JP3470651B2 - Manufacturing method of ceramic electronic component - Google Patents

Manufacturing method of ceramic electronic component

Info

Publication number
JP3470651B2
JP3470651B2 JP24421699A JP24421699A JP3470651B2 JP 3470651 B2 JP3470651 B2 JP 3470651B2 JP 24421699 A JP24421699 A JP 24421699A JP 24421699 A JP24421699 A JP 24421699A JP 3470651 B2 JP3470651 B2 JP 3470651B2
Authority
JP
Japan
Prior art keywords
ceramic
ceramic element
electronic component
manufacturing
laminated
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP24421699A
Other languages
Japanese (ja)
Other versions
JP2001068372A (en
Inventor
孝明 河合
日出夫 広瀬
正視 堤野
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Murata Manufacturing Co Ltd
Original Assignee
Murata Manufacturing Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Murata Manufacturing Co Ltd filed Critical Murata Manufacturing Co Ltd
Priority to JP24421699A priority Critical patent/JP3470651B2/en
Publication of JP2001068372A publication Critical patent/JP2001068372A/en
Application granted granted Critical
Publication of JP3470651B2 publication Critical patent/JP3470651B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Landscapes

  • Ceramic Capacitors (AREA)
  • Fixed Capacitors And Capacitor Manufacturing Machines (AREA)

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【発明の属する技術分野】本発明は、セラミック電子部
品の製造方法に関し、詳しくは、セラミック電子部品を
構成するセラミック素子に、水分の付着や吸着が生じる
ような処理を施す工程を経て製造されるセラミック電子
部品の製造方法に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for manufacturing a ceramic electronic component, and more particularly, it is manufactured through a process of subjecting a ceramic element constituting the ceramic electronic component to a process for causing adhesion or adsorption of moisture. The present invention relates to a method for manufacturing a ceramic electronic component.

【0002】[0002]

【従来の技術及び発明が解決しようとする課題】例え
ば、代表的なセラミック電子部品の一つである積層セラ
ミックコンデンサは、図1に示すように、複数の内部電
極1がセラミック層2を介して互いに対向するように配
設され、かつ、交互に逆側の端面3a,3bに引き出さ
れた構造を有するセラミック素子5に、内部電極1と導
通するように外部電極4a,4bが配設された構造を有
している。
2. Description of the Related Art For example, as shown in FIG. 1, a multilayer ceramic capacitor, which is one of typical ceramic electronic components, has a plurality of internal electrodes 1 with ceramic layers 2 interposed therebetween. External electrodes 4a and 4b are provided so as to be electrically connected to the internal electrode 1 on a ceramic element 5 which is arranged so as to face each other and has a structure in which the opposite end surfaces 3a and 3b are alternately drawn out. It has a structure.

【0003】ところで、上記のような積層セラミックコ
ンデンサは、例えば、以下に説明するような工程を経て
製造されることがある。
By the way, the monolithic ceramic capacitor as described above may be manufactured, for example, through the steps described below.

【0004】(1)セラミックグリーンシートの表面に内
部電極となる導電ペーストを印刷して電極印刷シートを
形成する。(2) この電極印刷シートと、導電ペーストの印刷されて
いないセラミックグリーンシート(上下両面側のカバー
シート)を所定枚数積層し、圧着することにより、積層
圧着体を形成する。(3) それから、この積層圧着体を所定の位置でカット
し、個々の未焼成のセラミック素子を切り出した後、セ
ラミック素子を所定の温度で焼結させる。(4) 次いで、セラミック素子を水と研磨媒体の混合物と
ともにバレルに入れて攪拌することによりその表面を研
磨する、いわゆる湿式バレル研磨処理を施し、セラミッ
ク素子の表面を研磨するとともに、面取りを行う。(5) それから、セラミック素子5に導電ペーストを塗
布、焼き付けして外部電極を形成する。これにより、図
1に示すような積層セラミックコンデンサが得られる。
(1) An electrode printed sheet is formed by printing a conductive paste that will become internal electrodes on the surface of a ceramic green sheet. (2) A predetermined number of the electrode printed sheets and the ceramic green sheets (cover sheets on the upper and lower sides) on which the conductive paste is not printed are laminated and pressure-bonded to form a laminated pressure-bonded body. (3) Then, the laminated pressure-bonded body is cut at a predetermined position to cut out each unfired ceramic element, and then the ceramic element is sintered at a predetermined temperature. (4) Next, the ceramic element is put into a barrel together with a mixture of water and a polishing medium, and the surface is polished by stirring, so-called wet barrel polishing treatment is performed to polish the surface of the ceramic element and chamfer it. (5) Then, the ceramic element 5 is coated with a conductive paste and baked to form external electrodes. As a result, a monolithic ceramic capacitor as shown in FIG. 1 is obtained.

