JP3044249B2 - Composite electrolytic polishing method - Google Patents
Composite electrolytic polishing methodInfo
- Publication number
- JP3044249B2 JP3044249B2 JP4234856A JP23485692A JP3044249B2 JP 3044249 B2 JP3044249 B2 JP 3044249B2 JP 4234856 A JP4234856 A JP 4234856A JP 23485692 A JP23485692 A JP 23485692A JP 3044249 B2 JP3044249 B2 JP 3044249B2
- Authority
- JP
- Japan
- Prior art keywords
- polishing
- stainless steel
- electrolytic polishing
- electrolytic
- current
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
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- Electrical Discharge Machining, Electrochemical Machining, And Combined Machining (AREA)
Description
【０００１】[0001]
【産業上の利用分野】本発明は、ステンレス鋼表面に対
して、電解液を供給しながら電解研磨を行うと共に機械
研磨を行う複合電解研磨方法に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a composite electropolishing method for performing electropolishing and mechanical polishing on a stainless steel surface while supplying an electrolytic solution.
【０００２】[0002]
【従来の技術及び発明が解決しようとする課題】金属表
面の面粗さを１μm 以下に研磨する従来の方法として
は、バフ研磨に代表される機械研磨，薬品を利用する化
学研磨及び電解液中にて電流を流しながら研磨を行う電
解研磨が挙げられる。しかしながら、機械研磨では平坦
性の向上は困難である。また化学研磨，電解研磨では被
研磨物を浸漬させる槽が必要であり、研磨対象物が大き
い場合は大きな槽及び大量の液を必要とするので、装置
は大掛かりでありコストの上昇も免れなかった。また研
磨製品は、食品，化学薬品の製造にも用いられることか
ら、付着物を減少させる必要があり、また高耐食性が要
求される。2. Description of the Related Art Conventional methods of polishing a metal surface to a surface roughness of 1 μm or less include mechanical polishing represented by buffing, chemical polishing using chemicals, and electrolytic polishing. And electropolishing in which polishing is performed while passing an electric current. However, it is difficult to improve flatness by mechanical polishing. In chemical polishing and electrolytic polishing, a tank for immersing the object to be polished is required. When the object to be polished is large, a large tank and a large amount of liquid are required. Therefore, the apparatus is large-scale and the cost is inevitably increased. . Further, since abrasive products are also used in the production of foods and chemicals, it is necessary to reduce deposits and high corrosion resistance is required.
【０００３】そこでこれらの欠点を補う方法として、機
械研磨と電解研磨とを合わせた複合電解研磨方法の研究
が進められており、ステンレス鋼においては、電解液と
して硝酸ナトリウム等の硝酸塩を用いて実用化が行われ
ている。硝酸塩はステンレス鋼の不動態化皮膜形成を目
的として行われているが、不動態化皮膜が形成されると
電流が流れなくなり電解研磨を行うことは困難である。
従って複合電解研磨ではこの不動態化皮膜を研削しなが
ら研磨を行っており、機械研磨の要素が強く効率が悪か
った。[0003] As a method for compensating for these drawbacks, studies are being conducted on a combined electrolytic polishing method combining mechanical polishing and electrolytic polishing. In stainless steel, a nitrate such as sodium nitrate is used as an electrolytic solution for practical use. Is being done. Nitrate is used for the purpose of forming a passivation film of stainless steel. However, when the passivation film is formed, no current flows and it is difficult to perform electrolytic polishing.
Therefore, in the composite electrolytic polishing, polishing is performed while grinding the passivation film, and the mechanical polishing factor is strong and the efficiency is low.
【０００４】本発明は、かかる事情に鑑みてなされたも
のであり、構成が簡略化され、小型で安価な設備を用い
て機械研磨と電解研磨とを同時的に行うことにより、ス
テンレス鋼表面の耐食性及び平坦性を向上し得るように
した複合電解研磨方法を提供することを目的とする。[0004] The present invention has been made in view of such circumstances, and has a simplified configuration and uses small and inexpensive equipment.
By simultaneously carrying out the electrolytic polishing and mechanical polishing Te, vinegar
As can improve the corrosion resistance and flatness of stainless steel surfaces
It is an object of the present invention to provide a combined electrolytic polishing method.
