JP3216626B2 - Amplifier - Google Patents

Amplifier

Info

Publication number
JP3216626B2
JP3216626B2 JP01253799A JP1253799A JP3216626B2 JP 3216626 B2 JP3216626 B2 JP 3216626B2 JP 01253799 A JP01253799 A JP 01253799A JP 1253799 A JP1253799 A JP 1253799A JP 3216626 B2 JP3216626 B2 JP 3216626B2
Authority
JP
Japan
Prior art keywords
layer
substrate
multilayer substrate
semiconductor chip
conductor
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP01253799A
Other languages
Japanese (ja)
Other versions
JP2000216307A (en
Inventor
亨 佐想
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp filed Critical NEC Corp
Priority to JP01253799A priority Critical patent/JP3216626B2/en
Publication of JP2000216307A publication Critical patent/JP2000216307A/en
Application granted granted Critical
Publication of JP3216626B2 publication Critical patent/JP3216626B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/02Bonding areas; Manufacturing methods related thereto
    • H01L2224/04Structure, shape, material or disposition of the bonding areas prior to the connecting process
    • H01L2224/06Structure, shape, material or disposition of the bonding areas prior to the connecting process of a plurality of bonding areas
    • H01L2224/0601Structure
    • H01L2224/0603Bonding areas having different sizes, e.g. different heights or widths
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/4805Shape
    • H01L2224/4809Loop shape
    • H01L2224/48091Arched
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/481Disposition
    • H01L2224/48151Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/48221Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/48225Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
    • H01L2224/48227Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation connecting the wire to a bond pad of the item
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/49Structure, shape, material or disposition of the wire connectors after the connecting process of a plurality of wire connectors
    • H01L2224/491Disposition
    • H01L2224/4911Disposition the connectors being bonded to at least one common bonding area, e.g. daisy chain
    • H01L2224/49111Disposition the connectors being bonded to at least one common bonding area, e.g. daisy chain the connectors connecting two common bonding areas, e.g. Litz or braid wires
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/49Structure, shape, material or disposition of the wire connectors after the connecting process of a plurality of wire connectors
    • H01L2224/491Disposition
    • H01L2224/4912Layout
    • H01L2224/49171Fan-out arrangements
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/73Means for bonding being of different types provided for in two or more of groups H01L2224/10, H01L2224/18, H01L2224/26, H01L2224/34, H01L2224/42, H01L2224/50, H01L2224/63, H01L2224/71
    • H01L2224/732Location after the connecting process
    • H01L2224/73251Location after the connecting process on different surfaces
    • H01L2224/73265Layer and wire connectors

Landscapes

  • Cooling Or The Like Of Semiconductors Or Solid State Devices (AREA)

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、高周波信号の増幅
に好適な増幅装置に関し、特に、放熱性が高い増幅装置
に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an amplifying device suitable for amplifying a high frequency signal, and more particularly to an amplifying device having high heat dissipation.

【0002】[0002]

【従来の技術】近時、携帯電話等には高周波信号が使用
され、その送信用増幅装置として多層基板上に形成され
た電界効果トランジスタ(以下、FETという。)を備
えた高周波増幅装置が使用されている。図3は従来の高
周波増幅装置を示す模式的断面図である。
2. Description of the Related Art Recently, a high frequency signal is used in a portable telephone or the like, and a high frequency amplifier provided with a field effect transistor (hereinafter, referred to as an FET) formed on a multilayer substrate is used as an amplifier for transmission. Have been. FIG. 3 is a schematic sectional view showing a conventional high-frequency amplifier.

【0003】従来の高周波増幅装置に使用される多層基
板21には、厚さが約5〜10μmの第4導体層23d
及びこの第4導体層23d上に形成された第3誘電体層
24cが設けられている。更に、第3誘電体層24c上
には、厚さが約5〜10μmの第3導体層23c、第2
誘電体層24b、厚さが約5〜10μmの第2導体層2
3b、第1誘電体層24a及び厚さが約5〜10μmの
第1導体層23aが順次積層されている。なお、各誘電
体層24a〜24cはガラスセラミックス等のセラミッ
クス製である。
A multilayer substrate 21 used in a conventional high-frequency amplifier has a fourth conductor layer 23d having a thickness of about 5 to 10 μm.
And a third dielectric layer 24c formed on the fourth conductor layer 23d. Further, on the third dielectric layer 24c, a third conductor layer 23c having a thickness of about 5 to 10 μm,
Dielectric layer 24b, second conductor layer 2 having a thickness of about 5 to 10 μm
3b, a first dielectric layer 24a and a first conductor layer 23a having a thickness of about 5 to 10 μm are sequentially laminated. Each of the dielectric layers 24a to 24c is made of ceramics such as glass ceramics.

