JP3499446B2 - Substrate processing equipment - Google Patents

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a substrate processing apparatus for supplying a processing liquid onto a substrate to perform a predetermined processing on the substrate.

[0002]

2. Description of the Related Art A substrate processing apparatus is used to perform various kinds of processing on a semiconductor wafer, a glass substrate for a liquid crystal display device, a glass substrate for a photomask, a glass substrate for an optical disk and the like. For example, a rotary developing device is used for developing the photosensitive film formed on the surface of the substrate.

FIG. 9 is a schematic sectional view of a conventional developing device. In FIG. 9, the substrate holding unit 31 includes a circular plate-shaped spin base 32. The spin base 32 is horizontally fixed to the tip of the rotary shaft 2 of the motor 3, and is rotationally driven around a vertical axis.

On the upper surface of the spin base 32, an annular support portion 3 is provided.
3 is fixed, and a plurality of substrate support pins 34 that support the back surface of the substrate W are provided on the annular support portion 33. A plurality of substrate holding pins 37 that regulate the horizontal position of the substrate W are attached to the spin base 32 by bearings 38 so as to be rotatable around an axis in the vertical direction. A rod-shaped permanent magnet 39 is attached to the bottom of each substrate holding pin 37.

An annular magnet 41 is provided below the spin base 32.
Is provided. This annular magnet 41 is provided with a magnet support member 4 which is vertically movable by a drive device (not shown).
It is fixed at 2.

A developing nozzle 43 for ejecting a developing solution is provided above the substrate holding portion 31 so as to be movable in the vertical and horizontal directions. The developing nozzle 43 stands by at a position separated from above the substrate W before and after the developing process, and moves above the central portion of the substrate W during the developing process.

The operation during the developing process in the above developing device will be described below. The development processing of the substrate using this developing device includes the steps of supplying a developing solution, retaining the developing solution, washing with pure water, and drying.

First, in the developing solution supplying step, the annular magnet 41 is used.
And the substrate W is held in the horizontal direction by the plurality of substrate holding pins 37. After that, the substrate holding unit 31 is rotationally driven by the motor 3, and the substrate W rotates at a low speed around the axis in the vertical direction. In this state, the developing solution is discharged onto the substrate W from the developing nozzle 43. By the rotation of the substrate W, the developing solution is uniformly spread on the entire surface of the substrate W.

In the developing solution holding step, the rotation of the substrate holding section 31 is stopped. When the rotation of the substrate W is stopped, the annular magnet 41 descends and the substrate holding pins 37 are opened. As a result, the developing solution is piled up on the substrate W and is left stationary for a certain period of time. During this time, the development of the photosensitive film on the substrate W proceeds.

In the pure water cleaning step, the substrate holder 31 is driven to rotate again, pure water is supplied to the surface of the substrate W from a pure water supply nozzle (not shown), and the surface of the substrate W is cleaned with pure water. Be seen.

In the drying step, after the supply of pure water is stopped, the substrate holder 31 is rotationally driven at a high speed, and the pure water is shaken off from the surface of the substrate W by the centrifugal force accompanying the rotation. As a result, the substrate W is dried. Then, the substrate holder 31
Is stopped, and the developing process of the substrate W is completed.

[0012]

In the developing solution supplying step described above, the developing solution 43 is discharged from the developing nozzle 43 onto the surface of the substrate W while the substrate W held by the substrate holding section 31 is rotationally driven at a low speed. To be done. When a large amount of the developing solution 45 is ejected so as to uniformly spread over the entire surface of the substrate W, the developing solution 45 flows down from the outer peripheral portion of the substrate W onto the upper surface of the substrate holding pin 37 and the upper peripheral portion of the upper surface of the spin base 32, and further spins. It flows down from the outer peripheral portion of the base 32. After that, when the rotation of the substrate W is stopped, a part of the developing solution propagates from the outer peripheral portion of the spin base 32 to the back surface and gradually permeates between the components.

