JP3102162B2 - Printed wiring board and method of manufacturing the same - Google Patents
Printed wiring board and method of manufacturing the sameInfo
- Publication number
- JP3102162B2 JP3102162B2 JP04288064A JP28806492A JP3102162B2 JP 3102162 B2 JP3102162 B2 JP 3102162B2 JP 04288064 A JP04288064 A JP 04288064A JP 28806492 A JP28806492 A JP 28806492A JP 3102162 B2 JP3102162 B2 JP 3102162B2
- Authority
- JP
- Japan
- Prior art keywords
- terminals
- layer
- insulating surface
- photosensitive material
- printed wiring
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/30—Assembling printed circuits with electric components, e.g. with resistor
- H05K3/32—Assembling printed circuits with electric components, e.g. with resistor electrically connecting electric components or wires to printed circuits
- H05K3/34—Assembling printed circuits with electric components, e.g. with resistor electrically connecting electric components or wires to printed circuits by soldering
- H05K3/341—Surface mounted components
- H05K3/3421—Leaded components
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/30—Assembling printed circuits with electric components, e.g. with resistor
- H05K3/32—Assembling printed circuits with electric components, e.g. with resistor electrically connecting electric components or wires to printed circuits
- H05K3/34—Assembling printed circuits with electric components, e.g. with resistor electrically connecting electric components or wires to printed circuits by soldering
- H05K3/3452—Solder masks
Landscapes
- Non-Metallic Protective Coatings For Printed Circuits (AREA)
- Electric Connection Of Electric Components To Printed Circuits (AREA)
Description
【0001】[0001]
【産業上の利用分野】本発明は, 高密度の配線パターン
を有するプリント配線板に係り, とくに, 端子部分(パ
ッド)の間に半田の付着を阻止するための, いわゆるソ
ルダーレジスト層が形成されたプリント配線板に関す
る。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a printed wiring board having a high-density wiring pattern, in particular, a so-called solder resist layer is formed between terminal portions (pads) to prevent the adhesion of solder. To printed wiring boards.
【0002】[0002]
【従来の技術】電子機器の小型化, 軽量化, 高性能化,
多機能化等にともなってプリント配線板における電子部
品の実装密度が高くなりつつあり, いわゆる表面実装(S
MT: Surface Mount Technology) 方式が導入されてい
る。SMT 方式は, 従来のプリント配線板におけるような
スルーホールを用いないので, 高密度実装が可能となる
ばかりでなく半田付けによる部品位置の自己修正が可能
になる利点がある。これに呼応して, 集積回路パッケー
ジにおいてはDIP(Dual-inline Package)からSOP(Small-
outline Package), さらにはQFP(Quad Flat Package)へ
と進展し, リードピッチの縮小は0.5mm 以下に達してい
る。最近では, ピッチが0.4mm のQFP の実装例が報告さ
れている。2. Description of the Related Art Electronic equipment is becoming smaller, lighter, and more sophisticated.
The mounting density of electronic components on printed wiring boards has been increasing along with multifunctionalization, and so-called surface mounting (S
MT (Surface Mount Technology) method is introduced. Since the SMT method does not use through holes as in conventional printed wiring boards, it has the advantage of enabling not only high-density mounting but also self-correction of component positions by soldering. Correspondingly, for integrated circuit packages, DIP (Dual-inline Package) to SOP (Small-inline
outline package) and further to QFP (Quad Flat Package), and the lead pitch has been reduced to less than 0.5mm. Recently, a mounting example of a QFP with a pitch of 0.4 mm has been reported.
