JP3436655B2 - Substrate cleaning method - Google Patents
Substrate cleaning methodInfo
- Publication number
- JP3436655B2 JP3436655B2 JP12536697A JP12536697A JP3436655B2 JP 3436655 B2 JP3436655 B2 JP 3436655B2 JP 12536697 A JP12536697 A JP 12536697A JP 12536697 A JP12536697 A JP 12536697A JP 3436655 B2 JP3436655 B2 JP 3436655B2
- Authority
- JP
- Japan
- Prior art keywords
- rod
- substrate
- shaped member
- liquid
- cleaning
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 239000000758 substrate Substances 0.000 title claims description 99
- 238000000034 method Methods 0.000 title claims description 39
- 238000004140 cleaning Methods 0.000 title claims description 35
- 239000007788 liquid Substances 0.000 claims description 45
- 239000011248 coating agent Substances 0.000 claims description 25
- 238000000576 coating method Methods 0.000 claims description 25
- 238000005507 spraying Methods 0.000 claims description 4
- 239000000463 material Substances 0.000 description 22
- 239000004973 liquid crystal related substance Substances 0.000 description 20
- 239000004033 plastic Substances 0.000 description 15
- 229920003023 plastic Polymers 0.000 description 15
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 12
- 239000000126 substance Substances 0.000 description 11
- 230000007547 defect Effects 0.000 description 10
- 229910021642 ultra pure water Inorganic materials 0.000 description 8
- 239000012498 ultrapure water Substances 0.000 description 8
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 6
- 230000002950 deficient Effects 0.000 description 5
- 230000002093 peripheral effect Effects 0.000 description 4
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 4
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 3
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 3
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- 239000004695 Polyether sulfone Substances 0.000 description 3
- 239000004721 Polyphenylene oxide Substances 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 229920000570 polyether Polymers 0.000 description 3
- 229920006393 polyether sulfone Polymers 0.000 description 3
- 229920001342 Bakelite® Polymers 0.000 description 2
- 229920012266 Poly(ether sulfone) PES Polymers 0.000 description 2
- 239000000853 adhesive Substances 0.000 description 2
- 230000001070 adhesive effect Effects 0.000 description 2
- 239000004637 bakelite Substances 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- 238000001035 drying Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 229910003437 indium oxide Inorganic materials 0.000 description 2
- PJXISJQVUVHSOJ-UHFFFAOYSA-N indium(iii) oxide Chemical compound [O-2].[O-2].[O-2].[In+3].[In+3] PJXISJQVUVHSOJ-UHFFFAOYSA-N 0.000 description 2
- 239000007769 metal material Substances 0.000 description 2
- 239000003960 organic solvent Substances 0.000 description 2
- -1 polyethylene Polymers 0.000 description 2
- 239000004925 Acrylic resin Substances 0.000 description 1
- 229920000178 Acrylic resin Polymers 0.000 description 1
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 1
- 239000004677 Nylon Substances 0.000 description 1
- CYTYCFOTNPOANT-UHFFFAOYSA-N Perchloroethylene Chemical compound ClC(Cl)=C(Cl)Cl CYTYCFOTNPOANT-UHFFFAOYSA-N 0.000 description 1
- 239000004952 Polyamide Substances 0.000 description 1
- 239000004698 Polyethylene Substances 0.000 description 1
- 239000004743 Polypropylene Substances 0.000 description 1
- 239000004809 Teflon Substances 0.000 description 1
- 229920006362 Teflon® Polymers 0.000 description 1
- 239000002390 adhesive tape Substances 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 230000004888 barrier function Effects 0.000 description 1
- 238000005452 bending Methods 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000007664 blowing Methods 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 229910001873 dinitrogen Inorganic materials 0.000 description 1
- 239000000428 dust Substances 0.000 description 1
- 229920001971 elastomer Polymers 0.000 description 1
- 239000005262 ferroelectric liquid crystals (FLCs) Substances 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 230000009477 glass transition Effects 0.000 description 1
- 238000007602 hot air drying Methods 0.000 description 1
- 229920001778 nylon Polymers 0.000 description 1
- 238000000059 patterning Methods 0.000 description 1
- 238000000206 photolithography Methods 0.000 description 1
- 229920002647 polyamide Polymers 0.000 description 1
- 229920001230 polyarylate Polymers 0.000 description 1
- 229920006289 polycarbonate film Polymers 0.000 description 1
- 229920006267 polyester film Polymers 0.000 description 1
- 229920000573 polyethylene Polymers 0.000 description 1
- 229920001155 polypropylene Polymers 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 238000007790 scraping Methods 0.000 description 1
- 238000006748 scratching Methods 0.000 description 1
- 230000002393 scratching effect Effects 0.000 description 1
- 238000009751 slip forming Methods 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 239000000725 suspension Substances 0.000 description 1
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 description 1
- 229910001887 tin oxide Inorganic materials 0.000 description 1
- 238000004506 ultrasonic cleaning Methods 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
- 238000004804 winding Methods 0.000 description 1
Landscapes
- Liquid Crystal (AREA)
- Cleaning In General (AREA)
- Cleaning By Liquid Or Steam (AREA)
Description
【0001】[0001]
【発明の属する技術分野】本発明は、各種基板の洗浄方
法に関するものであり、とりわけ電子機器用のプラスチ
ック基板、特に、液晶表示素子用のプラスチック基板の
洗浄に好適な基板の洗浄方法に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for cleaning various substrates, and more particularly to a method for cleaning a plastic substrate for electronic equipment, particularly a substrate suitable for cleaning a plastic substrate for a liquid crystal display device.