【0005】しかし、上記従来の製造方法では、(4)
バレル研磨処理の工程で、セラミック素子が水を吸着
し、その後の(5)の外部電極の形成工程で、導電ペース
トがセラミック素子の表面にのりにくくなる、いわゆる
はじき現象を招くという問題点がある。
In the above conventional manufacturing method, however, the ceramic element adsorbs water in the barrel polishing step (4) , and the conductive paste is converted into the ceramic element in the subsequent external electrode forming step (5) . There is a problem that it causes a so-called repellency phenomenon, which makes it difficult to get on the surface.

【0006】また、セラミック電子部品の種類によって
は、接続信頼性やはんだ付け性を向上させるため、外部
電極の表面に、Niめっき、及びSnめっき(はんだめ
っき)を施すことが行われる場合があるが、そのような
場合、セラミック素子にめっき液がしみ込み、リフロー
はんだ付けなどの方法により、回路基板などに実装する
工程で、めっき液中の水分が蒸発して、はんだのはぜ
(破裂)が生じ、隣接する電子部品などとの間にはんだ
ブリッジが発生して、短絡を引き起こすという問題点が
ある。
Further, depending on the type of ceramic electronic component, Ni plating and Sn plating (solder plating) may be applied to the surface of the external electrode in order to improve connection reliability and solderability. However, in such a case, the plating solution soaks into the ceramic element, and the water in the plating solution evaporates in the process of mounting on a circuit board by a method such as reflow soldering, causing solder solder (burst). Occurs, and a solder bridge is generated between adjacent electronic components, which causes a short circuit.

【0007】本発明は、上記問題点を解決するものであ
り、セラミック素子から効率よく水分を蒸発させて除去
し、導電ペーストを塗布、焼き付けして外部電極を形成
する場合の導電ペーストのはじき現象や、外部電極にめ
っきを施す場合のめっき液の付着や吸着による、実装時
のはんだのはぜを防止することが可能で、信頼性の高い
セラミック電子部品を効率よく製造することが可能なセ
ラミック電子部品の製造方法を提供することを目的とす
る。
The present invention solves the above problems, and repels the conductive paste when the moisture is efficiently evaporated from the ceramic element to be removed, and the conductive paste is applied and baked to form the external electrodes. Also, it is possible to prevent solder from soldering at the time of mounting due to the adhesion or adsorption of the plating solution when plating the external electrodes, and it is possible to efficiently manufacture highly reliable ceramic electronic components. It is an object to provide a method for manufacturing an electronic component.

【0008】[0008]

【課題を解決するための手段】上記目的を達成するため
に、本発明のセラミック電子部品の製造方法は、セラミ
ック成形体を焼成してなるセラミック素子の表面外部
電極を形成する工程と、湿式めっき処理を施して前記外
部電極の表面にめっき膜を形成する工程と、 前記外部電
極の表面にめっき膜が形成されたセラミック素子を減圧
下で120℃以上に加熱することにより、セラミック素
子から水分を除去する工程を具備することを特徴とし
ている。
To achieve the above object, according to the Invention The production method of a ceramic electronic component of the present invention, the outside surface of the ceramic element made by firing a ceramic molded body
And forming an electrode, the outer and facilities the wet plating process
Forming a plating film on the surface of the internal electrode,
By heating the ceramic element plated film is formed on the electrode surface above 120 ° C. under reduced pressure, it is characterized by comprising the step of removing moisture from the ceramic element.

