JP2873130B2 - Package for storing semiconductor elements - Google Patents

Package for storing semiconductor elements

Info

Publication number
JP2873130B2
JP2873130B2 JP4160589A JP16058992A JP2873130B2 JP 2873130 B2 JP2873130 B2 JP 2873130B2 JP 4160589 A JP4160589 A JP 4160589A JP 16058992 A JP16058992 A JP 16058992A JP 2873130 B2 JP2873130 B2 JP 2873130B2
Authority
JP
Japan
Prior art keywords
lid
insulating base
semiconductor element
external lead
package
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP4160589A
Other languages
Japanese (ja)
Other versions
JPH065723A (en
Inventor
弘二 井苅
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kyocera Corp
Original Assignee
Kyocera Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kyocera Corp filed Critical Kyocera Corp
Priority to JP4160589A priority Critical patent/JP2873130B2/en
Publication of JPH065723A publication Critical patent/JPH065723A/en
Application granted granted Critical
Publication of JP2873130B2 publication Critical patent/JP2873130B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/4805Shape
    • H01L2224/4809Loop shape
    • H01L2224/48091Arched
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/15Details of package parts other than the semiconductor or other solid state devices to be connected
    • H01L2924/161Cap
    • H01L2924/1615Shape
    • H01L2924/16152Cap comprising a cavity for hosting the device, e.g. U-shaped cap

Landscapes

  • Lead Frames For Integrated Circuits (AREA)

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【産業上の利用分野】本発明は、半導体素子を収容する
ための半導体素子収納用パッケージに関し、特にガラス
熔着によってパッケージの封止を行うガラス封止型半導
体素子収納用パッケージの改良に関するものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a package for accommodating a semiconductor element for accommodating a semiconductor element, and more particularly to an improvement in a glass-encapsulated semiconductor element accommodating package for sealing a package by glass welding. is there.

【0002】[0002]

【従来の技術】従来、半導体素子、特に半導体集積回路
素子を収容するための半導体素子収納用パッケージは図
3及び図4に示すように、アルミナセラミックス等の電
気絶縁材料から成り、中央部に半導体素子を収容する空
所を形成するための凹部を有し、上面に封止用の低融点
ガラス層22が被着された絶縁基体21と、同じくアルミナ
セラミックス等の電気絶縁材料から成り、中央部に半導
体素子を収容する空所を形成するための凹部を有し、下
面に封止用の低融点ガラス層24が被着された蓋体23と、
内部に収容する半導体素子25を外部の電気回路に電気的
に接続するための外部リード端子26とから構成されてお
り、絶縁基体21の上面に外部リード端子26を載置させる
とともに予め被着させておいた封止用の低融点ガラス層
22を溶融させることによって外部リード端子26を絶縁基
体21に仮止めし、次に前記絶縁基体21の凹部に半導体素
子25を取着固定するとともに該半導体素子25の各電極を
ボンディングワイヤ27を介して外部リード端子26に接続
し、しかる後、絶縁基体21と蓋体23とをその相対向する
各々の主面に被着させておいた封止用の低融点ガラス層
22、24を溶融一体化させ、絶縁基体21と蓋体23とから成
る容器を気密に封止することによって製品としての半導
体装置となる。
2. Description of the Related Art Conventionally, as shown in FIGS. 3 and 4, a semiconductor element housing package for housing a semiconductor element, especially a semiconductor integrated circuit element, is made of an electrically insulating material such as alumina ceramics, and has a semiconductor in the center. An insulating base 21 having a concave portion for forming a space for accommodating the element and having an upper surface covered with a low-melting glass layer 22 for sealing, and an electric insulating material also made of alumina ceramic or the like. A lid 23 having a concave portion for forming a space for accommodating the semiconductor element, and a lower melting point glass layer 24 for sealing is adhered to the lower surface,
An external lead terminal 26 for electrically connecting the semiconductor element 25 housed therein to an external electric circuit.The external lead terminal 26 is placed on the upper surface of the insulating base 21 and is previously attached. Low melting glass layer for sealing
The external lead terminals 26 are temporarily fixed to the insulating base 21 by melting the 22, and then the semiconductor element 25 is fixedly attached to the concave portion of the insulating base 21, and each electrode of the semiconductor element 25 is connected via a bonding wire 27. To the external lead terminals 26, and thereafter, a low-melting glass layer for sealing in which the insulating substrate 21 and the lid 23 are adhered to the respective main surfaces facing each other.
The semiconductor device as a product is obtained by melting and integrating the components 22 and 24 and hermetically sealing a container including the insulating base 21 and the lid 23.

