JP2680412B2 - Anisotropic conductive film - Google Patents

Anisotropic conductive film

Info

Publication number
JP2680412B2
JP2680412B2 JP1106045A JP10604589A JP2680412B2 JP 2680412 B2 JP2680412 B2 JP 2680412B2 JP 1106045 A JP1106045 A JP 1106045A JP 10604589 A JP10604589 A JP 10604589A JP 2680412 B2 JP2680412 B2 JP 2680412B2
Authority
JP
Japan
Prior art keywords
parts
weight
particle size
less
epoxy resin
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP1106045A
Other languages
Japanese (ja)
Other versions
JPH02288019A (en
Inventor
泰雄 松井
寿郎 小宮谷
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sumitomo Bakelite Co Ltd
Original Assignee
Sumitomo Bakelite Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sumitomo Bakelite Co Ltd filed Critical Sumitomo Bakelite Co Ltd
Priority to JP1106045A priority Critical patent/JP2680412B2/en
Publication of JPH02288019A publication Critical patent/JPH02288019A/en
Application granted granted Critical
Publication of JP2680412B2 publication Critical patent/JP2680412B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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Classifications

    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/30Assembling printed circuits with electric components, e.g. with resistor
    • H05K3/32Assembling printed circuits with electric components, e.g. with resistor electrically connecting electric components or wires to printed circuits
    • H05K3/321Assembling printed circuits with electric components, e.g. with resistor electrically connecting electric components or wires to printed circuits by conductive adhesives

Landscapes

  • Non-Insulated Conductors (AREA)
  • Manufacture Of Macromolecular Shaped Articles (AREA)
  • Moulding By Coating Moulds (AREA)
  • Adhesive Tapes (AREA)

Description

【発明の詳細な説明】 〔産業上の利用分野〕 本発明は、LCD(液晶ディスプレー)とフレキシブル
プリント回路板の接続や、半導体ICとIC搭載用回路基板
のマイクロ接合等の、微細な回路同志の電気的接続に用
いる事の出来る異方性導電フィルムに関するものであ
る。
DETAILED DESCRIPTION OF THE INVENTION [Industrial field of application] The present invention relates to a fine circuit such as a connection between an LCD (liquid crystal display) and a flexible printed circuit board and a micro-joint between a semiconductor IC and a circuit board for mounting an IC. The present invention relates to an anisotropic conductive film that can be used for electrical connection of.

〔従来の技術〕[Conventional technology]

最近の電子機器の小型化・薄型化に伴い、微細な回路
と微細な回路の接続や、微小部品と微細回路基板の接続
の必要性が飛躍的に増大してきており、その接合方法と
して、半田接合技術の進展と共に、新しい材料として、
縞状の導電部と絶縁部分を配したいわゆる“エラスチッ
クコネクター”や、異方性の導電性接着剤やシートが使
用され始めている。(例えば、特開昭59−120436、60−
84718、60−191228、61−55809、61−274394、61−2879
74各号公報等) しかし、その多くは基本的には熱硬化性樹脂或いは熱
可塑性樹脂に分類され、それぞれの特徴を活かした使用
方法が提案されている。即ち、熱硬化性樹脂系では、そ
の耐熱性に基づく高信頼性を活かし、又、熱可塑性樹脂
系のものではその粘着性と繰り返しの圧着・剥離が可能
であり、良好な作業性を有していることを活かして使い
分けられ、主として、液晶ディスプレーとフレキシブル
プリント回路基板の接合を中心とした微細回路の接合
や、耐熱性の不足から半田付け接合方法を採用出来ない
回路同志の接合に用いられる。しかし、上記のような特
性をすべて合わせ持つ異方性導電フィルムは未だなく、
これを用いた電子機器の高信頼性化の足枷となっている
のが現状である。
With the recent miniaturization and thinning of electronic devices, the need for connecting minute circuits to minute circuits and connecting minute parts to minute circuit boards has increased dramatically. With the progress of joining technology, as a new material,
So-called "elastic connectors", which have striped conductive and insulating parts, and anisotropic conductive adhesives and sheets are beginning to be used. (For example, JP-A-59-120436, 60-
84718, 60-191228, 61-55809, 61-274394, 61-2879
However, most of them are basically classified into thermosetting resins or thermoplastic resins, and usage methods utilizing the respective characteristics have been proposed. That is, the thermosetting resin system takes advantage of its high reliability based on its heat resistance, and the thermoplastic resin system has its workability because its adhesiveness and repeated press-bonding / peeling are possible. It is used for different purposes, and is mainly used for joining fine circuits centering on the joining of liquid crystal display and flexible printed circuit board, and joining of circuits that cannot adopt the soldering joining method due to insufficient heat resistance. . However, there is still no anisotropic conductive film that has all of the above characteristics.
The current situation is that it has become a stumbling block for higher reliability of electronic devices using this.

