JP3307361B2 - 高周波バイポーラトランジスタ - Google Patents

高周波バイポーラトランジスタ

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Publication number
JP3307361B2
JP3307361B2 JP12009099A JP12009099A JP3307361B2 JP 3307361 B2 JP3307361 B2 JP 3307361B2 JP 12009099 A JP12009099 A JP 12009099A JP 12009099 A JP12009099 A JP 12009099A JP 3307361 B2 JP3307361 B2 JP 3307361B2
Authority
JP
Japan
Prior art keywords
electrode
collector
bipolar transistor
emitter
base
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP12009099A
Other languages
English (en)
Other versions
JP2000311976A (ja
Inventor
博 加藤
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp filed Critical NEC Corp
Priority to JP12009099A priority Critical patent/JP3307361B2/ja
Priority to DE10019250A priority patent/DE10019250A1/de
Priority to KR10-2000-0022372A priority patent/KR100447460B1/ko
Publication of JP2000311976A publication Critical patent/JP2000311976A/ja
Application granted granted Critical
Publication of JP3307361B2 publication Critical patent/JP3307361B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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    • H01L2924/15738Material with a principal constituent of the material being a metal or a metalloid, e.g. boron [B], silicon [Si], germanium [Ge], arsenic [As], antimony [Sb], tellurium [Te] and polonium [Po], and alloys thereof the principal constituent melting at a temperature of greater than or equal to 950 C and less than 1550 C
    • H01L2924/15747Copper [Cu] as principal constituent
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/15Details of package parts other than the semiconductor or other solid state devices to be connected
    • H01L2924/181Encapsulation
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/15Details of package parts other than the semiconductor or other solid state devices to be connected
    • H01L2924/181Encapsulation
    • H01L2924/183Connection portion, e.g. seal
    • H01L2924/18301Connection portion, e.g. seal being an anchoring portion, i.e. mechanical interlocking between the encapsulation resin and another package part
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/30Technical effects
    • H01L2924/301Electrical effects
    • H01L2924/30107Inductance

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  • Condensed Matter Physics & Semiconductors (AREA)
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  • Ceramic Engineering (AREA)
  • Bipolar Transistors (AREA)
  • Structures Or Materials For Encapsulating Or Coating Semiconductor Devices Or Solid State Devices (AREA)