【0002】[0002]
【従来の技術】液晶表示素子用の電極付き基板には、フ
ォトリソグラフィー技術による電極パターンニング工程
で生じるレジスト残渣や製造環境からの塵埃が基板の電
極表面に付着している。これらは、液晶表示素子製造時
に、基板間の間隔の均一化の妨げとなり、表示欠陥を生
じる原因となる。例えば、これらの異物は、数μm〜数
十μmの高さを持ち、TN(Twisted Nema
tic)セルやSTN(Super Twisted
Nematic)セルでは異物の高さが基板間隔を超え
てしまうため、表示欠陥を生じ、大きな問題となる。2. Description of the Related Art In a substrate with electrodes for a liquid crystal display device, a resist residue generated in an electrode patterning process by a photolithography technique and dust from a manufacturing environment adhere to the electrode surface of the substrate. These impede the uniformization of the distance between the substrates at the time of manufacturing the liquid crystal display element and cause display defects. For example, these foreign substances have a height of several μm to several tens of μm, and have a TN (Twisted Nema).
tic) cells and STN (Super Twisted)
In the Nematic) cell, the height of the foreign matter exceeds the distance between the substrates, which causes a display defect, which is a serious problem.
【0003】更に、強誘電性液晶を用いた液晶表示素子
では、基板間隔を2μm前後とする必要があり、これら
異物を完全に除去しないかぎり、表示欠陥のない液晶表
示素子を製造することは非常に困難なものとなってい
る。Further, in a liquid crystal display device using a ferroelectric liquid crystal, it is necessary to set a substrate interval to about 2 μm, and it is very difficult to manufacture a liquid crystal display device having no display defect unless these foreign substances are completely removed. Has become difficult.
【0004】そこで、これら異物を除去する方法とし
て、各種の洗浄法が提案されている。その中で、異物の
除去効率(洗浄効率)が高い方式として、ブラシ洗浄が
注目されている。ブラシ洗浄とは、基板表面に回転ブラ
シを押圧させて、摩擦により異物を除去する方式である
(特開平5−297336号公報)。Therefore, various cleaning methods have been proposed as methods for removing these foreign substances. Among them, brush cleaning is drawing attention as a method with high foreign matter removal efficiency (cleaning efficiency). Brush cleaning is a method in which a rotating brush is pressed against the substrate surface to remove foreign matter by friction (Japanese Patent Laid-Open No. 5-297336).
【0005】しかしながら、ブラシ洗浄はガラス基板に
は効果が大きいものの、プラスチック基板においては通
常、一般に用いられているITO等の透明電極と基板と
の間の密着性がガラス基板と比較し弱く、また、電極自
体の硬度も小さいため、ブラシ等の摩擦により電極が着
傷し、断線が生じてしまう。However, although the brush cleaning has a great effect on the glass substrate, the adhesion between the transparent electrode, which is generally used, such as ITO, and the substrate is generally weaker in the plastic substrate than that of the glass substrate. Since the hardness of the electrode itself is small, the electrode is damaged by the friction of the brush or the like and the wire is broken.
【0006】[0006]
【発明が解決しようとする課題】本発明は、上記問題点
に鑑みてなされたもので、液晶表示素子等に用いられる
少なくとも一面に電極を有するプラスチック基板の表面
に付着した異物を、電極の着傷や断線を生じさせずに均
一かつ効率よく除去する洗浄方法を提供することを目的
とする。SUMMARY OF THE INVENTION The present invention has been made in view of the above-mentioned problems, and the foreign matter attached to the surface of a plastic substrate having an electrode on at least one surface used for a liquid crystal display device or the like is attached to the electrode. An object of the present invention is to provide a cleaning method that removes uniformly and efficiently without causing scratches or disconnection.
【0007】[0007]
【課題を解決するための手段】上記目的を達成するため
に、本発明者が検討した結果、表面に回転方向に対し平
行とならない壁面を持つ凹凸を有する棒状部材を、部分
的に液体に浸し、この棒状部材の液体の表面上に露出し
た部分の表面にこの液体の皮膜が形成されるように棒状
部材を回転させ、この皮膜を保護膜とすることで基板電
極への着傷を防止し、更に、この被膜に基板表面を接触
させながら基板を搬送することにより、凹凸の壁面が高
さのある異物にのみ接触し、掻き落とすかたちで異物除
去が可能であることを見出した。本発明者は、この知見
に基づき、本発明を完成するに至った。In order to achieve the above object, as a result of a study by the present inventor, as a result, a rod-shaped member having a surface having a wall surface that is not parallel to the rotation direction is partially immersed in a liquid. , The rod-shaped member is rotated so that a film of this liquid is formed on the surface of the exposed portion of the liquid of the rod-shaped member, and the film is used as a protective film to prevent damage to the substrate electrode. Furthermore, it was found that by transporting the substrate while bringing the substrate surface into contact with this coating, the uneven wall surface only contacts the foreign substances having a height, and the foreign substances can be removed by scraping. The present inventor has completed the present invention based on this finding.
【0008】即ち、本発明は、基板の表面に付着した異
物を除去する基板の洗浄方法であって、その長さ方向に
垂直な断面の中心を通って長さ方向に延びる中心軸を有
する棒状部材であって、該棒状部材を該中心軸を軸とし
て回転させたときにその回転方向に対して平行とならな
い壁面を有する凸部を表面にする棒状部材を用い、該棒
状部材の表面に液体被膜を形成し、該基板の表面が該液
体被膜には接触するが該棒状部材には接触しないように
して該棒状部材を該中心軸を中心として回転させるとと
もに、該基板と該棒状部材の相対位置を移動させて異物
を除去することを特徴とする基板の洗浄方法を提供する
ものである。That is, the present invention is a method for cleaning a substrate for removing foreign matter adhering to the surface of the substrate, which has a rod shape having a central axis extending in the length direction through the center of a cross section perpendicular to the length direction. A member having a convex portion having a wall surface that is not parallel to the rotation direction of the rod-shaped member when the rod-shaped member is rotated about the central axis, and a liquid is used on the surface of the rod-shaped member. Forming a coating, rotating the rod about the central axis so that the surface of the substrate comes into contact with the liquid coating but not the rod, and the relative position between the substrate and the rod. A method for cleaning a substrate, which is characterized in that a foreign matter is removed by moving a position.
