JP3195843B2 - High heat dissipation type semiconductor device - Google Patents

High heat dissipation type semiconductor device

Info

Publication number
JP3195843B2
JP3195843B2 JP3353193A JP3353193A JP3195843B2 JP 3195843 B2 JP3195843 B2 JP 3195843B2 JP 3353193 A JP3353193 A JP 3353193A JP 3353193 A JP3353193 A JP 3353193A JP 3195843 B2 JP3195843 B2 JP 3195843B2
Authority
JP
Japan
Prior art keywords
substrate
radiator
heat
semiconductor element
semiconductor device
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP3353193A
Other languages
Japanese (ja)
Other versions
JPH06252303A (en
Inventor
通孝 木村
至洋 冨田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Priority to JP3353193A priority Critical patent/JP3195843B2/en
Publication of JPH06252303A publication Critical patent/JPH06252303A/en
Application granted granted Critical
Publication of JP3195843B2 publication Critical patent/JP3195843B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/4805Shape
    • H01L2224/4809Loop shape
    • H01L2224/48091Arched
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/49Structure, shape, material or disposition of the wire connectors after the connecting process of a plurality of wire connectors
    • H01L2224/491Disposition
    • H01L2224/49105Connecting at different heights
    • H01L2224/49109Connecting at different heights outside the semiconductor or solid-state body
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/73Means for bonding being of different types provided for in two or more of groups H01L2224/10, H01L2224/18, H01L2224/26, H01L2224/34, H01L2224/42, H01L2224/50, H01L2224/63, H01L2224/71
    • H01L2224/732Location after the connecting process
    • H01L2224/73251Location after the connecting process on different surfaces
    • H01L2224/73265Layer and wire connectors

Landscapes

  • Cooling Or The Like Of Semiconductors Or Solid State Devices (AREA)

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【産業上の利用分野】この発明は、半導体素子の発生す
る熱を効率よく放熱する高放熱タイプの半導体装置に関
するものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a high heat radiation type semiconductor device for efficiently radiating heat generated by a semiconductor element.

【0002】[0002]

【従来の技術】半導体素子は作動することにより電力を
消費し温度が上昇する。特に、例えばパワートランジス
タ素子等の電力消費量の多い半導体素子では温度の上昇
が大きいため、そのパッケージに種々の放熱手段を取り
付け、高放熱タイプの半導体装置として半導体素子の温
度上昇の防止が図られている。
2. Description of the Related Art When a semiconductor device operates, it consumes power and its temperature rises. Particularly, for example, a semiconductor element having a large power consumption, such as a power transistor element, has a large temperature rise. Therefore, various heat radiating means are attached to the package to prevent the temperature of the semiconductor element from rising as a high heat radiation type semiconductor device. ing.

【0003】図5は放熱手段として放熱体等を有する従
来の高放熱タイプの半導体装置の断面を示している。図
において、1は半導体素子であるICチップ、2はその
中央部にICチップ配置用の開口部2aを有し、その外
面上にリード(図示せず)を保持する基板、3は基板2
上のリードとICチップ1との電気的接続を行なうボン
ディングワイヤ、4は基板2の一側に取り付けられ、基
板2の開口部2aに臨む位置にICチップ1の塔載部4
aが形成されている熱伝導率の大きい放熱体、5は放熱
体4からの熱放散をさらに良好にするために、この放熱
体4の他面側に取り付けられている熱伝導率の大きい材
料で構成されたフィン部材、6は基板2と放熱体4とを
接合する接合手段としての接着テープ、7は基板2のリ
ードと接続され、半導体装置をプリント基板等に実装し
た際にICチップ1と外部回路とを電気的に接続する外
部端子、8は基板2の開口部2aを閉じ、内部の半導体
素子1を保護する蓋部材である。ここで、フィン部材5
および蓋部材8はそれぞれ放熱板4および基板2に例え
ば接着テープ6で固着されている。
FIG. 5 shows a cross section of a conventional high heat radiation type semiconductor device having a heat radiator or the like as a heat radiation means. In the figure, 1 is an IC chip as a semiconductor element, 2 is a substrate having an opening 2a for arranging an IC chip in the center thereof, and holding a lead (not shown) on its outer surface, and 3 is a substrate 2
A bonding wire 4 for electrically connecting the upper lead to the IC chip 1 is attached to one side of the substrate 2, and the tower mounting portion 4 of the IC chip 1 is located at a position facing the opening 2 a of the substrate 2.
The heat radiator 5 having a large thermal conductivity in which a is formed is a material having a large heat conductivity attached to the other surface of the heat radiator 4 in order to further dissipate heat from the heat radiator 4. A fin member, 6 is an adhesive tape as a joining means for joining the substrate 2 and the heat radiator 4, and 7 is connected to a lead of the substrate 2 so that when the semiconductor device is mounted on a printed board or the like, the IC chip 1 An external terminal 8 for electrically connecting the semiconductor device 1 to an external circuit, and a cover member 8 for closing the opening 2a of the substrate 2 and protecting the semiconductor element 1 inside. Here, the fin member 5
The lid member 8 is fixed to the heat radiating plate 4 and the substrate 2 with an adhesive tape 6, for example.