【0003】[0003]

【発明が解決しようとする課題】しかしながら、近時、
ICカード等、情報処理装置は薄型化が急激に進み、該
情報処理装置に搭載される半導体装置もその厚みを薄く
したものが要求されるようになり、同時に半導体装置を
構成する半導体素子収納用パッケージもその絶縁基体及
び蓋体の厚みを各々0.2mm 程度としたり、封止用の低融
点ガラス層の厚みを0.2mm 程度としたりしてパッケージ
全体の厚みを薄型化することが要求されるようになって
きた。
However, recently,
Information processing devices such as IC cards are rapidly becoming thinner, and semiconductor devices mounted on the information processing devices are required to have a reduced thickness. It is also required that the thickness of the insulating base and the lid be about 0.2 mm each, and the thickness of the low-melting glass layer for sealing is about 0.2 mm to reduce the thickness of the entire package. It has become

【0004】そこで上述した従来の半導体素子収納用パ
ッケージの絶縁基体及び蓋体の厚みを0.2mm 程度とし、
パッケージ全体の厚みを薄くした場合、パッケージの絶
縁基体及び蓋体は通常、アルミナセラミックス等の電気
絶縁材料より成り、該アルミナセラミックスは脆弱で機
械的強度が弱いことから絶縁基体と蓋体とから成る容器
内部に半導体素子を気密に収容した後、絶縁基体もしく
は蓋体に外力が印加されると該外力よって絶縁基体もし
くは蓋体が容易に破損し、その結果、容器内部の気密が
破れ、内部に収容する半導体素子を長期間にわたり正
常、且つ安定に作動させることができないという欠点を
招来した。
Therefore, the thickness of the insulating base and the lid of the above-mentioned conventional package for housing a semiconductor element is set to about 0.2 mm,
When the thickness of the entire package is reduced, the insulating base and the lid of the package are usually made of an electrically insulating material such as alumina ceramics, and the alumina ceramics are composed of an insulating base and a lid because they are fragile and have low mechanical strength. After the semiconductor element is hermetically housed inside the container, when an external force is applied to the insulating base or the lid, the insulating base or the lid is easily damaged by the external force, and as a result, the airtightness inside the container is broken and the inside of the container is broken. There is a disadvantage that the semiconductor element to be housed cannot be operated normally and stably for a long period of time.

【0005】また封止用の低融点ガラス層の厚みを0.2m
m 程度としてパッケージ全体の厚みを薄くした場合、外
部リード端子と絶縁基体及び蓋体との間隔が各々、0.05
mm程度の薄いものになるとともに間に配される低融点ガ
ラスの量が少なくなり、その結果、絶縁基体と蓋体とか
ら成る容器の気密封止の信頼性が大きく劣化し、容器内
部に収容する半導体素子を長期間にわたり正常、且つ安
定に作動させることができないという欠点も招来した。
The thickness of the low melting point glass layer for sealing is 0.2 m.
When the thickness of the entire package is reduced to about m, the spacing between the external lead terminals and the insulating base and lid is 0.05
mm and the amount of low-melting glass placed between them is reduced, resulting in a significant deterioration in the reliability of hermetic sealing of the container consisting of the insulating substrate and the lid, and the container is housed inside the container. However, there is also a disadvantage that the semiconductor device cannot be operated normally and stably for a long period of time.

【0006】[0006]

【発明の目的】本発明は上記欠点に鑑み案出されたもの
で、その目的は内部に収容する半導体素子を長期間にわ
たり正常、且つ安定に作動させることができる薄型の半
導体素子収納用パッケージを提供することにある。
SUMMARY OF THE INVENTION The present invention has been made in view of the above-mentioned drawbacks, and an object of the present invention is to provide a thin semiconductor device housing package which can normally and stably operate a semiconductor device housed therein for a long period of time. To provide.

