JP2811000B2 - Method for producing film having uneven surface made of ionizing radiation curable resin - Google Patents

Method for producing film having uneven surface made of ionizing radiation curable resin

Info

Publication number
JP2811000B2
JP2811000B2 JP63285290A JP28529088A JP2811000B2 JP 2811000 B2 JP2811000 B2 JP 2811000B2 JP 63285290 A JP63285290 A JP 63285290A JP 28529088 A JP28529088 A JP 28529088A JP 2811000 B2 JP2811000 B2 JP 2811000B2
Authority
JP
Japan
Prior art keywords
intaglio
ionizing radiation
film
curable resin
film substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP63285290A
Other languages
Japanese (ja)
Other versions
JPH02131175A (en
Inventor
裕之 雨宮
泰司 石井
隆至 樽谷
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Dai Nippon Printing Co Ltd
Original Assignee
Dai Nippon Printing Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
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Application filed by Dai Nippon Printing Co Ltd filed Critical Dai Nippon Printing Co Ltd
Priority to JP63285290A priority Critical patent/JP2811000B2/en
Publication of JPH02131175A publication Critical patent/JPH02131175A/en
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Publication of JP2811000B2 publication Critical patent/JP2811000B2/en
Anticipated expiration legal-status Critical
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  • Treatments Of Macromolecular Shaped Articles (AREA)
  • Laminated Bodies (AREA)

Description

【発明の詳細な説明】 〔産業上の利用分野〕 本発明は電離放射線硬化性樹脂からなる凹凸表面を有
するフィルムの製造方法に関する。
Description: TECHNICAL FIELD The present invention relates to a method for producing a film having an uneven surface made of an ionizing radiation curable resin.

〔従来の技術及び発明が解決しようとする課題〕[Problems to be solved by conventional technology and invention]

エンボス賦型用フィルム、化粧フィルム等の用途に使
用されている凹凸表面を有するフィルムの製造方法とし
ては、従来、フィルム基材に一般のエンボス版を加熱
押圧して該基材表面に直接凹凸形状を賦型せしめて製造
する方法、フィルム基材に盛り上げ印刷により凹凸表
面を付して製造する方法、フィルム基材に特に紫外線
硬化性樹脂を盛り上げ印刷した後、紫外線を照射して硬
化させて凹凸表面を付して製造する方法等が知られてい
る。
As a method for producing a film having an uneven surface used for applications such as an embossing molding film and a decorative film, conventionally, a general embossing plate is heated and pressed on a film substrate, and the uneven surface is directly formed on the surface of the substrate. A method of shaping and manufacturing a film, a method of manufacturing by applying an uneven surface by embossing printing on a film substrate, after embossing and printing an ultraviolet curable resin particularly on a film substrate, and then irradiating ultraviolet light to cure the unevenness. A method of manufacturing by attaching a surface is known.

しかしながら、上記の場合、フィルム基材として賦
型用フィルムや化粧フィルム等の用途を考慮して離型性
や表面物性等の良好なポリエステルフィルム、基材用フ
ィルムに電離放射線硬化性樹脂を塗工、硬化させた積層
フィルム等を使用するとシャープな凹凸形状を付すこと
ができず、逆にフィルム基材が上記エンボス版による賦
型性が良好なものでは実際の使用に際しての物性に種々
の難点があり、例えば、ポリ塩化ビニルフィルムのよう
な基材では賦型用フィルムの用途としては離型性に劣
り、またポリエステルフィルム上に賦型性を良好せしめ
るため熱変形温度が低いフィルムを積層してなるような
基材では、インモールド転写賦型等の温度下に晒す用途
には凹凸形状が崩れて使用不可能という欠点がある。ま
た上記の場合、版からフィルム基材上へ転移した液状
のインキが流動してシャープで微細なエンボス形状を印
刷形成しにくく、盛り上げ印刷用インキが一般に熱可塑
性樹脂からなるため離型性や表面物性等に劣る凹凸表面
しか得られない欠点があった。更に上記の場合、紫外
線を照射する前に盛り上げ印刷による樹脂が流動して凹
凸形状が崩れてしまい、特にシャープで微細な凹凸形状
を付すことは不可能であった。
However, in the above case, an ionizing radiation-curable resin is applied to a polyester film having good release properties and surface properties, and a film for the base material in consideration of the use of a film for molding and a decorative film as a film base. However, when a cured laminated film or the like is used, sharp irregularities cannot be imparted, and conversely, if the film substrate has good moldability by the embossing plate, there are various difficulties in physical properties in actual use. Yes, for example, in the case of a substrate such as a polyvinyl chloride film, the use of a film for shaping is inferior in releasability, and a film having a low heat distortion temperature is formed on a polyester film to improve the shaping property. Such a base material has a drawback in that it cannot be used in applications where the substrate is exposed to a temperature such as in-mold transfer molding because the uneven shape is lost. In the above case, the liquid ink transferred from the plate onto the film substrate is difficult to print and form a sharp and fine embossed shape. There was a drawback that only an uneven surface having poor physical properties could be obtained. Further, in the above case, the resin formed by the emboss printing flows before the irradiation with the ultraviolet rays, and the uneven shape is broken, and it is impossible to give a sharp and fine uneven shape.

