JP3313232B2 - Grinding wheel - Google Patents
Grinding wheelInfo
- Publication number
- JP3313232B2 JP3313232B2 JP04494394A JP4494394A JP3313232B2 JP 3313232 B2 JP3313232 B2 JP 3313232B2 JP 04494394 A JP04494394 A JP 04494394A JP 4494394 A JP4494394 A JP 4494394A JP 3313232 B2 JP3313232 B2 JP 3313232B2
- Authority
- JP
- Japan
- Prior art keywords
- grinding
- polishing
- grindstone
- soluble
- grinding wheel
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Landscapes
- Polishing Bodies And Polishing Tools (AREA)
Description
【0001】[0001]
【産業上の利用分野】本願の請求項1に係る発明は、光
学部品・機械部品・セラミックス・金属等の加工に適し
た研削研磨用砥石に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The invention according to claim 1 of the present application relates to a grinding wheel for grinding and polishing suitable for processing optical parts, machine parts, ceramics, metals and the like.
【0002】[0002]
【従来の技術】従来、本願の請求項1に係る発明に対応
する従来技術としては、特開昭53−63692号公報
に記載されたレジンボンド砥石からなる研削研磨用砥石
が知られている。上記従来の研削研磨用砥石は、研削研
磨液に可溶な粒子(塩化ナトリウム、塩化カリウム、塩
化カルシウム、炭酸ナトリウム、臭化ナトリウム、臭化
カリウム等)を内部に含有して形成されており、上記可
溶性粒子を100〜325メッシュ粒径とし、この可溶
性粒子をそのまま砥粒含有部に10〜30vol%添加
した熱硬化性樹脂を結合材としたレジンボンドのダイヤ
モンド砥石または立方晶窒化ホウ素砥石である。2. Description of the Related Art Conventionally, as a prior art corresponding to the invention according to claim 1 of the present application, a grinding and polishing grindstone composed of a resin bond grindstone disclosed in Japanese Patent Application Laid-Open No. Sho 53-63692 is known. The above-mentioned conventional grinding and polishing whetstone is formed by containing particles (sodium chloride, potassium chloride, calcium chloride, sodium carbonate, sodium bromide, potassium bromide, etc.) soluble in the grinding and polishing liquid, A resin-bonded diamond grindstone or cubic boron nitride grindstone using a thermosetting resin in which the soluble particles have a particle size of 100 to 325 mesh and a thermosetting resin obtained by adding 10 to 30 vol% of the soluble particles as they are to the abrasive grain-containing portion as a binder. .
【0003】図5は、上記従来の研削研磨用砥石の製造
方法を示すブロック図である。この製造方法では、ま
ず、所望の粒度に粉砕した可溶性粒子を熱硬化性樹脂に
必要量加えて結合材とする。次に、この結合材に所望の
集中度になるように砥粒を混合する。そして、この混合
物質を所定の温度、圧力条件で焼成することによりペレ
ット状の研削研磨用砥石を製作している。FIG. 5 is a block diagram showing a method of manufacturing the above-mentioned conventional grinding and polishing grindstone. In this production method, first, a required amount of soluble particles pulverized to a desired particle size is added to a thermosetting resin to form a binder. Next, abrasive grains are mixed with the binder so as to have a desired degree of concentration. Then, the mixed substance is fired under predetermined temperature and pressure conditions to produce a pellet-shaped grinding / polishing grindstone.
【0004】[0004]
【発明が解決しようとする課題】前記従来の研削研磨用
砥石は、熱硬化性樹脂と砥粒と可溶性粉末(粒子)との
混合物を成形・焼成することによって作製されるので、
各構成物を成形した後の間隙が焼成後も残留し、その製
作上砥石構造中に連通気孔が生成される。この連通気孔
は、砥石の性能上チップポケットとして作用し、目詰ま
り防止に大きく寄与している。しかし、上述従来例の砥
石では、砥石使用時にこの連通気孔に研削研磨液が浸透
すると、砥石構造内に配置された可溶性粒子に接触し溶
解させてしまう。これにより砥石構造内にはチップポケ
ットが増大する。また、従来の研削研磨用砥石は、可溶
性粒子自体が砥石の強度を担う構成要素の一部となって
いるため、可溶性粒子が溶出してしまった部分(空間)
が生じることにより砥石強度が低下することになる。そ
のため、加工の際に砥石に加工圧力が加わると砥石が変
形しやすくなり、その結果、被加工物の加工形状に歪を
生じさせることになる。また、この歪を生じさせないた
めに加工圧力を低くすることを余儀なくされるので、結
果として加工時間の増大を引き起こすことになるという
問題点があった。The conventional grinding and polishing whetstone is manufactured by molding and firing a mixture of a thermosetting resin, abrasive grains and a soluble powder (particles).
