JP2969822B2 - Semiconductor device manufacturing management system - Google Patents
Semiconductor device manufacturing management systemInfo
- Publication number
- JP2969822B2 JP2969822B2 JP17230390A JP17230390A JP2969822B2 JP 2969822 B2 JP2969822 B2 JP 2969822B2 JP 17230390 A JP17230390 A JP 17230390A JP 17230390 A JP17230390 A JP 17230390A JP 2969822 B2 JP2969822 B2 JP 2969822B2
- Authority
- JP
- Japan
- Prior art keywords
- defective
- chip
- semiconductor device
- information
- wafer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Landscapes
- Testing Of Individual Semiconductor Devices (AREA)
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
Description
【発明の詳細な説明】 [産業上の利用分野] 本発明は半導体装置の製造プロセス内の製造管理シス
テムに関し、特に高品質な半導体装置の製造を実現する
システムに関する。Description: BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a manufacturing management system in a semiconductor device manufacturing process, and more particularly to a system for realizing high-quality semiconductor device manufacturing.
[従来の技術] 従来、半導体装置の製造プロセスにおいては、拡散工
程中で発生するゴミ付着,マスクキズ,フォトレジスト
の、パターン欠陥等の不良に関する情報はウェハ単位で
採取され、ウェハごとの良品・不良品判定を行った後に
廃棄されており、ウェハ内のチップ毎に関する情報の蓄
積及びこれに基づく検査はされていなかった。2. Description of the Related Art Conventionally, in a semiconductor device manufacturing process, information on defects such as dust adhesion, mask scratches, and photoresist pattern defects generated in a diffusion process is collected in wafer units, and non-defective / non-defective products for each wafer. It was discarded after a non-defective judgment was made, and no information was accumulated for each chip in the wafer and no inspection based on this was performed.
[発明が解決しようとする課題] この従来のシステムでは、拡散工程中で発生する各種
不良に関する情報は得られても、これを最終の検査工程
で有効に利用していないことから必ずしも十分な不良判
定ができず、不良チップが不良として除去されない場合
が生じて、市場へ出荷された後に半導体装置の品質低下
の原因となってしまうという問題があった。[Problems to be Solved by the Invention] In this conventional system, even if information on various defects generated in the diffusion process is obtained, it is not necessarily used effectively in the final inspection process, so that a sufficient defect is not necessarily obtained. There is a case where the determination cannot be made and the defective chip is not removed as a defect, which causes a deterioration in the quality of the semiconductor device after being shipped to the market.
[課題を解決するための手段] 本願発明の第1の要旨は複数のチップに相当するウエ
ハ上の複数の領域に所定の処理を実施する半導体装置の
ウエハ製造工程で発生する不良に関する情報をウエハお
よびチップ位置情報と関連付けて保存し、前記チップ毎
の電気的特性試験で良品と判定された前記チップに対し
前記不良に関する情報に基づいて前記チップか良品が不
良品かを判定することであり、本願発明の第2の要旨は
複数のチップに相当するウエハ上の複数の領域に所定の
処理を実施する半導体装置製造のウエハ製造工程で発生
するゴミ付着情報をウェハにおけるチップ位置情報と関
連付けて保存し、前記チップ毎の電気的特性試験で良品
と判定された前記チップに対し前記ゴミ付着情報に基づ
いて前記チップが良品であるか不良品であるかを判定す
ることことである。[Means for Solving the Problems] A first gist of the present invention is to provide information relating to a defect generated in a wafer manufacturing process of a semiconductor device for performing a predetermined process on a plurality of regions on a wafer corresponding to a plurality of chips. And save in association with chip position information, to determine whether the chip or non-defective is defective based on the information regarding the defect for the chip determined to be non-defective in the electrical characteristics test for each chip, A second gist of the present invention resides in that dust adhesion information generated in a wafer manufacturing process of semiconductor device manufacturing for performing a predetermined process on a plurality of regions on a wafer corresponding to a plurality of chips is stored in association with chip position information on the wafer. The chip determined to be non-defective in the electrical characteristic test for each chip is determined to be non-defective or defective based on the dust adhesion information. It is to determine whether or not.
すなわち、本発明は、途中工程ごとに採取した不良に
関する情報を集中管理し、ウェハ内に存在する不良チッ
プ情報、不良内容情報等を各検査工程で採取して蓄積
し、最終的にチップ1つ1つの良品・不良品情報と管理
統合し、従来の検査工程では除去されなかった不良チッ
プを不良として検査工程で除くことができるような情報
ネットワークを備えている。In other words, the present invention centrally manages information on defects collected for each process, collects and stores defective chip information, defect content information, and the like existing in a wafer in each inspection process, and finally collects one chip. It is provided with an information network that manages and integrates information on one good product / defective product and that can remove defective chips that were not removed in the conventional inspection process as defects in the inspection process.
