JP3046003B2 - Glass substrate for electronic device and method of manufacturing the same - Google Patents

Glass substrate for electronic device and method of manufacturing the same

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Publication number
JP3046003B2
JP3046003B2 JP22576198A JP22576198A JP3046003B2 JP 3046003 B2 JP3046003 B2 JP 3046003B2 JP 22576198 A JP22576198 A JP 22576198A JP 22576198 A JP22576198 A JP 22576198A JP 3046003 B2 JP3046003 B2 JP 3046003B2
Authority
JP
Japan
Prior art keywords
glass substrate
back surfaces
electronic device
polishing
chamfered
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP22576198A
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Japanese (ja)
Other versions
JPH11109607A (en
Inventor
浩二 高橋
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hoya Corp
Original Assignee
Hoya Corp
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Filing date
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Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、例えば、半導体集
積回路の製造の際にマスク基板等として用いられる電子
デバイス用ガラス基板及びその製造方法に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a glass substrate for an electronic device used as a mask substrate or the like in the manufacture of a semiconductor integrated circuit and a method for manufacturing the same.

【0002】[0002]

【従来の技術】例えば、半導体集積回路の製造の際にフ
ォトリソグラフィー法を実施するために使用されるマス
ク基板として、従来から、ソーダライム系ガラス、ボロ
シリケート系ガラスあるいは溶融石英等からなる電子デ
バイス用ガラス基板が用いられている。この電子デバイ
ス用ガラス基板は、通常、表面が鏡面に仕上げられ、こ
の上に真空蒸着法、スパッタリング法等によってクロム
や酸化クロム等の遮光膜が形成される。そして、この遮
光膜に所定のパターンが形成された後、マスク基板とし
て半導体製造工程で用いられる。
2. Description of the Related Art For example, an electronic device made of soda-lime glass, borosilicate glass, fused silica, or the like has been used as a mask substrate for performing photolithography in the manufacture of a semiconductor integrated circuit. Glass substrates are used. The glass substrate for an electronic device is usually mirror-finished on the surface, and a light-shielding film such as chromium or chromium oxide is formed thereon by a vacuum deposition method, a sputtering method, or the like. After a predetermined pattern is formed on the light-shielding film, it is used as a mask substrate in a semiconductor manufacturing process.

【0003】ところで、この電子デバイス用ガラス基板
からマスク基板を製造する工程は、極めて清浄な環境下
で行われることが必要とされる。特に、前記遮光膜の成
膜の際に、該遮光膜に、塵埃、研摩剤等の微粒子、ガラ
スチップその他の異物が混入すると、該遮光膜にパター
を形成する際にピンホール等の致命的な欠陥が多発する
ことになる。
Incidentally, the process of manufacturing a mask substrate from a glass substrate for an electronic device needs to be performed in an extremely clean environment. In particular, when the light-shielding film is formed, if dust, fine particles such as abrasives, glass chips, or other foreign matters are mixed in the light-shielding film, fatal holes such as pinholes are formed when forming a putter on the light-shielding film. Serious defects occur frequently.

【0004】このため、前記電子デバイス用ガラス基板
としては、マスク基板製造工程中に研磨剤等の異物を捕
捉したり、あるいは、該工程中に欠けが生じて自らガラ
スチップの異物を生じさせたりするようなものでないこ
とが要請される。このため、従来から、前記電子デバイ
ス用ガラス基板の側周縁部に鏡面加工を施して、研磨剤
等の異物を捕捉する余地のないようにしたり、あるい
は、該基板の側周縁部に所定の面取加工を施して欠けが
生じにくいようにしたもの等が知られている(例えば、
特公昭61-34669号公報参照)。
For this reason, as the glass substrate for an electronic device, a foreign substance such as an abrasive is trapped during a mask substrate manufacturing process, or a chip is generated during the process to generate a foreign substance on a glass chip by itself. It is not required to do so. For this reason, conventionally, the side peripheral portion of the electronic device glass substrate is mirror-finished so that there is no room for capturing foreign substances such as abrasives, or a predetermined surface is provided on the side peripheral portion of the substrate. It is known that chipping is performed so that chipping hardly occurs (for example,
See Japanese Patent Publication No. 61-34669).