【0003】[0003]
【発明が解決しようとする課題】上記のように配線パタ
ーンが高密度になると, 集積回路等の電子部品を基板上
のパッドに接続するための半田付けにおいて, 隣接する
パッド間に半田の架橋が形成されやすくなる問題が発生
する。このような半田の架橋は, パッド表面に半田ペー
ストを塗布する際の位置合わせずれ,および,塗布され
た半田ぺーストの滲みや型だれが原因である。そこで,
パッド間の基板表面に半田の濡れを阻害する層(ソルダ
ーレジスト層)を形成し, これにより架橋の生成を回避
する方法が採られている。図2は絶縁性基板1の一表面
に形成された銅層から成るパッド3と, パッド3間に形
成されたソルダーレジスト層2とを示す模式的断面図で
ある。ソルダーレジスト層2を設けることによって半田
の濡れを積極的に阻止できれば, 半田ペーストをパッド
のみに選択的に塗布せずとも,基板表面全体に塗布して
も差支えないことになり,工程が簡素化できる。As described above, when the wiring patterns have a high density, when soldering for connecting electronic components such as integrated circuits to pads on a substrate, the solder bridges between adjacent pads. There is a problem that it is easily formed. Such cross-linking of the solder is caused by misalignment when applying the solder paste to the pad surface, bleeding of the applied solder paste, and shape loss. Therefore,
A method has been adopted in which a layer (solder resist layer) that inhibits solder wetting is formed on the substrate surface between the pads, thereby avoiding the formation of crosslinks. FIG. 2 is a schematic sectional view showing a pad 3 made of a copper layer formed on one surface of the insulating substrate 1 and a solder resist layer 2 formed between the pads 3. If the solder resist layer 2 can be used to actively prevent solder wetting, the solder paste can be applied to the entire surface of the board, instead of being selectively applied only to the pads. This simplifies the process. it can.
【0004】しかし, 実際には, ピッチが0.4mm 程度に
小さくなると, パッド間における半田の架橋の発生は完
全には阻止できず, 短絡不良が避けられない。これに対
して, 半田ペーストの改良が試みられているが, 充分な
成果が得られていない。However, in practice, when the pitch is reduced to about 0.4 mm, the occurrence of solder bridging between pads cannot be completely prevented, and short-circuit failure cannot be avoided. On the other hand, attempts have been made to improve the solder paste, but no satisfactory results have been obtained.
【0005】本発明は,近接して配置されたパッド間に
おける半田の架橋を阻止する隔壁層(ソルダーレジスト
層)の形成を可能とすることを目的とする。An object of the present invention is to enable formation of a partition layer (solder resist layer) for preventing bridging of solder between closely arranged pads.
【0006】[0006]
【課題を解決するための手段】上記目的は,絶縁性表面
を有する基板と,該絶縁性表面に形成された導電層から
成り且つ互いに近接して配置された複数のパッドを有す
る配線パターンと,該パッドに電子部品を接続するため
の半田付けに対して耐熱性を有するとともに溶融した半
田に対して濡れを示さないフォトレジストから成り且つ
該パッド間の該絶縁性表面に形成されたソルダーレジス
ト層とを有するプリント配線板において,該ソルダーレ
ジストは,該パッド間の中央部近傍において該導電層の
厚さより少なくとも3倍の突状を成し,且つ該突状の両
側において厚さが漸次減少して該パッドに達する形状を
有し,且つ該パッドとの境界において該パッドとほぼ等
しい厚さを有することを特徴とする本発明に係るプリン
ト配線基板,または,近接して配置された複数のパッド
を有し且つ導電層から成る配線パターンを基板の絶縁性
表面に形成し,該パッドに電子部品を接続するための半
田付けに対して耐熱性を有するとともに溶融した半田に
対して濡れを示さないフォトレジストを該配線パターン
が形成された該絶縁性表面に塗布してフォトレジスト層
を形成し,該絶縁性表面に塗布された該フォトレジスト
層に対して少なくとも該パッド間の領域において該パッ
ド間の中央部から該パッドに向かって露光の強度が漸次
変化する露光用マスクを用いて光を照射したのち該フォ
トレジスト層を現像して該パッド間の中央部近傍におい
て該導電層よりも大きく且つ該パッドに近づくにつれて
減少する厚さを有するソルダーレジスト層を少なくとも
該パッド間の該絶縁性表面に形成する諸工程を含むこと
を特徴とする本発明に係るプリント配線板の製造方法に
よって達成される。SUMMARY OF THE INVENTION An object of the present invention is to provide a substrate having an insulating surface, a wiring pattern comprising a conductive layer formed on the insulating surface and having a plurality of pads arranged close to each other; A solder resist layer formed of a photoresist having heat resistance to soldering for connecting an electronic component to the pad and exhibiting no wettability to molten solder, and formed on the insulating surface between the pads; in the printed wiring board having bets, the solder resist, of the conductive layer in the vicinity of the central portion of the between said pad
Form at least three times the projecting than the thickness, and has a shape reaching to the pad gradually reduced thickness in the projecting shape of each side, and a thickness approximately equal with the pad at the boundary between the pad A printed wiring board according to the present invention, or a wiring pattern having a plurality of pads arranged close to each other and comprising a conductive layer is formed on an insulating surface of the substrate, and an electronic component is formed on the pad. Forming a photoresist layer by applying a photoresist having heat resistance to soldering for connection and not showing wettability to molten solder on the insulating surface on which the wiring pattern is formed; With respect to the photoresist layer applied to the insulating surface, the intensity of exposure is gradually increased from a central portion between the pads toward the pad at least in a region between the pads.
