JP2868772B2 - Manufacturing method of polishing tape - Google Patents

Description

Description: TECHNICAL FIELD The present invention relates to a method for producing a polishing tape used for precise finish polishing.

[Problems to be solved by conventional technology and invention]

2. Description of the Related Art In recent years, a polishing tape used for polishing a surface of a floppy disk, a magnetic head, an end face of an optical fiber, a precision electronic component, or the like to a mirror finish with high precision has been known. This kind of polishing tape generally has a polishing layer formed by simply applying a coating material containing an abrasive and a binder component to a substrate and forming a film, but in the case of this polishing tape, the polishing target is Polishing debris generated from the body enters between the polishing tape and the object to be polished, and if polishing is continued in this state, the polishing debris may damage the surface of the object to be polished, or the polishing debris adheres to the polishing layer surface. Inconveniences such as a clogging state and a decrease in polishing ability have occurred.

In addition, as a polishing tape having grooves in the polishing layer, JP-A-62
-255069, when forming a polishing layer, Bernard due to "convection cell phenomenon" generated in the coating layer when applying a paint containing a large amount of inorganic components in the coating agent and drying the solvent Although there is one using the unevenness of the cell, this polishing tape is limited in shape to a substantially hexagonal flat surface because of the manufacturing method, and can always form a recess having the same pattern. In order to stabilize the pattern of the concave portions, it is difficult to control the solvent composition, the coating amount, the drying conditions, and the like of the coating material for forming the polishing layer in the production, and there is a problem that the production operation becomes very complicated. Was.

The present invention has been made to solve the above problems,
An object of the present invention is to provide a manufacturing method capable of stably and easily manufacturing a polishing tape capable of easily carrying out a precise polishing operation by accommodating polishing waste generated during polishing on a polishing tape side.

[Means for solving the problem]

The present invention provides: (1) After applying a polishing layer-containing coating material containing an abrasive to at least one surface of a film substrate, a coating layer in an uncured state is provided with a large number of concave portion forming projections. A shaping film consisting of a synthetic resin film or a composite film obtained by coating a synthetic resin on paper is laminated in a direction in which the projections face the coating layer, and then, after the coating layer is cured, the shaping film is formed. A method for producing a polishing tape, comprising removing a film.

(2) A shaping layer-forming paint containing an abrasive on the projection side of a shaping film composed of a synthetic resin film provided with a large number of recessed shaping protrusions or a composite film obtained by coating paper with a synthetic resin. After the application, the coating layer side in the uncured state is laminated facing the film substrate, and then, after the coating layer is cured, the shaping film is peeled off. Production method.

(3) The method for producing a polishing tape according to the above (1) or (2), wherein an ionizing radiation-curable paint is used as the paint for forming the polishing layer, and the coating layer is cured by irradiating with ionizing radiation.

(4) The method for producing a polishing tape according to the above (1), (2) or (3), wherein the shaping projections of the shaping film are formed by an embossing method.

 It is the gist.

Embodiment An embodiment of the present invention will be described below with reference to the drawings.

FIG. 1 shows an example of a polishing tape manufactured according to the present invention.
And a polishing layer 3 provided on one surface of the film substrate 2, and the polishing layer 3 is provided with a number of specific concave portions 4.

The film substrate 2 may be any material as long as it is conventionally used for a polishing tape. For example, a polyester film, a polyethylene film, a polypropylene film, a polyvinyl chloride film, a polyvinylidene chloride film, a polycarbonate film,
A polyamide (nylon) film, a polystyrene film, an ethylene-vinyl acetate copolymer film, or the like can be used. Among them, a polyester film is particularly preferable in consideration of workability, strength, cost, and the like. The surface of these films on which the polishing layer is to be formed can be subjected to a corona discharge treatment or an easy-adhesion primer treatment such as a polyester resin as required. Further, in addition to the above-described base material, paper, cloth, non-woven fabric, or the like which has been subjected to a sealing treatment as necessary may be used. The thickness of the film substrate 2 is 12 to 10
0 μm is preferred.

The concave portion 4 of the polishing layer 3 in the present invention has a function of accommodating and collecting polishing waste generated from the object to be polished during polishing. As shown in FIG. 3, the recess 4 has an opening width: a of 0.1 to 200 μm, a depth: b of 0.1 to 100 μm, and a pitch: c (FIG. The distance between the centers of adjacent recesses is 10-50
It is specified to be 0 μm, and the concave portion that does not satisfy these conditions at the same time has an insufficient capacity for accommodating the polishing debris. The recesses 4 are uniformly and regularly arranged on the entire surface of the polishing layer 3 as shown in FIG. 2, and the plane (horizontal cross section) shape is a quadrilateral, hexagon, circle, ellipse, or the like. The vertical cross section is inverted triangle, square, semicircle,
It has a shape such as a trapezoid.

