JP2757086B2 - Wafer separating method and wire saw device - Google Patents

Wafer separating method and wire saw device

Info

Publication number
JP2757086B2
JP2757086B2 JP4058790A JP5879092A JP2757086B2 JP 2757086 B2 JP2757086 B2 JP 2757086B2 JP 4058790 A JP4058790 A JP 4058790A JP 5879092 A JP5879092 A JP 5879092A JP 2757086 B2 JP2757086 B2 JP 2757086B2
Authority
JP
Japan
Prior art keywords
wire
work
plate
wafer
slurry
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP4058790A
Other languages
Japanese (ja)
Other versions
JPH05220731A (en
Inventor
公平 外山
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shin Etsu Handotai Co Ltd
Original Assignee
Shin Etsu Handotai Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shin Etsu Handotai Co Ltd filed Critical Shin Etsu Handotai Co Ltd
Priority to JP4058790A priority Critical patent/JP2757086B2/en
Publication of JPH05220731A publication Critical patent/JPH05220731A/en
Application granted granted Critical
Publication of JP2757086B2 publication Critical patent/JP2757086B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B28WORKING CEMENT, CLAY, OR STONE
    • B28DWORKING STONE OR STONE-LIKE MATERIALS
    • B28D5/00Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor
    • B28D5/04Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor by tools other than rotary type, e.g. reciprocating tools
    • B28D5/045Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor by tools other than rotary type, e.g. reciprocating tools by cutting with wires or closed-loop blades

Landscapes

  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Processing Of Stones Or Stones Resemblance Materials (AREA)
  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【産業上の利用分野】本発明は、ワイヤーソーによって
切り出されたウエーハを切り離す方法及び該方法が適用
されるワイヤーソー装置に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for separating a wafer cut by a wire saw and a wire saw apparatus to which the method is applied.

【0002】[0002]

【従来の技術】例えば、半導体製造分野においては、単
結晶引上装置によって引き上げられたシリコン単結晶イ
ンゴットを内周刃スライサーによって軸直角方向に薄く
切断することによって複数のシリコン半導体ウエーハを
得ている。
2. Description of the Related Art For example, in the field of semiconductor manufacturing, a plurality of silicon semiconductor wafers are obtained by thinly cutting a silicon single crystal ingot pulled up by a single crystal pulling apparatus in a direction perpendicular to an axis by an inner peripheral slicer. .

【0003】ところで、近年の半導体ウエーハの大口径
化の傾向は、従来からの内周刃スライサーによるインゴ
ットの切断を困難にしている。又、内周刃スライサーに
よる切断方法は、ウエーハを1枚ずつ切り出すために非
効率で生産性が悪いという問題がある。
[0003] The recent tendency to increase the diameter of semiconductor wafers has made it difficult to cut ingots using conventional inner peripheral blade slicers. In addition, the cutting method using the inner peripheral blade slicer has a problem in that productivity is poor because the wafer is cut out one by one.

【0004】そこで、ワイヤーソー(特に、マルチワイ
ヤーソー)による切断方法が近年注目されつつあるが、
この切断方法は、複数のローラ間に螺旋状に巻回された
ワイヤーにワークを押圧し、該ワークとワイヤーとの接
触部にスラリーを供給しながらワイヤーを移動させるこ
とによってワークから複数枚のウエーハを切り出す方法
であって、これによれば、一度に多数枚(例えば、数1
00枚)のウエーハを同時に切り出すことができる。
Therefore, a cutting method using a wire saw (particularly, a multi-wire saw) has been attracting attention in recent years.
In this cutting method, a work is pressed against a wire spirally wound between a plurality of rollers, and the wire is moved while supplying slurry to a contact portion between the work and the wire, so that a plurality of wafers are separated from the work. According to this method, a large number of sheets (for example,
00 wafers can be cut out at the same time.