Irradiating light using a changing exposure mask and developing the photoresist layer to form a solder resist layer having a thickness larger than the conductive layer near the center between the pads and decreasing as approaching the pads; Is formed at least on the insulating surface between the pads by the method for manufacturing a printed wiring board according to the present invention.
【0007】[0007]
【作用】図1は本発明の原理を説明するための模式的断
面図であって, 絶縁性基板1上に設けられた配線パター
ンのパッド3間に設けられるソルダーレジスト層20を,
パッド3間中央部で最も厚く, パッド3に近づくにした
がって薄くなるような断面形状にする。とくに, 上記の
最大厚さを, パッド3を構成する導電層の厚さの3倍な
いしそれ以上,具体的には100 μm 以上とすることによ
って, パッド3間における半田の架橋の発生がほぼ完全
に阻止される。FIG. 1 is a schematic sectional view for explaining the principle of the present invention, in which a solder resist layer 20 provided between pads 3 of a wiring pattern provided on an insulating substrate 1 is removed.
The cross-sectional shape is such that it is thickest at the center between the pads 3 and becomes thinner as it approaches the pads 3. In particular, by setting the above-mentioned maximum thickness to be three times or more the thickness of the conductive layer constituting the pad 3, specifically, 100 μm or more, the occurrence of solder bridging between the pads 3 is almost complete. Is blocked.
【0008】上記のような厚さ分布を有するソルダーレ
ジスト層20を形成するために, この厚さ分布に対応して
フォトレジストに対する露光量を, 飽和露光量からそれ
以下の範囲で変化させる。このような露光量の変化を与
えるために, フォトレジストの解像度以下の寸法を有す
る線状または点状の遮光パターンを前記露光量に対応す
る密度で分布させて成るマスクを通して行う。In order to form the solder resist layer 20 having the above-described thickness distribution, the exposure amount for the photoresist is changed from the saturation exposure amount to a value less than the saturation exposure amount in accordance with the thickness distribution. In order to provide such a change in exposure, a linear or dot-shaped light-shielding pattern having a dimension equal to or smaller than the resolution of the photoresist is passed through a mask which is distributed at a density corresponding to the exposure.
【0009】[0009]
【実施例】図3は本発明による前記ソルダーレジスト層
20を形成する実施例の工程を説明するための模式的断面
図である。図3(a) に示すように, 例えばガラス布で強
化されたエポキシ樹脂板から成る絶縁性基板4の一表面
に貼り付けられた厚さ約25μm の銅箔をエッチングし,
0.4mm, 0.5mm, 0.85mmの三種類のピッチで配列された多
数のパッド5を形成する。FIG. 3 shows the solder resist layer according to the present invention.
FIG. 9 is a schematic cross-sectional view for explaining a step in an example for forming 20. As shown in FIG. 3A, a copper foil having a thickness of about 25 μm attached to one surface of an insulating substrate 4 made of, for example, an epoxy resin plate reinforced with a glass cloth is etched.
A large number of pads 5 arranged at three types of pitches of 0.4 mm, 0.5 mm, and 0.85 mm are formed.
【0010】次いで, 図3(b) に示すように, 絶縁性基
板4の表面全体に, 例えば型番 PSR4000(太陽インキ
(株)製)のようなフォトレジスト層10を塗布し乾燥し
たのち, 80℃で15分間セミキュアを行い, 室温まで冷却
する。フォトレジスト層10の厚さは約100 μm とする。
フォトレジスト層10は, 通常の自動半田付けにおけるリ
フロー温度250 ℃に加熱されても変形や変質を生じない
耐熱性を有する。Next, as shown in FIG. 3B, a photoresist layer 10 such as model number PSR4000 (manufactured by Taiyo Ink Co., Ltd.) is applied to the entire surface of the insulating substrate 4 and dried. Perform semi-cure at ℃ for 15 minutes and cool to room temperature. The thickness of the photoresist layer 10 is about 100 μm.
