것은 열을 발생시켜 피조리물을 굽는 일종의 그릴 효과를 내기 위한 것이다.First, the bent electric heater 70 is mounted on the ceiling side of the cooking chamber 20, which is intended to produce a kind of grill effect of generating heat by baking heat.

그리고 원반형상의 조리접시(50)는 고주파가 투과할 수 있도록 세라믹 재질로 마련되며, 구동부(40)의 구동에 의해 회전운동하는 받침판(60) 상면에 안착되어 이와 함께 일체로 회전함으로써, 피조리물이 고주파에 균일하게 조사된다. 이를 위해 본체(10)의 조리실(20)저부에는 구동부(40)가 장착되고, 구동부(40)의 회전축(41) 단부가 조리실(20) 바닥면을 관통하여 상부까지 연장되어 있다. 또한, 원판형상의 받침판(60) 저면의 중심부에는 축결합부(64)가 형성되어 있어서, 여기에 회전축(41)단부가 끼워져 결합된다.And the disk-shaped cooking plate 50 is made of a ceramic material to transmit high frequency, is mounted on the upper surface of the support plate 60 that is rotated by the drive of the drive unit 40 by rotating integrally with the workpiece This high frequency is irradiated uniformly. To this end, a driving unit 40 is mounted on the bottom of the cooking chamber 20 of the main body 10, and an end portion of the rotation shaft 41 of the driving unit 40 extends through the bottom surface of the cooking chamber 20 to an upper portion thereof. In addition, the shaft engaging portion 64 is formed at the center of the bottom surface of the disk-shaped support plate 60, and the rotary shaft 41 end is fitted thereto to be coupled thereto.

이에 따라 받침판(60)은 조리실(20) 바닥면으로부터 일정간격 이격되게 설치되며, 구동부(40)의 회전축(41)과 결합되어 구동부(40) 구동시 턴테이블 방식으로 회전운동한다.Accordingly, the supporting plate 60 is installed to be spaced apart from the bottom of the cooking chamber 20 by a predetermined interval, and is coupled to the rotation shaft 41 of the driving unit 40 to rotate in a turntable manner when driving the driving unit 40.

한편, 구동부(40)에 의해 회전운동하는 받침판(60)에는 조리접시(50)를 상면으로부터 이격되게 지지하여 이들 사이에 공간(80)을 형성하는 지지부(61)가 고리형상으로 마련되어 있다. 지지부(61)는 받침판(60)의 테두리부분을 따라 상측으로 돌출되어 조리접시(50)를 지지하는데, 이것은 조리접시(50) 하면과 면접촉하도록 평활하게 형성된 지지면(611)과 이의 양측부에 경사진 구배면(612, 613)으로 구성되어 있다.On the other hand, the support plate 61 which supports the cooking plate 50 spaced apart from the upper surface and forms the space 80 therebetween is provided in the support plate 60 which rotates by the drive part 40 in ring shape. The support portion 61 protrudes upward along the edge of the support plate 60 to support the cooking dish 50, which is a support surface 611 smoothly formed to be in surface contact with the bottom surface of the cooking dish 50 and both sides thereof. And gradient surfaces 612 and 613 that are inclined to each other.

