JPH07227765A - Grinding/polishing wheel and its manufacture - Google Patents

Grinding/polishing wheel and its manufacture

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Publication number
JPH07227765A
JPH07227765A JP6044943A JP4494394A JPH07227765A JP H07227765 A JPH07227765 A JP H07227765A JP 6044943 A JP6044943 A JP 6044943A JP 4494394 A JP4494394 A JP 4494394A JP H07227765 A JPH07227765 A JP H07227765A
Authority
JP
Japan
Prior art keywords
grinding
grindstone
polishing
soluble
particles
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP6044943A
Other languages
Japanese (ja)
Other versions
JP3313232B2 (en
Inventor
Shinji Yokoyama
真司 横山
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Olympus Corp
Original Assignee
Olympus Optical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Olympus Optical Co Ltd filed Critical Olympus Optical Co Ltd
Priority to JP04494394A priority Critical patent/JP3313232B2/en
Publication of JPH07227765A publication Critical patent/JPH07227765A/en
Application granted granted Critical
Publication of JP3313232B2 publication Critical patent/JP3313232B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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Abstract

PURPOSE:To make soluble particles put in a grinding/polishing wheel dissolve a grinding/polishing fluid only on the surface (machining surface) of the grinding wheel. CONSTITUTION:Sodium chloride particles 1 soluble in a grinding/polishing fluid are sealed inside each microcapsule 3 which has a film of polyimide resin 2 insoluble in the grinding/polishing fluid. The microcapsules 3 and synthetic diamond grains 4 are dispersed in phenol resin 5. The microcapsules 3 are broken on contact with a workpiece and the sodium chloride particles 1 in each microcapsule 3 are dissolved into the grinding/polishing fluid. This leads to formation of chip pockets, which prevent the grinding wheel 10 from clogging up and reduce the resistance to grinding and polishing.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本願の請求項1〜6に係る発明
は、光学部品・機械部品・セラミックス・金属等の加工
に適した研削研磨用砥石とその製造方法に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The invention according to claims 1 to 6 of the present invention relates to a grinding and polishing grindstone suitable for processing optical parts, mechanical parts, ceramics, metals and the like, and a manufacturing method thereof.

【0002】[0002]

【従来の技術】従来、本願の請求項1〜6に係る発明に
対応する従来技術としては、特開昭53−63692号
公報に記載されたレジンボンド砥石からなる研削研磨用
砥石が知られている。上記従来の研削研磨用砥石は、研
削研磨液に可溶な粒子(塩化ナトリウム、塩化カリウ
ム、塩化カルシウム、炭酸ナトリウム、臭化ナトリウ
ム、臭化カリウム等)を内部に含有して形成されてお
り、上記可溶性粒子を100〜325メッシュ粒径と
し、この可溶性粒子をそのまま砥粒含有部に10〜30
vol%添加した熱硬化性樹脂を結合剤としたレジンボ
ンドのダイヤモンド砥石または立方晶窒化ホウ素砥石で
ある。
2. Description of the Related Art Heretofore, as a conventional technique corresponding to the inventions according to claims 1 to 6 of the present application, a grindstone for grinding and polishing made of a resin bond grindstone disclosed in JP-A-53-63692 is known. There is. The conventional grindstone for grinding and polishing is formed by containing particles (sodium chloride, potassium chloride, calcium chloride, sodium carbonate, sodium bromide, potassium bromide, etc.) soluble in a grinding and polishing liquid inside. The soluble particles are made to have a particle size of 100 to 325 mesh, and the soluble particles are directly added to the abrasive grain containing portion in an amount of 10 to 30.
It is a resin-bonded diamond grindstone or cubic boron nitride grindstone using a thermosetting resin added by vol% as a binder.

【0003】図5は、上記従来の研削研磨用砥石の製造
方法を示すブロック図である。この製造方法では、ま
ず、所望の粒度に粉砕した可溶性粒子を熱硬化性樹脂に
必要量加えて結合剤とする。次に、この結合剤に所望の
集中度になるように砥粒を混合する。そして、この混合
物質を所定の温度、圧力条件で焼成することによりペレ
ット状の研削研磨用砥石を製作している。
FIG. 5 is a block diagram showing a method of manufacturing the conventional grinding and polishing grindstone. In this manufacturing method, first, soluble particles pulverized to a desired particle size are added to a thermosetting resin in a necessary amount to form a binder. Next, abrasive grains are mixed with the binder so as to have a desired concentration. Then, a pellet-shaped grindstone for grinding and polishing is manufactured by firing this mixed substance under a predetermined temperature and pressure condition.

【0004】[0004]

【発明が解決しようとする課題】前記従来の研削研磨用
砥石は、熱硬化性樹脂と砥粒と可溶性粉末(粒子)との
混合物を成形・焼成することによって作製されるので、
各構成物を成形した後の間隙が焼成後も残留し、その製
作上砥石構造中に連通気孔が生成される。この連通気孔
は、砥石の性能上チップポケットとして作用し、目詰ま
り防止に大きく寄与している。しかし、上述従来例の砥
石では、砥石使用時にこの連通気孔に研削研磨液が浸透
すると、砥石構造内に配置された可溶性粒子に接触し溶
解させてしまう。これにより砥石構造内にはチップポケ
ットが増大する。また、従来の研削研磨用砥石は、可溶
性粒子自体が砥石の強度を担う構成要素の一部となって
いるため、可溶性粒子が溶出してしまった部分(空間)
が生じることにより砥石強度が低下することになる。そ
のため、加工の際に砥石に加工圧力が加わると砥石が変
形しやすくなり、その結果、被加工物の加工形状に歪を
生じさせることになる。また、この歪を生じさせないた
めに加工圧力を低くすることを余儀なくされるので、結
果として加工時間の増大を引き起こすことになるという
問題点があった。
Since the conventional grindstone for grinding and polishing is produced by molding and firing a mixture of thermosetting resin, abrasive grains and soluble powder (particles),
The gaps after molding each component remain after firing, and in the production thereof, continuous air holes are formed in the grindstone structure. The continuous vent hole functions as a chip pocket in terms of the performance of the grindstone and greatly contributes to preventing clogging. However, in the above-mentioned conventional grindstone, when the grinding / polishing liquid permeates the continuous air holes when the grindstone is used, the grindstone contacts and dissolves the soluble particles arranged in the grindstone structure. This increases the chip pockets within the grindstone structure. Further, in the conventional grinding and polishing grindstone, the soluble particles themselves are a part of the constituent elements responsible for the strength of the grindstone.
As a result, the strength of the grindstone decreases. Therefore, if a processing pressure is applied to the grindstone during processing, the grindstone is likely to be deformed, and as a result, the processed shape of the workpiece is distorted. Further, there is a problem in that the processing pressure must be lowered in order to prevent this distortion, resulting in an increase in processing time.