The photoresist layer 10 has heat resistance that does not cause deformation or deterioration even when heated to a reflow temperature of 250 ° C. in normal automatic soldering.
【0011】次いで, 図3(c) に示すように, 後述する
透過率分布を有するマスク6を用いて, フォトレジスト
層10に対して紫外線7を照射する。このときの積算露光
量は800mJ/cm2 であった。マスク6には,図4に示すよ
うな分布を有する微細な遮光パターン8が形成されてい
る。図4(a) はネガ型のフォトレジスト層10に対する露
光に用いるマスク6の例, 図4(b) はポジ型のフォトレ
ジスト層10に対する露光に用いるマスク6の例である。Next, as shown in FIG. 3C, a photoresist layer 10 is irradiated with ultraviolet rays 7 using a mask 6 having a transmittance distribution described later. At this time, the integrated exposure amount was 800 mJ / cm 2 . On the mask 6, a fine light-shielding pattern 8 having a distribution as shown in FIG. FIG. 4A shows an example of the mask 6 used for exposing the negative photoresist layer 10, and FIG. 4B shows an example of the mask 6 used for exposing the positive photoresist layer 10.
【0012】図4(a) のネガ型用のマスクの場合には,
パッド5に対応する部分が完全に遮光され, パッド5間
の中央部が最大透過率になるような分布で微細な遮光パ
ターン8が形成されている。すなわち,パッド5間のソ
ルダーレジスト層20に対応する部分では, 中央部からそ
の両側にわたって透過率が漸減するような遮光パターン
8の分布である。一方, 図4(b) のポジ型用のマスクの
場合には, パッド5に対応する部分が最大透過率にな
り, パッド5間の中央部がほぼ完全に遮光されるような
分布で微細な遮光パターン8が形成されている。すなわ
ち,パッド5間のソルダーレジスト層20に対応する分布
では, 中央部からその両側にわたって透過率が漸増する
ような遮光パターン8の分布である。In the case of the negative type mask shown in FIG.
A portion corresponding to the pad 5 is completely shielded from light, and a fine light-shielding pattern 8 is formed with a distribution such that the central portion between the pads 5 has a maximum transmittance. That is, in a portion corresponding to the solder resist layer 20 between the pads 5, the light shielding pattern 8 has such a distribution that the transmittance gradually decreases from the center to both sides thereof. On the other hand, in the case of the mask for the positive type shown in FIG. 4B, the portion corresponding to the pad 5 has the maximum transmittance, and the central portion between the pads 5 has a fine distribution with almost complete light shielding. A light-shielding pattern 8 is formed. That is, the distribution corresponding to the solder resist layer 20 between the pads 5 is a distribution of the light shielding patterns 8 such that the transmittance gradually increases from the center to both sides thereof.
【0013】上記積算露光量800mJ/cm2 は, 厚さ100 μ
m のフォトレジスト層10を露光するために必要な最小露
光量(飽和露光量)である。したがって, 例えば図4
(a) のマスクの場合には, パッド5間の領域における中
央部に飽和露光量の紫外線が照射され, 塗布されたフォ
トレジスト層10の全部が現像後にも残る。一方, パッド
5に近づくにつれて露光量が減少し, 飽和露光量に満た
なくなるるため, 現像後に残るフォトレジスト層10が少
なくなる。このようにして, 図1に示すような厚さの分
布を有するソルダーレジスト20が生じる。The above integrated exposure amount of 800 mJ / cm 2 corresponds to a thickness of 100 μJ.
m is the minimum exposure amount (saturation exposure amount) necessary to expose the photoresist layer 10 of m. Therefore, for example, FIG.
In the case of the mask of (a), the central portion in the region between the pads 5 is irradiated with ultraviolet light of a saturated exposure amount, and the entire coated photoresist layer 10 remains after development. On the other hand, the exposure amount decreases as approaching the pad 5 and becomes less than the saturated exposure amount, so that the photoresist layer 10 remaining after development decreases. Thus, a solder resist 20 having a thickness distribution as shown in FIG. 1 is produced.