그리고, 조리작동 중에 조리접시(50)의 이탈을 방지하기 위해서, 받침판(60)에는 결합돌기(63)가 마련되며 조리접시(50) 하면에는 결합홈(52)과 돌출턱(51)이 형성되어 있다. 결합돌기(63)는 받침판(60) 중심부에서 상측방향으로 돌출되게 형성된다. 그리고 결합홈(52)은 결합돌기(63)가 여유있게 삽입되도록 조리접시(50) 저면의 중심부에 오목하게 형성되어 있으며, 돌출턱(51)은 지지부(61)의 내측구배면(612)과 접하도록 조리접시(50) 저면에 가장자리부위에 하측방향으로 돌출되게 마련된다. 따라서 결합홈(52)에 결합돌기(63)가 삽입되도록 조리접시(50)를 올려 놓으면, 지지부(61)의 지지면(611)과 조리접시(50) 하면이 접촉하여 이들 사이에 이격된 공간(80)을 형성하며, 돌출턱(51)은 지지부(61)의 내측구배면(612)과 접촉함으로써, 조리접시(50)가 받침판(60) 상면에 견고하게 안착된다.And, in order to prevent the separation of the cooking plate 50 during the cooking operation, the support plate 63 is provided on the support plate 60, the coupling groove 52 and the protruding jaw 51 is formed on the lower surface of the cooking plate 50. It is. Coupling projection (63) is formed to protrude upward from the center of the support plate (60). In addition, the coupling groove 52 is formed to be concave in the center of the bottom surface of the cooking plate 50 so that the coupling protrusion 63 can be inserted with ease, the projection jaw 51 is the inner gradient surface 612 of the support portion 61 and The bottom of the cooking plate 50 is provided to protrude downward in contact with the edge portion. Therefore, when the cooking plate 50 is placed so that the coupling protrusion 63 is inserted into the coupling groove 52, the space between the support surface 611 of the support part 61 and the bottom surface of the cooking plate 50 is in contact with each other. 80, the protruding jaw 51 is in contact with the inner gradient surface 612 of the support 61, so that the cooking dish 50 is firmly seated on the upper surface of the support plate 60.

또한, 원판형상의 받침판(60)에는 제2도에 도시한 바돠 같이, 조리접시(50) 하면을 통해서도 고주파가 조사되어 조리효율이 향상되도록 다수개의 고주파 안내공(614, 621)과 개구부(65)가 천공되어 있다. 고주파 안내공은 받침판(60)의 중심부위(62)에 방사상으로 천공된 다수개의 제1안내공(621)과, 지지부(61)의 지지면(611)을 따라 일정한 간격으로 이격되게 마련되며 제1안내공(621)의 직경보다 약간 작게 천공된 다수개의 제2안내공(614)으로 구별된다. 개구부(65)는 받침판(60) 중심부위(62)와 지지부(61) 사이를 넓게 개방시킨 부분으로서, 이를 통해 고주파 투과는 물론 전기히터(70)에서 방출된 열이 조리접시(50) 하면에 직접적으로 전달된다.In addition, as shown in FIG. 2, the disk-shaped support plate 60 is irradiated with high frequency through the lower surface of the cooking plate 50, so that the cooking efficiency is improved, and the plurality of high frequency guide holes 614 and 621 and the opening 65 are improved. ) Is perforated. The high frequency guide hole is provided to be spaced apart at regular intervals along a plurality of first guide holes 621 radially perforated on the central portion 62 of the support plate 60 and the support surface 611 of the support portion 61. The first guide hole 621 is divided into a plurality of second guide holes 614 slightly smaller than the diameter of the. The opening 65 is a portion wide open between the center 62 and the support 61 of the support plate 60, through which the heat emitted from the electric heater 70 is transmitted to the bottom surface of the cooking plate 50 through high frequency transmission. Delivered directly.

다음에는 이와 같이 구성된 본 고안에 따른 전자렌지의 작동을 설명한다.Next will be described the operation of the microwave oven according to the present invention configured as described above.

먼저, 피조리물이 놓인 조리접시(50)를 받침판(60) 위에 올려 놓으면, 앞에서 기술한 바와 같이, 결합돌기(63)가 결합홈(52)에 삽입되고 돌출턱(51)이 지지부(61)의 내측구배면(612)과 접촉한다. 또한, 지지부(61)의 지지면(611)이 조리접시(50) 하면과 접하여 이를 지지함으로써, 조리접시(50)는 받침판(60) 상면과 이격되어 이들 사이에 공간(80)이 형성된다.First, when the cooking plate 50 on which the workpiece is placed is placed on the base plate 60, as described above, the coupling protrusion 63 is inserted into the coupling groove 52 and the protruding jaw 51 is supported by the support 61. Contact the inner gradient surface 612). In addition, by supporting the support surface 611 of the support portion 61 in contact with the lower surface of the cooking plate 50, the cooking plate 50 is spaced apart from the upper surface of the support plate 60 to form a space 80 therebetween.