【０００５】[0005]
【課題を解決するための手段】本発明に係る複合電解研
磨方法は、ステンレス鋼表面に対して、電解液を供給し
ながら電解研磨を行い、同時的に研磨材を用いて機械研
磨を行う複合電解研磨方法において、先端部に電極及び
この電極を覆い、被研磨物と対向する面が平坦面である
不織布製のパッドを固定した導電性の中空の回転軸を回
転しつつ、該中空の回転軸を通じて前記パッドにリン酸
塩及び硫酸塩を重量比２：１で溶解した水溶液からなる
電解液を供給すると共に、前記電解液及び電極とステン
レス鋼表面とにデューティ比９５：５にて正負が交互反
転する電流密度２０〜３０Ａ／ｄｍ 2 の電流を供給する
ことを特徴とする。A composite electrolytic polishing method according to the present invention is a composite electrolytic polishing method in which electrolytic polishing is performed on a stainless steel surface while supplying an electrolytic solution, and mechanical polishing is simultaneously performed using an abrasive. in the electrolytic polishing method, to cover the electrode and the electrode at the distal end, HiKen grinding material facing the side faces are planar surfaces
While rotating the rotary shaft of the hollow non-woven pads were fixed conductive, hollow rotary weight ratio of phosphate and sulfate in the pad through the shaft 2: supplying an electrolytic solution comprising an aqueous solution prepared by dissolving in 1 In addition, a current having a current density of 20 to 30 A / dm 2 in which positive and negative are alternately reversed at a duty ratio of 95: 5 is supplied to the electrolyte and the electrode and the stainless steel surface.
【０００６】[0006]
【作用】本発明にあっては、リン酸塩と硫酸塩とを重量
比２：１で溶解した水溶液を電解液とするので、被研磨
物と電極間に流れる電流が従来方法の場合より増加する
こととなり、機械加工により生じる耐食性が低いベイル
ビー層及び変成層を電解作用により金属溶解し、耐食性
を向上させることが可能となり、またデューティ比９
５：５で正負が交互反転する電流密度２０〜３０Ａ／ｄ
ｍ 2 の電流を用いることにより、粘性がある被研磨物表
面の付着物を除洗しながら電解研磨を行うことが可能で
あり、被研磨物表面はより効果的に微細に研磨され、実
表面積は約１／３程度となり、耐食性を向上させること
が可能である。また導電性の回転軸の先端に電極及びパ
ッドを固定し、回転軸を通じてリン酸塩と硫酸塩とを溶
解した電解液の供給及び正負に交互する電流の供給を行
うようにしたから、簡単な設備で効率的な電解研磨を行
い得る。According to the present invention, phosphate and sulfate are used in a weight ratio.
Since the aqueous solution dissolved at a ratio of 2: 1 is used as the electrolytic solution, the current flowing between the object to be polished and the electrode is increased as compared with the conventional method, and the Bailby layer and the metamorphic layer having low corrosion resistance generated by machining are subjected to the electrolytic action. Dissolves the metal to improve the corrosion resistance, and has a duty ratio of 9
5: current positive and negative 5 is alternately inverted density 20~30A / d
By using a current of m 2 , it is possible to perform electropolishing while removing viscous deposits on the surface of the object to be polished. Is about 1/3, and the corrosion resistance can be improved. In addition, an electrode and a pad are fixed to the tip of the conductive rotating shaft, and the supply of the electrolytic solution in which the phosphate and the sulfate are dissolved and the supply of the current alternately in the positive and negative directions are performed through the rotating shaft. Efficient electropolishing can be performed with equipment.
【０００７】[0007]
【実施例】以下、本発明をその実施例を示す図面に基づ
き具体的に説明する。図１は、本発明に係る複合電解研
磨方法の実施に用いる複合電解研磨装置のワーク部（回
転部）を示す模式的断面図である。図中１は銅製、中空
の回転軸であり、この回転軸の先端部は雄ネジになって
いる。この雄ネジのすぐ上の側面に複数の孔1aが開設さ
れている。また回転軸１の他方側は図示しない本体に接
続されており、本体はエアー駆動装置及びコネクタを備
える。このエアー駆動装置により回転軸１は回転し、ま
たコネクタを介して回転軸１内へ電解液が送入されるよ
うになっている。また回転軸１は電源５に接続されてい
る。この電源５は正負に交互反転する電流を発生するも
のである。DESCRIPTION OF THE PREFERRED EMBODIMENTS The present invention will be specifically described below with reference to the drawings showing the embodiments. FIG. 1 is a schematic sectional view showing a work part (rotating part) of a composite electrolytic polishing apparatus used for carrying out the composite electrolytic polishing method according to the present invention. In the figure, reference numeral 1 denotes a hollow rotary shaft made of copper, and the tip of the rotary shaft is a male screw. A plurality of holes 1a are formed on the side surface immediately above the male screw. The other side of the rotating shaft 1 is connected to a main body (not shown), and the main body includes an air driving device and a connector. The rotating shaft 1 is rotated by the air driving device, and an electrolytic solution is fed into the rotating shaft 1 via a connector. The rotating shaft 1 is connected to a power supply 5. The power supply 5 generates a current that alternately reverses positive and negative.