The gap after forming each component remains even after firing, and a continuous air hole is generated in the grinding wheel structure due to its production. The continuous air holes function as chip pockets in terms of the performance of the grindstone and greatly contribute to preventing clogging. However, in the above-described conventional grindstone, if the grinding and polishing liquid penetrates into the continuous air holes when the grindstone is used, the grinding and polishing liquid contacts and dissolves the soluble particles disposed in the grindstone structure. This increases chip pockets in the grindstone structure. In addition, in the conventional grinding and polishing whetstone, since the soluble particles themselves are a part of the constituent elements responsible for the strength of the whetstone, the portion where the soluble particles eluted (space)
Causes the strength of the grindstone to decrease. Therefore, when a processing pressure is applied to the grindstone during the processing, the grindstone is easily deformed, and as a result, the processed shape of the workpiece is distorted. In addition, there is a problem in that the processing pressure must be reduced in order to prevent the occurrence of the distortion, and as a result, the processing time is increased.
【0005】本願の請求項1に係る発明は、上記従来技
術の問題点に鑑みてなされたもので、研削研磨用砥石の
内部に研削研磨液に可溶な粒子を膜材がポリイミド樹脂
からなるマイクロカプセルに封入して配置し、砥石の内
部から可溶性粒子が溶出するのを防止し、砥石の構造の
変化や強度の低下を生じさせない研削研磨用砥石を提供
することを目的とする。[0005] The invention according to claim 1 of the present application has been made in view of the above-mentioned problems of the prior art, and a film material made of a polyimide resin contains particles that are soluble in a grinding and polishing solution inside a grinding and grinding wheel. It is an object of the present invention to provide a grinding wheel for grinding and polishing which is disposed in a microcapsule, prevents soluble particles from being eluted from the inside of the grinding wheel, and does not cause a change in the structure of the grinding wheel or a decrease in strength.
【0006】[0006]
【課題を解決するための手段】前記課題を解決するため
に、本願の請求項1に係る発明は、研削研磨用砥石の内
部に研削研磨液に可溶な粒子を含有させた研削研磨用砥
石において、砥粒と、膜材がポリイミド樹脂からなるマ
イクロカプセルに封入した可溶性粒子とを合成樹脂の結
合材内に分散して混合して構成した。Means for Solving the Problems In order to solve the above problems, the invention according to claim 1 of the present application is directed to a grinding wheel for grinding and polishing in which particles soluble in a grinding and polishing liquid are contained inside the grinding wheel for grinding and polishing. In the above method, abrasive grains and soluble particles encapsulated in microcapsules made of polyimide resin were dispersed in a synthetic resin binder and mixed.
【0007】[0007]
【作用】前記請求項1に係る発明にあっては、可溶性粒
子が、膜材がポリイミド樹脂からなるマイクロカプセル
にて完全に密封されているので、研削研磨加工時に研削
研磨液が砥石中に浸透しても可溶性粒子と接触すること
がなく、砥石の内部構造中に気孔を生成することがな
い。また、マイクロカプセルは砥石表面にて被加工物と
接触するとマイクロカプセルの膜材が摩擦により除去あ
るいは破られて、マイクロカプセル内の可溶性粒子が研
削研磨液に触れて溶解するので、砥石表面にのみチップ
ポケットを配置させることが可能となる。さらに、可溶
性粒子を封入したマイクロカプセル作製後に固体物とマ
イクロカプセルとの間に摩擦を発生させるような工程が
ないことにより、マイクロカプセルの膜材が外力により
可溶性粒子から剥離するのを防止でき、砥石中において
可溶性粒子が研削研磨液に接触する確率を減じることが
できる。According to the first aspect of the present invention, since the soluble particles are completely sealed by the microcapsules whose film material is made of polyimide resin, the grinding and polishing liquid penetrates into the grindstone during the grinding and polishing process. However, it does not come into contact with the soluble particles and does not generate pores in the internal structure of the grinding wheel. Also, when the microcapsules come into contact with the workpiece on the surface of the grindstone, the film material of the microcapsules is removed or broken by friction, and the soluble particles in the microcapsules are dissolved by touching the grinding and polishing solution, so only the surface of the grindstone It becomes possible to arrange a chip pocket. Furthermore, since there is no step of generating friction between the solid matter and the microcapsules after the production of the microcapsules enclosing the soluble particles, it is possible to prevent the membrane material of the microcapsules from peeling from the soluble particles due to external force, The probability that the soluble particles come into contact with the grinding and polishing liquid in the grindstone can be reduced.