【0014】遮光パターン8は点状または線状のような
簡単な形状を有していれば充分であるが, ソルダーレジ
スト層20を構成するフォトレジスト層10にそれ自身のパ
ターンが形成されないようにするために, 投影面すなわ
ちフォトレジスト層10上において, フォトレジスト層10
の解像度以下の寸法であるような寸法をマスク6上にお
いて有している。具体的な例を示せば, マスク6の投影
倍率が等倍であるとすると, マスク6上における遮光パ
ターン8の寸法は10μm 以下である。It is sufficient that the light-shielding pattern 8 has a simple shape such as a dot shape or a line shape. However, it is sufficient that the light-shielding pattern 8 does not form its own pattern on the photoresist layer 10 constituting the solder resist layer 20. The photoresist layer 10 on the projection surface, i.e., on the photoresist layer 10.
Has a dimension on the mask 6 which is smaller than the resolution of. As a specific example, assuming that the projection magnification of the mask 6 is the same, the size of the light shielding pattern 8 on the mask 6 is 10 μm or less.
【0015】再び図3を参照して,上記マスク6を用い
た露光ののち,暗室内で約20分間保持し暗反応を起こさ
せる。そののち, フォトレジスト層10を変性トリクロロ
エタンを用いて現像を行った。現像条件は, スプレー圧
2.5Kg/cm2,液温20℃, 時間90秒である。現像後さらに,
150 ℃の熱風循環炉内で50分間ポストキュアを行った。
このようにして,図3(d) に示すような, パッド5間の
絶縁性基板4表面に,パッド5間の中央部で最大の厚さ
を有するソルダーレジスト層20が形成される。配線パタ
ーンが形成されない絶縁性基板4の周囲にソルダーレジ
スト層20を形成しても差支えない。Referring again to FIG. 3, after exposure using the mask 6, the substrate is kept in a dark room for about 20 minutes to cause a dark reaction. After that, the photoresist layer 10 was developed using modified trichloroethane. Development conditions are spray pressure
2.5 kg / cm 2 , liquid temperature 20 ° C., time 90 seconds. After development,
Post curing was performed in a hot air circulating furnace at 150 ° C. for 50 minutes.
In this way, a solder resist layer 20 having the maximum thickness at the center between the pads 5 is formed on the surface of the insulating substrate 4 between the pads 5 as shown in FIG. A solder resist layer 20 may be formed around the insulating substrate 4 where no wiring pattern is formed.
【0016】上記の絶縁性基板4に半田ペーストを塗布
し, これを熱風循環遠赤外線リフロー炉を用いて半田を
溶融させ, パッド5間における半田の架橋の発生状況を
調べた。その結果を表1および表2に示す。表1はパッ
ド5上にのみ半田ペーストを印刷した場合, 表2は絶縁
性基板4全面すなわちパッド5上およびソルダーレジス
ト層20上の双方に半田ペーストを塗布した場合である。
表1および2ともに測定点は965 である。比較のため
に, 図2に示した従来と同じ形状のソルダーレジスト層
2を設けた場合の測定結果を併記してある。A solder paste was applied to the insulating substrate 4 and the solder was melted using a hot-air circulating far-infrared reflow furnace, and the occurrence of solder bridging between the pads 5 was examined. The results are shown in Tables 1 and 2. Table 1 shows the case where the solder paste was printed only on the pad 5, and Table 2 shows the case where the solder paste was applied on the entire surface of the insulating substrate 4, that is, both on the pad 5 and on the solder resist layer 20.
The measurement points for both Tables 1 and 2 are 965. For comparison, a measurement result in the case where the solder resist layer 2 having the same shape as the conventional one shown in FIG. 2 is provided is also shown.
【0017】[0017]
【表1】 ピッチ(mm) 架橋発生数(本発明) 架橋発生数(従来例) 0.85 0 20 0.5 0 140 0.4 0 200 [Table 1] Pitch (mm) Number of cross-links (present invention) Number of cross-links (conventional example) 0.85 0 20 0.5 0 140 0.4 0 200
【表2】 ピッチ(mm) 架橋発生数(本発明) 架橋発生数(従来例) 0.85 0 40 0.5 2 200 0.4 3 400 表1および2から分かるように, 本発明により半田の架
橋の発生が著しく低減される。とくに注目されること
は, 表2のように, 絶縁性基板表面全体に半田ペースト
を塗布した場合でも, 架橋の発生はピッチが0.4mm の場
合でも全パッド数の0.3 %程度であり, 従来の1/100 以
下に低減されている。[Table 2] Pitch (mm) Number of cross-links generated (this invention) Number of cross-links generated (conventional example) 0.85 0 40 0.5 2 200 0.4 3 400 As can be seen from Tables 1 and 2, the occurrence of cross-linking of the solder is remarkable by the present invention. Reduced. Of particular note, as shown in Table 2, even when the solder paste is applied to the entire surface of the insulating substrate, the occurrence of cross-linking is about 0.3% of the total number of pads even when the pitch is 0.4 mm. It has been reduced to 1/100 or less.
