JP3115088B2 - Optical information recording medium provided with silicon hydride film - Google Patents

Optical information recording medium provided with silicon hydride film

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Publication number
JP3115088B2
JP3115088B2 JP04069255A JP6925592A JP3115088B2 JP 3115088 B2 JP3115088 B2 JP 3115088B2 JP 04069255 A JP04069255 A JP 04069255A JP 6925592 A JP6925592 A JP 6925592A JP 3115088 B2 JP3115088 B2 JP 3115088B2
Authority
JP
Japan
Prior art keywords
recording medium
optical information
film
silicon hydride
information recording
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP04069255A
Other languages
Japanese (ja)
Other versions
JPH05234137A (en
Inventor
弘之 岡本
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Ricoh Co Ltd
Original Assignee
Ricoh Co Ltd
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Filing date
Publication date
Application filed by Ricoh Co Ltd filed Critical Ricoh Co Ltd
Priority to JP04069255A priority Critical patent/JP3115088B2/en
Publication of JPH05234137A publication Critical patent/JPH05234137A/en
Application granted granted Critical
Publication of JP3115088B2 publication Critical patent/JP3115088B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【技術分野】本発明は、レーザー光を用いて、情報の記
録、再生、消去を行う光情報記録媒体に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an optical information recording medium for recording, reproducing, and erasing information using a laser beam.

【0002】[0002]

【従来技術】光情報記録媒体において記録層を支持する
基板はポリカーボネートやガラス、2P(フォトポリマ
ー)樹脂など、一般に誘電性の樹脂で形成されているた
め帯電しやすい。光情報記録媒体が帯電すると微少な塵
やゴミ等が静電気により記録媒体の読み取り面側表面に
付着して情報の再生及び記録の妨げになる。また帯電電
荷が電子回路の誤動作を誘発する原因ともなる。このよ
うな光情報記録媒体の帯電を防止する目的で、光情報記
録媒体の読み取り側表面に帯電防止膜を設けることが提
案されている。さらに基板表面に付着した塵を布などで
清掃した場合、ポリカーボネート基板などは表面硬度が
低いため、基板にキズが生じ情報の記録・再生に支障を
来すことになる。以上のように光情報記録媒体の読み取
り面側表面は帯電防止機能と高い表面硬度を兼ね備える
ことが好ましい。さらに入射レーザー光を有効に利用
し、再生出力を大きくするための反射防止機能を有する
ことも重要である。
2. Description of the Related Art A substrate for supporting a recording layer in an optical information recording medium is generally formed of a dielectric resin such as polycarbonate, glass, and 2P (photopolymer) resin, and thus is easily charged. When the optical information recording medium is charged, minute dust and dirt adhere to the reading surface side surface of the recording medium due to static electricity and hinder reproduction and recording of information. In addition, the charged charge may cause a malfunction of the electronic circuit. For the purpose of preventing such an optical information recording medium from being charged, it has been proposed to provide an antistatic film on the reading side surface of the optical information recording medium. Further, when dust adhering to the substrate surface is cleaned with a cloth or the like, since the surface hardness of the polycarbonate substrate or the like is low, the substrate is scratched, which hinders recording and reproduction of information. As described above, the reading surface side surface of the optical information recording medium preferably has both an antistatic function and a high surface hardness. It is also important to have an anti-reflection function to increase the reproduction output by effectively using the incident laser light.

【0003】[0003]

【目的】そこで本発明は、このような従来技術の課題を
解決することを目的としてなされたもので、静電気によ
る塵の付着及びキズの発生を防止した信頼性の高い光情
報記録媒体を提供することを目的とする。
SUMMARY OF THE INVENTION The present invention has been made to solve the above-mentioned problems of the prior art, and provides a highly reliable optical information recording medium in which dust and adhesion due to static electricity are prevented. The purpose is to:

【0004】[0004]

