JP3469614B2 - Manufacturing method of PS plate for lithographic printing - Google Patents

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for producing a printing plate, and more particularly to a method for producing a PS plate for lithographic printing.

[0002]

2. Description of the Related Art Lithographic printing is a printing method which uses a plate having a drawing line and a non-printing line on the same plane in appearance, and utilizes the fact that water and oil repel each other. , Generally, the non-image area is chemically constituted by hydrophilic group to make it hydrophilic, and the image area is constituted by a hydrophobic film by photoengraving technique, or lipophilic by drawing directly with oil-based ink. I am trying.
As the plate material, a metal multi-layer plate of zinc, aluminum, steel-copper-chromium or the like is used.

In printing, first, dampening water is supplied to the plate surface to form a liquid film of water on the hydrophilic surface corresponding to the non-image area,
Next, when an oily flat ink is applied by a roll, the ink does not adhere to the non-image area but adheres only to the lipophilic image area. This is transferred to paper or the like to complete printing.

The most widely used flat plate is PS
It is called a plate (Presensitized Plate), and an image area pattern was formed by a diazo compound or a photosensitive resin on the surface of an aluminum plate which was polished and hydrophilized by anodic oxidation. The conventional PS plate manufacturing method has been performed by causing the photosensitive polymer to change its polarity by ionizing radiation and developing it with a specific developing solution to form a lipophilic image area pattern.

[0005]

According to the conventional method for manufacturing a PS plate, since the adhesive force of the photosensitive resin, which is the lipophilic image area, to the hydrophilic surface is relatively weak due to the difference in polarity,
When the PS plate obtained by this method was used for lithographic printing, the physical durability of the image area pattern was not always sufficiently satisfactory.

[0006]

SUMMARY OF THE INVENTION The present invention has been made in view of the above-mentioned prior art, and enhances the bonding force between the substrate and the image area pattern to improve the durability during printing. It is an object of the present invention to provide a method for producing a PS plate for lithographic printing.

That is, according to the method for producing a PS plate for lithographic printing of the present invention, a desired pattern is formed on the surface of a substrate having a hydrophilic oxide layer on at least the surface portion by a pattern forming material, and then the substrate surface is formed. By contacting the lipophilic silane coupling agent and removing the patterning material formed in a pattern on the surface of the substrate, the coupling molecule binding portion obtained by the chemical modification of the silane coupling agent is desired on the substrate. It is characterized by being formed in a pattern.

Further, according to the present invention, a desired pattern is formed on a surface of a substrate having a hydrophilic oxide layer on at least a surface portion thereof by using a pattern forming material, and then the lipophilic or hydrophilic first layer is formed on the surface of the substrate. A first coupling molecular bond obtained by chemical modification of the first silane coupling agent on the substrate by contacting the silane coupling agent and removing the pattern forming material formed in a pattern on the substrate surface. The portion is formed into a desired pattern, and the second silane coupling agent has a polarity different from that of the first silane coupling agent.
The second coupling molecule binding portion is formed in a pattern on the same substrate by bringing the silane coupling agent of 1) into contact with the oxide layer on the substrate and chemically modifying it.

Further, the present invention generally comprises, on a substrate having a chemically modified site on the surface thereof, chemically bonding a chemically modified molecule capable of reacting with the chemically modified site to form a bond, in a pattern, The present invention includes a method for producing a PS plate for lithographic printing, which comprises forming a chemically modified molecule-bonding portion on a substrate in a desired pattern, and further, chemistry of a substrate surface by two kinds of chemically modified molecules having different polarities It includes a method of forming two kinds of chemically modified molecule binding moieties in a desired pattern on the same substrate surface by sequentially performing modification for each kind.

In the above method, the pattern formation of one or two chemically modified molecules can be performed by using a lithography method in which patterning using a pattern forming material such as resist and lift-off are combined.