In particular, the processing liquid is the bearing 3 of the substrate holding pin 37.
If it penetrates into the inside 8, smooth movement of the substrate holding pin 37 is impaired. Further, when the developing solution that has permeated between the components solidifies, the solidified developing solution becomes particles (solid particles) and floats in the cup 40 when the substrate holding unit 31 rotates at high speed in the drying process, and the substrate W It reattaches to the surface of the substrate and contaminates the substrate W.

An object of the present invention is to provide a substrate processing apparatus in which the processing liquid supplied to the substrate is prevented from entering the rotating portion of the holding member holding the substrate.

[0015]

A substrate processing apparatus according to a first aspect of the present invention is a substrate processing apparatus for supplying a processing liquid onto a substrate to perform a predetermined process on the substrate. A rotating member having a diameter larger than the diameter, a driving unit that rotationally drives the rotating member, and a plurality of members that are provided on the rotating member along the outer peripheral portion of the substrate and contact the outer peripheral end portion of the substrate to hold the substrate. A holding member; and a processing liquid supply means for supplying the processing liquid onto the substrate held by the plurality of holding members,
At least one holding member of the plurality of holding members includes a bearing provided so as to vertically penetrate the rotary member, a support portion rotatably provided on the rotary member by the bearing, and a rotation of the support portion. Accordingly, the rotating member includes a holding portion provided on the supporting portion so as to come into contact with the outer peripheral end portion of the substrate, and the rotating member includes a peripheral wall portion extending downward from the outer peripheral portion of the rotating member.

In the substrate processing apparatus according to the first aspect of the invention, the substrate is held on the rotating member by the plurality of holding members. In this case, the holding portion of the at least one holding member comes into contact with the outer peripheral end portion of the substrate as the support portion is rotated by the bearing. In this state, the rotating member is rotationally driven by the driving unit, and the processing liquid is supplied from the processing liquid supply unit onto the substrate.

A part of the processing liquid supplied onto the substrate flows down from the outer peripheral portion of the substrate onto the rotating member, and further tries to go around to the lower surface side along the outer peripheral portion of the rotating member. Since the peripheral wall portion that extends downward is formed on the outer peripheral portion of the rotary member, the peripheral wall portion prevents the processing liquid from flowing around to the lower surface side of the rotary member. As a result, the treatment liquid does not enter the bearing of the holding member, and malfunction of the bearing due to the entry of the treatment liquid is prevented. Further, generation of particles due to solidification of the treatment liquid that has entered the bearing is prevented.

A substrate processing apparatus according to a second aspect of the present invention has at least one of the substrate processing apparatus according to the first aspect of the present invention.
Each of the holding members further includes a bearing accommodating portion having an annular wall portion projecting to the upper surface side of the rotating member and accommodating the bearing, and the support portion has a constant gap outside the upper portion of the annular wall portion of the bearing accommodating portion. It has a lid-like portion surrounding it.

In this case, the bearing is accommodated in the bearing accommodating portion, and the outer side from the upper portion of the annular wall portion of the bearing accommodating portion protruding to the upper surface side of the rotating member is separated by the lid-like portion of the supporting portion with a certain gap. Since it is covered, the processing liquid that has flowed down from the substrate onto the supporting portion of the holding member flows down onto the rotating member along the outer surface of the lid-shaped portion of the supporting portion. Therefore, the treatment liquid does not enter the bearing in the bearing housing from the upper surface side of the rotating member. Further, since the inside of the bearing housing communicates with the outside through the curved gap between the annular wall and the lid of the support, the treatment liquid is not allowed to flow between the annular wall and the lid of the support. It becomes difficult to penetrate into the bearing in the bearing housing through the gap. Therefore, the treatment liquid is reliably prevented from entering the bearing of the holding member.