【0008】[0008]
【実施例1】本願の請求項1に係る発明の実施例を以下
に説明する。図1は本発明の研削研磨用砥石の製造方法
における製造工程の実施例1を示す説明図、図2は上記
製造方法により製造した研削研磨用砥石の実施例1を示
す断面図である。本実施例では研削抵抗の減少や目詰ま
りの防止を目的としたチップポケットを生成するため
に、研削研磨液に可溶性の物質を砥石内に配置させた研
削研磨用砥石とその製造方法について説明する。Embodiment 1 An embodiment of the invention according to claim 1 of the present application will be described below. FIG. 1 is an explanatory view showing Example 1 of a manufacturing process in a method for manufacturing a grinding and grinding wheel of the present invention, and FIG. 2 is a cross-sectional view showing Example 1 of a grinding and grinding wheel manufactured by the above manufacturing method. In the present embodiment, a grinding wheel for grinding and polishing in which a substance soluble in a grinding and polishing solution is arranged in a grinding wheel in order to generate a chip pocket for the purpose of reducing grinding resistance and preventing clogging, and a method of manufacturing the grinding wheel will be described. .
【0009】まず、図2を用いて本実施例の研削研磨用
砥石10を説明する。研削研磨用砥石10は、結合材と
してのフェノール樹脂5内に、研削液に可溶な物質であ
る塩化ナトリウム粒子(粒径約100μm)1と、砥粒
である合成ダイヤモンド粒(粒径約5μm)4を分散配
置して形成され、塩化ナトリウム粒子1はポリイミド樹
脂2を膜材としたマイクロカプセル3内に封入されてい
る。First, a grinding wheel 10 for grinding and polishing according to this embodiment will be described with reference to FIG. The grinding wheel 10 for grinding and polishing includes sodium chloride particles (particle diameter: about 100 μm) 1 which is a substance soluble in a grinding fluid and synthetic diamond particles (particle diameter: about 5 μm) in a phenol resin 5 as a binder. 4) are dispersed and arranged, and the sodium chloride particles 1 are encapsulated in microcapsules 3 using a polyimide resin 2 as a film material.
【0010】次に、前記研削研磨用砥石10の製造方法
を図1、2に基づいて説明する。砥石10の結合材とな
るフェノール樹脂5の粉体とその溶媒となるメチルアル
コールとを重量比1:2となるように秤量し、混合・溶
解させて樹脂溶液を得る。また、チップポケットを生成
させるための可溶性物質として選択した塩化ナトリウム
粒子(粒径約100μm)1をポリイミド樹脂2を膜材
としたマイクロカプセル3に封入する。マイクロカプセ
ル3はWurster法(気中懸濁被覆法)、スプレー
ドライ法(噴霧乾燥法)等の周知の方法にて製造され
る。そして、砥粒となる合成ダイヤモンド粒4(粒径約
5μm)を集中度が25になるように秤量し、またマイ
クロカプセル3を集中度が10になるように秤量し、前
記樹脂溶液に添加する。そして、樹脂溶液中に合成ダイ
ヤモンド粒4とマイクロカプセル3とが均一に分散する
ように混合する。次に、この混合体を所望の形状の成形
型に注入し、真空脱泡により混合体中の気泡を除いた
後、50℃の乾燥炉中で乾燥させてフェノール樹脂5の
溶媒であるメチルアルコールを蒸発除去させる。そし
て、ここで得られた成形体を乾燥炉で180℃・12時
間の条件で焼成し、研削研磨用砥石10を得る。Next, a method of manufacturing the grinding wheel 10 will be described with reference to FIGS. A phenolic resin powder serving as a binder of the grindstone 10 and methyl alcohol serving as a solvent thereof are weighed at a weight ratio of 1: 2, mixed and dissolved to obtain a resin solution. In addition, sodium chloride particles (particle diameter: about 100 μm) 1 selected as a soluble substance for forming a chip pocket are encapsulated in a microcapsule 3 made of a polyimide resin 2 as a film material. The microcapsules 3 are manufactured by a known method such as a Wurster method (air suspension coating method) and a spray drying method (spray drying method). Then, the synthetic diamond particles 4 (particle diameter: about 5 μm) serving as abrasive grains are weighed so that the concentration is 25, and the microcapsules 3 are weighed so that the concentration is 10 and are added to the resin solution. . Then, the synthetic diamond particles 4 and the microcapsules 3 are mixed so as to be uniformly dispersed in the resin solution. Next, the mixture is poured into a mold having a desired shape, and air bubbles in the mixture are removed by vacuum defoaming. Then, the mixture is dried in a drying oven at 50 ° C., and methyl alcohol as a solvent of the phenol resin 5 is removed. Is evaporated off. Then, the formed body obtained here is fired in a drying furnace at 180 ° C. for 12 hours to obtain a grinding wheel 10 for grinding and polishing.