〔発明が解決しようとする課題〕[Problems to be solved by the invention]

本発明は、前記従来技術では得られなかった、良好な
作業性と、高信頼性とを合わせ持つ新規な異方性導電フ
ィルムを提供せんとするものである。
The present invention aims to provide a novel anisotropic conductive film having both good workability and high reliability, which were not obtained by the above-mentioned conventional techniques.

〔課題を解決するための手段〕[Means for solving the problem]

アクリロニトリル・ブタジエン系コポリマー、スチレ
ン・ブタジエン系コポリマー等の、融点が150℃以下で
溶剤に可溶性の熱可塑性ポリマー100重量部、及びエポ
キシ樹脂とこれを硬化するのに用いる常温で固形のイミ
ダゾール系化合物を主成分とする硬化剤合計25〜400重
量部を均一に分散混合した樹脂溶液と、平均粒子径が5
〜15μmの範囲にあり、且つ、最大粒子径が25μm以
下、最小粒子径が1μm以上であり、インジウムを50%
以上含有し融点が110℃以上である半田粉からなる導電
性が粒子を、前記樹脂溶液の固形分に対して0.5〜20体
積%添加混合し均一に分散せしめた混合溶液を、離型フ
ィルム上に流延・乾燥して厚さ50μm以下のフィルム状
に形成しBステージ化して得られる、1度熱圧着した
後、再度熱または有機溶剤によって剥離できることを特
徴とする異方性導電フィルムに関するものである。
100 parts by weight of a solvent-soluble thermoplastic polymer having a melting point of 150 ° C. or less, such as an acrylonitrile / butadiene-based copolymer and a styrene / butadiene-based copolymer, and an epoxy resin and an imidazole-based compound which is solid at room temperature and used to cure the epoxy resin A resin solution in which a total of 25 to 400 parts by weight of a curing agent as a main component is uniformly dispersed and mixed, and an average particle size is 5
~ 15μm, maximum particle size is 25μm or less, minimum particle size is 1μm or more, 50% indium
Conductive particles composed of solder powder having a melting point of 110 ° C. or higher and containing 0.5 to 20% by volume with respect to the solid content of the resin solution are mixed and uniformly dispersed, on a release film. An anisotropic conductive film, which is obtained by casting and drying on a film to form a film having a thickness of 50 μm or less and forming it into a B stage, which can be peeled off again by heat or an organic solvent after thermocompression bonding once. Is.

本発明において用いられる熱可塑性エラストマーは、
アクリロニトリル・ブタジエン系コポリマー、スチレン
・ブタジエン系コポリマー等より選ばれた、融点が150
℃以下で且つ溶剤に可溶性の、所謂ゴム系ポリマーが1
種又は2種以上組合せて用いられ、又同時に用いられる
エポキシ樹脂及びイミダゾール系硬化剤と相溶性の良い
材料が、適宜選択される。
The thermoplastic elastomer used in the present invention is
Acrylonitrile-butadiene copolymer, styrene-butadiene copolymer, etc., melting point 150
The so-called rubber-based polymer, which has a temperature below ℃ and is soluble in solvents,
A material having a good compatibility with the epoxy resin and the imidazole-based curing agent, which are used singly or in combination of two or more, and which are used at the same time, is appropriately selected.