The polishing layer 3 having the concave portions 4 as described above is composed of an abrasive and a binder component, and is provided on one side of the film substrate 2 or on both sides (not shown). The polishing agent is not particularly limited as long as it is a polishing agent used for performing precise polishing, and various polishing agents can be selected and used depending on the polishing application. For example, when polishing a material to be polished such as a carbide tool made of a high-hardness material, green silicon carbide (Si) is used as an abrasive.
C), diamond and the like are suitable. Similarly, white fused alumina (Al ₂ O ₃ ) is used for a material to be polished such as hard steel special steel and high-speed copper, and chromium oxide is used for a material to be polished made of a flexible material. (Cr ₂ O ₃ ) and iron oxide (Fe ₂ O ₃ ) in the case of final polishing of the magnetic head are suitable polishing agents. The particle size of the abrasive is preferably 0.1 to 20 μm. It is preferable that 100 to 1400 parts by weight of these abrasives are contained in the coating material for forming a polishing layer based on 100 parts by weight of the binder component.

The polishing layer forming paint used as a binder component of the polishing layer 3 is roughly classified into a solvent paint, a thermosetting paint,
Ionizing radiation-curable paints; As the solvent paint, as a vehicle, a cellulose derivative such as ethyl cellulose, nitrocellulose, ethyl hydroxyethyl cellulose, cellulose acetate butyrate, or cellulose acetate; an acrylic or methacrylic resin such as polystyrene or poly-α-methylstyrene;
Rosin, rosin modified maleic resin, rosin modified phenol resin, rosin ester resin such as polymerized rosin; polyvinyl acetate resin, cumarone resin, vinyl toluene resin,
Examples include those used by selecting one or two or more of vinyl chloride resin, polyester resin, polyurethane resin, butyral resin, and the like. In the case of this coating material, in order to obtain a polishing layer having appropriate strength and abrasion resistance. It is preferable to crosslink three-dimensionally between molecules. Examples of the thermosetting paint include epoxy, melamine, polyurethane, unsaturated polyester, and polysiloxane-based paints.

Ionizing radiation-curable coatings are preferred in that they have high physical properties such as abrasion resistance and heat resistance due to the high crosslink density of the cured product, and good productivity due to high curing speed. The ionizing radiation-curable paints include an electron beam-curable paint and an ultraviolet-curable paint, and the two are similar in composition except that the latter contains a photopolymerization initiator or a sensitizer. In general, as a film-forming component, the main component is a polymer, oligomer, monomer, or the like having a radical polymerizable dipolymer bond in its structure, and if necessary, a non-reactive polymer,
It contains an organic solvent, a wax, and other additives such as an antistatic agent. Specifically, a film forming component having an acrylate-based functional group, for example, a relatively low-molecular-weight polyester resin, polyether resin, acrylic resin, epoxy resin, urethane resin, alkyd resin,
Spiroacetal resins, polybutadiene resins, polythiol polyene resins, oligomers or prepolymers such as (meth) acrylates of polyfunctional compounds such as polyhydric alcohols, and ethyl (meth) acrylate as a reactive diluent;
Monofunctional monomers such as ethylhexyl (meth) acrylate, styrene, methylstyrene, N-vinyl hololidone and polyfunctional monomers, for example, trimethylolpropane tri (meth) acrylate, hexanediol di (meth) acrylate, tripropylene glycol di (Meth) acrylate, diethylene glycol di (meth) acrylate, pentaerythritol tri (meth)
Acrylate, dipentaerythritol hexa (meth)
It contains a relatively large amount of acrylate, neopentyl glycol di (meth) acrylate, and the like.

By using a polyfunctional (meth) acrylate-based ionizing radiation-curable paint as described above, ultimately,
A cured resin layer having excellent surface hardness, transparency, abrasion resistance, scratch resistance and the like can be formed. Further, when such a cured resin layer is required to have high flexibility and shrink resistance, an appropriate amount of a thermoplastic resin, such as a non-reactive acrylic resin or various waxes, is used in the curable paint. The addition can meet those requirements.

In addition, in order to make the above-mentioned curable paint into an ultraviolet-curable paint, acetophenones, benzophenone, Michler benzoyl hezoate, α-aminoxime ester, tetramethylthiuram monosulfide, thioxanthone, etc. are used as photopolymerizing agents. And n- as a photosensitizer
Butylamine, triethylamine, tri-n-butylphosphine and the like can be used as a mixture.