【0011】次に、本実施例の研削研磨砥石10とその
製造方法の作用を図3を用いて説明する。本実施例の研
削研磨用砥石10にあっては、自らが溶出してチップポ
ケットを生成させる塩化ナトリウム粒子1は砥石10内
においてポリイミド樹脂2を膜材としたマイクロカプセ
ル3内に密封されているので、砥石10内に浸透する研
削液6に直接触れることがないため、塩化ナトリウム粒
子1は研削液6に溶解せず、砥石10内部においてチッ
プポケット8を生成することがない。これにより、可溶
性粒子である塩化ナトリウムが砥石10の強度を担う構
成要素の一部となっているにもかかわらず、砥石10の
強度が低下することがない。また、マイクロカプセル3
は砥石10の表面に現れて被加工物7と接触すると、膜
材であるポリイミド樹脂2が被加工物7との摩擦により
除去され、塩化ナトリウム粒子1が表面に現れる。表面
に現れた塩化ナトリウム粒子1は研削液6と接触し、研
削液6中に溶解する。この塩化ナトリウム粒子1の溶出
した痕跡がチップポケット8となって砥石10の表面に
形成され、加工により生じる研削屑の逃げ場となり目詰
まりを防止する。また、本実施例の研削研磨砥石10の
製造方法にあっては、研削液6に可溶な塩化ナトリウム
粒子1を研削液6に不溶なポリイミド樹脂2により被覆
してマイクロカプセル化した状態で、砥石10内に分散
配置しているので、マイクロカプセル3と被加工物7と
が接触する砥石10の表面においてのみチップポケット
を生じさせることができ、目詰まり防止を実現させるだ
けでなく、砥石10内部においてチップポケット8を生
じさせないことにより砥石強度の維持された砥石を作製
することができる。Next, the operation of the grinding and polishing grindstone 10 of this embodiment and the method of manufacturing the same will be described with reference to FIG. In the grinding wheel 10 of this embodiment, the sodium chloride particles 1 eluted by themselves to form chip pockets are sealed in the microcapsules 3 made of polyimide resin 2 in the grinding wheel 10. Therefore, since the grinding fluid 6 penetrating into the grindstone 10 is not directly touched, the sodium chloride particles 1 do not dissolve in the grinding fluid 6 and the chip pocket 8 is not generated inside the grindstone 10. Thus, the strength of the grindstone 10 does not decrease even though the soluble particles, sodium chloride, are a part of the component that bears the strength of the grindstone 10. In addition, microcapsule 3
When appears on the surface of the grindstone 10 and comes into contact with the workpiece 7, the polyimide resin 2 as a film material is removed by friction with the workpiece 7, and the sodium chloride particles 1 appear on the surface. The sodium chloride particles 1 appearing on the surface come into contact with the grinding fluid 6 and dissolve in the grinding fluid 6. Traces of the sodium chloride particles 1 eluted are formed as chip pockets 8 on the surface of the grindstone 10 and serve as a relief for grinding chips generated by machining, thereby preventing clogging. Further, in the method of manufacturing the grinding and polishing whetstone 10 of the present embodiment, the sodium chloride particles 1 soluble in the grinding fluid 6 are coated with the polyimide resin 2 insoluble in the grinding fluid 6 and microencapsulated. Since the microcapsules 3 and the workpiece 7 are dispersed and arranged in the grindstone 10, chip pockets can be generated only on the surface of the grindstone 10 where the microcapsules 3 and the workpiece 7 are in contact with each other. By not forming the chip pockets 8 inside, it is possible to manufacture a grindstone with the strength of the grindstone maintained.
【0012】本実施例によれば、研削研磨用砥石10の
製造に際し、予め自らが溶出することによってチップポ
ケット8を生成する可溶性粒子である塩化ナトリウム粒
子1を研削液6に不溶なポリイミド樹脂2でマイクロカ
プセル化して密封してから砥石10中に配置させるの
で、砥石10中の可溶性粒子の溶出による砥石10の強
度の低下を防ぐことができる。これにより、目詰まりが
防止されるだけでなく、より面精度の高い加工面を得る
ことができる。According to this embodiment, when manufacturing the grinding wheel 10 for grinding and polishing, the sodium chloride particles 1 which are soluble particles which form the chip pockets 8 by being eluted in advance by themselves are converted into the polyimide resin 2 which is insoluble in the grinding fluid 6. Since it is microencapsulated and sealed and placed in the grindstone 10, it is possible to prevent a decrease in the strength of the grindstone 10 due to elution of soluble particles in the grindstone 10. Thereby, not only clogging is prevented, but also a processed surface with higher surface accuracy can be obtained.