【0005】[0005]

【発明が解決しようとする課題】ところで、上記方法に
よってワイヤーによるワークの切断が終了した後は、ワ
イヤーをワークの切断経路に沿って相対的に戻す所謂ワ
イヤー抜き作業が必要である。
After the cutting of the work by the wire is completed by the above-mentioned method, it is necessary to perform a so-called wire removing operation in which the wire is relatively returned along the cutting path of the work.

【0006】上記ワイヤー抜き作業においては、ワイヤ
ーは今まで受けていた切断抵抗を受けることなくフリー
な状態にあるが、実際にはワイヤーは張力や振動の影響
を受けるため、該ワイヤーをウエーハ面に接触すること
なくワークの切断経路に沿ってスムーズに抜くことは至
難であって、ワイヤーがウエーハ面を叩いてウエーハの
チップや欠けを引き起すという問題が発生し易い。
[0006] In the above wire removal operation, the wire is in a free state without being subjected to the cutting resistance that has been received up to now. However, since the wire is actually affected by tension and vibration, the wire is placed on the wafer surface. It is extremely difficult to smoothly pull out the workpiece along the cutting path without contact, and the problem that the wire hits the wafer surface to cause chipping or chipping of the wafer is likely to occur.

【0007】そこで、ワークの切断終了後、ウエーハ列
を別設の取り出しアームにて把持した状態で、再びワイ
ヤーにて当て板を切断し、ウエーハ列を当て板から切り
離す方法(特開昭61−182761号公報参照)や、
ワークの切断終了後、ワイヤーにて更に当て板を切り込
んで該当て板中にワイヤーを喰い込ませた状態で、ウエ
ーハを1枚ずつ吸着してこれを当て板から切り離す方法
(特開昭61−125767号公報参照)が提案されて
いる。
[0007] Therefore, after the cutting of the work is completed, a method is used in which, while holding the wafer row with a separate take-out arm, the backing plate is cut again with a wire and the wafer row is separated from the backing plate (Japanese Patent Application Laid-Open No. 61-1986). No. 182761),
After the cutting of the work is completed, a method in which the plate is further cut with a wire and the wire is bitten into the plate and the wafer is sucked one by one to separate the wafer from the plate (Japanese Patent Application Laid-Open No. SHO 61-61). No. 125767) has been proposed.

【0008】しかしながら、前者の方法では、切り離さ
れて取り出しアームに把持されたウエーハが倒れて互い
に接触し、チップや欠けを生じる危険性があり、後者の
方法では、切り離しに手間と時間を要するという問題が
ある。
However, in the former method, there is a risk that the wafers separated and gripped by the take-out arm fall and come into contact with each other to cause chips and chips, and the latter method requires time and effort to separate. There's a problem.

【0009】本発明は上記問題に鑑みてなされたもの
で、その目的とする処は、複数枚のウエーハを、これに
チップや欠けを発生させることなく、同時に効率良く切
り離すことができるウエーハ切り離し方法及びワイヤー
ソー装置を提供することにある。
The present invention has been made in view of the above problems, and an object of the present invention is to provide a wafer separating method capable of efficiently separating a plurality of wafers simultaneously without causing chips or chips therein. And a wire saw device.

【0010】[0010]