【0005】第2図ないし第4図は、従来の電子デバイ
ス用ガラス基板の部分断面図である。図中、符号11は
ガラス基板本体、符号12は表面、符号13は裏面、符
号14は側面である。
FIGS. 2 to 4 are partial cross-sectional views of a conventional glass substrate for an electronic device. In the figure, reference numeral 11 denotes a glass substrate main body, reference numeral 12 denotes a front surface, reference numeral 13 denotes a back surface, and reference numeral 14 denotes a side surface.

【0006】第2図に示されるものは、表裏の面12お
よび13と側面14とが交差する稜線部にそれぞれ面取
を施して平坦な面取斜面15および16を形成したもの
である。また、第3図に示されるものは、表裏の面12
および13と側面14とが交差する稜線部を丸く形成し
たものである。さらに、第4図に示されるものは、側面
14全体を丸く形成したものである。
In FIG. 2, flat sloping slopes 15 and 16 are formed by chamfering ridges where the front and back surfaces 12 and 13 intersect with the side surface 14, respectively. Also, what is shown in FIG.
And 13 and the side surface 14 are formed with rounded ridge lines. Further, what is shown in FIG. 4 is one in which the entire side surface 14 is formed round.

【0007】[0007]

【発明が解決しようとする課題】ところで、前記電子デ
バイス用ガラス基板は、マスク基板の製造工程中等にお
いて、第2図ないし第4図に示されるように、基板保持
治具21のクサビ状の切り欠き保持部21にガラス基板
本体11の側面14を押圧することによって保持されて
搬送される。
As shown in FIGS. 2 to 4, the glass substrate for an electronic device is cut into a wedge-like shape during the manufacturing process of a mask substrate or the like, as shown in FIGS. The glass substrate main body 11 is held and conveyed by pressing the side surface 14 of the glass substrate main body 11 against the chip holder 21.

【0008】その際、前記従来例のうち、第2図に示さ
れる例では、前記切り欠き保持部21に前記平坦な面取
斜面15および16が当接されるから、確実な保持がで
きるという利点がある。ところが、前記面取斜面15並
びに16と、前記表裏の面12および13並びに前記側
面14とがそれぞれ交差する稜線部がシャープである。
このため、前記ガラス基板11を保持する際、あるい
は、保持を解除する際に、これら稜線部が基板保持治具
20に触れて欠けが生ずる事故が少なからず発生するこ
とが判明した。
At this time, in the example shown in FIG. 2 of the conventional examples, since the flat chamfered slopes 15 and 16 abut on the notch holding portion 21, it can be surely held. There are advantages. However, the ridges where the chamfered slopes 15 and 16 intersect with the front and back surfaces 12 and 13 and the side surface 14 are sharp.
For this reason, when holding | maintaining the said glass substrate 11, or when releasing holding | maintenance, it turned out that these ridge lines touch the board | substrate holding jig 20, and the accident which a chip | chip produces | generates occurs not a little.

【0009】また、第3図に示される例は、前記基板保
持治具20とガラス基板本体11との接触が、点あるい
は線接触に近いため、保持の際に、この接触部に集中し
て過大な力が加わり、微少なクラック等が生じたり、あ
るいは、保持の際の強い摩擦によって微細なガラスチッ
プが生ずる等の問題があることが判明した。
In the example shown in FIG. 3, the contact between the substrate holding jig 20 and the glass substrate body 11 is close to a point or line contact. It has been found that there is a problem that an excessive force is applied to cause a minute crack or the like, or a fine glass chip is generated due to strong friction at the time of holding.

【0010】さらに、第4図に示される例は、前記第2
図および第3図に示される例に比較すると、これら例に
おける問題点がある程度緩和される。しかし、依然とし
て、点あるいは線接触であることにはかわりはないの
で、これらの問題点を完全には除去できないことが判明
した。しかも、第3図および第4図で示される例では、
所定の工程で行われる洗浄の際に、異物の除去効率が低
下するという問題もあることが判明した。
Further, the example shown in FIG.
As compared with the examples shown in FIGS. 3 and 3, the problems in these examples are alleviated to some extent. However, it has been found that these problems cannot be completely eliminated, because the point or line contact still exists. Moreover, in the examples shown in FIGS. 3 and 4,
It has been found that there is also a problem that the efficiency of removing foreign substances is reduced during cleaning performed in a predetermined process.