【0009】セラミック素子に外部電極を形成した後、
該外部電極の表面にめっき膜を形成するために湿式めっ
きを施す工程では、セラミック素子へのめっき液の付着
又は吸着が生じるが、セラミック素子を減圧下で120
℃以上に加熱することにより、セラミック素子からめっ
き液に含まれる水分を確実に、しかも効率よく除去する
ことが可能になる。したがって、リフローはんだ付けな
どの方法により、セラミック電子部品を回路基板などに
実装する場合に、めっき液に由来する水分の蒸発によ
り、はんだがはぜて(破裂して)隣接する電子部品など
と短絡を生じたりすることを防止することが可能にな
り、信頼性の高いセラミック電子部品を効率よく製造す
ることが可能になる。
After forming the external electrodes on the ceramic element ,
Wet plating to form a plating film on the surface of the external electrode.
In the step of performing came, although adhesion or adsorption of the plating solution into the ceramic element is produced, the ceramic element under reduced pressure 120
By heating at a temperature of not less than 0 ° C, it becomes possible to reliably and efficiently remove the water contained in the plating solution from the ceramic element. Therefore, when a ceramic electronic component is mounted on a circuit board, etc. by a method such as reflow soldering, the evaporation of water from the plating solution causes the solder to stick (explode) and short-circuit with the adjacent electronic component. It is possible to prevent the occurrence of the occurrence, and it is possible to efficiently manufacture a highly reliable ceramic electronic component.

【0010】また、請求項のセラミック電子部品の製
造方法は、前記セラミック素子が、内部にセラミック層
を介して複数層の内部電極層が配設された積層構造を有
する積層型のセラミック素子であることを特徴としてい
る。
In the method of manufacturing a ceramic electronic component according to a second aspect of the present invention, the ceramic element is a laminated ceramic element having a laminated structure in which a plurality of internal electrode layers are arranged with a ceramic layer inside. It is characterized by being.

【0011】内部にセラミック層を介して複数層の内部
電極層が配設された積層構造を有する積層型のセラミッ
ク素子は、湿式めっき処理の工程で水分の吸着を生じや
すく、その弊害を引き起こしやすいが、本発明の方法に
よれば、水分を効率よく除去して、水分の吸着による不
具合の発生を効率よく防止することが可能になる。した
がって、本発明は、積層セラミックコンデンサや積層バ
リスタなどの積層セラミック電子部品の製造方法に適用
した場合に特に有意義である。
A laminated ceramic element having a laminated structure in which a plurality of internal electrode layers are arranged with a ceramic layer inside is likely to cause moisture adsorption during the wet plating process and cause its adverse effects. However, according to the method of the present invention, it becomes possible to efficiently remove water and efficiently prevent the occurrence of defects due to the adsorption of water. Therefore, the present invention is particularly significant when applied to a method for manufacturing a monolithic ceramic electronic component such as a monolithic ceramic capacitor or a monolithic varistor.

【0012】[0012]

【発明の実施の形態】以下、本発明の実施の形態を示し
て、その特徴とするところをさらに詳しく説明する。
BEST MODE FOR CARRYING OUT THE INVENTION Embodiments of the present invention will be shown below, and the characteristic features thereof will be described in more detail.

【0013】[参考実施形態] この参考実施形態では、セラミック電子部品として、図
1に示すように、複数の内部電極1がセラミック層2を
介して互いに対向するように配設され、かつ、交互に逆
側の端面3a,3bに引き出された構造を有するセラミ
ック素子5に、内部電極1と導通するように外部電極4
a,4bが配設された構造を有する積層セラミックコン
デンサを製造する場合を例にとって説明する。
[ Reference Embodiment] In this reference embodiment, as a ceramic electronic component, as shown in FIG. 1, a plurality of internal electrodes 1 are arranged so as to face each other with a ceramic layer 2 interposed therebetween, and alternate. A ceramic element 5 having a structure extended to the opposite end faces 3a and 3b is connected to the external electrode 4 so as to be electrically connected to the internal electrode 1.
A case of manufacturing a monolithic ceramic capacitor having a structure in which a and 4b are arranged will be described as an example.