本発明は上記従来技術の欠点を解消するためになされ
たもので、フィルム基材にシャープで微細な凹凸形状を
容易且つ確実に付すことが可能で、しかもフィルム基材
の材質に制約されずに離型性、表面物性等に優れた凹凸
表面を有するフィルムの製造が可能な製造方法を提供す
ることを目的とする。
The present invention has been made to solve the above-mentioned drawbacks of the prior art, and it is possible to easily and reliably apply a sharp and fine uneven shape to a film substrate, and without being limited by the material of the film substrate. It is an object of the present invention to provide a production method capable of producing a film having an uneven surface having excellent release properties and surface properties.

〔課題を解決するための手段〕[Means for solving the problem]

本発明は、 (1)フィルム基材をロール凹版と押圧ロールとの間を
通過させた後、フィルム基材をロール凹版表面に接触す
るように移送しながら、フィルム基材とロール凹版とが
接触する前にロール凹版とフィルム基材との間に電離放
射線硬化性樹脂を供給した後、ロール凹版と押圧ロール
との間でフィルム基材を押圧してロール凹版の凹部に電
離放射線硬化性樹脂を充填させると共に該凹版表面及び
凹部に充填された電離放射線硬化性樹脂にフィム基材を
接触させ、フィルム基材とロール凹版表面及び凹部に充
填された電離放射線硬化性樹脂が接触している区間にお
いて電離放射線をフィルム基材側及び/又は凹版内部側
より照射して凹版とフィルム基材間に介在している電離
放射線硬化性樹脂を硬化させて該樹脂とフィルム基材と
を密着せしめ、しかる後、フィルム基材を凹版から剥離
することを特徴とする電離放射線硬化性樹脂からなる凹
凸表面を有するフィルムの製造方法。
The present invention provides: (1) After the film substrate is passed between the roll intaglio and the pressing roll, the film substrate is brought into contact with the roll intaglio while the film substrate is transferred so as to be in contact with the surface of the roll intaglio. After supplying the ionizing radiation-curable resin between the roll intaglio and the film base before pressing, press the film base material between the roll intaglio and the pressing roll to apply the ionizing radiation-curable resin to the concave portions of the roll intaglio. The film substrate is brought into contact with the ionizing radiation-curable resin filled in the intaglio surface and the recesses, and the film substrate and the roll intaglio surface and the ionizing radiation-curable resin filled in the recesses are in contact with each other. Irradiation radiation is applied from the film substrate side and / or the inside of the intaglio to cure the ionizing radiation-curable resin interposed between the intaglio and the film substrate, and adhere the resin to the film substrate. A method for producing a film having an uneven surface made of an ionizing radiation-curable resin, wherein the film substrate is peeled off from the intaglio plate.

(2)フィルム基材を凹版から剥離した後、該基材に向
けて更に電離放射線を照射する請求項1記載のフルムの
製造方法。
(2) The method for producing a film according to claim 1, wherein after the film substrate is peeled off from the intaglio plate, the substrate is further irradiated with ionizing radiation.

(3)溶剤を含まない電離放射線硬化性樹脂を使用し、
必要に応じて凹版の加熱により該樹脂の粘度を調整する
請求項1又は2記載のフィルムの製造方法。
(3) using an ionizing radiation-curable resin containing no solvent,
3. The method according to claim 1, wherein the viscosity of the resin is adjusted by heating the intaglio as required.

(4)電離放射線硬化性樹脂として紫外線硬化性樹脂を
用い、且つフィルム基材が紫外線透過性である請求項1
〜3のいずれかに記載のフィルムの製造方法。
(4) An ultraviolet-curable resin is used as the ionizing radiation-curable resin, and the film substrate is ultraviolet-transparent.
4. The method for producing a film according to any one of claims 1 to 3.

(5)凹部が、任意に区分けされた各領域内に隣接する
領域どうし溝方向角度の相異なり、且つ溝幅、周期深さ
が0.1〜100μの直線群又は曲線群をなす平行溝の集合体
からなるロール凹版を使用する請求項1〜4のいずれか
に記載のフィルムの製造方法。
(5) Aggregates of parallel grooves in which the recesses are adjacent to each other and arbitrarily divided in each area and have different groove direction angles, and form a group of straight lines or a group of curves having a groove width and a periodic depth of 0.1 to 100 μm. The method for producing a film according to claim 1, wherein a roll intaglio is used.

を要旨とする。Is the gist.

〔実施例〕〔Example〕

以下、本発明の実施例を図面に基づき説明する。 Hereinafter, embodiments of the present invention will be described with reference to the drawings.