[実施例] 次に本発明を実施例に基づいて具体的に説明する。EXAMPLES Next, the present invention will be specifically described based on examples.
第1図は本発明の一実施例に係る半導体装置の製造フ
ローを示すブロック図である。まず、パタン設計された
半導体ウェハは酸化,フォトレジスト,拡散といった各
製造工程を経た後、電極形成工程で所定の電極が形成さ
れてP/Wチェックと呼ばれるテスタによる電気的特性チ
ェックにより、良品・不良品判定がなされる。ここで、
本実施例の管理システムでは、パタン設計時に決められ
たチップサイズ,ウェハ内チップ位置を初期情報として
情報ネットワークにもち、更に、製造工程が酸化,フォ
トレジスト,拡散とすすむにつれて発生する情報i(i
=1,2,3,・・・)にキズ不良,フォトレジスト不良,ゴ
ミ付着等の不良に関する情報をウェハ内のチップ位置及
び数とともに情報ネットワークに順次登録し、1チップ
毎の工程別データとして蓄積する。そして、情報ネット
ワークに登録された初期情報及び工程別情報を統合し、
P/Wチェック工程で電気的特性チェックで不良と認識さ
れないチップについての更なる良品・不良品判定を、情
報ネットワークから送り込んだ不良に関する情報に基づ
いて行い、良品のみを次の組立工程に供給するようプロ
グラムしてある。従って、組立工程にはこのP/Wチェッ
クで良品と判定された高品質なチップのみが投入され、
この組立工程で発生した不良チップは選別工程で除かれ
た後、最終的に高品質なチップのみが出荷される。FIG. 1 is a block diagram showing a manufacturing flow of a semiconductor device according to one embodiment of the present invention. First, a semiconductor wafer with a designed pattern undergoes various manufacturing processes such as oxidation, photoresist, and diffusion, and then a predetermined electrode is formed in an electrode forming process. A defective product is determined. here,
In the management system of this embodiment, a chip size and a chip position in a wafer determined at the time of pattern design are used as initial information in an information network, and information i (i) generated as the manufacturing process proceeds with oxidation, photoresist, and diffusion.
= 1, 2, 3, ...), information on defects such as scratch defects, photoresist defects, dust adhesion, etc. is sequentially registered in the information network along with the chip position and number in the wafer, and as process-specific data for each chip accumulate. Then, integrate the initial information and process-specific information registered in the information network,
In the P / W check process, further non-defective / non-defective judgment of chips that are not recognized as defective in the electrical characteristics check is performed based on the information on defects sent from the information network, and only non-defective products are supplied to the next assembly process It is programmed as follows. Therefore, in the assembly process, only high-quality chips determined to be non-defective by this P / W check are put in,
After the defective chips generated in the assembling process are removed in the sorting process, only high-quality chips are finally shipped.
第2図は本発明の他の一実施例に係る半導体装置の製
造フローを示すブロック図である。まず、パタン設計さ
れた半導体ウェハは酸化,フォトレジスト,拡散といっ
た各製造工程を何度か繰り返した後、P/Wチェックと呼
ばれるテクタによる電気的特性チェックにより、良品・
不良品判定がなされる。FIG. 2 is a block diagram showing a manufacturing flow of a semiconductor device according to another embodiment of the present invention. First, a semiconductor wafer with a designed pattern is manufactured by repeating the manufacturing process such as oxidation, photoresist, and diffusion several times, and then checking the electrical characteristics using a technician called a P / W check.
A defective product is determined.