【0011】すなわち、一般に、ガラス基板の洗浄は、
該ガラス基板本体11を略垂直に立てた状態で行う。こ
のため、ガラス基板本体11の側面12に付着している
異物は、該側面12から溶剤等によって下方に洗い落さ
れる。その際、前記第2図に示される例のように、前記
側面14と表面12とが交差する稜線部に面取りが施さ
れて、平坦な傾斜面15が形成されていれば、第5図に
示されるように、異物eはこの平坦な傾斜面15上を比
較的スムーズに滑って容易に洗い落される。しかし、前
記第3図や第4図に示される例のように、稜線部や稜線
部を含む側面14全体が丸いと、第6図に示されるよう
に、スムーズな滑りが阻害されるとともに、滑る距離が
長いので、途中で付着してしまう確率が大きくなる。
That is, generally, cleaning of a glass substrate is performed by:
The process is performed with the glass substrate body 11 standing upright. For this reason, foreign matter adhering to the side surface 12 of the glass substrate main body 11 is washed down from the side surface 12 by a solvent or the like. At this time, as in the example shown in FIG. 2, if a ridge portion where the side surface 14 and the surface 12 intersect is chamfered and a flat inclined surface 15 is formed, FIG. As shown, the foreign matter e slides relatively smoothly on the flat inclined surface 15 and is easily washed off. However, if the entire side surface 14 including the ridges and the ridges is round as in the examples shown in FIGS. 3 and 4, smooth sliding is hindered as shown in FIG. Since the sliding distance is long, the probability of adhesion on the way increases.

【0012】さらに、この第4図に示される例では、側
面全体が丸いため、マスク基板の洗浄法として一般的で
あるスクラブ洗浄における自動搬送時のハンドリングが
困難となるとともに、側面全体を丸く研摩する必要があ
ることから、製造に手間を要する等という欠点もある。
Further, in the example shown in FIG. 4, since the entire side surface is round, it becomes difficult to handle the automatic transfer in scrub cleaning, which is a general method of cleaning a mask substrate, and the entire side surface is polished round. Therefore, there is a disadvantage that the production is troublesome.

【0013】本発明は、上述の背景のもとでなされたも
のであり、比較的簡単な構成で、マスク基板等の電子デ
バイス用ガラス基板の製造工程中等において、欠け等が
生ずるおそれがなく、しかも、搬送時の保持が容易な電
子デバイス用ガラス基板及びその製造方法を提供するこ
とを目的としたものである。
The present invention has been made under the above-mentioned background, and has a relatively simple structure and does not cause chipping or the like during a manufacturing process of a glass substrate for an electronic device such as a mask substrate. Moreover, it is an object of the present invention to provide a glass substrate for an electronic device that can be easily held during transportation and a method for manufacturing the same.

【課題を解決するための手段】上述の課題を解決するた
めの手段として、第1の発明は、板状ガラス基板の表裏
の面と側面とが交差する稜線部に面取を施して平坦な面
取斜面を形成し、前記面取斜面と前記表裏の面及び前記
側面とがそれぞれ交差する稜線部をその曲率半径Rが
0.01〜0.3mmになるように丸く形成したことを
特徴とする電子デバイス用ガラス基板である。
Means for Solving the Problems As means for solving the above-mentioned problems, the first invention is to flatten a flat glass substrate by chamfering a ridge portion where the front and back surfaces and side surfaces intersect. A chamfered slope is formed, and a ridge portion where the chamfered slope, the front and back surfaces, and the side surfaces intersect is formed to be round so that the radius of curvature R is 0.01 to 0.3 mm. Glass substrate for electronic devices.

【0014】第2の発明は、板状ガラス基板の表裏の面
と側面とが交差する稜線部に面取を施して平坦な面取斜
面を形成し、該面取斜面を含む領域に研摩液を存在させ
てブラッシングすることによって、前記面取斜面と前記
表裏の面及び前記側面とがそれぞれ交差する稜線部をそ
の曲率半径Rが0.01〜0.3mmになるように丸く
形成したことを特徴とする電子デバイス用ガラス基板で
ある。
According to a second aspect of the present invention, a flat chamfered surface is formed by chamfering a ridge line where the front and back surfaces and the side surface of the plate-like glass substrate intersect with each other. Is present, and the ridges where the chamfered slopes and the front and back surfaces and the side surfaces intersect are each formed so as to have a radius of curvature R of 0.01 to 0.3 mm. A glass substrate for an electronic device, which is a feature.