【0009】[0009]
【発明の実施の形態】本発明における洗浄対象である基
板の材質に関しては、特に制限はない。とりわけ有用と
考えられる液晶表示素子用プラスチック基板においても
特に限定はなく、例えば一軸ポリエステルフィルム、ポ
リエチレンフィルム、ポリプロピレンフィルム、ポリカ
ーボネートフィルム、ポリエーテルスルホンフィルム、
ポリアリレートフィルム等が挙げられる。また、ガスバ
リアー層やアンダーコート層などの有機物質が積層され
ているものも適用可能である。BEST MODE FOR CARRYING OUT THE INVENTION There is no particular limitation on the material of the substrate to be cleaned in the present invention. There is also no particular limitation on the plastic substrate for liquid crystal display element considered to be particularly useful, for example, uniaxial polyester film, polyethylene film, polypropylene film, polycarbonate film, polyether sulfone film,
Examples thereof include polyarylate film. Further, a material in which an organic substance such as a gas barrier layer or an undercoat layer is laminated is also applicable.
【0010】液晶表示素子用等の電極付き基板を洗浄す
る場合、基板上の液晶駆動用の電極の材質としても、導
電性を有する材料であれば特に制限はなく、公知の蒸着
法やスパッタリング法などによって形成される酸化イン
ジウム電極、酸化インジウムと酸化錫とからなるITO
電極などが挙げられる。また、更にITOなど透明導電
性の材料の層の上にSiOxやポリアミド等の絶縁膜層
がコーティング又は積層されているものにも適用可能で
ある。In the case of cleaning a substrate with electrodes for a liquid crystal display element or the like, the material of the electrodes for driving the liquid crystal on the substrate is not particularly limited as long as it is a material having conductivity, and a known vapor deposition method or sputtering method is used. Indium oxide electrode formed by, for example, ITO composed of indium oxide and tin oxide
Examples include electrodes. Further, it is also applicable to a layer in which an insulating film layer such as SiO x or polyamide is coated or laminated on a layer of a transparent conductive material such as ITO.
【0011】棒状部材の形状としては、液体に部分的に
浸漬して回転させることにより、棒状部材表面に回転方
向に対して垂直方向に均一な厚みを有する液体被膜を形
成できる形状が好ましく、通常、ロール形状の外周表面
に複数の凸部を形成したものが好適に用いられる。ロー
ル形状の直径は特に制限されないが、通常、20〜20
0mmが好ましく、50〜150mmがより好ましい。
棒状部材の材質は特に限定されないが、表面への凸部形
成の容易さ、耐久性等を考慮すると、金属材、例えばス
テンレス材が好適である。The shape of the rod-shaped member is preferably such that it can be partially immersed in a liquid and rotated to form a liquid film having a uniform thickness on the surface of the rod-shaped member in a direction perpendicular to the rotation direction. A roll-shaped outer peripheral surface having a plurality of protrusions is preferably used. The diameter of the roll shape is not particularly limited, but is usually 20 to 20.
0 mm is preferable, and 50 to 150 mm is more preferable.
The material of the rod-shaped member is not particularly limited, but a metal material, for example, a stainless material is preferable in consideration of the ease of forming the convex portion on the surface, the durability, and the like.
【0012】また、凸部の形状は、棒状部材の回転方向
に対して平行とならない壁面を有する形状であれば特に
制限はない。被膜の厚みを均一にして基板への着傷を防
止するためには、凸部のロール形状の外周面からの高さ
を均一にし、各凸部の上面をロール形状の外周面と平行
に湾曲させて形成することが好ましい。凸部は格子状等
に連続して形成されていてもよいし、あるいは、複数の
島状や帯状に形成されていてもよい。帯状の凸部の場
合、棒状部材の長さ方向と平行に延びていてもよいし、
棒状部材の長さ方向と垂直にならない限り、ねじれ角を
持ってらせん状に延びていてもよく、屈曲又は湾曲して
いてもよい。The shape of the convex portion is not particularly limited as long as it has a wall surface that is not parallel to the rotation direction of the rod-shaped member. In order to make the film thickness uniform and prevent damage to the substrate, make the height of the convex parts from the outer peripheral surface of the roll shape uniform, and curve the upper surface of each convex part parallel to the outer peripheral surface of the roll shape. It is preferable to form it. The convex portions may be continuously formed in a lattice shape or the like, or may be formed in a plurality of island shapes or band shapes. In the case of a strip-shaped convex portion, it may extend parallel to the length direction of the rod-shaped member,
As long as it is not perpendicular to the longitudinal direction of the rod-shaped member, it may extend spirally with a helix angle, and may be bent or curved.
【0013】各凸部の棒状部材の回転方向に対して平行
とならない壁面のうちで、少なくとも棒状部材の回転方
向に面する壁面は、ほぼ90°、好ましくは45〜90
°のすくい角を有することが好ましい。棒状部材を回転
させると、この壁面がすくい面となり、基板表面に付着
した異物を掻き取る。Among the wall surfaces of each convex portion which are not parallel to the rotation direction of the rod-shaped member, at least the wall surface facing the rotation direction of the rod-shaped member is approximately 90 °, preferably 45 to 90.
It is preferable to have a rake angle of °. When the rod-shaped member is rotated, this wall surface serves as a rake face and scrapes off the foreign matter adhering to the substrate surface.
【0014】凸部間の溝幅、すなわち、隣り合った凸部
の間隔は、対象とする異物の大きさ以上が必要であり、
また上限値は基板の搬送速度と棒状部材の周速度との関
係により異なるため、一該には規定できないが、通常、
最小幅を100μm以上とすることが好ましく、100
μm〜10mmとすることがより好ましい。格子状の凸
部の場合、凸部間の溝幅とは、1格子の相対する凸部間
の溝幅をいう。The groove width between the convex portions, that is, the interval between the adjacent convex portions must be equal to or larger than the size of the target foreign matter,
Further, the upper limit differs depending on the relationship between the transport speed of the substrate and the peripheral speed of the rod-shaped member, and therefore cannot be specified as a whole, but normally,
The minimum width is preferably 100 μm or more, and 100
More preferably, it is set to μm to 10 mm. In the case of a lattice-shaped convex portion, the groove width between the convex portions means the groove width between the convex portions that face each other in one lattice.
【0015】凸部の高さは、高すぎると液体被膜の粘度
の違い及び棒状部材の回転数によって液体中に気泡を生
じ、均一な被膜形成を困難にするため、100μm〜1
mmとすることが好ましく、100μm〜500μmと
することがより好ましい。If the height of the convex portion is too high, bubbles are generated in the liquid due to the difference in viscosity of the liquid coating film and the rotation speed of the rod-shaped member, which makes it difficult to form a uniform coating film.
