JP2816742B2 - Circuit board - Google Patents

Circuit board

Info

Publication number
JP2816742B2
JP2816742B2 JP8004890A JP8004890A JP2816742B2 JP 2816742 B2 JP2816742 B2 JP 2816742B2 JP 8004890 A JP8004890 A JP 8004890A JP 8004890 A JP8004890 A JP 8004890A JP 2816742 B2 JP2816742 B2 JP 2816742B2
Authority
JP
Japan
Prior art keywords
conductor
circuit
wiring conductor
copper
molybdenum
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP8004890A
Other languages
Japanese (ja)
Other versions
JPH03280491A (en
Inventor
義博 細井
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kyocera Corp
Original Assignee
Kyocera Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kyocera Corp filed Critical Kyocera Corp
Priority to JP8004890A priority Critical patent/JP2816742B2/en
Publication of JPH03280491A publication Critical patent/JPH03280491A/en
Application granted granted Critical
Publication of JP2816742B2 publication Critical patent/JP2816742B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Landscapes

  • Parts Printed On Printed Circuit Boards (AREA)
  • Production Of Multi-Layered Print Wiring Board (AREA)

Description

【発明の詳細な説明】 (産業上の利用分野) 本発明は混成集積回路装置等に使用される回路基板に
関し、より詳細には内部にタングステン(W)、モリブ
デン(Mo)、マンガン(Mn)等の高融点金属から成る配
線導体を、外表面に銅(Cu)から成る回路導体を有する
回路基板の改良に関するものである。
Description: TECHNICAL FIELD The present invention relates to a circuit board used for a hybrid integrated circuit device or the like, and more particularly, to tungsten (W), molybdenum (Mo), manganese (Mn) inside. The present invention relates to an improvement of a circuit board having a wiring conductor made of a metal having a high melting point and a circuit conductor made of copper (Cu) on an outer surface.

(従来技術及びその課題) 従来、半導体素子等の能動部品や抵抗器、コンデンサ
等の受動部品を多数搭載し、所定の電子回路を構成する
ように成した混成集積回路装置は、通常、内部にタング
ステン(W)、モリブデン(Mo)、マンガン(Mn)等の
高融点金属から成る配線導体を埋設した絶縁基体の外表
面に銅(Cu)から成る回路導体をその一部が前記配線導
体と接触するようにして被着させた構造の回路基板を準
備し、次に前記回路基板の表面に半導体素子やコンデン
サ、抵抗器等を搭載取着するとともに該半導体素子等の
電極を前記回路導体に接続することによって混成集積回
路装置となる。
(Prior art and its problems) Conventionally, a hybrid integrated circuit device in which a plurality of active components such as semiconductor elements and passive components such as resistors and capacitors are mounted to form a predetermined electronic circuit is usually provided inside. A circuit conductor made of copper (Cu) contacts a part of the circuit conductor made of copper (Cu) on an outer surface of an insulating base in which a wiring conductor made of a refractory metal such as tungsten (W), molybdenum (Mo), and manganese (Mn) is embedded. A circuit board having a structure adhered as described above is prepared, and then a semiconductor element, a capacitor, a resistor, and the like are mounted on the surface of the circuit board, and electrodes of the semiconductor element and the like are connected to the circuit conductor. By doing so, a hybrid integrated circuit device is obtained.

かかる従来の混成集積回路装置等に使用される回路基
板は一般にセラミックスの積層技術及びスクリーン印刷
等の厚膜技術を採用することによって製作されており、
具体的には以下の方法によって製作される。
Circuit boards used in such conventional hybrid integrated circuit devices and the like are generally manufactured by employing a ceramic lamination technology and a thick film technology such as screen printing,
Specifically, it is manufactured by the following method.

即ち、 まず、アルミナ(Al2O3)等の電気絶縁性に優れたセ
ラミックス原料粉末に有機溶剤、溶媒を添加混合して複
数枚のセラミック生シートを得るとともに該各セラミッ
ク生シートの上下面にタングステン(W)、モリブデン
(Mo)、マンガン(Mn)等の高融点金属粉末から成る導
電ペーストを従来周知のスクリーン印刷等の厚膜手法を
採用することによって所定パターンに印刷塗布する。
That is, first, an organic solvent and a solvent are added to and mixed with a ceramic raw material powder having excellent electrical insulation such as alumina (Al 2 O 3 ) to obtain a plurality of raw ceramic sheets, and the raw ceramic sheets are formed on the upper and lower surfaces of each raw ceramic sheet. A conductive paste made of a high melting point metal powder such as tungsten (W), molybdenum (Mo), and manganese (Mn) is printed and applied in a predetermined pattern by employing a conventionally known thick film technique such as screen printing.