エポキシ樹脂は、通常のビスフェノール系の他、脂肪
族系、或いは多官能芳香族系を用いても良い。硬化剤と
しては、作業性、保存性、信頼性の点から、イミダゾー
ル系の硬化剤、例えば、2−メチルイミダゾール、2−
フェニルイミダゾール、2−フェニル−4メチルイミダ
ゾール、2−フェニル−4,5−ジヒドロキシメチルイミ
ダゾール、2−フェニル−4−メチル−5−ヒドロキシ
メチルイミダゾール、N,N−〔2−メチルイミダゾリル
−(1)−エチル〕−アジボイルジアミド、2,4−ジア
ミノ−6−{2′−メチルイミダゾリル−1′}エチル
−S−トリアジン・イソシアヌール酸付加物等の常温で
固体のイミダゾール系化合物等から選ばれた、1種又は
2種以上の混合物が用いられ、エポキシ樹脂と混合して
保存性が良好(常温で3カ月以上、冷蔵で6カ月以上)
であり、且つ、加熱速硬化性(120℃〜200℃で5秒〜1
分で初期密着性を与える)の組成物が好んで用いられ
る。その他、促進剤や酸化防止剤、カップリング剤等導
電性フィラーとの密着性向上、或いは透明導電ガラス回
路基板やフレキシブル回路基板との密着性向上の為に、
各種添加剤を適宜併用して用いる事が出来る。
The epoxy resin may be an bisphenol-based epoxy resin, an aliphatic-based epoxy resin, or a polyfunctional aromatic-based epoxy resin. As the curing agent, from the viewpoint of workability, storability, and reliability, an imidazole-based curing agent, such as 2-methylimidazole, 2-
Phenyl imidazole, 2-phenyl-4 methyl imidazole, 2-phenyl-4,5-dihydroxymethyl imidazole, 2-phenyl-4-methyl-5-hydroxymethyl imidazole, N, N- [2-methyl imidazolyl- (1) -Ethyl] -adiboyldiamide, 2,4-diamino-6- {2'-methylimidazolyl-1 '} ethyl-S-triazine / isocyanuric acid adduct, etc. In addition, 1 type or a mixture of 2 or more types is used, and it has good storage stability when mixed with epoxy resin (3 months or longer at room temperature, 6 months or longer at refrigerated).
And the rapid curing property by heating (120 ° C to 200 ° C for 5 seconds to 1
Compositions that give initial adhesion in minutes) are preferably used. In addition, in order to improve adhesion with conductive fillers such as accelerators, antioxidants, and coupling agents, or with transparent conductive glass circuit boards or flexible circuit boards,
Various additives can be appropriately used in combination.

エポキシ樹脂及び硬化剤は、低温短時間硬化等の接合
条件、リペアー性等の作業性や、前記熱可塑性エラスト
マーとの相溶性、さらには圧着・硬化後の耐熱性、耐湿
熱性等の信頼性要求特性に基づいて適宜選択される。通
常の異方性導電フィルムに要求される所謂リペアー性、
即ち、1度熱圧着した後にそのフィルムを熱又は有機溶
剤等で剥離し、新たに用意したフィルムを用いて再度位
置合わせし、接合出来ることが特に作業性上欠かせない
重要な特性である。
Epoxy resin and curing agent require bonding conditions such as low-temperature short-time curing, workability such as repairability, compatibility with the thermoplastic elastomer, and further reliability such as heat resistance after pressure bonding / curing and wet heat resistance. It is appropriately selected based on the characteristics. The so-called repairability required for ordinary anisotropic conductive films,
That is, it is an important property that workability is indispensable that the film can be peeled off by heat or an organic solvent or the like after thermocompression bonding once and then realigned using a newly prepared film and bonded.