【0004】そして、第1導体層23a上には、半導体
チップ31が、銅合金等の金属板からなるマウント部2
8を介して、載置されている。なお、半導体チップ31
が第1導体層23a上に直接載置される場合もある。
[0004] On the first conductor layer 23a, a semiconductor chip 31 is mounted on a mount 2 made of a metal plate such as a copper alloy.
8 is placed. The semiconductor chip 31
May be directly mounted on the first conductor layer 23a.

【0005】また、多層基板21には、半導体チップ3
1の直下に形成され第1導体層23aから第4導体層2
3dまで達するサーマルビア25が形成されている。サ
ーマルビア25は、ビアホールの側面に金属メッキ層2
5bが形成され、その内部に樹脂材25aが充填された
ものである。
Further, the semiconductor chip 3 is provided on the multilayer substrate 21.
1 to the fourth conductor layer 2 from the first conductor layer 23a to the fourth conductor layer 2
A thermal via 25 reaching up to 3d is formed. The thermal via 25 has a metal plating layer 2 on the side surface of the via hole.
5b are formed, and the inside thereof is filled with a resin material 25a.

【0006】更に、多層基板21の端面には、接地・放
熱用端面電極26が形成されている。また、多層基板2
1の他の端面には、入出力端子用端面電極及び電源端子
用端面電極(図示せず)が形成されている。
Further, an end surface electrode 26 for grounding and heat radiation is formed on the end surface of the multilayer substrate 21. In addition, the multilayer substrate 2
On the other end face, an end face electrode for an input / output terminal and an end face electrode (not shown) for a power supply terminal are formed.

【0007】更にまた、多層基板21は、金属カバー2
7に覆われており、電磁的にシールドされている。
Further, the multi-layer substrate 21 has a metal cover 2
7 and are electromagnetically shielded.

【0008】更に、多層基板21上には、チップコンデ
ンサ、チップ抵抗、チップインダクタ及びマイクロスト
リップライン等の素子29を備え半導体チップ31に接
続された整合バイアス回路が設けられている。
Further, on the multilayer substrate 21, a matching bias circuit provided with elements 29 such as a chip capacitor, a chip resistor, a chip inductor and a microstrip line and connected to a semiconductor chip 31 is provided.

【0009】なお、半導体チップは、第1及び第2の誘
電体層24a及び24bにキャビティを形成しそこに載
置されることもある。
In some cases, the semiconductor chip may be formed with cavities in the first and second dielectric layers 24a and 24b and mounted thereon.

【0010】このように構成された高周波増幅装置を携
帯電話等のセット基板に搭載する際には、接地・放熱用
端面電極26等の各端面電極をセット基板にはんだ付け
する。更に、半導体チップ31から発生する熱を放熱さ
せるために、多層基板21の半導体チップ31が搭載さ
れた部分の反対側部分をも直接セット基板にはんだ付け
する。
When the high-frequency amplifying device thus configured is mounted on a set substrate of a mobile phone or the like, each end surface electrode such as a grounding / radiating end surface electrode 26 is soldered to the set substrate. Further, in order to dissipate the heat generated from the semiconductor chip 31, the part of the multilayer substrate 21 opposite to the part on which the semiconductor chip 31 is mounted is also directly soldered to the set substrate.

【0011】そして、外部から高周波信号が入力される
と、この信号は入力段整合バイアス回路を介して半導体
チップ31の入力段FET部に入力される。そして、入
力段FET部により増幅されて出力される。その後、こ
の出力信号は、段間整合バイアス回路を介して出力段F
ET部に入力される。そして、出力段FET部により増
幅されて出力される。更に、この出力信号は、出力段整
合バイアス回路を介して外部に出力される。
When a high frequency signal is input from the outside, the signal is input to the input stage FET section of the semiconductor chip 31 via the input stage matching bias circuit. Then, the signal is amplified and output by the input stage FET unit. Thereafter, this output signal is output to the output stage F via an interstage matching bias circuit.
Input to the ET section. Then, it is amplified and output by the output stage FET unit. Further, this output signal is output to the outside via the output stage matching bias circuit.