【０００８】この回転軸１の先端部には、複数の孔2aが
開設された円板状、銅製の電極２が螺合されている。そ
して回転軸１の孔1aの上部には、電極２の上方及び側面
を覆う態様で伸縮性があるウレタンからなるカバー３が
取り付けられている。さらに電極２，カバー３の下側に
スポンジからなり中央部に孔4aを有するパッド４がカバ
ー３に接着させて取り付けられている。A disk-shaped, copper-made electrode 2 having a plurality of holes 2a is screwed into the tip of the rotating shaft 1. A cover 3 made of elastic urethane is attached to the upper part of the hole 1 a of the rotating shaft 1 so as to cover the upper side and the side surface of the electrode 2. Further, a pad 4 made of a sponge and having a hole 4a at the center is attached to the cover 3 under the electrode 2 and the cover 3.
【０００９】以上の如き構成の複合電解研磨装置におい
ては、回転軸１の中空部へ送入された電解液は孔1a, 2
a, 4aを通りパッド４全体へ行き渡り、回転軸１を経て
電極２に通電を行うことにより電解研磨が実施可能であ
り、且つワーク部を回転させることにより同時的に機械
研磨を行うことが可能である。In the composite electrolytic polishing apparatus having the above-described configuration, the electrolytic solution fed into the hollow portion of the rotating shaft 1 has the holes 1a, 2a.
Electropolishing can be performed by passing electricity to the electrode 2 through the rotary shaft 1 through the entire pad 4 through a and 4a, and mechanical polishing can be performed simultaneously by rotating the work part. It is.
【００１０】このような複合電解研磨装置を用いた本発
明方法の実施例及び実施結果について説明する。電解液
の組成物として、リン酸水素ナトリウム２４０ｇ，硫酸
ナトリウム１２０ｇを水１ｌに溶解し、アルミナ砥粒を
３０ｇ加える。そして正負のデューティ比が95:5で電流
密度が２０Ａ／ｄｍ2 の高速反転電流を用いる。試料は
ＳＵＳ３１６ステンレス鋼板である。Examples and results of the method of the present invention using such a composite electrolytic polishing apparatus will be described. As a composition of the electrolytic solution, 240 g of sodium hydrogen phosphate and 120 g of sodium sulfate are dissolved in 1 liter of water, and 30 g of alumina abrasive grains are added. Then, a high-speed inversion current having a positive / negative duty ratio of 95: 5 and a current density of 20 A / dm 2 is used. The sample is a SUS316 stainless steel plate.
【００１１】そしてオージェスパッタ試験により表面状
態の成分割合を調べた。図２は本発明方法とバフ研磨と
を比較して示す研磨表面の組成であり、縦軸に組成をと
り、横軸にスパッタ時間をとって示してある。スパッタ
時間が０に近いほど表面上層の組成を示すことになる。
図２より明らかな如くバフ研磨においては鉄，ニッケ
ル，クロム等の金属が表面と内部とでその成分割合にあ
まり変化は見られない。これに対し本発明方法において
は表面付近での鉄分含有量が少なく、相対的にニッケ
ル，クロムの割合が増加している。さらに表面付近にの
み酸素が高い割合で存在していることから表層に酸化皮
膜（不動態化皮膜）が形成されていることがわかる。Then, the component ratio in the surface state was examined by an Auger sputtering test. FIG. 2 shows the composition of the polished surface in comparison between the method of the present invention and buff polishing. The vertical axis shows the composition, and the horizontal axis shows the sputtering time. The closer the sputtering time is to 0, the more the composition of the upper surface layer is shown.