【課題を解決するための手段】上記目的を達成すべく本
発明は、当て板の下面に保持されたワークを、複数のロ
ーラ間に螺旋状に巻回されたワイヤーに対して下降させ
る鉛直下降方式を採用し、ワークをヤイヤーに押圧して
該ワークとワイヤーとの接触部にスラリーを供給しなが
らワイヤーを移動させてワークから複数枚のウエーハを
切り出すワイヤーソー装置に適用されるウエーハ切り離
し方法において、内部に液体が貯留されている液溜り槽
を前記ワイヤーの下方、かつワークの直下に配置し、
記ワイヤーによるワークの切断が終了した後、当て板を
更に下降させてワイヤーを該当て板に所定深さだけ喰い
込ませ、この状態から当て板をワイヤーの移動方向に対
して直角方向、かつ水平方向に移動させてウエーハを当
て板の一部と共に当て板から切り離し、切り離されたウ
エーハを前記液溜り槽の液中に自然落下させることを特
徴とする。
In order to achieve the above object, the present invention provides a vertical descent for lowering a work held on a lower surface of a backing plate with respect to a wire spirally wound between a plurality of rollers. In a wafer separating method applied to a wire saw device that presses a work to a yar and moves a wire while supplying slurry to a contact portion between the work and the wire to cut out a plurality of wafers from the work. , A liquid storage tank in which liquid is stored
Is placed below the wire and directly below the work, and after cutting of the work by the wire is completed, the contact plate is further lowered so that the wire is bitten into the corresponding plate by a predetermined depth. The plate is moved in a direction perpendicular to the moving direction of the wire and in a horizontal direction, and the wafer is separated from the caul plate together with a part of the caul plate, and the separated cuff is moved.
It is characterized in that the aerial falls naturally into the liquid in the liquid reservoir .

【0011】又、本発明は、上記ワイヤーソー装置にお
いて、前記当て板を前記ワイヤーの移動方向に対して
角方向、かつ水平方向に移動せしめる当て板駆動手段を
設け、内部に液体が貯留されている液溜り槽を、前記ワ
イヤーの下方、かつワークの直下に設けたことを特徴と
する。
[0011] Further, in the above wire saw apparatus, straight the backing plate with respect to the moving direction of the wire
The contact plate drive means that can be moved in the angular and horizontal directions
And a liquid storage tank in which a liquid is stored inside the tank.
It is provided below the ear and directly below the work .

【0012】[0012]

【作用】本発明では、ワイヤーによるワークの切断が終
了した後、当て板を更に下降させてワイヤーを該当て板
に所定深さだけ喰い込ませ、この状態から当て板をワイ
ヤーの移動方向に対して直角方向、かつ水平方向に移動
させることにより、ウエーハが当て板の一部と共に当て
板から切り離される。そして、切り離された全ウエーハ
の直下、かつワイヤーの下方には液溜り槽が位置してい
るから、これら切り離されたウエーハは自重により、液
溜り槽の液中に落下(自然落下)する。 このため、従来
のワイヤー抜き作業が不要となり、全ウエーハを、これ
にチップや欠けを発生させることなく、同時に効率良く
切り離すことができる。尚、液溜り槽の内面にウレタン
フォーム等の緩衝材を貼設すれば、液中に落下するウエ
ーハが受ける衝撃を小さく抑えて該ウエーハにチップや
欠けが発生するのを更に確実に防ぐことができる。
According to the present invention, the cutting of the workpiece by the wire is completed.
After that, lower the contact plate further and apply the wire to the plate
To the specified depth, and from this state wipe the backing plate
Moves in a direction perpendicular to the direction of movement
The wafer with a part of the backing plate
Cut off from the board. And all the separated wafers
There is a reservoir just below the wire and below the wire.
Therefore, these separated wafers are liquid
Drops (natural fall) into the liquid in the reservoir. For this reason, the conventional wire removing operation becomes unnecessary, and all the wafers can be cut off efficiently at the same time without generating chips or chips. If a buffer material such as urethane foam is attached to the inner surface of the liquid reservoir, the impact of the wafer falling into the liquid can be reduced to prevent chips and chips from being generated on the wafer. Further, it can be prevented more reliably.

【0013】[0013]

【実施例】以下に本発明の一実施例を添付図面に基づい
て説明する。
An embodiment of the present invention will be described below with reference to the accompanying drawings.