【0012】このとき、入力段FET部及び出力段FE
T部から熱が発生するが、この熱はサーマルビア25を
介して第2、3及び4導体層23b〜23dに伝達され
る。更に、半導体チップ31が搭載された部分の反対側
部分に直接はんだ付けされた携帯電話等のセット基板及
び接地・放熱用端面電極26等に伝達され、そこから外
気へと放出される。
At this time, the input stage FET section and the output stage FE
Heat is generated from the T portion, and this heat is transmitted to the second, third, and fourth conductor layers 23b to 23d via the thermal via 25. Further, the light is transmitted to a set substrate such as a mobile phone directly soldered to a portion opposite to the portion on which the semiconductor chip 31 is mounted, the grounding / radiating end face electrode 26, and the like, and is discharged therefrom to the outside air.

【0013】[0013]

【発明が解決しようとする課題】しかしながら、従来の
高周波増幅装置は、携帯電話等のセット基板に搭載され
る際には、前述のような直接のはんだ付けを行わない
と、入力段FET部及び出力段FET部の放熱が不十分
となって、高周波増幅装置が熱暴走してしまう。更に、
入力段FET部及び出力段FET部のソースにおけるイ
ンダクタンスが高くなるため、良好な高周波特性が得ら
れない。また、直接はんだ付けされると、セット基板の
その部分にパターン設計を行うことができなくなるとい
う問題点も生じる。
However, when the conventional high frequency amplifying device is mounted on a set board of a mobile phone or the like, unless the above-mentioned direct soldering is performed, the input stage FET unit and the Insufficient heat radiation of the output stage FET unit causes the high frequency amplifier to run out of heat. Furthermore,
Since the inductances at the sources of the input-stage FET unit and the output-stage FET unit increase, good high-frequency characteristics cannot be obtained. In addition, when soldering is performed directly, there is a problem that pattern design cannot be performed on that portion of the set substrate.

【0014】本発明はかかる問題点に鑑みてなされたも
のであって、熱暴走を防止することができ、良好な高周
波特性を得ることができる増幅装置を提供することを目
的とする。
The present invention has been made in view of the above problems, and an object of the present invention is to provide an amplifier capable of preventing thermal runaway and obtaining good high-frequency characteristics.

【0015】[0015]

【課題を解決するための手段】本発明に係る増幅装置
は、多層基板と、電界効果トランジスタを有する増幅回
路を備え前記多層基板上に設けられた半導体チップと、
を有し、前記多層基板は、厚さが70μm以上の第1の
導体層と、この第1の導体層上に形成された樹脂層と、
この樹脂層と前記半導体チップが載置された前記多層基
板の表面との間に形成され厚さが70μm以上の第2の
導体層と、前記半導体チップの直下で前記多層基板自身
表面から前記第1の導体層まで達すると共に前記第2
の導体層に接続されたサーマルビアと、前記多層基板自
身の端面に形成され前記第1及び第2の導体層に接続さ
れた接地・放熱用端面電極と、前記第1の導体層の下に
形成されたレジスト層と、を有し、前記多層基板の前記
第1の導体層側部分がセット基板にはんだ付けされるこ
となく前記接地・放熱用端面電極がセット基板にはんだ
付けされることを特徴とする。
According to the present invention, there is provided an amplifying apparatus comprising: a multi-layer substrate; a semiconductor chip having an amplifying circuit having a field-effect transistor and provided on the multi-layer substrate;
Wherein the multilayer substrate has a first conductor layer having a thickness of 70 μm or more, a resin layer formed on the first conductor layer,
This resin layer and the multilayer substrate on which the semiconductor chip is mounted
A second conductor layer having a thickness of 70 μm or more formed between the substrate and the surface of the board, and the multilayer substrate itself directly below the semiconductor chip;
From the surface of the first conductor layer to the first conductor layer .
A thermal via connected to the conductor layer of the multilayer board itself
A multi-layer substrate, comprising: a grounding / radiating end face electrode formed on an end face of the body and connected to the first and second conductor layers; and a resist layer formed below the first conductor layer. The grounding / radiating end face electrode is soldered to the set substrate without the first conductor layer side portion being soldered to the set substrate.

【0016】本発明においては、サーマルビアは厚さが
70μm以上の第1及び第2の導体層を介して端面電極
に接続されているので、増幅回路から発生した熱は高い
効率で放熱される。従って、熱暴走が抑制される。更
に、増幅回路の高周波特性が向上する。また、セット基
板に搭載する際には、裏面側を直接はんだ付けする必要
がないため、セット基板の増幅装置に接合する領域にお
けるパターン設計が可能となる。
In the present invention, since the thermal via is connected to the end face electrode via the first and second conductor layers having a thickness of 70 μm or more, the heat generated from the amplifier circuit is radiated with high efficiency. . Therefore, thermal runaway is suppressed. Further, the high frequency characteristics of the amplifier circuit are improved. Further, when mounting on a set substrate, it is not necessary to directly solder the back surface side, so that a pattern can be designed in a region of the set substrate to be joined to the amplification device.