熱可塑性エラストマー100重量部に対する、エポキシ
樹脂および硬化剤の混合物の配合量について種々検討を
行なった所、その配合量が25重量部以下では、圧着後の
樹脂マトリックスが熱可塑性エラストマーによって形成
され、島状に分布するエポキシ樹脂は殆ど密着強度に関
与しない。この為、被着体との密着強度は熱可塑性エラ
ストマーの持つ粘着(タッキネス)性が中心となり、エ
ポキシ樹脂が本来有する被着体との高い接着強度や高信
頼性が得られなかった。また、400重量部以上では、圧
着後の樹脂マトリックスがエポキシ樹脂の網目構造で形
成され、高い密着強度、耐熱性に裏付けられた高信頼性
が期待されるが、圧着作業で樹脂の硬化が進みすぎ、こ
の為一度の圧着で密着強度が発現してしまい、圧着した
被着体を破損すること無く剥離することは不可能で、リ
ペアー性が失なわれた。従って、エポキシ樹脂及び硬化
剤混合物の熱可塑性エラストマー100重量部に対する配
合量は、25重量部以上400重量部以下、更に好ましくは4
0重量部以上150重量部以下の範囲とするのが良い。
Various studies were conducted on the compounding amount of the epoxy resin and the curing agent with respect to 100 parts by weight of the thermoplastic elastomer, and when the compounding amount was 25 parts by weight or less, the resin matrix after pressure bonding was formed by the thermoplastic elastomer, and The epoxy resin distributed in a shape hardly contributes to the adhesion strength. For this reason, the adhesive strength with the adherend is centered on the tackiness of the thermoplastic elastomer, and the high adhesive strength with the adherend originally possessed by the epoxy resin and the high reliability cannot be obtained. In addition, when the amount is 400 parts by weight or more, the resin matrix after pressure bonding is formed with a mesh structure of epoxy resin, and high adhesion strength and high reliability backed by heat resistance are expected, but resin curing progresses during pressure bonding work. As a result, the adhesive strength was developed by one-time pressure bonding, and the pressure-bonded adherend could not be peeled off without damage and the repairability was lost. Therefore, the compounding amount of the epoxy resin and the curing agent mixture with respect to 100 parts by weight of the thermoplastic elastomer is 25 parts by weight or more and 400 parts by weight or less, and more preferably 4 parts by weight or less.
It is preferable that the range is from 0 parts by weight to 150 parts by weight.

異方性導電フィルムは主として、液晶パネルとフレキ
シブルプリント回路基板の接合用に実用化されており、
被着体となる透明導電性ガラス基板、即ちインジウム−
スズ系酸化物皮膜が形成されたガラス基板との密着性は
欠かせない特性の1つである。この為、導電性粒子につ
いても種々検討した結果、インジウムを50%以上含み、
且つ、融点が110℃以上である2種以上の金属からなる
低融点半田が優れた接続安定性を示すことを見出した。
Anisotropic conductive films are mainly used for joining liquid crystal panels and flexible printed circuit boards,
A transparent conductive glass substrate to be adhered, that is, indium-
Adhesion to a glass substrate on which a tin-based oxide film is formed is one of the essential characteristics. Therefore, as a result of various studies on the conductive particles, the content of indium is 50% or more,
Moreover, it has been found that a low melting point solder composed of two or more kinds of metals having a melting point of 110 ° C. or higher exhibits excellent connection stability.

