JP3140312U - レーザーエッチング装置 - Google Patents
レーザーエッチング装置 Download PDFInfo
- Publication number
- JP3140312U JP3140312U JP2008000034U JP2008000034U JP3140312U JP 3140312 U JP3140312 U JP 3140312U JP 2008000034 U JP2008000034 U JP 2008000034U JP 2008000034 U JP2008000034 U JP 2008000034U JP 3140312 U JP3140312 U JP 3140312U
- Authority
- JP
- Japan
- Prior art keywords
- laser
- light guide
- laser beam
- backlight module
- etching apparatus
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 238000010329 laser etching Methods 0.000 title claims abstract description 32
- 238000005530 etching Methods 0.000 claims description 5
- 238000000034 method Methods 0.000 description 7
- 238000010586 diagram Methods 0.000 description 5
- 238000004519 manufacturing process Methods 0.000 description 3
- 238000001039 wet etching Methods 0.000 description 2
- 238000003754 machining Methods 0.000 description 1
Images
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/1303—Apparatus specially adapted to the manufacture of LCDs
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
- G02F1/1336—Illuminating devices
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N60/00—Superconducting devices
- H10N60/01—Manufacture or treatment
- H10N60/0268—Manufacture or treatment of devices comprising copper oxide
- H10N60/0296—Processes for depositing or forming copper oxide superconductor layers
- H10N60/0521—Processes for depositing or forming copper oxide superconductor layers by pulsed laser deposition, e.g. laser sputtering
Landscapes
- Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Nonlinear Science (AREA)
- Engineering & Computer Science (AREA)
- General Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- Manufacturing & Machinery (AREA)
- Mathematical Physics (AREA)
- Mechanical Engineering (AREA)
- Plasma & Fusion (AREA)
- Laser Beam Processing (AREA)
- Mechanical Optical Scanning Systems (AREA)
Abstract
【解決手段】バックライト・モジュール部品を載せる・移動するプラットホームと、レーザー光線を発生させるレーザー光源と、前記レーザー光線をリードして発する導光器とを備えてなり、前記導光器は、前記レーザー光線が前記バックライト・モジュール部品に当てられる位置を調整する振動ミラー式走査系統を含むことを特徴とするレーザーエッチング装置が提供される。
【選択図】図3
Description
前記導光器は、前記レーザー光線を前記バックライト・モジュール部品に垂直に当てる垂直光発生装置を含むことを特徴とする。
11、31 レーザー光源
12、32、52 レーザー光線
13、33、53 導光器
15、35 プラットホーム
16 バックライト・モジュール部品
17、37、57 振動ミラー式走査系統
36、56 部品
39、59 垂直光発生装置
Claims (3)
- バックライト・モジュール部品をエッチングするためのレーザーエッチング装置であって、
前記バックライト・モジュール部品を載せる・移動するプラットホームと、
レーザー光線を発生させるレーザー光源と、
前記レーザー光線をリードして発する導光器とを備えてなり、
前記導光器は、前記レーザー光線が前記バックライト・モジュール部品に当てられる位置を調整する振動ミラー式走査系統を含むことを特徴とするレーザーエッチング装置。 - 前記プラットホームはXY軸機械式プラットホームであり、
前記バックライト・モジュール部品は導光板又は該導光板のモールドで、面積が462.25cm2以上であり、
前記レーザー光線のモードはTEM00であり、
前記導光器は、前記レーザー光線を前記バックライト・モジュール部品に垂直に当てる垂直光発生装置を含むことを特徴とする請求項1に記載のレーザーエッチング装置。 - 前記垂直光発生装置はテレセントリック・フラットフィールド・レンズであることを特徴とする請求項1に記載のレーザーエッチング装置。
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
TW096208005U TWM322096U (en) | 2007-05-17 | 2007-05-17 | Laser etching device |
Publications (1)
Publication Number | Publication Date |
---|---|
JP3140312U true JP3140312U (ja) | 2008-03-21 |
Family
ID=39295464
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2008000034U Expired - Lifetime JP3140312U (ja) | 2007-05-17 | 2008-01-08 | レーザーエッチング装置 |
Country Status (3)
Country | Link |
---|---|
JP (1) | JP3140312U (ja) |
KR (1) | KR200456071Y1 (ja) |
TW (1) | TWM322096U (ja) |
-
2007
- 2007-05-17 TW TW096208005U patent/TWM322096U/zh not_active IP Right Cessation
- 2007-10-23 KR KR2020070017050U patent/KR200456071Y1/ko not_active IP Right Cessation
-
2008
- 2008-01-08 JP JP2008000034U patent/JP3140312U/ja not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
KR20080005596U (ko) | 2008-11-21 |
KR200456071Y1 (ko) | 2011-10-10 |
TWM322096U (en) | 2007-11-11 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
CN104105994B (zh) | 用于激光束扫描的声光偏转器的配置 | |
US20080302771A1 (en) | Laser engraving system and engraving method | |
JP2009124035A (ja) | レーザー加工装置およびレーザー加工方法 | |
JP5392943B2 (ja) | レーザ加工方法、レーザ加工装置及びソーラパネル製造方法 | |
TW201913795A (zh) | 使用選擇性聚焦深度的輻射晶片切割 | |
KR100809583B1 (ko) | 레이저 패턴 가공장치 | |
US10969576B2 (en) | Piezo actuators for optical beam steering applications | |
JP2018136362A (ja) | 画像表示装置 | |
CN105117066B (zh) | 触控面板、触控面板的制造方法及激光蚀刻装置 | |
JP3140312U (ja) | レーザーエッチング装置 | |
CN112605542A (zh) | 一种激光系统及其加工柔性线路板的方法 | |
CN1199802C (zh) | 具有可变的印刷点尺寸的激光成象设备和方法 | |
CN115805365A (zh) | 一种复合偏转激光填充扫描系统、方法、装置及设备 | |
TWI636844B (zh) | 雷射加工方法 | |
KR101083432B1 (ko) | Co2 레이저를 이용한 도광판 패턴 형성 장치 | |
CN211162432U (zh) | 一种双振镜高速紫外激光切割fpc装置 | |
CN112496570B (zh) | 一种超快紫外激光pcb材料的加工方法及装置 | |
JP7368373B2 (ja) | レーザ加工装置 | |
CN101898482B (zh) | 组合式多波长激光多用加工机 | |
JP7278868B2 (ja) | レーザ加工装置 | |
JP5319175B2 (ja) | パターン描画方法及び装置 | |
JP7108517B2 (ja) | レーザ加工装置 | |
KR100748854B1 (ko) | 레이저 가공 장치 | |
KR100863071B1 (ko) | 405나노미터 레이저다이오드를 이용한 멀티노광장치 | |
KR20040100042A (ko) | 레이저를 이용한 스크라이빙 장치 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
R150 | Certificate of patent or registration of utility model |
Free format text: JAPANESE INTERMEDIATE CODE: R150 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20110227 Year of fee payment: 3 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20110227 Year of fee payment: 3 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20120227 Year of fee payment: 4 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20120227 Year of fee payment: 4 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20130227 Year of fee payment: 5 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20130227 Year of fee payment: 5 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20140227 Year of fee payment: 6 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
EXPY | Cancellation because of completion of term |