【0018】上記のような解像度以下の寸法を有する遮
光パターンの集合を用いてマスクの開口部の光透過率を
制御することについては,特開昭62-67547号や特開平1-
169451号等に開示されているが, 本発明におけるよう
に, 一つのマスクの開口内における透過率を連続的に変
化させるためにこのような微細な遮光パターンの分布密
度を変化させる例はない。Japanese Patent Application Laid-Open No. Sho 62-67547 and Japanese Patent Application Laid-Open No. HEI 1-1985-1 disclose a method of controlling the light transmittance of an opening of a mask by using a set of light-shielding patterns having dimensions smaller than the resolution described above.
Although it is disclosed in 169451 or the like, there is no example of changing the distribution density of such a fine light-shielding pattern in order to continuously change the transmittance in the opening of one mask as in the present invention.
【0019】なお, 上記説明においては, パッド5との
境界部分におけるソルダーレジスト層20の厚さについて
はとくに触れなかった。この境界部分においてソルダー
レジスト層20の上表面が, パッド5のそれと等しいかそ
れよりも高い方が望ましい。しかし, パッド5の中央部
で充分な高さを有していれば, この境界近傍においてソ
ルダーレジスト層20の厚さがパッド5より薄くても本発
明の目的を達成することは可能である。In the above description, the thickness of the solder resist layer 20 at the boundary with the pad 5 has not been particularly mentioned. It is desirable that the upper surface of the solder resist layer 20 at this boundary is equal to or higher than that of the pad 5. However, if the center of the pad 5 has a sufficient height, the object of the present invention can be achieved even if the thickness of the solder resist layer 20 is thinner than the pad 5 near this boundary.
【0020】[0020]
【発明の効果】本発明によれば, 高密度の配線パターン
を有するプリント配線板に電子部品を実装する際におけ
るパッド間の半田の架橋の発生が低減可能となり, 電子
機器の小型化, 軽量化, 高性能化, 多機能化の促進に寄
与する効果がある。According to the present invention, it is possible to reduce the occurrence of bridging of solder between pads when mounting electronic components on a printed wiring board having a high-density wiring pattern, and to reduce the size and weight of electronic devices. It has the effect of contributing to the promotion of high performance and multi-function.
【図1】 本発明の原理説明図FIG. 1 is a diagram illustrating the principle of the present invention.
【図2】 従来の問題点説明図FIG. 2 is an explanatory diagram of a conventional problem.
【図3】 本発明の実施例の工程説明図FIG. 3 is an explanatory diagram of a process according to an embodiment of the present invention.
【図4】 本発明の実施に用いる露光用マスク説明図FIG. 4 is an explanatory view of an exposure mask used for carrying out the present invention.
