JP2698278B2 - Hybrid integrated circuit device - Google Patents

Hybrid integrated circuit device

Info

Publication number
JP2698278B2
JP2698278B2 JP4064992A JP4064992A JP2698278B2 JP 2698278 B2 JP2698278 B2 JP 2698278B2 JP 4064992 A JP4064992 A JP 4064992A JP 4064992 A JP4064992 A JP 4064992A JP 2698278 B2 JP2698278 B2 JP 2698278B2
Authority
JP
Japan
Prior art keywords
metal substrate
integrated circuit
insulating metal
insulating
circuit device
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP4064992A
Other languages
Japanese (ja)
Other versions
JPH06177295A (en
Inventor
栄寿 前原
秀史 西搭
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sanyo Electric Co Ltd
Original Assignee
Sanyo Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sanyo Electric Co Ltd filed Critical Sanyo Electric Co Ltd
Priority to JP4064992A priority Critical patent/JP2698278B2/en
Publication of JPH06177295A publication Critical patent/JPH06177295A/en
Application granted granted Critical
Publication of JP2698278B2 publication Critical patent/JP2698278B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/4805Shape
    • H01L2224/4809Loop shape
    • H01L2224/48091Arched
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/481Disposition
    • H01L2224/48151Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/48221Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/48225Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
    • H01L2224/48227Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation connecting the wire to a bond pad of the item
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/49Structure, shape, material or disposition of the wire connectors after the connecting process of a plurality of wire connectors
    • H01L2224/4901Structure
    • H01L2224/4903Connectors having different sizes, e.g. different diameters
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/19Details of hybrid assemblies other than the semiconductor or other solid state devices to be connected
    • H01L2924/191Disposition
    • H01L2924/19101Disposition of discrete passive components
    • H01L2924/19107Disposition of discrete passive components off-chip wires

Landscapes

  • Insulated Metal Substrates For Printed Circuits (AREA)
  • Cooling Or The Like Of Semiconductors Or Solid State Devices (AREA)
  • Structures Or Materials For Encapsulating Or Coating Semiconductor Devices Or Solid State Devices (AREA)

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【産業上の利用分野】本発明は混成集積回路装置に関
し、詳細には、集積回路と絶縁金属基板間および放熱板
間の絶縁を改善した混成集積回路装置に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a hybrid integrated circuit device, and more particularly, to a hybrid integrated circuit device having improved insulation between an integrated circuit and an insulating metal substrate and between a heatsink.

【0002】[0002]

【従来の技術】図3および図4を参照して従来の混成集
積回路装置を説明する。なお、図4は図3の円内の構造
を説明する断面図である。従来の混成集積回路装置は第
1の絶縁金属基板(60)、この第1の絶縁金属基板(60)上
に、第1の絶縁層(62)を介して形成したワイアイボンデ
ィングパッド(64)、導電路(65)、ダイボンドパッド(6
6)、その他のパッドからなる回路パターン、ダイボンド
パッド(66)上に固着、搭載される集積回路素子(68)等の
半導体素子、チップコンデンサ、あるいはチップ抵抗
(図示しない)並びに外部リード(70)、主として絶縁性
向上のために使用される第2の絶縁金属基板(90)および
搭載素子を気密封止するケース材(72)等から構成され
る。
2. Description of the Related Art A conventional hybrid integrated circuit device will be described with reference to FIGS. FIG. 4 is a cross-sectional view illustrating the structure within the circle in FIG. A conventional hybrid integrated circuit device comprises a first insulating metal substrate (60), and a wire bonding pad (64) formed on the first insulating metal substrate (60) via a first insulating layer (62). , Conductive path (65), die bond pad (6
6), other circuit patterns including pads, semiconductor elements such as integrated circuit elements (68) fixed and mounted on die bond pads (66), chip capacitors or chip resistors (not shown), and external leads (70) And a case material (72) for hermetically sealing the second insulating metal substrate (90) mainly used for improving the insulating property and the mounted element.