次に前記各セラミック生シートを積層し、積層体を得
るとともにこれを約1500℃の温度で焼成し、内部及び表
面にタングステン(W)、モリブデン(Mo)、マンガン
(Mn)等の高融点金属から成る配線導体を有する絶縁基
体を得る。
Next, the respective ceramic green sheets are laminated to obtain a laminate, which is fired at a temperature of about 1500 ° C., and a high melting point metal such as tungsten (W), molybdenum (Mo), manganese (Mn) is formed inside and on the surface. An insulating substrate having a wiring conductor made of

そして最後に前記絶縁基体の外表面に、銅(Cu)粉末
にガラス粉末及び有機溶剤、溶媒を添加混合して得た銅
ペーストを従来周知のスクリーン印刷法によりその一部
が前記配線導体と接触するようにして塗布させるととも
にこれを中性雰囲気(窒素雰囲気)中、約800℃の温度
で焼成し、銅(Cu)粉末を絶縁基体及び配線導体上に焼
付け、被着させることによって製品としての回路基板と
なる。
Finally, a copper paste obtained by adding and mixing a glass powder, an organic solvent, and a solvent to copper (Cu) powder on the outer surface of the insulating base is partially contacted with the wiring conductor by a conventionally well-known screen printing method. In a neutral atmosphere (nitrogen atmosphere), this is fired at a temperature of about 800 ° C., and copper (Cu) powder is baked on an insulating substrate and a wiring conductor, and is adhered. It becomes a circuit board.

しかし乍ら、この従来の回路基板は配線導体を形成す
るタングステン(W)、モリブデン(Mo)等と回路導体
を形成する銅(Cu)との濡れ性(反応性)が悪いことか
ら配線導体の一部に回路導体を被着形成させたとしても
両者の密着性は悪く、その結果、配線導体と回路導体と
の間の電気的導通が極めて悪いものとなる欠点を有して
いた。
However, this conventional circuit board has poor wettability (reactivity) between tungsten (W), molybdenum (Mo) or the like forming the wiring conductor and copper (Cu) forming the circuit conductor. Even when a circuit conductor is partially formed, the adhesion between them is poor, and as a result, there is a disadvantage that the electrical conduction between the wiring conductor and the circuit conductor is extremely poor.

そこで上記欠点に鑑み、配線導体の外表面で回路導体
が接触する部位に、配線導体を形成するタングステン
(W)、モリブデン(Mo)と回路導体を形成する銅(C
u)のいずれとも濡れ性(反応性)が良いニッケル(N
i)やコバルト(Co)等から成る被覆層を被着させてお
き、これによって配線導体と回路導体との密着性を向上
させるようになした回路基板が提案されている(特開昭
58−30194号参照)。
In view of the above drawbacks, tungsten (W) and molybdenum (Mo), which form the wiring conductor, and copper (C), which forms the circuit conductor, are formed on the outer surface of the wiring conductor where the circuit conductor contacts.
u) Nickel (N
A circuit board has been proposed in which a coating layer made of i), cobalt (Co), or the like is adhered to thereby improve the adhesion between the wiring conductor and the circuit conductor (Japanese Patent Application Laid-Open (JP-A) No. 2002-143873).
58-30194).

しかし乍ら、この回路基板は回路導体を配線導体上に
被覆層を間に挟んで焼付け被着させる際、回路導体を形
成する銅(Cu)と被覆層を形成するニッケル(Ni)、コ
バルト(Co)等との間に相互拡散が起こり、回路導体の
銅(Cu)の一部が濡れ性(反応性)の悪いタングステン
(W)、モリブデン(Mo)等から成る配線導体に直接接
触して配線導体と回路導体との密着性が劣化してしま
い、更には回路導体と配線導体に温度サイクル等の熱ス
トレスが印加されると両者間に両者の熱膨張係数の相違
に起因した剥離が発生し、その結果、回路導体と配線導
体との間の電気的導通が大きく劣化してしまうという欠
点を有していた。
However, when this circuit board is applied by baking the circuit conductor on the wiring conductor with a coating layer interposed therebetween, copper (Cu) forming the circuit conductor and nickel (Ni), cobalt ( Inter-diffusion occurs between the copper and copper (Co), etc., and part of the copper (Cu) in the circuit conductor directly contacts the wiring conductor made of tungsten (W), molybdenum (Mo), etc., which has poor wettability (reactivity). Adhesion between the wiring conductor and the circuit conductor deteriorates, and when thermal stress such as a temperature cycle is applied to the circuit conductor and the wiring conductor, peeling occurs due to a difference in thermal expansion coefficient between the two. However, as a result, there is a disadvantage that the electrical conduction between the circuit conductor and the wiring conductor is greatly deteriorated.