【0014】図1乃至図4は本発明に係るウエーハ切り
離し方法をその工程順に示す断面図、図5は本発明に係
るワイヤーソー装置のワイヤーソー本体の斜視図、図6
はローラ端部の破断側面図、図7はワイヤーソー装置に
よるワークの切断作業を示す断面図である。
FIGS. 1 to 4 are sectional views showing a wafer separating method according to the present invention in the order of steps, FIG. 5 is a perspective view of a wire saw body of a wire saw apparatus according to the present invention, and FIG.
Is a cutaway side view of a roller end, and FIG. 7 is a cross-sectional view showing a work of cutting a work by a wire saw device.

【0015】先ず、ワイヤーソー本体1の構成を図5に
基づいて説明すると、該ワイヤーソー本体1は3つのロ
ーラ2,3,4を三角形の各頂点位置に互いに平行、且
つ回転自在に配して構成され、これらのローラ2,3,
4間には線径0.08〜0.25mm程度の特殊ピアノ
線から成る1本のワイヤー5が所定のピッチで螺旋状に
巻回されている。
First, the configuration of the wire saw main body 1 will be described with reference to FIG. 5. The wire saw main body 1 has three rollers 2, 3, and 4 arranged at respective apexes of a triangle in a parallel and rotatable manner. And these rollers 2, 3,
A single wire 5 made of a special piano wire having a wire diameter of about 0.08 to 0.25 mm is spirally wound between the four at a predetermined pitch.

【0016】そして、上方の2つのローラ2,3の間で
あって、且つこれらローラ2,3の上方には、単結晶イ
ンゴット等のワークWが当て板6を介してワーク切断治
具7に保持されてセットされており、該ワークWは、不
図示の駆動手段によってワーク切断治具7が上下動せし
められることによって、該ワーク切断治具7と共に上下
動する。上記当て板はガラス、セラミック、グラファイ
ト等の材料で構成され、これの下面には、前記ワークW
がそのオリエンテーション・フラットWaが真下を向く
ような姿勢で接着保持されている。そして、この当て板
6には、これを図示a方向(すなわち、ローラ2,3間
に張設されたワイヤー5の移動方向(図示矢印b方向)
に対して直角方向、且つ水平方向)に移動せしめるため
の当て板駆動手段8が接続されている。
A work W such as a single crystal ingot is placed on a work cutting jig 7 via a backing plate 6 between the upper two rollers 2 and 3 and above the rollers 2 and 3. The work W is held and set, and the work W moves up and down together with the work cutting jig 7 when the work cutting jig 7 is moved up and down by driving means (not shown). The backing plate is made of a material such as glass, ceramic, and graphite, and the work W
Is held in an attitude such that the orientation flat Wa faces directly below. The backing plate 6 is moved in the direction a in the drawing ( that is, the direction of movement of the wire 5 stretched between the rollers 2 and 3 (in the direction of the arrow b in the drawing)).
(A right angle direction and a horizontal direction with respect to ) is connected.

【0017】又、下方のローラ4は駆動ローラであっ
て、これは駆動モータ9によって正逆転せしめられる。
The lower roller 4 is a driving roller, which is rotated forward and backward by a driving motor 9.

【0018】ところで、上記ローラ2の端部の構成が図
6に示されるが、該ローラ2は、鋳鉄製の芯金10に中
空の樹脂製円筒11を圧入して構成され、芯金10はベ
アリング12を介して本体フレーム13に回転自在に支
承されている。そして、樹脂製円筒11の外周には所定
のピッチ(所望のウエーハ厚さ+切り代)で溝14が螺
旋状に形成されており、この溝14に前記ワイヤー5が
嵌まり込んでいる。尚、以上は特にローラ2の構成につ
いて説明したが、他のローラ3,4の構成もローラ2の
それと同様である。
The configuration of the end of the roller 2 is shown in FIG. 6. The roller 2 is formed by press-fitting a hollow resin cylinder 11 into a core metal 10 made of cast iron. The main body frame 13 is rotatably supported via a bearing 12. Grooves 14 are spirally formed on the outer periphery of the resin cylinder 11 at a predetermined pitch (desired wafer thickness + cut allowance), and the wire 5 is fitted into the grooves 14. Although the configuration of the roller 2 has been particularly described above, the configuration of the other rollers 3 and 4 is the same as that of the roller 2.