이러한 상태에서 도어(미도시)를 닫고 작동시키면, 마그네트론(31)에서 기본파 2450㎒의 고주파가 조리실(20) 내부로 방사되며, 아울러 구동부(40)에 의해 받침판(60)이 턴테이블방식으로 회전됨으로써, 조리접시(50)에 놓인 피조리물은 고주파에 균일하게 조사되어 조리가 이루어진다.In this state, when the door (not shown) is closed and operated, a high frequency of 2450 MHz fundamental wave is radiated from the magnetron 31 into the cooking chamber 20, and the support plate 60 is rotated by the driving unit 40 in a turntable manner. As a result, the cooking object placed on the cooking plate 50 is irradiated with high frequency uniformly to cook.

한편, 조리접시(50)는 받침판(60) 상면으로부터 공간(80)을 형성하도록 이격되게 지지되어 있기 때문에, 고주파는 제1안내공(621)과 제2안내공(614) 및 개구부(65)를 통해 조리접시(50) 하면을 투과해서도 피조리물에 조사된다. 즉, 마그네트론(31)에서 조리실(20)로 방사된 고주파는 접하는 대상물체에 따라 흡수, 투과, 반사하는 등의 성질로 인해 조리실(20) 바닥면 등과 부딪쳐 반사되고, 제1안내공(621)과 제2안내공(614) 및 개구부(65)를 통해 직접 조리접시(50)를 투과함과 동시에 일부는 공간(80)내에서 분산된다.On the other hand, since the cooking plate 50 is spaced apart to form the space 80 from the upper surface of the support plate 60, the high frequency is the first guide hole 621, the second guide hole 614 and the opening 65 Even through the lower surface of the cooking plate 50 is irradiated to the workpiece. That is, the high frequency radiated from the magnetron 31 to the cooking chamber 20 is reflected by colliding with the bottom surface of the cooking chamber 20 due to the properties such as absorption, transmission, and reflection depending on the object to be contacted, and the first guide hole 621. The second guide hole 614 and the opening 65 passes directly through the cooking plate 50 and at the same time a part of the dispersion in the space 80.

이에 따라 회전운동하는 조리접시(50) 위에 놓여진 피조리물은 조리실(20) 내부로 방사되는 고주파에 직접 조사됨은 물론이며, 받침판(60) 중심부위(62)와 지지부(61)에 형성된 제1안내공(621)과 제2안내공(614) 및 개구부(65)를 통해 조리접시(50)하면을 투과한 고주파에 의해 조리접시(50) 상면과 접촉하게 놓인 피조리물 하부도 동시에 조사됨으로써, 조리효율이 한층 더 향상된다.Accordingly, the workpiece placed on the cooking plate 50 that rotates is not only directly irradiated with the high frequency radiated into the cooking chamber 20, but also formed on the center portion 62 and the support 61 of the support plate 60. The lower part of the workpiece placed in contact with the upper surface of the cooking plate 50 is irradiated at the same time by the high frequency transmitted through the lower surface of the cooking plate 50 through the guide hole 621, the second guide hole 614, and the opening 65. The cooking efficiency is further improved.

또한, 전기히터(70)를 구동시키면, 이로부터 발생된 열은 조리실(20) 내부를 순환하기 때문에 회전하는 피조리물은 열에 의해서도 조리가 이루어진다. 이 때, 전기히터(70)로부터 방출된 열은 제1안내공(621)과 제2안내공(614), 개구부(65) 및 공간(80)을 통해 조리접시(50) 하면에도 고르게 전달되어 이에 놓인 피조리물의 조리가 균일하게 이루어진다.In addition, when the electric heater 70 is driven, the heat generated therefrom circulates inside the cooking chamber 20, and thus the cooked product that rotates is cooked by heat. At this time, the heat discharged from the electric heater 70 is evenly transmitted to the lower surface of the cooking plate 50 through the first guide hole 621, the second guide hole 614, the opening 65 and the space 80. Cooking of the dishes placed therein is uniform.