As is apparent from FIG. 2, in the buff polishing, there is little change in the composition ratio of metals such as iron, nickel and chromium between the surface and the inside. On the other hand, in the method of the present invention, the iron content near the surface is small, and the proportions of nickel and chromium are relatively increased. Furthermore, it can be seen that an oxide film (passivation film) is formed on the surface layer because oxygen exists at a high ratio only near the surface.
【００１２】次に本発明方法の他の実施例及びその実施
結果について説明する。電解液の組成物として、リン酸
水素２カリウム２００ｇ，硫酸カリウム１００ｇを水１
ｌに溶解する。そして正負のデューティ比が95:5で電流
密度が３０Ａ／ｄｍ2 の高速反転電流を用い、研磨材が
含まれた不織布をパッドとして複合電解研磨を行う。試
料はＳＵＳ３０４ステンレス鋼板である。Next, another embodiment of the method of the present invention and the results of the embodiment will be described. As a composition of the electrolytic solution, 200 g of dipotassium hydrogen phosphate and 100 g of potassium sulfate were added to water 1
Dissolve in l. Then, composite electropolishing is performed using a high-speed reversal current having a positive / negative duty ratio of 95: 5 and a current density of 30 A / dm 2 , using a nonwoven fabric containing an abrasive as a pad. The sample is a SUS304 stainless steel plate.
【００１３】そして硝酸への浸漬テストを行った。複合
電解研磨後の試料であるステンレス鋼板及び未処理のス
テンレス鋼板を67.5％の硝酸に浸漬し、重量の減少量を
常温にて測定した。図３は縦軸に重量減少量をとり、横
軸に浸漬日数をとって示したグラフであり、Ａは本発明
方法により処理したステンレス鋼板の重量減少量を示
し、Ｂは未処理のステンレス鋼板の重量減少量を示す。
図３より明らかな如く本発明方法によるステンレス鋼板
は重量減少量が少なく、14日目以降の重量減少はほとん
どない。これに対し未処理のステンレス鋼板では本発明
方法のステンレス鋼板の約２倍の重量減少がみられ、21
日目を境に重量は増加している。これは酸化皮膜の生成
によるものと考えられる。Then, an immersion test in nitric acid was performed. The stainless steel sheet and the untreated stainless steel sheet after the composite electrolytic polishing were immersed in 67.5% nitric acid, and the weight loss was measured at room temperature. FIG. 3 is a graph showing the weight loss on the vertical axis and the number of days of immersion on the horizontal axis, in which A shows the weight loss of the stainless steel sheet treated by the method of the present invention, and B shows the untreated stainless steel sheet. Indicates the amount of weight loss.
As is evident from FIG. 3, the stainless steel sheet according to the method of the present invention has a small weight loss, and hardly any weight loss after 14 days. On the other hand, the untreated stainless steel sheet showed a weight reduction of about twice that of the stainless steel sheet of the method of the present invention.
The weight has increased since the day. This is considered to be due to the formation of an oxide film.
【００１４】以上のように本発明方法により研磨を行う
と、表面付近の鉄分含有量が少なく、表面に緻密で強固
な不動態化皮膜（酸化皮膜）が形成されていること、及
び研磨表面の平坦性が増したことから、高濃度硝酸中に
浸漬しても重量の増減が少なく耐食性が高いステンレス
鋼板を得ることが可能である。また従来の複合電解研磨
方法より被研磨物と電極間に流れる電流が増大すること
から所要時間が大幅に短縮された。なお高速反転電流密
度は大きいほど研磨量が大きくなり研磨時間を短縮する
ことが可能である。また上述の実施例で示すように、研
磨材を電解液に混入するか又は研磨材を含むパッドを用
いるかのいずれの方法でも機械研磨を行うことが可能で
ある。As described above, when the polishing is performed by the method of the present invention, the iron content in the vicinity of the surface is small, and a dense and strong passivation film (oxide film) is formed on the surface. Since the flatness has been increased, it is possible to obtain a stainless steel sheet with little change in weight and high corrosion resistance even when immersed in high-concentration nitric acid. Further, since the current flowing between the object to be polished and the electrode is increased as compared with the conventional composite electrolytic polishing method, the required time is greatly reduced. The higher the high-speed reversal current density, the larger the polishing amount and the shorter the polishing time. Further, as shown in the above embodiment, mechanical polishing can be performed by either a method of mixing an abrasive into an electrolytic solution or a method of using a pad containing an abrasive.