【0013】本実施例では可溶性物質に塩化ナトリウム
を用いた場合を例示したが、塩化カリウム・塩化カルシ
ウム・炭酸ナトリウム、臭化ナトリウム・臭化カリウム
等の水溶性の中性塩を用いることができ、かかる場合に
あっても、上記実施例と同様な作用、効果を奏すること
ができる。In this embodiment, the case where sodium chloride is used as a soluble substance is exemplified. However, a water-soluble neutral salt such as potassium chloride / calcium chloride / sodium carbonate, sodium bromide / potassium bromide can be used. Even in such a case, the same operation and effect as those of the above embodiment can be obtained.
【0014】[0014]
【実施例2】本願の請求項1に係る発明の別の実施例を
以下に説明する。図4は本発明の研削研磨用砥石の製造
方法における製造工程の実施例2を示す説明図である。
本実施例では化学的な研削能力向上とチップポケットの
生成を目的とした可溶性物質を砥石内に配置させた研削
研磨用砥石とその製造方法について説明する。Embodiment 2 Another embodiment of the invention according to claim 1 of the present application will be described below. FIG. 4 is an explanatory view showing Example 2 of the manufacturing process in the method for manufacturing a grinding wheel for grinding and polishing according to the present invention.
In this embodiment, a grindstone for grinding and polishing in which a soluble substance for the purpose of improving the chemical grinding ability and generating chip pockets is arranged in a grindstone and a method of manufacturing the same will be described.
【0015】本実施例の砥石は、結合材としてのフェノ
ール樹脂内に、研磨液に可溶な物質である硝酸セリウム
アンモニウム粒子(粒径約50μm)と、砥粒である酸
化セリウム粉体(粒径約1μm)を分散配置して形成さ
れ、硝酸セリウムアンモウニム粒子は、ポリイミド樹脂
を膜材としたマイクロカプセル内に封入されている。The grindstone of the present embodiment comprises cerium ammonium nitrate particles (particle size: about 50 μm), which are soluble in a polishing liquid, and cerium oxide powder (grain particles) in a phenol resin as a binder. A diameter of about 1 μm) is dispersed and formed, and the cerium ammonium nitrate particles are encapsulated in microcapsules using a polyimide resin as a film material.
【0016】次に、砥石の製造方法を図4に基づいて説
明する。砥石の結合材となるフェノール樹脂の粉体とそ
の溶媒となるメチルアルコールとを重量比が1:2にな
るように秤量し、混合・溶解させて樹脂溶液を得る。ま
た、化学的な研削能力向上とチップポケットの生成のた
めの可溶性物質として選択した硝酸セリウムアンモニウ
ム粒子(粒径約50μm)をポリイミド樹脂を膜材とし
たマイクロカプセルに封入する。砥粒となる酸化セリウ
ム粉体(粒径約1μm)を成形品(砥石)の45vol
%になるように秤量し、またマイクロカプセルを35v
ol%になるように秤量し、前記樹脂溶液に添加する。
そして、樹脂溶液中に酸化セリウム粉体とマイクロカプ
セルとが均一に分散するように混合する。次にこの混合
体を所望の形状の成形型に注入し、真空脱泡により混合
体中の気泡を除いた後、50℃の乾燥炉中で乾燥させて
フェノール樹脂の溶媒であるメチルアルコールを蒸発除
去させる。そして、ここで得られた成形体を乾燥炉で1
80℃・12時間の条件で焼成し、研削研磨用砥石を得
る。Next, a method for manufacturing a grindstone will be described with reference to FIG. A resin solution is obtained by weighing and mixing and dissolving a phenolic resin powder as a binder of a grindstone and methyl alcohol as a solvent in a weight ratio of 1: 2. In addition, cerium ammonium nitrate particles (particle diameter: about 50 μm) selected as a soluble substance for improving the chemical grinding ability and for generating chip pockets are encapsulated in microcapsules made of polyimide resin as a film material. 45 vol of cerium oxide powder (particle size about 1 μm) to be abrasive grains
% Of the microcapsules and 35 v
ol% and added to the resin solution.