A substrate processing apparatus according to a third aspect of the present invention is a substrate processing apparatus that supplies a processing liquid onto a substrate to perform a predetermined process on the substrate, and includes a rotating member having a diameter larger than an outer diameter of the substrate. A driving means for rotationally driving the rotating member, a plurality of holding members provided on the rotating member along the outer peripheral portion of the substrate and holding the substrate by contacting the outer peripheral end portion of the substrate, and held by the plurality of holding members A treatment liquid supply means for supplying a treatment liquid onto the formed substrate, and at least one of the plurality of holding members is provided.
The two holding members are a bearing provided so as to vertically penetrate the rotating member, a support portion rotatably provided on the rotating member by the bearing, and an outer peripheral end portion of the substrate along with the rotation of the supporting portion. And a shielding portion that shields the outside of the bearing on the lower surface side and the outer peripheral side of the rotating member so as to abut on the supporting member.

In the substrate processing apparatus according to the third aspect of the invention, the substrate is held on the rotating member by the plurality of holding members. In this case, the holding portion of the at least one holding member comes into contact with the outer peripheral end portion of the substrate as the support portion is rotated by the bearing. In this state, the rotating member is rotationally driven by the driving unit, and the processing liquid is supplied from the processing liquid supply unit onto the substrate.

A part of the processing liquid supplied onto the substrate flows down from the outer peripheral portion of the substrate onto the rotating member, and further tries to go around to the lower surface side along the outer peripheral portion of the rotating member. Since the shielding portion that shields the outside of the bearing is provided on the lower surface side and the outer peripheral portion side of the rotating member, the shielding solution prevents the processing liquid from flowing around to the lower surface side of the holding member. As a result, the treatment liquid does not enter the bearing of the holding member, and malfunction of the bearing due to the entry of the treatment liquid is prevented. Further, generation of particles due to solidification of the treatment liquid that has entered the bearing is prevented.

A substrate processing apparatus according to a fourth aspect of the present invention has at least one of the substrate processing apparatus according to the third aspect of the invention.
Each of the holding members further includes a bearing accommodating portion having an annular wall portion projecting to the upper surface side of the rotating member and accommodating the bearing, and the support portion has a constant gap outside the upper portion of the annular wall portion of the bearing accommodating portion. It has a lid-like portion surrounding it.

In this case, the bearing is accommodated in the bearing accommodating portion, and the outer side from the upper portion of the annular wall portion of the bearing accommodating portion protruding to the upper surface side of the rotating member is separated by the lid-shaped portion of the supporting portion with a certain gap. Since it is covered, the processing liquid that has flowed down from the substrate onto the supporting portion of the holding member flows down onto the rotating member along the outer surface of the lid-shaped portion of the supporting portion. Therefore, the treatment liquid does not enter the bearing in the bearing housing from the upper surface side of the rotating member. Further, since the inside of the bearing housing communicates with the outside through the curved gap between the annular wall and the lid of the support, the treatment liquid is not allowed to flow between the annular wall and the lid of the support. It becomes difficult to penetrate into the bearing in the bearing housing through the gap. Therefore, the treatment liquid is reliably prevented from entering the bearing of the holding member.

[0025]

DETAILED DESCRIPTION OF THE INVENTION A rotary developing device will be described below as an example of a substrate processing apparatus according to the present invention.

FIG. 1 is a sectional view of a rotary developing device according to the first embodiment of the present invention, and FIG. 2 is a plan view of the developing device of FIG.

In FIG. 1 and FIG. 2, the substrate holder 1 is provided with a circular plate-shaped spin base 11. Spin base 1
No. 1 uses aluminum as a base material and nickel on the upper surface.
It is polytetrafluoroethylene plated. The contact angle of nickel-polytetrafluoroethylene plating with water is as large as about 100 ° and the developer can be repelled. Further, as another example of the spin base 11, it is possible to use an alumite impregnated with a water-repellent resin, or a metal material such as a titanium alloy coated with a fluorine-based resin (coating treatment). .

The spin base 11 is horizontally fixed to the tip of the rotary shaft 2 of the motor 3 via a base mounting member 12, and is rotationally driven about a vertical axis.