第1図は本発明の一実施例を示すもので、本発明の製
造方法では先ず、ロール凹版1の少なくとも凹部2に電
離放射線硬化性樹脂3を充填させる共に、該凹版1にフ
ィルム基材4を充填された樹脂3にも接するように接触
させる。図中、5はロール凹版1に当接する押圧ロー
ル、6は送りロールを示す。
FIG. 1 shows an embodiment of the present invention. In the manufacturing method of the present invention, at least the concave portion 2 of the roll intaglio 1 is filled with the ionizing radiation-curable resin 3 and the intaglio 1 is coated with a film substrate 4. Is also brought into contact with the filled resin 3. In the drawing, reference numeral 5 denotes a pressing roll that comes into contact with the roll intaglio 1, and reference numeral 6 denotes a feed roll.

上記電離放射線硬化性樹脂の凹版1の少なくとも凹部
2に充填させる方法としては、第1図に示す如く凹版1
と押圧ロール5の当接部上部に電離放射線硬化性樹脂3
を貯溜させて自然に凹部2に充填させる。
As a method for filling at least the concave portion 2 of the intaglio 1 of the ionizing radiation-curable resin, as shown in FIG.
And ionizing radiation-curable resin 3
And the concave portion 2 is naturally filled.

次いで本発明は、フィルム基材4が凹版1に接触して
いる間(具体的には図中の押圧ロール5と送林ロール6
との間に位置している時期)に、電離放射線照射装置7
から紫外線又は電子線等の電離放射線を照射する。電離
放射線の照射は、一般に図示の如くフィルム基材4側か
ら行われるが、この他にロール凹版1を石英、ガラス等
の電離放射線透過性材質にて構成した場合は、凹版1内
部側から照射しても(具体的にはロールの中空内に設置
した照射装置により)、或いは基材側と凹版内部側の両
方向から同時に照射してもよい。
Next, the present invention relates to a method in which the film substrate 4 is in contact with the intaglio 1 (specifically, the pressing roll 5 and the
The ionizing radiation irradiation device 7
Irradiates ionizing radiation such as ultraviolet rays or electron beams. Irradiation with ionizing radiation is generally performed from the film substrate 4 side as shown in the figure. In addition, when the roll intaglio 1 is made of an ionizing radiation permeable material such as quartz or glass, irradiation is performed from the inside of the intaglio 1. Irradiation may be performed simultaneously (specifically, by an irradiation device installed in the hollow of the roll), or simultaneously from both directions of the substrate side and the intaglio inside side.

この電離放射線の照射により、凹版1とフィルム基材
4間に介在している電離放射線硬化性樹脂3aを硬化させ
て該樹脂3aを基材4に密着せしめる。この際の硬化度合
いは、少なくとも樹脂3の流動性を失わせ且つ基材4と
の密着性を生じせしめる程度である。
By the irradiation of the ionizing radiation, the ionizing radiation-curable resin 3a interposed between the intaglio 1 and the film substrate 4 is cured, and the resin 3a is brought into close contact with the substrate 4. The degree of curing at this time is at least such that the fluidity of the resin 3 is lost and the resin 3 is brought into close contact with the substrate 4.

電離放射線を照射した後、フィルム基材4を凹版1か
ら剥離する。これにより硬化した電離放射線硬化性樹3a
が基材4と一体となって凹版(の凹部2内)から脱離さ
れ、その結果、本発明製造方法による、電離放射線硬化
性樹脂からなる凹凸表面を有するフィルムが得られる。
After irradiation with ionizing radiation, the film substrate 4 is peeled off from the intaglio 1. This cures the ionizing radiation-curable tree 3a
Is released from the intaglio plate (within the concave portion 2) integrally with the substrate 4, and as a result, a film having an uneven surface made of an ionizing radiation-curable resin is obtained by the production method of the present invention.

本発明製造方法は通常、凹部2の形状と同一の形状に
賦型された凸部8aのみが電離放射線硬化性樹脂により構
成された凹凸表面8を得るのに有利である。
The manufacturing method of the present invention is generally advantageous for obtaining the uneven surface 8 in which only the convex portions 8a formed in the same shape as the concave portions 2 are formed of the ionizing radiation curable resin.

本発明では、フィルム基材4を凹版1から剥離した
後、特に図示しないがフィルム9に更に電離放射線を照
射して凹凸表面8の樹脂をより完全に硬化させることも
できる。
In the present invention, after the film substrate 4 is peeled off from the intaglio 1, the resin on the uneven surface 8 can be more completely cured by further irradiating the film 9 with ionizing radiation (not shown).