【0014】(1)まず、セラミックグリーンシートの表
面に内部電極となる導電ペーストを印刷して電極印刷シ
ートを形成する。(2) この電極印刷シートと、導電ペーストの印刷されて
いないセラミックグリーンシート(上下両面側のカバー
シート)を所定枚数積層し、圧着することにより、積層
圧着体を形成する。(3) それから、この積層圧着体を所定の位置でカット
し、個々の未焼成のセラミック素子を切り出した後、セ
ラミック素子を所定の温度で焼結させる。(4) 次いで、セラミック素子を水又は水と研磨媒体の混
合物とともにバレルに入れて攪拌することにより、セラ
ミック素子の表面を研磨するとともに、面取りを行う。(5) それから、セラミック素子を水洗した後、真空吸引
しながら、所定の温度に加熱した温風を吹き付けること
により、セラミック素子の表面に付着した水分及び内部
に吸着された水分を蒸発させて除去する。(6) そして、上記のようにして水分を除去したセラミッ
ク素子5に導電ペースト(この参考実施形態ではAgペ
ースト)を塗布、焼き付けし、外部電極を形成する。こ
れにより、図1に示すような積層セラミックコンデンサ
を得た。
(1) First, a conductive paste to be internal electrodes is printed on the surface of a ceramic green sheet to form an electrode printed sheet. (2) A predetermined number of the electrode printed sheets and the ceramic green sheets (cover sheets on the upper and lower sides) on which the conductive paste is not printed are laminated and pressure-bonded to form a laminated pressure-bonded body. (3) Then, the laminated pressure-bonded body is cut at a predetermined position to cut out each unfired ceramic element, and then the ceramic element is sintered at a predetermined temperature. (4) Next, the ceramic element is put into a barrel together with water or a mixture of water and a polishing medium and stirred, whereby the surface of the ceramic element is polished and chamfered. (5) Then, after the ceramic element is washed with water, hot air blown to a predetermined temperature is blown while vacuum suction to evaporate and remove the water adhering to the surface of the ceramic element and the water adsorbed inside. To do. (6) Then, a conductive paste (Ag paste in this reference embodiment) is applied to the ceramic element 5 from which the moisture has been removed as described above and baked to form an external electrode. As a result, a monolithic ceramic capacitor as shown in FIG. 1 was obtained.

【0015】なお、この参考実施形態では、表1の試験
番号4,5,6に示すような条件(真空度及び温度)
で、セラミック素子の乾燥を行った。また、比較のた
め、温風を吹き付けるだけで、真空吸引を行わない条件
(表1の試験番号1及び2)、及び真空吸引するだけで
加熱を行わない条件(試験番号3)でもセラミック素子
の乾燥を行った。
In this reference embodiment, conditions (vacuum degree and temperature) as shown in test numbers 4, 5, and 6 of Table 1 are used.
Then, the ceramic element was dried. In addition, for comparison, the ceramic element was also tested under the condition that only hot air was blown and vacuum suction was not performed (test numbers 1 and 2 in Table 1) and the condition that only vacuum suction was used and heating was not performed (test number 3). It was dried.

【0016】そして、得られた積層セラミックコンデン
サにつき、外部電極の状態を観察し、導電ペーストがセ
ラミック素子の表面にのりにくくなる、いわゆるはじき
現象の発生状況(試料500個に対するはじき現象の発
生した試料の個数)を調べた。その結果を表1に併せて
示す。
With respect to the obtained laminated ceramic capacitor, the state of the external electrodes was observed, and the occurrence of a so-called repellency phenomenon in which the conductive paste was less likely to adhere to the surface of the ceramic element (a repulsion phenomenon for 500 samples) The number of The results are also shown in Table 1.

【0017】[0017]

【表1】 [Table 1]

【0018】表1より、温風を吹き付けるだけで、真空
吸引を行わない条件(試験番号1及び2)で乾燥させた
場合、はじき現象が相当な割合で発生した。これは、真
空吸引していないために、内部に吸着された水分が蒸発
しにくいことによるものと考えられる。
From Table 1, it is found that the repelling phenomenon occurred at a considerable rate when dried under the conditions (test numbers 1 and 2) in which only hot air was blown and vacuum suction was not performed. It is considered that this is because the moisture adsorbed inside is less likely to evaporate because vacuum suction is not performed.

【0019】また、真空吸引するだけで加熱を行わない
条件(試験番号3)で乾燥させた場合にも、はじき現象
が試料500個につき25個と高い割合で発生した。こ
れは、真空吸引は行っても、温度が常温のままでは、十
分に水分を蒸発させることができず、内部に吸着された
水分が除去されにくいことによるものと考えられる。
Also, when the sample was dried under the condition that only vacuum suction was performed and heating was not performed (test number 3), the repelling phenomenon occurred at a high rate of 25 per 500 samples. It is considered that this is because even if vacuum suction is performed, if the temperature is room temperature, the moisture cannot be sufficiently evaporated, and the moisture adsorbed inside is difficult to remove.