[0011]

DETAILED DESCRIPTION OF THE INVENTION The present invention will be described in detail below with reference to the accompanying drawings. FIG. 1 is a process cross-sectional view illustrating a method of manufacturing a PS plate for lithographic printing according to the present invention. First, a metal pattern or a resist pattern is formed by a pattern forming material 3 on a substrate 1 having an oxide layer 2 which is made of a metal oxide or the like and constitutes a hydrophilic surface on the uppermost surface, according to a usual lithography process ( Figure 1
(a)). Next, the patterned substrate is immersed in a silane coupling agent solution, and heated and dried at 40 to 100 ° C.
Then, the excess silane coupling agent is washed away with a solvent and dried (Fig. 1 (b)). Next, when the pattern forming material 3 is a metal, a metal etchant is used, or when the pattern forming material 3 is a resist, a resist stripping solution is used to remove the metal or the resist pattern (lift off), thereby removing the oxide layer 2 from the oxide layer 2. The binding part (lipophilicity) of the newly formed coupling molecule 4 on the surface (hydrophilic) forms a pattern, and a PS plate is prepared (FIG. 1).
(c)).

Further, from this PS plate, another coupling molecule 5 is bonded to the exposed oxide layer 2 by using a silane coupling agent having a polarity (for example, high polarity) different from that used previously. Thus, it is possible to obtain a PS plate in which two types of coupling molecules having different polarities are bound to each other on substantially the same plane (FIG. 1 (d)).

The above-mentioned chemical modifier that binds to the oxide layer 2 is not limited to a silane coupling agent, and a chemical that can react with a chemical modification site to form a bond on a substrate having a chemical modification site on the surface. What can form a surface having different surface energies by binding a modifying molecule can be appropriately used.

A silane coupling agent can be used as a preferred specific example of the above chemically modified molecule.
In the molecule, Si-OH, Si-OMe, Si-OEt,
It means that it has an active site capable of coupling with a modified site such as a Si-OCl group.

For example, such a silane coupling agent modifies the surface of the oxide layer 2 of the substrate as shown in FIG. 2 and forms a molecular film corresponding to the molecule of the silane coupling agent to be bonded. Therefore, it is possible to form a molecular film pattern having a desired function by introducing a desired functional site into such a chemically modified molecule. For example, if a polymer is used, the bond with the substrate becomes stronger.

As the oxide layer 2 used in the present invention,
Glass, silicon oxide such as quartz, a coating type silicon oxide film (spin on glass: SOG), metal oxide such as ITO, tin oxide, titanium oxide, and chromium oxide may be used.
The substrate itself may constitute these oxide layers, or those having these oxide layers formed on the surface of the substrate may be used. Moreover, you may use what formed these oxide layers on the substrate surface. Alternatively, the surface of the metal may be oxidized. When the silane coupling is performed only once, the substrate is preferably as hydrophilic as possible.

Examples of lift-off resists include resists containing metals such as chromium, aluminum and gold and metal oxides or novolac cresol and polyvinylphenol, and polymer resists such as PMMA, PMIPK and PBS.

[0018]

EXAMPLES Example 1 Chromium was deposited on a quartz substrate by a 30 nm sputtering method, a photoresist was applied, and high-pressure mercury light was irradiated through a mask, and a chromium pattern was formed through a development and etching process. Next, the substrate was immersed in an octadecyltrimethoxysilane solution (solvent: toluene) as a silane coupling agent for 5 minutes at room temperature. Next, this substrate is heated to a temperature of 7
It was dried by heating at 0 ° C. for 15 minutes. Next, the chrome pattern was peeled off from the substrate with a chrome etchant to prepare a PS plate composed of the coupling portion (water repellent surface) of the coupling agent and the quartz surface (hydrophilic surface). When the difference in the frictional force on this surface was measured with a frictional force microscope (FFM), it was confirmed that a coupling molecular film having a desired pattern was formed. A pattern was reproduced by placing a hydrophilic ink on the obtained PS plate and transferring it to paper. The conventional PS plate is abraded by scanning with an atomic force microscope (AFM) at 10 ⁻⁸ N, whereas the P obtained by this example is removed.
The S plate was not scraped even if scanned at 10 ^-7 N,
It had sufficient durability.