Then, the cerium oxide powder and the microcapsules are mixed so as to be uniformly dispersed in the resin solution. Next, the mixture is poured into a mold having a desired shape, and air bubbles in the mixture are removed by vacuum defoaming. Then, the mixture is dried in a drying oven at 50 ° C. to evaporate methyl alcohol which is a solvent of the phenol resin. Let it be removed. Then, the molded body obtained here is dried in a drying oven for 1 hour.
It is baked under the conditions of 80 ° C. for 12 hours to obtain a grinding wheel for grinding and polishing.
【0017】本実施例の研削研磨用砥石とその製造方法
によれば、実施例1と同様に砥石内部の可溶性粒子の溶
出による砥石強度の低下を防ぎつつ、砥石表面に目詰ま
りを有効に防止するチップポケットを生成させることが
できるのはもちろんのこと、被加工物に酸の作用を与え
て加工効率を向上させる硝酸セリウムアンモニウムの可
溶性物質が砥石と被加工物である硝材との界面でのみ研
磨液に溶解することになるので、高濃度の可溶性物質溶
液が被加工物に作用することになり、可溶性物質の化学
作用能力を充分に生かすことができ、特に耐酸性の低い
ガラスの加工効率を向上し得るという利点がある。According to the grinding wheel for grinding and polishing of this embodiment and the method for manufacturing the same, the clogging of the grinding wheel surface is effectively prevented while preventing the reduction of the grinding wheel strength due to the elution of soluble particles inside the grinding wheel as in the first embodiment. In addition to the generation of chip pockets, the soluble substance of cerium ammonium nitrate, which gives an action of acid to the workpiece to improve the processing efficiency, is generated only at the interface between the grindstone and the glass material that is the workpiece. Since it is dissolved in the polishing liquid, a high-concentration soluble material solution acts on the workpiece, making it possible to make full use of the chemical action capability of the soluble material, and in particular, the processing efficiency of glass having low acid resistance. There is an advantage that can be improved.
【0018】本実施例では可溶性物質に硝酸セリウムア
ンモニウムを用いた場合を挙げたが、クエン酸、フタル
酸、ピコリン酸、EDTA・2Na等の水溶性の酸を用
いることができ、かかる場合にあっても上記実施例2と
同様な作用、効果を奏することができる。In this embodiment, the case where cerium ammonium nitrate is used as the soluble substance is described. However, a water-soluble acid such as citric acid, phthalic acid, picolinic acid, EDTA and 2Na can be used. The same operation and effect as those of the second embodiment can be obtained.
【0019】[0019]
【実施例3】本願の請求項1に係る発明のさらに別の実
施例を以下に説明する。本実施例の研削研磨用砥石とそ
の製造方法は、可溶性物質に水酸化ナトリウムを用いた
点を除き、前記実施例2と同様である。Embodiment 3 Another embodiment of the invention according to claim 1 of the present application will be described below. The grinding wheel for grinding and polishing of this embodiment and the method of manufacturing the same are the same as those of the above-mentioned embodiment 2 except that sodium hydroxide is used as a soluble substance.
【0020】第1実施例と同様の効果が得られるのはも
ちろんのこと、被加工物にアルカリの作用を与えて加工
効率を向上させる水酸化ナトリウムの可溶性物質が砥石
と被加工物であるガラスとの界面でのみ研磨液に溶解す
ることになるので、高濃度の可溶性物質溶液が被加工物
に作用することになり、可溶性物質の化学的作用能力を
生かすことができ、特に耐アルカリ性の低いガラスの加
工効率を向上し得るという利点がある。The same effects as those of the first embodiment can be obtained. Of course, the soluble material of sodium hydroxide which improves the processing efficiency by giving an alkali action to the workpiece is a grindstone and the glass which is the workpiece. Since it is dissolved in the polishing liquid only at the interface with the polishing solution, a high-concentration soluble substance solution acts on the workpiece, and the chemical action ability of the soluble substance can be utilized, and particularly, the alkali resistance is low. There is an advantage that the processing efficiency of glass can be improved.
【0021】本実施例では可溶性物質に水酸化ナトリウ
ムを用いた場合を挙げたが、水酸化カリウム等の水溶性
のアルカリを用いることができ、かかる場合にあっても
上記実施例3と同様な作用、効果を得ることができる。In this embodiment, the case where sodium hydroxide is used as the soluble substance has been described. However, a water-soluble alkali such as potassium hydroxide can be used. Functions and effects can be obtained.