【0004】つぎにこの半導体装置の動作を説明する。
この半導体装置が外部端子7を介してプリント基板(図
示せず)に実装され、外部回路(図示せず)とICチッ
プ1とが外部端子7、基板2のリードおよびボンディン
グワイヤ3を介して電気的に接続される。そして、外部
回路から入力信号が入力されてICチップ1が動作す
る。この時、このICチップ1から熱が発生する。そし
て、ICチップ1の温度は上昇してくるが、このICチ
ップ1にて発生した熱は放熱体4および放熱体4を介し
てフィン部材5に伝わり、この放熱体4およびフィン部
材5から外部に容易に放出されるため、ICチップ1の
温度上昇は抑制される。
Next, the operation of the semiconductor device will be described.
This semiconductor device is mounted on a printed circuit board (not shown) via external terminals 7, and an external circuit (not shown) and the IC chip 1 are electrically connected via the external terminals 7, the leads of the substrate 2 and the bonding wires 3. Connected. Then, an input signal is input from an external circuit, and the IC chip 1 operates. At this time, heat is generated from the IC chip 1. Then, although the temperature of the IC chip 1 rises, the heat generated in the IC chip 1 is transmitted to the fin member 5 via the heat radiator 4 and the heat radiator 4, and the heat is radiated from the heat radiator 4 and the fin member 5 to the outside. Therefore, the temperature rise of the IC chip 1 is suppressed.

【0005】[0005]

【発明が解決しようとする課題】ところが、ICチップ
1からの放熱により放熱体4の温度は上昇し、基板2と
の間に温度差が生じるため、放熱体4と基板2との間の
熱膨張量に差が生じる。このため、放熱体4と基板2間
に熱ストレスが発生し、基板2と接着テープ6間、また
は放熱体4と接着テープ6間、または接着テープ6内で
剥離現象が生じ、放熱体4が基板2から脱落してしまう
という課題があった。また、基板2と放熱体4間に隙間
が生じるため、ICチップ1から基板2側に対流や輻射
によって伝わった熱が放熱体4側に伝えられず、ICチ
ップ1近傍の基板2の温度が上昇してしまうという課題
があった
However, the temperature of the radiator 4 rises due to the heat radiation from the IC chip 1 and a temperature difference occurs between the radiator 4 and the substrate 2. There is a difference in the amount of expansion. For this reason, thermal stress occurs between the radiator 4 and the substrate 2, and a peeling phenomenon occurs between the substrate 2 and the adhesive tape 6, between the radiator 4 and the adhesive tape 6, or within the adhesive tape 6, and the radiator 4 There was a problem that the substrate 2 was dropped from the substrate 2 . Also, since the gap is formed between the substrate 2 and the heat radiating member 4, heat transferred by convection and radiation from the IC chip 1 on the substrate 2 side is not transmitted to the heat radiating member 4 side, the temperature of the IC chip 1 near the substrate 2 There was a problem that would rise .

【0006】この発明は上記のような課題を解消するた
めになされたもので、放熱体の基板からの脱落が生じ
ず、かつ基板の温度上昇も防止できる高放熱タイプの半
導体装置を提供することを目的とする。
SUMMARY OF THE INVENTION An object of the present invention is to provide a high heat radiation type semiconductor device in which a heat radiator does not fall off a substrate and a temperature rise of the substrate can be prevented. With the goal.

【0007】[0007]

【課題を解決するための手段】この発明の第1の発明
は、半導体素子との接続用リードを保持し、その中央部
に半導体素子を配置するための開口部が形成されている
基板と、この基板の一面側に取り付けられ、この基板の
開口部に臨む位置に半導体素子の搭載部が形成されてい
るとともに、この半導体素子からの発生熱を外部に放散
させる熱伝導率の大きい放熱体とを有する高放熱タイプ
の半導体装置において、放熱体の塔載部を凸状に突出さ
せて形成し、かつ基板の放熱体側に、開口部に臨む位置
でその塔載部を嵌め込んだ後かしめて、この放熱体を取
り付ける孔部が形成された放熱体取付部を有しているこ
とである。
According to a first aspect of the present invention, there is provided a substrate which holds a lead for connection with a semiconductor element and has an opening for arranging the semiconductor element in the center thereof. A radiator having a large thermal conductivity that is attached to one surface of the substrate and has a mounting portion for the semiconductor element formed at a position facing the opening of the substrate, and dissipates heat generated from the semiconductor element to the outside. In the high heat radiation type semiconductor device having the above, the tower mounting portion of the heat radiator is formed to protrude in a convex shape, and the tower mounting portion is fitted on the heat radiator side of the substrate at a position facing the opening and then caulked . And a heat radiator mounting portion in which a hole for mounting the heat radiator is formed.

【0008】[0008]

【0009】この発明の第2の発明は、半導体素子との
接続用リードを保持し、その中央部に半導体素子を配置
するための開口部が形成されている基板と、この基板の
一面側に取り付けられ、この基板の開口部に臨む位置に
半導体素子の搭載部が形成されているとともに、この半
導体素子からの発生熱を外部に放散させる熱伝導率の大
きい放熱体とを有する高放熱タイプの半導体装置におい
て、基板と放熱体とを接合手段で接合するとともに、こ
の接合部の基板と放熱体とに互いに嵌合する少なくとも
2組の凹凸部を設けていることである。
According to a second aspect of the present invention, there is provided a substrate which holds a lead for connection with a semiconductor element and has an opening for arranging the semiconductor element in the center thereof, A high heat radiation type having a mounting portion for the semiconductor element formed at a position facing the opening of the substrate and having a large heat conductivity for dissipating heat generated from the semiconductor element to the outside. In a semiconductor device, a substrate and a heat radiator are joined by joining means, and at least two sets of concave and convex portions are provided so as to be fitted to the substrate and the heat radiator at the joint.