(発明の目的) 本発明は上記欠点に鑑み案出されたもので、その目的
はタングステン(W)、モリブデン(Mo)、マンガン
(Mn)の少なくとも1種から成る配線導体と銅(Cu)か
ら成る回路導体との密着性を大幅に向上させるとともに
両者間の電気的導通を良好なものとして混成集積回路装
置等に好適に使用し得る回路基板を提供することにあ
る。
(Object of the Invention) The present invention has been devised in view of the above-mentioned drawbacks, and its object is to provide a wiring conductor made of at least one of tungsten (W), molybdenum (Mo), and manganese (Mn) and copper (Cu). It is an object of the present invention to provide a circuit board which can be used for a hybrid integrated circuit device or the like by significantly improving the adhesion to the circuit conductor and improving the electrical conduction between the two.

(課題を解決するための手段) 本発明はタングステン、モリブデン、マンガンの少な
くとも1種から成る配線導体を設けた絶縁基体の外表面
に銅から成る回路導体をその一部が前記配線導体と接触
するようにして被着させた回路基板において、前記配線
導体と回路導体との接触部に、ニッケル、コバルトの少
なくとも1種とタングステン、モリブデンの少なくとも
1種とホウ素との合金を主成分とする中間金属層を介在
させたことを特徴とするものである。
(Means for Solving the Problems) The present invention provides a circuit conductor made of copper on an outer surface of an insulating base provided with a wiring conductor made of at least one of tungsten, molybdenum, and manganese, and a part of the circuit conductor comes into contact with the wiring conductor. In the circuit board thus adhered, an intermediate metal mainly composed of an alloy of at least one of nickel, cobalt, tungsten, and at least one of molybdenum and boron is provided at a contact portion between the wiring conductor and the circuit conductor. It is characterized in that a layer is interposed.

(実施例) 次に本発明を添付図面に基づき詳細に説明する。(Example) Next, the present invention will be described in detail with reference to the accompanying drawings.

第1図は本発明の回路基板を説明するための一部拡大
断面図であり、1は電気絶縁性の材料から成る絶縁基体
である。
FIG. 1 is a partially enlarged sectional view for explaining a circuit board of the present invention, and 1 is an insulating base made of an electrically insulating material.

前記絶縁基体1は、例えばアルミナセラミックス等の
電気絶縁材料から成り、アルミナ(Al2O3)、シリカ(S
iO2)、マグネシア(MgO)、カルシア(CaO)等のセラ
ミック原料粉末に有機溶剤、溶媒を添加混合して泥漿状
となすと共に、これをドクターブレード法を採用するこ
とによってセラミック生シートを得、しかる後、前記セ
ラミック生シートに適当な穴あけ加工を施すとともに複
数枚積層し、還元雰囲気中、約1500℃の温度で焼成する
ことによって製作される。
The insulating base 1 is made of an electrically insulating material such as alumina ceramics, for example, alumina (Al 2 O 3 ), silica (S
iO 2 ), magnesia (MgO), calcia (CaO) and other ceramic raw material powders are mixed with an organic solvent and a solvent to form a slurry. Thereafter, the ceramic green sheet is manufactured by subjecting the green ceramic sheet to appropriate perforation processing, laminating a plurality of sheets, and firing at about 1500 ° C. in a reducing atmosphere.

また前記絶縁基体1にはその内部から上面に導出する
配線導体2が設けてあり、該配線導体2はタングステン
(W)、モリブデン(Mo)、マンガン(Mn)の少なくと
も1種より形成されている。
The insulating base 1 is provided with a wiring conductor 2 extending from the inside to the upper surface, and the wiring conductor 2 is formed of at least one of tungsten (W), molybdenum (Mo), and manganese (Mn). .