On the upper surface of the spin base 11, an annular supporting portion 13 made of a water-repellent resin is provided, and on the upper surface of the annular supporting portion 13, a plurality of support pins 14 for supporting the lower surface of the substrate W are provided. Is provided.

As shown in FIG. 2, a plurality of cutout portions 13b are provided on the outer peripheral portion of the annular support portion 13. A rotary holding pin 15 that restricts the horizontal position of the substrate W is provided in each notch 13 b of the annular support 13. The rotary holding pin 15 is attached to the spin base 11 so as to be rotatable around a vertical axis. The structure of the rotary holding pin 15 will be described later.

As shown in FIG. 1, an annular magnet 6 is arranged below the spin base 11. This ring magnet 6
Is fixed to a magnet supporting member 7 provided so as to be vertically movable by a driving device (not shown).

The rotating shaft 2 of the motor 3 is a hollow shaft, and a back rinse nozzle 9 (see FIG. 2) for cleaning the back surface of the substrate W is inserted therein. The back rinse nozzle 9 penetrates the base mounting member 12 and the substrate W
Projecting to the back side of. A frustoconical cap 8 is attached to the tip of the back rinse nozzle 9. The cap 8 is provided to prevent a rinse liquid such as pure water discharged from the back rinse nozzle 9 from entering the inside of the rotating shaft 2.

Above the substrate holder 1, a developing nozzle 10 for ejecting a developing solution is provided so as to be movable in the vertical and horizontal directions. The developing nozzle 10 stands by at a position separated from above the substrate W before and after the developing process, and moves above the central portion of the substrate W during the developing process.

Further, a hollow cup 4 is arranged so as to surround the substrate holding portion 1. The cup 4 includes an upper cup 4a that is vertically movable, and a lower cup 4b fixed below the upper cup 4a. An exhaust port 4c for exhausting a downward flow (downflow) of clean air that is descended from above the developing device into the cup 4 is provided below the lower cup 4b.

FIG. 3 is a sectional view taken along line XX in FIG. 2, and FIG. 4 is an exploded perspective view of the rotary holding pin of the developing device of FIG.

In FIGS. 3 and 4, the rotary holding pin 15 includes a rod-shaped pin member 16, a substantially columnar pin support portion 17, a mounting member 18, and a magnet housing portion 21. The pin member 16 is provided on the upper surface of the pin support portion 17 so as to be eccentric with respect to the center of the pin support portion 17.

The pin support portion 17 has a lid portion 17a, an insertion portion 17b which is inserted into a bearing 20 of a mounting member 18 which will be described later, and a connecting portion 1 which is connected to the magnet accommodating portion 21.
7c and.

The magnet housing portion 21 is a housing portion 21a for housing a rod-shaped permanent magnet 22 and a connecting portion 17 of the pin support portion 17.
c is provided with a connecting portion 21b fixed by the screw 25 of FIG.

The mounting member 18 includes a fixing portion 18a fixed to the spin base 11, a cylindrical insertion portion 18b inserted into a mounting hole of the spin base 11, and a cylindrical protrusion protruding above the spin base 11. And a portion 18c. A bearing 20 is housed inside the insertion portion 18b and the protruding portion 18c.
A bearing support member 24 for preventing the falling of 0 is inserted (see FIG. 3).

A pair of mounting holes 19 are formed in the fixing portion 18a of the mounting member 18, and the fixing portion 18a is formed by inserting a screw (not shown) into the mounting hole 19.
a is fixed to the spin base 11. Mounting member 18
The projecting portion 18c of the above project from the upper surface of the spin base 11 upward. In the bearing 20 inserted inside the protruding portion 18c of the mounting member 18, the insertion portion 1 of the pin support portion 17 is inserted.
7b is inserted. In addition, in the bearing 20, from the lower end side of the mounting member 18 to the connecting portion 21b of the magnet housing portion 21.
Is inserted, and the pin support portion 17 and the magnet storage portion 21 are connected by the screw 25 of FIG. As a result, the pin support portion 17 and the magnet housing portion 21 are integrated, and the bearing 2
It is rotatably supported by the spin base 11 by 0.