【0003】第1および第2の絶縁金属基板(60)(90)に
は放熱特性および加工性を考慮して略2mm厚のアルミ
ニウムが使用され、絶縁性の向上のためにその表面が陽
極酸化処理される。第1の絶縁金属基板(60)は矩形であ
り、混成集積回路装置が略完成した時点で、数単位乃至
十数単位の混成集積回路装置基板から単位混成集積回路
装置のサイズに分割プレスされる。また、第2の絶縁金
属基板(90)はケース材(72)と略同一の平面形状であり、
後述するケース材(72)のネジ孔(74)に対応する位置に同
軸の孔(92)が形成される。
The first and second insulating metal substrates (60) and (90) are made of aluminum having a thickness of about 2 mm in consideration of heat radiation characteristics and workability. It is processed. The first insulated metal substrate (60) is rectangular, and when the hybrid integrated circuit device is substantially completed, it is divided and pressed from the hybrid integrated circuit device substrate of several units to several tens of units to the size of the unit hybrid integrated circuit device. . The second insulated metal substrate (90) has substantially the same planar shape as the case material (72),
A coaxial hole (92) is formed at a position corresponding to the screw hole (74) of the case material (72) described later.

【0004】各種パッド(64)(66)および導電路(65)は、
ポリイミド樹脂等の接着性を有する熱硬化性絶縁樹脂と
略35μm厚の銅箔とのクラッド材を温度150℃〜1
70℃、1平方センチメートル当り50〜100Kgの
圧力で第1の絶縁金属基板(60)にホットプレスした後、
その銅箔をホトエッチングする等して所定パターンに形
成される。なお、前記熱硬化性絶縁樹脂はこのホットプ
レス工程で完全硬化して略35μm厚の第1の絶縁層(6
2)となる。
The various pads (64) (66) and the conductive path (65)
A thermosetting insulating resin having adhesiveness such as a polyimide resin and a clad material of a copper foil having a thickness of about 35 μm are heated at a temperature of 150 ° C. to 1 ° C.
After hot pressing the first insulating metal substrate (60) at 70 ° C. and a pressure of 50 to 100 kg per square centimeter,
The copper foil is formed into a predetermined pattern by photo-etching or the like. The thermosetting insulating resin is completely cured in this hot pressing step, and the first insulating layer (6
2).

【0005】集積回路素子(68)等の半導体素子およびそ
の他の回路素子にはチップ部品が使用され、集積回路素
子(68)は銀ペースト等によりダイボンドパッド(66)に固
着される。また、チップコンデンサ、あるいはチップ抵
抗、外部リード(70)等の異型部品は半田固着される。こ
れら回路素子は所定のパッド(66)上にスクリーン印刷し
たソルダーペーストに一時的に付着させた後、リフロー
して完全固着される。
[0005] Chip components are used for semiconductor elements such as the integrated circuit element (68) and other circuit elements, and the integrated circuit element (68) is fixed to the die bond pad (66) with silver paste or the like. In addition, odd-shaped components such as chip capacitors, chip resistors, and external leads (70) are fixed by soldering. These circuit elements are temporarily attached to a solder paste screen-printed on a predetermined pad (66), and then reflowed to be completely fixed.

【0006】ケース材(72)は例えばファイバグラス・レ
インホースPET(FRPET)を略箱形状に射出成形
したものであり、通常、その長手方向端部に、混成集積
回路装置を放熱板に結合するネジ孔(74)を備える。この
ケース材(72)はエポキシ含浸ポリエステル不繊布を接着
シートとして、加熱圧着して(125℃、8時間)、第
1の絶縁金属基板(60)の終辺部で固着され、その搭載回
路素子を封止する。この後、熱硬化性絶縁樹脂、シリコ
ン樹脂等の第2の絶縁層(94)により第1の絶縁金属基板
(60)の裏面に第2の絶縁金属基板(90)が接着される。そ
して、この第2の絶縁層(94)により放熱板と第1の絶縁
金属基板(60)上の回路との高い絶縁が達成される。
The case material (72) is, for example, formed by injection molding a fiberglass rain hose PET (FRPET) into a substantially box shape. Usually, a hybrid integrated circuit device is connected to a heat radiating plate at the longitudinal end. A screw hole (74) is provided. The case material (72) is heated and pressed (125 ° C., 8 hours) using an epoxy impregnated polyester non-woven cloth as an adhesive sheet, and is fixed at the end of the first insulating metal substrate (60). Is sealed. Thereafter, a first insulating metal substrate is formed by a second insulating layer (94) such as a thermosetting insulating resin or a silicon resin.
A second insulating metal substrate (90) is adhered to the back surface of (60). The second insulating layer (94) achieves high insulation between the heat sink and the circuit on the first insulating metal substrate (60).