本発明に使用されるロール凹版1は、電子彫刻、エッ
チング法、ミル押し、電鋳等の手段にて所定の凹部2を
設けたものであり、該凹部2の溝幅、周期及び深さは0.
1〜100μm程度であり、特に本発明の特徴であるシャー
プで微細な凹凸を忠実に賦形し得ることにより効力を発
揮する点からは0.1〜30μmが好ましい。また凹部2の
形状、パターン等は特に限定されないが、例えば、第4
図に示すように凹部2が、平行な直線又は曲線を形成す
る凹凸乃至溝の群とそれを囲む閉じた境界線とからなる
パターンであって、境界線を共有して隣合うパターンの
平行な直線又は直線の群の方向が異なり、線の深さ及び
間隔が0.1〜100μmであって、境界線を介して隣接する
線群の方向差は5゜以上のものであるパターン形成の構
成例が挙げられ、特にこの種のパターンによれば視差に
よって各閉領域の光沢が変わることにその意匠の特色が
あり、更に隣接する線群の方向がすべて異なるようにす
るには、位相幾何学の「4色問題の定理」から、方向差
の種類が4種類以上あることが必要充分である。このよ
うなパターンからなる凹部2が設けられた凹版を使用
し、このパターンを忠実に賦形した凹凸表面8を得るこ
とに本発明の手法は極めて有効である。
The roll intaglio 1 used in the present invention is provided with a predetermined concave portion 2 by means such as electronic engraving, etching, mill pressing, and electroforming. The groove width, period and depth of the concave portion 2 are as follows. 0.
It is about 1 to 100 μm, and particularly preferably 0.1 to 30 μm from the viewpoint of exhibiting the effect by being able to faithfully shape the sharp and fine unevenness which is a feature of the present invention. The shape, pattern, and the like of the concave portion 2 are not particularly limited.
As shown in the figure, the concave portion 2 is a pattern composed of a group of irregularities or grooves forming parallel straight lines or curves and a closed boundary line surrounding the group, and the parallel pattern of adjacent patterns sharing the boundary line. The configuration example of the pattern formation in which the directions of the straight lines or the groups of the straight lines are different, the depth and the interval of the lines are 0.1 to 100 μm, and the direction difference between the adjacent line groups through the boundary line is 5 ° or more. In particular, according to this type of pattern, the gloss of each closed area is changed by the parallax, which is a characteristic feature of the design. Further, in order to make the directions of the adjacent line groups all different, the topological “ From the theorem of the four-color problem, it is necessary and sufficient that there be four or more types of direction differences. The method of the present invention is extremely effective in using an intaglio provided with the concave portion 2 having such a pattern and obtaining an uneven surface 8 in which the pattern is faithfully formed.

電離放射線硬化性樹脂3としては、公知の紫外線硬化
性樹脂又は電子線硬化性樹脂を使用することができる。
中でも溶剤無添加で使用する方が硬化による体積収縮、
形状変形、気泡発生等の不具合が生じることがなく、電
離放射線照射前の予備乾燥工程が不要となり好ましく、
またこの種の樹脂は、必要に応じて加熱させた凹版1や
押圧ロール5の加熱、或いは必要に応じ適宜設ける赤外
線ヒーター、温風送風装置等により該樹脂の粘度を適宜
調整することができる。また樹脂3の粘度は3000cpsが
好ましい。
As the ionizing radiation curable resin 3, a known ultraviolet curable resin or electron beam curable resin can be used.
Among these, volume shrinkage due to curing is better when used without solvent,
Deformation, troubles such as generation of bubbles do not occur, and a preliminary drying step before ionizing radiation irradiation is unnecessary, which is preferable.
In addition, the viscosity of the resin of this type can be appropriately adjusted by heating the intaglio 1 or the pressing roll 5 heated as necessary, or by using an infrared heater, a hot air blower or the like appropriately provided as necessary. The viscosity of the resin 3 is preferably 3000 cps.

フィルム基材4としては、ポリエチレンテレフタレー
ト等のポリエステル、ナイロン等のポリアミド、ポリ塩
化ビニル、ポリメタクリル酸メチル等のアクリル樹脂、
ポリカーボネート、ポリスチレン、ポリアクリレート、
フッ素系樹脂、ポリプロピレン、三酢酸セルロース、セ
ロファン等からなるプラスチックフィルム、或いは銅、
鉄、アルミニウム等の金属箔が挙げられ、これらを単独
で使用しても又は適宜積層させた基材として使用しても
良い。但し基材4側から電離放射線を照射する場合には
基材4は電離放射線透過性であることが必要である。ま
た基材4としては用途に応じて他の層を積層して構成し
たものも使用可能であり、例えば、化粧フィルムの用途
においては印刷層、金属蒸着層状等の化粧層等を積層し
たものを使用することができる(この場合、該化粧層は
凹凸表面8とは反対側の面に形成しても同一の面に形成
してもよいが、電離放射線の樹脂3への到達を阻害しな
い様、化粧層の材料を選定するか、或いは照射方向を選
定する必要がある)。基材4の厚さは用途に応じて適宜
選択されるが、一般に10〜100μm、好ましくは25〜50
μmである。
Examples of the film substrate 4 include polyesters such as polyethylene terephthalate, polyamides such as nylon, acrylic resins such as polyvinyl chloride and polymethyl methacrylate,
Polycarbonate, polystyrene, polyacrylate,
Plastic film made of fluororesin, polypropylene, cellulose triacetate, cellophane, etc., or copper,
Metal foils such as iron and aluminum may be used, and these may be used alone or as a suitably laminated substrate. However, when the substrate 4 is irradiated with ionizing radiation, the substrate 4 needs to be ionizing radiation permeable. In addition, as the base material 4, one formed by laminating other layers according to the intended use may be used. For example, in the case of a decorative film, a laminated printed layer or a decorative layer such as a metal vapor-deposited layer may be used. (In this case, the decorative layer may be formed on the surface opposite to the uneven surface 8 or may be formed on the same surface, but the decorative layer does not hinder the ionizing radiation from reaching the resin 3). It is necessary to select the material of the decorative layer or the irradiation direction). The thickness of the substrate 4 is appropriately selected depending on the application, but is generally 10 to 100 μm, preferably 25 to 50 μm.
μm.