【0010】この発明の第3の発明は、半導体素子との
接続用リードを保持し、その中央部に半導体素子を配置
するための開口部が形成されている基板と、この基板の
一面側に取り付けられ、この基板の開口部に臨む位置に
半導体素子の搭載部が形成されているとともに、この半
導体素子からの発生熱を外部に放散させる熱伝導率の大
きい放熱体とを有する高放熱タイプの半導体装置におい
て、基板と放熱体とを接合手段で接合するとともに、こ
の接合部を貫いて基板または放熱体側からこの基板およ
び放熱体に互いに離間した少なくとも一対の圧入ピンが
挿入されていることである。
According to a third aspect of the present invention, there is provided a substrate which holds a lead for connection with a semiconductor element and has an opening for arranging the semiconductor element in the center thereof, A high heat radiation type having a mounting portion for the semiconductor element formed at a position facing the opening of the substrate and having a large heat conductivity for dissipating heat generated from the semiconductor element to the outside. In a semiconductor device, a board and a radiator are joined by joining means, and at least a pair of press-fit pins separated from each other are inserted into the board and the radiator from the substrate or the radiator through the joint. .

【0011】[0011]

【作用】この発明の第1の発明では、放熱体の塔載部を
基板の放熱体取付部に設けられた孔部に嵌め込んだ後か
しめて、放熱体を基板の一側面側に取り付けている。こ
の場合、放熱体取付部の孔部は基板の開口部に臨んだ位
置にあるため、半導体素子はこの開口部を介して放熱体
の塔載部に容易に搭載される。そして、この半導体装置
がプリント基板等に実装され、半導体素子が動作する
と、半導体素子から発生した熱は放熱体の塔載部を介し
て外部に放出される。また、輻射や対流によって半導体
素子から基板に伝わった熱も、基板に嵌め込まれている
放熱体の塔載部に伝えられ、これから外部に放出され
る。さらに、放熱体の塔載部を基板の孔部に嵌め込んだ
後かしめているので、放熱体が基板に堅固に取り付けら
れる分、放熱体の脱落が防止され、基板から放熱体側へ
の熱の移動も良好になる。
[Action] or after the first aspect of the invention, I write fitted tower mounting portion of the radiator to the hole provided on the heat dissipating member mounting portion of the substrate of the present invention
In short , the radiator is attached to one side of the substrate. In this case, since the hole of the radiator mounting portion is located at a position facing the opening of the substrate, the semiconductor element is easily mounted on the tower mounting portion of the radiator through this opening. Then, when the semiconductor device is mounted on a printed circuit board or the like and the semiconductor element operates, heat generated from the semiconductor element is released to the outside via the tower mounting portion of the radiator. Further, heat transmitted from the semiconductor element to the substrate by radiation or convection is also transmitted to the tower mounting portion of the radiator fitted into the substrate, and is then released to the outside. Furthermore, the tower mounting part of the radiator was fitted into the hole of the substrate
The heat sink is firmly attached to the board
As a result, the radiator is prevented from falling off, and
Heat transfer is also good.

【0012】[0012]

【0013】この発明の第2の発明では、基板と放熱体
とを接合手段にて接合し、かつこの接合部の基板と放熱
体との凹凸部を嵌合させることにより、放熱体を基板の
一面側に取り付けている。半導体素子が動作し、この半
導体素子から発生した熱が放熱体側に移動してこの放熱
体の温度が上昇し、基板と放熱体4とに温度差が生じて
も、基板と放熱体とは少なくとも2組の凹凸部で嵌合し
合って強固に結合しているため、両者の熱膨張量に差は
生じない。したがって、接合手段を介した基板と放熱体
との接合部には剥離は生じない。
In the second aspect of the present invention, the radiator is joined to the radiator by joining the substrate and the radiator by joining means, and fitting the uneven portion between the substrate and the radiator at the joint. Installed on one side. Even if the semiconductor element operates and the heat generated from the semiconductor element moves to the radiator side and the temperature of the radiator rises, and a temperature difference occurs between the substrate and the radiator 4, at least the substrate and the radiator are at least Since the two sets of concave and convex portions are fitted and firmly connected, there is no difference in the amount of thermal expansion between the two sets. Therefore, no peeling occurs at the joint between the substrate and the heat radiator via the joining means.

【0014】この発明の第3の発明では、基板と放熱体
とを接合手段にて接合し、かつこの接合部を互いに離間
した少なくとも一対の圧入ピンで貫いて基板と放熱体と
を結合させることにより、放熱体を基板の一面側に取り
付けている。したがって、基板と放熱体4とに温度差が
生じても、基板と放熱体とは圧入ピンを介して強固に結
合しているため、両者の熱膨張量に差は生じず、接合手
段を介した基板と放熱体との接合部に剥離は生じない。
According to a third aspect of the present invention , the substrate and the heat radiator are joined by a joining means, and the substrate and the heat radiator are joined by penetrating this joint with at least a pair of press-fit pins separated from each other. Thus, the heat radiator is attached to one surface of the substrate. Therefore, even if a temperature difference occurs between the substrate and the heat radiator 4, the substrate and the heat radiator are firmly connected via the press-fit pins, so that there is no difference in the amount of thermal expansion between the two and the heat radiator 4 is connected through the joining means. No peeling occurs at the joint between the substrate and the radiator.

【0015】[0015]

【実施例】以下にこの発明の実施例を図について説明す
る。参考例 図1はこの発明の参考例である半導体装置の断面図であ
る。なお、図において、図5に示した従来の半導体装置
と同一または相当部分には同一符号を付しその説明を省
略する。
BRIEF DESCRIPTION OF THE DRAWINGS FIG. Example Figure 1 is a sectional view of a semiconductor device in reference example of the present invention. In the drawing, the same or corresponding portions as those of the conventional semiconductor device shown in FIG. 5 are denoted by the same reference numerals, and description thereof will be omitted.