【0005】本願の請求項1、5および6に係る発明
は、上記従来技術の問題点に鑑みてなされたもので、研
削研磨用砥石の内部に研削研磨液に可溶な粒子をマイク
ロカプセルに封入して配置し、砥石の内部から可溶性粒
子が溶出するのを防止し、砥石の構造の変化や強度の低
下を生じさせない研削研磨用砥石とその砥石の製造方法
を提供することを目的とする。
The inventions according to claims 1, 5 and 6 of the present application have been made in view of the above problems of the prior art. Particles soluble in a grinding / polishing liquid are formed into microcapsules in a grindstone for grinding / polishing. An object of the present invention is to provide a grinding wheel for grinding and polishing and a method for manufacturing the grinding wheel, which is placed in a sealed state, prevents soluble particles from eluting from the inside of the wheel, and does not cause a change in the structure of the wheel or a decrease in strength. .

【0006】また、請求項2に係る発明は、研削研磨用
砥石の内部に研削研磨液に可溶な粒子をマイクロカプセ
ルに封入して配置し、研削研磨加工中に砥石表面に露出
したマイクロカプセルから可溶性粒子が研削研磨液に溶
出した際、砥石表面にチップポケットを生成し、目詰ま
りの防止や研削抵抗の減少を実現することができる研削
研磨用砥石を提供することを目的とする。
Further, in the invention according to claim 2, the particles soluble in the grinding and polishing liquid are enclosed in microcapsules inside the grindstone for grinding and polishing, and the microcapsules exposed on the surface of the grindstone during the grinding and polishing process. An object of the present invention is to provide a grinding / polishing grindstone capable of forming a chip pocket on the surface of the grindstone when soluble particles are eluted from the grind / polishing liquid to prevent clogging and reduce the grinding resistance.

【0007】そして、請求項3に係る発明は、研削研磨
用砥石の内部に研削研磨液に可溶な粒子をマイクロカプ
セルに封入して配置し、研削研磨加工中に砥石表面に露
出したマイクロカプセルから可溶性粒子が研削研磨液に
溶出した際に、砥石表面にチップポケットを生成し、目
詰まりの防止や研削抵抗の減少を実現するとともに、酸
に侵されやすい被加工物の加工速度の向上を実現するこ
とができる研削研磨用砥石を提供することを目的とす
る。
The invention according to claim 3 arranges particles soluble in a grinding and polishing liquid in microcapsules inside a grindstone for grinding and polishing, and the microcapsules exposed on the surface of the grindstone during the grinding and polishing process. When soluble particles are dissolved in the grinding and polishing solution, chip pockets are created on the surface of the grindstone to prevent clogging and reduce grinding resistance, and to improve the processing speed of the workpiece that is easily attacked by acid. An object of the present invention is to provide a grinding and polishing whetstone that can be realized.

【0008】また、請求項4に係る発明は、研削研磨用
砥石の内部に研削研磨液に可溶な粒子をマイクロカプセ
ルに封入して配置し、研削研磨加工中に砥石表面に露出
したマイクロカプセルから可溶性粒子が研削研磨液に溶
出した際に、砥石表面にチップポケットに生成し、目詰
まりの防止や研削抵抗の減少を実現するとともに、アル
カリに侵されやすい被加工物の加工速度の向上を実現す
ることができる研削研磨用砥石を提供することを目的と
する。
Further, in the invention according to claim 4, the particles which are soluble in the grinding and polishing liquid are enclosed in a microcapsule inside the grindstone for grinding and polishing, and the microcapsules exposed on the surface of the grindstone during the grinding and polishing process. When soluble particles are dissolved in the grinding / polishing liquid, they are generated in the chip pockets on the surface of the grindstone to prevent clogging and reduce grinding resistance, and to improve the processing speed of the workpiece that is easily attacked by alkali. An object of the present invention is to provide a grinding and polishing whetstone that can be realized.

【0009】[0009]

【課題を解決するための手段】前記課題を解決するため
に、本願の請求項1に係る発明は、研削研磨用砥石の内
部に研削研磨液に可溶な粒子を含有させた研削研磨用砥
石において、砥粒と、合成樹脂のマイクロカプセルに封
入した可溶性粒子とを合成樹脂の結合剤内に分散して混
合して構成した。また、請求項2に係る発明は、前記マ
イクロカプセルに封入した可溶性粒子を水溶性の中性塩
とした。そして、請求項3に係る発明は、前記マイクロ
カプセルに封入した可溶性粒子を水溶性の酸とした。ま
た、請求項4に係る発明は、前記マイクロカプセルに封
入した可溶性粒子を水溶性のアルカリとした。
In order to solve the above-mentioned problems, the invention according to claim 1 of the present application is a grinding and grinding wheel in which particles soluble in a grinding and polishing liquid are contained in the grinding and grinding wheel. In the above, the abrasive grains and the soluble particles encapsulated in the synthetic resin microcapsules are dispersed and mixed in the binder of the synthetic resin. In the invention according to claim 2, the soluble particles encapsulated in the microcapsules are water-soluble neutral salts. In the invention according to claim 3, the soluble particles encapsulated in the microcapsules are water-soluble acids. In the invention according to claim 4, the soluble particles encapsulated in the microcapsules are water-soluble alkalis.