【構成】本発明は、少なくとも透明基板と記録層とから
なり、レーザーを照射し記録再生を行う光情報記録媒体
において、該記録媒体の記録再生側表面に帯電防止機能
・反射防止機能・高表面硬度を有する水素化シリコン膜
を設けることで、前記課題の解決を達成した。すなわ
ち、少なくとも透明基板と記録層とからなり、レーザー
光を照射し記録再生を行う光情報記録媒体において、該
記録媒体の記録再生側表面に光学ギャップが2.1eV
以上の水素化シリコン膜を設けたことを特徴とする光情
報記録媒体であり、また、好ましくは該水素化シリコン
膜が活性型の伝導率を示し、その値が室温で1×10
-13S/cm以上であるものである。本発明において、
前記水素化シリコン膜は、少なくとも該記録媒体の記録
再生側の表面に設けることが必要であるが、その被処理
対象は前記表面に限らず、該媒体の他の大気に接触する
表面、例えば保護層に設けてもよい。さらに該媒体の中
間層、例えば下引層等に設けてもよく、このような中間
層に設ける場合には、該媒体製造時に発生する静電気を
防止できる。水素化シリコン膜を構成する水素化シリコ
ンは、シリコンと水素からなる無機材料で、水素含有量
と結合様式を変えることで、光学特性、電気特性、機械
特性をある程度任意に変えることができ、該膜は、好ま
しくはシランガスと水素ガスをECRプラズマCVD法
を用いて分解して形成できる。
The present invention relates to an optical information recording medium comprising at least a transparent substrate and a recording layer and irradiating a laser to perform recording and reproduction, wherein an antistatic function, an antireflection function and a high surface By providing a silicon hydride film having hardness, the above-mentioned problem was solved. That is, in an optical information recording medium comprising at least a transparent substrate and a recording layer and performing recording and reproduction by irradiating a laser beam, an optical gap of 2.1 eV is formed on the recording and reproduction side surface of the recording medium.
An optical information recording medium provided with the above silicon hydride film, and preferably, the silicon hydride film has an active conductivity, and the value is 1 × 10 at room temperature.
-13 S / cm or more. In the present invention,
The silicon hydride film needs to be provided at least on the recording / reproducing side surface of the recording medium, but the object to be processed is not limited to the surface, and the surface of the medium that comes into contact with the other atmosphere, for example, a protective surface It may be provided in a layer. Further, it may be provided on an intermediate layer of the medium, for example, an undercoat layer. When such an intermediate layer is provided, static electricity generated at the time of manufacturing the medium can be prevented. Silicon hydride that constitutes the silicon hydride film is an inorganic material composed of silicon and hydrogen.By changing the hydrogen content and the bonding mode, the optical characteristics, electric characteristics, and mechanical characteristics can be changed to some extent. The film can be formed preferably by decomposing silane gas and hydrogen gas using ECR plasma CVD.

【0005】透明基板としては、ポリカーボネート、ア
クリル、エポキシ、PMMA(ポリメチルメタクリレー
ト)等の合成樹脂、ガラスまたは2P基板等が使用され
る。
As the transparent substrate, a synthetic resin such as polycarbonate, acrylic, epoxy, PMMA (polymethyl methacrylate), glass, or a 2P substrate is used.

【0006】記録層としては、レーザー光の照射によ
り、記録層を変形、昇華、蒸発或いは変性させる等の手
段で、ピットを形成しデータを記録するもの、あるいは
光磁気を利用して記録するものが挙げられる。前者とし
ては、Te,Bi,Mn等の金属層、シアニン、メロシ
アニン、フタロシアニン等の色素層があげられる。後者
の光磁気効果を用いた記録用材料としては、GdCo,
TbFe,TbFeCo,TbDyFe,TbDyFe
Co合金などがある。これらはいずれも非晶質であり、
膜面に垂直な方向に磁化容易軸をもつ。該薄膜の形成は
スパッタあるいは電子ビーム蒸着等が使用できる。さら
に、その他の相変化等を利用した記録材料、例えば結晶
−非晶質間の相変化を利用した記録材料で形成した記録
層であってもよい。
[0006] The recording layer is formed by forming pits and recording data by means of deforming, sublimating, evaporating or denaturing the recording layer by irradiating a laser beam, or by using magneto-optics. Is mentioned. Examples of the former include a metal layer such as Te, Bi, and Mn, and a dye layer such as cyanine, merocyanine, and phthalocyanine. As the recording material using the latter magneto-optical effect, GdCo,
TbFe, TbFeCo, TbDyFe, TbDyFe
Co alloy and the like. These are all amorphous,
It has an easy axis of magnetization in a direction perpendicular to the film surface. The thin film can be formed by sputtering or electron beam evaporation. Further, the recording layer may be a recording material utilizing other phase change, such as a recording material utilizing a phase change between crystal and amorphous.