【0015】第3の発明は、板状ガラス基板を所定の大
きさ及び形状に切り出し、その表裏面を粗研磨し、次に
前記板状ガラス基板の表裏の面と側面とが交差する稜線
部に面取加工を施して平坦な面取斜面を形成し、次に前
記面取斜面並びに側面及び表裏の面の一部にブラッシン
グによる研磨を施して前記面取斜面と前記表裏の面及び
前記側面とがそれぞれ交差する稜線部をその曲率半径R
が0.01〜0.3mmになるように丸く形成し、次に
前記表裏の面を仕上げ研磨し、次いで洗浄を施すことを
特徴とする電子デバイス用ガラス基板の製造方法であ
る。
According to a third aspect of the present invention, a plate-like glass substrate is cut into a predetermined size and shape, the front and back surfaces thereof are roughly polished, and then the ridge portion where the front and back surfaces and the side surfaces of the plate-like glass substrate intersect. A chamfering process is performed to form a flat chamfered slope, and then the chamfered slope and a part of the side and front and back surfaces are polished by brushing to make the chamfered slope and the front and back surfaces and the side surfaces. Are defined by the radii of curvature R
Is rounded so as to be 0.01 to 0.3 mm, and then, the front and back surfaces are finish-polished and then subjected to cleaning.

【0016】[0016]

【0017】[0017]

【0018】上述の構成において、前記平坦な面取斜面
が形成されていることから、マスク基板の製造工程等に
おける搬送時の保持が容易となり、かつ、保持の際に局
部的に過大な力が加わるおそれがなく、割れや欠けが生
ずることがない。また、平坦な面取斜面があることから
洗浄の際の異物の洗い落しが容易であり、効率的な洗浄
が可能となる。また、前記面取斜面と前記表裏の面およ
び前記側面とがそれぞれ交差する稜線部を丸く形成して
いることから、この部分に欠け等が生ずることがない。
しかも、これら稜線部を丸く形成する研摩は比較的迅速
にできるので製造も容易である。
In the above structure, since the flat chamfered slope is formed, it is easy to hold the mask substrate during the transportation in a manufacturing process or the like, and an excessive force is locally applied during the holding. There is no risk of cracking or chipping. In addition, since there is a flat chamfered slope, it is easy to wash away foreign substances at the time of cleaning, and efficient cleaning can be performed. In addition, since the chamfered slope, the front and back surfaces, and the side surfaces each have a rounded ridge portion, no chipping or the like occurs in this portion.
In addition, since the polishing for forming these ridge portions in a round shape can be performed relatively quickly, manufacturing is easy.

【0019】[0019]

【実施の形態】第1図は本発明の一実施例にかかる電子
デバイス用ガラス基板の部分断面図、第7図は第1図の
A部拡大図、第8図は第1図のB部拡大図である。以
下、これらの図面を参照しながら本発明の一実施例を詳
述する。
FIG. 1 is a partial sectional view of a glass substrate for an electronic device according to an embodiment of the present invention, FIG. 7 is an enlarged view of a portion A of FIG. 1, and FIG. 8 is a portion B of FIG. It is an enlarged view. Hereinafter, an embodiment of the present invention will be described in detail with reference to these drawings.

【0020】第1図において、符号1はガラス基板本
体、符号2は表面、符号3は裏面、符号4は側面、符号
5および6は面取斜面、符号5a,5b,6a,6bは
稜線部である。
In FIG. 1, reference numeral 1 denotes a glass substrate body, reference numeral 2 denotes a front surface, reference numeral 3 denotes a back surface, reference numeral 4 denotes a side surface, reference numerals 5 and 6 denote chamfers, and reference numerals 5a, 5b, 6a and 6b denote ridge portions. It is.