The thickness of the polishing layer 3 is appropriately set depending on the application, but is usually preferably about 0.5 to 500 μm. Incidentally, an antistatic agent or the like can be added to the polishing layer as needed.

Next, the manufacturing method of the present invention for manufacturing the polishing tape having the above-described configuration will be described in detail.

In the manufacturing method of the present invention, first, as shown in FIG. 4, at least one surface of the film substrate 2 is coated with a polishing layer forming paint 5 containing an abrasive to form a coating layer 6. For this coating, coating means such as blade coating, gravure coating, rod coating, knife coating, reverse roll coating, spray coating, offset gravure coating, and kiss coating are used.

Next, while the coating layer 6 is in an uncured state, a shaping film 7 separately prepared is laminated on the coating layer 6. The shaping film 7 is formed with a large number of shaping projections 8 for shaping the recess 4 described above.
The shaping projections 8 are superposed so as to face the surface of the coating layer 6, and are appropriately pressed and laminated as needed. Shaping film 7
As the base material, a film made of a synthetic resin such as polyvinyl chloride, polyethylene, polypropylene, or the like, a laminated film thereof, a composite film in which paper or the like is coated with the above synthetic resin, or the like can be used. In the case where these films themselves do not have releasability from the coating layer 7, the surface thereof can be subjected to a release treatment. The thickness of the shaping film 7 is set in consideration of the depth of the concave portion, the suitability for pressing / peeling to the coating layer, the film strength, and the like, and is preferably 12 to 100 μm.

In forming the shaping projections 8 of the shaping film 7, a conventionally well-known method can be employed. In particular, the embossing method is used in that a regular projection pattern can be arbitrarily and stably provided. preferable. In this case, the embossing is performed on the surface of the shaping film substrate by an embossing roll provided with shaping projections.

Next, the coating layer 6 is formed in a state where the shaping film 7 is laminated.
Is subjected to a hardening treatment for hardening. When the coating layer 6 is made of a thermosetting paint, it is subjected to a heat treatment to be cured, and when the coating layer 6 is made of an ionizing radiation-curable paint, the fifth coating is applied.
As shown in the figure, it is cured by irradiation with an ionizing radiation ray 9. The irradiation with the ionizing radiation 9 is performed from the side of the shaping film 7 or the side of the film substrate 2. This ionizing radiation irradiation is performed, for example, when the coating layer is cured by an electron beam, various types of electron such as Cockloft-Walton type, Bande graph type, Resonant transformation type, Insulating core transformer type, Linear type, Dynamitron type, High frequency type, etc. 50 to 1000 KeV, preferably 100 to 100, emitted from the linear accelerator
An electron beam having an energy of 300 KeV is used, and in the case of ultraviolet curing, ultraviolet rays emitted from a light source such as an ultra-high pressure mercury lamp, a low pressure mercury lamp, a carbon arc, a xenon arc, and a metal halide lamp are used.

After curing the coating layer 6, the shaping film 7 is peeled off (FIG. 6). By this peeling, a shape corresponding to the shaping projections 8 of the shaping film 7 is formed on the surface of the coating layer 7,
As a result, the polishing tape 1 in which the polishing layer 3 having the concave portion 4 is formed on the film substrate 2 is obtained.

In the manufacturing method of the present invention, instead of the above-described step of applying the coating material 5 for forming a polishing layer on the film substrate 2 and then laminating the coating material 5 for forming a polishing layer on the film substrate 2, the coating material 5 for forming a polishing layer is first used. Can be applied to the surface of the shaping projections 8, and then the uncured coating layer 6 can be laminated with the coating layer 6 facing the base film 7. After the coating layer curing step and the shaping film peeling step, the polishing layer 3 having the recess 4 becomes the film substrate 2
A polishing tape formed thereon can be obtained.

Next, the present invention will be described in more detail with reference to specific examples.

Example 1 Polyester film having a thickness of 25 μm (Toray T-60)
Was coated with a polyester-based two-component curable primer by a gravure coating method so as to have a dry thickness of 0.3 μm, and subjected to a release treatment. A polyester acrylate-based electron beam-curable paint containing 100% by weight of white fused alumina was applied to the treated surface by a roll coating method so that the wet thickness was 9 μm.

On the other hand, a 25 μm-thick polyester film (Toray: T
-60) On one side of the polypropylene film side of a laminated film obtained by laminating polypropylene to a thickness of 20 μm by EC coating method, the recess width is 10 μm, the plate depth (recess depth) is 15 μm, and the pitch of the recesses is 30 μm. The embossing roll is used, in which the shape of the shaping projections is rectangular and the cross-sectional shape is rectangular. did.