前記配線導体2はタングステン(W)、モリブデン
(Mo)、マンガン(Mn)の粉末に有機溶剤、溶媒を添加
混合して導体ペーストを作り、該導体ペーストを前記セ
ラミック生シートの上下面にスクリーン印刷等により所
定のパターンに印刷塗布させておくことによって絶縁基
体1の内部及び表面に被着形成される。
The wiring conductor 2 is made by adding and mixing an organic solvent and a solvent to a powder of tungsten (W), molybdenum (Mo), and manganese (Mn) to form a conductor paste, and the conductor paste is screen-printed on the upper and lower surfaces of the ceramic raw sheet. By printing and applying a predetermined pattern by the method described above, the insulating substrate 1 is adhered and formed inside and on the surface.

前記配線導体2はその露出外表面で後述する回路配線
4が被着される部位に、ニッケル(Ni)、コバルト(C
o)の少なくとも1種とタングステン(W)、モリブデ
ン(Mo)の少なくとも1種とホウ素との合金を主成分と
する金属から成る中間金属層3が被着形成されており、
該中間金属層3は配線導体2の露出外表面に電解メッキ
法、無電解メッキ法等により被着形成される。
The wiring conductor 2 is provided with nickel (Ni), cobalt (C)
o), an intermediate metal layer 3 made of a metal mainly containing an alloy of at least one of tungsten (W) and molybdenum (Mo) and boron;
The intermediate metal layer 3 is formed on the exposed outer surface of the wiring conductor 2 by electroplating, electroless plating, or the like.

前記中間金属層3はこれを構成する金属、即ち、ニッ
ケル(Ni)、コバルト(Co)の少なくとも1種とタング
ステン(W)、モリブデン(Mo)の少なくとも1種とホ
ウ素との合金が配線導体2と回路導体4の両方に濡れ性
(反応性)が良く、配線導体2上に回路配線4を被着さ
せた場合、両者は完全に密着して両者間の電気的導通を
極めて優れたものと為す。
The intermediate metal layer 3 is made of a metal constituting the wiring conductor 2, that is, an alloy of at least one of nickel (Ni) and cobalt (Co) with tungsten (W) and at least one of molybdenum (Mo) and boron. And the circuit conductor 4 have good wettability (reactivity), and when the circuit wiring 4 is applied on the wiring conductor 2, the two are completely adhered to each other and the electrical conduction between them is extremely excellent. Do

また前記中間金属層3を構成する金属は銅(Cu)と相
互拡散し難い金属であり、そのため配線導体2上に中間
金属層3を間に挟んで回路導体4を被着させたとしても
回路導体4の銅(Cu)の一部が配線導体2に直接接触す
ることは一切なく、これによっても配線導体2と回路導
体4との密着性をより完全なものとし、両者の電気的導
通を極めて良好と為すこともできる。
Further, the metal constituting the intermediate metal layer 3 is a metal which is hardly interdiffused with copper (Cu). Therefore, even if the circuit conductor 4 is attached to the wiring conductor 2 with the intermediate metal layer 3 interposed therebetween, the circuit Part of the copper (Cu) of the conductor 4 does not directly contact the wiring conductor 2 at all, and this also makes the adhesion between the wiring conductor 2 and the circuit conductor 4 more complete, and establishes electrical continuity between the two. It can be extremely good.

尚、前記中間金属層3はタングステン(W)、モリブ
デン(Mo)の合計重量がニッケル(Ni)、コバルト(C
o)の合計重量100に対し2.0%未満となると銅(Cu)の
拡散の抑止効果が弱まり、回路導体を構成する銅(Cu)
の一部が中間金属層3内を拡散して配線導体2に直接接
触し配線導体2と回路導体4との密着性を劣化させる傾
向にあり、またタングステン(W)、モリブデン(Mo)
の合計重量がニッケル(Ni)、コバルト(Co)の合計重
量100に対し50.0%を越えると中間金属層3と回路導体
4との濡れ性(反応性)が悪くなり、回路導体4を配線
導体2に密着性良く被着させることができなくなる傾向
にあることから中間金属層3はタングステン(W)、モ
リブデン(Mo)の合計重量をニッケル(Ni)、コバルト
(Co)の合計重量100に対し2.0乃至50.0%の範囲として
おくことが望ましい。
The intermediate metal layer 3 has a total weight of tungsten (W) and molybdenum (Mo) of nickel (Ni) and cobalt (C).
If the total weight of o) is less than 2.0% of the total weight of 100, the effect of suppressing the diffusion of copper (Cu) is weakened, and the copper (Cu) constituting the circuit conductor is reduced.
A part of the metal tends to diffuse in the intermediate metal layer 3 and directly contact the wiring conductor 2 to deteriorate the adhesion between the wiring conductor 2 and the circuit conductor 4. In addition, tungsten (W), molybdenum (Mo)
If the total weight exceeds 50.0% of the total weight of nickel (Ni) and cobalt (Co), 100, the wettability (reactivity) between the intermediate metal layer 3 and the circuit conductor 4 deteriorates, and the circuit conductor 4 is connected to the wiring conductor. Since the intermediate metal layer 3 tends to be unable to adhere with good adhesion, the total weight of the tungsten (W) and molybdenum (Mo) is based on the total weight of nickel (Ni) and cobalt (Co) of 100. It is desirable to set it in the range of 2.0 to 50.0%.