【0017】前記サーマルビアは、樹脂材又は導電材
と、この樹脂材又は導電材の表面に形成され前記第1及
び第2の導体層に接続された金属メッキ層とを有するこ
とができる。
[0017] The thermal via is a resin material or a conductive material, the first及 formed on the surface of the resin material or the conductive material
And a metal plating layer connected to the second conductor layer.

【0018】[0018]

【0019】[0019]

【0020】更にまた、前記増幅回路は、電界効果トラ
ンジスタを有することができる。
Further, the amplifier circuit may include a field effect transistor.

【0021】[0021]

【発明の実施の形態】以下、本発明の実施例に係る高周
波増幅装置について、添付の図面を参照して具体的に説
明する。図1は本発明の実施例に係る高周波増幅装置を
示す模式的平面図である。
DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS Hereinafter, a high-frequency amplifier according to an embodiment of the present invention will be specifically described with reference to the accompanying drawings. FIG. 1 is a schematic plan view showing a high-frequency amplifier according to an embodiment of the present invention.

【0022】本実施例においては、多層基板1上に入力
段FET部11a及び出力段FET部11bが設けられ
た増幅回路を備えた半導体チップ11が設けられてい
る。入力段FET部11aには、入力段FET及びこれ
に接続されたゲート等の回路が設けられており、出力段
FET部11bには、出力段FET及びこれに接続され
た他のゲート等の回路が設けられている。
In this embodiment, a semiconductor chip 11 having an amplifier circuit provided with an input-stage FET section 11a and an output-stage FET section 11b is provided on a multilayer substrate 1. The input stage FET unit 11a is provided with a circuit such as an input stage FET and a gate connected thereto, and the output stage FET unit 11b is provided with a circuit such as an output stage FET and another gate connected thereto. Is provided.

【0023】また、多層基板1上には、入力段FET部
11aの入力端と入力端子13との間に接続された入力
段整合バイアス回路12aが設けられている。更に、入
力段FET部11aの出力端と出力段FET部11bの
入力端との間に接続された段間整合バイアス回路12b
が設けられている。更にまた、出力段FET部11bの
出力端と出力端子14との間には出力段整合バイアス回
路12cが設けられている。なお、整合バイアス回路1
2a〜12cは、チップコンデンサ、チップ抵抗、チッ
プインダクタ及びマイクロストリップライン等から構成
されており、入力段FET部11a及び出力段FET部
11bに直流の電圧又は電流を供給すると共に、それら
のインピーダンスを整合させるための回路である。
On the multilayer substrate 1, an input stage matching bias circuit 12a connected between the input terminal of the input stage FET section 11a and the input terminal 13 is provided. Further, an interstage matching bias circuit 12b connected between the output terminal of the input stage FET unit 11a and the input terminal of the output stage FET unit 11b.
Is provided. Further, an output stage matching bias circuit 12c is provided between the output terminal of the output stage FET section 11b and the output terminal 14. The matching bias circuit 1
Reference numerals 2a to 12c each include a chip capacitor, a chip resistor, a chip inductor, a microstrip line, and the like, supply a DC voltage or current to the input-stage FET unit 11a and the output-stage FET unit 11b, and reduce the impedance thereof. This is a circuit for matching.

【0024】更に、多層基板1の端面には、わん曲した
複数の切り込みが形成されており、そこに端面電極15
が設けられている。これらの電極のうち、1つが入力端
子13、1つが出力端子14、3つが電源端子16とな
っている。なお、多層基板1は、図示しない金属カバー
により覆われている。
Further, a plurality of curved cuts are formed in the end face of the multilayer substrate 1 and the end face electrode 15 is formed therein.
Is provided. One of these electrodes is an input terminal 13, one is an output terminal 14, and three are power supply terminals 16. The multilayer substrate 1 is covered with a metal cover (not shown).

【0025】次に、多層基板1の構造について説明す
る。図2は本発明の実施例に係る高周波増幅装置を示す
模式的断面図である。
Next, the structure of the multilayer substrate 1 will be described. FIG. 2 is a schematic sectional view showing a high-frequency amplifier according to an embodiment of the present invention.