The thickness is preferably mm, and more preferably 100 μm to 500 μm.
【0016】棒状部材の表面の凸部は、例えば、棒状部
材材料、例えばロール状材料への彫刻、溝切り加工や、
凸部を形成する材料、例えば板状積層物の貼りつけなど
により形成することができる。The convex portion on the surface of the rod-shaped member is, for example, engraved on a rod-shaped member material such as a roll-shaped material, grooved
It can be formed by sticking a material forming the convex portion, for example, a plate-shaped laminate.
【0017】溝付き棒状部材としては、市販のグラビア
ロールを流用することが簡易で好適である。As the grooved rod-shaped member, it is simple and suitable to use a commercially available gravure roll.
【0018】凸部を形成する材料を貼りつける場合、そ
の材料の材質としては、例えば、ポリエーテル、アクリ
ル樹脂、テフロン樹脂等のプラスチック材料、ゴム材
料、アルミニウム、SUS等の金属材料、セラミックス
等が好適である。When the material for forming the convex portion is attached, examples of the material of the material include plastic materials such as polyether, acrylic resin, and Teflon resin, rubber materials, metal materials such as aluminum and SUS, and ceramics. It is suitable.
【0019】板状の積層物の貼りつけによる凸部の形成
は、例えば、プラスチック基板を短冊に切り、これを間
隔をおきながら棒状部材表面に接着剤などを用いて回転
方向に対し平行とならない壁面を持たせるように固定す
ることによって行うことができる。接着剤の代わりに両
面接着テープを用いることもできる。The formation of the convex portion by sticking the plate-shaped laminated body is not parallel to the rotation direction, for example, by cutting a plastic substrate into strips and using an adhesive or the like on the surface of the rod-shaped member while keeping an interval therebetween. It can be done by fixing it so that it has a wall surface. A double-sided adhesive tape may be used instead of the adhesive.
【0020】棒状部材の表面への液体の被膜の形成に用
いられる液体としては、超純水、有機溶媒等の一般的な
洗浄用液体であれば特に制限なく使用することができ、
その粘度範囲は0.2〜100cPs程度が好適であ
り、好ましくは0.3〜10cPs、更に好ましくは
0.3〜5cPsである。本発明の方法に好適な有機溶
剤の具体例としては、メタノール、エタノール、イソプ
ロピルアルコール、メチルエチルケトン、アセトン等が
挙げられる。The liquid used for forming the liquid film on the surface of the rod-shaped member may be any general cleaning liquid such as ultrapure water or organic solvent without particular limitation.
The viscosity range is preferably about 0.2 to 100 cPs, preferably 0.3 to 10 cPs, and more preferably 0.3 to 5 cPs. Specific examples of the organic solvent suitable for the method of the present invention include methanol, ethanol, isopropyl alcohol, methyl ethyl ketone, acetone and the like.
【0021】なお、基板への異物の再付着を防ぐため
に、異物により懸濁が生じる前に定期的、又は連続的に
交換することが好ましい。In order to prevent the foreign matter from reattaching to the substrate, it is preferable to replace the foreign matter regularly or continuously before the suspension occurs.
【0022】棒状部材の表面の液体被膜は、例えば、洗
浄槽中の液体に棒状部材を水平にして部分的に浸しなが
ら、棒状部材を回転させることにより形成することがで
きる。また、棒状部材全体を液体中に浸し、棒状部材の
凸部と基材との間に液体を介在させて棒状部材を回転さ
せてもよい。また、棒状部材にシャワーリンス等により
液体を噴射又は噴霧により供給しながら棒状部材を回転
することにより形成することもできる。The liquid coating on the surface of the rod-shaped member can be formed, for example, by rotating the rod-shaped member while partially immersing the rod-shaped member in the liquid in the cleaning tank while making the rod-shaped member horizontal. Alternatively, the entire rod-shaped member may be immersed in the liquid, and the liquid may be interposed between the convex portion of the rod-shaped member and the base material to rotate the rod-shaped member. It can also be formed by rotating the rod-shaped member while supplying the liquid to the rod-shaped member by spraying or spraying it with a shower rinse or the like.
【0023】棒状部材の好適な回転速度は、基板の搬送
速度や液体の粘度等により最適値が異なるため、一概に
は規定できないが、通常、10rpm以上とすることが
好ましく、10rpm〜500rpmとすることがより
好ましい。The optimum rotation speed of the rod-shaped member cannot be unconditionally specified because the optimum value varies depending on the transfer speed of the substrate, the viscosity of the liquid, etc., but it is preferably 10 rpm or more, and preferably 10 rpm to 500 rpm. Is more preferable.
【0024】基板と棒状部材との相対位置を移動させる
方法としては、棒状部材の位置を固定して、基板を移動
させる方法、基板の位置を固定して棒状部材を移動させ
る方法、棒状部材と基板との両方を移動させる方法があ
り、いずれでもよい。その際、棒状部材と基板の相対移
動速度は、異物の付着程度や棒状部材の回転速度等によ
って異なり、一概に規定はできないが、通常0.1〜1
00m/分とすることが好ましく、0.3〜10m/分
とすることがより好ましい。As a method of moving the relative position between the substrate and the rod-shaped member, a method of fixing the position of the rod-shaped member and moving the substrate, a method of fixing the position of the substrate and moving the rod-shaped member, and a rod-shaped member There is a method of moving both the substrate and the substrate, and either method may be used. At this time, the relative moving speed of the rod-shaped member and the substrate varies depending on the degree of adhesion of foreign matter, the rotation speed of the rod-shaped member, etc., and cannot be specified unconditionally, but usually 0.1 to 1
It is preferably 00 m / min, and more preferably 0.3 to 10 m / min.
【0025】なお、棒状部材の回転方向は、通常、基板
の搬送方向と逆方向、又は、棒状部材の移動方向と同方
向とすることが好ましい。It is preferable that the rotating direction of the rod-shaped member is usually opposite to the substrate conveying direction or the same as the moving direction of the rod-shaped member.