【0021】前記ガラス基板本体1は、一辺の長さが12
7 mm、厚さ2.3 mmの略正方形状をなした板状体であ
る。材質は、ソーダライム系ガラス、ボロシリケート系
ガラスあるいは溶融石英等のいずれでもよいが、この実
施例ではソーダライム系ガラスを採用している。
The glass substrate body 1 has a side length of 12
It is a plate having a substantially square shape with a thickness of 7 mm and a thickness of 2.3 mm. The material may be any of soda lime glass, borosilicate glass, fused quartz, etc., but in this embodiment, soda lime glass is used.

【0022】前記ガラス基板本体1の表面2および裏面
3は平坦面であり、鏡面仕上げが施されている。
The front surface 2 and the back surface 3 of the glass substrate main body 1 are flat surfaces and are mirror-finished.

【0023】また、前記面取斜面5および6は、それぞ
れ前記表面2および裏面3と側面4とが交差する稜線部
に面取り加工が施されて平坦な傾斜面に形成されたもの
である。これら面取斜面5と6とは、前記ガラス基板本
体1の中心を含み表裏の面2および3と平行な基準面C
対して略対称となるように形成されている。また、この
面取斜面5および6と前記表面2および裏面3並びに側
面4となす角αおよびβは、マスク基板製造時等に用い
られる搬送装置に対応して設定されるが、この実施例で
は、α,βともに略45°に設定されている。さらに、こ
れら面取斜面5および6の側面4および表裏の面2およ
び3への投影距離a,bも、前記搬送装置に対応して設
定されるが、この実施例では、0.6 〜0.7 mmに設定さ
れている。
The chamfered slopes 5 and 6 are formed as flat inclined surfaces by chamfering the ridges at which the front surface 2 and the back surface 3 intersect with the side surfaces 4, respectively. The chamfered slopes 5 and 6 include a reference plane C including the center of the glass substrate main body 1 and being parallel to the front and back surfaces 2 and 3.
It is formed so as to be substantially symmetrical with respect to it. The angles α and β between the chamfered slopes 5 and 6 and the front surface 2 and the back surface 3 and the side surface 4 are set in accordance with a transfer device used at the time of manufacturing a mask substrate. , Α, and β are both set at approximately 45 °. Further, the projection distances a and b of the chamfered slopes 5 and 6 onto the side surface 4 and the front and back surfaces 2 and 3 are also set in accordance with the transport device. In this embodiment, the projection distances are 0.6 to 0.7 mm. Is set.

【0024】また、前記稜線部5a,5b,6a,6b
は、前記面取斜面5および6と、表面2および裏面3並
びに側面4とがそれぞれ交差する部位である。
The ridges 5a, 5b, 6a, 6b
Is a portion where the chamfered slopes 5 and 6 intersect the front surface 2, the back surface 3, and the side surface 4, respectively.

【0025】第7図および第8図に示されるように、こ
れら稜線部5a,5bは、図で点線で示されるように、
前記側面4と面取斜面5、並びに、面取斜面5と表面2
および裏面3とがそれぞれ交差する交差線の近傍を除去
し、断面略円弧曲線状となるように丸く形成したもので
ある。なお、前記円弧の曲率半径Rは、前記ガラス基板
本体1の厚さ、面取斜面5および6の傾斜角α,β等を
考慮して設定されるが、おおよそ0.01mm〜0.3 mm程
度の範囲に設定することが好ましい。なお、この実施例
ではR=0.05mmに設定している。なお、前記稜線部6
a,6bも前記稜線部5a,5bと同様であるから説明
を省略する。
As shown in FIGS. 7 and 8, these ridge portions 5a and 5b are, as shown by dotted lines in the drawings,
The side surface 4 and the chamfered slope 5, and the chamfered slope 5 and the surface 2
In addition, the vicinity of the intersection line where the back surface 3 intersects with each other is removed, and the cross section is formed in a round shape so as to have a substantially arc-shaped cross section. The radius of curvature R of the arc is set in consideration of the thickness of the glass substrate body 1, the inclination angles α and β of the chamfered slopes 5 and 6, and the like, and is in a range of about 0.01 mm to 0.3 mm. It is preferable to set In this embodiment, R is set to 0.05 mm. In addition, the said ridgeline part 6
Since a and 6b are the same as the ridge portions 5a and 5b, description thereof is omitted.