【0010】さらに、請求項5に係る発明は、研削研磨
用砥石の内部に研削研磨液に可溶な粒子を含有させた研
削研磨用砥石の製造方法において、合成樹脂を溶媒に溶
解する工程と、可溶性粒子をマイクロカプセルに封入す
る工程と、前記溶解した合成樹脂溶液に砥粒と前記マイ
クロカプセルとを混合する工程と、この混合体を乾燥し
た後、焼成する工程とから構成した。そして、可溶性粒
子をマイクロカプセルに封入する工程を、気中懸濁被覆
法、噴霧乾燥被覆法、噴霧凝固被覆法、液中乾燥被覆法
のいずれかとした。
Further, the invention according to claim 5 is a method of manufacturing a grindstone for grinding and polishing in which particles soluble in a grinding and polishing liquid are contained in a grindstone for grinding and polishing, and a step of dissolving a synthetic resin in a solvent, , A step of encapsulating the soluble particles in microcapsules, a step of mixing the dissolved synthetic resin solution with abrasive grains and the microcapsules, and a step of drying and firing the mixture. Then, the step of encapsulating the soluble particles in the microcapsules was any one of the air suspension coating method, the spray drying coating method, the spray coagulation coating method, and the liquid dry coating method.

【0011】[0011]

【作用】前記請求項1、5および6に係る発明にあって
は、可溶性粒子がマイクロカプセルにて完全に密封され
ているので、研削研磨加工時に研削研磨液が砥石中に浸
透しても可溶性粒子と接触することがなく、砥石の内部
構造中に気孔に生成することがない。また、マイクロカ
プセルは砥石表面にて被加工物と接触するとマイクロカ
プセルの膜材が摩擦により除去あるいは破られて、マイ
クロカプセル内の可溶性粒子が研削研磨液に触れて溶解
するので、砥石表面にのみチップポケットを配置させる
ことが可能となる。さらに、マイクロカプセル作製後に
固体物とマイクロカプセルとの間に摩擦を発生させるよ
うな工程がないことにより、マイクロカプセルの膜材が
外力により可溶性粒子から剥離するのを防止でき、砥石
中において可溶性粒子が研削研磨液に接触する確率を減
じることができる。
In the inventions according to claims 1, 5 and 6, since the soluble particles are completely sealed by the microcapsules, even if the grinding / polishing liquid penetrates into the grindstone during the grinding / polishing process, it is soluble. It does not come into contact with particles and does not form pores in the internal structure of the grindstone. Also, when the microcapsules come into contact with the work piece on the surface of the grindstone, the film material of the microcapsules is removed or broken by friction, and the soluble particles in the microcapsules come into contact with the grinding / polishing liquid and dissolve, so only on the grindstone surface. It becomes possible to arrange the chip pocket. Furthermore, since there is no step for generating friction between the solid material and the microcapsules after the production of the microcapsules, it is possible to prevent the film material of the microcapsules from being separated from the soluble particles by an external force, and the soluble particles in the grindstone. It is possible to reduce the probability of contact with the grinding / polishing liquid.

【0012】また、請求項2に係る発明にあっては、前
述したようにマイクロカプセルは被加工物との接触によ
り除去あるいは破られるため、マイクロカプセル内の中
性塩は砥石表面において研削研磨液に触れる。これによ
り研削研磨液に可溶な中性塩は溶解し、その粒径と等し
いチップポケットが砥石の表面のみ生成する。そして、
請求項3に係る発明にあっては、砥石表面において溶解
した水溶性の酸は研削研磨液の液性を酸性領域にする。
このとき、砥石表面には被加工物の加工面が当接してお
り、その加工面に酸を作用させることができ、耐酸性の
低い被加工物に侵食作用を与える。さらに、請求項4に
係る発明にあっては、砥石表面において溶解した水溶性
のアルカリは研削研磨液の液性をアルカリ性領域にす
る。このとき、砥石表面には被加工物の加工面が当接し
ており、その加工面にアルカリを作用することができ、
耐アルカリ性の低い被加工物に侵食作用を与える。
Further, in the invention according to claim 2, since the microcapsules are removed or broken by contact with the workpiece as described above, the neutral salt in the microcapsules is ground and polished on the surface of the grindstone. Touch. As a result, the neutral salt soluble in the grinding / polishing liquid is dissolved, and chip pockets having the same particle size are formed only on the surface of the grindstone. And
In the invention according to claim 3, the water-soluble acid dissolved on the surface of the grindstone causes the liquid property of the grinding / polishing liquid to be in the acidic region.
At this time, the processing surface of the workpiece is in contact with the surface of the grindstone, and acid can be applied to the processing surface, which gives an erosion effect to the workpiece having low acid resistance. Further, in the invention according to claim 4, the water-soluble alkali dissolved on the surface of the grindstone causes the liquid property of the grinding / polishing liquid to be in the alkaline region. At this time, the processing surface of the workpiece is in contact with the surface of the grindstone, and alkali can act on the processing surface,
Gives an erosion effect to the work piece with low alkali resistance.