【0007】[0007]

【発明が解決しようとする課題】従来の混成集積回路装
置は第1および第2の絶縁金属基板(60)(90)の表面が陽
極酸化処理されていることと第1および第2の絶縁層(6
2)(94)によりかなりの絶縁強度が得られているものの、
さらに高電圧の用途に適する高耐圧構造が求められてい
る。
The conventional hybrid integrated circuit device has a structure in which the surfaces of first and second insulating metal substrates (60) and (90) are anodized and the first and second insulating layers are provided. (6
2) Although considerable insulation strength is obtained by (94),
Further, there is a demand for a high breakdown voltage structure suitable for high voltage applications.

【0008】なお、第1の絶縁金属基板(60)の端面と混
成集積回路装置を放熱板に結合するネジ孔(74)との距離
を大きく設計することによって高耐圧化が達成されるも
のの、小型化の要求に応えることができない問題を有す
る。従って、本発明の目的は高耐圧構造であって、小型
の混成集積回路装置を提供することにある。
Although the distance between the end face of the first insulated metal substrate (60) and the screw hole (74) for connecting the hybrid integrated circuit device to the heat sink is designed to be large, a high withstand voltage is achieved. There is a problem that the demand for miniaturization cannot be met. Accordingly, an object of the present invention is to provide a small-sized hybrid integrated circuit device having a high withstand voltage structure.

【0009】[0009]

【課題を解決するための手段】請求項1の発明は、第2
の絶縁金属基板に、放熱板に結合するネジのためのブッ
シュ孔を形成し、このブッシュ孔にブッシュを圧入した
点を主要な特徴とする。請求項2の発明は、第1の絶縁
金属基板の搭載回路素子を封止するケース材の壁に樹脂
溜を形成した点を主要な特徴とする。
Means for Solving the Problems The invention of claim 1 is the second invention.
The main feature is that a bush hole for a screw to be connected to the heat sink is formed in the insulating metal substrate, and the bush is pressed into the bush hole. The main feature of the invention of claim 2 is that a resin reservoir is formed on a wall of a case material for sealing the mounted circuit element of the first insulating metal substrate.

【0010】請求項3の発明は、放熱板に結合するネジ
孔に直近のケース材の壁に樹脂溜を形成した点を主要な
特徴とする。
The invention according to claim 3 is characterized in that a resin reservoir is formed on a wall of a case member immediately adjacent to a screw hole connected to a heat sink.

【0011】[0011]

【作用】第2の絶縁金属基板に、放熱板に結合するネジ
のためのブッシュ孔を形成し、このブッシュ孔にブッシ
ュを圧入する請求項1の構成は、第2の絶縁金属基板の
ブッシュ孔断面を絶縁被覆し、第1絶縁金属基板上の回
路と第2の絶縁金属基板間を絶縁する。
A bush hole for a screw to be connected to a heat sink is formed in the second insulating metal substrate, and the bush is press-fitted into the bush hole. The section is insulated and insulated between the circuit on the first insulated metal substrate and the second insulated metal substrate.

【0012】第1の絶縁金属基板の搭載回路素子を封止
するケース材の壁に樹脂溜を形成する請求項2の構成
は、樹脂溜の樹脂の浸透により第1絶縁金属基板の端面
および第2の絶縁金属基板のネジ孔の断面を絶縁被覆す
る。放熱板に結合するネジ孔に直近のケース材の壁に樹
脂溜を形成する請求項3の構成は、より簡素な構造、工
程により第1絶縁金属基板の端面および第2の絶縁金属
基板のネジ孔の断面を絶縁被覆することを可能にする。
The resin reservoir is formed on the wall of the case material for sealing the mounted circuit element of the first insulating metal substrate. The resin reservoir penetrates the resin into the end surface of the first insulating metal substrate and the second insulating metal substrate. The section of the screw hole of the insulating metal substrate of No. 2 is insulated. 4. The structure according to claim 3, wherein the resin reservoir is formed on the wall of the case material immediately adjacent to the screw hole connected to the heat sink, by means of a simpler structure and process. It is possible to insulate the cross section of the hole.