【0026】上述の一実施例の電子デバイス用ガラス基
板は、例えば、以下の手順で製造することができる。
The glass substrate for an electronic device of the above-described embodiment can be manufactured, for example, by the following procedure.

【0027】まず、厚さ2.3 mmのソーダライムガラス
を大きさ127 ×127 mmの正方形状に切り出し、表裏の
面を粗研磨してガラス基板本体1を得る。
First, a soda lime glass having a thickness of 2.3 mm is cut into a square having a size of 127 × 127 mm, and the front and back surfaces are roughly polished to obtain a glass substrate body 1.

【0028】次に、周知の面取加工装置を用いて、表裏
の面と側面とがそれぞれ交差する稜線部に面取り加工を
施し、面取斜面5および6を形成する。
Next, using a well-known chamfering apparatus, chamfering is performed on the ridge portions where the front and back surfaces and the side surfaces intersect, thereby forming chamfered slopes 5 and 6.

【0029】次に、このガラス基板本体1を第9図およ
び第10図に示される研摩装置7にセットし、前記面取
斜面5および6を含む側面を研摩する。この研摩装置7
は、複数枚のガラス基板1を基板固定ボックス71に垂
直に立てて固定し、ブラシ台座72に植設されたナイロ
ンブラシ73によってブラッシングするものである。こ
のブラッシング操作は、前記ブラシ台座72に固定され
たスイングアーム74を図示しない駆動機構によって回
転および往復移動することにより行う。また、その際、
この研摩装置7の周囲に配置された複数のノズル75か
ら水または有機溶媒を含む混合液に周知の研摩材を分散
させた研摩液76を噴出させて、前記ガラス基板本体1
に吹きかける。
Next, the glass substrate main body 1 is set in a polishing apparatus 7 shown in FIGS. 9 and 10, and the side surfaces including the chamfered slopes 5 and 6 are polished. This polishing device 7
Is a method in which a plurality of glass substrates 1 are set upright on a substrate fixing box 71 and fixed, and brushing is performed with a nylon brush 73 planted on a brush pedestal 72. This brushing operation is performed by rotating and reciprocating a swing arm 74 fixed to the brush pedestal 72 by a drive mechanism (not shown). At that time,
A plurality of nozzles 75 arranged around the polishing apparatus 7 eject a polishing liquid 76 in which a known polishing material is dispersed in a mixed liquid containing water or an organic solvent, and the glass substrate main body 1
Spray.

【0030】この研摩によって、前記面取斜面5および
6と、表面2および裏面3並びに側面4とがそれぞれ交
差する突出した部位が選択的に研摩され、これら部位が
丸く形成されて前記稜線部5a,5b,6a,6bが形
成される。なお、この研摩は、ブラシの種類および分散
させる研摩材の粒度を研摩の進行につれて変えていき、
粗研磨から精密研摩までを行う。
By this polishing, protruding portions where the chamfered slopes 5 and 6 intersect with the front surface 2 and the back surface 3 and the side surface 4 are selectively polished, and these portions are formed in a round shape to form the ridge portion 5a. , 5b, 6a, 6b are formed. In this polishing, the type of brush and the particle size of the abrasive to be dispersed are changed as the polishing progresses,
Performs rough polishing to precision polishing.

【0031】次いで、前記表裏の面2および3に周知の
方法で鏡面仕上げを施し、界面活性剤を含む洗浄液、並
びに純水で洗浄後、乾燥する。これにより、電子デバイ
ス用ガラス基板が得られる。
Then, the front and back surfaces 2 and 3 are mirror-finished by a known method, washed with a cleaning solution containing a surfactant and pure water, and dried. Thereby, a glass substrate for an electronic device is obtained.

