JP3361157B2 - 表面上の未知線幅判定方法及び判定用試験構造 - Google Patents

表面上の未知線幅判定方法及び判定用試験構造

Info

Publication number
JP3361157B2
JP3361157B2 JP23356293A JP23356293A JP3361157B2 JP 3361157 B2 JP3361157 B2 JP 3361157B2 JP 23356293 A JP23356293 A JP 23356293A JP 23356293 A JP23356293 A JP 23356293A JP 3361157 B2 JP3361157 B2 JP 3361157B2
Authority
JP
Japan
Prior art keywords
width
grid
grating
lines
pitch
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP23356293A
Other languages
English (en)
Japanese (ja)
Other versions
JPH06229719A (ja
Inventor
ピー．パランジプ アジット
チャパドス，ジュニア フィリップ
ダブリュ．ホスク ジミー
Original Assignee
テキサス インスツルメンツ インコーポレイテツド
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by テキサス インスツルメンツ インコーポレイテツド filed Critical テキサス インスツルメンツ インコーポレイテツド
Publication of JPH06229719A publication Critical patent/JPH06229719A/ja
Application granted granted Critical
Publication of JP3361157B2 publication Critical patent/JP3361157B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Diffracting Gratings Or Hologram Optical Elements (AREA)
  • Drying Of Semiconductors (AREA)
  • Weting (AREA)
JP23356293A 1992-09-21 1993-09-20 表面上の未知線幅判定方法及び判定用試験構造 Expired - Fee Related JP3361157B2 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US948194 1992-09-21
US07/948,194 US5422723A (en) 1992-09-21 1992-09-21 Diffraction gratings for submicron linewidth measurement

Publications (2)

Publication Number Publication Date
JPH06229719A JPH06229719A (ja) 1994-08-19
JP3361157B2 true JP3361157B2 (ja) 2003-01-07

Family

ID=25487454

Family Applications (1)

Application Number Title Priority Date Filing Date
JP23356293A Expired - Fee Related JP3361157B2 (ja) 1992-09-21 1993-09-20 表面上の未知線幅判定方法及び判定用試験構造

Country Status (5)

Country Link
US (1) US5422723A (pt)
EP (1) EP0595020B1 (pt)
JP (1) JP3361157B2 (pt)
DE (1) DE69327146T2 (pt)
TW (1) TW262578B (pt)

Families Citing this family (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3215289B2 (ja) * 1995-04-17 2001-10-02 オークマ株式会社 スケール及びエンコーダ
US6094307A (en) * 1996-05-17 2000-07-25 Okuma Corporation Optical grating and encoder
US5940194A (en) * 1996-10-22 1999-08-17 University Of Delaware Real time-determination of interconnect metrology using binary computer-generated holograms
JP3902796B2 (ja) * 1996-12-30 2007-04-11 ディトゥー，トーマス，ディー． 回折測距システム用可変ピッチ格子
JP4327266B2 (ja) * 1997-02-26 2009-09-09 株式会社東芝 パターン寸法評価方法及びパターン形成方法
US6512385B1 (en) * 1999-07-26 2003-01-28 Paul Pfaff Method for testing a device under test including the interference of two beams
DE10058216C1 (de) * 2000-11-23 2002-06-06 Infineon Technologies Ag Verfahren zur Bestimmung eines Abstandes periodischer Strukturen
TW519746B (en) * 2001-01-26 2003-02-01 Timbre Tech Inc System and method for characterizing macro-grating test patterns in advanced lithography and etch processes
US6894790B2 (en) * 2001-11-13 2005-05-17 Hitachi High-Technologies Corporation Micropattern shape measuring system and method
US9952161B2 (en) 2001-12-06 2018-04-24 Attofemto, Inc. Methods for obtaining and analyzing digital interferometric data for computer testing and developing semiconductor and anisotropic devices and materials
US8462350B2 (en) 2001-12-06 2013-06-11 Attofemto, Inc. Optically enhanced holographic interferometric testing methods for the development and evaluation of semiconductor devices, materials, wafers, and for monitoring all phases of development and manufacture
US7733499B2 (en) 2001-12-06 2010-06-08 Attofemto, Inc. Method for optically testing semiconductor devices
US6933507B2 (en) 2002-07-17 2005-08-23 Kenneth H. Purser Controlling the characteristics of implanter ion-beams
JP2004101931A (ja) * 2002-09-10 2004-04-02 Konica Minolta Holdings Inc 対物集光手段及び光ピックアップ装置
JP4401814B2 (ja) * 2004-02-25 2010-01-20 株式会社日立ハイテクノロジーズ 測長用標準部材及び電子ビーム測長装置
SG153747A1 (en) 2007-12-13 2009-07-29 Asml Netherlands Bv Alignment method, alignment system and product with alignment mark
US10359369B2 (en) * 2014-08-07 2019-07-23 Nova Measuring Instruments Ltd. Metrology test structure design and measurement scheme for measuring in patterned structures
CN105786052B (zh) 2014-12-16 2020-09-08 艺康美国股份有限公司 一种用于pH调节的在线控制和反应方法
EP4370954A1 (en) * 2021-07-12 2024-05-22 Spec-Imaging AB A grating for optical measurements, an assembly for measurements of one or more optical parameters of a medium and a method of using the assembly

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4303341A (en) * 1977-12-19 1981-12-01 Rca Corporation Optically testing the lateral dimensions of a pattern
US4330213A (en) * 1980-02-14 1982-05-18 Rca Corporation Optical line width measuring apparatus and method
US4408884A (en) * 1981-06-29 1983-10-11 Rca Corporation Optical measurements of fine line parameters in integrated circuit processes
DE3305977A1 (de) * 1983-02-21 1984-08-23 Siemens AG, 1000 Berlin und 8000 München Verfahren zur schnellen indirekten bestimmung von fotolacklinienbreiten bei der optischen projektionsbe lichtung
US4600597A (en) * 1984-10-29 1986-07-15 Rca Corporation Method and device for determining the contour of spin-coated thin films of material on substrate topography
US5227625A (en) * 1992-09-16 1993-07-13 International Business Machines Corporation Retro-reflective variable-pitch diffraction grating for use in a rotary actuator disk file
FR2723449B1 (fr) * 1994-08-04 1996-09-06 Alcatel Fibres Optiques Procedes pour modifier la distribution longitudinale de pas d'un reseau diffractant et pour realiser un tel reseau dans un guide optique

Also Published As

Publication number Publication date
EP0595020A3 (en) 1995-08-09
EP0595020A2 (en) 1994-05-04
TW262578B (pt) 1995-11-11
US5422723A (en) 1995-06-06
DE69327146T2 (de) 2000-07-06
JPH06229719A (ja) 1994-08-19
EP0595020B1 (en) 1999-12-01
DE69327146D1 (de) 2000-01-05

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