When the rotary holding pin 15 is attached to the spin base 11, the lid-shaped portion 17 of the pin support 17 is provided.
a covers the upper end surface and the outer peripheral surface of the protruding portion 18c of the attachment member 18 with a certain gap. As a result, the gap reaching the bearing 20 in the mounting member 18 from the outside of the pin support 17 meanders in the vertical direction, and it becomes difficult for the developer to enter the bearing 20 from the outside.

Further, as shown in FIG. 3, the mounting member 1
Due to its structure, a gap A is formed between the lower surface of 8 and the surfaces of the storage portion 21a and the connecting portion 21b of the magnet storage portion 21. For this reason, if a part of the developer flowing down from the substrate W onto the spin base 11 flows down into the magnet housing portion 21, there is a possibility that it will enter the bearing 20 through the gap A.

Therefore, an annular outer peripheral cover member 26 is provided on the outer peripheral portion of the spin base 11. The outer peripheral cover member 26 extends downward from the outer peripheral portion of the spin base 11 and surrounds the outer sides of the plurality of rotary holding pins 15.

The developing solution that has flowed down to the spin base 11 flows down along the outer surface of the outer peripheral cover member 26.
Therefore, the developer is prevented from entering the bearing 20.

In this embodiment, the spin base 11 corresponds to the rotating member, the motor 3 corresponds to the driving means, the rotary holding pin 15 corresponds to the holding member, and the developing nozzle 10 corresponds to the processing liquid supply means. To do. In addition, the rotary holding pin 15
The bearing 20 in FIG.
7 corresponds to the support portion, the pin member 16 corresponds to the holding portion,
The outer peripheral cover member 26 corresponds to the peripheral wall portion. Further, the mounting member 18 corresponds to the bearing accommodating portion, the protruding portion 18c corresponds to the annular wall portion, and the lid-shaped portion 17a corresponds to the lid-shaped portion.

Next, the operation of the developing device having the above structure during the developing process will be described. In this developing device, the developing process is performed while a clean downflow is supplied to the inside and the outside of the cup 4 from above. In the developing process, the steps of supplying a developing solution, holding a developing solution, washing with pure water, and drying are sequentially performed.

First, the substrate W is the support pin 1 of the substrate holder 1.
4. Next, the annular magnet 6 rises and the plurality of rotary holding pins 15 hold the substrate W in the horizontal direction.

In the developing solution supplying step, the developing nozzle 1 is operated while the substrate holding portion 1 is rotationally driven at a low speed by the motor 3.
The developing solution is discharged onto the substrate W from 0. The discharged developing solution is uniformly spread on the entire surface of the substrate W.

A relatively large amount of developing solution is discharged from the developing nozzle 10. Therefore, a part of the developer is transmitted to the rotary holding pin 15 or directly flows down to the outer peripheral portion of the upper surface of the annular support portion 13. Further, the developing solution is applied to the annular supporting portion 13.
From the outer peripheral portion of the upper surface along the outer surface of the outer peripheral cover member 26 to flow downward in the cup 4.

Further, the pin support portion 1 of the rotary holding pin 15
The developer that has flowed down to the upper surface of 7 flows down to the surface of the spin base 11 in the notch 13b along the lid-shaped portion 17a of the pin supporting portion 17, and further flows down along the outer surface of the outer peripheral cover member 26.

This prevents the developer from entering the bearing 20 in the mounting member 18.

In the developing solution holding step, the rotation of the substrate holding section 1 is stopped, the annular magnet 6 is lowered, and the rotary holding pin 15 is opened. In this state, the developing solution is held stationary on the substrate W for a certain period of time. As a result, the substrate W
Development of the upper photosensitive film proceeds. Also in this case, the substrate W
When the developer flows down from the outer peripheral portion of the, the developer is flushed off below the cup 4 along the outer surface of the outer peripheral cover member 26.