【0032】上述の手順により電子デバイス用ガラス基
板を100 枚製造して周辺の傷等を調べた結果、表面の鏡
面研摩の際の保持治具との接触等による傷、あるいは、
搬送時における保持治具との接触による傷等が全くなか
った。また、これら電子デバイス用ガラス基板のそれぞ
れの表面に、クロム膜をスパッタリング法によって成膜
してマスク基板を製造した。そして、これらマスク基板
に付着している異物(微粒子)の数およびピンホールの
数を調べた。その結果、異物の数は、従来に比較して半
数以下であり、また、ピンホールの数も平均0.04個/cm
2 であって、従来の平均値である0.08個/cm2 半分であ
った。さらに、これらマスク基板を半導体製造に用いた
ところ、自動搬送等のための保持を容易に行うことがで
き、作業性が極めてよいとともに、保持に伴ってガラス
チップ等の異物が生ずることもなく、自動搬送その他の
作業工程をトラブルなく安定してスムーズに行なうこと
ができた。
As a result of manufacturing 100 glass substrates for an electronic device by the above-described procedure and examining peripheral scratches and the like, it was found that the surface was scratched due to contact with a holding jig during mirror polishing, or
There were no scratches or the like due to contact with the holding jig during transportation. A chromium film was formed on each surface of the glass substrates for electronic devices by a sputtering method to produce a mask substrate. Then, the number of foreign substances (fine particles) and the number of pinholes adhering to these mask substrates were examined. As a result, the number of foreign substances is less than half the number of conventional ones, and the average number of pinholes is 0.04 / cm.
2 , which is half of the conventional average value of 0.08 / cm 2 . Furthermore, when these mask substrates are used for semiconductor manufacturing, holding for automatic conveyance and the like can be easily performed, workability is extremely good, and no foreign matter such as a glass chip is generated with the holding, Automatic transfer and other work processes could be performed stably and smoothly without any trouble.

【0033】なお、上述の一実施例では、ガラス基板本
体1の形状が略正方形状である場合の例を掲げたが、本
発明は、これに限られものでなく、長方形状、円形その
他の形状のものにも適用できることは勿論である。ま
た、側面、面取斜面および稜線部は鏡面仕上げとしても
よいことは勿論である。
In the above-described embodiment, an example in which the shape of the glass substrate body 1 is substantially square has been described. However, the present invention is not limited to this. It is needless to say that the present invention can be applied to a shape. Further, it is needless to say that the side face, the chamfered slope, and the ridge portion may be mirror-finished.

【0034】[0034]

【発明の効果】以上詳述したように、本発明は、板状の
ガラス基板の表裏の面と側面とが交差する稜線部に面取
を施して平坦な面取斜面を形成し、前記面取斜面と前記
表裏の面および前記側面とがそれぞれ交差する稜線部を
丸く形成した構成を有し、これにより、比較的簡単な構
成で、マスク基板の製造工程中等において、欠け等が生
ずるおそれがなく、しかも、搬送時の保持が容易な電子
デバイス用ガラス基板を得ているものである。
As described above in detail, according to the present invention, a flat chamfered slope is formed by chamfering a ridge portion where the front and back surfaces and side surfaces of a plate-like glass substrate intersect. It has a configuration in which a ridge line portion where the inclined surface intersects with the front and back surfaces and the side surface is formed in a round shape, whereby a relatively simple configuration may cause chipping or the like during a mask substrate manufacturing process or the like. In addition, a glass substrate for an electronic device which can be easily held during transportation is obtained.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明の一実施例にかかる電子デバイス用ガラ
ス基板の部分断面図である。
FIG. 1 is a partial cross-sectional view of a glass substrate for an electronic device according to one embodiment of the present invention.

【図2】従来例の説明図である。FIG. 2 is an explanatory diagram of a conventional example.

【図3】従来例の説明図である。FIG. 3 is an explanatory diagram of a conventional example.

【図4】従来例の説明図である。FIG. 4 is an explanatory diagram of a conventional example.

【図5】従来例の説明図である。FIG. 5 is an explanatory diagram of a conventional example.

【図6】従来例の説明図である。FIG. 6 is an explanatory diagram of a conventional example.

【図7】第1図のA部拡大図である。FIG. 7 is an enlarged view of a portion A in FIG. 1;

【図8】第1図のB部拡大図である。FIG. 8 is an enlarged view of a portion B in FIG. 1;

【図9】一実施例の製造時における研摩工程説明図であ
る。
FIG. 9 is an explanatory view of a polishing step during manufacturing of one embodiment.

【図10】一実施例の製造時における研摩工程説明図で
ある。
FIG. 10 is an explanatory view of a polishing step during manufacturing of one embodiment.