【0013】[0013]

【実施例】図1を参照して本発明の第1の実施例を説明
する。なお、図1は図4に示した従来例の円内の構造に
対応する構造を断面図で示している。本発明の混成集積
回路装置は、半導体素子およびその他の回路素子を搭載
する第1の絶縁金属基板(10)、この第1の絶縁金属基板
(10)の搭載素子を封止するケース材(20)、主として、絶
縁性向上のために使用される第2の絶縁金属基板(40)か
ら構成される。
DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS A first embodiment of the present invention will be described with reference to FIG. FIG. 1 is a sectional view showing a structure corresponding to the structure in the circle of the conventional example shown in FIG. A hybrid integrated circuit device according to the present invention comprises a first insulating metal substrate (10) on which a semiconductor element and other circuit elements are mounted;
The case material (20) for sealing the mounting element of (10) is mainly composed of a second insulating metal substrate (40) used for improving insulation.

【0014】第1および第2の絶縁金属基板(10)(40)に
は放熱特性および加工性を考慮して略2mm厚のアルミ
ニウムが使用され、絶縁性の向上のためにその表面が陽
極酸化処理される。第1の絶縁金属基板(10)は矩形であ
り、混成集積回路装置が略完成した時点で、数単位乃至
十数単位の混成集積回路装置基板から単位混成集積回路
装置のサイズに分割プレスされる。また、第2の絶縁金
属基板(40)はケース材(20)と略同一の平面形状であり、
第1の絶縁金属基板(10)より大面積である。
The first and second insulating metal substrates (10) and (40) are made of aluminum having a thickness of about 2 mm in consideration of heat radiation characteristics and workability. It is processed. The first insulated metal substrate (10) is rectangular, and when the hybrid integrated circuit device is substantially completed, it is divided and pressed from the hybrid integrated circuit device substrate of several to several tens of units to the size of the unit hybrid integrated circuit device. . The second insulated metal substrate (40) has substantially the same planar shape as the case material (20),
The area is larger than that of the first insulating metal substrate (10).

【0015】ワイアボンディングパッド(14)、ダイボン
ドパッド(16)、その他のパッドおよび導電路(図示しな
い)は、ポリイミド樹脂等の接着性を有する熱硬化性絶
縁樹脂と略35μm厚の銅箔とのクラッド材を温度15
0℃〜170℃、1平方センチメートル当り50〜10
0Kgの圧力で第1の絶縁金属基板(10)にホットプレス
した後、その銅箔をホトエッチングする等して所定パタ
ーンに形成される。なお、前記熱硬化性絶縁樹脂はこの
ホットプレス工程で完全硬化して略35μm厚の絶縁層
(12)となる。
The wire bonding pad (14), die bond pad (16), other pads and conductive paths (not shown) are made of an adhesive thermosetting insulating resin such as a polyimide resin and a copper foil having a thickness of about 35 μm. Clad material at temperature 15
0 ° C to 170 ° C, 50 to 10 per square centimeter
After hot-pressing the first insulating metal substrate (10) at a pressure of 0 kg, the copper foil is formed into a predetermined pattern by photo-etching or the like. The thermosetting insulating resin is completely cured in this hot pressing step to form an insulating layer having a thickness of about 35 μm.
(12).

【0016】集積回路素子(18)等の半導体素子およびそ
の他の回路素子にはチップ部品が使用され、銀ペースト
等により所定のパッド(16)に固着される。また、チップ
コンデンサ、あるいはチップ抵抗、外部リード(何れも
図示されていない)等の異型部品は半田固着される。こ
れら回路素子は所定のパッド上にソルダーペーストをス
クリーン印刷し、これに一時的に付着させた後、リフロ
ーして完全固着される。
Chip components are used for semiconductor elements such as the integrated circuit element (18) and other circuit elements, and are fixed to predetermined pads (16) with silver paste or the like. Further, odd-shaped components such as a chip capacitor, a chip resistor, and external leads (both not shown) are fixed by soldering. These circuit elements are screen-printed with solder paste on predetermined pads, temporarily attached thereto, and then reflowed to be completely fixed.