【0020】一方、真空吸引しながら、温風の吹き付け
を行った参考実施形態にかかる方法の場合(試験番号
4,5及び6)、真空度133Pa、温度(温風吹き付
け温度)150℃×2時間で、はじき現象の発生数が試
料500個につき6個と少なく、真空度133Pa、温
度(温風吹き付け温度)200℃×2時間、及び、真空
度133Pa、温度300℃×2時間の条件では、はじ
き現象の発生が認められなかった。これは、真空吸引し
ながら、温風の吹き付けを行っているため、乾燥が十分
に行われ、セラミック素子から十分に水分が除去される
ことによるものであると考えられる。
On the other hand, in the case of the method according to the reference embodiment in which hot air is blown while vacuum suction is performed (test numbers 4, 5 and 6), the degree of vacuum is 133 Pa and the temperature (hot air blowing temperature) is 150 ° C. × 2. In the time, the number of repellency phenomena was as small as 6 per 500 samples, and the degree of vacuum was 133 Pa, the temperature (hot air blowing temperature) was 200 ° C. × 2 hours, and the degree of vacuum was 133 Pa, the temperature was 300 ° C. × 2 hours. No repulsion phenomenon was observed. It is considered that this is because the hot air is blown while vacuum suction, so that the drying is sufficiently performed and the moisture is sufficiently removed from the ceramic element.

【0021】[本発明の実施形態] この実施形態では、製品のはんだ付け性を向上させるた
めに、上記参考実施形態の方法で製造した積層セラミッ
クコンデンサの外部電極(Ag電極)の表面に、湿式め
っきを行って、Niめっき膜を形成するとともに、さら
にその上に、Snめっき膜を形成した後、水洗し、真空
吸引しながら、所定温度の温風を吹き付けて乾燥するこ
とにより、図1に示すように、複数の内部電極1がセラ
ミック層2を介して互いに対向するように配設され、か
つ、交互に逆側の端面3a,3bに引き出された構造を
有するセラミック素子5に、内部電極1と導通するよう
外部電極4a,4bが配設された構造を有する積層セ
ラミックコンデンサ(最終製品)を得た。
[Embodiment of the Present Invention] In this embodiment, in order to improve the solderability of the product, the wet process is performed on the surface of the external electrode (Ag electrode) of the multilayer ceramic capacitor manufactured by the method of the reference embodiment. By performing plating to form a Ni plating film and further forming a Sn plating film on the Ni plating film, washing with water, vacuum suction, and blowing with warm air of a predetermined temperature to dry , As shown, a plurality of internal electrodes 1
Are arranged so as to face each other with the Mick layer 2 in between,
The structure drawn alternately to the opposite end faces 3a, 3b.
Conducting electrical connection with the internal electrode 1 to the ceramic element 5 that it has.
External electrodes 4a, 4b to obtain a multilayer ceramic capacitor (final product) having arranged structure on.

【0022】なお、この実施形態では、上記参考実施形
態の場合と同様にして、湿式バレル研磨処理を行った後
で、真空に吸引しながら所定の温度に加熱して乾燥させ
ることにより、はじき現象を引き起こすことなく導電ペ
ーストを塗布、焼き付けして外部電極を形成した積層セ
ラミックコンデンサを用い、その外部電極の表面に湿式
めっきを施してNiめっき膜及びSnめっき膜を形成す
るようにした。
[0022] In this embodiment, as in the case of the referential embodiment, after performing the wet barrel polishing treatment, dried by heating to a predetermined temperature while sucking in vacuum, repelling A multilayer ceramic capacitor having an external electrode formed by applying and baking a conductive paste without causing a phenomenon was used, and the surface of the external electrode was subjected to wet plating to form a Ni plating film and a Sn plating film.