【0007】本発明の光情報記録媒体は、前記の透明基
板および記録層を基本的なものであるが、必要に応じ他
の層、例えば以下のような層を有していてもよい。基板
の片側あるいは両面、特に記録層が設けられる側の基板
表面には、平面性の改善、記録層との接着力の向上、断
熱効果による感度の向上および記録層の変質の防止など
の目的で、下塗層が設けられていてもよい。また、必要
に応じてプレグルーブ層が設けることができる。このプ
レグルーブ層は、例えば放射線硬化型樹脂を、電子線、
紫外線等を照射することにより形成できる。特に光磁気
効果を用いた記録用材料として、遷移金属と希土金属と
を組合せた膜(RE−TM膜)は酸化腐食を受け易く、
またRE−TM膜自体の力−効果やファラデー効果とい
った磁気光学効果が大きくないため、RE−TM膜の片
面もしくは両面に、保護膜としてレーザ光に対して透明
で屈折率の大きい誘電体膜、すなわちエンハンスメント
膜の機能も有しているものを設けるのが好ましい。
Although the optical information recording medium of the present invention basically has the above-mentioned transparent substrate and recording layer, it may have other layers as required, for example, the following layers. On one or both sides of the substrate, especially on the substrate surface on the side where the recording layer is provided, for the purpose of improving flatness, improving adhesion to the recording layer, improving sensitivity due to a heat insulating effect, and preventing deterioration of the recording layer. , An undercoat layer may be provided. In addition, a pre-groove layer can be provided as needed. This pre-groove layer is made of, for example, a radiation-curable resin, an electron beam,
It can be formed by irradiating ultraviolet rays or the like. In particular, as a recording material using the magneto-optical effect, a film (RE-TM film) in which a transition metal and a rare earth metal are combined is susceptible to oxidative corrosion.
Further, since the magneto-optical effect such as the force-effect and the Faraday effect of the RE-TM film itself is not large, a dielectric film which is transparent to laser light and has a large refractive index as a protective film on one or both surfaces of the RE-TM film, That is, it is preferable to provide one having the function of an enhancement film.

【0008】さらに、光情報記録媒体の反射率を高める
ために、反射膜として金属膜を設けるのが好ましく、例
えば、金、銀、アルミニウムあるいはこれらを含む合金
を、蒸着法、スパッタ法等の手段により形成することが
できる。
Further, in order to increase the reflectance of the optical information recording medium, it is preferable to provide a metal film as a reflection film. For example, gold, silver, aluminum or an alloy containing these may be deposited by means of vapor deposition, sputtering or the like. Can be formed.

【0009】また、反射膜上には耐衝撃性の優れた樹脂
によって形成される保護層を設けるのが望ましく、たと
えば紫外線硬化樹脂をスピンコート法により塗布し、紫
外線を照射して硬化させることにより形成する。
It is desirable to provide a protective layer formed of a resin having excellent impact resistance on the reflective film. For example, an ultraviolet curable resin is applied by a spin coating method, and cured by irradiating ultraviolet rays. Form.

【0010】以下、図示の実施例に基づいて説明する。
図1は、記録層に光磁気記録磁性材料を用いた光磁気デ
ィスクを示している。但し、前記したように、本発明の
光情報記録媒体は、記録層に光磁気記録磁性材料を用い
る場合に限定されるものではない。透明基板1の上には
順に第1誘電体保護層2、光磁気記録層3、第2誘電体
保護層4、金属反射層5、有機保護膜6が形成され、他
方の面(読み取り面側表面)には高硬度と帯電防止機能
を備えた水素化シリコン膜7が形成されている。第1誘
電体保護層2、第2誘電体保護層4は光磁気記録層3を
2O,O2等による酸化腐食から保護したり、力−回転
角のエンハンスメント効果のために設けられ、材料とし
てはSiNx,SiOx,In23等が使われる。光磁
気記録層3としてはTbDyFeCo合金を用いること
が好ましいが、これに限定されるものではない。金属反
射層5は入射レーザー光を反射しエンハンスメント効果
をもたらすために設けられAl,Au等の反射率の高い
金属が用いられる。有機保護膜6は金属反射層5以下に
積層された各層の腐食防止を行うもので、紫外線硬化型
樹脂、熱可塑性樹脂等が用いられる。
Hereinafter, description will be made based on the illustrated embodiment.
FIG. 1 shows a magneto-optical disk using a magneto-optical recording magnetic material for a recording layer. However, as described above, the optical information recording medium of the present invention is not limited to the case where a magneto-optical recording magnetic material is used for the recording layer. On the transparent substrate 1, a first dielectric protection layer 2, a magneto-optical recording layer 3, a second dielectric protection layer 4, a metal reflection layer 5, and an organic protection film 6 are formed in this order. A silicon hydride film 7 having high hardness and an antistatic function is formed on the surface. The first dielectric protection layer 2 and the second dielectric protection layer 4 are provided for protecting the magneto-optical recording layer 3 from oxidative corrosion due to H 2 O, O 2 or the like, or for enhancing the force-rotational angle. As a material, SiNx, SiOx, In 2 O 3 or the like is used. It is preferable to use a TbDyFeCo alloy as the magneto-optical recording layer 3, but the present invention is not limited to this. The metal reflection layer 5 is provided to reflect an incident laser beam and bring about an enhancement effect, and a metal having a high reflectivity such as Al or Au is used. The organic protective film 6 serves to prevent corrosion of each layer laminated below the metal reflective layer 5, and is made of an ultraviolet curable resin, a thermoplastic resin, or the like.