【0017】ケース材(20)はファイバグラス・レインホ
ースPET(FRPET)を略箱形状に射出成形して得
られる。ケース材(20)の壁(26)を、エポキシ含浸ポリエ
ステル不繊布を接着シートとして、第1の絶縁金属基板
(10)の周辺部に加熱圧着(125℃、8時間)して、第
1の絶縁金属基板(10)の搭載素子を封止した後、シリコ
ン樹脂あるいは通常の熱硬化性樹脂等による第2の絶縁
層(44)により第1の絶縁金属基板(10)の集積回路素子搭
載面の反対面に第2の絶縁金属基板(40)が固着される。
The case material (20) is obtained by injection molding a fiberglass rain hose PET (FRPET) into a substantially box shape. The wall (26) of the case material (20) is used as a first insulated metal substrate using an epoxy impregnated polyester non-woven cloth as an adhesive sheet.
After heat-pressing (125 ° C., 8 hours) around the periphery of (10) to seal the mounting element on the first insulating metal substrate (10), the second element made of silicon resin or ordinary thermosetting resin is used. The second insulating metal substrate (40) is fixed to the surface of the first insulating metal substrate (10) opposite to the surface on which the integrated circuit element is mounted by the insulating layer (44).

【0018】ケース材(20)には第1の絶縁金属基板(10)
の長手方向の端部直近に、この混成集積回路装置を放熱
板に結合するためのネジ孔(22)が形成され、その下部に
ネジ孔(22)より大口径のブッシュ孔が形成される。ま
た、ケース材(20)の下部の複数の辺には第2の絶縁金属
基板(40)の位置合わせのための段部(34)が形成される。
一方、第2の絶縁金属基板(40)には第1の絶縁金属基板
(10)のネジ孔(22)、あるいはブッシュ孔に対応する位置
にブッシュ孔(42)が形成され、第2の絶縁金属基板(40)
の固着により、ケース材(20)のネジ孔(22)と第2の絶縁
金属基板(40)のブッシュ孔(42)が同軸配置される。
The case material (20) includes a first insulating metal substrate (10).
A screw hole (22) for coupling the hybrid integrated circuit device to a heat sink is formed in the immediate vicinity of the end in the longitudinal direction, and a bush hole having a larger diameter than the screw hole (22) is formed below the screw hole (22). In addition, steps (34) for positioning the second insulated metal substrate (40) are formed on a plurality of lower sides of the case material (20).
On the other hand, the second insulating metal substrate (40) has the first insulating metal substrate.
A bush hole (42) is formed at a position corresponding to the screw hole (22) or the bush hole of (10), and the second insulating metal substrate (40) is formed.
As a result, the screw hole (22) of the case material (20) and the bush hole (42) of the second insulating metal substrate (40) are coaxially arranged.

【0019】ネジ孔(52)を備えるブッシュ(50)はフロン
樹脂により第2の絶縁金属基板(40)のブッシュ孔(42)よ
りいくらか大口径に、また、第2の絶縁金属基板(40)の
厚さより長く形成され、ブッシュ孔(42)に圧入される。
上記のように構成される本実施例では、ブッシュ(50)に
より第2の絶縁金属基板(40)のブッシュ孔(42)の断面が
被覆されるため、第1の絶縁金属基板(10)上の回路と第
2の絶縁金属基板(40)との間の高絶縁が確保される。ま
た、第1の絶縁金属基板(10)上の回路とネジ間の沿面距
離が増大する。このため、第1の絶縁金属基板(10)の端
部とケース材(20)のネジ孔(22)との距離を短くすること
ができ、混成集積回路装置の小型化が達成される。
The bush (50) having the screw hole (52) is made of fluorocarbon resin to have a somewhat larger diameter than the bush hole (42) of the second insulating metal substrate (40), and the second insulating metal substrate (40). And pressed into the bush hole (42).
In the present embodiment configured as described above, the bush (50) covers the cross section of the bush hole (42) of the second insulating metal substrate (40). High insulation between the circuit and the second insulating metal substrate (40) is ensured. Also, the creepage distance between the circuit and the screw on the first insulating metal substrate (10) increases. For this reason, the distance between the end of the first insulating metal substrate (10) and the screw hole (22) of the case material (20) can be shortened, and the miniaturization of the hybrid integrated circuit device is achieved.