【0013】[0013]

【実施例1】本願の請求項1、2、5および6に係る発
明の実施例を以下に説明する。図1は本発明の研削研磨
用砥石の製造方法における製造工程の実施例1を示す説
明図、図2は上記製造方法により製造した研削研磨用砥
石の実施例1を示す断面図である。本実施例では研削抵
抗の減少や目詰まりの防止を目的としたチップポケット
を生成するために、研削研磨液に可溶性の物質を砥石内
に配置させた研削研磨用砥石とその製造方法について説
明する。
Embodiment 1 An embodiment of the invention according to claims 1, 2, 5 and 6 of the present application will be described below. FIG. 1 is an explanatory view showing a first embodiment of a manufacturing process in a method for manufacturing a grinding and polishing grindstone of the present invention, and FIG. 2 is a sectional view showing a first embodiment of a grinding and polishing grindstone manufactured by the above manufacturing method. In this example, in order to generate chip pockets for the purpose of reducing grinding resistance and preventing clogging, a grinding and polishing grindstone in which a substance soluble in a grinding and polishing liquid is placed in the grindstone, and a manufacturing method thereof will be described. .

【0014】まず、図2を用いて本実施例の研削研磨用
砥石10を説明する。研削研磨用砥石10は、結合剤と
してのフェノール樹脂5内に、研削液に可溶な物質であ
る塩化ナトリウム粒子(粒径約100μm)1と、砥粒
である合成ダイヤモンド粒(粒径約5μm)4を分散配
置して形成され、塩化ナトリウム粒子1はポリイミド樹
脂2を膜材としたマイクロカプセル3内に封入されてい
る。
First, the grindstone 10 for grinding and polishing of this embodiment will be described with reference to FIG. The grindstone 10 for grinding and polishing has a sodium chloride particle (particle size of about 100 μm) 1 which is a substance soluble in a grinding fluid and a synthetic diamond particle (particle size of about 5 μm) which is a substance soluble in a grinding fluid, in a phenol resin 5 as a binder. 4) are dispersed and arranged, and the sodium chloride particles 1 are enclosed in microcapsules 3 in which the polyimide resin 2 is used as a film material.

【0015】次に、前記研削研磨用砥石10の製造方法
を図1、2に基づいて説明する。砥石10の結合材とな
るフェノール樹脂5の粉体とその溶媒となるメチルアル
コールとを重量比1:2となるように秤量し、混合・溶
解させて樹脂溶液を得る。また、チップポケットを生成
させるための可溶性物質として選択した塩化ナトリウム
粒子(粒径約100μm)1をポリイミド樹脂2を膜材
としたマイクロカプセル3に封入する。マイクロカプセ
ル3はWurster法(気中懸濁被覆法)、スプレー
ドライ法(噴霧乾燥法)等の周知の方法にて製造され
る。そして、砥粒となる合成ダイヤモンド粒4(粒径約
5μm)を集中度が25になるように秤量し、またマイ
クロカプセル3を集中度が10になるように秤量し、前
記樹脂溶液に添加する。そして、樹脂溶液中に合成ダイ
ヤモンド粒4とマイクロカプセル3とが均一に分散する
ように混合する。次に、この混合体を所望の形状に成形
型に注入し、真空脱泡により混合体中の気泡を除いた
後、50℃の乾燥炉中で乾燥させてフェノール樹脂5の
溶媒であるメチルアルコールを蒸発除去させる。そし
て、ここで得られた成形体を乾燥炉で180℃・12時
間の条件で焼成し、研削研磨用砥石10を得る。
Next, a method of manufacturing the grindstone 10 for grinding and polishing will be described with reference to FIGS. A powder of the phenolic resin 5 serving as a binder of the grindstone 10 and methyl alcohol serving as a solvent thereof are weighed in a weight ratio of 1: 2, mixed and dissolved to obtain a resin solution. Further, sodium chloride particles (particle size: about 100 μm) 1 selected as a soluble substance for generating a chip pocket are enclosed in a microcapsule 3 having a polyimide resin 2 as a film material. The microcapsules 3 are manufactured by a well-known method such as the Wurster method (air suspension coating method) and the spray drying method (spray drying method). Then, the synthetic diamond grains 4 (particle size: about 5 μm) as abrasive grains are weighed so that the concentration becomes 25, and the microcapsules 3 are weighed so that the concentration becomes 10, and added to the resin solution. . Then, the synthetic diamond particles 4 and the microcapsules 3 are mixed in the resin solution so as to be uniformly dispersed. Next, this mixture was poured into a molding die in a desired shape, the bubbles in the mixture were removed by vacuum defoaming, and the mixture was dried in a drying oven at 50 ° C. to obtain methyl alcohol which is a solvent for the phenol resin 5. Are removed by evaporation. Then, the molded body obtained here is fired in a drying furnace at 180 ° C. for 12 hours to obtain a grindstone 10 for grinding and polishing.