また前記中間金属層3に含有されるホウ素(B)は中
間金属層3表面に酸化膜が形成されるのを抑制し、中間
金属層3と回路導体4との密着性を良好とする作用を為
し、その含有量が0.1重量%未満では前記性質が有効に
作用せず、また3.0重量%を越えると中間金属層3が硬
く、脆くなり、温度サイクル等の熱ストレスが印加され
るとクラックを発生して配線導体2と回路導体4との電
気的導通が悪くなる傾向がある。従って、中間金属層3
に含有させるホウ素(B)はその含有量を0.1乃至3.0重
量%の範囲としておくことが望ましい。
The boron (B) contained in the intermediate metal layer 3 has an effect of suppressing the formation of an oxide film on the surface of the intermediate metal layer 3 and improving the adhesion between the intermediate metal layer 3 and the circuit conductor 4. If the content is less than 0.1% by weight, the above properties do not work effectively. If the content exceeds 3.0% by weight, the intermediate metal layer 3 becomes hard and brittle, and cracks when heat stress such as temperature cycle is applied. And the electrical continuity between the wiring conductor 2 and the circuit conductor 4 tends to deteriorate. Therefore, the intermediate metal layer 3
It is desirable that the content of boron (B) is set in the range of 0.1 to 3.0% by weight.

更に、前記中間金属層3はその厚みが0.1μm未満で
あると回路導体4を形成する銅(Cu)の拡散を完全に防
止することができず、回路導体4の一部が中間金属層3
内を拡散し、配線導体2に直接接触して配線導体2と回
路導体4の密着性が劣化する傾向にあり、また10.0μm
を越えると中間金属層3に内部応力によるクラックが発
生し、回路導体4の一部が中間金属層3のクラックを介
して配線導体2に直接接触し、配線導体2と回路導体4
との密着性が劣化する傾向にあることから中間金属層3
の厚みは0.1乃至10.0μmの範囲としておくことが好ま
しい。
Further, if the thickness of the intermediate metal layer 3 is less than 0.1 μm, the diffusion of copper (Cu) forming the circuit conductor 4 cannot be completely prevented, and a part of the circuit conductor 4
And tends to degrade the adhesion between the wiring conductor 2 and the circuit conductor 4 by direct contact with the wiring conductor 2.
Is exceeded, a crack occurs due to internal stress in the intermediate metal layer 3, and a part of the circuit conductor 4 directly contacts the wiring conductor 2 through the crack in the intermediate metal layer 3, and the wiring conductor 2 and the circuit conductor 4
The intermediate metal layer 3
Is preferably in the range of 0.1 to 10.0 μm.

前記配線導体2の外表面に被着させた中間金属層3の
上面を含む絶縁基1表面には更に銅(Cu)から成る回路
導体4が被着されており、該回路導体4には半導体素子
等の能動部品や抵抗器、コンデンサ等の受動部品の各電
極が接続される。
A circuit conductor 4 made of copper (Cu) is further attached to the surface of the insulating base 1 including the upper surface of the intermediate metal layer 3 attached to the outer surface of the wiring conductor 2. Electrodes of active components such as elements and passive components such as resistors and capacitors are connected.

前記回路導体4は銅(Cu)の粉末にガラス粉末及び有
機溶剤、溶媒を添加混合して銅ペーストを作り、該銅ペ
ーストをその一部が配線導体2に被着させた中間金属層
3と接触するようにして絶縁基体1の外表面に印刷塗布
し、しかる後、これを中性雰囲気中、約800℃の温度で
焼成することによって絶縁基体1の外表面に被着され
る。
The circuit conductor 4 is formed by adding and mixing a glass powder, an organic solvent, and a solvent to copper (Cu) powder to form a copper paste, and applying the copper paste to the intermediate metal layer 3 partially adhered to the wiring conductor 2. Printing is performed on the outer surface of the insulating substrate 1 so as to be in contact with the substrate, and thereafter, the resultant is baked at a temperature of about 800 ° C. in a neutral atmosphere to be applied to the outer surface of the insulating substrate 1.