Description

【発明の詳細な説明】
【0001】
【発明の属する技術分野】本発明は、高周波バイポーラ
トランジスタに係わり、特に、遮断周波数を上昇させ、
高周波特性を改善した高周波バイポーラトランジスタに
関する。
【0002】
【従来の技術】主な高周波特性である遮断周波数f
次式で示される。 f=1/2π(τe+τb+τc+τx) τe=kTCte/qIc τb=WB/NDn Dn=kTμB τc=rcs*Ccb τx=Xs/2vx ここで、k:ボルツマン定数 T:絶対温度 Cte:エミッタ容量 q :電子の単位電価量 Ic :コレクタ電流 WB:ベース幅 N :定数 μB:電子の移動度 rcs:コレクタ対抗 Ccb:コレクタ容量 Xs :コレクタ空乏層幅 vx :コレクタ空乏層走行飽和速度 このように、fは、コレクタ容量によって増減する。
コレクタ容量を極力小さくすることがf向上には望ま
しいが、実際の半導体装置には能動部のコレクタ容量だ
けでなくパッケージによる容量、即ち、寄生容量が存在
し、f向上のさまたげになっている。例えば、図3
示した特開平6−224320号公報のトランジスタで
は、ベース電極11とコレクタ電極13とが隣り合うか
ら、1.0mm×0.5mmサイズのパッケージでは、
0.1pFのパッケージ寄生容量が存在し、この為、遮
断周波数の上昇には、限度があった。
【0003】
【発明が解決しようとする課題】本発明の目的は、上記
した従来技術の欠点を改良し、特に、遮断周波数を上昇
させ、高周波特性を改善した新規な高周波バイポーラト
ランジスタを提供するものである。
【0004】
【課題を解決するための手段】本発明は上記した目的を
達成するため、基本的には、以下に記載されたような技
術構成を採用するものである。即ち、本発明に係わる高
周波バイポーラトランジスタの態様は、半導体チップ
と、リードフレームのベース、コレクタ、エミッタ電極
と、前記半導体チップのボンディングパッドと前記各電
極とを接続するボンディングワイヤと、これらを封止す
る封止樹脂とで構成したエミッタ接地回路で用いるリー
ドレスパッケージ構造の高周波バイポーラトランジスタ
において、前記半導体チップを前記エミッタ電極上に配
置し、前記エミッタ電極を挟んで、前記ベース電極、前
記コレクタ電極を設け、前記各電極を前記封止樹脂の側
面の内側に存在するように配置し、前記各電極の一部を
前記封止樹脂の下面のみから露出せしめたことを特徴と
するものである。
【0005】
【発明の実施の形態】本発明に係わる高周波バイポーラ
トランジスタは、半導体チップと、この半導体チップの
ベース、コレクタ、エミッタ電極と、前記半導体チップ
のボンディングパッドと前記各電極とを接続するボンデ
ィングワイヤと、これらを封止する封止樹脂とで構成し
た高周波バイポーラトランジスタにおいて、前記半導体
チップをエミッタ電極上に配置し、前記エミッタ電極を
挟んで、ベース電極、コレクタ電極を設けたことを特徴
とするものである。
【0006】本発明のトランジスタは、特に、エミッタ
接地回路に用いて顕著な効果を奏する。
【0007】
【実施例】以下に、本発明に係わる高周波バイポーラト
ランジスタの具体例を図面を参照しながら詳細に説明す
る。 (第1の具体例)図1(a),(b)は、本発明に係わ
る高周波バイポーラトランジスタの第1の具体例の構造
を示す図であって、これらの図には、半導体チップ1
と、この半導体チップ1のベース、コレクタ、エミッタ
電極3、4、2と、前記半導体チップ1のボンディング
パッドと前記各電極3、4、2とを接続するボンディン
グワイヤ6、7、5と、これらを封止する封止樹脂8と
で構成した高周波バイポーラトランジスタにおいて、前
記半導体チップ1をエミッタ電極2上に配置し、前記エ
ミッタ電極2を挟んで、ベース電極3、コレクタ電極4
を設けたことを特徴とする高周波バイポーラトランジス
タが示されている。
【0008】また、前記夫々の電極の一部を封止樹脂8
より露出せしめたリードレスパッケージであることを特
徴とする高周波バイポーラトランジスタが示され、更
に、前記電極2、3、4は、封止樹脂8の一方の面8a
にのみ露出せしめた高周波バイポーラトランジスタが示
されている。以下に、第1の具体例を図1を用いて、更
に詳細に説明する。
【0009】エミッタ電極2は、ベース電極3とコレク
タ電極4の間にあり、エミッタ電極2、ベース電極3、
コレクタ電極4の一端は、封止樹脂8より一部が露出し
ており、本発明の本半導体装置を基板(図示していな
い)に実装する際、基板の配線パターンと接触するよう
に構成している。エミッタ電極2上に半導体チップ1が
搭載され、チップ1上のエミッタボンディングパッドと
エミッタ電極2とがエミッタボンディングワイヤ5を介
し接続され、チップ1上のベースボンディングパッドと
ベース電極3とがベースボンディングワイヤ6を介し接
続され、同様に、チップ1上に形成されたコレクタボン
ディングパッドとコレクタ電極4とはコレクタボンディ
ングワイヤ7を介し接続されている。
【0010】エミッタ電極2、ベース電極3、コレクタ
電極4の一端は、封止樹脂8より下方に露出しており、
基板に実装される際、基板の引き出し電極と接触する。
また、エミッタ電極2、ベース電極3、コレクタ電極4
を、半導体装置上面から見た場合、樹脂の内側に存在
し、樹脂の外側には存在しない(図1)。次に、本発
明の半導体装置の製造方法について説明する。
【0011】初めに、銅製のリードフレームのエミッタ
電極となる部分を写真食刻法を用いて0.05mmエッ
チングし、凹部を形成する。続いて、銀をリードフレー
ムにめっきし、金型を用いたプレス法でベース電極3、
エミッタ電極2、コレクタ電極4に分離する。続いて、
チップ1を銀ペースト等の接続材を用いて、エミッタ電
極2上に搭載する。接続材はこの他、金アンチモンや金
すずや、金シリコン共晶などを用いてもよい。次に、金
線からなるベースボンディングワイヤ6、コレクタボン
ディング7、エミッタボンディングワイヤ5を用いて、
チップ1上に設けたベースボンディングパット、エミッ
タボンディングパット、コレクタボンディングパットと
ベース電極3、エミッタ電極2、コレクタ電極4とを夫
々接続する。
【0012】次に、縦1mm、横0.5mm、高さ0.
3mmとなるように封入金型を用いて、エポキシ系樹脂
を金型に封入し、整形する。この際、樹脂の外に余分に
はみ出していたベース電極3、エミッタ電極2、コレク
タ電極4は切り取られる。この整形はダイシング法を用
いる。最後に、露出しているベース電極3、エミッタ電
極2、コレクタ電極4上を半田めっきし、ベース電極
3、エミッタ電極2、コレクタ電極4に半田層を形成す
る。
【0013】図3の従来例の場合、1.0mm×0.5
mmサイズのパッケージでは、0.1pFのパッケージ
寄生容量が存在したが、この具体例では、0.01pF
であり、従来の1/10にすることが出来た。また、上
記トランジスタをエミッタ接地で用いる場合、従来のト
ランジスタのCcbが0.05pFの場合、fTが20
GHzであるのに対し、本具体例の半導体装置では、2
5GHzと良好な値を得ることが出来た。 (第2の具体例) 図2(a),(b)は、本発明に係わる高周波バイポー
ラトランジスタの第2の具体例の構造を示す図であっ
て、これらの図には、前記半導体チップ1をコレクタ電
極4上に配置し、前記エミッタ電極2を挟んで、ベース
電極3、コレクタ電極4を設けたことを特徴とする高周
波バイポーラトランジスタが示されている。
【0014】この場合、各ボンディグワイヤはインダク
タンスを小さくするため、複数本形成できるから、利得
も更に向上できる等の効果を有する。
【0015】
【0016】
【発明の効果】本発明に係わる高周波バイポーラトラン
ジスタは、上述のように構成したので、特に、エミッタ
接地回路で用いた場合、コレクタ容量が小さくなり、従
って、遮断周波数が上昇し、高周波特性を改善すること
が出来る。
【図面の簡単な説明】
【図1】本発明に係わる高周波バイポーラトランジスタ
の第1の具体例を示す図である。
【図2】本発明の第2の具体例を示す図である。
【図3】従来例を示す図である。
───────────────────────────────────────────────────── フロントページの続き (56)参考文献 特開 平10−247713(JP,A) 特開 昭59−208756(JP,A) 特開 平11−3953(JP,A) 特開 昭63−146453(JP,A) 特開 平10−98133(JP,A) 特開 平9−237882(JP,A) 特開 平6−224320(JP,A) 特開 平9−298256(JP,A) 特開 昭62−281458(JP,A) (58)調査した分野(Int.Cl.7,DB名) H01L 23/48