1, 4 絶縁性基板 7 紫外線 2, 20 ソルダーレジスト層 8 遮光パターン 3, 5 パッド 10 フォトレジス
ト層 6 マスク1, 4 Insulating substrate 7 Ultraviolet light 2, 20 Solder resist layer 8 Light-shielding pattern 3, 5 Pad 10 Photoresist layer 6 Mask
───────────────────────────────────────────────────── フロントページの続き (56)参考文献 特開 昭61−256789(JP,A) 特開 平3−278592(JP,A) (58)調査した分野(Int.Cl.7,DB名) H05K 3/28 H05K 3/34 ──────────────────────────────────────────────────続 き Continuation of the front page (56) References JP-A-61-256789 (JP, A) JP-A-3-278592 (JP, A) (58) Fields investigated (Int. Cl. 7 , DB name) H05K 3/28 H05K 3/34
Claims (4)
接して配置された複数の端子を有する配線パターンと, 該端子に電子部品を接続するための半田付けに対して耐
熱性を有するとともに溶融した半田に対して濡れを示さ
ない感光材料から成り且つ少なくとも該端子間の該絶縁
性表面に形成された隔壁層とを有するプリント配線板に
おいて, 該隔壁層は,該端子間の中央部近傍において該導電層の
厚さより少なくとも3倍の突状を成し,且つ該突状の両
側において厚さが漸次減少して該端子に達する形状を有
し,且つ該端子との境界において該端子とほぼ等しい厚
さを有することを特徴とするプリント配線板。1. A substrate having an insulating surface, a wiring pattern comprising a conductive layer formed on the insulating surface and having a plurality of terminals arranged close to each other, and connecting an electronic component to the terminals. A printed wiring board comprising a photosensitive material having heat resistance to soldering and not showing wettability to molten solder, and having at least a partition layer formed on the insulating surface between the terminals. partition wall layer, the conductive layer in the vicinity of the central portion of the inter-said terminal
Form at least three times the projecting than the thickness, and has a shape to reach the terminal decreases gradually in thickness in the projecting shape of each side, and a thickness approximately equal to the said terminal at the boundary between the terminal A printed wiring board, comprising:
つ導電層から成る配線パターンを基板の絶縁性表面に形
成する工程と, 該端子に電子部品を接続するための半田付けに対して耐
熱性を有するとともに溶融した半田に対して濡れを示さ
ない感光材料を該配線パターンが形成された該絶縁性表
面に塗布して感光材料層を形成する工程と, 該絶縁性表面に塗布された該感光材料層に対して少なく
とも該端子間の領域において該端子間の中央部から該端
子に向かって露光の強度が漸次変化する露光用マスクを
用いて光を照射したのち該感光材料層を現像して該端子
間の中央部近傍において該導電層よりも大きく且つ該端
子に近づくにつれて減少する厚さを有する隔壁層を少な
くとも該端子間の該絶縁性表面に形成する工程 とを含む
ことを特徴とするプリント配線板の製造方法。 And a plurality of terminals arranged close to each other.
Wiring pattern consisting of two conductive layers on the insulating surface of the substrate
And soldering for connecting electronic components to the terminals.
Shows heat and wets molten solder
No insulating material on which the wiring pattern is formed
Forming a photosensitive material layer by coating the photosensitive material layer on the insulating surface;
And in the region between the terminals from the center between the terminals to the end
Exposure masks whose exposure intensity gradually changes toward
After irradiating light, the photosensitive material layer is developed to
Near the center between the conductive layer and the end
The barrier layer, which has a thickness that decreases as it approaches
And forming the insulating surface between Kutomo the terminals
A method for manufacturing a printed wiring board, comprising:
フォトレジストであることを特徴とする請求項2記載の
プリント配線板の製造方法。3. The method according to claim 1, wherein the photosensitive material is a negative type or a positive type.
The method according to claim 2, wherein the method is a photoresist .
おける投影寸法が該フォトレジストの解像度を越えない
寸法を有する遮光パターンから成ることを特徴とする請
求項2記載のプリント配線板の製造方法。 4. The method according to claim 1, wherein the exposure mask is provided on the photosensitive material layer.
Projection dimensions do not exceed the resolution of the photoresist
A light-shielding pattern having dimensions.
The method for producing a printed wiring board according to claim 2 .
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP04288064A JP3102162B2 (en) | 1992-10-27 | 1992-10-27 | Printed wiring board and method of manufacturing the same |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP04288064A JP3102162B2 (en) | 1992-10-27 | 1992-10-27 | Printed wiring board and method of manufacturing the same |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH06140748A JPH06140748A (en) | 1994-05-20 |
JP3102162B2 true JP3102162B2 (en) | 2000-10-23 |
Family
ID=17725363
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP04288064A Expired - Fee Related JP3102162B2 (en) | 1992-10-27 | 1992-10-27 | Printed wiring board and method of manufacturing the same |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP3102162B2 (en) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20210154454A (en) * | 2020-06-12 | 2021-12-21 | 엘지이노텍 주식회사 | Printed circuit board and mehod of manufacturing thereof |
-
1992
- 1992-10-27 JP JP04288064A patent/JP3102162B2/en not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
JPH06140748A (en) | 1994-05-20 |
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