JP2687540B2 - Trimming device for multilayer capacitors - Google Patents

Trimming device for multilayer capacitors

Info

Publication number
JP2687540B2
JP2687540B2 JP1012655A JP1265589A JP2687540B2 JP 2687540 B2 JP2687540 B2 JP 2687540B2 JP 1012655 A JP1012655 A JP 1012655A JP 1265589 A JP1265589 A JP 1265589A JP 2687540 B2 JP2687540 B2 JP 2687540B2
Authority
JP
Japan
Prior art keywords
capacitance
capacitor
multilayer capacitor
trimming device
optical system
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP1012655A
Other languages
Japanese (ja)
Other versions
JPH02192886A (en
Inventor
聡 堀越
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp filed Critical NEC Corp
Priority to JP1012655A priority Critical patent/JP2687540B2/en
Publication of JPH02192886A publication Critical patent/JPH02192886A/en
Application granted granted Critical
Publication of JP2687540B2 publication Critical patent/JP2687540B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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  • Fixed Capacitors And Capacitor Manufacturing Machines (AREA)
  • Laser Beam Processing (AREA)

Description

【発明の詳細な説明】 技術分野 本発明は積層型コンデンサのトリミング装置に関し、
特にセラミック基板に作り込まれた積層型セラミックコ
ンデンサの容量値の調整を行う積層型コンデンサのトリ
ミング装置に関する。
TECHNICAL FIELD The present invention relates to a trimming device for a multilayer capacitor,
In particular, the present invention relates to a multilayer capacitor trimming device that adjusts the capacitance value of a multilayer ceramic capacitor built into a ceramic substrate.

従来技術 従来、コンデンサの容量に関しては、製造段階での調
整を行うことができないので、精度が要求されるコンデ
ンサを製造する場合、製造後の検査にて容量値を測定し
て精度分けを行っている。
Conventional technology Conventionally, the capacitance of a capacitor cannot be adjusted at the manufacturing stage.Therefore, when manufacturing a capacitor that requires high accuracy, the capacitance value should be measured in the post-manufacturing inspection to classify the accuracy. There is.

この様な従来のコンデンサの製造方法では、コンデン
サがほぼ完成品となってから精度分けを行っているの
で、不良品が多数生じることは避けられず、歩留りが著
しく低下するという欠点がある。
In such a conventional method for manufacturing a capacitor, since the accuracy is divided after the capacitors are almost finished, it is inevitable that a large number of defective products will occur and the yield will be remarkably reduced.

発明の目的 そこで、本発明はこの様な従来のものの欠点を除去す
べくなされたものであって、その目的とするところは、
製造途中で容量値の調整を行うようにして歩留りの向上
を図った積層型コンデサのトリミング装置を提供するこ
とにある。
SUMMARY OF THE INVENTION Accordingly, the present invention has been made to eliminate such drawbacks of the conventional art, and the object thereof is to:
It is an object of the present invention to provide a trimming device for a laminated capacitor in which the yield is improved by adjusting the capacitance value during manufacturing.

発明の構成 本発明による積層型コンデンサのトリミング装置は、
積層型のコンデンサを水平面内で移動せしめる搬送手段
と、この積層型コンデンサの容量値を測定する容量測定
器と、前記積層型コンデンサの電極部にレーザ光を照射
して切欠きを設ける加工光学系と、前記容量測定器の測
定地が所定値でないときに前記加工光学系により前記電
極に切欠きを設けて前記測定値が所定値になるまで容量
測定と切欠き動作とを繰返し制御する制御手段とを含む
ことを特徴とする。
Structure of the Invention A trimming device for a multilayer capacitor according to the present invention comprises:
Conveying means for moving the multilayer capacitor in a horizontal plane, a capacitance measuring device for measuring the capacitance value of the multilayer capacitor, and a processing optical system for irradiating the electrode part of the multilayer capacitor with a laser beam to form a notch. And a control means for repeatedly controlling the capacitance measurement and the notch operation until the measured value reaches a predetermined value by providing a notch in the electrode by the processing optical system when the measurement location of the capacitance measuring device is not a predetermined value. It is characterized by including and.

実施例 次に、本発明の実施例について図面を参照して説明す
る。
Embodiment Next, an embodiment of the present invention will be described with reference to the drawings.

第1図は本発明の一実施例の概略構成図である。積層
セラミックコンデンサ基板6をXYZ方向に移動可能な搬
送部7に搭載し、制御装置1に作業開始の信号を与え
る。搬送部7はキャパシタンス測定するキャパシタンス
測定器2の測定端子に積層セラミックコンデンサ基板6
の、1度にトリミングする範囲の部分をXYZ方向に位置
決めし、トリミングすべきコンデンサの測定端子をVHF
信号切替装置3にて選択する。
FIG. 1 is a schematic configuration diagram of one embodiment of the present invention. The monolithic ceramic capacitor substrate 6 is mounted on the transfer unit 7 which is movable in the XYZ directions, and a signal for starting the work is given to the control device 1. The carrier unit 7 has a multilayer ceramic capacitor substrate 6 on the measurement terminal of the capacitance measuring device 2 for measuring capacitance.
Position the part of the area to be trimmed at once in the XYZ directions and set the measuring terminal of the capacitor to be trimmed to VHF.
It is selected by the signal switching device 3.