【0011】[0011]

【実施例】表1に記載の各特性を示す水素化シリコン膜
を、光情報記録媒体の記録再生側の基板表面上に、EC
RプラズマCVD法を用い、以下の成膜条件で形成し
た。表1に各実施例で用いる水素化シリコン膜の各特性
を示す。成膜法はECRプラズマCVD法を用いてい
る。主な成膜条件は、 SiH4 …1〜4sccm H2 …4〜8sccm 圧 力 …2.5E−4〜7.3E−4 Torr パワー …400〜600W 基板温度…75〜150℃ 表面での反射を防止するために膜厚をコントロールして
決めている。実施例1から実施例3における光磁気記録
媒体の各構成は、表2に記載の構成のものである。第1
誘電体保護層2として、屈折率2.20のシリコン窒化
膜を900A、光磁気記録層3としてDy15Tb7Fe
70Co8を200A、第2誘電体保護層4として、屈折
率2.20のシリコン窒化膜を300A、金属反射膜5
としてアルミニウムを500A、紫外線硬化型樹脂6を
1μmを積層している。以上のようにして作製した光磁
気記録媒体について反射率、表面硬度、及び塵あい試験
前後のBER(ビットエラー率)を評価し、その結果を
表3に示す。比較例として、水素化シリコン膜を設けて
いない表2に記載の構成を有する光情報記録媒体につい
て、同様の評価試験を行い、表3に示す。 (以下余白)
EXAMPLE A silicon hydride film having the characteristics shown in Table 1 was coated on a recording / reproducing side substrate surface of an optical information recording medium by EC.
The film was formed under the following film forming conditions using an R plasma CVD method. Table 1 shows each characteristic of the silicon hydride film used in each example. The ECR plasma CVD method is used for the film formation method. The main film forming conditions are: SiH 4 1〜1 to 4 sccm H 2 〜4 to 8 sccm Pressure −42.5E-4 to 7.3E-4 Torr Power 400400 to 600 W Substrate temperature 7575 to 150 ° C. Surface reflection In order to prevent this, the thickness is controlled and determined. Each configuration of the magneto-optical recording medium in the first to third embodiments has the configuration shown in Table 2. First
The dielectric protective layer 2 is made of a silicon nitride film having a refractive index of 2.20 at 900 A, and the magneto-optical recording layer 3 is made of Dy 15 Tb 7 Fe.
70 Co 8 as 200 A, as the second dielectric protection layer 4, a silicon nitride film with a refractive index of 2.20 as 300 A, and a metal reflection film 5
In this case, 500 A of aluminum and 1 μm of the ultraviolet curing resin 6 are laminated. The reflectivity, surface hardness, and BER (bit error rate) before and after the dust test were evaluated for the magneto-optical recording medium manufactured as described above, and the results are shown in Table 3. As a comparative example, an optical information recording medium having a configuration shown in Table 2 without a silicon hydride film was subjected to the same evaluation test, and the results are shown in Table 3. (Below)

【表1】 [Table 1]

【表2】 1)表1の実施例1の水素化シリコン膜 2)表1の実施例2の水素化シリコン膜 3)表1の実施例3の水素化シリコン膜 (以下余白)[Table 2] 1) Silicon hydride film of Example 1 of Table 1 2) Silicon hydride film of Example 2 of Table 1 3) Silicon hydride film of Example 3 of Table 1 (hereinafter blank)