In the cleaning step, the annular magnet 6 moves up again and the rotary holding pin 15 holds the substrate W in the horizontal direction. Then, the substrate holding unit 1 is rotationally driven by the motor 3, and the substrate W is rotated at a predetermined speed. In this cleaning process, pure water is discharged from the pure water supply nozzle (not shown) onto the substrate W to clean the surface of the substrate W, and the rinse liquid (pure water) is rinsed from the back rinse nozzle 9 (see FIG. 2). Are discharged to clean the back surface of the substrate W.

When the cleaning process for the front surface and the back surface of the substrate W is completed, the process proceeds to the drying step. In the drying process, the motor 3
The number of rotations is increased, and the substrate W rotates at high speed. As a result, the pure water supplied to the surface of the substrate W is shaken off to the outside, and the surface of the substrate W is dried.

As described above, in the developing device of this embodiment, the outer peripheral cover member 26 is provided on the lower surface side of the outer peripheral portion of the spin base 11.
Is provided, the developer is prevented from flowing around the lower surface side of the spin base 11. This prevents the developer from penetrating into the bearing 20 and impairing the movement of the rotary holding pin 15. Also, the bearing 20
The generation of particles due to the solidification of the developing solution that has penetrated into is prevented.

FIG. 5 is a sectional view of a rotary developing device according to the second embodiment of the present invention, and FIG. 6 is a plan view of the developing device of FIG. 7 is a sectional view taken along the line YY in FIG. 6, and FIG. 8 is an exploded perspective view of the rotary holding pin of the developing device of FIG.

In the developing device of FIG. 5, each mounting member 18 is used instead of the outer peripheral cover member 26 of the developing device of FIG.
The bearing cover portion 18d is provided in the. The configuration of the other parts of the developing device in FIG. 5 is the same as the configuration of the developing device in FIG. In this embodiment, the bearing cover portion 18d of the mounting member 18 corresponds to the shielding portion.

7 and 8, the mounting member 1
The lower surface of 8 is provided with a bearing cover portion 18d.
The bearing cover portion 18d is the fixed portion 18a of the mounting member 18.
Is formed in a semi-cylindrical shape extending downward from the lower surface of the magnet and covering almost half of the outside of the magnet housing portion 21.

The developer flowing down from the substrate W onto the spin base 11 is further subjected to the bearing cover portion 18d of the mounting member 18.
Flows down the cup 4 along the outer surface of the cup. As a result, the developing solution is applied to the lower surface of the mounting member 18 and the magnet housing 2
It is prevented that the bearing 20 is penetrated through the gap A between the bearing 20 and the surface of the bearing 1.

Therefore, it is possible to prevent the movement of the rotary holding pin 15 from being impaired by the infiltration of the developing solution into the bearing 20. Further, the generation of particles due to the solidification of the developer that has entered the bearing 20 is prevented.

The bearing cover portion 18d is preferably formed in a semi-cylindrical shape so that the annular magnet 6 that drives the magnet housing portion 21 can come close to the permanent magnet 22 inside the magnet housing portion 21. However, if the annular magnet 6 can exert a sufficient magnetic force on the permanent magnet 22 in the magnet housing portion 21, the bearing cover portion 18d may be formed in a cylindrical shape surrounding the magnet housing portion 21.

In the developing device of the above embodiment, the rotary holding pins 15 are used as the plurality of holding members, but the rotary holding pin 1 is used as at least one of the plurality of holding members.
5 may be used, and a fixed holding pin may be used as the remaining holding member.

The present invention can be applied not only to the developing device that supplies the developing solution as in the above-described embodiment but also to another substrate processing apparatus that supplies another processing liquid to the substrate.