【0016】図において、10はその中央部にICチッ
プ配置用の開口部10aを有し、その上面上にICチッ
プ1との電気的接続用のリード(図示せず)を保持する
とともに、下部側に放熱体取付部10bを有し、この放
熱体取付部10bの前記開口部10aに臨む位置に孔部
10cが形成されている基板、11はICチップ1の塔
載部11aが凸状に突出して形成され、基板10の孔部
10c内にこの塔載部11aを圧入嵌合することにより
基板10の一面側に取り付けられる熱伝導率の大きい放
熱体である。なお、放熱体11の下面側にはフィン部材
5が取り付けられ、かつ基板10の上面側には外部端子
7が取り付けられているとともに、基板10の開口部1
0aには蓋部材8が取り付けられ、この蓋部材8により
放熱体11の塔載部11aに塔載された開口部10a内
のICチップ1の保護が図られている。
In FIG. 1, reference numeral 10 denotes an opening 10a for arranging an IC chip at the center thereof, and a lead (not shown) for electrical connection with the IC chip 1 is held on the upper surface thereof. A substrate having a radiator mounting portion 10b on the side thereof and a hole 10c formed at a position facing the opening 10a of the radiator mounting portion 10b. Reference numeral 11 denotes that the tower mounting portion 11a of the IC chip 1 has a convex shape. This is a heat radiator having high thermal conductivity, which is formed to protrude and is attached to one surface side of the substrate 10 by press-fitting the tower mounting portion 11a into the hole 10c of the substrate 10. The fin member 5 is attached to the lower surface of the radiator 11, the external terminal 7 is attached to the upper surface of the substrate 10, and the opening 1 of the substrate 10 is provided.
A cover member 8 is attached to 0a, and the cover member 8 protects the IC chip 1 in the opening 10a mounted on the tower mounting portion 11a of the radiator 11.

【0017】つぎに、この半導体装置の動作を説明す
る。この半導体装置が外部端子7を介してプリント基板
に実装され、外部回路とICチップ1とが外部端子7、
基板10のリードおよびボンディングワイヤ3を介して
電気的に接続される。そして、外部回路から入力信号が
入力されてICチップ1が動作する。この時、このIC
チップ1から熱が発生する。このため、ICチップ1の
温度は上昇してくるが、このICチップ1にて発生した
熱は放熱体11および放熱体11を介してフィン部材5
に伝わり、この放熱体11およびフィン部材5から外部
に容易に放出され、ICチップ1の温度上昇は抑制され
る。また、輻射や対流の形でICチップ1から基板10
側に伝わった熱も、基板10の放熱体取付部10bを介
して放熱体11の塔載部11a側に容易に伝えられ、I
Cチップ1近傍の基板10の温度上昇も抑えられる。
Next, the operation of the semiconductor device will be described. This semiconductor device is mounted on a printed circuit board via the external terminals 7, and the external circuit and the IC chip 1 are connected to the external terminals 7,
They are electrically connected via the leads of the substrate 10 and the bonding wires 3. Then, an input signal is input from an external circuit, and the IC chip 1 operates. At this time, this IC
Heat is generated from the chip 1. As a result, the temperature of the IC chip 1 rises, but the heat generated by the IC chip 1 is dissipated by the radiator 11 and the fin member 5 through the radiator 11.
And the heat is easily released to the outside from the radiator 11 and the fin member 5, and the temperature rise of the IC chip 1 is suppressed. In addition, the radiation from the IC chip 1 to the substrate
The heat transmitted to the side is also easily transmitted to the tower mounting portion 11a side of the radiator 11 via the radiator mounting portion 10b of the substrate 10, and
The temperature rise of the substrate 10 near the C chip 1 is also suppressed.

【0018】さらに、放熱体11が基板10の孔部10
cにその塔載部11aを圧入嵌合することにより取り付
けられているため、基板10と放熱体11間に温度差が
生じても、基板10より放熱体11の方が熱膨張率が大
きい場合、放熱板11の搭載部11aの熱膨張が基板1
0の孔部10cで受け止められ、この基板10と放熱体
11との嵌合部には熱膨張差は生じない。また、基板1
0より放熱体11の方が熱膨張率が小さい場合でも、基
板10と放熱体11との嵌合部は比較的サイズが小さい
ため、これらの間にはほとんど熱膨張差は生じない。し
たがって、基板2と放熱体4とを接着テープ6で接合し
た従来の半導体装置のように、放熱体4が基板2から脱
落したり、基板2に熱が蓄積されて基板2の温度が上昇
してしまうという不都合は生じない。
Further, the heat radiating body 11 is
c, the tower mounting portion 11a is mounted by press-fitting, so that even if a temperature difference occurs between the substrate 10 and the radiator 11, the radiator 11 has a larger coefficient of thermal expansion than the substrate 10. The thermal expansion of the mounting portion 11a of the heat sink 11
The hole 10c is received by the zero hole 10c, and there is no difference in thermal expansion between the fitting portion of the substrate 10 and the heat radiator 11. Also, substrate 1
Even when the heat radiator 11 has a smaller coefficient of thermal expansion than 0, since the fitting portion between the substrate 10 and the heat radiator 11 is relatively small in size, there is almost no difference in thermal expansion between them. Therefore, as in the conventional semiconductor device in which the substrate 2 and the heat radiator 4 are bonded with the adhesive tape 6, the heat radiator 4 falls off from the substrate 2 or heat is accumulated in the substrate 2 and the temperature of the substrate 2 rises. There is no inconvenience.