【0022】上述の実施例1、2、3では、砥粒に合成
ダイヤモンド、酸化セリウムおよび結合材にフェノール
樹脂を用いたが、酸化ジルコニウム、酸化アルミニウ
ム、CBN、SiC、べんがら等の砥粒およびエポキシ
系、ポリイミド樹脂等の合成樹脂を用いてもよい。そし
て、砥粒、結合材、可溶性物質は任意の組み合わせを取
ることができる。また、可溶性粒子をマイクロカプセル
化する方法は、可溶性粒子の物性、粒径等により可溶性
粒子を研削研磨液から確実に隔離・保護できる方法を気
中懸濁法、噴霧乾燥法、噴霧凝固法、液中乾燥法等の周
知の手段より選択することができる。In the above Examples 1, 2 and 3, synthetic diamond, cerium oxide and phenol resin were used for the abrasive grains. However, abrasive grains such as zirconium oxide, aluminum oxide, CBN, SiC, and bran, and epoxy A system or a synthetic resin such as a polyimide resin may be used. The abrasive, the binder, and the soluble substance can be in any combination. In addition, the method of microencapsulating the soluble particles is a method that can reliably separate and protect the soluble particles from the grinding and polishing solution by the physical properties of the soluble particles, the particle size, etc., such as an air suspension method, a spray drying method, a spray coagulation method, It can be selected from well-known means such as a submerged drying method.
【0023】[0023]
【発明の効果】研削研磨液に可溶な粒子を膜材がポリイ
ミド樹脂からなるマイクロカプセルに封入した上で可溶
性粒子を研削研磨用砥石内に配置したので、この砥石を
用いて研削研磨するときに、この研削研磨用砥石を作製
する工程での焼成時に生成された連通気孔内に浸透する
研削研磨液によって可溶性粒子が砥石内部で研削研磨液
に溶解することはない。このため、可溶性粒子を砥石中
に配置しても砥石の強度が維持され、被加工物の面精度
を低下させることがない。さらに、マイクロカプセル
は、被加工物の加工中に砥石表面が徐々に摩耗、滅失し
て、砥石内部のマイクロカプセルが砥石の表面に露出し
たときに初めて膜材が被加工物との接触により除去ある
いは破られることになり、この時点でマイクロカプセル
内の可溶性粒子が研削研磨液に溶解して砥石の表面にチ
ップポケットが生成されるので、砥石表面の目詰まりを
防止でき、研削研磨抵抗を低減させることができる。According to the present invention, the particles soluble in the grinding and polishing liquid are encapsulated in microcapsules made of a polyimide resin, and the soluble particles are arranged in the grinding wheel for grinding and polishing. In addition, the soluble particles do not dissolve in the grinding / polishing liquid inside the grinding wheel due to the grinding / polishing liquid that penetrates into the continuous ventilation holes generated at the time of firing in the step of producing the grinding / polishing whetstone. For this reason, even if soluble particles are arranged in the grindstone, the strength of the grindstone is maintained, and the surface accuracy of the workpiece is not reduced. Furthermore, the surface of the grinding wheel gradually wears and disappears during processing of the workpiece, and the film material is removed by contact with the workpiece only when the microcapsules inside the grinding wheel are exposed on the surface of the grinding wheel. Or at this point, the soluble particles in the microcapsules dissolve in the grinding and polishing solution and chip pockets are generated on the surface of the grinding wheel, preventing clogging of the grinding wheel surface and reducing grinding and polishing resistance Can be done.
【図1】本発明の実施例の製造工程を示す説明図であ
る。FIG. 1 is an explanatory view showing a manufacturing process of an example of the present invention.
【図2】本発明の実施例1の研削研磨用砥石を示す断面
図である。FIG. 2 is a sectional view showing a grinding wheel for grinding and polishing according to the first embodiment of the present invention.
【図3】本発明の実施例1の研削研磨用砥石の作用を説
明するための断面図である。FIG. 3 is a cross-sectional view for explaining the operation of the grinding wheel for grinding and polishing according to the first embodiment of the present invention.
【図4】本発明の実施例2の製造工程を示す説明図であ
る。FIG. 4 is an explanatory diagram illustrating a manufacturing process according to a second embodiment of the present invention.
【図5】従来の研削研磨用砥石の製造工程を示す説明図
である。FIG. 5 is an explanatory view showing a manufacturing process of a conventional grinding and polishing whetstone.