【００１５】[0015]
【発明の効果】以上のように本発明に係る複合電解研磨
方法では、リン酸塩及び硫酸塩を重量比２：１で溶解し
た水溶液を電解液として用いることにより、被研磨物と
電極間に流れる電流が増加して電解作用による金属溶解
を促す。さらにデューティ比９５：５で正負が交互反転
する電流密度２０〜３０Ａ／ｄｍ 2 の電流を用いて前述
の複合電解研磨方法を実施するので、耐食性及び平坦性
を向上させることが可能となる。また導電性の回転軸を
通じてその先端に固定した電極及びこれを覆い、被研磨
物との対向面が平坦なパッドに対する電解液の供給及び
正負に交互反転する電流の供給を行うようにしたから、
回転軸の回転と併せて簡単な設備で効率的な研磨を行い
得る効果がある。更にステンレス鋼を対象とすることで
前記した数値限定によって、図３に示す如くステンレス
鋼板の重量減少量が少なく、また表面付近の鉄分含有量
が少なく、表面に緻密で強固な不動態化皮膜を形成出来
ると共に、研磨表面の平坦性が増し、耐食性の高いステ
ンレス鋼板が得られる。また研磨に要する時間が短縮出
来、加えて高速反転電流密度を大きくするほど研磨量を
大きく出来ることから研磨時間の大幅な短縮を容易に行
い得る。 As described above, in the composite electrolytic polishing method according to the present invention, an aqueous solution in which a phosphate and a sulfate are dissolved at a weight ratio of 2: 1 is used as an electrolytic solution, so that there is a gap between an object to be polished and an electrode. The flowing current increases to promote metal dissolution by the electrolytic action. Furthermore, since the above-described composite electrolytic polishing method is performed using a current having a current density of 20 to 30 A / dm 2 in which the polarity is alternately reversed at a duty ratio of 95: 5 , the corrosion resistance and the flatness can be improved. In addition, since the electrode fixed to the tip and covering the electrode through the conductive rotating shaft and the surface facing the object to be polished were supplied with the electrolytic solution to the flat pad and the supply of the current alternately reversed between positive and negative,
There is an effect that efficient polishing can be performed with simple equipment in combination with the rotation of the rotating shaft. In addition, by targeting stainless steel
Due to the above numerical limitation, stainless steel as shown in FIG.
Low weight loss of steel sheet and iron content near the surface
And a dense and strong passivation film can be formed on the surface.
At the same time, the flatness of the polished surface increases,
A stainless steel sheet is obtained. Also, the time required for polishing is reduced.
In addition, as the high-speed reversal current density increases, the polishing amount increases.
Easy to greatly reduce polishing time
Can be.
【図１】本発明方法の実施に使用する複合電解研磨装置
を示す模式的断面図である。FIG. 1 is a schematic sectional view showing a composite electrolytic polishing apparatus used for carrying out the method of the present invention.
【図２】研磨表面の組成を示すグラフである。FIG. 2 is a graph showing a composition of a polished surface.
【図３】硝酸浸漬における重量減少量を示すグラフであ
る。FIG. 3 is a graph showing the amount of weight loss in nitric acid immersion.