【表3】 [Table 3]

【0012】[0012]

【効果】本発明の光情報記録媒体は、帯電防止効果を持
つ水素化シリコン膜をその表面、特に記録再生側の基板
表面に設けることで、記録媒体表面への塵あい付着を防
止することができ、かつ、布などで表面を清掃してもデ
ィスクを損傷する可能性が低減できる。
The optical information recording medium of the present invention can prevent dust from adhering to the surface of the recording medium by providing a silicon hydride film having an antistatic effect on its surface, particularly on the substrate surface on the recording / reproducing side. Also, the possibility of damaging the disk even if the surface is cleaned with a cloth or the like can be reduced.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明の光情報記録媒体の1構成例の断面図を
モデル的に示す図である。
FIG. 1 is a diagram schematically showing a cross-sectional view of one configuration example of an optical information recording medium of the present invention.

【符号の説明】[Explanation of symbols]

1 透明基板 2 第1誘電体保護層 3 光磁気記録層 4 第2誘電体保護層 5 金属反射層 6 有機保護膜 7 水素化シリコン膜 REFERENCE SIGNS LIST 1 transparent substrate 2 first dielectric protective layer 3 magneto-optical recording layer 4 second dielectric protective layer 5 metal reflective layer 6 organic protective film 7 silicon hydride film

───────────────────────────────────────────────────── フロントページの続き (51)Int.Cl.7 識別記号 FI G11B 11/105 531 G11B 11/105 531H 546 546F (58)調査した分野(Int.Cl.7,DB名) G11B 7/24 G11B 7/26 G11B 11/105 ──────────────────────────────────────────────────続 き Continued on the front page (51) Int.Cl. 7 identification code FI G11B 11/105 531 G11B 11/105 531H 546 546F (58) Investigated field (Int.Cl. 7 , DB name) G11B 7/24 G11B 7/26 G11B 11/105

Claims (5)

(57)【特許請求の範囲】(57) [Claims] 【請求項1】 少なくとも透明基板と記録層とからなる
光情報記録媒体において、該記録媒体の記録再生側表面
に水素化シリコン膜を設けたことを特徴とする光情報記
録媒体。
1. An optical information recording medium comprising at least a transparent substrate and a recording layer, wherein a silicon hydride film is provided on a recording / reproducing side surface of the recording medium.
【請求項2】 少なくとも透明基板と記録層とからなる
光情報記録媒体において、少なくとも該記録媒体の大気
に接触する表面に水素化シリコン膜を設けたことを特徴
とする光情報記録媒体。
2. An optical information recording medium comprising at least a transparent substrate and a recording layer, wherein a silicon hydride film is provided on at least a surface of the recording medium which is in contact with the atmosphere.
【請求項3】 水素化シリコン膜が、2.1eV以上の
光学ギャップを有するものである請求項1または2記載
の光情報記録媒体。
3. The optical information recording medium according to claim 1, wherein the silicon hydride film has an optical gap of 2.1 eV or more.
【請求項4】 水素化シリコン膜が、活性型の伝導率を
示し、その値が室温で1×10-13S/cm以上であ
り、かつ光学ギャップが2.1eV以上である請求項1
または2記載の光情報記録媒体。
4. The silicon hydride film exhibits an active conductivity, the value of which is 1 × 10 −13 S / cm or more at room temperature, and the optical gap is 2.1 eV or more.
Or the optical information recording medium according to 2.
【請求項5】 水素化シリコン膜が、シランガスと水素
ガスをECRプラズマCVD法を用いて分解して膜形成
を行ったものである請求項1または2記載の光情報記録
媒体。
5. The optical information recording medium according to claim 1, wherein the silicon hydride film is formed by decomposing a silane gas and a hydrogen gas by using an ECR plasma CVD method.
JP04069255A 1992-02-18 1992-02-18 Optical information recording medium provided with silicon hydride film Expired - Fee Related JP3115088B2 (en)

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JP04069255A JP3115088B2 (en) 1992-02-18 1992-02-18 Optical information recording medium provided with silicon hydride film

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Application Number Priority Date Filing Date Title
JP04069255A JP3115088B2 (en) 1992-02-18 1992-02-18 Optical information recording medium provided with silicon hydride film

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JPH05234137A JPH05234137A (en) 1993-09-10
JP3115088B2 true JP3115088B2 (en) 2000-12-04

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