低融点半田を得る方法は、インジウムのほか、例えば
ビスマス、カドミウム等をスズ/鉛系に添加する方法が
知られているが、ビスマス系、カドミウム系では圧着後
の引き剥がし試験で強度が低く、一方、インジウム系を
用いた場合は剥離後のガラス板表面に半田粉が凝集破壊
して残留しており強度も高い結果であった。更に、又、
ビスマス系は接合後の電気的接続信頼性においても不足
し、カドミウム系はその毒性から使用は避ける方が好ま
しい。
As a method of obtaining a low melting point solder, in addition to indium, for example, a method of adding bismuth, cadmium, etc. to a tin / lead system is known, but bismuth system and cadmium system have low strength in a peeling test after pressure bonding, On the other hand, when the indium-based material was used, the solder powder was cohesively broken and remained on the surface of the glass plate after peeling, resulting in high strength. In addition,
The bismuth type also lacks the reliability of electrical connection after joining, and it is preferable to avoid using the cadmium type due to its toxicity.

インジウムの含有量は50%以下では密着性・信頼性に
おいてその添加効果は少ない。インジウムの含有量が50
%以上であっても、融点が110℃以下の場合、圧着後の
耐熱性に不足するだけでなく、圧着時に半田が溶融して
しまい、半田粒子の凝集がおこり、隣接する回路間の絶
縁信頼性を下げることになる。半田粉の融点はその組成
によって自由に変えられるが、110℃以上、更に好まし
くは120℃以上160℃以下の範囲にあることが好適であ
る。
When the content of indium is 50% or less, the effect of adding it is small in adhesion and reliability. Indium content is 50
% Or more, if the melting point is 110 ° C or less, the heat resistance after crimping will be insufficient, and the solder will melt during crimping, causing agglomeration of the solder particles and insulation reliability between adjacent circuits. Sex will be reduced. Although the melting point of the solder powder can be freely changed depending on its composition, it is preferably 110 ° C. or higher, more preferably 120 ° C. or higher and 160 ° C. or lower.

導電性粒子としての半田粉の大きさは、接合する回路
のパターン精度によって、又、導電メカニズムによっ
て、それぞれ好適な範囲があるが、現状接合に用いられ
る回路幅/回路間隔=0.1/0.1mmに適合するためには、
最大粒子径25μm以下、最小粒子径1μm以上の範囲に
あり、而も平均粒子径が5〜15μmであることが必要で
ある。25μm以上の場合、粒子同志が凝集した時や、圧
着時に2〜3倍に押しつぶされた際に、隣接する回路同
志が短絡する恐れがある。又、1μm以下の場合には、
粒子の凝集が著しくなったり、異方性導電フィルム全体
としての誘電特性にも影響が出てくる。平均粒子径につ
いては断面観察によるその導電メカニズムから、厚み方
向に単一の粒子で電気的に接合されていることが望まし
く、5〜15μmの場合が最も安定した接合状態を示す。
前記樹脂固形分に対する添加量については、0.5体積%
以下では導電性が得られず、又20%以上では隣接回路間
の絶縁信頼性が不良である。
The size of the solder powder as conductive particles has a suitable range depending on the pattern accuracy of the circuit to be bonded and the conductive mechanism, but the current circuit width / circuit interval = 0.1 / 0.1mm used for bonding. To fit,
The maximum particle size is 25 μm or less and the minimum particle size is 1 μm or more, and the average particle size must be 5 to 15 μm. If the particle size is 25 μm or more, adjacent circuits may be short-circuited when particles are aggregated or crushed 2-3 times during pressure bonding. If it is less than 1 μm,
Aggregation of particles becomes remarkable, and the dielectric properties of the anisotropic conductive film as a whole are affected. Regarding the average particle size, it is desirable that the particles are electrically bonded by a single particle in the thickness direction from the conduction mechanism by cross-section observation, and the most stable bonding state is shown in the case of 5 to 15 μm.
The amount added to the resin solid content is 0.5% by volume.
Below, conductivity cannot be obtained, and above 20%, insulation reliability between adjacent circuits is poor.