【0026】基板の搬送方法としては、部状部材表面の
液体被膜に基板を均一な張力で接触させ搬送することが
可能な方法でれば特に制限はない。例えば、可撓性のあ
る長尺基板、例えば、プラスチック基板の場合、キスコ
ーターやグラビアコーターなどの塗工装置の搬送手段で
あって、基板の巻き出し部及び巻き取り部を有する搬送
手段を用いることにより、効率的な洗浄を行うことが可
能である。The method of transporting the substrate is not particularly limited as long as it can transport the substrate by bringing the substrate into contact with the liquid coating on the surface of the partial member with uniform tension. For example, in the case of a flexible long substrate, for example, a plastic substrate, a transporting means of a coating device such as a kiss coater or a gravure coater, which has a substrate unwinding part and a winding up part is used. By this, it is possible to perform efficient cleaning.
【0027】図1は、本発明の方法の一実施態様を示す
断面説明図である。本実施態様では、可撓性の長尺のプ
ラスチック基板1が2本のロール5により矢印で示した
一定方向に方向づけられて搬送されている。一方、丸棒
状の棒状部材3が、洗浄槽6内の液体4中に水平にして
部分的に浸漬された状態で矢印の方向に回転している。
棒状部材3の液体4の表面より高い部分では、棒状部材
3の回転により、棒状部材3の表面に液体被膜41が形
成されている。棒状部材3は、その回転方向に対し平行
とならない壁面311を持つ複数の凸部31を有し、棒
状部材3の上部では、凸部31の上で基板1が液体被膜
41に接触して搬送されている。FIG. 1 is an explanatory sectional view showing an embodiment of the method of the present invention. In this embodiment, the flexible long plastic substrate 1 is conveyed by two rolls 5 being oriented in a fixed direction indicated by an arrow. On the other hand, the round bar-shaped bar-shaped member 3 is rotated in the direction of the arrow while being horizontally immersed in the liquid 4 in the cleaning tank 6 and partially immersed therein.
At a portion of the rod-shaped member 3 that is higher than the surface of the liquid 4, the liquid coating 41 is formed on the surface of the rod-shaped member 3 by the rotation of the rod-shaped member 3. The rod-shaped member 3 has a plurality of convex portions 31 each having a wall surface 311 that is not parallel to the rotation direction of the rod-shaped member 3. At the upper portion of the rod-shaped member 3, the substrate 1 comes into contact with the liquid coating film 41 on the convex portions 31 and is conveyed. Has been done.
【0028】図2に、図1におけるプラスチック基板1
と液体被膜41との接触部付近を拡大して示す。棒状部
材3の表面には、板状の積層物が間隔をおいて貼りつけ
られ、回転方向に対して平行とならない壁面311を有
する高さbの複数の凸部31を形成している。板状の積
層物が棒状部材3の長さ方向に平行に貼りつけられてい
る場合、cが凸部間の最小溝幅である。この実施態様に
おいて、棒状部材3の回転方向に対して平行とならない
壁面311のすくい角は約90°である。プラスチック
基板1が液体被膜41に接触しているときの被膜の厚み
をaとし、プラスチック基板1に付着している異物22
の高さをdとすると、a<dの高さを有する異物22
が、凸部31によって掻き落とされる。つまり、本発明
の方法においては、プラスチック基板表面を液体被膜が
保護しており、基板に着傷させることなく異物の除去洗
浄が可能である。FIG. 2 shows the plastic substrate 1 shown in FIG.
The vicinity of the contact area between the liquid coating 41 and the liquid coating 41 is shown enlarged. On the surface of the rod-shaped member 3, plate-shaped laminates are attached at intervals to form a plurality of convex portions 31 of height b having wall surfaces 311 that are not parallel to the rotation direction. When the plate-shaped laminate is attached in parallel with the length direction of the rod-shaped member 3, c is the minimum groove width between the convex portions. In this embodiment, the rake angle of the wall surface 311 that is not parallel to the rotation direction of the rod-shaped member 3 is about 90 °. The thickness of the coating film when the plastic substrate 1 is in contact with the liquid coating film 41 is a, and the foreign matter 22 attached to the plastic substrate 1 is 22.
The height of a is d, the foreign matter 22 having a height of a <d
Are scraped off by the convex portion 31. That is, in the method of the present invention, the surface of the plastic substrate is protected by the liquid film, and foreign substances can be removed and cleaned without damaging the substrate.
【0029】前述のとおり、液体被膜の厚みは、棒状部
材の回転数と液体の粘度を調整することで決められる。
一例として、棒状部材として、直径20mmのステンレ
ス丸棒の表面に、幅2.5mm、厚み100μmのポリ
エーテルフィルムの短冊12枚を、ステンレス丸棒の長
さ方向に平行に等間隔に貼りつけたものを用い、液体と
して粘度0.9cPsの超純水を用い、棒状部材を水平
にして垂直方向10mmまで超純水中に浸漬して回転さ
せた場合の、棒状部材の回転数と液体被膜の厚みとの関
係を調べた結果を表1に示す。As described above, the thickness of the liquid coating film is determined by adjusting the rotation speed of the rod-shaped member and the viscosity of the liquid.
As an example, as a rod-shaped member, 12 strips of a polyether film having a width of 2.5 mm and a thickness of 100 μm were attached to the surface of a stainless round bar having a diameter of 20 mm at equal intervals in parallel with the length direction of the stainless round bar. Of the liquid coating film, using ultrapure water having a viscosity of 0.9 cPs as the liquid and rotating the rod-shaped member by immersing the rod-shaped member horizontally in the ultrapure water up to 10 mm in the vertical direction. Table 1 shows the results of examining the relationship with the thickness.
【0030】[0030]
【表1】
洗浄を終えた後の基板の乾燥は、エアーナイフ等でクリ
ーンエアーや窒素ガスを基板に吹きつけ、液滴を吹き飛
ばした後、熱風乾燥装置等で加熱乾燥する方法が好適で
ある。なお、乾燥温度は基板材料のガラス転移温度以下
とすることが好ましい。[Table 1] After the cleaning, the substrate is preferably dried by blowing clean air or nitrogen gas onto the substrate with an air knife or the like to blow off the droplets and then heat-drying with a hot air dryer or the like. The drying temperature is preferably below the glass transition temperature of the substrate material.