【0020】図2を参照して本発明の第2の実施例を説
明する。なお、図2も図4に示した従来例の円内の構造
に対応する構造を断面図で示しており、先の実施例に対
応する個所には同一の符号を使用している。本実施例で
は、ケース材(20)の壁(26)に樹脂溜として使用される溝
(28)が形成され、第1の絶縁金属基板(10)とケース材(2
0)の加熱圧着直前に、この溝(28)に流動性の熱硬化性樹
脂(48)が適宜の手段で塗布される。そして、図示の状態
で、第1および第2の絶縁金属基板(10)(40)を固着する
熱処理時に、溝(28)に塗布した熱硬化性樹脂(48)が第1
および第2の絶縁金属基板(10)(40)とケース材(20)の間
隙に浸透し、硬化して、第1の絶縁金属基板(10)の端部
と第2の絶縁金属基板(40)のブッシュ孔(42)の断面を完
全に被覆する。なお、ケース材(20)の溝(28)はネジ孔(2
2)に近い位置の一部に形成すれば足りる。
A second embodiment of the present invention will be described with reference to FIG. FIG. 2 also shows a cross-sectional view of a structure corresponding to the structure in the circle of the conventional example shown in FIG. 4, and the same reference numerals are used for the portions corresponding to the previous embodiment. In the present embodiment, a groove used as a resin reservoir is formed on the wall (26) of the case material (20).
(28) is formed, the first insulated metal substrate (10) and the case material (2
Immediately before the thermocompression bonding of (0), a fluid thermosetting resin (48) is applied to the groove (28) by an appropriate means. Then, in the state shown in the figure, at the time of heat treatment for fixing the first and second insulating metal substrates (10) and (40), the thermosetting resin (48) applied to the groove (28) becomes the first.
And penetrates into the gap between the second insulating metal substrate (10) (40) and the case material (20) and cures, and the end of the first insulating metal substrate (10) and the second insulating metal substrate (40). ) Completely covers the cross section of the bush hole (42). In addition, the groove (28) of the case material (20) is
It is sufficient if it is formed at a part of the position close to 2).

【0021】図2は説明のため、第1および第2の絶縁
金属基板(10)(40)とケース材(20)の間隙が大きく描かれ
ているが、本実施例によれば、第1の絶縁金属基板(10)
上の回路と第2の絶縁金属基板(40)間、あるいは図示し
ないネジ間の沿面放電が防止されるため第1の絶縁金属
基板(10)と第2の絶縁金属基板(40)の基板サイズを殆ど
同一にすることができ、極めて小型の混成集積回路が得
られる。
FIG. 2 shows a large gap between the first and second insulating metal substrates (10) and (40) and the case material (20) for the sake of explanation. Insulated metal substrate (10)
Since the creeping discharge between the upper circuit and the second insulating metal substrate (40) or between the screw (not shown) is prevented, the substrate size of the first insulating metal substrate (10) and the second insulating metal substrate (40) is reduced. Can be made almost the same, and a very small hybrid integrated circuit can be obtained.

【0022】[0022]

【発明の効果】以上述べたように本発明の混成集積回路
装置は、第2の絶縁金属基板に、放熱板に結合するネジ
のためのブッシュ孔を形成し、このブッシュ孔にブッシ
ュを圧入するため、第2の絶縁金属基板のブッシュ孔断
面が絶縁被覆され、第1および第2の絶縁金属基板のサ
イズを略同一とすることができ、結果、小型化が達成さ
れる。
As described above, in the hybrid integrated circuit device according to the present invention, a bush hole for a screw to be connected to a heat sink is formed in a second insulating metal substrate, and a bush is pressed into this bush hole. Therefore, the cross section of the bush hole of the second insulated metal substrate is insulated and covered, and the sizes of the first and second insulated metal substrates can be made substantially the same. As a result, downsizing is achieved.