以下、実施例をもとに本発明を説明する。 Hereinafter, the present invention will be described based on examples.

〔実施例1〜5〕 アクリロニトリル・ブタジエン共重合体(NBR)15部
(重量部、以下同様)(日本合成ゴム(株)製)85部の
メチルエチルケトンに溶解し、15%濃度に溶液を作製
した。同様にして、スチレン・ブタジエン共重合体(SB
R)についても15%濃度のトルエン溶液を作製した。
[Examples 1 to 5] Acrylonitrile / butadiene copolymer (NBR) 15 parts (parts by weight, the same applies hereinafter) (manufactured by Nippon Synthetic Rubber Co., Ltd.) was dissolved in 85 parts of methyl ethyl ketone to prepare a solution having a concentration of 15%. . Similarly, styrene-butadiene copolymer (SB
For R), a 15% strength toluene solution was prepared.

次に、常温で固形のエポキシ樹脂(油化シェルエポキ
シ(株)製 EP−1001)33部とイミダゾール系硬化剤
(2−フェニル−4−メチルイミダゾール)2部をメチ
ルエチルケトン65部に溶解し、エポキシ樹脂溶液を作
製した。又、常温で液状のエポキシ樹脂としてビスフェ
ノール系エポキシ樹脂(油化シェルエポキシ(株)製
EP−828)96部に、ジシアンジアミド1.5部を溶解したメ
チルセロソルブ溶液15部、および2−フェニル−4−メ
チルイミダゾール2.5部を溶解したメチルエチルケトン
溶液25部を、添加混合し均一な樹脂溶液を作製した。
Next, 33 parts of a solid epoxy resin (EP-1001 manufactured by Yuka Shell Epoxy Co., Ltd.) and 2 parts of an imidazole-based curing agent (2-phenyl-4-methylimidazole) are dissolved in 65 parts of methyl ethyl ketone to prepare an epoxy resin. A resin solution was prepared. In addition, as a liquid epoxy resin at room temperature, a bisphenol epoxy resin (made by Yuka Shell Epoxy Co., Ltd.)
EP-828), 96 parts of dicyandiamide, 15 parts of methyl cellosolve solution dissolved in 1.5 parts, and 25 parts of methyl ethyl ketone solution dissolved in 2.5 parts of 2-phenyl-4-methylimidazole were added and mixed to prepare a uniform resin solution. .

及びの熱可塑性エラストマー溶液と、及びの
エポキシ樹脂溶液とを第1表に示す割合で比率を変えて
混合した。
The thermoplastic elastomer solution of and and the epoxy resin solution of and were mixed at the ratios shown in Table 1 while changing the ratio.

次に、このようにして得た樹脂混合溶液に、インジウ
ム合金粒子(In65重量%、Pb20重量%、Sn15重量%、平
均粒子径13μm、最大粒子径17μm、最小粒子径2μ
m)を、樹脂固形分に対して5体積%投入混合し、撹拌
混合機によって10分間混合した。このものをアプリケー
ターを用いて離型フィルム(ポリエチレンテレフタレー
トフィルム、厚さ25μm)上に、乾燥後のフィルム厚み
が20μmになるように流延し、80℃で5分間乾燥し、異
方性導電フィルムを得た。
Next, in the resin mixture solution thus obtained, indium alloy particles (In65 wt%, Pb20 wt%, Sn15 wt%, average particle diameter 13 μm, maximum particle diameter 17 μm, minimum particle diameter 2 μ
m) was added and mixed at 5% by volume with respect to the resin solid content, and mixed by an agitating mixer for 10 minutes. This product was cast on a release film (polyethylene terephthalate film, thickness 25 μm) using an applicator so that the film thickness after drying would be 20 μm, and dried at 80 ° C. for 5 minutes to obtain an anisotropic conductive film. Got