【符号の説明】[Explanation of symbols]

1…ガラス基板本体、2…表面、3…裏面、4…側面、
5,6…面取斜面、5a,5b,6a,6b…稜線部。
1: glass substrate body, 2: front surface, 3: rear surface, 4: side surface,
5, 6 ... chamfered slopes, 5a, 5b, 6a, 6b ... ridge lines.

Claims (3)

(57)【特許請求の範囲】(57) [Claims] 【請求項1】 板状ガラス基板の表裏の面と側面とが交
差する稜線部に面取を施して平坦な面取斜面を形成し、
前記面取斜面と前記表裏の面及び前記側面とがそれぞれ
交差する稜線部をその曲率半径Rが0.01〜0.3m
mになるように丸く形成したことを特徴とする電子デバ
イス用ガラス基板。
1. A flat chamfered slope is formed by chamfering a ridge portion where the front and back surfaces and side surfaces of a plate-like glass substrate intersect,
The radius of curvature R of the ridge portion at which the chamfered slope, the front and back surfaces, and the side surfaces intersect is 0.01 to 0.3 m.
A glass substrate for an electronic device, wherein the glass substrate is formed so as to have a diameter of m .
【請求項2】 板状ガラス基板の表裏の面と側面とが交
差する稜線部に面取を施して平坦な面取斜面を形成し、
該面取斜面を含む領域に研摩液を存在させてブラッシン
グすることによって、前記面取斜面と前記表裏の面及び
前記側面とがそれぞれ交差する稜線部をその曲率半径R
が0.01〜0.3mmになるように丸く形成したこと
を特徴とする電子デバイス用ガラス基板。
2. A flat chamfered slope is formed by chamfering a ridge portion where the front and back surfaces and side surfaces of the plate-like glass substrate intersect,
Brushing is performed in the region including the chamfered slope with the polishing liquid present, so that the ridge line where the chamfered slope intersects the front and back surfaces and the side surfaces has a radius of curvature R.
A glass substrate for an electronic device, wherein the glass substrate is formed so as to be 0.01 to 0.3 mm.
【請求項3】 板状ガラス基板を所定の大きさ及び形状
に切り出し、その表裏面を粗研磨し、次に前記板状ガラ
ス基板の表裏の面と側面とが交差する稜線部に面取加工
を施して平坦な面取斜面を形成し、次に前記面取斜面並
びに側面及び表裏の面の一部にブラッシングによる研磨
を施して前記面取斜面と前記表裏の面及び前記側面とが
それぞれ交差する稜線部をその曲率半径Rが0.01〜
0.3mmになるように丸く形成し、次に前記表裏の面
を仕上げ研磨し、次いで洗浄を施すことを特徴とする電
子デバイス用ガラス基板の製造方法。
3. A plate-like glass substrate is cut into a predetermined size and shape, its front and back surfaces are roughly polished, and chamfering is performed on a ridge line where the front and back surfaces and side surfaces of the plate-like glass substrate intersect. To form a flat chamfered slope, and then polishing the chamfered slope and part of the side and front and back surfaces by brushing so that the chamfered slope intersects the front and back surfaces and the side surfaces, respectively. Radius of curvature R is 0.01 to
A method for producing a glass substrate for an electronic device, comprising: forming a round shape so as to have a thickness of 0.3 mm; and polishing and polishing the front and back surfaces, and then performing cleaning.
JP22576198A 1998-08-10 1998-08-10 Glass substrate for electronic device and method of manufacturing the same Expired - Lifetime JP3046003B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP22576198A JP3046003B2 (en) 1998-08-10 1998-08-10 Glass substrate for electronic device and method of manufacturing the same

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP22576198A JP3046003B2 (en) 1998-08-10 1998-08-10 Glass substrate for electronic device and method of manufacturing the same

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
JP31276189A Division JP2866684B2 (en) 1989-11-30 1989-11-30 Method for manufacturing glass substrate for electronic device

Publications (2)

Publication Number Publication Date
JPH11109607A JPH11109607A (en) 1999-04-23
JP3046003B2 true JP3046003B2 (en) 2000-05-29

Family

ID=16834411

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Country Link
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