Claims (1)

    (57)【特許請求の範囲】
  1. 【請求項1】 半導体チップと、リードフレームのベー
    ス、コレクタ、エミッタ電極と、前記半導体チップのボ
    ンディングパッドと前記各電極とを接続するボンディン
    グワイヤと、これらを封止する封止樹脂とで構成したエ
    ミッタ接地回路で用いるリードレスパッケージ構造の
    周波バイポーラトランジスタにおいて、 前記半導体チップを前記エミッタ電極上に配置し、前記
    エミッタ電極を挟んで、前記ベース電極、前記コレクタ
    電極を設け、前記各電極を前記封止樹脂の側面の内側に
    存在するように配置し、前記各電極の一部を前記封止樹
    脂の下面のみから露出せしめたことを特徴とする高周波
    バイポーラトランジスタ。
JP12009099A 1999-04-27 1999-04-27 高周波バイポーラトランジスタ Expired - Fee Related JP3307361B2 (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP12009099A JP3307361B2 (ja) 1999-04-27 1999-04-27 高周波バイポーラトランジスタ
DE10019250A DE10019250A1 (de) 1999-04-27 2000-04-18 Bipolarer Hochfrequenztransistor
KR10-2000-0022372A KR100447460B1 (ko) 1999-04-27 2000-04-27 고주파 바이폴라 트랜지스터

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP12009099A JP3307361B2 (ja) 1999-04-27 1999-04-27 高周波バイポーラトランジスタ

Publications (2)

Publication Number Publication Date
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JP3307361B2 true JP3307361B2 (ja) 2002-07-24

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Country Status (3)

Country Link
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DE (1) DE10019250A1 (ja)

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5410465B2 (ja) * 2011-02-24 2014-02-05 ローム株式会社 半導体装置および半導体装置の製造方法

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06260563A (ja) * 1993-03-03 1994-09-16 Mitsubishi Electric Corp トランジスタ用パッケージ

Also Published As

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KR100447460B1 (ko) 2004-09-07
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DE10019250A1 (de) 2001-03-15

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