【0007】[0007]

【課題を解決するための手段】本発明は絶縁基体と蓋体
との間に外部リード端子を挟持し、絶縁基体と蓋体と外
部リード端子とを封止用ガラス部材で接合することによ
って内部に半導体素子を気密に収容する半導体素子収納
用パッケージであって、前記絶縁基体及び蓋体の相対向
する主面で、且つ外部リード端子が対接する領域に凹部
を設けたことを特徴とするものである。
According to the present invention, an external lead terminal is sandwiched between an insulating base and a lid, and the insulating base, the lid and the external lead terminal are joined by a sealing glass member. A package for airtightly housing a semiconductor element, characterized in that a concave portion is provided in a main surface of the insulating base and the lid facing each other and in a region where an external lead terminal is in contact with the insulating substrate. It is.

【0008】[0008]

【実施例】次に本発明を添付図面に基づき詳細に説明す
る。図1 及び図2 は本発明の半導体素子収納用パッケー
ジの一実施例を示し。1 は絶縁基体、2 は蓋体である。
この絶縁基体1 と蓋体2 とで半導体素子3 を収容する容
器を構成する。
BRIEF DESCRIPTION OF THE DRAWINGS FIG. 1 and 2 show one embodiment of the package for housing a semiconductor element of the present invention. 1 is an insulating base, 2 is a lid.
The insulating base 1 and the lid 2 constitute a container for housing the semiconductor element 3.

【0009】前記絶縁基体1及び蓋体2 にはそれぞれの
中央部に半導体素子3 を収容する空所を形成するための
凹部が設けてあり、絶縁基体1 の凹部1a底面には半導体
素子3 がガラス、樹脂、ロウ材等の接着剤を介して接着
固定される。
The insulating base 1 and the lid 2 are each provided with a concave portion for forming a space for accommodating the semiconductor element 3 at the center thereof, and the semiconductor element 3 is formed on the bottom surface of the concave portion 1a of the insulating base 1. It is bonded and fixed via an adhesive such as glass, resin, or brazing material.

【0010】前記絶縁基体1 及び蓋体2 はアルミナセラ
ミックス等の電気絶縁材料から成り、例えばアルミナ(A
l 2 O 3 ) 、シリカ(SiO2 ) 、カルシア(CaO) 、マグネ
シア(MgO) 等に適当な有機溶剤、溶媒を添加混合した原
料粉末を図1 及び図2 に示す絶縁基体1 及び蓋体2 の形
状に対応したプレス型内に充填させるとともに一定圧力
を印加して成形し、しかる後、前記成形品を約1500℃の
温度で焼成することによって製作される。
The insulating base 1 and the lid 2 are made of an electrically insulating material such as alumina ceramics.
l 2 O 3 ), silica (SiO 2 ), calcia (CaO), magnesia (MgO), and the like, and an appropriate organic solvent and a solvent. The raw material powder was mixed with the insulating base 1 and the lid 2 shown in FIGS. 1 and 2. It is manufactured by filling in a press die corresponding to the above shape and applying a constant pressure to form the molded product, and then firing the molded product at a temperature of about 1500 ° C.

【0011】前記絶縁基体1 及び蓋体2 にはまたその相
対向する各々の主面に封止用の低融点ガラス層4 、5 が
予め厚さ0.1mm 程度に薄く被着形成されており、該絶縁
基体1 及び蓋体2 の各々の主面に被着されている封止用
の低融点ガラス層4 、5 を加熱溶融させ、一体化させる
ことにより絶縁基体1 と蓋体2 とから成る容器内部に半
導体素子3 を気密に収容する。
On the insulating base 1 and the lid 2, low-melting-point glass layers 4 and 5 for sealing are previously formed on the opposing main surfaces so as to have a thickness of about 0.1 mm, respectively. The insulating base 1 and the lid 2 are formed by heating and melting the sealing low-melting glass layers 4 and 5 adhered to the respective main surfaces of the insulating base 1 and the lid 2 and integrating them. The semiconductor element 3 is hermetically housed inside the container.