The shaping film is superimposed on the coating layer surface in an uncured state, passed between rolls composed of a rubber roll and a metal roll, pressed and laminated, and thereafter, a curtain beam type electron beam irradiator is used. The coating layer was cured by irradiating an electron beam of × 10 ⁶ rad, and finally, the shaping film was peeled off to obtain a polishing tape having a polishing layer in which a predetermined concave portion was formed.

In the obtained polishing tape, a concave portion having a regular predetermined shape is formed in the polishing layer as desired, and a stainless steel (SUS-45C) having a center line of 0.5 μm using this polishing tape is used.
As a result of the polishing, the polishing finished with a center average roughness of 0.1 μm, and the polishing dust was accommodated in the above-mentioned concave portion, and no scratch was generated on the surface of the body to be polished by the polishing dust.

On the other hand, when the same stainless steel was polished with a polishing tape having no concave portion formed by the shaping film, it was confirmed that polishing efficiency was poor and minute scratches were generated.

〔The invention's effect〕

As described above, since the polishing tape of the present invention is provided with a large number of specific concave portions in the polishing layer, polishing debris generated from the object to be polished at the time of polishing is efficiently stored in the concave portions. As a result, there is no risk of damaging the surface of the object to be polished due to the presence of polishing debris between the polishing tape and the object to be polished, and the polishing ability does not decrease due to clogging of the polishing layer. , Which can be performed more reliably.

Further, according to the manufacturing method of the present invention, a polishing tape having a desired concave portion formed in a polishing layer can be stably and easily manufactured, and in particular, a shaping tape having a shaping projection formed by an embossing method. By using a film, it is possible to stably mass-produce a polishing layer having an equivalent concave portion, and the shape of the concave portion can be freely selected within a specific range. There are significant effects that can be easily obtained.

Furthermore, if an ionizing radiation-curable paint is used as the paint for forming the polishing layer, the shaping work of the concave portion can be performed quickly and accurately, and as a result, the physical properties such as abrasion resistance are excellent, and the polishing target is excellent. A polishing layer having high-precision polishing characteristics that does not easily cause scratches can be obtained.

[Brief description of the drawings]

FIG. 1 is a longitudinal sectional view showing an example of a polishing tape manufactured according to the present invention, FIG. 2 is a partially enlarged plan view showing an example of a concave portion in a polishing layer, and FIG. FIG. 4 to FIG. 6 are vertical cross-sectional views taken along the line, showing the respective steps of the manufacturing method of the present invention. DESCRIPTION OF SYMBOLS 1 ... Polishing tape 2 ... Film base material 3 ... Polishing layer 4 ... Depressed portion 5 ... Paint for forming a polishing layer 6 ... Coating layer, 7 ... Film for shaping 8 ... Shaping Protrusion for a: opening width of recess b: depth of recess c: pitch of recess

──────────────────────────────────────────────────続 き Continuation of the front page (56) References JP-A-62-255069 (JP, A) JP-A-57-168868 (JP, A) JP-A-63-16980 (JP, A) JP-A-63-1988 216679 (JP, A) JP-A-62-28177 (JP, A) JP-A-63-156664 (JP, A) JP-A-62-144163 (JP, U) JP-A-63-17768 (JP, U) (58) Field surveyed (Int. Cl. ⁶ , DB name) B24D 11/00

Claims (4)

(57) [Claims] 1. A synthetic method in which a coating material for forming a polishing layer containing an abrasive is applied to at least one surface of a film base material, and a large number of recess-shaped shaping projections are provided on an uncured coating layer. After laminating a shaping film consisting of a resin film or a composite film in which paper is coated with a synthetic resin in a direction in which the protrusions face the coating layer, and then after curing the coating layer, the shaping film is removed. A method for producing a polishing tape, comprising peeling off. 2. A formation of a polishing layer containing an abrasive on the projection side of a shaping film made of a synthetic resin film provided with a number of recessed shaping protrusions or a composite film obtained by coating paper with a synthetic resin. After applying the coating material, the coating layer side in the uncured state is laminated facing the film substrate, and then, after the coating layer is cured, the shaping film is peeled off. Manufacturing method of polishing tape. 3. The method for producing a polishing tape according to claim 1, wherein an ionizing radiation-curable coating is used as the coating for forming the polishing layer, and the coating layer is cured by irradiating with ionizing radiation. 4. The method for producing a polishing tape according to claim 1, wherein the shaping projections of the shaping film are formed by an embossing method.