【0026】多層基板1には、レジスト層2及びこのレ
ジスト層2上に形成された厚さが約70〜100μmの
導体層3dが設けられている。更に、第導体層3
d上には第3誘電体層4c、厚さが約70μmの第
体層3c、第2誘電体層4b、厚さが約18μmの第
導体層3b、第1誘電体層4a及び厚さが約18〜48
μmの第導体層3aが順次積層されている。このよう
に、第及び第1導体層3c及び3dの厚さは、第
第3導体層3a及び3bの厚さより厚いものとなって
いる。なお、各誘電体層4a〜4cは樹脂製である。
The multilayer substrate 1 is provided with a resist layer 2 and a first conductor layer 3d formed on the resist layer 2 and having a thickness of about 70 to 100 μm. Further, the first conductor layer 3
The on d third dielectric layer 4c, the second conductor layer 3c thickness of about 70 [mu] m, the second dielectric layer 4b, the third thickness of about 18μm
The conductor layer 3b, the first dielectric layer 4a, and the thickness of about 18 to 48
μm fourth conductor layers 3a are sequentially laminated. Thus, the thicknesses of the second and first conductor layers 3c and 3d are larger than the thicknesses of the fourth and third conductor layers 3a and 3b. Each of the dielectric layers 4a to 4c is made of resin.

【0027】そして、第導体層3a上には、半導体チ
ップ11が、銅合金等の金属板からなるマウント部8を
介して、載置されている。同様に、整合バイアス回路を
構成する素子9が第導体層3a上に載置されている。
なお、半導体チップ11は第導体層3a上に直接載置
されていてもよい。
A semiconductor chip 11 is mounted on the fourth conductor layer 3a via a mount 8 made of a metal plate such as a copper alloy. Similarly, an element 9 constituting a matching bias circuit is mounted on the fourth conductor layer 3a.
Note that the semiconductor chip 11 may be directly mounted on the fourth conductor layer 3a.

【0028】また、多層基板1には、半導体チップ11
の直下に形成され第導体層3aから第導体層3dま
で達するサーマルビア5が形成されている。サーマルビ
ア5は、ビアホールの側面に金属メッキ層5bが形成さ
れ、その内部に樹脂材5aが充填されたものである。
The multilayer substrate 1 has a semiconductor chip 11
Thermal via 5 is formed immediately below the reach from the fourth conductive layer 3a to the first conductor layer 3d is formed. The thermal via 5 is formed by forming a metal plating layer 5b on the side surface of a via hole and filling the inside thereof with a resin material 5a.

【0029】更に、多層基板1の端面には、サーマルビ
ア5の金属メッキ層5bに第第1導体層3b〜3d
を介して接続された接地・放熱用端面電極6が形成され
ている。また、多層基板1の他の端面には、入出力端子
用端面電極及び電源端子用端面電極が形成されている
が、これらはサーマルビア5に接続されていない。これ
らの端面電極は、図1における端面電極15に対応する
ものである。
Further, the third to first conductor layers 3b to 3d are provided on the metal plating layer 5b of the thermal via 5 on the end face of the multilayer substrate 1.
And a grounding / radiating end face electrode 6 connected through the contact. On the other end face of the multilayer substrate 1, an end face electrode for input / output terminal and an end face electrode for power supply terminal are formed, but these are not connected to the thermal via 5. These end electrodes correspond to the end electrodes 15 in FIG.

【0030】更にまた、多層基板1は、金属カバー7に
覆われており、電磁的にシールドされている。
Further, the multilayer substrate 1 is covered with a metal cover 7 and is electromagnetically shielded.

【0031】このように構成された高周波増幅装置を携
帯電話等のセット基板に搭載する際には、接地・放熱用
端面電極6等の各端面電極をセット基板にはんだ付けす
る。但し、このとき、半導体チップ11から発生する熱
を放熱させるために、多層基板1の半導体チップ11が
搭載された部分の反対側部分である第導体層3d側部
分を直接セット基板にはんだ付けする必要はない。
When the high-frequency amplifying device thus configured is mounted on a set board of a mobile phone or the like, each end face electrode such as the grounding / radiating end face electrode 6 is soldered to the set board. However, at this time, in order to dissipate the heat generated from the semiconductor chip 11, the portion of the multilayer substrate 1 on the first conductor layer 3d side opposite to the portion on which the semiconductor chip 11 is mounted is directly soldered to the set substrate. do not have to.

【0032】次に、本実施例に係る高周波増幅装置の動
作について説明する。
Next, the operation of the high-frequency amplifier according to the present embodiment will be described.