【0012】前記絶縁基体1 及び蓋体2 の相対向する主
面に被着される封止用の低融点ガラス層4,、5 は例え
ば、酸化鉛75.0重量%、酸化チタン9.0 重量%、酸化ホ
ウ素7.5 重量%、酸化亜鉛2.0 重量%等のガラスから成
り、該ガラス粉末に適当な有機溶剤、溶媒を添加混合し
て得たガラスペーストを従来周知のスクリーン印刷等の
厚膜手法を採用することにより絶縁基体1 及び蓋体2の
相対向する各々の主面に厚さ0.1mm 程度に被着される。
The sealing low-melting glass layers 4, 5 attached to the opposing main surfaces of the insulating substrate 1 and the lid 2 are, for example, 75.0% by weight of lead oxide, 9.0% by weight of titanium oxide, A glass paste obtained by adding a suitable organic solvent and a solvent to the glass powder and mixing the glass powder with a glass paste containing 7.5% by weight of boron and 2.0% by weight of zinc oxide by a conventionally known thick film method such as screen printing. Thereby, the insulating substrate 1 and the lid 2 are attached to the opposing main surfaces to a thickness of about 0.1 mm.

【0013】尚、前記封止用の低融点ガラス層4 、5 は
その熱膨張係数を絶縁基体1 及び蓋体2 の熱膨張係数に
近似した値にしておくと絶縁基体1 と蓋体2 とを封止用
低融点ガラス層4 、5 を介して接合させ、容器を気密に
封止する際、絶縁基体1 及び蓋体2 と封止用低融点ガラ
ス層4 、5 との間には両者の熱膨張係数の相違に起因す
る熱応力が発生することは殆どなく、絶縁基体1 と蓋体
2 とを封止用低融点ガラス層4 、5 を介し強固に接合す
ることが可能となる。従って、封止用低融点ガラス層4
、5 はその熱膨張係数を絶縁基体1 及び蓋体2 の熱膨
張係数に合わせておくことが好ましい。
If the thermal expansion coefficient of the low melting glass layers 4 and 5 for sealing is set to a value close to the thermal expansion coefficient of the insulating base 1 and the lid 2, the insulating base 1 and the lid 2 can be combined with each other. Are bonded via the low melting glass layers for sealing 4 and 5, and when the container is airtightly sealed, the insulating base 1 and the lid 2 and the low melting glass layers for sealing 4 and 5 are both present. Almost no thermal stress occurs due to the difference in thermal expansion coefficient between the insulating base 1 and the lid.
2 can be firmly joined via the low-melting glass layers 4 and 5 for sealing. Therefore, the low melting point glass layer 4 for sealing is used.
, 5 preferably have the same thermal expansion coefficient as that of the insulating base 1 and the lid 2.

【0014】また前記絶縁基体1 と蓋体2 との間には導
電性材料、例えばコバール金属(Fe-Ni-Co 合金) や42ア
ロイ(Fe-Ni合金) 等の金属から成る外部リード端子6 が
配されており、該外部リード端子6 は半導体素子3 の各
電極がボンディングワイヤ7を介して電気的に接続さ
れ、外部リード端子6 を外部電気回路に接続することに
よって半導体素子3 は外部電気回路と接続されることと
なる。
An external lead terminal 6 made of a conductive material, for example, a metal such as Kovar metal (Fe--Ni--Co alloy) or 42 alloy (Fe--Ni alloy) is provided between the insulating base 1 and the lid 2. The external lead terminal 6 is electrically connected to each electrode of the semiconductor element 3 via a bonding wire 7, and the external lead terminal 6 is connected to an external electric circuit, whereby the semiconductor element 3 is connected to an external electric circuit. It will be connected to the circuit.

【0015】前記外部リード端子6 は、絶縁基体1 と蓋
体2 とから成る容器を封止用の低融点ガラス層4 、5 を
溶融一体化させて気密封止する際に同時に絶縁基体1 と
蓋体2 との間に取着固定される。
The external lead terminals 6 are simultaneously sealed with the insulating base 1 when the container comprising the insulating base 1 and the lid 2 is hermetically sealed by melting and integrating the low-melting glass layers 4 and 5 for sealing. It is attached and fixed between the lid 2.