【0031】[0031]
【実施例】以下、本発明を実施例によりより詳細に説明
するが、本発明はこれら実施例に限定されるものではな
い。EXAMPLES The present invention will now be described in more detail with reference to examples, but the present invention is not limited to these examples.
【0032】実施例1
直径20mmのステンレス丸棒の表面に、長さ360m
m、幅2.5mm、厚み100μmのポリエーテルフィ
ルムの短冊12枚を、等間隔に、ステンレス丸棒の回転
方向に対しフィルムの壁面が直交するように両面テープ
で固定して棒状部材を作製し、グラビアコーターに装着
した。Example 1 On the surface of a stainless steel round bar having a diameter of 20 mm, a length of 360 m
m, width 2.5 mm, thickness 100 μm 12 strips of polyether film were fixed at equal intervals with double-sided tape so that the wall surface of the film was orthogonal to the direction of rotation of the stainless round bar, to produce a rod-shaped member. , Attached to the gravure coater.
【0033】被洗浄物として、ITOパターン電極付き
のポリエーテルスルホン(PES)基板(PES:住友
ベークライト社製FST:幅360mm、厚さ100μ
m、長さ50m、ITO電極:幅1mm、厚み0.08
μm、ギャップ0.07mm、ピッチ1.07mmのス
トライプ状)の長尺フィルム基板を、このグラビアコー
ターにセットした。そして、図1に示すように、超純水
(粘度:0.9cPs)が100cc/分で供給される
オーバーフロー型の洗浄槽に上記棒状部材を水面下10
mmまで部分的に浸し、100rpmで回転させ、前記
のフィルム基板を100m/minの速度で棒状部材上
の超純水の被膜に接触するように搬送し、洗浄を行っ
た。被膜の厚みは1.7μmであった。更に、エアーナ
イフにより基板に付着した水分を除去した。As the object to be cleaned, a polyether sulfone (PES) substrate with an ITO pattern electrode (PES: Sumitomo Bakelite FST: width 360 mm, thickness 100 μ)
m, length 50 m, ITO electrode: width 1 mm, thickness 0.08
A long film substrate having a stripe shape (μm, gap 0.07 mm, pitch 1.07 mm) was set on this gravure coater. Then, as shown in FIG. 1, the rod-shaped member was placed under the water 10 in an overflow type cleaning tank to which ultrapure water (viscosity: 0.9 cPs) was supplied at 100 cc / min.
The film substrate was partially dipped to a depth of 10 mm and rotated at 100 rpm, and the film substrate was transported at a speed of 100 m / min so as to come into contact with the ultrapure water coating on the rod-shaped member and washed. The thickness of the coating was 1.7 μm. Further, the water attached to the substrate was removed by an air knife.
【0034】その後、液晶パネルを以下の方法で作製し
た。After that, a liquid crystal panel was manufactured by the following method.
【0035】下記に示す液晶材料をトルエンに溶解させ
(濃度25重量%)、洗浄したフィルム基板の電極面上
にマイクログラビアコーターを用い、塗布速度2m/m
inで塗布し、液晶材料の厚み3μmの膜を形成した。
そして同様に洗浄したITO付きフィルム基板を一対の
加圧ロールを用いてラミネートし、上下基板間に室温で
40Vの直流電圧を印加しながらパネル全体に一定方向
のたわみ変形を与えて配向処理を行った。このパネルを
直交偏光板間に配置し、駆動表示したところ、基板に付
着した異物に由来する表示欠陥は300mm×600m
mサイズで0個であった。また、電極の断線による表示
不良ラインも0本であった。A liquid crystal material shown below was dissolved in toluene (concentration: 25% by weight), and a microgravure coater was used on the electrode surface of the washed film substrate to apply a coating speed of 2 m / m.
in, to form a film of liquid crystal material having a thickness of 3 μm. Then, the similarly washed film substrate with ITO was laminated by using a pair of pressure rolls, and while applying a DC voltage of 40 V between the upper and lower substrates at room temperature, a bending deformation in a certain direction was given to the entire panel for orientation treatment. It was When this panel was placed between orthogonal polarizing plates and driven and displayed, the display defect due to the foreign matter adhering to the substrate was 300 mm × 600 m.
It was 0 in m size. In addition, the number of defective display lines due to the disconnection of the electrodes was zero.
【0036】表示欠陥の個数とは、目視により認識され
る正常に表示がなされていない欠陥部位の個数である。
このような表示欠陥は、上下基板間に基板間隔(3μ
m)以上の厚みの異物が存在する時に生じることが確認
されている。The number of display defects is the number of defective parts which are visually recognized and are not normally displayed.
Such a display defect is caused by a substrate gap (3 μm) between the upper and lower substrates.
It has been confirmed that this occurs when a foreign substance having a thickness of m) or more is present.
【0037】実施例2
実施例1と同様にして、被洗浄物として、ITOパター
ン電極付きのポリエーテルスルホン(PES)基板(P
ES:住友ベークライト社製FST:幅360mm、厚
さ100μm、長さ50m、ITO電極:幅1mm、厚
み0.08μm、ギャップ0.07mm、ピッチ1.0
7mmのストライプ状)の長尺フィルム基板を、このグ
ラビアコーターにセットした。そして、図1に示すよう
に、メチルエチルケトン(粘度:0.3cPs)が30
cc/分で供給されるオーバーフロー型の洗浄槽に、直
径20mmの斜線45番のマイクログラビアロッド(康
井精機(株)製)(凸部形状:らせん状、幅0.56m
m、厚み50μm、ねじれ角約40°、壁面のすくい角
約90°、溝幅0.7mm)を液面下10mmまで浸
し、40rpmで回転させ、前記のフィルム基板を0.
3m/minの速度でマイクログラビアロッド上のメチ
ルエチルケトンの被膜に接触するように搬送し、洗浄を
行った。被膜の厚みは1μmであった。更に、熱風乾燥
により基板に付着したメチルエチルケトンを除去した。Example 2 In the same manner as in Example 1, as an article to be cleaned, a polyether sulfone (PES) substrate (PES) with an ITO pattern electrode was used.