尚、この場合、配線導体2の外表面には回路導体4が
拡散し難く、回路導体4と濡れ性(反応性)の良い金属
から成る中間金属層3が配されていることから配線導体
2に回路導体4を密着性良く、且つ両者の電気的導通を
良好として密着させることが可能となる。
In this case, since the circuit conductor 4 is hardly diffused on the outer surface of the wiring conductor 2 and the intermediate metal layer 3 made of a metal having good wettability (reactivity) with the circuit conductor 4 is provided, the wiring conductor 2 Thus, the circuit conductor 4 can be adhered with good adhesion and good electrical continuity between them.

かくしてこの回路基板はその表面に半導体素子や抵抗
器、コンデンサ等が搭載取着され、該半導体素子等の各
電極が回路導体に接続されることによって混成集積回路
装置となる。
Thus, the circuit board has a semiconductor element, a resistor, a capacitor, and the like mounted and attached on the surface thereof, and each electrode of the semiconductor element and the like is connected to a circuit conductor to form a hybrid integrated circuit device.

(実験例) 次に本発明の作用効果を以下に述べる実験例に基づき
説明する。
(Experimental Example) Next, the operation and effect of the present invention will be described based on an experimental example described below.

まず、アルミナ(Al2O3)を主成分とするセラミック
生シートの上面にタングステン(W)、モリブデン(M
o)の粉末から成る導体ペーストを印刷塗布し、幅1.0m
m、長さ10.0mmのパターンを一対、その先端の間隔を5.0
mmとして20対被着させ、しかる後、これを還元雰囲気
中、約1500℃の温度で焼成し、アルミナ質焼結体から成
る絶縁基体に第1表に示す材質から成る配線導体を形成
する。
First, tungsten (W) and molybdenum (M) are placed on the upper surface of a green ceramic sheet mainly composed of alumina (Al 2 O 3 ).
o) Conductive paste consisting of powder of the above is printed and applied, and the width is 1.0m.
m, a pair of patterns with a length of 10.0 mm, the distance between the tips is 5.0
Then, this is fired at a temperature of about 1500 ° C. in a reducing atmosphere to form a wiring conductor made of the material shown in Table 1 on an insulating substrate made of an alumina sintered body.

次に前記配線導体の表面に第1表に示す組成、厚みの
中間金属層を電解メッキ法もしくは無電解メッキ法によ
り被着させる。
Next, an intermediate metal layer having the composition and thickness shown in Table 1 is applied to the surface of the wiring conductor by electrolytic plating or electroless plating.

そして次に前記一対の線導体間に銅(Cu)ペーストを
厚み約30μmに印刷するとともにこれを中性雰囲気中、
800℃の温度で焼成し回路導体を形成する。
Then, a copper (Cu) paste is printed to a thickness of about 30 μm between the pair of wire conductors, and is printed in a neutral atmosphere.
Baking at a temperature of 800 ° C to form circuit conductors.

尚、銅(Cu)ペーストの配線導体への接触は配線導体
の先端1.0mmに銅(Cu)ペーストが接触するようにし
た。
The copper (Cu) paste was brought into contact with the wiring conductor such that the copper (Cu) paste was in contact with the tip 1.0 mm of the wiring conductor.

そして最後に前記一対の配線導体間に初期電気抵抗値
及び−65〜+150℃の温度サイクルテストを100サイクル
実施した後の電気抵抗値を測定し、その変化率(増加
率)を求めるとともに平均値を算出し、平均増加率の大
きさを配線導体と回路導体の電気的導通の評価とした。
Finally, the initial electric resistance value between the pair of wiring conductors and the electric resistance value after 100 cycles of a temperature cycle test of -65 to + 150 ° C are measured, and the rate of change (increase rate) is obtained and the average value is obtained. Was calculated, and the magnitude of the average increase rate was used as the evaluation of the electrical continuity between the wiring conductor and the circuit conductor.