本発明により得られる凹凸表面8を有するフィルム9
は、主にエンボス賦形用フィルム、化粧フィルム等の用
途として使用することができるが、この他の広範な用途
にも適用可能である。特にエンボス賦形用フィルムの用
途の場合、その具体的使用例として例えば、メラミン、
ジアクリレート、不飽和ポリエステル等からなる化粧基
材等の表面に塗布されている硬化性樹脂面上へ重ね合わ
せて樹脂硬化後に剥離して凹凸形状を賦形したり、また
射出成形の金型上に凹凸表面8をキャビティ側へ向けて
予備成形後、射出形成用樹脂を注入して射出成形品の所
定表面に凹凸形状を賦形したり、更にポリ塩化ビニル、
アクリル樹脂等の溶液を凹凸表面8へキャスティングし
た後、フィルムを剥離して凹凸形状を賦形するのに用い
ることができる。
Film 9 having uneven surface 8 obtained by the present invention
Can be used mainly for applications such as embossing films and decorative films, but can also be applied to other wide-ranging applications. Particularly in the case of the use of the embossable shaping film, for example, melamine,
It is superimposed on the surface of the curable resin applied to the surface of a decorative base material such as diacrylate, unsaturated polyester, etc., and is peeled off after curing the resin to form an irregular shape, or on an injection mold. After pre-molding the concave-convex surface 8 toward the cavity side, injection molding resin is injected to form a concave-convex shape on a predetermined surface of the injection-molded product.
After casting a solution such as an acrylic resin on the uneven surface 8, the film can be peeled off and used to shape the unevenness.

次に、具体的実施例に挙げて本発明を更に詳細に説明
する。
Next, the present invention will be described in more detail with reference to specific examples.

実施例1 厚さ0.1mmの透明性ポリ塩化ビニルフィルム(28パー
ツ)に片面に、塩化ビニル−酢酸ビニル共重合樹脂から
なる印刷インキを用いグラビア印刷法にて石目柄を印刷
した。
Example 1 On a transparent polyvinyl chloride film (28 parts) having a thickness of 0.1 mm, a stone pattern was printed on one side by a gravure printing method using a printing ink composed of a vinyl chloride-vinyl acetate copolymer resin.

これをフィルム基材として用い、第1図に図示の製造
態様を採用し、下記の構成材料及び条件にて該基財の非
印刷面に凹凸表面形状を付し、化粧フィルムを製造し
た。
Using this as a film substrate, the production mode shown in FIG. 1 was adopted, and the non-printed surface of the base material was given an uneven surface shape using the following constituent materials and conditions to produce a decorative film.

・電離放射線硬化性樹脂……紫外線硬化性樹脂(大日精
化(株)製:セイカビームHT509、粘度3000cps)を使
用。
・ Ionizing radiation curable resin: UV curable resin (manufactured by Dainichi Seika Co., Ltd .: Seika Beam HT509, viscosity 3000 cps) is used.

・凹版……溝幅及び版深15μm、ピッチ30μmの万線を
各閉領域毎にもち、且つ辺を介して隣接する万線の方向
角度を変えて区分けしたパターン凹部からなる凹版を使
用。万線の角度は、0゜(基準)、30゜、30゜、90゜の
4種である。
-Intaglio .... An intaglio consisting of pattern recesses that have lines of 15 μm in groove width and plate depth, 30 μm in pitch for each closed area, and are separated by changing the direction angle of adjacent lines through the sides. The angles of the parallel lines are four types: 0 ° (reference), 30 °, 30 °, and 90 °.

・電離放射線照射……オゾン含有の高圧水銀灯(80W/c
m)を2灯設置した照射装置により、基材送り速度1m/mi
nの基材に紫外線を照射した。
・ Ionizing radiation irradiation …… High pressure mercury lamp containing ozone (80W / c
m), the feed rate of the substrate is 1m / mi
The substrate of n was irradiated with ultraviolet rays.