ES: Sumitomo Bakelite FST: width 360 mm, thickness 100 μm, length 50 m, ITO electrode: width 1 mm, thickness 0.08 μm, gap 0.07 mm, pitch 1.0
A 7 mm striped long film substrate was set on this gravure coater. Then, as shown in FIG. 1, methyl ethyl ketone (viscosity: 0.3 cPs) is 30
A micro gravure rod with a diameter of 20 mm and a slanted line number 45 (manufactured by Yasui Seiki Co., Ltd.) with a diameter of 20 mm is provided in an overflow type washing tank supplied at cc / min.
m, thickness 50 μm, twist angle of about 40 °, rake angle of wall surface of about 90 °, groove width of 0.7 mm) was dipped to 10 mm below the liquid surface and rotated at 40 rpm to make the film substrate 0.
It was conveyed at a speed of 3 m / min so as to come into contact with the film of methyl ethyl ketone on the micro gravure rod, and washed. The coating thickness was 1 μm. Further, the methyl ethyl ketone attached to the substrate was removed by hot air drying.
【0038】その後、液晶パネルを以下の方法で作製し
た。After that, a liquid crystal panel was manufactured by the following method.
【0039】実施例1で用いた液晶材料をトルエンに溶
解させ(濃度25重量%)、洗浄したフィルム基板の電
極面上にマイクログラビアコーターを用い、塗布速度2
m/minで塗布し、液晶材料の厚み3μmの膜を形成
した。The liquid crystal material used in Example 1 was dissolved in toluene (concentration: 25% by weight), and a microgravure coater was used on the electrode surface of the washed film substrate, and the coating speed was 2
It was applied at m / min to form a film of liquid crystal material having a thickness of 3 μm.
【0040】そして同様に洗浄したITO付きフィルム
基板を一対の加圧ロールを用いてラミネートし、上下基
板間に室温で40Vの直流電圧を印加しながらパネル全
体に一定方向のたわみ変形を与えて配向処理を行った。
このパネルを直交偏光板間に配置し、駆動表示したとこ
ろ、基板に付着した異物に由来する表示欠陥は300m
m×600mmサイズで0個であった。また、電極の断
線による表示不良ラインも0本であった。Then, the similarly washed film substrate with ITO was laminated by using a pair of pressure rolls, and while applying a DC voltage of 40 V at room temperature between the upper and lower substrates, the entire panel was flexibly deformed and oriented. Processed.
When this panel was placed between orthogonal polarizing plates and driven and displayed, the display defect due to the foreign matter adhering to the substrate was 300 m.
There were 0 pieces of m × 600 mm size. In addition, the number of defective display lines due to the disconnection of the electrodes was zero.
【0041】比較例1
実施例1で用いたと同じITOパターン電極付き基板を
洗浄せずに用い、実施例1と同様にして液晶パネルを作
製した。この液晶パネルについて実施例1と同様にして
駆動表示を行ったところ、基板に付着した異物に由来す
る表示欠陥は、360mm×600mmサイズで20個
であった。しかし、電極の断線による表示不良ラインは
0本であった。Comparative Example 1 A liquid crystal panel was prepared in the same manner as in Example 1, except that the same substrate with ITO pattern electrodes used in Example 1 was used without cleaning. When drive display was performed on this liquid crystal panel in the same manner as in Example 1, there were 20 display defects of 360 mm × 600 mm size, which were caused by foreign substances adhering to the substrate. However, the number of defective display lines due to the disconnection of the electrodes was zero.
【0042】比較例2
特開平2−297336号公報記載の方法を用いて、実
施例1で用いたと同じITOパターン電極付き基板を洗
浄した。すなわち、基板を一方向に0.3m/minで
搬送しながら、基板の両側に配設され、回転数100r
pmで基板の搬送方向と逆方向に回転する一対のローラ
状の洗浄ブラシ(ブラシ材:径100μm、長さ30m
mのナイロン材)間を通過させ、ブラシ洗浄を行った。
ブラシ洗浄の際、基板及び洗浄ブラシの両方に超純水を
噴射し、ブラシによる洗浄と同時に基板のすすぎを行っ
た。ブラシ洗浄後、基板を洗浄水の噴射により洗浄した
後、超純水を収容した超音波洗浄槽中で超音波洗浄し、
再度超純水の噴射によるすすぎを行った後、エアーナイ
フにより水分を乾燥した。Comparative Example 2 The same substrate with an ITO pattern electrode as used in Example 1 was washed by using the method described in JP-A-2-297336. That is, while the substrate is being conveyed at a rate of 0.3 m / min in one direction, it is arranged on both sides of the substrate and the rotation speed is 100 r
A pair of roller-shaped cleaning brushes (brush material: diameter 100 μm, length 30 m) that rotate in the direction opposite to the substrate transport direction at pm
m nylon material), and brush cleaning was performed.
During the brush cleaning, ultrapure water was sprayed on both the substrate and the cleaning brush to rinse the substrate simultaneously with the cleaning with the brush. After brush cleaning, the substrate is cleaned by spraying cleaning water, and then ultrasonically cleaned in an ultrasonic cleaning tank containing ultrapure water.
After rinsing by jetting ultrapure water again, water was dried with an air knife.
【0043】このようにして洗浄した基板を用いて実施
例1と同様にして液晶パネルを作製した。そして、得ら
れた液晶パネルについて実施例1と同様にして駆動表示
を行ったところ、基板に付着した異物に由来する表示欠
陥は、360mm×600mmサイズで5個であった。
表示欠陥となった異物の高さを測定したところ、3μm
から10μm程度の非常に小さい異物であった。また、
電極の断線による表示不良ラインは18本であった。A liquid crystal panel was produced in the same manner as in Example 1 using the substrate thus washed. Then, the liquid crystal panel thus obtained was driven and displayed in the same manner as in Example 1, and as a result, there were 5 display defects of 360 mm × 600 mm size, which were caused by the foreign matter adhering to the substrate.
When the height of the foreign matter that became the display defect was measured, it was 3 μm.
It was a very small foreign substance of about 10 μm. Also,
There were 18 defective display lines due to electrode breakage.