Example 2 Chromium was deposited on a quartz substrate by a 30 nm sputtering method, a photoresist was applied to the quartz substrate, light of high pressure mercury was irradiated through a mask, and a chromium pattern was formed through development and etching steps. Next, the substrate was immersed in an octadecyltrimethoxysilane solution (solvent: toluene) as a first silane coupling agent for 5 minutes at room temperature. Next, this substrate was heated and dried at a temperature of 70 ° C. for 15 minutes. Next, the chromium pattern is peeled off from the substrate with a chromium etchant, and then C8 F17 C2 H5 Si is used as a second silane coupling agent.
The substrate was immersed in a (OEt) 3 solution (solvent: 1,3-bistrifluoromethylbenzene) for 5 minutes at room temperature. Next, this substrate was heated and dried at a temperature of 70 ° C. for 15 minutes. As a result, a PS plate having an oil-repellent surface and a lipophilic surface was completed. When the difference in the frictional force on this surface was measured with a frictional force microscope (FFM), it was confirmed that a coupling molecular film having a desired pattern was formed. A pattern was reproduced by placing a lipophilic ink on the obtained PS plate and transferring it on paper. The conventional PS plate is abraded by scanning with an atomic force microscope (AFM) at 10 ⁻⁸ N, whereas the PS plate obtained in this example is abraded even by scanning at 10 ⁻⁷ N. There was nothing, and it had sufficient durability.

[Brief description of drawings]

FIG. 1 is a process sectional view illustrating a method of manufacturing a PS plate for lithographic printing according to the present invention.

FIG. 2 is a diagram for explaining how a substrate surface is chemically modified.

[Explanation of symbols]

1 substrate 2 Oxide layer 3 pattern forming materials 4 First silane coupling molecule 5 Second silane coupling molecule

─────────────────────────────────────────────────── ─── Continuation of front page (56) Reference JP-A-63-257760 (JP, A) JP-A-62-25081 (JP, A) JP-A-47-32905 (JP, A) JP-A-4- 263994 (JP, A) JP-A-4-161957 (JP, A) JP-A-3-27043 (JP, A) JP-A-2-242255 (JP, A) (58) Fields investigated (Int. Cl. ⁷ , DB name) B41C 1/10

Claims (8)

(57) [Claims] 1. A desired pattern is formed on a surface of a substrate having a hydrophilic oxide layer on at least a surface portion by a pattern forming material, and then a lipophilic silane coupling agent is brought into contact with the surface of the substrate and heated. The pattern of the substrate surface by
The silane coupling agent is applied to the area where the silane-forming material does not exist.
It was allowed to bind to chemically modified, then removing the <br/> pattern forming material formed in a pattern on the substrate surface, obtained by chemical modification of the silane coupling agent on the substrate parent Oily putter
A method for producing a PS plate for lithographic printing , which comprises forming a PS plate. 2. A desired pattern is formed on a surface of a substrate having a hydrophilic oxide layer on at least a surface portion by a pattern forming material, and then a lipophilic or hydrophilic first silane coupling is formed on the surface of the substrate. The substrate by contacting the agent
In the portion of the surface where the pattern forming material does not exist, the first
By bonding a silane coupling agent chemically modifying, followed by removing the <br/> pattern forming material formed in a pattern on the substrate surface, the first silane coupling agent on the substrate first coupling molecule binding portion is formed in a desired pattern, further, the oxide on the substrate different polarities second silane coupling agent is a first silane coupling agent obtained by chemical modification by chemically modified in contact with the layer, said on the same substrate
Part where no pattern is formed by the first coupling agent
A method for producing a PS plate for lithographic printing, which comprises forming a second coupling molecule binding portion in a pattern on the substrate. 3. A combination of the first and second silane coupling agents is a hydrocarbon-based polymer and a fluorocarbon-based polymer,
Method according to claim 2, characterized in that it is vice versa. 4. The oxide layer comprises an oxide selected from the group consisting of glass, silicon oxide such as quartz, and metal oxides such as ITO, tin oxide, titanium oxide, and chromium oxide. Alternatively, the method according to any one of 2 above. 5. The method according to claim 1, wherein the oxide layer is formed by oxidizing the surface of a metal. 6. The polymer layer having a hydroxyl group, a methoxy group or an ethoxy group, such as spin-on-glass, is further formed on the uppermost surface layer on the substrate.
The method described in the section. 7. A chemically modified molecule on a substrate having a chemically modified site on the surface thereof, by chemically bonding a chemically modified molecule capable of reacting with the chemically modified site to form a bond in a pattern. the molecular binding moiety on the occasion in order to form a desired pattern, the two chemical modifications molecules of different polarities
The chemical modification of the substrate surface by
The two chemically modified molecule-binding moieties on the same substrate surface.
Characterized by being formed into a desired pattern ,
Manufacturing method of PS plate for lithographic printing. 8. The method according to claim 7 , wherein the chemically modified molecule is patterned by using lithography.