【0019】実施例1. 図2はこの発明の第1の発明の一実施例である半導体装
置の断面図である。この実施例1の半導体装置は、上記
参考例の半導体装置の放熱体11の塔載部11aを基板
10の孔部10c内に圧入嵌合した後、この塔載部11
aをかしめたものである。この放熱体11の塔載部11
aの孔部10cに対するかしめにより、放熱体11は基
板10に一層堅固に取り付けられ、放熱体11の基板1
0からの脱落がより防止される。また、放熱体11の塔
載部11aと基板10の放熱体取付部10bとの密着が
よくなる分、基板10側から放熱体11側への熱輸送が
容易になり、基板10の温度上昇が一層抑えられる。
Embodiment 1 FIG. 2 is a sectional view of a semiconductor device according to an embodiment of the first invention of the present invention. The semiconductor device of the first embodiment is
After the tower mounting portion 11a of the heat radiator 11 of the semiconductor device of the reference example is press-fitted into the hole 10c of the substrate 10, the tower mounting portion 11a
It is a crimped version of a. Tower mounting portion 11 of this heat radiator 11
The heat radiator 11 is more firmly attached to the substrate 10 by caulking the hole 10c of FIG.
Dropping from zero is further prevented. Further, since the adhesion between the tower mounting portion 11a of the radiator 11 and the radiator mounting portion 10b of the substrate 10 is improved, heat transport from the substrate 10 side to the radiator 11 side is facilitated, and the temperature of the substrate 10 further increases. Can be suppressed.

【0020】実施例2. 図3はこの発明の第2の発明の一実施例である半導体装
置の断面図である。図において、12はその中央部にI
Cチップ配置用の開口部12aを有し、その上面側にI
Cチップ1との電気的接続用のリード(図示せず)を保
持するとともに、その下面の開口部12aを挟む前後左
右の位置に2対の(4個)凹部12bが形成されている
基板、13は基板12の凹部12b側の下面に接着テー
プ6を介して接合され、基板12の開口部12aに臨む
面にICチップ1の塔載部13aが形成されているとと
もに、基板12側に前記凹部12bに嵌合する凸部13
bが形成されている熱伝導率のよい放熱体である。な
お、他の構成は上記参考例の半導体装置と同一である。
Embodiment 2 FIG. FIG. 3 is a sectional view of a semiconductor device according to an embodiment of the second invention of the present invention. In the drawing, reference numeral 12 denotes an I
It has an opening 12a for C chip placement,
A substrate holding leads (not shown) for electrical connection to the C chip 1 and having two pairs (four) of recesses 12b formed in front, rear, left and right positions sandwiching the opening 12a on the lower surface thereof; Reference numeral 13 denotes a lower surface of the substrate 12 on the side of the concave portion 12b via an adhesive tape 6, and a tower mounting portion 13a of the IC chip 1 is formed on a surface of the substrate 12 facing the opening 12a. Convex part 13 fitted into concave part 12b
This is a heat radiator having good thermal conductivity in which b is formed. The other configuration is the same as that of the semiconductor device of the above reference example .

【0021】この半導体装置では基板12と放熱体13
とが接着テープ6にて接合されており、ICチップ1の
動作に伴ない基板12と放熱体13間に熱膨張率の違い
に基づく熱ストレスが発生しようとするが、2組の基板
12の凹部12bと放熱体13の凸部13bとが嵌合
し、基板12と放熱体13とは機械的に堅固に結合され
ているため、両者は一体となって熱膨張することにな
り、基板12と放熱体13の接着テープ6を介した接合
部には熱ストレスは発生しない。したがって、基板12
と接着テープ6間、または放熱体13と接着テープ6
間、または接着テープ6内で熱ストレスに基づく剥離現
象は生じず、放熱体13が基板12から脱落してしまう
ことはない。また基板12と放熱体13間に隙間が生じ
ることもないため、ICチップ1から基板2側に対流や
輻射によって伝わった熱も放熱体13側に充分に伝えら
れ、基板12の温度が上昇してしまうということもな
い。
In this semiconductor device, the substrate 12 and the radiator 13
Are bonded by an adhesive tape 6, and thermal stress based on the difference in the coefficient of thermal expansion between the substrate 12 and the radiator 13 is caused by the operation of the IC chip 1. Since the concave portion 12b and the convex portion 13b of the heat radiator 13 are fitted to each other and the substrate 12 and the heat radiator 13 are mechanically and firmly connected, the two expand integrally and thermally. No thermal stress occurs at the joint between the heat sink 13 and the heat radiator 13 via the adhesive tape 6. Therefore, the substrate 12
And the adhesive tape 6, or between the heat radiator 13 and the adhesive tape 6.
No peeling phenomenon due to thermal stress occurs in the gap or in the adhesive tape 6, and the heat radiator 13 does not fall off the substrate 12. Further, since there is no gap between the substrate 12 and the heat radiator 13, heat transmitted from the IC chip 1 to the substrate 2 by convection or radiation is also sufficiently transmitted to the heat radiator 13 and the temperature of the substrate 12 rises. There is no such thing as.

【0022】なお、基板12の凹部12bと放熱体13
の凸部13bとは互いに離れた位置に少なくとも2組
(凹部12b2個、凸部13b2個)あればよく、かつ
基板12の凹部12bと放熱体13の凸部13bとを逆
にしてもよいのはもちろんである。
The recess 12b of the substrate 12 and the radiator 13
It is sufficient that at least two sets (two concave portions 12b and two convex portions 13b) are provided at positions separated from each other, and the concave portion 12b of the substrate 12 and the convex portion 13b of the heat radiator 13 may be reversed. Of course.