【0019】又、図5に示すように、前記ローラ2,3
の上方にはスラリー(砥液)15(図7参照)を噴出す
べきノズル16が設置されており、両ローラ2,3の対
向間隙(ワークWの直下、かつワイヤー5の直下)
は、ノズル16から噴出したスラリー15を受けるスラ
リー溜り槽17が設けられており、このスラリー溜り槽
17の内面には所定厚さ(本実施例では、10mm)の
ウレタンフォーム等の緩衝材18(図4参照)が貼設さ
れている。尚、スラリー15は、ラップ砥粒と研削液の
混合液であって、これは不図示のスラリータンクに貯留
されている。
Further, as shown in FIG.
A nozzle 16 for ejecting a slurry (abrasive liquid) 15 (see FIG. 7) is provided above the roller, and a pair of rollers 2 and 3 is provided.
A slurry reservoir 17 for receiving the slurry 15 ejected from the nozzle 16 is provided in the gap (immediately below the workpiece W and immediately below the wire 5), and an inner surface of the slurry reservoir 17 has a predetermined thickness (for example, In the embodiment, a cushioning material 18 (see FIG. 4) such as urethane foam of 10 mm) is attached. The slurry 15 is a mixture of lapping abrasive grains and a grinding fluid, and is stored in a slurry tank (not shown).

【0020】次に、本ワイヤーソー装置の作用を説明す
る。
Next, the operation of the wire saw device will be described.

【0021】本実施例に係るワイヤーソー装置はワーク
Wを鉛直下方に移動せしめる鉛直下降方式を採用する装
置であって、これのワイヤーソー本体1において、当て
板6を介してワーク切断治具7に保持されたワークWが
下動してこれがローラ2,3間に張設されたワイヤー5
に押圧される。そして、この状態で駆動モータ9が駆動
されて駆動ローラ4が交互に正逆転せしめられると同時
に、ノズル16からスラリー15がワークWとワイヤー
5との接触部に供給されると、図7に示すように、ワー
クWは、往復移動するワイヤー5とスラリー15による
ラッピング作用によって所定の厚さに切断されていく
(図1参照)。
The wire saw apparatus according to the present embodiment is an apparatus employing a vertical descent method for moving a work W vertically downward. In the wire saw body 1, a work cutting jig 7 is provided via a backing plate 6. The workpiece W held by the wire 5 moves downward, and the wire W is stretched between the rollers 2 and 3.
Is pressed. Then, in this state, when the drive motor 9 is driven and the drive roller 4 is alternately rotated forward and backward, and the slurry 15 is supplied from the nozzle 16 to the contact portion between the work W and the wire 5, as shown in FIG. As described above, the work W is cut to a predetermined thickness by the lapping action of the wire 5 and the slurry 15 that reciprocate (see FIG. 1).