【0016】次に、本実施例の研削研磨砥石10とその
製造方法の作用を図3を用いて説明する。本実施例の研
削研磨用砥石10にあっては、自らが溶出してチップポ
ケットを生成させる塩化ナトリウム粒子1は砥石10内
においてポリイミド樹脂2を膜材としたマイクロカプセ
ル3内に密封されているので、砥石10内に浸透する研
削液6に直接触れることがないため、塩化ナトリウム粒
子1は研削液6に溶解せず、砥石10内部においてチッ
プポケット8を生成することがない。これにより、可溶
性粒子である塩化ナトリウムが砥石10の強度を担う構
成要素の一部となっているにもかかわらず、砥石10の
強度が低下することがない。また、マイクロカプセル3
は砥石10の表面に現れて被加工物7と接触すると、膜
材であるポリイミド樹脂2が被加工物7との摩擦により
除去され、塩化ナトリウム粒子1が表面に現れる。表面
に現れた塩化ナトリウム粒子1は研削液6と接触し、研
削液6中に溶解する。この塩化ナトリウム粒子1の溶出
した痕跡がチップポケット8となって砥石10の表面に
形成され、加工により生じる研削屑の逃げ場となり目詰
まりを防止する。また、本実施例の研削研磨砥石10の
製造方法にあっては、研削液6に可溶な塩化ナトリウム
粒子1を研削液6に不溶なポリイミド樹脂2により被覆
してマイクロカプセル化した状態で、砥石10内に分散
配置しているので、マイクロカプセル3と被加工物7と
が接触する砥石10の表面においてのみチップポケット
を生じさせることができ、目詰まり防止を実現させるだ
けでなく、砥石10内部においてチップポケット8を生
じさせないことにより砥石強度の維持された砥石を作製
することができる。
Next, the operation of the grinding / polishing grindstone 10 of this embodiment and its manufacturing method will be described with reference to FIG. In the grindstone 10 for grinding and polishing of the present embodiment, sodium chloride particles 1 which elute by themselves to generate chip pockets are sealed in the microcapsules 3 in which the polyimide resin 2 is a film material in the grindstone 10. Therefore, since the grinding fluid 6 penetrating into the grindstone 10 is not directly touched, the sodium chloride particles 1 are not dissolved in the grinding fluid 6 and the chip pocket 8 is not formed inside the grindstone 10. As a result, the strength of the grindstone 10 does not decrease even though sodium chloride, which is a soluble particle, is a part of the constituent elements that bear the strength of the grindstone 10. In addition, microcapsule 3
When appears on the surface of the grindstone 10 and comes into contact with the workpiece 7, the polyimide resin 2 as a film material is removed by friction with the workpiece 7, and sodium chloride particles 1 appear on the surface. The sodium chloride particles 1 appearing on the surface come into contact with the grinding fluid 6 and dissolve in the grinding fluid 6. The traces of the eluted sodium chloride particles 1 become chip pockets 8 and are formed on the surface of the grindstone 10, which serves as an escape area for grinding dust generated by processing and prevents clogging. Further, in the method for manufacturing the grinding and polishing whetstone 10 of the present embodiment, the sodium chloride particles 1 soluble in the grinding fluid 6 are coated with the polyimide resin 2 insoluble in the grinding fluid 6 and are microencapsulated. Since they are dispersed in the grindstone 10, chip pockets can be generated only on the surface of the grindstone 10 in which the microcapsules 3 and the workpiece 7 are in contact, and not only can the clogging be prevented, but also the grindstone 10 By not producing the chip pockets 8 inside, it is possible to manufacture a grindstone in which the strength of the grindstone is maintained.

【0017】本実施例によれば、研削研磨用砥石10の
製造に際し、予め自らが溶出することによってチップポ
ケット8を生成する可溶性粒子である塩化ナトリウム粒
子1を研削液6に不溶な樹脂でマイクロカプセル化して
密封してから砥石10中に配置させるので、砥石10中
の可溶性粒子の溶出による砥石10の強度の低下を防ぐ
ことができる。これにより、目詰まりが防止されるだけ
でなく、より面精度の高い加工面を得ることができる。
According to the present embodiment, when the grindstone 10 for grinding and polishing is manufactured, the sodium chloride particles 1 which are soluble particles which generate the chip pockets 8 by being preliminarily dissolved by themselves are micro-ized by a resin insoluble in the grinding fluid 6. Since it is placed in the grindstone 10 after being encapsulated and sealed, it is possible to prevent the strength of the grindstone 10 from decreasing due to the elution of soluble particles in the grindstone 10. As a result, not only clogging is prevented, but also a machined surface with higher surface accuracy can be obtained.

【0018】本実施例では可溶性物質に塩化ナトリウム
を用いた場合を例示したが、塩化カリウム・塩化カルシ
ウム・炭酸ナトリウム、臭化ナトリウム・臭化カリウム
等の水溶性の中性塩を用いることができ、かかる場合に
あっても、上記実施例と同様な作用、効果を奏すること
ができる。
In this embodiment, the case where sodium chloride is used as the soluble substance is exemplified, but a water-soluble neutral salt such as potassium chloride / calcium chloride / sodium carbonate or sodium bromide / potassium bromide can be used. Even in such a case, the same operation and effect as those of the above-described embodiment can be obtained.

【0019】[0019]

【実施例2】本願の請求項1、3、5および6に係る発
明の実施例を以下に説明する。図4は本発明の研削研磨
用砥石の製造方法における製造工程の実施例2を示す説
明図である。本実施例では化学的な研削能力向上とチッ
プポケットの生成を目的とした可溶性物質を砥石内に配
置させた研削研磨用砥石とのその製造方法について説明
する。
Embodiment 2 An embodiment of the invention according to claims 1, 3, 5 and 6 of the present application will be described below. FIG. 4 is an explanatory view showing a second embodiment of the manufacturing process in the method for manufacturing the grinding and polishing grindstone of the present invention. In this embodiment, a grindstone for grinding and polishing in which a soluble substance is placed in the grindstone for the purpose of improving the chemical grinding ability and forming chip pockets, and a method for manufacturing the grindstone.

【0020】本実施例の砥石は、結合剤としてのフェノ
ール樹脂内に、研磨液に可溶な物質である硝酸セリウム
アンモニウム粒子(粒径約50μm)と、砥粒である酸
化セリウム粉体(粒径約1μm)を分散配置して形成さ
れ、硝酸セリウムアンモウニム粒子は、ポリイミド樹脂
を膜材としたマイクロカプセル内に封入されている。
In the grindstone of this embodiment, cerium ammonium nitrate particles (particle diameter of about 50 μm), which is a substance soluble in the polishing liquid, and cerium oxide powder (particles, which are abrasive particles) are contained in a phenol resin as a binder. The cerium nitrate ammonium particles are formed by arranging dispersed particles having a diameter of about 1 μm), and the cerium nitrate ammonium particles are enclosed in microcapsules using a polyimide resin as a film material.