尚、試料番号29及び30は本発明品と比較するための比
較試料であり、配線導体の表面にニッケル(Ni)もしく
はコバルト(Co)の層を被着させたものである。
Sample Nos. 29 and 30 are comparative samples for comparison with the product of the present invention, in which a layer of nickel (Ni) or cobalt (Co) is applied to the surface of the wiring conductor.

上記の結果を第1表に示す。 The results are shown in Table 1.

上記実験結果から判るように従来の配線導体の表面に
ニッケル(Ni)もしくはコバルト(Co)の層を被着させ
たものは電気抵抗の増加率が81.0%以上と大きく、回路
導体を被着させる際、回路導体を構成する銅(Cu)と配
線導体の表面に被着させたニッケル(Ni)もしくはコバ
ルト(Co)との間に相互拡散がおこり、配線導体と回路
導体との間の密着性が劣化するとともに両者間の電気的
導通が悪いものに成っているのに対し、本発明の配線導
体と回路導体との間に、ニッケル(Ni)、コバルト(C
o)の少なくとも1種とタングステン(W)、モリブデ
ン(Mo)の少なくとも種とホウ素の合金を主成分とする
金属を介在させたものは電気抵抗の増加率が12.5%以下
と小さく、配線導体と回路導体とが密着し、且つ両者の
電気的導通が極めて優れたものとなっていることが判
る。
As can be seen from the above experimental results, the conventional wiring conductor with a nickel (Ni) or cobalt (Co) layer deposited on the surface has a large increase in electrical resistance of 81.0% or more, and the circuit conductor is deposited. In this case, mutual diffusion occurs between copper (Cu) constituting the circuit conductor and nickel (Ni) or cobalt (Co) deposited on the surface of the wiring conductor, resulting in adhesion between the wiring conductor and the circuit conductor. Is deteriorated and the electrical conduction between the two is poor, whereas nickel (Ni), cobalt (C)
o) interposed a metal whose main component is an alloy of at least one of tungsten (W) and molybdenum (Mo) and boron and has a small increase rate of electric resistance of 12.5% or less, and the wiring conductor It can be seen that the circuit conductors are in close contact with each other, and the electrical conduction between the two is extremely excellent.

(発明の効果) 本発明の回路基板によれば、配線導体と回路導体との
間にニッケル(Ni)、コバルト(Co)の少なくとも1種
とタングテン(W)、モリブデン(Mo)の少なくとも1
種とホウ素(B)との合金を主成分とする金属が介在さ
れていることから配線導体と回路導体とを両者間の電気
的導通を良好として密着性良く被着させることができ、
混成集積回路装置等に使用される回路基板として極めて
有用である。
(Effect of the Invention) According to the circuit board of the present invention, at least one of nickel (Ni) and cobalt (Co) and at least one of tungsten (W) and molybdenum (Mo) are provided between the wiring conductor and the circuit conductor.
Since a metal mainly composed of an alloy of a seed and boron (B) is interposed, the wiring conductor and the circuit conductor can be adhered with good electrical continuity between them,
It is extremely useful as a circuit board used for a hybrid integrated circuit device or the like.

【図面の簡単な説明】[Brief description of the drawings]

第1図は本発明の回路基板の説明するための一部拡大断
面図である。 1……絶縁基体、2……配線導体 3……中間金属層、4……回路導体
FIG. 1 is a partially enlarged sectional view for explaining a circuit board of the present invention. DESCRIPTION OF SYMBOLS 1 ... Insulating base, 2 ... Wiring conductor 3 ... Intermediate metal layer, 4 ... Circuit conductor

───────────────────────────────────────────────────── フロントページの続き (58)調査した分野(Int.Cl.6,DB名) H05K 3/46 H05K 1/09 H05K 3/10 - 3/26,3/38──────────────────────────────────────────────────続 き Continued on the front page (58) Field surveyed (Int.Cl. 6 , DB name) H05K 3/46 H05K 1/09 H05K 3/10-3 / 26,3 / 38

Claims (1)