【0023】また、この実施形態では、湿式めっき後に
積層セラミックコンデンサ(セラミック素子)を乾燥す
るにあたって、表2の試験番号5,6,7に示すような
条件(真空度及び温度)で乾燥を行った。なお、比較の
ため、真空吸引するだけで加熱を行わない条件(表2の
試験番号1,2)、及び、温風を吹き付けるだけで真空
吸引を行わない条件(試験番号3,4)でも、積層セラ
ミックコンデンサの乾燥を行った。
Further, in this embodiment, when the laminated ceramic capacitor (ceramic element) is dried after the wet plating, it is dried under the conditions (vacuum degree and temperature) shown in the test numbers 5, 6, and 7 of Table 2. went. In addition, for comparison, under the condition that only vacuum suction is performed and heating is not performed (test numbers 1 and 2 in Table 2) and the condition that only hot air is blown and vacuum suction is not performed (test number 3 and 4), The monolithic ceramic capacitor was dried.

【0024】それから、得られた積層セラミックコンデ
ンサを、リフローはんだ付けの方法により、回路基板上
に実装し、はんだのはぜ(破裂)の発生状況を観察し
た。その結果を表2に併せて示す。
Then, the obtained monolithic ceramic capacitor was mounted on a circuit board by a reflow soldering method, and the occurrence state of solder solder (burst) was observed. The results are also shown in Table 2.

【0025】[0025]

【表2】 [Table 2]

【0026】表2より、真空吸引するだけで加熱を行わ
ない条件(試験番号1及び2)で乾燥させた場合、はん
だのはぜ(破裂)が高い割合で発生した。これは、真空
吸引を行っても、温風の吹き付けを行わない場合には、
十分に水分を蒸発させることができず、内部に吸着され
た水分が除去されにくいことによるものと考えられる。
From Table 2, when dried under the conditions of vacuum suction but no heating (Test Nos. 1 and 2), solder crease (burst) occurred at a high rate. This is because if hot air is not blown even if vacuum suction is performed,
It is considered that this is because the water cannot be sufficiently evaporated and the water adsorbed inside is difficult to remove.

【0027】また、温風を吹き付けるだけで、真空吸引
を行わない条件(試験番号3及び4)で乾燥させた場合
にも、はんだのはぜ(破裂)が相当な割合で発生した。
これは、温風を吹き付けても、真空吸引しなければ、水
分を十分に蒸発させることができず、内部に吸着された
水分が除去されにくいことによるものと考えられる。
Further, even when only the hot air was blown and the vacuum suction was not performed (Test Nos. 3 and 4), a considerable amount of solder broke (rupture) occurred.
It is considered that this is because even if the hot air is blown, the moisture cannot be sufficiently evaporated without vacuum suction, and the moisture adsorbed inside is difficult to be removed.

【0028】一方、真空吸引しながら、温風の吹き付け
を行った本発明の実施形態にかかる方法の場合(試験番
号5,6及び7)、はんだのはぜ(破裂)の発生が大幅
に減少していることがわかる。これは、真空吸引しなが
ら、温風の吹き付けを行っているため、乾燥が十分に行
われて、セラミック素子から十分に水分が除去されるこ
とによるものであると考えられる。
On the other hand, with vacuum suction, in the case of the method according to the exemplary shaped state of the present invention conducted the blowing of warm air (Test No. 5, 6 and 7), significantly the occurrence of solder goby (rupture) You can see that it is decreasing. It is considered that this is because hot air is blown while vacuum suction is performed, so that the ceramic element is sufficiently dried and moisture is sufficiently removed.

【0029】上記実施形態においては、積層セラミック
コンデンサを製造する場合を例にとって説明したが、本
発明は、積層セラミックコンデンサに限らず、セラミッ
ク素子の表面に外部電極を配設してなる種々のセラミッ
ク電子部品を製造する場合に、広く適用することが可能
である。
[0029] Oite to the above embodiment, the case of producing a multilayer ceramic capacitor was explained as an example, the present invention is not limited to a multilayer ceramic capacitor, various formed by disposing the external electrode on the surface of the ceramic element It can be widely applied to the production of the ceramic electronic component.

【0030】また、本発明は、さらにその他の点におい
ても上記実施形態に限定されるものではなく、真空度、
温度、時間などの乾燥条件、セラミック素子を構成する
セラミックの種類、外部電極の構成材料や構造などに関
し、発明の要旨の範囲内において、種々の応用、変形を
加えることが可能である。
Further, the present invention is not limited to the above embodiment in other points as well, and the degree of vacuum,
Various applications and modifications can be made within the scope of the invention with respect to the drying conditions such as temperature and time, the type of ceramic that constitutes the ceramic element, the constituent material and structure of the external electrode, and the like.