【0023】また、放熱体13とフィン部材5とを接着
テープ6を介して接合する場合においても、温度の違い
により熱膨張量に違いが生じて、その接着テープ6を介
した接合部に剥離現象が生じるおそれもあるが、この場
合においても、放熱体13とフィン部材5との接着テー
プ6を介した接合部に少なくとも2組の凹凸部を設け、
この凹凸部を嵌合させるようにすれば、前記基板12と
放熱体13の場合と同様な効果を得ることができる。
In the case where the radiator 13 and the fin member 5 are joined via the adhesive tape 6, a difference in temperature causes a difference in the amount of thermal expansion. Although a phenomenon may occur, also in this case, at least two sets of concave and convex portions are provided at a joint portion between the heat radiator 13 and the fin member 5 via the adhesive tape 6,
If the concave and convex portions are fitted, the same effect as in the case of the substrate 12 and the heat radiator 13 can be obtained.

【0024】実施例3. 図4はこの発明の第3の発明の一実施例である半導体装
置の断面図である。図において、14はその中央部にI
Cチップ配置用の開口部14aを有し、その上面側にI
Cチップ1との電気的接続用のリード(図示せず)を保
持するとともに、開口部14aを挟む前後左右の位置に
上下に貫通する2対(4本)の貫通孔14bが形成され
ている基板、15は基板14の下面に接着テープ6を介
して取り付けられ、基板14の開口部14aに臨む面に
ICチップ1の塔載部15aが形成されているととも
に、基板14側の貫通孔14bに対向する位置に、この
貫通孔14bと同サイズの凹部15bが形成されている
熱伝導率の大きい放熱体、16は基板14の貫通孔14
bおよび放熱体15の凹部15bに圧入されるピンであ
る。なお、他の構成は上記参考例の半導体装置と同一で
ある。
Embodiment 3 FIG. FIG. 4 is a sectional view of a semiconductor device according to a third embodiment of the present invention. In the figure, 14 is I in the center
It has an opening 14a for C chip placement,
Two pairs (four) of through-holes 14b are formed to hold leads (not shown) for electrical connection to the C-chip 1 and vertically penetrate the opening 14a at front, rear, left and right positions. The substrate 15 is attached to the lower surface of the substrate 14 with the adhesive tape 6 therebetween. The tower mounting portion 15a of the IC chip 1 is formed on the surface of the substrate 14 facing the opening 14a. A heat radiator having a high thermal conductivity and a recess 15b having the same size as the through hole 14b is formed at a position facing the through hole 14b.
b and a pin pressed into the recess 15b of the heat radiator 15. The other configuration is the same as that of the semiconductor device of the above reference example .

【0025】この半導体装置も実施例2の半導体装置と
同様に、基板14と放熱体15との接着テープ6を介し
た接合部に熱ストレスが発生しようとするが、基板14
と放熱体15とがピン16を介して堅固に結合されてい
るため、この接合部には大きな熱ストレスは発生しな
い。したがって、基板14と放熱体15との接着テープ
6を介した接合部には剥離現象は生じず、放熱体13が
基板14から脱落してしまうことはない。また、ICチ
ップ1から基板14側に伝わった熱も放熱体15側に充
分に伝えられ、基板14の温度が上昇してしまうことも
ない。
In this semiconductor device, as in the semiconductor device of the second embodiment , thermal stress is likely to be generated at the joint between the substrate 14 and the radiator 15 via the adhesive tape 6.
Since the heat radiator 15 and the heat radiator 15 are firmly connected to each other via the pin 16, no large thermal stress is generated at this joint. Therefore, no peeling phenomenon occurs at the joint between the substrate 14 and the radiator 15 via the adhesive tape 6, and the radiator 13 does not fall off the substrate 14. Further, the heat transmitted from the IC chip 1 to the substrate 14 is sufficiently transmitted to the radiator 15 side, so that the temperature of the substrate 14 does not increase.

【0026】なお、基板14の貫通孔14bと放熱体1
5の凹部15bとは互いに離れた位置に少なくとも2組
(貫通孔14b2個、凹部15b2個)あればよく、か
つ基板14の貫通孔14bと放熱体15の凹部15bと
を逆にしてもよいのはもちろんである。
The through hole 14b of the substrate 14 and the radiator 1
It is sufficient that at least two sets (two through holes 14b and two recesses 15b) are provided at positions separated from the five recesses 15b, and the through hole 14b of the substrate 14 and the recess 15b of the heat radiator 15 may be reversed. Of course.

【0027】また、上記各実施例では、接合手段として
接着テープ6を用いるものとしているが、接合手段は接
着テープ6に限らず、接着剤、粘着剤等でもよいのはも
ちろんである。
Further, in each of the above embodiments, the adhesive tape 6 is used as the joining means. However, the joining means is not limited to the adhesive tape 6, but may be an adhesive, an adhesive or the like.

【0028】[0028]

【発明の効果】この発明は、以上のように構成されてい
るので、以下に記載されるような効果を奏する。
Since the present invention is configured as described above, it has the following effects.

【0029】この発明の第1の発明によれば、半導体素
子との接続用リードを保持し、その中央部に半導体素子
を配置するための開口部が形成されている基板と、この
基板の一面側に取り付けられ、この基板の開口部に臨む
位置に半導体素子の搭載部が形成されているとともに、
この半導体素子からの発生熱を外部に放散させる熱伝導
率の大きい放熱体とを有する高放熱タイプの半導体装置
において、放熱体の塔載部を凸状に突出させて形成し、
かつ基板の放熱体側に、開口部に臨む位置でその塔載部
を嵌め込んだ後かしめて、この放熱体を取り付ける孔部
が形成された放熱体取付部を有しているので、基板と放
熱体間に温度差が生じても、放熱体と基板とはしっかり
結合されており、放熱体が基板から脱落したり、基板の
温度が上昇したりすることはない。
According to the first aspect of the present invention, there is provided a substrate on which a lead for holding a connection with a semiconductor element is held, and an opening for arranging the semiconductor element is formed in the center thereof, and one surface of the substrate. Side, and a mounting portion of the semiconductor element is formed at a position facing the opening of the substrate,
In a high heat radiation type semiconductor device having a heat radiator having a large thermal conductivity for dissipating heat generated from the semiconductor element to the outside, a tower mounting portion of the heat radiator is formed to project in a convex shape,
In addition, since the tower mounting portion is fitted on the heat radiator side of the substrate at a position facing the opening and then caulked , and the heat radiator mounting portion having the hole for mounting the heat radiator is provided, the substrate and the heat radiator are provided. Even if there is a temperature difference between the bodies , the radiator and the board are firmly
And coupled to the heat dissipation body is dropped or if et de substrate, is not the temperature of the substrate or rises.