【0021】次に、砥石の製造方法を図4に基づいて説
明する。砥石の結合材となるフェノール樹脂5の粉体と
その溶媒となるメチルアルコールとを重量比が1:2に
なるように秤量し、混合・溶解させて樹脂溶液を得る。
また、化学的な研削能力向上とチップポケットの生成の
ための可溶性物質として選択した硝酸セリウムアンモニ
ウム粒子(粒径約50μm)をポリイミド樹脂を膜材と
したマイクロカプセルに封入する。砥粒となる酸化セリ
ウム粉体(粒径約1μm)を成形品(砥石)の45vo
l%になるように秤量し、またマイクロカプセルを35
vol%になるように秤量し、前記樹脂溶剤液に添加す
る。そして、樹脂溶液中に酸化セリウム粉体とマイクロ
カプセルとが均一に分散するように混合する。次にこの
混合体を所望の形状の成形型に注入し、真空脱泡により
混合体中の気泡を除いた後、50℃の乾燥炉中で乾燥さ
せてフェノール樹脂の溶媒であるメチルアルコールを蒸
発除去させる。そして、ここで得られた成形体を乾燥炉
で180℃・12時間の条件で焼成し、研削研磨用砥石
を得る。
Next, a method for manufacturing a grindstone will be described with reference to FIG. A powder of the phenolic resin 5 as a binder of the grindstone and methyl alcohol as a solvent thereof are weighed in a weight ratio of 1: 2, mixed and dissolved to obtain a resin solution.
Also, cerium ammonium nitrate particles (particle size of about 50 μm) selected as a soluble substance for improving chemical grinding ability and generation of chip pockets are encapsulated in microcapsules having a polyimide resin as a film material. 45 vo of cerium oxide powder (particle size about 1 μm) to be the abrasive grain of the molded product (grinding stone)
Weigh to 1% and add 35 microcapsules.
It is weighed so as to be vol% and added to the resin solvent solution. Then, the cerium oxide powder and the microcapsules are mixed in the resin solution so as to be uniformly dispersed. Then, the mixture is poured into a mold having a desired shape, and the bubbles in the mixture are removed by vacuum defoaming, followed by drying in a drying oven at 50 ° C. to evaporate methyl alcohol which is a solvent for the phenol resin. To remove. Then, the molded body obtained here is fired in a drying furnace at 180 ° C. for 12 hours to obtain a grindstone for grinding and polishing.

【0022】本実施例の研削研磨用砥石とその製造方法
によれば、実施例1と同様に砥石内部の可溶性粒子の溶
出による砥石強度の低下を防ぎつつ、砥石表面に目詰ま
りを有効に防止するチップポケットを生成させることが
できるのはもちろんのこと、被加工物に酸の作用を与え
て加工効率を向上させる硝酸セリウムアンモニウムの可
溶性物質が砥石と被加工物である硝材との界面でのみ研
磨液に溶解することになるので、高濃度の可溶性物質溶
液が被加工物に作用することになり、可溶性物質の化学
作用能力を充分に生かすことができ、特に耐酸性の低い
ガラスの加工効率を向上し得るという利点がある。
According to the grindstone for grinding and polishing of this embodiment and the method for manufacturing the same, the clogging of the surface of the grindstone is effectively prevented while the strength of the grindstone is prevented from being lowered due to the elution of soluble particles in the grindstone as in the case of the first embodiment. In addition to the ability to generate chip pockets, the soluble substance of cerium ammonium nitrate, which imparts the action of acid to the work piece to improve the working efficiency, is only at the interface between the grindstone and the glass material that is the work piece. Since it will dissolve in the polishing liquid, a high-concentration soluble substance solution will act on the work piece, making it possible to fully utilize the chemical action capacity of the soluble substance, and especially the processing efficiency of glass with low acid resistance. Can be improved.

【0023】本実施例では可溶性物質に硝酸セリウムア
ンモニウムを用いた場合を挙げたが、クエン酸・フタル
酸・ピコリン酸・EDTA2Na等の水溶性の酸を用い
ることができ、かかる場合にあっても上記実施例2と同
様な作用、効果を奏することができる。
In this embodiment, cerium ammonium nitrate was used as the soluble substance, but a water-soluble acid such as citric acid, phthalic acid, picolinic acid or EDTA2Na can be used, and even in such a case. The same action and effect as those of the above-described second embodiment can be obtained.

【0024】[0024]

【実施例3】本願の請求項1、4、5および6に係る発
明の実施例を以下に説明する。本実施例の研削研磨用砥
石とその製造方法は、可溶性物質に水酸化ナトリウムを
用いた点を除き、前記実施例2と同様である。
[Embodiment 3] An embodiment of the invention according to claims 1, 4, 5 and 6 of the present application will be described below. The grindstone for grinding and polishing and the method for manufacturing the same in this example are the same as those in Example 2 except that sodium hydroxide was used as the soluble substance.

【0025】第1実施例と同様の効果が得られるのはも
ちろんのこと、被加工物にアルカリの作用を与えて加工
効率を向上させる水酸化ナトリウムの可溶性物質が砥石
と被加工物であるガラスとの界面でのみ研磨液に溶解す
ることになるので、高濃度の可溶性物質溶液が被加工物
に作用することになり、可溶性物質の化学的作用能力に
生かすことができ、特に耐アルカリ性の低いガラスの加
工効率を向上し得るという利点がある。
Not only the same effects as those of the first embodiment can be obtained, but also the soluble substance of sodium hydroxide which gives the action of the alkali to the workpiece to improve the processing efficiency is the grindstone and the glass to be processed. Since it will dissolve in the polishing liquid only at the interface with the, the high-concentration soluble substance solution will act on the work piece, and it will be possible to make use of the chemical action capacity of the soluble substance, and especially the low alkali resistance. There is an advantage that the processing efficiency of glass can be improved.