【0022】そして、図2に示すように、ワイヤー5に
よるワークWの切断が終了し、該ワークWから複数枚の
ウエーハWiが切り出された後においても、当て板6を
更に下降させてワイヤー5を該当て板6に所定深さだけ
喰い込ませ、この状態から図3に示すように前記当て板
駆動手段8を駆動して当て板6をワイヤー5の移動方向
(図3の紙面に垂直な方向)に対して直角方向、かつ水
平方向(図3の矢印a方向)に所定量(ワイヤー5の配
列ピッチ(本実施例では、1.5mm)を最大とする
量)だけ所定速度(本実施例では、0.2〜0.5mm
/min)で移動させれば、図4に示すように、全ウエ
ーハWiが当て板6の一部6aと一体で当て板6から切
り離され、自重により同時にスラリー溜り槽17内のス
ラリー15中に落下する。このスラリー15中に落下す
るウエーハWiは、スラリー15の緩衝作用に加えて、
スラリー溜り槽17の内面に貼設された前記緩衝材18
の緩衝作用によってその衝撃が吸収緩和される。
Then, as shown in FIG. 2, even after the cutting of the work W by the wire 5 is completed and a plurality of wafers Wi are cut out from the work W, the contact plate 6 is further lowered and the wire 5 In this state, the contact plate driving means 8 is driven to move the contact plate 6 in the moving direction of the wire 5 as shown in FIG.
(Perpendicular to the plane of FIG. 3) and water
In the horizontal direction (the direction of the arrow a in FIG. 3), a predetermined amount (the amount that maximizes the arrangement pitch of the wires 5 (1.5 mm in this embodiment)) is a predetermined speed (0.2 to 0. 5mm
/ Min), as shown in FIG. 4, all the wafers Wi are cut off from the backing plate 6 integrally with the part 6a of the backing plate 6, and the weight in the slurry storage tank 17 is simultaneously reduced by its own weight.
It falls into rally 15. The wafer Wi falling into the slurry 15 has the buffering action of the slurry 15,
The buffer material 18 stuck on the inner surface of the slurry reservoir 17
The shock is absorbed and alleviated by the buffering action of.

【0023】以上のように、本実施例によれば、ウエー
ハWiが当て板6の一部6aと共にワイヤー5によって
切り離され、切り離された全ウエーハWiは自重によっ
て自然落下してスラリー溜り17のスラリー15中に投
入されるため、従来のワイヤー抜き作業が不要となり、
全ウエーハWiを、これにチップや欠けを発生させるこ
となく、同時に効率良く切り離すことができる。尚、前
述のように、スラリー15中に投入されるウエーハWi
はスラリー15と緩衝材18による緩衝作用を受けるた
め、これに加えられる衝撃が小さく抑えられ、該ウエー
ハWiにチップや欠けが発生するのが更に確実に防がれ
る。因に、従来法(ワイヤー抜き作業を含む方法)によ
るウエーハ切り離しではウエーハのチップや欠けの発生
率が8%となるのに対し、本発明方法(スラリー溜りに
緩衝材を貼設しない場合)では3%と低く抑えられ、特
にスラリー溜りに緩衝材を貼設した場合には0%とする
ことができた。
As described above, according to the present embodiment, the wafer Wi is separated by the wire 5 together with the part 6a of the backing plate 6, and all the separated wafers Wi fall naturally by their own weight and the slurry in the slurry pool 17 is removed. Because it is put into the inside of 15, the conventional wire removal work becomes unnecessary,
All the wafers Wi can be simultaneously and efficiently separated without generating chips or chips. As described above, the wafer Wi charged into the slurry 15
Is subjected to a buffering action by the slurry 15 and the buffer material 18, so that the impact applied thereto is suppressed to a small extent, and the generation of chips and chips on the wafer Wi is more reliably prevented. By the way, in the conventional method (a method including a wire removing operation), the rate of occurrence of chips and chips in the wafer is 8%, whereas in the method of the present invention (when no buffer material is attached to the slurry reservoir), It was suppressed to as low as 3%, and could be reduced to 0% particularly when a buffer material was attached to the slurry reservoir.

【0024】[0024]