その後、キャパシタンス測定器2によりキャパシタン
スを測定する。所望のキャパシタンスよりも、測定値の
方が大きい場合、トリミングすべきコンデンサの電極を
10,11のうち一方の電極10を第2図に示す様に加工光学
系5にてレーザ光を位置決め後、レーザ光を発して切欠
いて切断する。切断後キャパシタンスを再測定し、所望
のキャパシタンスに達していない場合、さらにコンデン
サの電極を切断し、所望のキャパシタンス値が得られる
までこの作業を繰り返す。
After that, the capacitance is measured by the capacitance measuring device 2. If the measured value is larger than the desired capacitance, place the electrode of the capacitor to be trimmed.
As shown in FIG. 2, one electrode 10 of the electrodes 10 and 11 is positioned by the processing optical system 5 to position the laser beam, and then the laser beam is emitted to cut and cut. After disconnection, the capacitance is remeasured, and if the desired capacitance is not reached, the electrode of the capacitor is further disconnected, and this operation is repeated until the desired capacitance value is obtained.

所望のキャパシタンスが得られた後、次のトリミング
すべきコンデンサの測定端子をVHF信号切替装置3にて
選択し、同様のレーザトリミング処理を行う。この部分
で全てのコンデンサをレーザトリミング後、積層セレミ
ックコンデンサ基板6の次にトリミングする部分を搬送
部7にて測定端子に移動させて位置決めし、レーザトリ
ミングを行う。
After the desired capacitance is obtained, the measurement terminal of the next capacitor to be trimmed is selected by the VHF signal switching device 3 and the same laser trimming process is performed. After laser trimming of all capacitors at this portion, the portion to be trimmed next to the laminated ceremic capacitor substrate 6 is moved to the measuring terminal by the transport unit 7 and positioned, and laser trimming is performed.

積層セラミックコンデンサ基板6上のすべてのコンデ
ンサをトリミング後、積層セラミックコンデンサ基板6
を排出位置に搬送部7にて移動させ、積層セラミックコ
ンデンサ基板6のレーザトリミングが完了する。前述の
一連の動きは、制御装置1にてプログム制御される。
After trimming all capacitors on the monolithic ceramic capacitor substrate 6, the monolithic ceramic capacitor substrate 6
Is moved to the discharge position by the transport unit 7, and laser trimming of the laminated ceramic capacitor substrate 6 is completed. The above-described series of movements are program-controlled by the control device 1.

発明の効果 以上説明したように、本発明によれば、積層セラミッ
クコンデンサ基板上のコンデンサのレーザトリミングを
行うことにより、精度の高いコンデンサを歩留り良く製
造でき、従来では不良となるコンデンサに対しても行っ
ていたモールド工程、分別工程等を省くという効果があ
る。
EFFECTS OF THE INVENTION As described above, according to the present invention, by performing laser trimming of a capacitor on a laminated ceramic capacitor substrate, a highly accurate capacitor can be manufactured with a high yield, and even a capacitor that is defective in the past can be manufactured. This has the effect of omitting the molding process and sorting process that were performed.

【図面の簡単な説明】[Brief description of the drawings]

第1図は本発明の実施例のブロック図、第2図(A)は
積層セラミックコンデンサの平面図、第2図(B)は第
2図(A)のAA線に沿う矢視方向断面図である。 主要部分の符号の説明 1……制御装置 2……キャパシタンス測定器 4……レーザ発振器 5……加工光学系 6……積層セラミックコンデンサ基板 7……搬送部 10,11……電極
1 is a block diagram of an embodiment of the present invention, FIG. 2 (A) is a plan view of a monolithic ceramic capacitor, and FIG. 2 (B) is a sectional view taken along line AA of FIG. 2 (A). Is. Description of symbols of main parts 1 ... Control device 2 ... Capacitance measuring device 4 ... Laser oscillator 5 ... Processing optical system 6 ... Multilayer ceramic capacitor substrate 7 ... Transport unit 10,11 ... Electrodes

Claims (1)

(57)【特許請求の範囲】(57) [Claims] 【請求項1】積層型のコンデンサを水平面内で移動せし
める搬送手段と、この積層型コンデンサの容量値を測定
する容量測定器と、前記積層型コンデンサの電極部にレ
ーザ光を照射して切欠きを設ける加工光学系と、前記容
量測定器の測定値が所定値でないときに前記加工光学系
により前記電極に切欠きを設けて前記測定値が所定値に
なるまで容量測定と切欠き動作とを繰返し制御する制御
手段とを含むことを特徴とする積層型コンデンサのトリ
ミング装置。
1. A conveying means for moving a multilayer capacitor in a horizontal plane, a capacitance measuring device for measuring the capacitance value of the multilayer capacitor, and a cutout formed by irradiating an electrode portion of the multilayer capacitor with a laser beam. A machining optical system provided with, and when the measured value of the capacitance measuring device is not a predetermined value, a notch is provided in the electrode by the machining optical system, and the capacitance measurement and the notch operation are performed until the measured value reaches a predetermined value. A trimming device for a multilayer capacitor, comprising: a control unit for repeatedly controlling.
JP1012655A 1989-01-20 1989-01-20 Trimming device for multilayer capacitors Expired - Fee Related JP2687540B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1012655A JP2687540B2 (en) 1989-01-20 1989-01-20 Trimming device for multilayer capacitors

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1012655A JP2687540B2 (en) 1989-01-20 1989-01-20 Trimming device for multilayer capacitors

Publications (2)

Publication Number Publication Date
JPH02192886A JPH02192886A (en) 1990-07-30
JP2687540B2 true JP2687540B2 (en) 1997-12-08

Family

ID=11811376

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1012655A Expired - Fee Related JP2687540B2 (en) 1989-01-20 1989-01-20 Trimming device for multilayer capacitors

Country Status (1)

Country Link
JP (1) JP2687540B2 (en)

Also Published As

Publication number Publication date
JPH02192886A (en) 1990-07-30

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