１ 回転軸 ２ 電極 ３ カバー ４ パッド ５ 電源 1 rotating shaft 2 electrode 3 cover 4 pad 5 power supply
フロントページの続き (51)Int.Cl.7 識別記号 ＦＩ Ｃ２５Ｆ 3/24 Ｃ２５Ｆ 3/24 (56)参考文献 特開 平２−9532（ＪＰ，Ａ) 特開 昭60−217018（ＪＰ，Ａ) 特開 昭64−4500（ＪＰ，Ａ) 特開 平２−237721（ＪＰ，Ａ) 特開 平２−256419（ＪＰ，Ａ) 特開 昭62−228364（ＪＰ，Ａ) 特開 平１−127222（ＪＰ，Ａ) 特開 平１−246400（ＪＰ，Ａ) 特開 平３−251317（ＪＰ，Ａ) 特開 昭62−224523（ＪＰ，Ａ) 特開 平１−222824（ＪＰ，Ａ) 田島栄編著、「新版表面処理ハンドブ ック」、新版第３刷、産業図書株式会社 昭和49年８月10日、ｐ．384−388 (58)調査した分野(Int.Cl.7，ＤＢ名) B23H 3/02,3/08 B23H 5/00,5/08 C25F 3/16,3/24 Continuation of the front page (51) Int.Cl. 7 identification code FI C25F 3/24 C25F 3/24 (56) References JP-A-2-9532 (JP, A) JP-A-60-217018 (JP, A) JP-A-64-4500 (JP, A) JP-A-2-237721 (JP, A) JP-A-2-256419 (JP, A) JP-A-62-228364 (JP, A) JP-A-1-127222 (JP, A) JP-A-1-246400 (JP, A) JP-A-3-251317 (JP, A) JP-A-62-2224523 (JP, A) JP-A-1-222824 (JP, A) Tajima Sakae ed., “New Edition Surface Treatment Handbook”, 3rd edition, Sangyo Tosho Co., Ltd., August 10, 1974, p. 384-388 (58) Field surveyed (Int.Cl. 7 , DB name) B23H 3 / 02,3 / 08 B23H 5 / 00,5 / 08 C25F 3 / 16,3 / 24
Claims (1)
給しながら電解研磨を行い、同時的に研磨材を用いて機
械研磨を行う複合電解研磨方法において、先端部に電極
及びこの電極を覆い、被研磨物と対向する面が平坦面で
ある不織布製のパッドを固定した導電性の中空の回転軸
を回転しつつ、該中空の回転軸を通じて前記パッドにリ
ン酸塩及び硫酸塩を重量比２：１で溶解した水溶液から
なる電解液を供給すると共に、前記電解液及び電極とス
テンレス鋼表面とにデューティ比９５：５にて正負が交
互反転する電流密度２０〜３０Ａ／ｄｍ 2 の電流を供給
することを特徴とする複合電解研磨方法。1. A composite electrolytic polishing method in which electrolytic polishing is performed on a stainless steel surface while supplying an electrolytic solution, and mechanical polishing is simultaneously performed using an abrasive. while rotating the rotary shaft of the hollow HiKen grinding material facing the face to fix the non-woven pad is a flat surface conductive, weight phosphate and sulfate in the pad through the hollow rotary shaft the ratio 2: supplies the electrolytic solution composed of an aqueous solution of 1, the electrolyte and the electrode and the stainless steel surface and the duty ratio of 95: current density 20~30A positive and negative at 5 to exchange <br/> each other inverted composite electrolytic polishing method characterized by supplying / dm 2 of current.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP4234856A JP3044249B2 (en) | 1992-09-02 | 1992-09-02 | Composite electrolytic polishing method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP4234856A JP3044249B2 (en) | 1992-09-02 | 1992-09-02 | Composite electrolytic polishing method |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH0679533A JPH0679533A (en) | 1994-03-22 |
| JP3044249B2 true JP3044249B2 (en) | 2000-05-22 |
Family
ID=16977426
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP4234856A Expired - Fee Related JP3044249B2 (en) | 1992-09-02 | 1992-09-02 | Composite electrolytic polishing method |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP3044249B2 (en) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6811680B2 (en) * | 2001-03-14 | 2004-11-02 | Applied Materials Inc. | Planarization of substrates using electrochemical mechanical polishing |
| JP2003311540A (en) * | 2002-04-30 | 2003-11-05 | Sony Corp | Electrolytic polishing liquid, electrolytic polishing method and method for producing semiconductor device |
| JP5097331B2 (en) * | 2004-07-27 | 2012-12-12 | 株式会社アルバック | Surface treatment method |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS62228364A (en) * | 1986-03-28 | 1987-10-07 | Agency Of Ind Science & Technol | Line system continuous feeding specular face polishing device |
| JPH0785848B2 (en) * | 1987-11-10 | 1995-09-20 | 株式会社中央製作所 | Electrolytic deburring method |
| JP2673695B2 (en) * | 1988-03-25 | 1997-11-05 | セイコーインスツルメンツ株式会社 | Electrolytic polishing method for platinum probe |
| JP2647529B2 (en) * | 1990-02-28 | 1997-08-27 | 住友石炭鉱業株式会社 | Electrolytic grinding method and apparatus |
-
1992
- 1992-09-02 JP JP4234856A patent/JP3044249B2/en not_active Expired - Fee Related
Non-Patent Citations (1)
| Title |
|---|
| 田島栄編著、「新版表面処理ハンドブック」、新版第３刷、産業図書株式会社 昭和４９年８月１０日、ｐ．３８４−３８８ |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0679533A (en) | 1994-03-22 |
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