【0016】尚、前記外部リード端子6 はコバール金属
等のインゴット( 塊) を従来周知の圧延加工法及び打ち
抜き加工法等を採用し、所定の板状に成形することによ
って製作される。
The external lead terminals 6 are manufactured by shaping an ingot made of Kovar metal or the like into a predetermined plate shape by using a conventionally known rolling method, punching method, or the like.

【0017】また前記外部リード端子6 はその外表面に
ニッケル、金等の良導電性で、且つ耐蝕性に優れた金属
を1.0 乃至20.0μm の厚みにメッキにより層着させてお
くと外部リード端子6 の酸化腐食を有効に防止するとと
もに外部リード端子6 と外部電気回路との電気的導通を
良好となすことができる。従って、前記外部リード端子
6 はその外表面にニッケル、金等の良導電性で、且つ耐
蝕性に優れた金属を1.0 乃至20.0μm の厚みにメッキに
より層着させておくことが好ましい。
The external lead terminal 6 may be formed by plating a metal having good conductivity and excellent corrosion resistance, such as nickel or gold, to a thickness of 1.0 to 20.0 μm on its outer surface by plating. 6 can be effectively prevented, and good electrical continuity between the external lead terminal 6 and the external electric circuit can be achieved. Therefore, the external lead terminal
It is preferable that a metal 6 having good conductivity and excellent corrosion resistance, such as nickel or gold, be plated on the outer surface thereof to a thickness of 1.0 to 20.0 μm by plating.

【0018】かくしてこの半導体素子収納用パッケージ
によれば、絶縁基体1 の上面に設けた凹部1a底面に接着
剤を介して半導体素子3 を取着固定するとともに該半導
体素子3 の各電極をボンディングワイヤ7 により外部リ
ード端子6 に接続させ、しかる後、絶縁基体1 と蓋体2
とをその両者の相対向する主面に予め被着させておいた
封止用低融点ガラス層4 、5 を溶融一体化させることに
よって接合すると絶縁基体1 と蓋体2 とから成る容器内
部に半導体素子3 が気密に封止されて最終製品としての
半導体装置となる。
Thus, according to the package for accommodating the semiconductor element, the semiconductor element 3 is attached and fixed to the bottom surface of the concave portion 1a provided on the upper surface of the insulating base 1 via an adhesive, and each electrode of the semiconductor element 3 is connected to a bonding wire. 7 to connect to the external lead terminal 6, and then the insulating base 1 and lid 2
When the low melting glass layers 4 and 5 for sealing, which have been applied in advance on the main surfaces facing each other, are fused and integrated, the inside of the container consisting of the insulating base 1 and the lid 2 is joined. The semiconductor element 3 is hermetically sealed to provide a semiconductor device as a final product.

【0019】本発明の半導体素子収納用パッケージにお
いては絶縁基体1 及び蓋体2 の相対向する各々の主面で
外部リード端子6 が対接する領域に凹部を形成しておく
ことが重要である。
In the package for accommodating a semiconductor element of the present invention, it is important to form a recess in a region where the external lead terminals 6 are in contact with each other on the main surfaces of the insulating base 1 and the lid 2 facing each other.

【0020】そのため図2 に示す実施例では絶縁基体1
及び蓋体2 の相対向する各々の主面で外部リード端子6
が対接する領域に深さが0.03mm、幅及び長さが外部リー
ド端子6 より若干大きい形状の凹部1b、2bが形成されて
いる。
Therefore, in the embodiment shown in FIG.
And external lead terminals 6 on each of the opposing main surfaces of the lid 2.
The concave portions 1b and 2b each having a depth of 0.03 mm, a width and a length slightly larger than those of the external lead terminals 6 are formed in regions where the external lead terminals 6 are in contact with each other.