이상에서 상세히 설명한 바와 같이, 본 고안에 따른 전자렌지의 조리접시 받침판은 지지부를 통해 조리접시를 이격되게 지지하며 이의 중심부위와 지지부에 제1안내공과 제2안내공 등이 천공되어 있어서, 이들을 통해 고주파가 조리접시 하면을 통해서도 피조리물에 조사되어 전자렌지의 조리효율이 향상되는 이점이 있다.As described above in detail, the cooking plate support plate of the microwave oven according to the present invention supports the cooking plate spaced apart through the support portion, and the first guide hole and the second guide hole, etc. are drilled on the center and the support portion thereof. The high frequency is also irradiated to the workpiece through the bottom of the cooking dish has the advantage that the cooking efficiency of the microwave is improved.

Claims (1)

천장면에 전기히터(70)가 부설된 조리실(20)과 전장품실(30)이 구획되게 마련된 본체(10)와, 상기 전장품실(30)에 설치되어 상기 조리실(20)로 고주파를 방사하는 마그네트론(31)과, 상기 마그네트론(31)에서 방사되는 고주파가 피조리물에 고르게 조사되도록 상기 조리실(20) 바닥면에서 이격된 상태로 회전가능하게 마련된 원판형상의 받침판(60), 상기 받침판(60)위에 안착되어 피조리물이 놓이며 고주파가 투과할 수 있는 재질로 이루어진 조리접시(50)를 갖춘 전자렌지에 있어서, 상기 받침판(60)은, 테두리부분에 마련되며 상기 조리접시(50)와 상기 받침판(60) 사이에 공간(80)을 형성하도록 상측으로 돌출되어 상기 조리접시(50)를 지지하는 고리형상의 지지부(61)와, 상기지지부(61)에 의해 형성된 상기 공간(80)으로 고주파가 조사되며 상기 조리접시(50) 하면을 투과하여 피조리물에 조사되도록 상기 받침판(60)의 중심부위(62)에 다수개 천공된 제1안내공(621)과 상기 지지부(61)의 상면을 따라 천공된 제2안내공(614)을 구비하는 것을 특징으로 하는 전자렌지의 조리접시 받침판.The main body 10 provided with the cooking chamber 20 and the electrical equipment compartment 30 in which the electric heater 70 is installed on the ceiling surface, and the electrical equipment 70 are installed in the electrical equipment compartment 30 to radiate high frequency to the cooking chamber 20. Magnetron 31, and a disk-shaped support plate 60, the support plate provided rotatably spaced from the bottom surface of the cooking chamber 20 so that the high frequency radiated from the magnetron 31 is evenly irradiated to the workpiece. (60) In the microwave oven having a cooking plate (50) made of a material which is placed on a workpiece and has a high frequency transmission therethrough, the support plate (60) is provided at an edge portion of the cooking plate (50). And an annular support portion 61 protruding upward to form a space 80 between the support plate 60 and the support plate 60, and the space 80 formed by the support portion 61. High frequency is irradiated to the bottom of the cooking plate 50 The first guide hole 621 and a plurality of second guide hole 614 perforated along the upper surface of the support portion 61 and the plurality of perforations on the center 62 of the support plate 60 to be irradiated to the workpiece Microwave cooking plate support plate characterized in that it comprises.
KR2019960002787U 1996-02-23 1996-02-23 Microwave oven KR200153686Y1 (en)

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100774506B1 (en) 2006-05-29 2007-11-08 엘지전자 주식회사 Metal tray in microwave oven

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100774506B1 (en) 2006-05-29 2007-11-08 엘지전자 주식회사 Metal tray in microwave oven

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