本実施例の管理システムでは、パタン設計時に決めら
れたチップサイズ,ウェハ内チップ位置を初期情報とし
てもち、製造工程が酸化,フォトレジスト,拡散とすす
むにつれて各工程でゴミ検出装置により検出されるゴミ
付着の情報i(i=1,2,3,・・・)をウェハ内のチップ
位置及び数とともに順次登録し、1チップ毎の工程別デ
ータとして蓄積する。このゴミ付着に関する情報をゴミ
付着に関する設計基準に基づき良品・不良品判定を行
い、電気的特性チェックで不良と認識されないチップに
ついての良品・不良品チップ情報をP/Wチェック時に使
用するプローバに送り込む。プローバはP/W時に電気的
特性チェック結果とゴミ検出装置より得た情報を照合し
て総合し、不良と認識されるチップをスクラッチし、良
品のみを次の組立工程に供給する。従って、組立工程に
はこのP/Wチェック時に総合して良品と認められた高品
質なチップのみが投入され、選別工程で組立工程で発生
した不良のチップが除かれた後、最終的に高品質なチッ
プのみが出荷される。In the management system of this embodiment, a chip size and a chip position in a wafer determined at the time of pattern design are used as initial information, and dust is detected by a dust detection device in each step as the manufacturing process proceeds with oxidation, photoresist, and diffusion. The information of adhesion i (i = 1, 2, 3,...) Is sequentially registered together with the chip position and the number in the wafer, and stored as process-specific data for each chip. Based on the dust-related information, the non-defective / defective products are judged based on the dust-related design criteria, and non-defective / defective chip information on chips that are not recognized as defective in the electrical characteristics check is sent to the prober used for P / W check. . At the time of P / W, the prober checks and integrates the results of the electrical characteristics check with the information obtained from the dust detection device, scratches the chip recognized as defective, and supplies only a good product to the next assembly process. Therefore, in the assembly process, only high-quality chips that have been recognized as good products in the P / W check are put into the assembly process. Only quality chips are shipped.
[発明の効果] 以上説明したように、本発明により最終的な出荷品質
が向上し、出荷品の市場での不具合発生を防止できるほ
か、製造工程の比較的初期の段階で不良品を除くことが
できるため、無駄な費用が発生せず、半導体製造コスト
を下げることができるという効果を有する。[Effects of the Invention] As described above, the present invention can improve the final shipping quality, prevent the occurrence of defects in the market of shipped products, and eliminate defective products at a relatively early stage of the manufacturing process. Therefore, there is an effect that unnecessary costs are not generated and semiconductor manufacturing costs can be reduced.
第1図は本発明の一実施例に係る半導体装置の製造フロ
ーを示すブロック図、第2図は本発明の他の一実施例に
係る半導体装置の製造フローを示すブロック図である。FIG. 1 is a block diagram showing a manufacturing flow of a semiconductor device according to one embodiment of the present invention, and FIG. 2 is a block diagram showing a manufacturing flow of a semiconductor device according to another embodiment of the present invention.
Claims (2)
領域に所定の処理を実施する半導体装置のウエハ製造工
程で発生する不良に関する情報をウエハおよびチップ位
置情報と関連付けて保存し、前記チップ毎の電気的特性
試験で良品と判定された前記チップに対し前記不良に関
する情報に基づいて前記チップが良品か不良品かを判定
することを特徴とする半導体装置の製造管理システム。A semiconductor device for performing a predetermined process on a plurality of regions on a wafer corresponding to a plurality of chips; information relating to a defect occurring in a wafer manufacturing process of the semiconductor device; A semiconductor device manufacturing management system comprising: determining whether a chip is a non-defective product or a non-defective product based on information on the defect with respect to the chip determined to be non-defective in each electrical characteristic test.
領域に所定の処理を実施する半導体装置製造のウエハ製
造工程で発生するゴミ付着情報をウェハにおけるチップ
位置情報と関連付けて保存し、前記チップ毎の電気的特
性試験で良品と判定された前記チップに対し前記ゴミ付
着情報に基づいて前記チップが良品であるか不良品であ
るかを判定することを特徴とする半導体装置の製造管理
システム。2. A method of manufacturing a semiconductor device, comprising: performing a predetermined process on a plurality of regions on a wafer corresponding to a plurality of chips; storing dust adhesion information generated in a wafer manufacturing process in association with chip position information on the wafer; A semiconductor device manufacturing management system for determining whether the chip is a non-defective product or a defective product based on the dust adhesion information for the chip determined to be non-defective in an electrical characteristic test for each chip. .
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP17230390A JP2969822B2 (en) | 1990-06-28 | 1990-06-28 | Semiconductor device manufacturing management system |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP17230390A JP2969822B2 (en) | 1990-06-28 | 1990-06-28 | Semiconductor device manufacturing management system |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH0461251A JPH0461251A (en) | 1992-02-27 |
JP2969822B2 true JP2969822B2 (en) | 1999-11-02 |
Family
ID=15939426
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP17230390A Expired - Fee Related JP2969822B2 (en) | 1990-06-28 | 1990-06-28 | Semiconductor device manufacturing management system |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP2969822B2 (en) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN104777415A (en) * | 2015-04-17 | 2015-07-15 | 重庆微标科技有限公司 | Manufacturing process of automatic train identification system host |
-
1990
- 1990-06-28 JP JP17230390A patent/JP2969822B2/en not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
JPH0461251A (en) | 1992-02-27 |
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Legal Events
Date | Code | Title | Description |
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LAPS | Cancellation because of no payment of annual fees |