一方、比較のために上記印刷済み基材に上記エンボス
凹版と同一の凹部を設けてなるエンボスロールにて加熱
エンボス加工を行い、ポリ塩化ビニルフィルム面に凹凸
形状を賦形した化粧フィルムを作成した。
On the other hand, for comparison, the printed substrate was heated and embossed with an embossing roll provided with the same recesses as the embossed intaglio, to create a decorative film in which an irregular shape was formed on the surface of the polyvinyl chloride film. .

得られた各化粧フィルムは、本発明製造方法によるも
のは再現性良好に凹凸表面形状が形成されており、また
加熱工程がないため印刷柄の歪みが殆ど生じることがな
く、しかも紫外線硬化性樹脂にて凹凸表面が構成されて
いるため耐スクチッチ性等の物性が良好で化粧板の用途
として好適なものであった。一方、比較例の化粧フィル
ムは所期の凹凸表面の形成が忠実に再現できず、印刷柄
の歪みが生じ、凹凸表面がポリ塩化ビニルフィルムから
なるため表面物性に劣るものであった。
Each of the obtained decorative films was produced according to the production method of the present invention, the uneven surface shape was formed with good reproducibility, and there was almost no distortion of the printed pattern due to the absence of a heating step. Since the uneven surface was formed, the material had good physical properties such as scutch resistance and was suitable for use as a decorative board. On the other hand, in the decorative film of the comparative example, the desired formation of the uneven surface could not be faithfully reproduced, the printed pattern was distorted, and the uneven surface was made of a polyvinyl chloride film, so that the surface properties were poor.

実施例2 厚さ23μmの易接着性ポリエステルフィルム(ICI
製:メリネック313)をフィルム基材として用い、第2
図に図示の製造態様を採用し、下記の条件に基づいて精
密エンボス賦型用フィルムを製造した。
Example 2 An easily adhesive polyester film having a thickness of 23 μm (ICI
Manufactured by Merinec 313) as a film base material.
The production mode shown in the figure was adopted, and a precision embossing film was produced under the following conditions.

・電離放射線硬化性樹脂……紫外線硬化性樹脂 (大日精化(株)製:セイカビームHKT)を溶剤(メチ
ルエチルケトン/トロール)にて粘度12秒(ザーンカッ
プNo.4)としたものを使用。
・ Ionizing radiation curable resin: UV curable resin (manufactured by Dainichi Seika Co., Ltd .: Seika Beam HKT) with a solvent (methyl ethyl ketone / trol) with a viscosity of 12 seconds (Zern Cup No. 4) is used.

・凹版……溝幅及び版深30μm、周期60μmである他は
実施例1と同種の形状のパターン凹部からなる凹版を使
用。
-Intaglio: An intaglio consisting of pattern recesses of the same type as in Example 1 except that the groove width and plate depth are 30 μm and the period is 60 μm.

・電離放射線照射……照射装置7a(80W/cmのオゾン含有
の高圧水銀灯1灯)にてハーフキュアさせる。
・ Ionizing radiation irradiation: Half-cured with the irradiation device 7a (one high-pressure mercury lamp containing ozone at 80 W / cm).

照射装置7による照射内容は実施例1と同一の条件で
行った。
The irradiation by the irradiation device 7 was performed under the same conditions as in Example 1.

得られた賦形用フィルムは、微細なエンボスが正確に
再現された凹凸表面に形成されており、このフィルムを
用いて射出成形時、該賦形用フィルムを赤外線ヒーター
にて加熱軟化させた後、真空・圧空成形して金型上に凹
凸表面をキャビティ側に位置するような向きで予備成形
し、次いで金型を閉じ、溶融させたABS樹脂を注入、冷
却後、金型を解放し、賦形用フィルムを剥離して賦形を
行ったところ、見る角度により異なったパターンがきら
めいて現出する極めて意匠性に富んだ凹凸表面を相手側
に賦形することができた。また、実施例1と同様にして
同一内容のエンボス版を用いて比較用の賦形フィルムの
作成を試みたが、基材表面にエンボス形状を賦型するこ
とが出来なかった。
The obtained shaping film has an uneven surface on which fine embosses are accurately reproduced, and after injection-molding using this film, the shaping film is heated and softened by an infrared heater. , Vacuum / Pressure molding, pre-molding on the mold in such a way that the uneven surface is located on the cavity side, then close the mold, inject the molten ABS resin, cool, release the mold, When the shaping film was peeled off and shaping was carried out, it was possible to shape an extremely design-like uneven surface in which different patterns shimmered and appeared depending on the viewing angle, on the other side. An attempt was made to produce a shaped film for comparison using an embossed plate having the same contents as in Example 1, but no embossed shape could be formed on the substrate surface.