【0026】本実施例では可溶性物質に水酸化ナトリウ
ムを用いた場合を挙げたが、水酸化カリウム等の水溶性
のアルカリを用いることができ、かかる場合にあっても
上記実施例3と同様な作用、効果を得ることができる。
In this example, the case where sodium hydroxide was used as the soluble substance was described, but a water-soluble alkali such as potassium hydroxide can be used, and in such a case, the same as in Example 3 above. The action and effect can be obtained.

【0027】上述の実施例1、2、3では、砥粒に合成
ダイヤモンド、酸化セリウムおよび結合材にフェノール
樹脂を用いたが、酸化ジルコニウム、酸化アルミニウ
ム、CBN、SiC、べんがら等の砥粒およびエポキシ
系、ポリイミド樹脂等の合成樹脂を用いてもよい。そし
て、砥粒、結合材、可溶性物質は任意の組み合わせを取
ることができる。また、可溶性粒子をマイクロカプセル
化する方法は、可溶性粒子の物性、粒径等により可溶性
粒子を研削研磨液から確実に隔離・保護できる方法を気
中懸濁法、噴霧乾燥法、噴霧凝固法、液中乾燥法等の周
知の手段より選択することができる。
In the above-mentioned Examples 1, 2 and 3, synthetic diamond, cerium oxide was used for the abrasive grains and phenol resin was used for the binder. However, the abrasive grains such as zirconium oxide, aluminum oxide, CBN, SiC and red iron oxide and epoxy were used. A system, a synthetic resin such as a polyimide resin may be used. Further, the abrasive grains, the bonding material, and the soluble substance can take any combination. In addition, the method of microencapsulating the soluble particles, the physical properties of the soluble particles, the method of reliably separating and protecting the soluble particles from the grinding and polishing liquid depending on the particle size, etc., is an air suspension method, a spray drying method, a spray coagulation method, It can be selected from well-known means such as an in-liquid drying method.

【0028】[0028]

【発明の効果】本願の各請求項に係る発明は、以下のよ
うな効果を奏することができる。 [請求項1、5、6の効果]研削研磨液に可溶を粒子を
合成樹脂のマイクロカプセルに封入した状態で可溶性粒
子を研削研磨用砥石内に配置したので、可溶性粒子が砥
石内部で研削研磨液に溶解しない。このため、可溶性粒
子を砥石中に配置しても砥石の強度が維持され、被加工
物の面精度を低下させることがない。さらに、マイクロ
カプセルは、砥石の表面に露出したときに被加工物との
接触により除去あるいは破られるため、マイクロカプセ
ル内の可溶性粒子が研削研磨液に溶解して砥石の表面に
チップポケットが生成されるので、砥石表面の目詰まり
を防止でき、研削研磨抵抗を低減させることができる。 [請求項2の効果]研削研磨用砥石の目詰まりを防止す
るとともに、研削研磨抵抗の低減を実現させることがで
きる。また、研削研磨液の性質を変えることがなく、被
加工物の耐酸性、耐アルカリ性の如何にかかわらず使用
することができる。 [請求項3の効果]研削研磨用砥石の目詰まりを防止で
きるとともに、研削研磨抵抗を低減させることができ
る。また、耐酸性の低い被加工物、例えばガラスの加工
速度を向上させることができる。 [請求項4の効果]研削研磨用砥石の目詰まりを防止で
きるとともに、研削研磨抵抗を低減させることができ
る。また、耐アルカリ性の低い被加工物、例えばガラス
の加工速度を向上させることができる。
The invention according to each of the claims of the present application can exert the following effects. [Effects of Claims 1, 5, and 6] Since the soluble particles are placed in the grinding stone for grinding and polishing while the particles are soluble in the grinding and polishing liquid and are encapsulated in the synthetic resin microcapsules, the soluble particles are ground inside the grinding stone. Does not dissolve in polishing liquid. Therefore, even if the soluble particles are arranged in the grindstone, the strength of the grindstone is maintained and the surface accuracy of the workpiece is not deteriorated. Further, when the microcapsules are exposed or exposed to the surface of the grindstone, the microcapsules are removed or broken by contact with the workpiece, so that the soluble particles in the microcapsules are dissolved in the grinding / polishing liquid to generate chip pockets on the surface of the grindstone. Therefore, the surface of the grindstone can be prevented from being clogged, and the grinding and polishing resistance can be reduced. [Effect of Claim 2] It is possible to prevent clogging of the grindstone for grinding and polishing and realize reduction of grinding and polishing resistance. Further, it can be used regardless of the acid resistance and alkali resistance of the work piece without changing the properties of the grinding and polishing liquid. [Effect of claim 3] It is possible to prevent clogging of the grindstone for grinding and polishing and reduce the grinding and polishing resistance. Further, it is possible to improve the processing speed of a work piece having low acid resistance, for example, glass. [Effect of Claim 4] It is possible to prevent clogging of the grindstone for grinding and polishing and to reduce the grinding and polishing resistance. Further, it is possible to improve the processing speed of a workpiece having low alkali resistance, for example, glass.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明の実施例の製造工程を示す説明図であ
る。
FIG. 1 is an explanatory view showing a manufacturing process according to an embodiment of the present invention.

【図2】本発明の実施例1の研削研磨用砥石を示す断面
図である。
FIG. 2 is a sectional view showing a grindstone for grinding and polishing according to a first embodiment of the present invention.

【図3】本発明の実施例1の研削研磨用砥石の作用を説
明するための断面図である。
FIG. 3 is a cross-sectional view for explaining the action of the grindstone for grinding and polishing of Example 1 of the present invention.

【図4】本発明の実施例2の製造工程を示す説明図であ
る。
FIG. 4 is an explanatory diagram showing a manufacturing process of a second embodiment of the present invention.

【図5】従来の研削研磨用砥石の製造工程を示す説明図
である。
FIG. 5 is an explanatory view showing a manufacturing process of a conventional grinding and polishing whetstone.