【0023】また、第1の絶縁金属基板の搭載回路素子
を封止するケース材の壁に樹脂溜を形成するため、樹脂
溜の樹脂の浸透により第1絶縁金属基板の端面および第
2の絶縁金属基板のネジ孔の断面を絶縁被覆することが
できる。この結果、小型化が達成される。さらに、放熱
板に結合するネジ孔に直近のケース材の壁に樹脂溜を形
成するため、より簡素なケース材構造、工程により第1
絶縁金属基板の端面および第2の絶縁金属基板のネジ孔
の断面を絶縁被覆することが可能になる。
Further, since the resin reservoir is formed on the wall of the case material for sealing the mounted circuit element of the first insulating metal substrate, the end surface of the first insulating metal substrate and the second insulating substrate are formed by the penetration of the resin in the resin reservoir. The cross section of the screw hole of the metal substrate can be covered by insulation. As a result, downsizing is achieved. Furthermore, since a resin reservoir is formed on the wall of the case material immediately adjacent to the screw hole to be connected to the heat sink, the first case material structure and process can be simplified.
It becomes possible to insulate the end face of the insulating metal substrate and the cross section of the screw hole of the second insulating metal substrate.

【図面の簡単な説明】[Brief description of the drawings]

【図1】第1の実施例の要部断面図。FIG. 1 is a sectional view of a main part of a first embodiment.

【図2】第2の実施例の要部断面図。FIG. 2 is a sectional view of a main part of a second embodiment.

【図3】一部を切断して示す従来例の斜視図。FIG. 3 is a perspective view of a conventional example shown with a part cut away.

【図4】従来例の要部断面図。FIG. 4 is a sectional view of a main part of a conventional example.

【符号の説明】[Explanation of symbols]

10 第1の絶縁金属基板 12 第1の絶縁層 14 ワイアボンディングパッド 16 ダイボンドパッド 20 ケース材 22 ネジ孔 40 第2の絶縁金属基板 42 ブッシュ孔 44 第2の絶縁層 50 ブッシュ 52 ネジ孔 Reference Signs List 10 first insulating metal substrate 12 first insulating layer 14 wire bonding pad 16 die bond pad 20 case material 22 screw hole 40 second insulating metal substrate 42 bush hole 44 second insulating layer 50 bush 52 screw hole

Claims (3)

(57)【特許請求の範囲】(57) [Claims] 【請求項1】 回路パターン上に複数の集積回路素子を
固着、搭載した第1の絶縁金属基板と、 混成集積回路装置を放熱板に結合するためのネジ孔を備
え、前記第1の絶縁金属基板の搭載回路素子を封止する
ケース材と、 前記ケース材のネジ孔に対応する位置にブッシュ孔が形
成され、第1の絶縁金属基板の集積回路素子搭載面の反
対面に絶縁性の接着剤により固着される第2の絶縁金属
基板と、 前記第2の絶縁金属基板のブッシュ孔に圧入されるブッ
シュから構成される混成集積回路装置。
A first insulating metal substrate on which a plurality of integrated circuit elements are fixed and mounted on a circuit pattern; and a screw hole for connecting a hybrid integrated circuit device to a heat sink. A case material for sealing the mounted circuit element of the substrate; and a bush hole formed at a position corresponding to the screw hole of the case material, and an insulating adhesive bonded to a surface of the first insulated metal substrate opposite to the integrated circuit element mounting surface. A hybrid integrated circuit device comprising: a second insulating metal substrate fixed by an agent; and a bush pressed into a bush hole of the second insulating metal substrate.
【請求項2】 回路パターン上に複数の集積回路素子を
固着、搭載した第1の絶縁金属基板と、 混成集積回路装置を放熱板に結合するためのネジ孔を備
え、第1の絶縁金属基板の搭載回路素子を封止する壁に
樹脂溜を形成したケース材と、 前記第1の絶縁金属基板の集積回路素子搭載面の反対面
に絶縁性の接着剤により固着される第2の絶縁金属基板
から構成され、 前記ケース材の樹脂溜から浸透する樹脂により第1の絶
縁金属基板の端部を被服したことを特徴とする混成集積
回路装置。
2. A first insulating metal substrate, comprising: a first insulating metal substrate having a plurality of integrated circuit elements fixed and mounted on a circuit pattern; and a screw hole for connecting the hybrid integrated circuit device to a heat sink. A case material in which a resin reservoir is formed on a wall for sealing the mounted circuit element, and a second insulating metal fixed to the surface of the first insulating metal substrate opposite to the integrated circuit element mounting surface with an insulating adhesive. A hybrid integrated circuit device comprising a substrate, wherein an end of the first insulating metal substrate is covered with a resin that penetrates from a resin reservoir of the case material.
【請求項3】 回路パターン上に複数の集積回路素子を
固着、搭載した第1の絶縁金属基板と、 混成集積回路装置を放熱板に結合するためのネジ孔を備
え、第1の絶縁金属基板の搭載回路素子を封止する壁の
前記ネジ孔近傍に樹脂溜を形成したケース材と、 前記第1の絶縁金属基板の集積回路素子搭載面の反対面
に絶縁性の接着剤により固着される第2の絶縁金属基板
から構成される混成集積回路装置。
3. A first insulating metal substrate comprising: a first insulating metal substrate having a plurality of integrated circuit elements fixed and mounted on a circuit pattern; and a screw hole for connecting the hybrid integrated circuit device to a heat sink. A case member having a resin reservoir formed in the vicinity of the screw hole on the wall for sealing the mounted circuit element, and an insulating adhesive fixed to a surface of the first insulating metal substrate opposite to the integrated circuit element mounting surface. A hybrid integrated circuit device comprising a second insulating metal substrate.
JP4064992A 1992-01-31 1992-01-31 Hybrid integrated circuit device Expired - Fee Related JP2698278B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP4064992A JP2698278B2 (en) 1992-01-31 1992-01-31 Hybrid integrated circuit device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4064992A JP2698278B2 (en) 1992-01-31 1992-01-31 Hybrid integrated circuit device