(57)【特許請求の範囲】(57) [Claims] 【請求項1】タングステン、モリブデン、マンガンの少
なくとも1種から成る配線導体を設けた絶縁基体の外表
面に、銅から成る回路導体をその一部が前記配線導体と
接触するように被着させた回路基板であって、前記配線
導体と回路導体との接触部に、ニッケル、コバルトの少
なくとも1種とタングステン、モリブデンの少なくとも
1種とホウ素との合金を主成分とする中間金属層が介在
されており、該中間金属層はホウ素の含有量が0.1乃至
3.0重量%であり、かつタングステン、モリブデンの重
量がニッケル、コバルトの重量100に対し2.0乃至50%で
あることを特徴とする回路基板。
1. A circuit conductor made of copper is adhered to an outer surface of an insulating substrate provided with a wiring conductor made of at least one of tungsten, molybdenum, and manganese so that a part of the circuit conductor comes into contact with the wiring conductor. A circuit board, wherein an intermediate metal layer mainly containing an alloy of at least one of nickel and cobalt, tungsten, and at least one of molybdenum and boron is interposed at a contact portion between the wiring conductor and the circuit conductor. The intermediate metal layer has a boron content of 0.1 to
A circuit board, wherein the weight is 3.0% by weight, and the weight of tungsten and molybdenum is 2.0 to 50% with respect to the weight of 100 of nickel and cobalt.
JP8004890A 1990-03-28 1990-03-28 Circuit board Expired - Lifetime JP2816742B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP8004890A JP2816742B2 (en) 1990-03-28 1990-03-28 Circuit board

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8004890A JP2816742B2 (en) 1990-03-28 1990-03-28 Circuit board

Publications (2)

Publication Number Publication Date
JPH03280491A JPH03280491A (en) 1991-12-11
JP2816742B2 true JP2816742B2 (en) 1998-10-27

Family

ID=13707358

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8004890A Expired - Lifetime JP2816742B2 (en) 1990-03-28 1990-03-28 Circuit board

Country Status (1)

Country Link
JP (1) JP2816742B2 (en)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100715569B1 (en) 2000-01-26 2007-05-09 엔지케이 스파크 플러그 캄파니 리미티드 Ceramic member for bonding, process for producing the same, vacuum switch, and vacuum vessel
PL356439A1 (en) 2001-10-05 2003-04-07 Ngk Spark Plug Co Method of making a ceramic connecting component, ceramic connecting component as such, vacuum change-over switch and vacuum vessel
CN108504966B (en) * 2018-06-11 2020-03-20 西南大学 Cobalt-based bulk amorphous alloy and preparation method thereof

Also Published As

Publication number Publication date
JPH03280491A (en) 1991-12-11

Similar Documents

Publication Publication Date Title
JP3532926B2 (en) Resistance wiring board and method of manufacturing the same
JP2002026528A (en) Conductive paste and multilayer ceramic substrate
JPS6342879B2 (en)
JP2816742B2 (en) Circuit board
JP2931910B2 (en) Circuit board
JP2842711B2 (en) Circuit board
JP4646362B2 (en) Conductor composition and wiring board using the same
JPH11284296A (en) Wiring board
JP2842710B2 (en) Circuit board
JP3556377B2 (en) Wiring board
JPH0685466A (en) Multilayer circuit board
JP2798566B2 (en) Circuit board manufacturing method
JPH11186727A (en) Wiring board and manufacture thereof
JP2842707B2 (en) Circuit board
JP2738600B2 (en) Circuit board
JP2600477B2 (en) Multilayer ceramic electronic components
JPS6346595B2 (en)
JP2738603B2 (en) Circuit board
JPH0555718A (en) Circuit board
JPH0614596B2 (en) Manufacturing method of ceramic multilayer wiring board
JPS6263488A (en) Manufacturing thick film substrate
JPH10341067A (en) Inorganic multilayered substrate and conductor paste for via holes
JPS63186492A (en) Manufacture of circuit board
JPH04307797A (en) Manufacture of multilayer ceramic circuit board
JPH0213952B2 (en)

Legal Events

Date Code Title Description
FPAY Renewal fee payment (prs date is renewal date of database)

Free format text: PAYMENT UNTIL: 20080821

Year of fee payment: 10

FPAY Renewal fee payment (prs date is renewal date of database)

Free format text: PAYMENT UNTIL: 20080821

Year of fee payment: 10

FPAY Renewal fee payment (prs date is renewal date of database)

Year of fee payment: 11

Free format text: PAYMENT UNTIL: 20090821

FPAY Renewal fee payment (prs date is renewal date of database)

Year of fee payment: 11

Free format text: PAYMENT UNTIL: 20090821

FPAY Renewal fee payment (prs date is renewal date of database)

Free format text: PAYMENT UNTIL: 20100821

Year of fee payment: 12

EXPY Cancellation because of completion of term
FPAY Renewal fee payment (prs date is renewal date of database)

Year of fee payment: 12

Free format text: PAYMENT UNTIL: 20100821