【発明の効果】以上の説明で明らかな如く、本発明によ
れば、当て板の下面に保持されたワークを、複数のロー
ラ間に螺旋状に巻回されたワイヤーに対して下降させる
鉛直下降方式を採用し、ワークをワイヤーに押圧して該
ワークとワイヤーとの接触部にスラリーを供給しながら
ワイヤーを移動させてワークから複数枚のウエーハを切
り出すワイヤーソー装置に適用されるウエーハ切り離し
方法において、内部に液体が貯留されている液溜り槽を
前記ワイヤーの下方、かつワークの直下に配置し、前記
ワイヤーによるワークの切断が終了した後、当て板を更
に下降させてワイヤーを該当て板に所定深さだけ喰い込
ませ、この状態から当て板をワイヤーの移動方向に対し
直角方向、かつ水平方向に移動させてウエーハを当て
板の一部と共に当て板から切り離し、切り離されたウエ
ーハを前記液溜り槽の液中に自然落下させるようにした
ため、複数枚のウエーハを、これにチップや欠けを発生
させることなく、同時に効率良く切り離すことができる
という効果が得られる。
As is apparent from the above description, according to the present invention, the workpiece held on the lower surface of the backing plate is lowered vertically with respect to the wire spirally wound between the plurality of rollers. In a wafer separating method applied to a wire saw device which presses a work to a wire and feeds a slurry to a contact portion between the work and the wire to move the wire and cut out a plurality of wafers from the work. , A liquid storage tank in which liquid is stored
It is arranged below the wire and directly below the work, and after the cutting of the work by the wire is completed, the caul plate is further lowered so that the wire is bitten into the corresponding plate by a predetermined depth, and from this state the caul plate disconnection from perpendicular direction, and abutting with part in the horizontal direction by moving against the wafer plate plate with respect to the moving direction of the wire, detached weather
Since the wafers are allowed to fall naturally into the liquid in the liquid storage tank, an effect is obtained in which a plurality of wafers can be cut off efficiently simultaneously without generating chips or chips.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明に係るウエーハ切り離し方法をその工程
順に示す断面図である。
FIG. 1 is a cross-sectional view showing a wafer separating method according to the present invention in the order of steps.

【図2】本発明に係るウエーハ切り離し方法をその工程
順に示す断面図である。
FIG. 2 is a sectional view showing a wafer separating method according to the present invention in the order of steps.

【図3】本発明に係るウエーハ切り離し方法をその工程
順に示す断面図である。
FIG. 3 is a sectional view showing a wafer separating method according to the present invention in the order of steps.

【図4】本発明に係るウエーハ切り離し方法をその工程
順に示す断面図である。
FIG. 4 is a sectional view showing a wafer separating method according to the present invention in the order of steps.

【図5】本発明に係るワイヤーソー装置のワイヤーソー
本体の斜視図である。
FIG. 5 is a perspective view of a wire saw main body of the wire saw device according to the present invention.

【図6】ローラ端部の破断側面図である。FIG. 6 is a cutaway side view of a roller end.

【図7】ワイヤーソー装置によるワークの切断作業を示
す断面図である。
FIG. 7 is a cross-sectional view showing a work of cutting a work by a wire saw device.

【符号の説明】[Explanation of symbols]

1 ワイヤーソー本体 2,3,4 ローラ 5 ワイヤー 6 当て板 6a 当て板の一部 8 当て板駆動手段 17 スラリー溜り槽(液溜り槽) 18 緩衝材 DESCRIPTION OF SYMBOLS 1 Wire saw main body 2, 3, 4 Roller 5 Wire 6 Backing plate 6a Part of backing plate 8 Backing plate drive means 17 Slurry storage tank (liquid storage tank) 18 Buffer material

Claims (3)