【0031】[0031]

【発明の効果】上述のように、本発明(請求項1)のセ
ラミック電子部品の製造方法は、セラミック素子に形成
された外部電極の表面に、湿式めっき処理を施してめっ
き膜を形成した後、セラミック素子を減圧下で120℃
以上に加熱するようにしているので、セラミック素子か
ら水分を確実に除去することが可能になる。その結果、
リフローはんだ付けなどの方法により、セラミック電子
部品を回路基板などに実装する場合に、めっき液に由来
する水分の蒸発により、はんだがはぜて(破裂して)隣
接する電子部品などと短絡を生じたりすることを防止す
ることが可能になり、信頼性の高いセラミック電子部品
を効率よく製造することが可能になる。
As described above, according to the method for manufacturing a ceramic electronic component of the present invention (claim 1), a ceramic element is formed.
Wet plating treatment is applied to the surface of the external electrode
After forming the membrane, the ceramic element is put under reduced pressure at 120 ° C.
Since the heating is performed as described above, it becomes possible to reliably remove the moisture from the ceramic element . As a result,
When a ceramic electronic component is mounted on a circuit board, etc. by a method such as reflow soldering, the evaporation of water from the plating solution causes the solder to fit (explode) and cause a short circuit with the adjacent electronic component. It becomes possible to prevent the occurrence of the occurrence, and it becomes possible to efficiently manufacture a highly reliable ceramic electronic component.

【0032】また、内部にセラミック層を介して複数層
の内部電極層が配設された積層構造を有する積層型のセ
ラミック素子は、外部電極に湿式めっきを施す過程で
分の吸着を生じやすく、その弊害を引き起こしやすい
が、本発明(請求項)の方法によれば、水分を効率よ
く除去して、水分の吸着による不具合の発生を効率よく
防止することが可能になる。したがって、本発明は、積
層セラミックコンデンサや積層バリスタなどの積層セラ
ミック電子部品の製造方法に適用した場合に、特に有意
義である。
Further, a laminated ceramic element having a laminated structure in which a plurality of internal electrode layers are arranged with ceramic layers interposed therein is used in the process of applying wet plating to the external electrodes . Although adsorption is likely to occur and its adverse effect is likely to occur, the method of the present invention (Claim 2 ) makes it possible to efficiently remove water and efficiently prevent the occurrence of defects due to water adsorption. . Therefore, the present invention is particularly significant when applied to a method for manufacturing a laminated ceramic electronic component such as a laminated ceramic capacitor or a laminated varistor.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明の一実施形態において製造した積層セラ
ミック電子部品(積層セラミックコンデンサ)を示す断
面図である。
FIG. 1 is a cross-sectional view showing a monolithic ceramic electronic component (multilayer ceramic capacitor) manufactured in an embodiment of the present invention.

【符号の説明】[Explanation of symbols]

1 内部電極 2 セラミック層 3a,3b 端面 4a,4b 外部電極 5 セラミック素子 1 internal electrode 2 ceramic layers 3a, 3b end faces 4a, 4b external electrodes 5 Ceramic element

───────────────────────────────────────────────────── フロントページの続き (56)参考文献 特開 平10−163062(JP,A) 特開 平4−250607(JP,A) 特開 平11−244216(JP,A) (58)調査した分野(Int.Cl.7,DB名) H01G 4/00 - 4/42 ─────────────────────────────────────────────────── ─── Continuation of the front page (56) References JP 10-166302 (JP, A) JP 4-250607 (JP, A) JP 11-244216 (JP, A) (58) Field (Int.Cl. 7 , DB name) H01G 4/00-4/42

Claims (2)