【0021】前記絶縁基体1 及び蓋体2 の相対向する各
々の主面に凹部1b、2bを形成しておくと絶縁基体1 と蓋
体2 との間に外部リード端子6 を挟み、絶縁基体1 と蓋
体2と外部リード端子6 とを封止用の低融点ガラス層4
、5 で接合させた場合、パッケージ全体の薄型化を図
るために封止用低融点ガラス層4 、5 の厚みを0.1mm 程
度に薄くしても外部リード端子6 と絶縁基体1 及び蓋体
2 との間隔は0.13mm程度の広いものとなり、その間に配
される封止用低融点ガラスの量を多いものとなすことが
できる。そのためこの半導体素子収納用パッケージによ
れば絶縁基体1 と蓋体2 とから成る容器の気密封止の信
頼性が大幅に向上し、容器内部に収容する半導体素子3
を長期間にわたり正常、且つ安定に作動させることが可
能となる。
When concave portions 1b and 2b are formed on the opposing main surfaces of the insulating base 1 and the lid 2, an external lead terminal 6 is sandwiched between the insulating base 1 and the lid 2, 1, a low-melting glass layer 4 for sealing the
, 5, the external lead terminals 6, the insulating base 1, and the lid are formed even if the thickness of the low melting glass layers 4, 5 for sealing is reduced to about 0.1 mm in order to reduce the thickness of the entire package.
The gap between the glass and the second glass is as large as about 0.13 mm, and the amount of the low-melting glass for sealing provided therebetween can be made large. Therefore, according to the semiconductor element storage package, the reliability of hermetic sealing of the container including the insulating base 1 and the lid 2 is greatly improved, and the semiconductor element 3 accommodated in the container is improved.
Can operate normally and stably over a long period of time.

【0022】また前記絶縁基体1 及び蓋体2 に設ける凹
部1b、2bは絶縁基体1 及び蓋体2 の一部に形成されるこ
とから絶縁基体1 及び蓋体2 の機械的強度が大幅に低下
することはない。従って、絶縁基体1 もしくは蓋体2 に
外力が印加されても該外力によって絶縁基体1 もしくは
蓋体2 が容易に破損することはなく、これによっても絶
縁基体1 と蓋体2 とから成る容器の気密封止の信頼性が
向上し、内部に収容する半導体素子3 を長期間にわたり
正常、且つ安定に作動させることができる。
Since the concave portions 1b and 2b provided in the insulating base 1 and the lid 2 are formed in a part of the insulating base 1 and the lid 2, the mechanical strength of the insulating base 1 and the lid 2 is greatly reduced. I will not do it. Therefore, even if an external force is applied to the insulating base 1 or the lid 2, the insulating base 1 or the lid 2 is not easily damaged by the external force. The reliability of hermetic sealing is improved, and the semiconductor element 3 housed therein can operate normally and stably for a long period of time.

【0023】尚、前記絶縁基体1 及び蓋体2 に設ける凹
部1b、2bはアルミナ等の原料粉末をプレス成形によって
形成し、絶縁基体1 及び蓋体2 を得る際に、予めプレス
型に突起を設けておくことによって絶縁基体1 及び蓋体
2 の所定位置に所定形状に形成される。
The recesses 1b and 2b provided on the insulating base 1 and the lid 2 are formed by pressing a raw material powder such as alumina by press molding. When the insulating base 1 and the lid 2 are obtained, projections are previously formed on a press die. By providing the insulating base 1 and the lid
2 is formed in a predetermined shape at a predetermined position.

【0024】また本発明は上述の実施例に限定されるも
のではなく、本発明の要旨を逸脱しない範囲であれば種
々の変更は可能である。
The present invention is not limited to the above-described embodiment, and various modifications can be made without departing from the gist of the present invention.

【0025】[0025]