Publications (2)

Publication Number Publication Date
JPH06177295A JPH06177295A (en) 1994-06-24
JP2698278B2 true JP2698278B2 (en) 1998-01-19

Family

ID=12586405

Family Applications (1)

Application Number Title Priority Date Filing Date
JP4064992A Expired - Fee Related JP2698278B2 (en) 1992-01-31 1992-01-31 Hybrid integrated circuit device

Country Status (1)

Country Link
JP (1) JP2698278B2 (en)

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE10114572A1 (en) 2001-03-24 2002-11-07 Marquardt Gmbh Carrier for an electrical circuit, in particular for an electrical switch
US7232957B2 (en) 2003-09-25 2007-06-19 Sanyo Electric Co., Ltd. Hybrid integrated circuit device and method of manufacturing the same
JP4334335B2 (en) 2003-12-24 2009-09-30 三洋電機株式会社 Method for manufacturing hybrid integrated circuit device
JP4488733B2 (en) 2003-12-24 2010-06-23 三洋電機株式会社 A method for manufacturing a circuit board and a method for manufacturing a hybrid integrated circuit device.
TWI309962B (en) 2004-02-24 2009-05-11 Sanyo Electric Co Circuit device and menufacturing method thereof
JP4413054B2 (en) 2004-03-29 2010-02-10 三洋電機株式会社 Method for manufacturing hybrid integrated circuit device
JP4592333B2 (en) 2004-05-31 2010-12-01 三洋電機株式会社 Circuit device and manufacturing method thereof
JP2005347356A (en) * 2004-05-31 2005-12-15 Sanyo Electric Co Ltd Manufacturing method for circuit arrangement
JP2005347353A (en) 2004-05-31 2005-12-15 Sanyo Electric Co Ltd Circuit device and its manufacturing method
US7565738B2 (en) 2004-05-31 2009-07-28 Sanyo Electric Co., Ltd. Method for manufacturing circuit device
JP4471735B2 (en) 2004-05-31 2010-06-02 三洋電機株式会社 Circuit equipment
JP4383257B2 (en) 2004-05-31 2009-12-16 三洋電機株式会社 Circuit device and manufacturing method thereof
JP2005347354A (en) 2004-05-31 2005-12-15 Sanyo Electric Co Ltd Circuit device and its manufacturing method
JP2006019361A (en) 2004-06-30 2006-01-19 Sanyo Electric Co Ltd Circuit device and its manufacturing method
JP5831239B2 (en) 2012-01-16 2015-12-09 Tdk株式会社 Bus bar and electronic equipment

Also Published As

Publication number Publication date
JPH06177295A (en) 1994-06-24

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