【0044】このように、ブラシ洗浄を用いた場合、非
常に小さな異物の除去効果が低く、さらに電極の断線が
生じてしまった。As described above, when the brush cleaning is used, the effect of removing very small foreign matter is low, and the electrode is broken.
【0045】[0045]
【発明の効果】本発明の方法によれば、洗浄による被洗
浄物の損傷や着傷を生じさせずに効率的に異物を除去し
洗浄工程を完了することが可能である。とりわけ、電極
の断線が生じ易い電極付きプラスチック基板に付着した
異物を効率よく除去洗浄することが可能であり、液晶表
示素子等に用いられる基板の洗浄法として好適である。
また、本発明の方法は、表面に回転方向に対し平行とな
らない壁面を持つ凸部を有する棒状部材を部分的に液体
に浸漬するなどして回転させて棒状部材表面に被膜を形
成し、基板をその液体被膜に接触させながら搬送すると
いう極めて簡単な操作で実施することができ、また、連
続的な大量洗浄にも適した方法である。According to the method of the present invention, it is possible to efficiently remove foreign substances and complete the cleaning step without causing damage or scratching of the object to be cleaned due to cleaning. In particular, it is possible to efficiently remove and clean foreign matter attached to the plastic substrate with electrodes, which is likely to cause disconnection of the electrodes, and is suitable as a method for cleaning substrates used for liquid crystal display elements and the like.
In addition, the method of the present invention includes rotating a rod-shaped member having a convex portion having a wall surface that is not parallel to the rotation direction on the surface by partially immersing the rod-shaped member in a liquid to form a film on the surface of the rod-shaped member. It can be carried out by an extremely simple operation of transferring while contacting the liquid coating, and is also a method suitable for continuous large-scale cleaning.
【図1】本発明の方法の一実施態様を示す断面説明図で
ある。FIG. 1 is a cross-sectional explanatory view showing one embodiment of the method of the present invention.
【図2】図1に示す一実施態様の部分拡大説明図であ
る。FIG. 2 is a partially enlarged explanatory view of the embodiment shown in FIG.
1 プラスチック基板 2 異物が付着している表面 22 異物 3 棒状部材 31 凸部 4 液体 41 液体被膜 5 ロール 6 洗浄槽 1 plastic substrate 2 Surface with foreign matter 22 foreign matter 3 Rod-shaped members 31 convex 4 liquid 41 Liquid coating 5 rolls 6 cleaning tank
Claims (8)
板の洗浄方法であって、その長さ方向に垂直な断面の中
心を通って長さ方向に延びる中心軸を有する棒状部材で
あって、該棒状部材を該中心軸を軸として回転させたと
きにその回転方向に対して平行とならない壁面を有する
凸部を表面にする棒状部材を用い、該棒状部材の表面に
液体被膜を形成し、該基板の表面が該液体被膜には接触
するが該棒状部材には接触しないようにして該棒状部材
を該中心軸を中心として回転させるとともに、該基板と
該棒状部材の相対位置を移動させて異物を除去すること
を特徴とする基板の洗浄方法。1. A method for cleaning a substrate for removing foreign matter adhering to the surface of the substrate, comprising a rod-shaped member having a central axis extending in the length direction through the center of a cross section perpendicular to the length direction. Forming a liquid film on the surface of the rod-shaped member by using a rod-shaped member having a convex portion having a wall surface that is not parallel to the rotation direction when the rod-shaped member is rotated about the central axis as the surface , The surface of the substrate is in contact with the liquid coating but not the rod-shaped member, the rod-shaped member is rotated about the central axis, and the relative position of the substrate and the rod-shaped member is moved. A method of cleaning a substrate, characterized by removing foreign matter.
の該液体被膜の厚みが0.1〜100μmである請求項
1記載の方法。2. The method according to claim 1, wherein the thickness of the liquid coating between the convex portion of the rod-shaped member and the surface of the substrate is 0.1 to 100 μm.
体である請求項1又は2記載の方法。3. The method according to claim 1, wherein the liquid has a viscosity of 0.3 to 10 cPs.
ら回転させることで該液体皮膜を形成する請求項1〜3
いずれかに記載の方法。4. The liquid film is formed by rotating the rod-shaped member while partially immersing it in the liquid.
The method described in either.
又は、噴霧により該棒状部材の表面に該液体を供給しな
がら該棒状部材を回転させて該液体皮膜を形成する請求
項1〜3いずれかに記載の方法。5. While immersing the entire rod-shaped member in the liquid,
Alternatively, the method according to claim 1, wherein the liquid film is formed by rotating the rod member while supplying the liquid to the surface of the rod member by spraying.
0.1〜100m/分である請求項1〜5いずれかに記
載の方法。6. The method according to claim 1, wherein a relative moving speed between the rod-shaped member and the substrate is 0.1 to 100 m / min.
基板が移動する請求項6記載の方法。7. The method according to claim 6, wherein the position of the rod-shaped member is fixed, and the substrate is moved.
部材が移動する請求項6記載の方法。8. The method according to claim 6, wherein the position of the substrate is fixed, and the rod-shaped member is moved.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP12536697A JP3436655B2 (en) | 1997-05-15 | 1997-05-15 | Substrate cleaning method |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP12536697A JP3436655B2 (en) | 1997-05-15 | 1997-05-15 | Substrate cleaning method |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH10314692A JPH10314692A (en) | 1998-12-02 |
JP3436655B2 true JP3436655B2 (en) | 2003-08-11 |
Family
ID=14908362
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP12536697A Expired - Fee Related JP3436655B2 (en) | 1997-05-15 | 1997-05-15 | Substrate cleaning method |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP3436655B2 (en) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP6394878B2 (en) * | 2014-09-25 | 2018-09-26 | 株式会社豊田自動織機 | Method for manufacturing power storage device |
JP6482891B2 (en) * | 2015-02-16 | 2019-03-13 | 日東電工株式会社 | Manufacturing method of optical film |
CN105921431B (en) | 2016-05-04 | 2018-02-06 | 京东方科技集团股份有限公司 | A kind of transfer plate cleaning equipment and its cleaning method |
-
1997
- 1997-05-15 JP JP12536697A patent/JP3436655B2/en not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
JPH10314692A (en) | 1998-12-02 |
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