【0030】[0030]

【0031】この発明の第2の発明によれば、半導体素
子との接続用リードを保持し、その中央部に半導体素子
を配置するための開口部が形成されている基板と、この
基板の一面側に取り付けられ、この基板の開口部に臨む
位置に半導体素子の搭載部が形成されているとともに、
この半導体素子からの発生熱を外部に放散させる熱伝導
率の大きい放熱体とを有する高放熱タイプの半導体装置
において、基板と放熱体とを接合手段で接合するととも
に、この接合部の基板と放熱体とに互いに嵌合する少な
くとも2組の凹凸部を設けているので、基板と放熱体間
に温度差が生じても、この凹凸部を介して放熱体と基板
とはしっかり結合されており、接合手段を介した基板と
放熱体との接合部に剥離は生じず、放熱体が基板から脱
落したり、基板の温度が上昇したりすることはない。
According to the second aspect of the present invention , a substrate for holding a connection lead for connecting to a semiconductor element and having an opening for arranging the semiconductor element in the center thereof, and one surface of the substrate Side, and a mounting portion of the semiconductor element is formed at a position facing the opening of the substrate,
In a high heat dissipation type semiconductor device having a heat radiator having a large thermal conductivity for dissipating heat generated from the semiconductor element to the outside, the substrate and the heat radiator are joined by joining means, Since at least two sets of projections and depressions fitted to each other are provided on the body, even if a temperature difference occurs between the substrate and the heat dissipation body, the heat dissipation body and the board are firmly coupled via the projections and depressions, There is no separation at the junction between the substrate and the heat radiator via the bonding means, and the heat radiator does not fall off the substrate and the temperature of the substrate does not rise.

【0032】この発明の第3の発明によれば、半導体素
子との接続用リードを保持し、その中央部に半導体素子
を配置するための開口部が形成されている基板と、この
基板の一面側に取り付けられ、この基板の開口部に臨む
位置に半導体素子の搭載部が形成されているとともに、
この半導体素子からの発生熱を外部に放散させる熱伝導
率の大きい放熱体とを有する高放熱タイプの半導体装置
において、基板と放熱体とを接合手段で接合するととも
に、この接合部を貫いて基板または放熱体側からこの基
板および放熱体に、互いに離間した少なくとも一対の圧
入ピンが挿入されているので、基板と放熱体間に温度差
が生じても、圧入ピンを介して放熱体と基板とはしっか
り結合されており、接合手段を介した基板と放熱体との
接合部に剥離は生じず、放熱体が基板からの脱落した
り、基板の温度が上昇したりすることはない。
According to the third aspect of the present invention, there is provided a substrate which holds a lead for connection with a semiconductor element and has an opening for arranging the semiconductor element in the center thereof, and one surface of the substrate. Side, and a mounting portion of the semiconductor element is formed at a position facing the opening of the substrate,
In a high heat radiation type semiconductor device having a heat radiator having a large thermal conductivity for dissipating heat generated from the semiconductor element to the outside, the substrate and the heat radiator are joined by joining means, and the substrate is pierced through the joint. Alternatively, since at least a pair of press-fit pins spaced apart from each other are inserted into the board and the heat radiator from the heat radiator side, even if a temperature difference occurs between the board and the heat radiator, the heat radiator and the board can be connected via the press-fit pins. It is firmly connected, and there is no separation at the junction between the substrate and the heat radiator via the bonding means, so that the heat radiator does not fall off the substrate or the temperature of the substrate rises.

【図面の簡単な説明】[Brief description of the drawings]

【図1】 この発明の参考例に係る半導体装置の断面図
である。
FIG. 1 is a sectional view of a semiconductor device according to a reference example of the present invention.

【図2】 この発明の実施例1に係る半導体装置の断面
図である。
FIG. 2 is a sectional view of the semiconductor device according to the first embodiment of the present invention;

【図3】 この発明の実施例2に係る半導体装置の断面
図である。
FIG. 3 is a sectional view of a semiconductor device according to a second embodiment of the present invention.

【図4】 この発明の実施例3に係る半導体装置の断面
図である。
FIG. 4 is a sectional view of a semiconductor device according to a third embodiment of the present invention.

【図5】 従来の半導体装置の断面図である。FIG. 5 is a cross-sectional view of a conventional semiconductor device.

【符号の説明】[Explanation of symbols]

1 半導体素子、6 接着テープ(接合手段)、10
基板、10a 開口部、10b 放熱体取付部、10c
孔部、11 放熱体、11a 塔載部、12基板、1
2a 開口部、12b 凹部、13 放熱体、13a
塔載部、13b 凸部、14 基板、14a 開口部、
15 放熱体、15a 塔載部、16圧入ピン。
DESCRIPTION OF SYMBOLS 1 Semiconductor element, 6 Adhesive tape (joining means), 10
Substrate, 10a opening, 10b radiator mounting part, 10c
Hole, 11 radiator, 11a tower mounting part, 12 substrates, 1
2a opening, 12b recess, 13 radiator, 13a
Tower mounting portion, 13b convex portion, 14 substrate, 14a opening portion,
15 Heat radiator, 15a Tower mounting part, 16 press-fit pins.