【発明の効果】本発明は絶縁基体と蓋体との間に外部リ
ード端子を挟持し、絶縁基体と蓋体と外部リード端子と
を封止用ガラス部材で接合することによって内部に半導
体素子を気密に収容する半導体素子収納用パッケージで
あって、前記絶縁基体及び蓋体の相対向する主面で、且
つ外部リード端子が対接する領域に凹部を設けたことか
ら絶縁基体と蓋体との間に外部リード端子を挟み、絶縁
基体と蓋体と外部リード端子とを封止用の低融点ガラス
層で接合させる場合、パッケージ全体の薄型化を図るた
めに封止用低融点ガラス層の厚みを薄くしても外部リー
ド端子と絶縁基体及び蓋体との間に配される封止用低融
点ガラスの量は多くなり、これによって絶縁基体と蓋体
とから成る容器の気密封止の信頼性が大幅に向上し、容
器内部に収容する半導体素子を長期間にわたり正常、且
つ安定に作動させることが可能となる。
According to the present invention, a semiconductor element is internally formed by sandwiching an external lead terminal between an insulating base and a lid and bonding the insulating base, the lid and the external lead terminal with a sealing glass member. A package for hermetically housing a semiconductor element, wherein a concave portion is provided on a main surface of the insulating base and the lid facing each other and in a region where an external lead terminal is in contact with the package. When the external lead terminals are sandwiched between the insulating base and the lid and the external lead terminals are joined by a low-melting glass layer for sealing, the thickness of the low-melting glass layer for sealing is reduced in order to reduce the thickness of the entire package. Even when the thickness is reduced, the amount of the low-melting glass for sealing disposed between the external lead terminal and the insulating base and the lid increases, thereby improving the reliability of hermetic sealing of the container including the insulating base and the lid. Greatly improved and housed inside the container Normal conductive elements for a long period of time, it is possible to stably operate.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明の半導体素子収納用パッケージの一実施
例を示す縦断面図である。
FIG. 1 is a longitudinal sectional view showing an embodiment of a package for housing a semiconductor element according to the present invention.

【図2】図1に示すパッケージの外部リード端子側から
見た断面図である。
FIG. 2 is a cross-sectional view of the package shown in FIG. 1 as viewed from an external lead terminal side.

【図3】従来の半導体素子収納用パッケージの断面図で
ある。
FIG. 3 is a cross-sectional view of a conventional semiconductor element storage package.

【図4】図3に示すパッケージの外部リード端子側から
見た断面図である。
FIG. 4 is a cross-sectional view of the package shown in FIG. 3 as viewed from an external lead terminal side.

【符号の説明】[Explanation of symbols]

1・・・・・・・絶縁基体 1b・・・・・・絶縁基体に設けた凹部 2 ・・・・・・蓋体 2b・・・・・・蓋体に設けた凹部 3・・・・・・・半導体素子 4、5・・・・・封止用の低融点ガラス層 6・・・・・・・外部リード端子 DESCRIPTION OF SYMBOLS 1 ... Insulating base 1b ... Depression provided in insulating base 2 ... Lid 2b ... Depression provided in lid 3 ... ... Semiconductor element 4,5 ... Low melting glass layer for sealing 6 ... External lead terminal

Claims (1)

(57)【特許請求の範囲】(57) [Claims] 【請求項1】絶縁基体と蓋体との間に外部リード端子を
挟持し、絶縁基体と蓋体と外部リード端子とを封止用ガ
ラス部材で接合することによって内部に半導体素子を気
密に収容する半導体素子収納用パッケージであって、前
記絶縁基体及び蓋体の相対向する主面で、且つ外部リー
ド端子が対接する領域に凹部を設けたことを特徴とする
半導体素子収納用パッケージ。
An external lead terminal is sandwiched between an insulating base and a lid, and the semiconductor element is hermetically accommodated inside by bonding the insulating base, the lid and the external lead terminal with a sealing glass member. A package for semiconductor element storage, characterized in that a recess is provided in a region where opposing main surfaces of the insulating base and the lid and an external lead terminal are in contact with each other.
JP4160589A 1992-06-19 1992-06-19 Package for storing semiconductor elements Expired - Fee Related JP2873130B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP4160589A JP2873130B2 (en) 1992-06-19 1992-06-19 Package for storing semiconductor elements

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4160589A JP2873130B2 (en) 1992-06-19 1992-06-19 Package for storing semiconductor elements

Publications (2)

Publication Number Publication Date
JPH065723A JPH065723A (en) 1994-01-14
JP2873130B2 true JP2873130B2 (en) 1999-03-24

Family

ID=15718226

Family Applications (1)

Application Number Title Priority Date Filing Date
JP4160589A Expired - Fee Related JP2873130B2 (en) 1992-06-19 1992-06-19 Package for storing semiconductor elements

Country Status (1)

Country Link
JP (1) JP2873130B2 (en)

Also Published As

Publication number Publication date
JPH065723A (en) 1994-01-14

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