【0033】外部から入力端子13に入力された高周波
信号は、入力段整合バイアス回路12aを介して入力段
FET部11aに入力される。そして、入力段FET部
11aにより増幅されて出力される。その後、この出力
信号は、段間整合バイアス回路12bを介して出力段F
ET部11bに入力される。そして、出力段FET部1
1bにより増幅されて出力される。更に、この出力信号
は、出力段整合バイアス回路12cを介して出力端子1
4から外部に出力される。このように、外部から本実施
例に係る高周波増幅回路に入力された信号は、2段階に
増幅されて出力される。
A high-frequency signal externally input to the input terminal 13 is input to the input-stage FET section 11a via the input-stage matching bias circuit 12a. Then, the signal is amplified and output by the input stage FET unit 11a. Thereafter, this output signal is output to the output stage F via the interstage matching bias circuit 12b.
It is input to the ET section 11b. Then, the output stage FET unit 1
The signal is amplified and output by 1b. Further, this output signal is output to the output terminal 1 via the output stage matching bias circuit 12c.
4 to the outside. As described above, the signal externally input to the high-frequency amplifier circuit according to the present embodiment is amplified and output in two stages.

【0034】このとき、入力段FET部11a及び出力
段FET11部bから熱が発生するが、この熱はサーマ
ルビア5を介して第第2及び第1導体層3b〜3d
に伝達される。更に、接地・放熱用端面電極6に伝達さ
れる。この接地・放熱用端面電極6は携帯電話等のセッ
ト基板にはんだ付けされているので、そこから外気へと
放出される。
At this time, heat is generated from the input-stage FET section 11a and the output-stage FET section 11b, and this heat is transmitted via the thermal via 5 to the third , second and first conductor layers 3b to 3d.
Is transmitted to Further, it is transmitted to the grounding / radiating end face electrode 6. Since the grounding / radiating end electrode 6 is soldered to a set substrate of a mobile phone or the like, it is discharged from there to the outside air.

【0035】このように、本実施例によれば、誘電体層
4a〜4cを樹脂製としているので、各導体層3a〜3
dを従来のものよりも厚く形成することができる。特
に、第及び第1導体層3c及び3dの厚さを70μm
以上と厚くすることができるため、半導体チップ11に
対する多層基板1の熱抵抗を小さくすることができる。
このため、多層基板1の半導体チップ11が搭載された
部分の反対側部分を携帯電話等のセット基板に直接はん
だ付けしなくても、接地・放熱用端面電極6をセット基
板にはんだ付けすれば、入力段FET部11a及び出力
段FET部11bから発生した熱の放出が可能である。
As described above, according to the present embodiment, since the dielectric layers 4a to 4c are made of resin, each of the conductor layers 3a to 3c is formed.
d can be formed thicker than conventional ones. Particularly, the thickness of the second and first conductor layers 3c and 3d is set to 70 μm.
Since the thickness can be increased as described above, the thermal resistance of the multilayer substrate 1 with respect to the semiconductor chip 11 can be reduced.
Therefore, instead of directly soldering the portion of the multilayer substrate 1 opposite to the portion on which the semiconductor chip 11 is mounted to a set substrate such as a mobile phone, the grounding / radiating end electrode 6 can be soldered to the set substrate. In addition, heat generated from the input stage FET unit 11a and the output stage FET unit 11b can be released.

【0036】また、各導体層3a〜3dが従来のものよ
りも厚く形成されているため、入力段FET部11a及
び出力段FET部11bに対するソースのインダクタン
スが低減される。従って、良好な高周波特性が得られ
る。
Further, since each of the conductor layers 3a to 3d is formed thicker than the conventional one, the inductance of the source with respect to the input stage FET unit 11a and the output stage FET unit 11b is reduced. Therefore, good high-frequency characteristics can be obtained.

【0037】更に、多層基板1の半導体チップ11が搭
載される部分の反対側部分を携帯電話等のセット基板に
直接はんだ付けする必要がないため、多層基板1の裏面
には絶縁性のレジスト層2が形成されているので、携帯
電話等のセット基板のレジスト層2に接合する部分にパ
ターン設計を行うことができる。このため、セット基板
のパターン設計に冗長性が得られる。
Further, since it is not necessary to directly solder the portion of the multilayer substrate 1 opposite to the portion on which the semiconductor chip 11 is mounted to a set substrate such as a mobile phone, an insulating resist layer is formed on the back surface of the multilayer substrate 1. Since the substrate 2 is formed, a pattern can be designed at a portion to be joined to the resist layer 2 of a set substrate such as a mobile phone. For this reason, redundancy is obtained in the pattern design of the set board.