───────────────────────────────────────────────────── フロントページの続き (58)調査した分野(Int.Cl.7,DB名) H01L 23/40 ──────────────────────────────────────────────────続 き Continuation of front page (58) Field surveyed (Int.Cl. 7 , DB name) H01L 23/40

Claims (3)

(57)【特許請求の範囲】(57) [Claims] 【請求項1】 半導体素子との接続用リードを保持し、
その中央部に前記半導体素子を配置するための開口部が
形成されている基板と、この基板の一面側に取り付けら
れ、この基板の前記開口部に臨む位置に前記半導体素子
の搭載部が形成されているとともに、この半導体素子か
らの発生熱を外部に放散させる熱伝導率の大きい放熱体
とを有する高放熱タイプの半導体装置において、前記放
熱体の前記塔載部を凸状に突出させて形成し、かつ前記
基板の前記放熱体側に、前記開口部に臨む位置でその塔
載部を嵌め込んだ後かしめて、この放熱体を取り付ける
孔部が形成された放熱体取付部を有していることを特徴
とする高放熱タイプの半導体装置。
1. A connection lead for holding a connection with a semiconductor element,
A substrate in which an opening for arranging the semiconductor element is formed in a central portion thereof, and a mounting portion for the semiconductor element formed in a position facing the opening in the substrate, which is mounted on one surface side of the substrate; And a radiator having a large thermal conductivity for dissipating heat generated from the semiconductor element to the outside. In the high heat radiation type semiconductor device, the tower mounting portion of the radiator is formed to project in a convex shape. And, on the radiator side of the substrate, there is provided a radiator mounting portion in which a hole for mounting the radiator is formed after the tower mounting portion is fitted at a position facing the opening and then crimped. A high heat dissipation type semiconductor device characterized by the above-mentioned.
【請求項2】 半導体素子との接続用リードを保持し、
その中央部に前記半導体素子を配置するための開口部が
形成されている基板と、この基板の一面側に取り付けら
れ、この基板の前記開口部に臨む位置に前記半導体素子
の搭載部が形成されているとともに、この半導体素子か
らの発生熱を外部に放散させる熱伝導率の大きい放熱体
とを有する高放熱タイプの半導体装置において、前記基
板と前記放熱体とを接合手段で接合するとともに、この
接合部の前記基板と前記放熱体とに互いに嵌合する少な
くとも2組の凹凸部を設けていることを特徴とする高放
熱タイプの半導体装置。
2. A semiconductor device comprising a lead for connection with a semiconductor element,
A substrate in which an opening for arranging the semiconductor element is formed in a central portion thereof, and a mounting portion for the semiconductor element formed in a position facing the opening in the substrate, which is mounted on one surface side of the substrate; In addition, in a high heat radiation type semiconductor device having a heat radiator having a large thermal conductivity for dissipating heat generated from the semiconductor element to the outside, the substrate and the heat radiator are joined by joining means. A high heat dissipation type semiconductor device, comprising: at least two sets of concave and convex portions which are fitted to each other on the substrate and the heat radiator of a joint portion.
【請求項3】 半導体素子との接続用リードを保持し、
その中央部に前記半導体素子を配置するための開口部が
形成されている基板と、この基板の一面側に取り付けら
れ、この基板の前記開口部に臨む位置に前記半導体素子
の搭載部が形成されているとともに、この半導体素子か
らの発生熱を外部に放散させる熱伝導率の大きい放熱体
とを有する高放熱タイプの半導体装置において、前記基
板と前記放熱体とを接合手段で接合するとともに、この
接合部を貫いて前記基板または前記放熱体側からこの基
板および放熱体に、互いに離間した少なくとも一対の圧
入ピンが挿入されていることを特徴とする高放熱タイプ
の半導体装置。
3. A connection lead for holding a connection with a semiconductor element,
A substrate in which an opening for arranging the semiconductor element is formed in a central portion thereof, and a mounting portion for the semiconductor element formed in a position facing the opening in the substrate, which is mounted on one surface side of the substrate; In addition, in a high heat radiation type semiconductor device having a heat radiator having a large thermal conductivity for dissipating heat generated from the semiconductor element to the outside, the substrate and the heat radiator are joined by joining means. A high heat radiation type semiconductor device characterized in that at least a pair of press-fit pins spaced apart from each other are inserted into the substrate and the heat radiator from the substrate or the heat radiator through a joint.
JP3353193A 1993-02-23 1993-02-23 High heat dissipation type semiconductor device Expired - Fee Related JP3195843B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP3353193A JP3195843B2 (en) 1993-02-23 1993-02-23 High heat dissipation type semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3353193A JP3195843B2 (en) 1993-02-23 1993-02-23 High heat dissipation type semiconductor device

Publications (2)

Publication Number Publication Date
JPH06252303A JPH06252303A (en) 1994-09-09
JP3195843B2 true JP3195843B2 (en) 2001-08-06

Family

ID=12389136

Family Applications (1)

Application Number Title Priority Date Filing Date
JP3353193A Expired - Fee Related JP3195843B2 (en) 1993-02-23 1993-02-23 High heat dissipation type semiconductor device

Country Status (1)

Country Link
JP (1) JP3195843B2 (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2015029043A (en) * 2013-06-26 2015-02-12 京セラ株式会社 Electronic device and optical module
KR20230011733A (en) * 2021-07-14 2023-01-25 엘지이노텍 주식회사 Printed Circuit Board module and Electronic device having the same

Also Published As

Publication number Publication date
JPH06252303A (en) 1994-09-09

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