【符号の説明】[Explanation of symbols]

1 塩化ナトリウム粒子 2 ポリイミド樹脂 3 マイクロカプセル 4 合成ダイヤモンド粒 5 フェノール樹脂 6 研削液 7 被加工物 8 チップポケット 10 研削研磨用砥石 1 Sodium Chloride Particles 2 Polyimide Resin 3 Micro Capsules 4 Synthetic Diamond Grains 5 Phenolic Resin 6 Grinding Fluid 7 Workpiece 8 Chip Pocket 10 Grinding / Grinding Stone

Claims (6)

【特許請求の範囲】[Claims] 【請求項1】 研削研磨用砥石の内部に研削研磨液に可
溶な粒子を含有させた研削研磨用砥石において、砥粒
と、合成樹脂のマイクロカプセルに封入した可溶性粒子
とを合成樹脂の結合剤内に分散して構成したことを特徴
とする研削研磨用砥石。
1. A grinding / polishing grindstone in which particles that are soluble in a grinding / polishing liquid are contained in a grind / polishing grindstone, in which abrasive grains and soluble particles encapsulated in a synthetic resin microcapsule are bonded to a synthetic resin. A grindstone for grinding and polishing, characterized in that it is dispersed in the agent.
【請求項2】 可溶性粒子が水溶性の中性塩であること
を特徴とする請求項1記載の研削研磨用砥石。
2. The grindstone for grinding and polishing according to claim 1, wherein the soluble particles are water-soluble neutral salts.
【請求項3】 可溶性粒子が水溶性の酸であることを特
徴とする請求項1記載の研削研磨用砥石。
3. The grindstone for grinding and polishing according to claim 1, wherein the soluble particles are water-soluble acids.
【請求項4】 可溶性粒子が水溶性のアルカリであるこ
とを特徴とする請求項1記載の研削研磨用砥石。
4. The grindstone for grinding and polishing according to claim 1, wherein the soluble particles are water-soluble alkalis.
【請求項5】 研削研磨用砥石の内部に研削研磨液に可
溶な粒子を含有させた研削研磨用砥石の製造方法におい
て、合成樹脂を溶媒に溶解する工程と、可溶性粒子をマ
イクロカプセルに封入する工程と、前記溶解した合成樹
脂溶液に砥粒と前記マイクロカプセルとを混合する工程
と、この混合体を乾燥した後、焼成する工程とからなる
ことを特徴とする研削研磨用砥石の製造方法。
5. A method of manufacturing a grinding and polishing grindstone in which particles that are soluble in a grinding and polishing liquid are contained inside a grinding and grindstone, and a step of dissolving a synthetic resin in a solvent and encapsulating the soluble particles in microcapsules. And a step of mixing abrasive grains and the microcapsules in the dissolved synthetic resin solution, and a step of drying the mixture and then firing the mixture, a method for manufacturing a grindstone for grinding and polishing. .
【請求項6】 可溶性粒子をマイクロカプセルに封入す
る工程が、気中懸濁被覆法・噴霧乾燥被覆法・噴霧凝固
被覆法・液中乾燥被覆法のいずれかであることを特徴と
する請求項5記載の研削研磨用砥石の製造方法。
6. The step of encapsulating the soluble particles in microcapsules is any one of an air suspension coating method, a spray drying coating method, a spray coagulation coating method, and a liquid dry coating method. 5. The method for producing a grindstone for grinding and polishing according to 5.
JP04494394A 1994-02-17 1994-02-17 Grinding wheel Expired - Fee Related JP3313232B2 (en)

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JP04494394A JP3313232B2 (en) 1994-02-17 1994-02-17 Grinding wheel

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP04494394A JP3313232B2 (en) 1994-02-17 1994-02-17 Grinding wheel

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JPH07227765A true JPH07227765A (en) 1995-08-29
JP3313232B2 JP3313232B2 (en) 2002-08-12

Family

ID=12705573

Family Applications (1)

Application Number Title Priority Date Filing Date
JP04494394A Expired - Fee Related JP3313232B2 (en) 1994-02-17 1994-02-17 Grinding wheel

Country Status (1)

Country Link
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Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5876266A (en) * 1997-07-15 1999-03-02 International Business Machines Corporation Polishing pad with controlled release of desired micro-encapsulated polishing agents
EP1078717A2 (en) * 1999-08-02 2001-02-28 Ebara Corporation Fixed abrasive polishing tool
US6383238B1 (en) 1999-08-17 2002-05-07 Mitsubishi Materials Corporation Resin bonded abrasive tool
KR100446248B1 (en) * 2001-12-17 2004-08-30 최창호 Polymeric Polishing Pad including Polishing Microparticles
CN110788743A (en) * 2019-09-23 2020-02-14 湖南科技大学 Magnetic field controllable slow-release magnetic substance thickening fluid flow polishing pad and polishing method

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5876266A (en) * 1997-07-15 1999-03-02 International Business Machines Corporation Polishing pad with controlled release of desired micro-encapsulated polishing agents
EP1078717A2 (en) * 1999-08-02 2001-02-28 Ebara Corporation Fixed abrasive polishing tool
EP1078717A3 (en) * 1999-08-02 2003-07-09 Ebara Corporation Fixed abrasive polishing tool
US6383238B1 (en) 1999-08-17 2002-05-07 Mitsubishi Materials Corporation Resin bonded abrasive tool
KR100446248B1 (en) * 2001-12-17 2004-08-30 최창호 Polymeric Polishing Pad including Polishing Microparticles
CN110788743A (en) * 2019-09-23 2020-02-14 湖南科技大学 Magnetic field controllable slow-release magnetic substance thickening fluid flow polishing pad and polishing method
CN110788743B (en) * 2019-09-23 2021-11-09 湖南科技大学 Magnetic field controllable slow-release magnetic substance thickening fluid flow polishing pad and polishing method

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