(57)【特許請求の範囲】(57) [Claims] 【請求項1】セラミック成形体を焼成してなるセラミッ
ク素子の表面外部電極を形成する工程と、 湿式めっき 処理を施して前記外部電極の表面にめっき膜
を形成する工程と、 前記外部電極の表面にめっき膜が形成された セラミック
素子を減圧下で120℃以上に加熱することにより、セ
ラミック素子から水分を除去する工程を具備すること
を特徴とするセラミック電子部品の製造方法。
1. A ceramic formed by firing a ceramic molded body.
ElementSurface ofToA step of forming an external electrode, Wet plating ProcessedThen, a plating film is formed on the surface of the external electrode.
A step of forming A plating film was formed on the surface of the external electrode ceramic
Under reduced pressureAbove 120 ° CBy heating,
Process to remove water from Lamic elementWhenTo have
A method for manufacturing a ceramic electronic component, comprising:
【請求項2】前記セラミック素子が、内部にセラミック
層を介して複数層の内部電極層が配設された積層構造を
有する積層型セラミック素子であることを特徴とする請
求項1記載のセラミック電子部品の製造方法。
2. The ceramic electronic device according to claim 1, wherein the ceramic element is a laminated ceramic element having a laminated structure in which a plurality of internal electrode layers are arranged with a ceramic layer interposed therebetween. Manufacturing method of parts.
JP24421699A 1999-08-31 1999-08-31 Manufacturing method of ceramic electronic component Expired - Lifetime JP3470651B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP24421699A JP3470651B2 (en) 1999-08-31 1999-08-31 Manufacturing method of ceramic electronic component

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP24421699A JP3470651B2 (en) 1999-08-31 1999-08-31 Manufacturing method of ceramic electronic component

Publications (2)

Publication Number Publication Date
JP2001068372A JP2001068372A (en) 2001-03-16
JP3470651B2 true JP3470651B2 (en) 2003-11-25

Family

ID=17115482

Family Applications (1)

Application Number Title Priority Date Filing Date
JP24421699A Expired - Lifetime JP3470651B2 (en) 1999-08-31 1999-08-31 Manufacturing method of ceramic electronic component

Country Status (1)

Country Link
JP (1) JP3470651B2 (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6442881B2 (en) * 2014-06-17 2018-12-26 株式会社村田製作所 Manufacturing method of ceramic electronic component
JP7426771B2 (en) * 2018-04-11 2024-02-02 太陽誘電株式会社 Manufacturing method of multilayer ceramic capacitor

Also Published As

Publication number Publication date
JP2001068372A (en) 2001-03-16

Similar Documents

Publication Publication Date Title
JPH0341710A (en) Laminated ceramic capacitor
EP1335392A1 (en) Ceramic electronic device and method of manufacturing the device
JP4428852B2 (en) Multilayer electronic component and manufacturing method thereof
JP2019220602A (en) Electronic component and method of manufacturing electronic component
JP2002015939A (en) Multilayered electronic component and its manufacturing method
JPH06224073A (en) Manufacture of multilayer ceramic capacitor
JP3470651B2 (en) Manufacturing method of ceramic electronic component
JPH06112085A (en) Layered ceramic capacitor and manufacture thereof
JPH097878A (en) Ceramic electronic part and manufacture thereof
JPH11354370A (en) Layered ceramic electronic parts
JPH0897072A (en) Multilayer ceramic device
JP4513129B2 (en) Manufacturing method of multilayer ceramic electronic component and multilayer ceramic electronic component
JP3444290B2 (en) Ceramic electronic component and method of manufacturing the same
US20200312564A1 (en) Multilayer ceramic capacitor and method of manufacturing multilayer ceramic capacitor
JP4637440B2 (en) Manufacturing method of ceramic element
JPH0422115A (en) Ceramic electronic parts and manufacture thereof
JP4506076B2 (en) Manufacturing method of ceramic electronic component
JPH04154104A (en) Laminated ceramic capacitor
JP4470463B2 (en) Manufacturing method of ceramic electronic component
JPH07297556A (en) Manufacture of multilayer ceramic electronic part
JP2002110451A (en) Laminated electronic part and its manufacturing method
JPH0786081A (en) Manufacture of multilayered ceramic capacitor
JPH09162452A (en) Ceramic device and its production
JPH08203768A (en) Electronic component and its manufacture
JPH06140278A (en) Laminated ceramic capacitor

Legal Events

Date Code Title Description
TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20030812

R150 Certificate of patent or registration of utility model

Ref document number: 3470651

Country of ref document: JP

Free format text: JAPANESE INTERMEDIATE CODE: R150

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20080912

Year of fee payment: 5

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20080912

Year of fee payment: 5

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20090912

Year of fee payment: 6

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20090912

Year of fee payment: 6

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20100912

Year of fee payment: 7

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20100912

Year of fee payment: 7

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20110912

Year of fee payment: 8

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20120912

Year of fee payment: 9

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20120912

Year of fee payment: 9

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20130912

Year of fee payment: 10

EXPY Cancellation because of completion of term