(57)【特許請求の範囲】(57) [Claims] 【請求項1】 当て板の下面に保持されたワークを、複
数のローラ間に螺旋状に巻回されたワイヤーに対して下
降させる鉛直下降方式を採用し、ワークをヤイヤーに押
圧して該ワークとワイヤーとの接触部にスラリーを供給
しながらワイヤーを移動させてワークから複数枚のウエ
ーハを切り出すワイヤーソー装置に適用される方法であ
って、内部に液体が貯留されている液溜り槽を前記ワイ
ヤーの下方、かつワークの直下に配置し、前記ワイヤー
によるワークの切断が終了した後、当て板を更に下降さ
せてワイヤーを該当て板に所定深さだけ喰い込ませ、こ
の状態から当て板をワイヤーの移動方向に対して直角方
向、かつ水平方向に移動させてウエーハを当て板の一部
と共に当て板から切り離し、切り離されたウエーハを前
記液溜り槽の液中に自然落下させることを特徴とするウ
エーハ切り離し方法。
1. A vertical descent method in which a work held on a lower surface of a backing plate is lowered with respect to a wire spirally wound between a plurality of rollers, and the work is pressed against a wire to press the work. A method applied to a wire saw device that cuts a plurality of wafers from a work by moving a wire while supplying a slurry to a contact portion of the wire, wherein the liquid is stored in a liquid reservoir tank. Wai
Yer lower, and directly under the workpiece, after the cutting of the workpiece by the wire has been completed, caul plate was further lowered by bite a predetermined depth into the plate wire Te applicable, the plate against this state At right angles to the direction of wire movement
In a horizontal and horizontal direction to separate the wafer from the caul plate with a part of the caul plate, and
A method for separating a wafer, wherein the wafer is dropped naturally into the liquid in the liquid storage tank .
【請求項2】 当て板の下面に保持されたワークを、複
数のローラ間に螺旋状に巻回されたワイヤーに対して下
降させる鉛直下降方式を採用し、ワークをヤイヤーに押
圧して該ワークとワイヤーとの接触部にスラリーを供給
しながらワイヤーを移動させてワークから複数枚のウエ
ーハを切り出すワイヤーソー装置において、前記当て板
を前記ワイヤーの移動方向に対して直角方向、かつ水平
方向に移動せしめる当て板駆動手段を設け、内部に液体
が貯留されている液溜り槽を、前記ワイヤーの下方、か
つワークの直下に設けたことを特徴とするワイヤーソー
装置。
2. A vertical descent method in which a work held on a lower surface of a backing plate is lowered with respect to a wire spirally wound between a plurality of rollers, and the work is pressed against a wire to press the work. In a wire saw device that cuts a plurality of wafers from a work by moving a wire while supplying slurry to a contact portion between the wire and a wire, the contact plate is moved in a direction perpendicular to the moving direction of the wire and horizontally.
Provide a contact plate drive means for moving the
The liquid storage tank in which
A wire saw device provided immediately below one work .
【請求項3】 前記液溜り槽は、スラリー溜り槽であっ
て、これの内面には所定厚さの緩衝材が貼設されている
ことを特徴とする請求項2記載のワイヤーソー装置。
3. The wire saw device according to claim 2, wherein the liquid storage tank is a slurry storage tank, and a buffer material having a predetermined thickness is adhered to an inner surface of the slurry storage tank.
JP4058790A 1992-02-13 1992-02-13 Wafer separating method and wire saw device Expired - Lifetime JP2757086B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP4058790A JP2757086B2 (en) 1992-02-13 1992-02-13 Wafer separating method and wire saw device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4058790A JP2757086B2 (en) 1992-02-13 1992-02-13 Wafer separating method and wire saw device

Publications (2)

Publication Number Publication Date
JPH05220731A JPH05220731A (en) 1993-08-31
JP2757086B2 true JP2757086B2 (en) 1998-05-25

Family

ID=13094372

Family Applications (1)

Application Number Title Priority Date Filing Date
JP4058790A Expired - Lifetime JP2757086B2 (en) 1992-02-13 1992-02-13 Wafer separating method and wire saw device

Country Status (1)

Country Link
JP (1) JP2757086B2 (en)

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CH698391B1 (en) * 2003-12-17 2009-07-31 Applied Materials Switzerland Wire sawing device.
EP1748873A1 (en) * 2004-03-30 2007-02-07 Solaicx, Inc. Method and apparatus for cutting ultra thin silicon wafers
US20130251940A1 (en) * 2012-03-23 2013-09-26 Sheng Sun Method of cutting an ingot for solar cell fabrication
EP2711979A1 (en) 2012-09-24 2014-03-26 Meyer Burger AG Wafer cutting system
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Also Published As

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