【0038】なお、上述の実施例におけるサーマルビア
5には、樹脂材5aが充填されているが、金属材が充填
されていても、同様の効果が得られる。
Although the resin material 5a is filled in the thermal via 5 in the above-described embodiment, the same effect can be obtained if the thermal via 5 is filled with a metal material.

【0039】また、 多層基板1は導体層は4層構造と
されているが、5層又はそれ以上の層から多層基板が形
成されていてもよい。この場合にも、同様の効果が得ら
れる。
Although the multilayer substrate 1 has a four-layered conductor layer structure, the multilayer substrate may be formed of five or more layers. In this case, the same effect can be obtained.

【0040】更に、これらの構造が組み合わされた構造
が採用されても、同様の効果が得られる。
Further, even if a structure in which these structures are combined is adopted, the same effect can be obtained.

【0041】[0041]

【発明の効果】以上詳述したように、本発明によれば、
多層基板に厚さが70μm以上の導体層を設け、この導
体層を介してサーマルビアを端面電極に接続させている
ので、増幅回路から発生した熱を高い効率で外部に放出
することができる。従って、熱暴走を抑制することがで
きる。更に、増幅回路の高周波特性を向上させることが
できる。また、セット基板に搭載する際には、裏面側を
直接はんだ付けする必要がないので、セット基板の増幅
装置に接合する領域におけるパターン設計を行うことが
できる。
As described in detail above, according to the present invention,
Since a conductor layer having a thickness of 70 μm or more is provided on the multilayer substrate and the thermal via is connected to the end face electrode via the conductor layer, heat generated from the amplifier circuit can be released to the outside with high efficiency. Therefore, thermal runaway can be suppressed. Further, the high frequency characteristics of the amplifier circuit can be improved. Further, when mounting on the set substrate, it is not necessary to directly solder the rear surface side, so that it is possible to design a pattern in a region where the set substrate is joined to the amplifier.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明の実施例に係る高周波増幅装置を示す模
式的平面図である。
FIG. 1 is a schematic plan view showing a high-frequency amplifier according to an embodiment of the present invention.

【図2】本発明の実施例に係る高周波増幅装置を示す模
式的断面図である。
FIG. 2 is a schematic sectional view showing a high-frequency amplifier according to an embodiment of the present invention.

【図3】従来の高周波増幅装置を示す模式的断面図であ
る。
FIG. 3 is a schematic sectional view showing a conventional high frequency amplifying device.

【符号の説明】[Explanation of symbols]

1、21;多層基板 2;レジスト層 3a、3b、3c、3d、23a、23b、23c、2
3d;導体層 4a、4b、4c、24a、24b、24c;誘電体層 5、25;サーマルビア 5a、25a;樹脂材 5b、25b;金属メッキ層 6、26;接地・放熱用端面電極 7、27;金属カバー 8、28;マウント部 11、31;半導体チップ 11a;入力段FET部 11b;出力段FET部 12a、12b、12c;整合バイアス回路 13;入力端子 14;出力端子 15;端面電極 16;電源端子
1, 21; multilayer substrate 2; resist layers 3a, 3b, 3c, 3d, 23a, 23b, 23c, 2
3d; conductor layers 4a, 4b, 4c, 24a, 24b, 24c; dielectric layers 5, 25; thermal vias 5a, 25a; resin materials 5b, 25b; metal plating layers 6, 26; 27; metal cover 8, 28; mount portion 11, 31; semiconductor chip 11a; input stage FET portion 11b; output stage FET portion 12a, 12b, 12c; matching bias circuit 13; input terminal 14; output terminal 15; Power supply terminal

フロントページの続き (56)参考文献 特開 平9−55459(JP,A) 特開 平7−106721(JP,A) 特開 平6−177544(JP,A) 特開 平9−134981(JP,A) 特開 平7−273462(JP,A) 特開 平10−107449(JP,A) 特開 平9−199855(JP,A) (58)調査した分野(Int.Cl.7,DB名) H01L 23/34 - 23/473 H01L 23/12 301 Continuation of the front page (56) References JP-A-9-55459 (JP, A) JP-A-7-106721 (JP, A) JP-A-6-177544 (JP, A) JP-A-9-139481 (JP, A) JP-A-7-273462 (JP, A) JP-A-10-107449 (JP, A) JP-A-9-199855 (JP, A) (58) Fields studied (Int. Cl. 7 , DB Name) H01L 23/34-23/473 H01L 23/12 301

Claims (3)