[Brief description of drawings]

FIG. 1 is a sectional view of a rotary type developing device according to a first embodiment of the present invention.

FIG. 2 is a plan view of the developing device of FIG.

FIG. 3 is a sectional view taken along line XX in FIG.

FIG. 4 is an exploded perspective view of a rotary holding pin of the developing device of FIG.

FIG. 5 is a sectional view of a rotary developing device according to a second embodiment of the present invention.

FIG. 6 is a plan view of the developing device of FIG.

7 is a cross-sectional view taken along the line YY in FIG.

FIG. 8 is an exploded perspective view of a rotary holding pin of the developing device of FIG.

FIG. 9 is a sectional view of a conventional developing device.

[Explanation of symbols]

1 Substrate holder 11 spin base 12 Mounting member 13 Annular support 15 Rotary holding pin 16 pin member 17 pin support 17a lid part 17b insertion part 17c connection part 18 Mounting member 18a fixed part 18b insertion part 18c protrusion 18d bearing cover 20 bearings 21 Magnet storage 21a Storage section 21b Connection part 22 Permanent magnet 26 Peripheral cover member

─────────────────────────────────────────────────── ─── Continuation of front page (56) References JP-A-8-323274 (JP, A) JP-A-8-222512 (JP, A) JP-A-8-141478 (JP, A) (58) Field (Int.Cl. ⁷ , DB name) H01L 21/027 G03F 7/30 501

Claims (4)

(57) [Claims] 1. A substrate processing apparatus for supplying a processing liquid onto a substrate to perform a predetermined process on the substrate, comprising: a rotating member having a diameter larger than an outer diameter of the substrate; and a drive for rotationally driving the rotating member. Means, a plurality of holding members provided on the rotating member along the outer peripheral portion of the substrate, for holding the substrate by contacting the outer peripheral end portion of the substrate, and processing on the substrate held by the plurality of holding members. A treatment liquid supply means for supplying a liquid, wherein at least one holding member of the plurality of holding members is a bearing provided so as to vertically penetrate the rotating member, and the bearing is provided on the rotating member. The rotating member includes a supporting portion that is rotatably provided, and a holding portion that is provided on the supporting portion so as to come into contact with an outer peripheral end of the substrate as the supporting portion rotates. A peripheral wall extending downward from the outer peripheral portion of the member A substrate processing apparatus having a section. 2. The at least one holding member further includes a bearing accommodating portion having an annular wall portion projecting to an upper surface side of the rotating member and accommodating the bearing, and the supporting portion is the bearing accommodating portion. 2. The substrate processing apparatus according to claim 1, further comprising a lid-shaped portion that surrounds an outer side of the annular peripheral wall from an upper portion of the annular peripheral wall with a constant gap. 3. A substrate processing apparatus for supplying a processing liquid onto a substrate to perform a predetermined process on the substrate, the rotating member having a diameter larger than the outer diameter of the substrate, and a drive for rotationally driving the rotating member. Means, a plurality of holding members provided on the rotating member along the outer peripheral portion of the substrate, for holding the substrate by contacting the outer peripheral end portion of the substrate, and processing on the substrate held by the plurality of holding members. A treatment liquid supply means for supplying a liquid, wherein at least one holding member of the plurality of holding members is a bearing provided so as to vertically penetrate the rotating member, and the bearing is provided on the rotating member. A supporting portion that is rotatably provided, a holding portion that is provided on the supporting portion so as to come into contact with an outer peripheral end portion of the substrate as the supporting portion rotates, a lower surface side and an outer peripheral portion of the rotating member. Shield that shields the outside of the bearing on the side And a substrate processing apparatus. 4. The at least one holding member further includes a bearing accommodating portion having an annular wall portion protruding toward an upper surface side of the rotating member and accommodating the bearing, and the supporting portion is the bearing accommodating portion. 4. The substrate processing apparatus according to claim 3, further comprising a lid-shaped portion that surrounds an outer side of the annular wall portion from above with a constant gap.