1 塩化ナトリウム粒子 2 ポリイミド樹脂 3 マイクロカプセル 4 合成ダイヤモンド粒 5 フェノール樹脂 6 研削液 7 被加工物 8 チップポケット 10 研削研磨用砥石 DESCRIPTION OF SYMBOLS 1 Sodium chloride particle 2 Polyimide resin 3 Microcapsule 4 Synthetic diamond particle 5 Phenol resin 6 Grinding fluid 7 Workpiece 8 Chip pocket 10 Grinding wheel for grinding and polishing
フロントページの続き (58)調査した分野(Int.Cl.7,DB名) B24D 3/34 B24D 3/02 310 B24D 3/28 Continuation of the front page (58) Field surveyed (Int. Cl. 7 , DB name) B24D 3/34 B24D 3/02 310 B24D 3/28
Claims (1)
溶な粒子を含有させた研削研磨用砥石において、砥粒
と、膜材がポリイミド樹脂からなるマイクロカプセルに
封入した可溶性粒子とを合成樹脂の結合材内に分散して
構成したことを特徴とする研削研磨用砥石。1. A grinding wheel for grinding and polishing in which particles soluble in a grinding and polishing liquid are contained in a grinding wheel for grinding and polishing, wherein abrasive grains and soluble particles encapsulated in microcapsules whose film material is made of a polyimide resin. A grinding wheel for grinding and polishing characterized by being dispersed in a synthetic resin binder.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP04494394A JP3313232B2 (en) | 1994-02-17 | 1994-02-17 | Grinding wheel |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP04494394A JP3313232B2 (en) | 1994-02-17 | 1994-02-17 | Grinding wheel |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH07227765A JPH07227765A (en) | 1995-08-29 |
JP3313232B2 true JP3313232B2 (en) | 2002-08-12 |
Family
ID=12705573
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP04494394A Expired - Fee Related JP3313232B2 (en) | 1994-02-17 | 1994-02-17 | Grinding wheel |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP3313232B2 (en) |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5876266A (en) * | 1997-07-15 | 1999-03-02 | International Business Machines Corporation | Polishing pad with controlled release of desired micro-encapsulated polishing agents |
JP2001105329A (en) * | 1999-08-02 | 2001-04-17 | Ebara Corp | Grinding wheel for polishing |
JP2001138244A (en) | 1999-08-17 | 2001-05-22 | Mitsubishi Materials Corp | Resin bond type grinding wheel |
KR100446248B1 (en) * | 2001-12-17 | 2004-08-30 | 최창호 | Polymeric Polishing Pad including Polishing Microparticles |
CN110788743B (en) * | 2019-09-23 | 2021-11-09 | 湖南科技大学 | Magnetic field controllable slow-release magnetic substance thickening fluid flow polishing pad and polishing method |
-
1994
- 1994-02-17 JP JP04494394A patent/JP3313232B2/en not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
JPH07227765A (en) | 1995-08-29 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP2002538284A5 (en) | ||
JPS5890466A (en) | Grinding wheel | |
JP3313232B2 (en) | Grinding wheel | |
JPS6384875A (en) | Manufacture of composite diamond polishing molded form | |
CN109809822B (en) | High-strength high-toughness silicon carbide ceramic carrier disc, manufacturing method and application | |
US3899307A (en) | Resin bonded diamond wheels with copper and silicon carbide fillers | |
JP2680739B2 (en) | Resin bond super abrasive whetstone | |
CN102816530A (en) | Chemical-mechanical polishing solution | |
JP2001062601A (en) | Hard tool | |
JP3321250B2 (en) | Conductive whetstone | |
JPH07156068A (en) | Manufacture of grinding and abrasive wheel | |
JP2005319556A (en) | Pore generating type resinoid grinding wheel | |
JP3250746B2 (en) | Manufacturing method of grinding wheel for grinding and polishing and grinding wheel for grinding and polishing | |
JP2641438B2 (en) | Centrifugal firing method of metal whetstone with porous part | |
JPH0360970A (en) | Polishing surface plate | |
JPS60118469A (en) | Manufacturing method of metal bond grindstone | |
JP3231402B2 (en) | Grinding wheel | |
JPS6354488A (en) | Granulated abrasive for cutting wheel and grinding wheel, its manufacture, and grindstone made by using same | |
JP3055084B2 (en) | Porous metal bond whetstone and method of manufacturing the same | |
JPS58155012A (en) | Blade part of tip saw and production thereof | |
JPS6312747B2 (en) | ||
JP2000263449A (en) | Pore generated type resinoid grinding wheel | |
JPH04122571A (en) | Precision polishing method for ceramics | |
JP3676102B2 (en) | Abrasive tool manufacturing method | |
JPS62114879A (en) | Manufacture of grinding stone of abrasive grains composed of massive grain-formed grinding stone piece |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20020514 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20080531 Year of fee payment: 6 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20090531 Year of fee payment: 7 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20100531 Year of fee payment: 8 |
|
LAPS | Cancellation because of no payment of annual fees |