(57)【特許請求の範囲】(57) [Claims] 【請求項1】 多層基板と、電界効果トランジスタを有
する増幅回路を備え前記多層基板上に設けられた半導体
チップと、有し、前記多層基板は、厚さが70μm以
上の第1の導体層と、この第1の導体層上に形成された
樹脂層と、この樹脂層と前記半導体チップが載置された
前記多層基板の表面との間に形成され厚さが70μm以
上の第2の導体層と、前記半導体チップの直下で前記多
層基板自身の表面から前記第1の導体層まで達すると共
に前記第2の導体層に接続されたサーマルビアと、前記
多層基板自身の端面に形成され前記第1及び第2の導体
層に接続された接地・放熱用端面電極と、前記第1の
体層の下に形成されたレジスト層と、を有し、前記多層
基板の前記第1の導体層側部分がセット基板にはんだ付
けされることなく前記接地・放熱用端面電極がセット基
板にはんだ付けされることを特徴とする増幅装置。
And 1. A multi-layer substrate, comprising: a semiconductor chip provided on said multilayer substrate comprising an amplifier circuit having a field effect transistor, wherein the multilayer substrate has a first conductive layer thickness is at least 70μm And a resin layer formed on the first conductor layer, and the resin layer and the semiconductor chip are mounted thereon.
Wherein the second conductive layer is a thickness formed above 70μm between the surface multi-layer substrate, the multi directly under the semiconductor chip
Co reaches a layer substrate itself of surface to the first conductive layer
A thermal via connected to the second conductive layer, the
A grounding / radiating end face electrode formed on an end face of the multilayer substrate itself and connected to the first and second conductor layers; a resist layer formed below the first conductor layer; Wherein the grounding / radiating end face electrode is soldered to the set substrate without soldering the first conductor layer side portion of the multilayer substrate to the set substrate.
【請求項2】 前記サーマルビアは、樹脂材と、この樹
脂材の表面に形成され前記第1及び第2の導体層に接続
された金属メッキ層とを有することを特徴とする請求項
1に記載の増幅装置。
2. The thermal via according to claim 1, wherein the thermal via includes a resin material and a metal plating layer formed on a surface of the resin material and connected to the first and second conductor layers. The amplifying device as described in the above.
【請求項3】 前記サーマルビアは、導電材と、この導
電材の表面に形成され前記第1及び第2の導体層に接続
された金属メッキ層とを有することを特徴とする請求項
1に記載の増幅装置。
3. The thermal via according to claim 1, wherein the thermal via includes a conductive material and a metal plating layer formed on a surface of the conductive material and connected to the first and second conductive layers. The amplifying device as described in the above.
JP01253799A 1999-01-20 1999-01-20 Amplifier Expired - Fee Related JP3216626B2 (en)

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JP3216626B2 true JP3216626B2 (en) 2001-10-09

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JP4480818B2 (en) * 1999-09-30 2010-06-16 株式会社ルネサステクノロジ Semiconductor device
WO2002014917A1 (en) 2000-08-17 2002-02-21 Matsushita Electric Industrial Co., Ltd. Optical mounting board, optical module, optical transmitter/receiver, optical transmitting/receiving system, and method for manufacturing optical mounting board
EP1394857A3 (en) 2002-08-28 2004-04-07 Matsushita Electric Industrial Co., Ltd. Semiconductor device
US6787896B1 (en) * 2003-05-15 2004-09-07 Skyworks Solutions, Inc. Semiconductor die package with increased thermal conduction
NZ571827A (en) * 2005-10-26 2010-03-26 Pentair Water Pool & Spa Inc LED pool and spa light
JP2012009609A (en) * 2010-06-24 2012-01-12 Jtekt Corp Multi-layer circuit board
JP5496845B2 (en) * 2010-09-30 2014-05-21 本田技研工業株式会社 Electric vehicle

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06177544A (en) * 1992-12-03 1994-06-24 Ibiden Co Ltd Electronic component mounting board and manufacture thereof
JPH07106721A (en) * 1993-10-04 1995-04-21 Sony Corp Printed circuit board and heat radiating method
JPH07273462A (en) * 1994-03-31 1995-10-20 Ibiden Co Ltd Electronic part mounting substrate
JPH0955459A (en) * 1995-06-06 1997-02-25 Seiko Epson Corp Semiconductor device
JPH09134981A (en) * 1995-11-08 1997-05-20 Fujitsu Ltd Functional module package for microwave and millimeter wave bands
JPH09199855A (en) * 1996-01-17 1997-07-31 Sony Corp Manufacture of multilayer interconnection board
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