得られた異方性導電フィルムを用いて、インジウム−
スズ酸化物で回路形成した透明導電回路とフレキシブル
プリント回路板(ポリイミド25μm、銅箔18μm、回路
巾0.1mm、ピッチ0.1mm)を回路端子部を位置合わせした
後、150℃で30秒熱圧着することにより接続した。この
ようにして接続した試験片について、初期特性と、150
℃、1000Hr処理した後の特性比較を行なった。結果は第
1表に示した通りであった。
Using the obtained anisotropic conductive film, indium-
After aligning the circuit terminals with the transparent conductive circuit formed with tin oxide circuit and the flexible printed circuit board (polyimide 25 μm, copper foil 18 μm, circuit width 0.1 mm, pitch 0.1 mm), thermocompression bonding at 150 ° C. for 30 seconds Connected by. For the test pieces connected in this way,
The characteristics were compared after the treatment at 1000 ° C. for 1000 hours. The results are as shown in Table 1.

〔比較例1〜3〕 実施例に示した樹脂溶液〜、及び、導電性粒子と
しての通常の6/4半田(Sn60%、Pn40%、500messパス)
を用いて、他は実施例と全く同様にして試験片を作製
し、信頼性評価を行なった。樹脂配合及び評価結果を第
1表に示した。
[Comparative Examples 1 to 3] Resin solutions shown in Examples to and ordinary 6/4 solder as conductive particles (Sn60%, Pn40%, 500 mess pass)
Other than the above, a test piece was prepared in the same manner as in the other examples, and the reliability was evaluated. The resin composition and the evaluation results are shown in Table 1.

実施例ではいずれも優れたリペア性を示した。即ち、
150℃で30秒圧着後、顕微鏡観察の結果、被着体の端子
間にズレが発生した試験片について、再度加熱して直ち
に引き剥がしたところ、フィルムの破断も無く剥離する
ことができた。又、信頼性試験を終了した試験片につい
て、フレキシブルプリント回路板を剥離し、透明導電ガ
ラス表面の顕微鏡観察を行なった結果、ガラス表面の金
属粒子の凝集破壊した跡が観察され、優れた密着性が確
認できた。密着強度測定の結果からも、処理後強度がい
ずれも若干上昇しており、抵抗値の上昇もわずかなもの
であった。
All of the examples showed excellent repairability. That is,
After pressure bonding at 150 ° C. for 30 seconds, microscopic observation revealed that the test piece having a gap between the terminals of the adherend was heated again and immediately peeled off, and the film could be peeled off without breakage. The flexible printed circuit board was peeled off from the test piece that had undergone the reliability test, and the surface of the transparent conductive glass was observed with a microscope.As a result, traces of cohesive failure of metal particles on the glass surface were observed, and excellent adhesion was observed. Was confirmed. From the results of the measurement of the adhesion strength, the strengths after the treatments were slightly increased, and the resistance values were also slightly increased.

これに対して、比較例1では、優れた密着強度と抵抗
値安定性を示したが、リペア性は全く無く、一度圧着し
た後、剥離を試みたところ、フレキシブルプリント回路
板が破断した。又、熱可塑性エラストマーのエポキシ樹
脂に対する配合比率が大きくなるほど初期値、処理後の
いずれも密着強度が低く、抵抗値安定性は得られなかっ
た。
On the other hand, in Comparative Example 1, excellent adhesion strength and resistance value stability were exhibited, but there was no repairability at all, and when pressure was applied once and peeling was attempted, the flexible printed circuit board broke. Further, as the blending ratio of the thermoplastic elastomer to the epoxy resin increased, the initial value and the adhesion strength after the treatment were both low, and resistance value stability could not be obtained.