〔発明の効果〕〔The invention's effect〕

以上説明したように、本発明製造方法はフィルム基材
をロール凹版と押圧ロールとの間を通過させた後、フィ
ルム基材をロール凹版表面に接触するように移送しなが
ら、フィルム基材とロール凹版とが接触する前にロール
凹版とフィルム基材との間に電離放射線硬化性樹脂を供
給した後、ロール凹版と押圧ロールとの間でフィルム基
材を押圧してロール凹版の凹部に電離放射線硬化性樹脂
を充填させると共に該凹版表面及び凹部に充填された電
離放射線硬化性樹脂にフィム基材を接触させ、フィルム
基材とロール凹版表面及び凹部に充填された電離放射線
硬化性樹脂が接触している区間において電離放射線をフ
ィルム基材側及び/又は凹版内部側より照射して凹版と
フィルム基材間に介在している電離放射線硬化性樹脂を
硬化させて該樹脂とフィルム基材とを密着せしめ、しか
る後、フィルム基材を凹版から剥離しているため、樹脂
が不用意に流動することがなく凹部形状と同一形状に賦
型された凸部のみが電離放射線硬化性樹脂より形成され
た凹凸表面を付したフィルムを容易に且つ確実に得るこ
とができ、しかも電離放射線硬化性樹脂を使用し、この
樹脂により凹凸表面を構成してなるため、フィルム基材
の材質に関係なく離型性、表面物性等に優れた凹凸表面
を有するフィルムの製造を効率よく簡便に行うことが可
能である。
As described above, the production method of the present invention is to pass the film substrate between the roll intaglio and the pressing roll, and then transfer the film substrate so as to be in contact with the surface of the roll intaglio. After supplying the ionizing radiation-curable resin between the roll intaglio and the film base before the intaglio comes into contact, the film base is pressed between the roll intaglio and the pressing roll to ionize the concave portions of the roll intaglio. The film base is brought into contact with the ionizing radiation-curable resin filled in the intaglio surface and the concave portions while filling the curable resin, and the film substrate and the roll intaglio surface and the ionizing radiation-curable resin filled in the concave portions are brought into contact with each other. Irradiating ionizing radiation from the film substrate side and / or from the inside of the intaglio to cure the ionizing radiation curable resin interposed between the intaglio and the film substrate in the section where The film base material is adhered to the film base material, and then the film base material is peeled off from the intaglio plate. It is possible to easily and reliably obtain a film having an uneven surface formed of a conductive resin, and furthermore, using an ionizing radiation-curable resin and forming the uneven surface with this resin, the material of the film base material Irrespective of this, it is possible to efficiently and easily produce a film having an uneven surface having excellent release properties, surface physical properties, and the like.

また本発明によれば、フィルム基材の剥離後に再度電
離放射線の照射を行って、より完全な硬化がなされた電
離放射線硬化性樹脂からなる凹凸表面を基材に付すこと
ができる。また溶剤無添加の電離放射線硬化性樹脂を用
いることにより、溶剤除去のための予備乾燥工程等が不
要となって製造工程の簡略化を図ることができる。
Further, according to the present invention, the film substrate can be irradiated with ionizing radiation again after the film substrate has been peeled off, so that the substrate can be provided with an uneven surface made of a completely cured ionizing radiation-curable resin. In addition, by using the ionizing radiation-curable resin containing no solvent, a preliminary drying step or the like for removing the solvent is not required, and the manufacturing process can be simplified.

【図面の簡単な説明】[Brief description of the drawings]

第1図は本発明製造方法の製造工程の一例を示す説明
図、第2図は凹版の凹部の1構成例を示す平面説明図で
ある。 1……ロール凹版 2……凹部 3……電離放射線硬化性樹脂 4……フィルム基材 7……電離放射線照射装置 8……電離放射線硬化性樹脂からなる凹凸表面 9……フィルム
FIG. 1 is an explanatory view showing an example of the manufacturing process of the manufacturing method of the present invention, and FIG. 2 is an explanatory plan view showing an example of a configuration of a concave portion of an intaglio. DESCRIPTION OF SYMBOLS 1 ... Roll intaglio 2 ... Depression 3 ... Ionizing radiation curable resin 4 ... Film base 7 ... Ionizing radiation irradiation device 8 ... Irregular surface made of ionizing radiation curable resin 9 ... Film

Claims (5)