〔発明の効果〕〔The invention's effect〕

本発明の異方性導電フィルムは、回路板に対する接着
力、接続抵抗等の特性が長時間の加熱処理後でも安定し
ている信頼性に優れると共に、再加熱によって容易に引
き剥がすことが出来てリペア性に優れ、作業性に優れ高
信頼性の微小回路の接続材料として有用である。
The anisotropic conductive film of the present invention has excellent reliability such that adhesiveness to a circuit board, connection resistance, and other properties are stable even after a long-time heat treatment, and can be easily peeled off by reheating. It has excellent repairability, workability, and high reliability and is useful as a connecting material for minute circuits.

Claims (1)

(57)【特許請求の範囲】(57) [Claims] 【請求項1】融点が150℃以下で溶剤に可溶性の熱可塑
性エラストマー100重量部、およびエポキシ樹脂とこれ
を硬化するのに用いる常温で固形のイミダゾール系化合
物を主成分とする硬化剤合計25〜400重量部を均一に分
散混合した樹脂溶液と、平均粒子径が5〜15μmの範囲
にあり、且つ、最大粒子径が25μm以下、最小粒子径が
1μm以上であり、インジウムを50%以上含有し融点が
110℃以上である半田粉からなる導電性が粒子を、前記
樹脂溶液の固形分に対して0.5〜20体積%添加混合し均
一に分散せしめた混合溶液を、離型フィルム上に流延・
乾燥して厚さ50μm以下のフィルム状に形成しBステー
ジ化して得られる、一度熱圧着した後、再度熱又は有機
溶剤によって剥離できることを特徴とする異方性導電フ
ィルム。
1. A total of 25 parts by weight of 100 parts by weight of a thermoplastic elastomer which has a melting point of 150 ° C. or less and is soluble in a solvent, and an epoxy resin and a curing agent mainly composed of an imidazole compound which is solid at room temperature and used for curing the same. A resin solution in which 400 parts by weight are uniformly dispersed and mixed, and an average particle size is in the range of 5 to 15 μm, a maximum particle size is 25 μm or less, a minimum particle size is 1 μm or more, and indium is contained in 50% or more. Melting point
Conductive particles consisting of solder powder having a temperature of 110 ° C or higher, 0.5 to 20% by volume with respect to the solid content of the resin solution, mixed and uniformly dispersed, and cast on a release film.
An anisotropic conductive film obtained by being dried and formed into a film having a thickness of 50 μm or less, and being B-staged, which can be peeled by heat or an organic solvent after thermocompression bonding once.
JP1106045A 1989-04-27 1989-04-27 Anisotropic conductive film Expired - Fee Related JP2680412B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1106045A JP2680412B2 (en) 1989-04-27 1989-04-27 Anisotropic conductive film

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1106045A JP2680412B2 (en) 1989-04-27 1989-04-27 Anisotropic conductive film

Publications (2)

Publication Number Publication Date
JPH02288019A JPH02288019A (en) 1990-11-28
JP2680412B2 true JP2680412B2 (en) 1997-11-19

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2500819B2 (en) * 1991-07-31 1996-05-29 住友ベークライト株式会社 Anisotropic conductive film
JP2500826B2 (en) * 1991-10-30 1996-05-29 住友ベークライト株式会社 Anisotropic conductive film
JP2509773B2 (en) * 1991-12-05 1996-06-26 住友ベークライト株式会社 Method for producing anisotropic conductive film
JP2002075064A (en) * 2000-08-23 2002-03-15 Tdk Corp Anisotropic conductive film and its manufacturing method, and display using anisotropic conductive film
WO2006110634A2 (en) 2005-04-11 2006-10-19 3M Innovative Properties Company Connection method of a flexible printed circuit board with two printed circuit boards, and electric or electronic component with parts connected by the connection method
JP4828151B2 (en) * 2005-04-15 2011-11-30 タツタ電線株式会社 Conductive adhesive sheet and circuit board
JP2019119820A (en) * 2018-01-09 2019-07-22 住友ベークライト株式会社 Encapsulation film, encapsulation film coated electronic component loading substrate and re-detachment method

Also Published As

Publication number Publication date
JPH02288019A (en) 1990-11-28

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