(57)【特許請求の範囲】(57) [Claims] 【請求項1】フィルム基材をロール凹版と押圧ロールと
の間を通過させた後、フィルム基材をロール凹版表面に
接触するように移送しながら、フィルム基材とロール凹
版とが接触する前にロール凹版とフィルム基材との間に
電離放射線硬化性樹脂を供給した後、ロール凹版と押圧
ロールとの間でフィルム基材を押圧してロール凹版の凹
部に電離放射線硬化性樹脂を充填させると共に該凹版表
面及び凹部に充填された電離放射線硬化性樹脂にフィル
ム基材を接触させ、フィルム基材とロール凹版表面及び
凹部に充填された電離放射線硬化性樹脂が接触している
区間において電離放射線をフィルム基材側及び/又は凹
版内部側より照射して凹版とフィルム基材間に介在して
いる電離放射線硬化性樹脂を硬化させて該樹脂とフィル
ム基材とを密着せしめ、しかる後、フィルム基材を凹版
から剥離することを特徴とする電離放射線硬化性樹脂か
らなる凹凸表面を有するフィルムの製造方法。
1. After the film substrate is passed between the roll intaglio and the pressing roll, the film substrate is transferred so as to come into contact with the surface of the roll intaglio, while the film substrate is in contact with the roll intaglio. After supplying the ionizing radiation curable resin between the roll intaglio and the film substrate, the film substrate is pressed between the roll intaglio and the pressing roll to fill the concave portions of the roll intaglio with the ionizing radiation curable resin. A film base is brought into contact with the ionizing radiation-curable resin filled in the intaglio surface and the recesses, and ionizing radiation is applied in a section where the film base is in contact with the roll intaglio surface and the ionizing radiation-curable resin filled in the recesses. Is irradiated from the film substrate side and / or the inside of the intaglio to cure the ionizing radiation-curable resin interposed between the intaglio and the film substrate, thereby bringing the resin and the film substrate into close contact with each other. Because, after which the production method of a film having an uneven surface of the film substrate made of an ionizing radiation curable resin, which comprises peeling the intaglio.
【請求項2】フィルム基材を凹版から剥離した後、該基
材に向けて更に電離放射線を照射する請求項1記載のフ
ィルムの製造方法。
2. The method for producing a film according to claim 1, wherein after the film substrate is peeled off from the intaglio, the substrate is further irradiated with ionizing radiation.
【請求項3】溶剤を含まない電離放射線硬化性樹脂を使
用し、必要に応じて凹版の加熱により該樹脂の粘度を調
整する請求項1又は2記載のフィルムの製造方法。
3. The method according to claim 1, wherein an ionizing radiation-curable resin containing no solvent is used, and the viscosity of the resin is adjusted by heating the intaglio as required.
【請求項4】電離放射線硬化性樹脂として紫外線硬化性
樹脂を用い、且つフィルム基材が紫外線透過性である請
求項1〜3のいずれかに記載のフィルムの製造方法。
4. The method according to claim 1, wherein an ultraviolet-curable resin is used as the ionizing radiation-curable resin, and the film base is transparent to ultraviolet light.
【請求項5】凹部が、任意に区分けされた各領域内に隣
接する領域どうし溝方向角度の相異なり、且つ溝幅、周
期深さが0.1〜100μmの直線群又は曲線群をなす平行溝
の集合体からなるロール凹版を使用する請求項1〜4の
いずれかに記載のフィルムの製造方法。
5. A parallel groove in which a concave portion has a different groove direction angle between adjacent regions in each region arbitrarily divided and forms a straight line group or a curve group having a groove width and a periodic depth of 0.1 to 100 μm. The method for producing a film according to claim 1, wherein a roll intaglio made of an aggregate is used.
JP63285290A 1988-11-11 1988-11-11 Method for producing film having uneven surface made of ionizing radiation curable resin Expired - Fee Related JP2811000B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP63285290A JP2811000B2 (en) 1988-11-11 1988-11-11 Method for producing film having uneven surface made of ionizing radiation curable resin

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP63285290A JP2811000B2 (en) 1988-11-11 1988-11-11 Method for producing film having uneven surface made of ionizing radiation curable resin

Publications (2)

Publication Number Publication Date
JPH02131175A JPH02131175A (en) 1990-05-18
JP2811000B2 true JP2811000B2 (en) 1998-10-15

Family

ID=17689606

Family Applications (1)

Application Number Title Priority Date Filing Date
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Country Status (1)

Country Link
JP (1) JP2811000B2 (en)

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* Cited by examiner, † Cited by third party
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JPH0647883A (en) * 1992-07-29 1994-02-22 Toppan Printing Co Ltd Production of embossed sheet by irradiation with ionizing radiation
JP4789443B2 (en) * 2004-08-26 2011-10-12 京セラ株式会社 Composite sheet manufacturing method, laminated body manufacturing method, and laminated part manufacturing method
US8187695B2 (en) 2005-09-30 2012-05-29 Dai Nippon Printing Co., Ltd. Shaping sheet, resin decorative material and method of producing the same
JP4752430B2 (en) * 2005-09-30 2011-08-17 大日本印刷株式会社 Molding sheet
KR101242330B1 (en) * 2009-12-30 2013-03-12 (주)엘지하우시스 Release film and preparation method thereof
JP2012061832A (en) * 2010-09-17 2012-03-29 Sony Corp Method of manufacturing laminated body, stamper, and transfer device
KR101094068B1 (en) * 2011-10-19 2011-12-15 유병호 Method for manufacturing three dimensions lens film
CN111378307B (en) * 2020-04-28 2022-05-06 邦弗特新材料股份有限公司 UV coating with special bump structure and preparation method thereof

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Publication number Priority date Publication date Assignee Title
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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
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